Full-wave-band laser window sheet applied to high-power laser

Abstract

The utility model discloses a full-wave-band laser window sheet applied to high-power laser, which comprises a substrate layer positioned in the middle, a main film structure layer arranged at the upper part of the substrate layer, and a secondary film structure layer arranged at the lower part of the substrate layer, the main film structure layer is composed of eight high-refractive-index film structures and low-refractive-index absorption film structures which are alternately overlapped outwards along one side close to the substrate layer, and the main film structure layer is shown as follows: the substrate layer / 10.17 nmH, 21.64 nmL, 88.37 nmH, 20.55 nmL, 36.27 nmH, 39.14 nmL, 23.04 nmH and 94.92 nmL / air; the secondary film structure layer is composed of eight high-refractive-index film structures and low-refractive-index absorption film structures which are alternately overlapped outwards along one side close to the substrate layer, and the secondary film structure layer is composed of the substrate layer / 10.17 nmH, 21.64 nmL, 88.37 nmH, 20.55 nmL, 36.27 nmH, 39.14 nmL, 23.04 nmH and 94.92 nmL / air. The full-wave band laser window sheet applied to the high-power laser can obtain the transmittance of more than 99.8% at 355 nm, 532 nm and 1064 nm, and the transmittance reaches the result; and the low absorption rate of 2ppm is achieved.

Description

Technical Field

[0001] This utility model relates to the field of full-band laser window manufacturing, specifically to a full-band laser window used in high-power lasers. Background Technology

[0002] A full-band laser window needs to be able to adapt to operating conditions across the entire wavelength range from ultraviolet to infrared. In the ultraviolet band, many scientific research experiments, such as photochemical analysis of materials and photolithography, rely on ultraviolet lasers. A full-band laser window must allow efficient transmission of ultraviolet light, which requires its materials to possess special optical properties with minimal absorption of ultraviolet light. Simultaneously, the material must exhibit extremely high stability in the ultraviolet environment, preventing chemical changes or physical damage from prolonged exposure.

[0003] In the visible light band, this is the most common application range of lasers in people's daily lives, such as laser pointers and laser printers. The window must ensure high transmittance of visible light to ensure the normal functioning of the laser, and there must be no obvious optical distortion in appearance.

[0004] The infrared band has wide applications in military reconnaissance, thermal imaging technology, and some industrial inspection fields. The transmittance of infrared light is equally crucial for full-band laser windows; they need to withstand the thermal effects of infrared light without their own heating interfering with the transmission path and performance of the infrared laser. Only full-band laser windows capable of operating across the entire wavelength range from ultraviolet to infrared can play an indispensable role in many high-end and complex laser applications. Utility Model Content

[0005] In order to overcome the above-mentioned defects of the prior art, the purpose of this utility model is to provide a full-band laser window for use with high-power lasers.

[0006] A full-band laser window for high-power lasers, comprising:

[0007] The base layer is located in the middle, and the main membrane structure layer is disposed on the upper part of the base layer.

[0008] A sub-membrane structure layer is provided at the lower part of the substrate layer;

[0009] The main film structure layer consists of eight layers of alternating high-refractive-index film structure and low-refractive-index absorption film structure stacked outwards from the side closest to the substrate layer.

[0010] The main membrane structure layer is as follows:

[0011] Base layer / 10.17nmH, 21.64nmH, 88.37nmH, 20.55nmH, 36.27nmH, 39.14nmH, 23.04nmH, 94.92nmH / air;

[0012] The sub-film structure layer consists of eight alternating layers of high-refractive-index film structure and low-refractive-index absorption film structure stacked outwards along one side close to the substrate layer.

[0013] The submembrane structure layer is:

[0014] Base layer / 10.17nmH, 21.64nmH, 88.37nmH, 20.55nmH, 36.27nmH, 39.14nmH

[0015] 23.04 nmH, 94.92 nm / air;

[0016] Where H represents a high refractive index film structure, L represents a low refractive index absorbing film structure, and the nanometers before H and L represent the thickness of the corresponding film structure.

[0017] In a preferred embodiment of this utility model, the base layer is made of quartz.

[0018] In a preferred embodiment of this utility model, the base layer is Herlix SUP-313 quartz.

[0019] In a preferred embodiment of this invention, the high refractive index film structure is hafnium dioxide (HFO2).

[0020] In a preferred embodiment of this invention, the low refractive index absorption film structure is silicon dioxide (SiO2).

[0021] The beneficial effects of this utility model are as follows:

[0022] The full-band laser window of this invention, applied to high-power lasers, can achieve a transmittance of over 99.8% at 355nm, 532nm, and 1064nm, and a low absorption rate of <2ppm.

[0023] The base layer uses Herringbone 313 quartz, a material with a low coefficient of expansion, few impurities, high heat resistance, high moisture resistance, and excellent chemical stability, making it suitable for use in all wavelengths of high-power lasers. Attached Figure Description

[0024] Figure 1 This is a schematic diagram of the structure of this utility model.

[0025] Figure 2 This is a schematic diagram illustrating the effect of an embodiment of the present invention.

[0026] Figure 3 This is a partial view illustrating the effect of an embodiment of the present invention. Detailed Implementation

[0027] To make the objectives, technical solutions, and advantages of this utility model clearer, the present utility model will be further described in detail below with reference to the accompanying drawings and embodiments. However, it should be understood that the specific embodiments described herein are merely illustrative of the present utility model and are not intended to limit its scope. Furthermore, in the following descriptions, well-known structures and technologies have been omitted to avoid unnecessary confusion regarding the concept of this utility model.

[0028] In the description of this utility model, it should be noted that the terms "upper," "lower," "inner," "outer," "top / bottom," etc., indicating the orientation or positional relationship are based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this utility model and simplifying the description. They do not indicate or imply that the device or component referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model.

[0029] like Figure 1 As shown in Figure 2 or 3, a full-band laser window for high-power lasers includes a base layer 100 located in the middle. The base layer 100 is made of quartz material, and in this embodiment, it is Herringbone SUP-313 quartz.

[0030] Herlix SUP-313 quartz material is characterized by a low coefficient of thermal expansion, few impurities, high heat resistance, high moisture resistance, and excellent chemical stability.

[0031] When heated from a low-temperature environment (-20℃) to a high-temperature environment (+100℃), the change in its length is negligible compared to other materials. This characteristic is very important for high-precision optical instruments because the expansion or contraction of the window itself during temperature changes will not cause changes in the focal length of the optical system or a shift in the optical path.

[0032] It exhibits strong resistance to most chemicals. Whether acidic (such as nitric acid and hydrochloric acid) or alkaline (such as sodium hydroxide solution), it is difficult for them to corrode it under normal concentrations and temperatures. This allows it to be used in a variety of harsh chemical environments, such as optical monitoring systems in chemical production or optical equipment in certain specialized laboratory environments.

[0033] A primary membrane structure layer 200 is disposed on the upper part of the substrate layer 100. A secondary membrane structure layer 300 is disposed on the lower part of the substrate layer 100.

[0034] The main membrane structure layer 200 and the secondary membrane structure layer 300 are symmetrically arranged.

[0035] The main film structure layer 200 consists of eight alternating layers of high-refractive-index film and low-refractive-index absorption film structures stacked outwards from the side closest to the substrate layer 100. The specific main film structure layer is shown below:

[0036] Base layer / 10.17nmH, 21.64nmmL, 88.37nmH, 20.55nmmL, 36.27nmH, 39.14nmmL, 23.04nmH, 94.92nmmL / air.

[0037] H represents a high refractive index film structure, and L represents a low refractive index absorbing film structure. The nanometers before H and L represent the thickness of the corresponding film structure.

[0038] The secondary membrane structure layer 300 consists of eight layers of high-refractive-index membrane structure and low-refractive-index absorption membrane structure that are alternately stacked outwards along the side closest to the substrate layer 100.

[0039] The secondary membrane structure layer 300 is as follows: base layer / 10.17 nmH, 21.64 nmL, 88.37 nmH, 20.55 nmL, 36.27 nmH, 39.14 nmL, 23.04 nmH, 94.92 nmL / air.

[0040] H represents a high refractive index film structure, and L represents a low refractive index absorbing film structure. The nanometers before H and L represent the thickness of the corresponding film structure.

[0041] The high-refractive-index film structure is hafnium dioxide (HFO2), and the low-refractive-index absorption film structure is silicon dioxide (SiO2).

[0042] High refractive index film structures are attached to low refractive index absorption film structures through a coating process.

[0043] This invention achieves a transmittance of over 99.8% at 355nm, 532nm, and 1064nm, and a low absorption rate of <2ppm.

[0044] The above shows and describes the basic principles, main features, and advantages of this utility model.

[0045] Those skilled in the art should understand that this utility model is not limited to the above embodiments. The embodiments and descriptions in the specification are merely illustrative of the principles of this utility model. Various changes and modifications can be made to this utility model without departing from its spirit and scope. All such changes and modifications fall within the scope of this utility model as defined by the appended claims and their equivalents.

Claims

1. A full-band laser window for use with high-power lasers, characterized in that, include: The base layer is located in the middle, and the main membrane structure layer is disposed on the upper part of the base layer. A sub-membrane structure layer is provided at the lower part of the substrate layer; The main film structure layer consists of eight layers of alternating high-refractive-index film structure and low-refractive-index absorption film structure stacked outwards from the side closest to the substrate layer. The main membrane structure layer is as follows: Base layer / 10.17nmH, 21.64nmH, 88.37nmH, 20.55nmH, 36.27nmH, 39.14nmH, 23.04nmH, 94.92nmH / air; The sub-film structure layer consists of eight alternating layers of high-refractive-index film structure and low-refractive-index absorption film structure stacked outwards along one side close to the substrate layer. The submembrane structure layer is: Base layer / 10.17nmH, 21.64nmH, 88.37nmH, 20.55nmH, 36.27nmH, 39.14nmH, 23.04nmH, 94.92nmH / air; Where H represents a high refractive index film structure, L represents a low refractive index absorbing film structure, and the nanometers before H and L represent the thickness of the corresponding film structure.

2. A full-band laser window for high-power lasers as described in claim 1, characterized in that, The base layer is made of quartz.

3. A full-band laser window for high-power lasers as described in claim 1 or 2, characterized in that, The base layer is Hellish SUP-313 quartz.

4. A full-band laser window for high-power lasers as described in claim 1, characterized in that, The high refractive index film structure is hafnium dioxide (HFO2).

5. A full-band laser window for high-power lasers as described in claim 1, characterized in that, The low-refractive-index absorption film structure is silicon dioxide (SiO2).

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