Nano-coating equipment with ion source arranged in middle

Abstract

The nanometer coating equipment with the ion source arranged in the middle comprises a vacuum working furnace, an ion source loading plate is arranged on the side face of a furnace body of the vacuum working furnace, a plurality of ion source supply modules are arranged on the ion source loading plate, and each ion source supply module comprises a filament ion source and an anode corresponding part which are correspondingly arranged. The filament ion source and the anode corresponding part are correspondingly provided with plate surface openings, and the diameter of the plate surface opening correspondingly arranged on the anode corresponding part is 1.3-1.8 times of the diameter of the plate surface opening correspondingly arranged on the filament ion source.

Description

Technical Field

[0001] This utility model relates to surface coating preparation technology and its equipment, specifically, a nano-coating device with an ion source in the center. Background Technology

[0002] In current nano-coating preparation equipment, the ion source is generally placed at the top as the negative electrode, and the corresponding anode is set at the bottom of the equipment. During operation, the space between the upper and lower parts forms an ion beam to bombard the workpiece. However, the current ion source setting method cannot effectively process the side edges when the coating requirements on the workpiece side are high.

[0003] Therefore, it is necessary to provide a nano-coating device with an ion source in the center to solve the above problems. Utility Model Content

[0004] The purpose of this invention is to provide a nano-coating device with an ion source in the center.

[0005] A nano-coating device with a centrally located ion source includes a vacuum furnace. An ion source loading plate is provided on the side of the furnace body. Several ion source supply modules are provided on the ion source loading plate. Each ion source supply module includes a corresponding filament ion source and an anode corresponding part. Both the filament ion source and the anode corresponding part are provided with corresponding plate openings. The diameter of the plate opening corresponding to the anode corresponding part is 1.3-1.8 times the diameter of the plate opening corresponding to the filament ion source.

[0006] Furthermore, the number of ion source supply modules is at least two, and the distance between the two ion source supply modules is not less than 500mm.

[0007] Furthermore, the spacing between the plate openings corresponding to the anode and the plate openings corresponding to the filament ion source is 200-300mm.

[0008] Furthermore, the vacuum furnace is an octagonal or hexagonal furnace.

[0009] Furthermore, the number of ion source loading plates is several.

[0010] Furthermore, the number of ion source loading plates is one-third or one-quarter of the number of the inner side of the vacuum furnace.

[0011] Furthermore, the filament ion source is a single tungsten filament ion source.

[0012] Compared with the prior art, this utility model sets the ion source in the form of a side panel, which can form an ion source setting structure with the center of the vacuum furnace as the reference and the ion source side setting is set. Corresponding to the workpiece, the required ion source can be quickly adjusted, effectively ensuring the coating preparation effect on the side of the workpiece, and can adapt to the surface coating preparation of various workpieces. Attached Figure Description

[0013] Figure 1 This is a schematic diagram of the structure of this utility model.

[0014] Figure 2 This is a schematic diagram of the ion source loading plate.

[0015] Figure 3 This is a schematic diagram of the structure of a filament ion source. Detailed Implementation

[0016] Example:

[0017] Reference Figure 1-3 This embodiment demonstrates a nano-coating device with a centrally located ion source, including a vacuum furnace 100. An ion source loading plate 1 is provided on the side of the furnace body of the vacuum furnace 100. A plurality of ion source supply modules 2 are provided on the ion source loading plate 1. Each ion source supply module 2 includes a correspondingly arranged filament ion source 21 and an anode corresponding part 22. Both the filament ion source 21 and the anode corresponding part 22 are provided with corresponding plate openings. The diameter of the plate opening corresponding to the anode corresponding part 22 is 1.3-1.8 times the diameter of the plate opening corresponding to the filament ion source 21.

[0018] The number of ion source supply modules 2 is at least two, and the distance between the two ion source supply modules 2 is not less than 500mm.

[0019] The spacing between the plate openings corresponding to the anode part 22 and the plate openings corresponding to the filament ion source 21 is 200-300mm.

[0020] The vacuum furnace 100 is an octagonal or hexagonal furnace.

[0021] The number of ion source loading plates 1 is several.

[0022] The number of ion source loading plates 1 is one-third or one-quarter of the number of the inner surfaces of the vacuum furnace 100.

[0023] The filament ion source 21 is a single tungsten filament ion source.

[0024] Compared with the prior art, this utility model sets the ion source in the form of a side panel, which can form an ion source setting structure with the center of the vacuum furnace as the reference and the ion source side setting is set. Corresponding to the workpiece, the required ion source can be quickly adjusted, effectively ensuring the coating preparation effect on the side of the workpiece, and can adapt to the surface coating preparation of various workpieces.

[0025] The above descriptions are merely some embodiments of this utility model. For those skilled in the art, various modifications and improvements can be made without departing from the inventive concept of this utility model, and all such modifications and improvements fall within the protection scope of this utility model.

Claims

1. A nano-coating device with an ion source in place, characterized in that: The system includes a vacuum furnace. An ion source loading plate is installed on the side of the furnace body. Several ion source supply modules are installed on the ion source loading plate. Each ion source supply module includes a corresponding filament ion source and an anode corresponding part. Both the filament ion source and the anode corresponding part are provided with corresponding plate openings. The diameter of the plate opening corresponding to the anode corresponding part is 1.3-1.8 times the diameter of the plate opening corresponding to the filament ion source.

2. The nano-coating device with an ion source in place according to claim 1, characterized in that: The number of ion source supply modules shall be at least two, and the distance between the two ion source supply modules shall not be less than 500mm.

3. The nano-coating device with an ion source in place according to claim 2, characterized in that: The spacing between the plate openings corresponding to the anode and the plate openings corresponding to the filament ion source is 200-300mm.

4. A nano-coating device with an ion source in place according to any one of claims 1-3, characterized in that: The vacuum furnace is either octagonal or hexagonal.

5. The nano-coating device with an ion source in place according to claim 4, characterized in that: The number of ion source loading plates is several.

6. The nano-coating device with an ion source in place according to claim 5, characterized in that: The number of ion source loading plates is one-third or one-quarter of the number of the inner side of the vacuum furnace.

7. The nano-coating device with an ion source in place according to claim 6, characterized in that: The filament ion source is a single tungsten filament ion source.

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