Back dirt prevention workbench for perovskite coating

Abstract

The utility model discloses a back dirt prevention workbench for perovskite coating. The back dirt prevention workbench comprises a platform main body, a coating groove, a silicon wafer vacuum adsorption platform, a jacking piece and a vacuum pipeline, the coating groove is positioned on the platform main body, is of an inverted trapezoidal structure, has a large chamfer, can be matched with photovoltaic silicon wafers of different sizes, and is provided with scales on four sides to ensure that the silicon wafers are horizontally placed; the silicon wafer vacuum adsorption platform is located at the bottom of the coating groove, the surface of the silicon wafer vacuum adsorption platform is provided with uniformly-distributed vacuum exhaust hole channels, and in addition, vacuum adsorption platforms of different sizes can be replaced; the jacking piece is fixed below the silicon wafer vacuum adsorption platform and is used for driving the vacuum adsorption base station to move up and down; and the vacuum pipeline is connected with the silicon wafer vacuum adsorption platform and has a function of vacuumizing and adsorbing the silicon wafer.

Description

TECHNICAL FIELD

[0001] The utility model belongs to coating platform, especially relate to a perovskite coating work platform of preventing back pollution. BACKGROUND

[0002] Perovskite-crystalline silicon laminated solar cell needs to deposit perovskite layer on crystalline silicon cell piece base, inevitably needs to use slot coating technology. Wet coating is needed on commercial size crystalline silicon cell piece to coat full area, cannot have area waste, but because silicon wafer cell piece is very thin, if full area is coated with solution, it is easy to flow to the back of cell piece and cause back pollution, so the technical difficulty is high. At present, the technology of slot coating on crystalline silicon base is not mature, and some solutions are to tightly clamp the four edges of crystalline silicon cell piece with a clamp, but there will always be a gap in actual operation, and the back pollution prevention effect is poor. SUMMARY

[0003] The utility model discloses to aim at the deficiency of prior art, provide a perovskite coating work platform of preventing back pollution.

[0004] A perovskite coating back pollution prevention work platform, the device includes platform overall structure and vacuum adsorption platform matching;

[0005] The platform overall structure includes the base that is provided with the coating groove, the coating groove is arranged on the base, and the coating groove is a inverted trapezoidal groove in cross section;

[0006] The vacuum adsorption platform matching includes a base, a jacking piece and a vacuum air duct, the base is installed in the bottom of the coating groove, and the surface has uniformly distributed vacuum air holes, the vacuum air holes are connected with the vacuum duct, the jacking piece is fixedly installed in the inside of the platform overall structure below the base, and has the function of lifting.

[0007] Further, the angle chamfer in the coating groove is less than 60 DEG.

[0008] Further, the base is a inverted quadrangular prism structure, and the small-area bottom surface is in contact with the bottom of the coating groove.

[0009] Further, the vacuum air holes are gathered in the base, and are gathered into a total hole in the center of the base bottom.

[0010] Further, the vacuum air duct is a hose, is connected to the total hole in the base bottom, and is lifted along with the height change of the base.

[0011] The back pollution prevention perovskite coating platform provided by the utility model can ensure that the silicon wafer is not warped and the edge is not liquid leakage through the downward vacuum adsorption force and the upward base support force, can be compatible with multiple types and multiple sizes of samples, avoids back pollution in the perovskite material coating process, ensures the solution coating effect on the silicon wafer, and improves the application range of the workbench.

[0012] The utility model discloses the beneficial effect has: the coating platform of inverted trapezoidal structure can be matched with silicon wafer of different size, and the big chamfer is reserved, and the coating cutter head layout is facilitated. BRIEF DESCRIPTION OF DRAWINGS

[0013] Figure 1 It is the side view schematic diagram of the back pollution prevention perovskite coating platform of the utility model,

[0014] Figure 2 It is the partial enlarged view schematic diagram of the silicon wafer placement part of the coating platform side view,

[0015] Figure 3 It is the top view schematic diagram of the back pollution prevention perovskite coating platform of the utility model,

[0016] The platform overall structure 1, base 11, coating groove 12, vacuum adsorption platform matching 2, base 21, jacking piece 22, vacuum air extraction pipeline 23, the silicon wafer to be coated 3, the silicon wafer of size 156mm × 156mm 31, the silicon wafer of size 182mm × 182mm 32, the silicon wafer of size 210mm × 210mm 33. DETAILED DESCRIPTION

[0017] In order to make the purpose, technical scheme and advantage of the utility model embodiment more clear, the technical scheme in the utility model embodiment will be described clearly and completely in conjunction with the drawings in the utility model example, obviously, the described embodiment is only a part of the utility model, but not all the embodiments. Based on the embodiment in the utility model, all other embodiments obtained by the person skilled in the art without creative labor belong to the protection scope of the utility model.

[0018] As Figure 1 , Figure 2 and Figure 3As shown. The embodiment provides a back-dirt-proof perovskite coating workbench, which comprises a platform integral structure 1 and a vacuum adsorption platform matching part 2;

[0019] The platform integral structure 1 comprises a base 11 provided with a coating groove 12, and the vacuum adsorption platform matching part 2 comprises a base 21, a jacking part 22 and a vacuum air exhaust pipeline 23,

[0020] The coating groove 1 is a groove with an inverted trapezoidal cross section, and the angle chamfer is less than 60°; the base 21 is an inverted quadrangular prism structure, and the small-area bottom surface is in contact with the bottom of the coating groove, and the surface is provided with uniformly distributed vacuum air exhaust channels that are gathered to the center of the bottom inside the platform; the base 21 is provided with a heating wire; the jacking part 22 is fixed below the silicon wafer vacuum adsorption platform and has a lifting function; and the vacuum air exhaust pipeline 23 is connected with the vacuum air exhaust channels gathered to the center of the bottom of the silicon wafer vacuum adsorption platform.

[0021] In the actual use process of the utility model, first, the silicon wafer 3 to be coated is placed on the base 21, the silicon wafer 3 to be coated is adjusted to the center position, and the vacuum adsorption is started through the vacuum air exhaust pipeline 23; then the base 21 is slowly lowered, and the base height is slightly adjusted, so that the silicon wafer is just clamped in the clamp without gap, as shown in Figure 2 As shown, the silicon wafer 31 with a size of 156mm*156mm, the silicon wafer 32 with a size of 182mm*182mm and the silicon wafer 33 with a size of 210mm*210mm have different positions in the coating groove 12; then the base heating function is started through the heating wire in the base 21, the solution is coated by a slit coating method after preheating for a period of time; the coating tool bit is located above the platform integral structure 1 during use; after coating, the base 21 is lifted, the vacuum adsorption is released, the silicon wafer is taken away, and thus the full-area coating is completed.

[0022] The above embodiment is used to explain and illustrate the utility model, rather than limit the utility model, and any modification and change made to the utility model within the spirit and protection scope of the claims falls into the protection scope of the utility model.

Claims

1. A perovskite-coated anti-fouling workbench, characterized in that, The platform structure comprises a base provided with a coating groove, and a vacuum adsorption platform set; The platform structure comprises a base provided with a coating groove, and a vacuum adsorption platform set; The vacuum adsorption platform set comprises a base, a lifting element and a vacuum pipeline, the base is installed at the bottom of the coating groove and has uniformly distributed vacuum holes, the vacuum holes are connected with the vacuum pipeline, and the lifting element is fixedly installed inside the platform structure below the base and has a lifting function.

2. The perovskite-coated anti-fouling workbench according to claim 1, characterized in that, The angle of the coating groove is less than 60°.

3. The perovskite-coated anti-fouling workbench of claim 1, wherein, The base is a reverse quadrangular prism structure, and the small bottom surface is in contact with the bottom of the coating groove.

4. The perovskite-coated anti-fouling workbench of claim 1, wherein, The vacuum holes are gathered inside the base and gathered into a total hole at the center of the bottom of the base.

5. The perovskite-coated anti-fouling workbench according to claim 4, characterized in that, The vacuum pipeline is a hose connected to the total hole at the bottom of the base and follows the height change of the base to lift.

6. The perovskite-coated anti-fouling workbench of claim 1, wherein, The base contains a heating wire.

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