Rinsing device for machining parts of PECVD (plasma enhanced chemical vapor deposition) equipment

Abstract

The utility model relates to the field of rinsing devices, and discloses a rinsing device for PECVD (plasma enhanced chemical vapor deposition) equipment part processing, which comprises a frame, a box body is embedded in the frame, an electric field control module is arranged on the box body, fixing plates are arranged at two ends of the top surface of the box body, a plurality of branch pipes distributed at equal intervals are arranged on each fixing plate, and nozzles are arranged at the bottom ends of the branch pipes. Hydraulic cylinders are arranged on the outer walls of the two sides of the box body, top plates are arranged at the output ends of the two hydraulic cylinders, a screen frame is arranged in the box body, vertical rods are arranged at the two ends of the top face of the screen frame, and the top faces of the two vertical rods are connected with the two top plates correspondingly; according to the device, ultrapure water serves as rinsing liquid, the characteristics of low impurity content and high purity of the ultrapure water are utilized, impurity residues on the surfaces of parts are reduced, the ultrapure water is conveyed into the two communicating pipes through the water inlet pipe and the U-shaped pipe by means of the water pump, then the ultrapure water is sprayed out of the spray heads through the branch pipes, and the parts in the box body are rinsed; and the parts on the screen frame are convenient to take.

Description

Technical Field

[0001] This application relates to the field of rinsing apparatus, and more particularly to a rinsing apparatus for processing parts in PECVD equipment. Background Technology

[0002] PECVD equipment is one of the key pieces of equipment in semiconductor manufacturing. The cleanliness and precision of its components have a significant impact on the performance and lifespan of the equipment. In the component processing of PECVD equipment, the rinsing process is an important step to ensure that the surface of the components is clean and free of residues. However, traditional rinsing methods often have problems such as uneven rinsing effect, long time consumption, and waste of water resources. Moreover, for some precision components, such as nozzles and electrodes, it is easy to cause damage, affecting the performance and lifespan of the components. Utility Model Content

[0003] To address the problems of uneven rinsing effect, long rinsing time, and water waste often associated with traditional rinsing methods, and the potential damage to certain precision components such as nozzles and electrodes, which can affect the performance and lifespan of these components, this application provides a rinsing device for PECVD equipment component processing.

[0004] The rinsing device for processing parts in PECVD equipment provided in this application adopts the following technical solution:

[0005] A rinsing device for processing parts in a PECVD equipment includes a frame, a housing embedded inside the frame, an electric field control module on the housing, fixed plates at both ends of the top surface of the housing, multiple equally spaced branch pipes on each fixed plate, nozzles at the bottom ends of the branch pipes, hydraulic cylinders on both outer walls of the housing, top plates at the output ends of the two hydraulic cylinders, a mesh frame inside the housing, vertical rods at both ends of the top surface of the mesh frame, and the top surfaces of the two vertical rods connected to the two top plates respectively.

[0006] Preferably, the other end of the plurality of branch pipes is connected to a connecting pipe, both ends of the connecting pipe are provided with connecting plates, two of the connecting plates are connected to a fixing plate, one end of the two connecting pipes is connected to a U-shaped pipe, and the U-shaped pipe is connected to a water inlet pipe.

[0007] Preferably, a limiting frame is provided inside the box and below the wire mesh frame, and a drain pipe is provided on the bottom surface of the box, with a pipe cover hinged to the bottom surface of the drain pipe.

[0008] Preferably, the electric field control module includes an electric field generator, electrodes, and a control system. By adjusting the output voltage and current of the electric field generator, as well as the shape and position of the electrodes, precise control of the rinsing process can be achieved.

[0009] Preferably, the inner wall of the tank is equipped with a sensor to monitor the pH value and temperature of the rinsing solution in the tank in real time, and adjust them according to a preset parameter range.

[0010] In summary, this application includes the following beneficial technical effects:

[0011] 1. This device uses ultrapure water as the rinsing solution. Taking advantage of the low impurity content and high purity of ultrapure water, it reduces the residue of impurities on the surface of the parts. The ultrapure water is pumped through the inlet pipe and transported through the U-shaped pipe to the inside of the two connecting pipes. Then, the ultrapure water is sprayed out from the nozzle through the branch pipe to rinse the parts inside the tank.

[0012] 2. The top plate is moved upward by the output ends of two hydraulic cylinders. The upward movement of the two top plates causes the vertical rod and the mesh frame to move upward. The up and down movement of the mesh frame makes it easier to remove the parts on the mesh frame.

[0013] 3. The electric field control module includes an electric field generator, electrodes, and a control system. By adjusting the output voltage and current of the electric field generator, as well as the shape and position of the electrodes, precise control of the rinsing process can be achieved. Sensors are installed on the inner wall of the chamber to monitor the pH value and temperature of the rinsing solution in the chamber in real time and adjust them according to the preset parameter range to ensure that the pH value and temperature of the rinsing solution are always kept within the optimal range to improve the cleaning effect. Attached Figure Description

[0014] Figure 1 This is a structural front view of an embodiment of the application;

[0015] Figure 2 This is a top view of the structure of the embodiment of the application;

[0016] Figure 3 This is a schematic diagram of the structure of the limiting frame in the embodiment of the application;

[0017] Figure 4 This is a schematic diagram of the sewage pipe in the embodiment of the application.

[0018] Explanation of reference numerals in the attached drawings: 1. Frame; 2. Box body; 3. Electric field control module; 4. Wire frame; 5. Fixing plate; 6. Connecting plate; 7. Branch pipe; 8. Nozzle; 9. U-shaped pipe; 10. Water inlet pipe; 11. Hydraulic cylinder; 12. Top plate; 13. Vertical rod; 14. Limiting frame; 15. Sewage pipe; 16. Pipe cover. Detailed Implementation

[0019] The following is in conjunction with the appendix Figure 1-4 This application will be described in further detail.

[0020] This application discloses a rinsing device for processing parts in PECVD equipment, referring to... Figure 1 The device includes a frame 1, with a housing 2 fixedly embedded inside the frame 1. An electric field control module 3 is installed on the housing 2. Fixed plates 5 are fixed at both ends of the top surface of the housing 2. Multiple equally spaced branch pipes 7 are fixed on each fixed plate 5. A nozzle 8 is fixed at the bottom end of each branch pipe 7. A connecting pipe is fixedly connected to the other end of each branch pipe 7. A connecting plate 6 is fixedly installed at both ends of each connecting pipe. Two connecting plates 6 are connected to the fixed plates 5. A U-shaped pipe 9 is fixedly connected to one end of each connecting pipe. A water inlet pipe 10 is fixedly connected to each U-shaped pipe 9. This device uses ultrapure water as the rinsing solution. By utilizing the low impurity content and high purity of ultrapure water, the impurity residue on the surface of the parts is reduced. Ultrapure water is pumped through the water inlet pipe 10 and then transported through the U-shaped pipe 9 to the inside of the two connecting pipes. The ultrapure water is then sprayed out from the nozzle 8 through the branch pipe 7 to rinse the parts inside the housing 2.

[0021] Reference Figures 2-4 Hydraulic cylinders 11 are fixedly installed on both outer walls of the box body 2. Top plates 12 are fixedly installed at the output ends of the two hydraulic cylinders 11. A mesh frame 4 is slidably installed inside the box body 2. Vertical rods 13 are fixedly installed at both ends of the top surface of the mesh frame 4. The top surfaces of the two vertical rods 13 are fixedly connected to the two top plates 12 respectively. A limiting frame 14 is provided inside the box body 2 and below the mesh frame 4. The limiting frame 14 is fixedly connected to the inner wall of the box body 2. A drain pipe 15 is fixedly installed on the bottom surface of the box body 2. A pipe cover 16 is hinged to the bottom surface of the drain pipe 15. The output ends of the two hydraulic cylinders 11 drive the top plate 12 to move upward. The upward movement of the two top plates 12 drives the vertical rods 13 and the mesh frame 4 to move upward. The up and down movement of the mesh frame 4 facilitates the removal of parts on the mesh frame 4.

[0022] Reference Figure 1 The electric field control module 3 includes an electric field generator, electrodes, and a control system. By adjusting the output voltage and current of the electric field generator, as well as the shape and position of the electrodes, precise control of the rinsing process can be achieved. Sensors are installed on the inner wall of the tank 2 to monitor the pH value and temperature of the rinsing solution in the tank 2 in real time and adjust them according to the preset parameter range to ensure that the pH value and temperature of the rinsing solution are always kept within the optimal range to improve the cleaning effect.

[0023] The implementation principle of the rinsing device for PECVD equipment parts processing in this application embodiment is as follows: In use, this device uses ultrapure water as the rinsing solution. Utilizing the low impurity content and high purity of ultrapure water, the residual impurities on the surface of the parts are reduced. The ultrapure water is pumped through the inlet pipe 10 and transported to the interior of two connecting pipes via the U-shaped pipe 9. Then, the ultrapure water is sprayed out from the nozzle 8 through the branch pipe 7 to rinse the parts inside the chamber 2. At the same time, the electric field control module 3 includes an electric field generator, electrodes, and a control system. By adjusting the output voltage and current of the electric field generator, as well as the shape and position of the electrodes, precise control of the rinsing process is achieved. Sensors are installed on the inner wall of the chamber 2 to monitor the pH value and temperature of the rinsing solution in the chamber 2 in real time and adjust them according to the preset parameter range to ensure that the pH value and temperature of the rinsing solution are always kept within the optimal range to improve the cleaning effect.

[0024] Finally, the following points should be noted: First, in the description of this application, it should be noted that, unless otherwise specified and limited, the terms "installation", "connection", and "linkage" should be interpreted broadly, and can be mechanical or electrical connections, or internal connections between two components, or direct connections. "Up", "down", "left", "right", etc. are only used to indicate relative positional relationships. When the absolute position of the described object changes, the relative positional relationship may change.

[0025] Secondly: The accompanying drawings of the embodiments disclosed in this utility model only involve the structures involved in the embodiments disclosed in this utility model. Other structures can refer to the general design. In the absence of conflict, the same embodiment and different embodiments of this utility model can be combined with each other.

[0026] Finally: The above description is only a preferred embodiment of the present utility model and is not intended to limit the present utility model. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present utility model should be included within the protection scope of the present utility model.

[0027] The above are all preferred embodiments of this application, and are not intended to limit the scope of protection of this application. Therefore, all equivalent changes made in accordance with the structure, shape and principle of this application should be covered within the scope of protection of this application.

Claims

1. A rinsing device for processing parts in a PECVD equipment, comprising a frame (1), characterized in that: The frame (1) is embedded with a box (2), and the box (2) is provided with an electric field control module (3). The top surface of the box (2) is provided with a fixing plate (5) at both ends. Each fixing plate (5) is provided with multiple equally spaced branch pipes (7). The bottom end of the branch pipe (7) is provided with a nozzle (8). The outer walls on both sides of the box (2) are provided with hydraulic cylinders (11). The output ends of the two hydraulic cylinders (11) are provided with top plates (12). The box (2) is provided with a mesh frame (4). The top surface of the mesh frame (4) is provided with vertical rods (13) at both ends. The top surfaces of the two vertical rods (13) are respectively connected to the two top plates (12).

2. The rinsing device for PECVD equipment parts processing according to claim 1, characterized in that: The other end of each of the branch pipes (7) is connected to a connecting pipe. Both ends of the connecting pipe are provided with connecting plates (6). The two connecting plates (6) are connected to the fixing plate (5). One end of each of the two connecting pipes is connected to a U-shaped pipe (9). The U-shaped pipe (9) is connected to a water inlet pipe (10).

3. The rinsing device for PECVD equipment parts processing according to claim 1, characterized in that: A limiting frame (14) is provided inside the box (2) and below the wire mesh frame (4). A drain pipe (15) is provided on the bottom surface of the box (2), and a pipe cover (16) is hinged to the bottom surface of the drain pipe (15).

4. A rinsing device for processing parts in a PECVD equipment according to claim 1, characterized in that: The electric field control module (3) includes an electric field generator, electrodes, and a control system. By adjusting the output voltage and current of the electric field generator, as well as the shape and position of the electrodes, precise control of the rinsing process can be achieved.

5. A rinsing device for processing parts in a PECVD equipment according to claim 1, characterized in that: The inner wall of the box (2) is equipped with a sensor, which monitors the pH value and temperature of the rinsing solution in the box (2) in real time and adjusts them according to the preset parameter range.

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