Lens microenvironment system of photovoltaic projection lithography equipment

Abstract

The utility model discloses a lens microenvironment system of photovoltaic projection photoetching equipment, which comprises a base, a lens sealing cover arranged on the base and used for sealing a lens, and a light source shaping assembly, a mask assembly and a projection lens which are sequentially arranged on the supporting table, the mask plate assembly covers the supporting table, the light source shaping assembly, the mask plate assembly and the projection lens, a sealing assembly is arranged in the mask plate assembly, and the sealing assembly comprises a mask plate sealing cover and an air guide branch pipe and is used for conducting independent air duct circulation on the mask plate assembly; an EFU assembly is combined with dual-channel airflow distribution, so that continuous replacement of microenvironment air in a lens sealing cover and independent circulating cooling of a mask assembly part are realized, and the influence of thermal expansion and cold contraction on exposure precision is reduced; according to the anti-pollution design, the protective glass and the ion wind bar act synergistically to prevent adhesion of ink volatile matters and electrostatic adsorption of dust, so that the lens cleaning frequency is reduced.

Description

TECHNICAL FIELD

[0001] The utility model relates to photovoltaic photoetching technical field, concretely relates to a lens microenvironment system for photovoltaic projection photoetching equipment. BACKGROUND

[0002] In the photovoltaic patterning production workshop, the photoetching equipment needs to ensure exposure accuracy through environment control. The existing photovoltaic workshop environment control mainly relies on workshop-level water cooling, air conditioning and EFU (fan filter unit) dust removal system. However, such methods have the following defects:

[0003] Temperature and humidity control is rough: the workshop-level air conditioner is difficult to accurately adjust the local microenvironment of the lens, film plate pollution risk: the mask assembly lacks independent air duct protection and is easily affected by external air disturbance and internal heat accumulation; dust removal efficiency is insufficient: EFU can only maintain the overall cleanliness of the workshop and cannot block the invasion of pollutants such as ink volatiles and static adsorption into the lens area.

[0004] The above problems result in low operation rate of the photoetching equipment and exposure yield fluctuation, and an integrated control scheme for the lens microenvironment is urgently needed. UTILITY MODEL CONTENT

[0005] TECHNICAL PROBLEM

[0006] The utility model aims to solve the problem of inaccurate temperature and humidity control of the lens microenvironment, mask thermal deformation and pollution invasion in the prior art, and provides a multi-stage sealed and partitioned photoetching lens microenvironment system.

[0007] To achieve the above purpose, the utility model provides the following technical scheme:

[0008] A photovoltaic projection photoetching equipment lens microenvironment system, comprising: a base provided with a battery piece loading platform and a support table, a light source shaping assembly, a mask assembly and a projection lens are sequentially arranged on the support table, and further comprising:

[0009] A lens sealing cover is arranged on the base and covers the support table, the light source shaping assembly, the mask assembly and the projection lens, and a sealing assembly is arranged in the lens sealing cover, the sealing assembly comprises a mask sealing cover and a gas guide branch pipe for independent air duct circulation of the mask assembly;

[0010] An air purification device comprises an air conditioner, a gas guide main pipe and an EFU assembly, the gas guide main pipe is connected between the air conditioner and the EFU assembly, and the EFU assembly is connected with the air inlet of the lens sealing cover.

[0011] An electrostatic dust removal device comprises a protective glass arranged at the bottom of the projection lens and an ion wind rod, and the ion wind rod blows air towards the surface of the protective glass to remove static electricity and dust.

[0012] As a further scheme of the utility model: the sealing assembly further includes a gas guide cover and a partition plate, the gas guide cover is connected with the mask sealing cover and the gas guide branch pipe, and the partition plate is arranged in the air inlet and a groove is formed in the outer wall of the partition plate for shunting clean air into the gas guide branch pipe.

[0013] As a further scheme of the utility model: the mask sealing cover is sleeved outside the mask assembly, and the mask sealing cover is provided with light transmission openings on the two sides of the outer wall close to the light source shaping assembly and the projection lens.

[0014] As a further scheme of the utility model: the air outlet of the EFU assembly is fully attached to the air inlet, the air inlet is divided into a double-channel airflow distribution structure by the partition plate, and clean air enters the lens sealing cover through the gap between the partition plate and the air inlet.

[0015] As a further scheme of the utility model: the protective glass is attached to the light emitting position of the projection lens, and a waterproof film is arranged on the surface of the protective glass to prevent ink volatiles from adhering.

[0016] As a further scheme of the utility model: the air outlet of the air conditioner is provided with an activated carbon filter element for adsorbing particulate matter and controlling humidity.

[0017] As a further scheme of the utility model: the top of the base is provided with a device shell, the lens sealing cover is arranged in the device shell, and a temperature and humidity sensor and a dew condensation sensor are arranged in the mask sealing cover, the lens sealing cover and the device shell to monitor environmental parameters and trigger an alarm.

[0018] As a further scheme of the utility model: a second maintenance door is arranged on one side of the mask sealing cover, a third maintenance door and a first maintenance door are arranged on the device shell and the lens sealing cover respectively, and an exhaust port with a wind shield is arranged on the second maintenance door and the first maintenance door.

[0019] Compared with the prior art, the utility model has the beneficial effects that: through linkage of the air conditioner and the EFU assembly, the temperature and humidity in the lens sealing cover are accurately controlled to meet the high-precision requirement of the photolithography lens.

[0020] High-efficiency dust removal and independent air duct: the EFU assembly combines double-channel airflow distribution to realize continuous replacement of micro-environment air in the lens sealing cover and independent circulation cooling of part of the mask assembly, thereby reducing the influence of thermal expansion and contraction on exposure precision.

[0021] Anti-pollution design: the protective glass and the ion wind rod cooperate to prevent ink volatiles from adhering and electrostatically adsorbing dust, thereby reducing the cleaning frequency of the lens. BRIEF DESCRIPTION OF DRAWINGS

[0022] Figure 1It is a kind of photovoltaic projection photoetching equipment lens microenvironment system's structural schematic diagram.

[0023] Figure 2 It is a kind of photovoltaic projection photoetching equipment lens microenvironment system in the equipment shell in the structural schematic diagram.

[0024] Figure 3 It is a kind of photovoltaic projection photoetching equipment lens microenvironment system in the structure schematic diagram of electrostatic precipitator.

[0025] Figure 4 It is a kind of photovoltaic projection photoetching equipment lens microenvironment system in the structure schematic diagram of sealing assembly.

[0026] Figure 5 It is a kind of photovoltaic projection photoetching equipment lens microenvironment system in the structure schematic diagram of sealing assembly.

[0027] Figure 6 It is a kind of photovoltaic projection photoetching equipment lens microenvironment system in the structure schematic diagram of mask sealing cover.

[0028] Figure 7 It is a kind of photovoltaic projection photoetching equipment lens microenvironment system in the structure schematic diagram of lens sealing cover.

[0029] In the figure: 1, base; 2, battery piece support; 3, equipment shell; 4, air conditioner; 5, gas guide main pipe; 6, support table; 7, light source shaping assembly; 8, mask assembly; 9, projection lens; 10, sealing assembly; 11, mask sealing cover; 12, gas guide cover; 13, gas guide branch pipe; 14, partition; 15, groove; 16, lens sealing cover; 17, air inlet; 18, first access door; 19, air outlet; 20, wind shield; 21, light transmission port; 22, second access door; 23, EFU assembly; 24, protective glass; 25, ion wind rod; 26, third access door. DETAILED DESCRIPTION

[0030] The utility model will be further explained in detail in the following in combination with the drawings and specific embodiments.

[0031] As Figures 1-4 shown, a kind of photovoltaic projection photoetching equipment lens microenvironment system, including: base 1, which is equipped with battery piece support 2 and support table 6 on it, the support table 6 is sequentially provided with light source shaping assembly 7, mask assembly 8 and projection lens 9, light source is irradiated on mask assembly 8 after rectifying by light source shaping assembly 7, then enters projection lens 9, and is irradiated on the battery piece of support table 6 from the bottom of projection lens 9, to the exposure of battery piece.

[0032] Further comprising: a lens sealing cover 16 arranged on the base 1, covering the support table 6, the light source shaping assembly 7, the mask assembly 8, and the projection lens 9, and internally provided with a sealing assembly 10, the sealing assembly 10 comprising a mask sealing cover 11 and a gas guide branch pipe 13, for independently circulating air channels for the mask assembly 8.

[0033] The mask sealing cover 11 is sleeved outside the mask assembly 8, and the mask sealing cover 11 is provided with light transmission ports 21 on the two sides of the external walls close to the light source shaping assembly 7 and the projection lens 9, so that the light source shaping assembly 7 is not hindered by the light transmission ports 21, and the light passing through the mask assembly 8 will not be hindered from entering the projection lens 9.

[0034] The lens sealing cover 16 completely covers the support table 6, the light source shaping assembly 7, the mask assembly 8, and the projection lens 9, forming a first level of physical isolation; the mask sealing cover 11 is further sleeved outside the mask assembly 8, forming a second level of independent sealing space, and double sealing blocks the invasion of ink volatiles and dust into the lens and mask area.

[0035] As shown in Figure 5 The sealing assembly 10 further comprises a gas guide cover 12 and a partition plate 14, the gas guide cover 12 connects the mask sealing cover 11 and the gas guide branch pipe 13, and the partition plate 14 is arranged in the air inlet 17 and the outer wall is provided with a groove 15 for shunting clean air into the gas guide branch pipe 13.

[0036] The air purification device comprises an air conditioner 4, a gas guide main pipe 5, and an EFU assembly 23, the gas guide main pipe 5 connects the air conditioner 4 and the EFU assembly 23, and the EFU assembly 23 is connected with the air inlet 17 of the lens sealing cover 16.

[0037] The air outlet of the air conditioner 4 is provided with an activated carbon filter element for adsorbing particulate matter and controlling humidity.

[0038] As shown in Figure 7 The air outlet and the air inlet 17 of the EFU assembly 23 are fully attached and connected, the partition plate 14 divides the air inlet 17 into a double-channel air flow distribution structure, and clean air enters the inside of the lens sealing cover 16 through the gap between the partition plate 14 and the air inlet 17.

[0039] As shown in Figure 6 The mask sealing cover 11 is provided with a second maintenance door 22 on one side, the equipment shell 3 and the lens sealing cover 16 are respectively provided with a third maintenance door 26 and a first maintenance door 18, and the second maintenance door 22 and the first maintenance door 18 are both provided with an exhaust port 19 with a wind shield 20.

[0040] The air conditioner 4 outputs the pre-processed air with suitable temperature and humidity, and the air is transported to the EFU assembly 23 through the air guide main pipe 5 after the particles are adsorbed by the activated carbon filter element.

[0041] A part of the clean air enters the air guide branch pipe 13 through the groove 15 on the partition plate 14, and the air enters the mask sealing cover 11 through the air guide cover 12, and the air in the mask sealing cover 11 is circulated through the independent air duct of the mask assembly 8. Since the mask assembly 8 generates heat due to the continuous irradiation of the light source shaping assembly 7, the air in the air guide branch pipe 13 enters the mask sealing cover 11, flows along the surface of the mask glass, and can reduce the glass temperature of the mask assembly 8, control the thermal expansion and contraction of the mask assembly 8, improve the accuracy of the final exposure, and the hot air is discharged through the exhaust port 19 on the second access door 22, and enters the lens sealing cover 16 through the wind shield 20.

[0042] Another part of the clean air enters the lens sealing cover 16 through the gap of the air inlet 17 and diffuses uniformly downward to form a vertical laminar flow; the exhaust gas is discharged through the exhaust port 19 on the first access door 18, and the wind shield 20 ensures the one-way flow of the air flow and maintains the positive pressure of the micro-environment.

[0043] As shown in Figure 3 The electrostatic dust removal device includes a protective glass 24 arranged at the bottom of the projection lens 9 and an ion wind rod 25, and the ion wind rod 25 blows air towards the surface of the protective glass 24 to remove static electricity and dust, prevent ink volatiles from adhering and static electricity from adsorbing dust, and reduce the frequency of cleaning the lens.

[0044] The protective glass 24 is attached to the light emitting position of the projection lens 9, and a waterproof film is arranged on the surface of the protective glass 24 to prevent ink volatiles from adhering.

[0045] The top of the base 1 is provided with a device shell 3, the lens sealing cover 16 is arranged in the device shell 3, and a temperature and humidity sensor and a dew condensation sensor are arranged in the mask sealing cover 11, the lens sealing cover 16 and the device shell 3 to monitor the environmental parameters and trigger an alarm.

[0046] The above is only a preferred specific embodiment of the present application, but the protection scope of the present application is not limited thereto, and any skilled person in the art can make equivalent replacement or change according to the technical scheme and the inventive concept of the present application within the technical range disclosed by the present application, which should be covered in the protection scope of the present application.

Claims

1. A photovoltaic projection lithography apparatus lens micro-environment system, comprising: A base, on which a battery cell carrier and a support platform are mounted, wherein a light source shaping assembly, a mask assembly, and a projection lens are sequentially arranged on the support platform, characterized in that it further includes: A lens sealing cover is disposed on the base and covers the support platform, the light source shaping assembly, the mask assembly, and the projection lens. A sealing assembly is provided inside the lens sealing cover, which includes a mask sealing cover and an air guide pipe for independent air circulation to the mask assembly. An air purification device includes an air conditioner, a main air duct, and an EFU assembly. The main air duct connects the air conditioner and the EFU assembly, and the EFU assembly is connected to the air inlet of the lens sealing cover. An electrostatic dust removal device includes a protective glass and an ionizing air bar located at the bottom of the projection lens. The ionizing air bar blows air toward the surface of the protective glass to remove static electricity and dust.

2. A photovoltaic projection lithography apparatus lens micro-environment system according to claim 1, wherein, The sealing assembly also includes an air guide hood and a partition. The air guide hood connects the mask sealing cover and the air guide branch pipe. The partition is located inside the air inlet and has a groove on its outer wall to divert clean air to the inside of the air guide branch pipe.

3. A photovoltaic projection lithography apparatus lens micro-environment system according to claim 2, wherein, The air outlet and air inlet of the EFU component are fully fitted together, and the partition divides the air inlet into a dual-channel airflow distribution structure. Clean air enters the lens cover through the gap between the partition and the air inlet.

4. A photovoltaic projection lithography apparatus lens micro-environment system according to claim 1, wherein, The mask sealing cover is fitted over the mask assembly, and the outer walls of the mask sealing cover near the light source shaping assembly and the projection lens are respectively provided with light-transmitting openings.

5. A photovoltaic projection lithography apparatus lens micro-environment system according to claim 1, wherein, The protective glass is fitted to the light-emitting position of the projection lens, and the surface of the protective glass is provided with a waterproof film to prevent ink volatiles from adhering.

6. A photovoltaic projection lithography apparatus lens micro-environment system according to claim 1, wherein, The air conditioner's air outlet is equipped with an activated carbon filter to adsorb particulate matter and control humidity.

7. A photovoltaic projection lithography apparatus lens micro-environment system according to claim 1, wherein, The base is provided with a device housing on top, and the lens sealing cover is located inside the device housing. Temperature and humidity sensors and condensation sensors are provided inside the mask sealing cover, lens sealing cover and device housing to monitor environmental parameters and trigger alarms.

8. A photovoltaic projection lithography apparatus lens micro-environment system according to claim 7, wherein, The mask plate sealing cover is provided with a second inspection door on one side, and the equipment shell and lens sealing cover are respectively provided with a third inspection door and a first inspection door. Both the second inspection door and the first inspection door are provided with exhaust ports with wind shields.

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