Cavity of co-evaporation coating equipment

Abstract

The utility model provides a cavity of co-evaporation coating equipment, and relates to the related field of evaporation coating. Comprising a film coating bin and a glass placing plate used for placing materials, the glass placing plate is located above the film coating bin, a processing component is arranged above the glass placing plate, the processing component comprises a reaction cylinder, two conveying assemblies and two pressurizing assemblies, and the two conveying assemblies and the two pressurizing assemblies are arranged in the reaction cylinder. The two conveying assemblies and the pressurizing assembly are fixedly connected to the two ends of the reaction cylinder, through holes are formed in the surface of the reaction cylinder, and an electric heater for achieving a heating effect is arranged above the reaction cylinder. According to the cavity of the co-evaporation coating equipment, after raw materials are put into the reaction cylinder, the temperature of the periphery of the reaction cylinder is increased through the electric heater, so that the materials in the reaction cylinder are subjected to rapid evaporation treatment, the deposition speed is increased, and it is guaranteed that the materials are put into follow-up use after being rapidly in a steam state.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of evaporation coating, in particular to a cavity of a co-evaporation coating device. BACKGROUND

[0002] Evaporation coating is a physical vapor deposition technology. By heating solid materials, they are sublimated or evaporated into vapor, and then condensed on the surface of the substrate to form a thin film. The process is carried out in a high vacuum environment to reduce the interference of gas molecules and ensure that the vapor can be transmitted straight to the substrate. With the increasing demand for coating of optical components, more and more multi-source evaporation or instantaneous evaporation methods are used in the market to form a film layer containing multiple alloy components.

[0003] However, most of the evaporation coating devices on the market are slow heating mode. During the heating process, it is difficult to ensure that the solid materials are evenly heated, which leads to a significant increase in the time required for material processing. Therefore, we propose a cavity of a co-evaporation coating device. CONTENT OF THE INVENTION

[0004] (I) Technical problems solved

[0005] In view of the deficiencies of the prior art, the present application provides a cavity of a co-evaporation coating device, which solves the problems mentioned in the background technology.

[0006] (II) Technical solutions

[0007] To achieve the above purpose, the present application is implemented by the following technical solutions: a cavity of a co-evaporation coating device, comprising a coating chamber and a glass placement plate for placing materials, the glass placement plate is located above the coating chamber, a treatment component is provided above the glass placement plate, the treatment component comprises a reaction cylinder, a conveying assembly and a pressure boosting assembly, the conveying assembly and the pressure boosting assembly are both provided with two, the two conveying assemblies and the pressure boosting assemblies are both fixedly connected to the two ends of the reaction cylinder, a through hole is formed in the surface of the reaction cylinder, an electric heater for heating effect is provided above the reaction cylinder.

[0008] By using the above technical solution, after the raw materials are put into the reaction cylinder, the temperature around the reaction cylinder is raised by the electric heater, so that the materials in the reaction cylinder are quickly evaporated and treated, and the deposition speed is accelerated to ensure that the materials can quickly become vapor state and be used in subsequent use.

[0009] Preferably, the electric heater is provided with two, the treatment component further comprises a ceramic shield, the reaction cylinder is located in the interior of the ceramic shield, and the two electric heaters are fixedly installed on the surface of the ceramic shield.

[0010] By adopting the technical scheme, the electric heater can quickly generate heat when in operation, and the heat is delivered to the gap between the ceramic shield and the reaction cylinder, so as to heat and evaporate the solid material.

[0011] Preferably, the bottom of the reaction cylinder is provided with a deposition gap for discharging deposits.

[0012] By adopting the technical scheme, the impurities left in the solid material can be discharged from the deposition gap during the heating and evaporation process.

[0013] Preferably, the delivery assembly comprises a delivery pipe, a feeding port is fixedly installed at the top end of the delivery pipe, a drive pump is fixedly connected to one end of the delivery pipe, and a connecting pipe is fixedly connected to the other end of the delivery pipe, one end of the connecting pipe is fixedly connected to the reaction cylinder through the ceramic shield.

[0014] By adopting the technical scheme, the feeding port can quickly deliver the solid material into the reaction cylinder for processing when the drive pump is in operation.

[0015] Preferably, the booster assembly comprises a booster pipe, the booster pipe is fixedly connected to the other end of the connecting pipe, and a booster pump is fixedly installed at one end of the booster pipe.

[0016] By adopting the technical scheme, the pressure inside the reaction cylinder can be increased by the booster pump, so that the solid material can be processed.

[0017] Preferably, the bottom of the ceramic shield is provided with a discharge gap, and the discharge gap is located above the glass placement plate.

[0018] By adopting the technical scheme, the discharge gap can discharge the steam from the reaction cylinder, so as to be suitable for the film plating equipment for film plating treatment.

[0019] Preferably, the bottom of the glass placement plate is fixedly installed with a rolling conveyor.

[0020] By adopting the technical scheme, the rolling conveyor can transport the glass placement plate, so as to process the equipment after feeding and then process it.

[0021] (Three) beneficial effects

[0022] The present application provides a cavity of a co-evaporation film plating equipment. It has the following beneficial effects:

[0023] The cavity of the co-evaporation film plating equipment can quickly evaporate the material in the reaction cylinder by the electric heater after the raw material is fed into the reaction cylinder, so as to speed up the deposition speed and ensure that the material can quickly become a steam state and then be used. BRIEF DESCRIPTION OF DRAWINGS

[0024] Figure 1 is a schematic view of the three-dimensional structure of the present application;

[0025] Figure 2 is a schematic view of the three-dimensional structure of the present application;

[0026] Figure 3 is a schematic view of the three-dimensional structure of the processing component of the present application;

[0027] Figure 4 is a schematic view of the three-dimensional structure of the processing component of the present application;

[0028] In the figure: 1, coating chamber; 10, rolling conveyor; 11, glass placement plate; 2, processing component; 20, ceramic shield; 200, discharge gap; 21, electric heater; 22, reaction cylinder; 220, deposition gap; 23, conveying assembly; 230, conveying pipe; 231, driving pump; 232, connecting pipe; 24, pressurizing assembly; 240, pressurizing pump; 241, pressurizing pipe. DETAILED DESCRIPTION

[0029] The present application will be further described in detail below with reference to the accompanying drawings and examples.

[0030] With reference to Figure 1 , Figure 2 , Figure 3 and Figure 4 , the embodiment of the present application provides a cavity of a co-evaporation coating device, which comprises a coating chamber 1 and a glass placement plate 11 for placing materials, the glass placement plate 11 is located above the coating chamber 1, a processing component 2 is arranged above the glass placement plate 11, the processing component 2 comprises a reaction cylinder 22, a conveying assembly 23 and a pressurizing assembly 24, the conveying assembly 23 and the pressurizing assembly 24 are both provided with two, the two conveying assemblies 23 and the two pressurizing assemblies 24 are both fixedly connected to two ends of the reaction cylinder 22, a through hole is formed in the surface of the reaction cylinder 22, and an electric heater 21 for heating effect is arranged above the reaction cylinder 22.

[0031] With reference to Figure 1 , Figure 2 and Figure 4 , in one aspect of the embodiment, the electric heater 21 is provided with two, and the processing component 2 further comprises a ceramic shield 20, the reaction cylinder 22 is located inside the ceramic shield 20, and the two electric heaters 21 are both fixedly installed on the surface of the ceramic shield 20.

[0032] A deposition gap 220 for discharging deposits is formed in the bottom of the reaction cylinder 22.

[0033] The conveying assembly 23 comprises a conveying pipe 230, a feeding port is fixedly installed at the top end of the conveying pipe 230, one end of the conveying pipe 230 is fixedly connected with a driving pump 231, and the other end of the conveying pipe 230 is fixedly connected with a connecting pipe 232, one end of the connecting pipe 232 is fixedly connected with the reaction cylinder 22 through the ceramic shield 20.

[0034] The pressurizing assembly 24 comprises a pressurizing pipe 241, the pressurizing pipe 241 is fixedly connected at the other end of the connecting pipe 232, and one end of the pressurizing pipe 241 is fixedly installed with a pressurizing pump 240.

[0035] Before the coated material is processed, the solid material to be evaporated is fed into the conveying pipe 230 through the feeding port, and the driving pump 231 is started, so that the solid material is conveyed into the reaction cylinder 22 through the connecting pipe 232, after the feeding is completed, the electric heater 21 is started, the electric heater 21 conveys heat to the gap between the ceramic shield 20 and the reaction cylinder 22, and conveys heat to the solid material through the through hole on the surface of the reaction cylinder 22, and performs high-temperature evaporation treatment on the solid material, during the evaporation process, the impurities remaining after the evaporation of the solid material are discharged from the deposition gap 220 at the bottom, after the evaporation is completed, the material to be coated is placed on the glass placing plate 11, and the coating operation is performed.

[0036] Referring to Figure 2 and Figure 3 In one aspect of the embodiment, the bottom of the ceramic shield 20 is provided with a discharging gap 200, and the discharging gap 200 is located above the glass placing plate 11.

[0037] The bottom of the glass placing plate 11 is fixedly installed with a rolling conveyor 10.

[0038] After the material is placed, the rolling conveyor 10 is started, the glass placing plate 11 is conveyed to the lower side of the ceramic shield 20, the evaporated steam slowly descends, and the coating material is coated, after the processing is completed, the rolling conveyor 10 conveys the coating equipment to the subsequent use point for processing.

[0039] All the electrical equipment in the scheme is powered by an external power supply.

[0040] Working principle: in use, before the coating material is processed, the solid material to be evaporated is put into the feeding pipe 230 through the feeding port, and the driving pump 231 is started, so that the solid material is transported to the reaction cylinder 22 through the connecting pipe 232, after the feeding is completed, the electric heater 21 is started, the electric heater 21 will deliver heat to the gap between the ceramic guard 20 and the reaction cylinder 22, and through the through hole on the surface of the reaction cylinder 22 to the solid material, and carry out high temperature evaporation treatment, during the evaporation process, the impurities remaining after the evaporation of the solid material will be discharged from the bottom deposition gap 220, after the evaporation is completed, the material to be coated is placed on the glass placing plate 11, and the rolling conveyor 10 is started, so that the glass placing plate 11 is conveyed to the lower side of the ceramic guard 20, the evaporated steam slowly descends and adheres to the coating material for coating treatment, after the treatment is completed, the rolling conveyor 10 can convey the coating equipment to the subsequent use point for processing.

[0041] It should be noted that, in this document, the terms such as first and second are used merely to distinguish one entity or operation from another, and do not necessarily require or imply that these entities or operations exist in any actual relationship or order. Moreover, the terms "include", "contain" or any other variants thereof are intended to cover non-exclusive inclusion, so that the process, method, article or equipment including a series of elements not only includes those elements, but also includes other elements not explicitly listed or inherent to such process, method, article or equipment.

[0042] Although the embodiments of the present application have been shown and described, it can be understood by those skilled in the art that various changes, modifications, replacements and variations can be made to the embodiments without departing from the principles and spirits of the present application, the scope of the present application is defined by the appended claims and their equivalents.

Claims

1. A cavity for a co-evaporation coating apparatus, comprising a coating chamber (1) and a glass placement plate (11) for placing materials, characterized in that: The glass placement plate (11) is located above the coating chamber (1). A processing component (2) is provided above the glass placement plate (11). The processing component (2) includes a reaction cylinder (22), a conveying assembly (23), and a pressurizing assembly (24). There are two of each of the conveying assembly (23) and the pressurizing assembly (24). The two conveying assemblies (23) and the pressurizing assembly (24) are fixedly connected to both ends of the reaction cylinder (22). The surface of the reaction cylinder (22) is provided with through holes. An electric heater (21) for heating is provided above the reaction cylinder (22).

2. The cavity of the co-evaporation coating apparatus according to claim 1, characterized in that: Two electric heaters (21) are provided. The processing component (2) also includes a ceramic shield (20). The reaction cylinder (22) is located inside the ceramic shield (20). Both electric heaters (21) are fixedly installed on the surface of the ceramic shield (20).

3. The cavity of the co-evaporation coating apparatus according to claim 1, characterized in that: The bottom of the reaction cylinder (22) is provided with a sedimentation slit (220) for discharging sediments.

4. The cavity of the co-evaporation coating apparatus according to claim 1, characterized in that: The conveying assembly (23) includes a conveying pipe (230), with a feeding port fixedly installed at the top end of the conveying pipe (230). A drive pump (231) is fixedly connected to one end of the conveying pipe (230), and a connecting pipe (232) is fixedly connected to the other end of the conveying pipe (230). One end of the connecting pipe (232) passes through the ceramic protective cover (20) and is fixedly connected to the reaction cylinder (22).

5. The cavity of the co-evaporation coating apparatus according to claim 4, characterized in that: The booster assembly (24) includes a booster pipe (241), which is fixedly connected to the other end of the connecting pipe (232), and a booster pump (240) is fixedly installed at one end of the booster pipe (241).

6. The cavity of a co-evaporation coating apparatus according to claim 2, characterized in that: The bottom of the ceramic cover (20) is provided with a discharge slot (200), and the discharge slot (200) is located above the glass placement plate (11).

7. The cavity of a co-evaporation coating apparatus according to claim 6, characterized in that: A rolling conveyor (10) is fixedly installed at the bottom of the glass placement plate (11).

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