Polishing device for improving precision of substrate surface of photomask

Abstract

The utility model belongs to the field of polishing devices, and particularly relates to a polishing device for improving the precision of a photomask substrate surface, which comprises a base, two symmetrically distributed screw rods are mounted on the outer side of the base through bearings, the outer side of each screw rod is connected with a threaded frame through threads, a polisher is fixedly connected between the two threaded frames, and the polisher is fixedly connected with the base through bearings. A dust suction box is fixedly mounted at the upper end of the polisher, a dust collection box is slidably connected into the dust suction box, a dismounting and mounting mechanism is arranged on the outer side of the dust collection box, and an air pump is fixedly mounted in the dust suction box. Due to the fact that the dust collection box, the dust collection cover, the nozzle pipe and the like are additionally arranged on the polisher, when a plate is polished through the polisher, air flow can be jetted to a polishing face through the air pump and the nozzle pipe, and meanwhile dust generated by polishing can be absorbed through the dust collection cover. Therefore, the problem that the polishing precision is influenced by dust can be effectively avoided.

Description

TECHNICAL FIELD

[0001] The utility model relates to polishing device technical field, concretely is a kind of polishing device of improving photomask substrate surface precision. BACKGROUND

[0002] Photomask substrate is the key material in photoetching process, for manufacturing semiconductor device, display panel and micro electro mechanical system, photomask substrate is the carrier of photomask, its surface is coated with photosensitive material, form fine pattern through exposure and development, then these patterns are transferred to silicon wafer or other substrates, the precision of photomask substrate surface is improved, the substrate surface can be polished by polishing device, but the dust is generated when polishing device in prior art is used to polish substrate, when dust polishing roller contacts with the surface of substrate, it is easy to affect polishing precision, resulting in the decrease of polishing precision. Therefore, the prior art needs to be improved. SUMMARY

[0003] The utility model discloses a kind of polishing device of improving photomask substrate surface precision, solve the problem that dust generated by polishing easily affects polishing precision.

[0004] To achieve the above object, the utility model provides the following technical scheme: a kind of polishing device of improving photomask substrate surface precision, including base, the outer side of the base is equipped with two symmetrical distribution screw rods by bearing, the outer side of each screw rod is connected with threaded frame by screw thread, two threaded frames are fixedly connected with polisher between them, the upper end of the polisher is fixedly installed with dust collection box, the inside of the dust collection box is slidably connected with dust collection box, the outer side of the dust collection box is provided with dismounting mechanism, the inside of the dust collection box is fixedly installed with air pump, the left end of the dust collection box is fixedly installed with flexible pipe, the lower end of the flexible pipe is fixedly installed with dust cover, the lower end of the dust cover is fixedly connected with sealing frame, the outer side of the polisher is fixedly connected with two symmetrical distribution fixed frame, the inside of the fixed frame is provided with spring one, the inside of the dust collection box is fixedly installed with filter material, the right end of the polisher is fixedly connected with connecting frame, the lower end of the connecting frame is fixedly connected with nozzle pipe, the upper end of the nozzle pipe is fixedly connected with connecting pipe.

[0005] Preferably, the sealing frame is in contact with the base, the upper end of the dust cover is fixedly connected with a limit ring, the limit ring is slidably connected with the spring one, and the sealing frame can seal the contact between the dust cover and the board.

[0006] Preferably, one end of the spring one is fixedly connected with the dust cover, the other end of the spring one is fixedly connected with the fixed frame, the outer side of the base is fixedly connected with a driver, the output shaft of the driver is fixedly connected with the screw rod, and the spring one can support the dust cover by elastic force.

[0007] Preferably, the inside of the dust collecting box is fixedly connected with a sealing ring, the sealing ring is in sliding connection with the dust suction box, the connecting pipe is fixedly connected with the dust suction box, and the sealing ring can seal the connection between the dust collecting box and the dust suction box.

[0008] Preferably, the dismounting mechanism comprises connecting nails, the outside of the dust collecting box is fixedly connected with two symmetrically distributed connecting nails, the outside of the connecting nail is in sliding connection with a supporting ring, the upper end of the supporting ring is fixedly connected with a sealing pipe, the outside of the connecting nail is provided with spring No. 2, the sealing pipe is in sliding connection with the input port of the air pump and the dust collecting box, the sealing pipe is in contact with the dust suction box, and the sealing pipe can seal the connection between the dust collecting box and the air pump.

[0009] Preferably, one end of the spring No. 2 is fixedly connected with the dust collecting box, the other end of the spring No. 2 is fixedly connected with the supporting ring, the supporting ring is in sliding connection with the dust collecting box, and the spring No. 2 can drive the supporting ring to automatically reset through elastic force.

[0010] Compared with the prior art, the utility model has the advantages that:

[0011] 1、The utility model discloses a dust suction box, a dust suction cover and a spray pipe are additionally arranged on the polisher, when the plate is polished through the polisher, the air flow can be sprayed on the polishing surface through the air pump and the spray pipe, and the dust generated during polishing can be sucked through the dust suction cover, thereby effectively avoiding the problem that the dust affects the polishing precision.

[0012] 2、The utility model discloses a dust collecting box, filter material and a sealing pipe are additionally arranged in the dust suction box, the dust can be collected through the dust collecting box during dust suction, after collection, the sealing pipe can be separated from the air pump, the dust collecting box is released from the limiting, thereby making the dust more convenient to clean. DRAWINGS

[0013] Figure 1 It is the three-dimensional structure of the utility model Figure 1 ;

[0014] Figure 2 It is the three-dimensional structure of the utility model Figure 2 ;

[0015] Figure 3 It is the three-dimensional enlarged view of the dust suction cover of the utility model Figure 1 ;

[0016] Figure 4 It is the three-dimensional enlarged view of the spray pipe of the utility model Figure 2 ;

[0017] Figure 5 The utility model discloses Figure 1 The dust absorption box's overhead section view enlarged diagram of

[0018] Figure 6 The utility model discloses Figure 1 A part structure enlarged view of

[0019] Figure 7 The utility model discloses Figure 5 B part structure enlarged view of

[0020] In the drawing: 1, base, 2, screw rod, 3, screw frame, 4, polisher, 5, dust absorption box, 6, dust collecting box, 7, dismounting mechanism, 8, air pump, 9, hose, 10, dust absorption cover, 11, sealing frame, 12, fixed frame, 13, spring one, 14, limit ring, 15, filter material, 16, connecting frame, 17, nozzle pipe, 18, connecting pipe, 19, driver, 20, sealing ring, 71, connecting nail, 72, support ring, 73, sealing pipe, 74, spring two. Specific embodiments

[0021] The technical scheme in the embodiments of the utility model will be apparently and completely described below with the drawings in the embodiments of the utility model, and obviously, the described embodiments are only part of the embodiments of the utility model, not all the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by the person skilled in the art without creative labor belong to the range of protection of the utility model.

[0022] Please refer to Figure 1 、 Figure 2 、 Figure 3 、 Figure 4 、 Figure 5 、 Figure 6 A kind of polishing device for improving photomask substrate surface precision, including base 1, two symmetrical distribution screw rods 2 are installed on the outer side of base 1 by bearing, the outer side of each screw rod 2 is connected by screw thread with screw frame 3, polishing machine 4 is fixedly connected between the two screw frames 3, dust absorption box 5 is fixedly installed on the upper end of polishing machine 4, dust collecting box 6 is slidably connected in dust absorption box 5, dismounting mechanism 7 is arranged on the outer side of dust collecting box 6, air pump 8 is fixedly installed in dust absorption box 5, hose 9 is fixedly installed on the left end of dust absorption box 5, dust absorption cover 10 is fixedly installed on the lower end of hose 9, dust absorption cover 10 is fixedly connected with sealing frame 11 on the lower end, two symmetrical distribution fixed frames 12 are fixedly connected on the outer side of polishing machine 4, spring one 13 is arranged in fixed frame 12, filter material 15 is fixedly installed in dust collecting box 6, connecting frame 16 is fixedly connected on the right end of polishing machine 4, nozzle pipe 17 is fixedly connected on the lower end of connecting frame 16, connecting pipe 18 is fixedly connected on the upper end of nozzle pipe 17.

[0023] Please refer to Figure 1 , Figure 2 , Figure 3 , Figure 4 , Figure 5 , Figure 6 , the sealing frame 11 is in contact with the base 1, the upper end of the dust cover 10 is fixedly connected with a limiting ring 14, the limiting ring 14 is slidably connected with the spring one 13, the sealing frame 11 can seal the contact of the dust cover 10 and the plate, one end of the spring one 13 is fixedly connected with the dust cover 10, the other end of the spring one 13 is fixedly connected with the fixed frame 12, the outer side of the base 1 is fixedly connected with a driver 19, the output shaft of the driver 19 is fixedly connected with the screw rod 2, the spring one 13 can support the dust cover 10 through the elastic force, the inside of the dust collecting box 6 is fixedly connected with a sealing ring 20, the sealing ring 20 is slidably connected with the dust collecting box 5, the connecting pipe 18 is fixedly connected with the dust collecting box 5, and the sealing ring 20 can seal the connecting position of the dust collecting box 6 and the dust collecting box 5.

[0024] Please refer to Figure 1 , Figure 5 , Figure 7 , the dismounting mechanism 7 comprises connecting nails 71, the outer side of the dust collecting box 6 is fixedly connected with two symmetrically distributed connecting nails 71, the outer side of the connecting nail 71 is slidably connected with a supporting ring 72, the upper end of the supporting ring 72 is fixedly connected with a sealing pipe 73, the outer side of the connecting nail 71 is provided with a spring two 74, the sealing pipe 73 is slidably connected with the dust collecting box 6 and the input port of the air pump 8, the sealing pipe 73 is in contact with the dust collecting box 5, the sealing pipe 73 can seal the connecting position of the dust collecting box 6 and the air pump 8, one end of the spring two 74 is fixedly connected with the dust collecting box 6, the other end of the spring two 74 is fixedly connected with the supporting ring 72, the supporting ring 72 is slidably connected with the dust collecting box 6, and the spring two 74 can drive the supporting ring 72 to automatically reset through the elastic force.

[0025] The specific implementation process of the utility model is as follows: in use, the plate is placed above the base 1, then the polisher 4 is started, and the driver 19 is started at the same time, the driver 19 drives the screw rod 2 to rotate, the screw rod 2 can drive the polisher 4 to move through the threaded cooperation between the screw rod 2 and the threaded frame 3 in the process of rotating, the polisher 4 can polish the plate through the polishing roller in the process of moving, the air pump 8 is started at the same time, the air pump 8 blows out gas, the gas is sprayed on the polishing surface through the connecting pipe 18 and the nozzle pipe 17, the air pump 8 generates suction force in the process of working, the suction force acts on the upper side of the base 1 through the dust cover 10, and the dust generated in polishing can be absorbed, so that the problem that the polishing precision is affected by the dust can be avoided.

[0026] When the dust inside the dust collecting box 6 needs to be cleaned, the supporting ring 72 is pushed to move the sealing pipe 73 and compress the spring 74, and when the sealing pipe 73 is separated from the air pump 8, the dust collecting box 6 is released from the limiting, and then the dust collecting box 6 can be taken out from the inside of the dust collecting box 5.

[0027] Although the embodiments of the present application have been shown and described, it is to be understood that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the present application, and the scope of the present application is defined by the appended claims and their equivalents.

Claims

1. A polishing device for improving the flatness of a photomask substrate, comprising a base (1), characterized in that: The outer side of the base (1) is provided with two symmetrically distributed screw rods (2) through bearing mounting, the outer side of each screw rod (2) is provided with a threaded frame (3) through threaded connection, the two threaded frames (3) are fixedly connected together and are provided with a polisher (4), the upper end of the polisher (4) is fixedly installed with a dust suction box (5), the inside of the dust suction box (5) is slidably connected with a dust collecting box (6), the outer side of the dust collecting box (6) is provided with a dismounting mechanism (7), the inside of the dust suction box (5) is fixedly installed with an air pump (8), the left end of the dust suction box (5) is fixedly installed with a hose (9), the lower end of the hose (9) is fixedly installed with a dust suction cover (10), the lower end of the dust suction cover (10) is fixedly connected with a sealing frame (11), the outer side of the polisher (4) is fixedly connected with two symmetrically distributed fixing frames (12), the inside of the fixing frame (12) is provided with a spring (13), the inside of the dust collecting box (6) is fixedly installed with a filter material (15), the right end of the polisher (4) is fixedly connected with a connecting frame (16), the lower end of the connecting frame (16) is fixedly connected with a nozzle pipe (17), the upper end of the nozzle pipe (17) is fixedly connected with a connecting pipe (18).

2. The polishing device for improving the accuracy of the surface of a photomask substrate according to claim 1, wherein: The sealing frame (11) is in contact with the base (1), the upper end of the dust suction cover (10) is fixedly connected with a limiting ring (14), and the limiting ring (14) is slidably connected with the spring (13).

3. The polishing device for improving the accuracy of the surface of a photomask substrate according to claim 1, wherein: One end of the spring (13) is fixedly connected with the dust suction cover (10), and the other end of the spring (13) is fixedly connected with the fixing frame (12), and the outer side of the base (1) is fixedly connected with a driver (19), and the output shaft of the driver (19) is fixedly connected with the screw rod (2).

4. The polishing device for improving the accuracy of the surface of a photomask substrate according to claim 1, wherein: The inside of the dust collecting box (6) is fixedly connected with a sealing ring (20), the sealing ring (20) is slidably connected with the dust suction box (5), and the connecting pipe (18) is fixedly connected with the dust suction box (5).

5. The polishing device for improving the accuracy of the surface of a photomask substrate according to claim 1, wherein: The dismounting mechanism (7) comprises a connecting nail (71), the outer side of the dust collecting box (6) is fixedly connected with two symmetrically distributed connecting nails (71), the outer side of the connecting nail (71) is slidably connected with a supporting ring (72), the upper end of the supporting ring (72) is fixedly connected with a sealing pipe (73), the outer side of the connecting nail (71) is provided with a spring (74), the sealing pipe (73) is slidably connected with the dust collecting box (6) and the input port of the air pump (8), and the sealing pipe (73) is in contact with the dust suction box (5).

6. The polishing device for improving the accuracy of the surface of a photomask substrate according to claim 5, wherein: One end of the spring (74) is fixedly connected with the dust collecting box (6), and the other end of the spring (74) is fixedly connected with the supporting ring (72), and the supporting ring (72) is slidably connected with the dust collecting box (6).

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