Gas flow equalizing device for MPCVD equipment

Abstract

The utility model discloses a gas flow equalizing device for MPCVD (Micro Pressure Chemical Vapor Deposition) equipment, which relates to the technical field of MPCVD equipment and comprises a gas injection barrel and a gas inlet assembly, a flow guide assembly is installed at the lower end of the gas injection barrel, an adjusting assembly is installed in the gas injection barrel, and the flow guide assembly is connected with the adjusting assembly; the air inlet assembly comprises an air inlet box, baffle plates and a connecting ring, an air inlet is formed in the upper end of the air injection barrel, the connecting ring is fixed in the air inlet, the air inlet box is fixed at the upper end of the connecting ring, the connecting ring is communicated with an inner cavity of the air inlet box, the baffle plates which are uniformly distributed are fixed in the air inlet box, and the baffle plates are communicated with the inner cavity of the air inlet box. The flow velocity of the gas can be effectively stabilized by arranging the gas inlet assembly, the flow guide assembly comprises the flow guide barrel and the gas guide pipe, the flow velocity of the gas can be stabilized, meanwhile, the uniformity of the gas can be improved, and the gas flow can be adjusted according to adjustment requirements.

Description

Technical Field

[0001] This utility model relates to the field of MPCVD equipment technology, specifically to a gas flow equalization device for MPCVD equipment. Background Technology

[0002] MPCVD (Microwave Plasma Chemical Vapor Deposition) is a technology widely used in semiconductor manufacturing and thin film deposition. In MPCVD equipment, uniform gas distribution is one of the key factors ensuring the quality and performance of the deposited thin film. However, traditional gas distribution devices have the following problems:

[0003] 1. Uneven gas distribution: Due to differences in gas flow paths, the gas concentration in local areas may be too high or too low, which can affect the uniformity and density of the film.

[0004] 2. Unstable airflow velocity: Traditional devices have difficulty effectively controlling airflow velocity, which easily generates turbulence and further exacerbates the unevenness of gas distribution. To address this, we propose a gas flow equalization device for MPCVD equipment. Utility Model Content

[0005] The technical problem to be solved by this utility model is to overcome the existing defects and provide a gas flow equalization device for MPCVD equipment, which can stabilize the gas flow rate, improve the gas uniformity, and adjust the airflow size according to adjustment needs, thus effectively solving the problems in the background art.

[0006] To achieve the above objectives, this utility model provides the following technical solution: a gas flow equalization device for MPCVD equipment, comprising a gas injection tank and a gas inlet assembly;

[0007] Air injection tank: A flow guiding component is installed at the lower end, and an adjustment component is installed inside the air injection tank. The flow guiding component is connected to the adjustment component.

[0008] Air intake assembly: includes an air intake box, baffles and connecting rings. The upper end of the air injection tank has an air inlet. A connecting ring is fixed inside the air inlet. The upper end of the connecting ring is fixed with the air intake box. The connecting ring communicates with the inner cavity of the air intake box. The air intake box has uniformly distributed baffles fixed inside. By setting the air intake assembly, the flow rate of the gas can be effectively stabilized.

[0009] Furthermore, the flow guiding assembly includes a flow guiding barrel and a gas guiding pipe. The lower end of the gas injection barrel is fixed with the flow guiding barrel, and the lower edge of the flow guiding barrel has evenly distributed openings. The gas guiding pipe is fixed inside the openings. The lower end of the gas injection barrel has evenly distributed flow guiding holes, and the upper end of the gas guiding pipe is fixed inside the flow guiding holes. By setting the flow guiding assembly, the gas is evenly injected into the interior of the MPCVD equipment.

[0010] Furthermore, the flow guiding assembly also includes a sealing disc, connecting strips, connecting rods, and springs. An opening is formed on the circumferential surface of the air guiding pipe, and a sealing disc is disposed inside the opening. A connecting rod is fixed to the surface of the sealing disc. A uniformly distributed connecting strip is fixed to the lower end of the air injection tank. A connecting hole is formed on the side of the connecting strip. The connecting rod is slidably connected to the interior of the corresponding connecting hole. A spring is sleeved on the circumferential surface of the connecting rod. One end of the spring is fixed to the side of the connecting strip, and the other end of the spring is fixed to the surface of the corresponding sealing disc.

[0011] Furthermore, the adjustment assembly includes a motor, a turntable, metal wires, and a conical guide shroud. The conical guide shroud is fixed in the middle of the lower end of the gas injection tank. The motor is installed at the lower end of the gas injection tank and is located inside the conical guide shroud. A turntable is fixed on the output shaft of the motor. Metal wires are evenly distributed on the circumference of the turntable. The end of the metal wire away from the turntable is fixed to the end face of the corresponding connecting rod. The input end of the motor is electrically connected to the output end of an external PLC controller. By setting the adjustment assembly, all the sealing discs are moved, thereby adjusting the gas flow rate of the gas guide pipe.

[0012] Furthermore, an air inlet pipe is fixed inside the air injection hole on the upper side of the air inlet box, and a connecting flange is fixed at the upper end of the circumferential surface of the air inlet pipe. The air inlet box is connected to an external air injection device by setting the air inlet pipe and the connecting flange.

[0013] Compared with the prior art, the beneficial effects of this utility model are as follows: This gas flow equalization device for MPCVD equipment has the following advantages:

[0014] 1. By setting the adjustment component, the external PLC controller can automatically control the motor to work based on the pressure data measured by the internal pressure sensor of the MPCVD equipment during use. The motor drives the turntable to rotate, the turntable to rotate, all the metal wires to move, and all the metal wires to move, which in turn drives all the connecting rods to move and pull all the sealing discs to move. In this way, the air flow rate discharged from the gas duct can be adjusted, and the quality and performance of the deposited film can be ensured after adjustment.

[0015] 2. By setting up an air intake assembly, the gas entering the air intake box during the gas injection process will be deflected by evenly distributed baffles. After deflection, the gas flow rate can be stabilized. The gas with a stable flow rate is guided downward by a conical guide hood. After being guided, all the gas will be evenly injected into the interior of the MPCVD equipment through evenly distributed gas guide pipes. In this way, the quality and performance of the deposited film can be further ensured. Attached Figure Description

[0016] Figure 1 This is a schematic diagram of the front structure of this utility model;

[0017] Figure 2 This is a schematic diagram of the flow guiding component structure of this utility model;

[0018] Figure 3 This is a front sectional view of the present invention;

[0019] Figure 4 This is a lower sectional view of the present invention.

[0020] In the diagram: 1. Air injection tank, 2. Flow guide assembly, 21. Flow guide tank, 22. Air guide pipe, 23. Sealing plate, 24. Connecting strip, 25. Connecting rod, 26. Spring, 3. Adjustment assembly, 31. Motor, 32. Turntable, 33. Metal wire, 34. Conical flow guide, 4. Air intake assembly, 41. Air intake box, 42. Baffle plate, 43. Connecting ring, 5. Air intake pipe, 6. Connecting flange. Detailed Implementation

[0021] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0022] Please see Figure 1-4 This embodiment provides a technical solution: a gas equalization device for MPCVD equipment, including a gas injection tank 1 and a gas inlet assembly 4;

[0023] Air injection tank 1: A flow guide component 2 is installed at the lower end. An adjustment component 3 is installed inside the air injection tank 1. The flow guide component 2 is connected to the adjustment component 3. The flow guide component 2 includes a flow guide tank 21 and an air guide pipe 22. The flow guide tank 21 is fixed at the lower end of the air injection tank 1. The lower edge of the flow guide tank 21 has evenly distributed openings. The air guide pipe 22 is fixed inside the openings. The lower end of the air injection tank 1 has evenly distributed flow guide holes. The upper end of the air guide pipe 22 is fixed inside the flow guide holes. The flow guide component 2 also includes a sealing plate 23, a connecting strip 24, a connecting rod 25, and a spring 26. The circumferential surface of the air guide pipe 22 has an opening. The sealing plate 23 is installed inside the opening. The surface of the sealing plate 23 is fixed with a connecting rod 25. The lower end of the air injection tank 1 has evenly distributed connecting strips 24. The side of the connecting strips 24 has a connecting hole. The connecting rod 25 is slidably connected inside the corresponding connecting hole. A spring is sleeved on the circumferential surface of the connecting rod 25. 26. One end of spring 26 is fixed to the side of connecting bar 24, and the other end of spring 26 is fixed to the surface of the corresponding sealing disc 23. Adjustment component 3 includes motor 31, turntable 32, metal wire 33 and conical guide shroud 34. Conical guide shroud 34 is fixed in the middle of the lower end of the gas injection tank 1. Motor 31 is installed in the lower end of the gas injection tank 1. Motor 31 is located inside conical guide shroud 34. Turntable 32 is fixed on the output shaft of motor 31. Metal wire 33 is evenly distributed on the circumference of turntable 32. The end of metal wire 33 away from turntable 32 is fixed to the end face of the corresponding connecting rod 25. The input end of motor 31 is electrically connected to the output end of external PLC controller. By setting adjustment component 3, all sealing discs 23 are moved, thereby adjusting the gas flow rate of gas guide pipe 22. By setting guide component 2, gas is evenly injected into the interior of MPCVD equipment.

[0024] The air intake assembly 4 includes an air intake box 41, a baffle plate 42, and a connecting ring 43. An air inlet is provided at the upper end of the air injection tank 1. A connecting ring 43 is fixed inside the air inlet. An air intake box 41 is fixed at the upper end of the connecting ring 43. The connecting ring 43 communicates with the inner cavity of the air intake box 41. A baffle plate 42 is evenly distributed inside the air intake box 41. By setting the air intake assembly 4, the flow rate of the gas can be effectively stabilized.

[0025] The air inlet box 41 has an air inlet pipe 5 fixed inside the air injection hole on the upper side. The upper end of the circumferential surface of the air inlet pipe 5 is fixed with a connecting flange 6. The air inlet box 41 is connected to the external air injection equipment by setting the air inlet pipe 5 and the connecting flange 6.

[0026] The working principle of the gas flow equalization device for MPCVD equipment provided by this utility model is as follows: During use, the external PLC controller can automatically control the motor 31 to work based on the pressure data measured by the internal pressure sensor of the MPCVD equipment. The motor 31 drives the turntable 32 to rotate, and the rotation of the turntable 32 drives all the metal wires 33 to move. The movement of all the metal wires 33 drives all the connecting rods 25 to move, pulling all the sealing discs 23 to move. In this way, the gas flow rate discharged from the gas guide pipe 22 can be adjusted. After adjustment, the gas is injected into the interior of the gas inlet pipe 5. The gas entering the gas inlet pipe 5 will enter the interior of the gas inlet box 41 downward. The gas entering the gas inlet box 41 will be deflected by the evenly distributed baffles 42. After deflection, the gas flow rate can be stabilized. The gas with a stable flow rate is guided downward by the conical guide shroud 34. After being guided, all the gas will be evenly injected into the interior of the MPCVD equipment through the evenly distributed gas guide pipe 22. In this way, the quality and performance of the deposited film can be further ensured.

[0027] The above description is merely an embodiment of this utility model and does not limit the patent scope of this utility model. Any equivalent structural or procedural transformations made based on the content of this utility model specification and drawings, or direct or indirect applications in other related technical fields, are similarly included within the patent protection scope of this utility model.

Claims

1. A gas flow equalization device for MPCVD equipment, characterized in that: Includes an air injection tank (1) and an air intake assembly (4); Gas injection tank (1): A flow guide component (2) is installed at the lower end. An adjustment component (3) is installed inside the gas injection tank (1). The flow guide component (2) is connected to the adjustment component (3). Air intake assembly (4): includes air intake box (41), baffle (42) and connecting ring (43). The upper end of the air injection tank (1) is provided with an air inlet. The inside of the air inlet is fixed with a connecting ring (43). The upper end of the connecting ring (43) is fixed with an air intake box (41). The connecting ring (43) communicates with the inner cavity of the air intake box (41). The inside of the air intake box (41) is fixed with evenly distributed baffles (42).

2. The gas flow equalization device for MPCVD equipment according to claim 1, characterized in that: The flow guiding component (2) includes a flow guiding barrel (21) and an air guiding pipe (22). The lower end of the air injection barrel (1) is fixed with the flow guiding barrel (21). The lower edge of the flow guiding barrel (21) has evenly distributed openings. The air guiding pipe (22) is fixed inside the openings. The lower end of the air injection barrel (1) has evenly distributed flow guiding holes. The upper end of the air guiding pipe (22) is fixed inside the flow guiding holes.

3. A gas flow equalization device for MPCVD equipment according to claim 2, characterized in that: The flow guiding assembly (2) also includes a sealing disc (23), a connecting strip (24), a connecting rod (25), and a spring (26). An opening is provided on the circumferential surface of the air guiding pipe (22), and a sealing disc (23) is provided inside the opening. A connecting rod (25) is fixed on the surface of the sealing disc (23). A uniformly distributed connecting strip (24) is fixed at the lower end of the air injection tank (1). A connecting hole is provided on the side of the connecting strip (24). The connecting rod (25) is slidably connected to the inside of the corresponding connecting hole. A spring (26) is sleeved on the circumferential surface of the connecting rod (25). One end of the spring (26) is fixed on the side of the connecting strip (24), and the other end of the spring (26) is fixed on the surface of the corresponding sealing disc (23).

4. A gas flow equalization device for MPCVD equipment according to claim 3, characterized in that: The adjustment assembly (3) includes a motor (31), a turntable (32), a metal wire (33), and a conical guide shroud (34). The conical guide shroud (34) is fixed in the middle of the lower end of the air injection tank (1). The motor (31) is installed in the lower end of the air injection tank (1). The motor (31) is located inside the conical guide shroud (34). The turntable (32) is fixed on the output shaft of the motor (31). The metal wire (33) is evenly distributed on the circumferential surface of the turntable (32). The end of the metal wire (33) away from the turntable (32) is fixed on the end face of the corresponding connecting rod (25). The input end of the motor (31) is electrically connected to the output end of an external PLC controller.

5. A gas flow equalization device for MPCVD equipment according to claim 1, characterized in that: An air inlet pipe (5) is fixed inside the air injection hole on the upper side of the air inlet box (41), and a connecting flange (6) is fixed at the upper end of the circumferential surface of the air inlet pipe (5).

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