Controllable valve and wafer processing equipment

Abstract

The embodiment of the utility model provides a controllable valve and wafer processing equipment. The controllable valve comprises a valve cavity, a valve plate and a clearing assembly. The valve plate is rotatably arranged in the valve cavity so as to open or close the valve cavity. The clearing assembly is arranged in the valve cavity and comprises a plurality of clearing openings used for spraying cleaning fluid. The clearing assembly is arranged to have a first posture at least matched with the valve plate which is communicated with the valve cavity, so that part of the clearing ports can face the surface of the valve plate at a first preset inclination angle; the clearing opening ejects first beveled fluid capable of stripping attachments on the surface of the valve plate at a first preset inclination angle. The wafer processing apparatus includes a controllable valve. According to the embodiment of the invention, the plurality of obliquely arranged clearing ports can emit the first beveled fluid which is obliquely jetted to the surface of the valve plate, so that the impurities attached to the surface of the valve plate are separated from the surface of the valve plate, and the situation that the valve plate cannot normally rotate due to more impurities deposited on the surface of the valve plate is avoided; therefore, the situation that the photoresist removing equipment cannot operate due to the fact that the controllable valve breaks down is avoided.

Description

TECHNICAL FIELD

[0001] The present disclosure relates to the technical field of wafer processing, and in particular to a controllable valve and a wafer processing device. BACKGROUND

[0002] The plasma stripping mainly removes the photoresist by the reaction between oxygen atoms and the photoresist in the plasma environment. Since the basic component of the photoresist is a hydrocarbon polymer, under the action of radio frequency or microwave, oxygen is ionized into oxygen atoms and reacts with the photoresist to generate carbon monoxide, carbon dioxide and water, etc. The generated products are pumped out by vacuum to complete the removal of the photoresist.

[0003] However, a controllable valve is usually arranged on the pipeline connected with the reaction chamber for controlling the conduction or disconnection of the pump and the reaction chamber. Therefore, when the controllable valve is in the conduction state, part of the generated products will adhere to the surface of the valve plate and the wall surface of the valve cavity during the pumping process, and will accumulate over time to cause unstable opening degree of the controllable valve or the valve plate to be stuck. CONTENT OF THE UTILITY MODEL

[0004] In view of the above-mentioned defects of the prior art, the purpose of the present disclosure is to provide a controllable valve and a wafer processing device to solve the problems in the related art.

[0005] The first aspect of the present disclosure provides a controllable valve, comprising:

[0006] a valve cavity;

[0007] a valve plate rotatably arranged in the valve cavity to conduct or block the valve cavity;

[0008] a cleaning assembly arranged in the valve cavity and comprising a plurality of cleaning ports for spraying cleaning fluid; the cleaning assembly is arranged to include at least a first attitude cooperating with the valve plate in the conduction state of the valve cavity, so that part of the cleaning ports can be directed at a first preset inclination angle towards the surface of the valve plate; the cleaning ports emit a first beveling fluid capable of peeling off the adherents on the surface of the valve plate at the first preset inclination angle.

[0009] In an embodiment of the first aspect, the direction of the cleaning ports is adjustably arranged; the cleaning assembly further includes a second attitude cooperating with the wall surface of the valve cavity after being conducted, so that the plurality of cleaning ports can be directed at a second preset inclination angle towards the wall surface of the valve cavity; the cleaning ports emit a second beveling fluid capable of peeling off the adherents on the wall surface of the valve cavity at the second preset inclination angle; wherein the cleaning ports can be intermittently arranged in the first attitude and the second attitude.

[0010] In an embodiment of the first aspect, the cleaning assembly comprises a containing member, a plurality of cleaning pipes and an adjusting member; the containing member comprises a containing cavity; each of the cleaning pipes is rotationally connected to the containing member, and one end of each of the cleaning pipes is communicated with the containing cavity through a pipe, and the other end forms the cleaning port; the adjusting member comprises a plurality of linkage members and an extension member drivingly connected to the linkage members; each of the linkage members is correspondingly connected to one of the cleaning pipes; when the extension member is extended or retracted, the cleaning pipes are intermittently tilted towards the valve cavity wall surface and the valve plate surface through the linkage members.

[0011] In an embodiment of the first aspect, when the valve plate is rotated to open the valve cavity, a part of the cleaning ports can be swingable towards different positions of the outer edge surface of the valve plate, and another part is intermittently tilted towards the valve cavity wall surface and the valve plate surface.

[0012] In an embodiment of the first aspect, the containing member is implemented as a ring, and the plurality of cleaning pipes are rotationally connected to the containing member at intervals along the circumference of the containing member; the linkage members comprise a plurality of driven wheels and a driving column; each of the driven wheels is correspondingly connected to one of the cleaning pipes, the extension member is arranged between the driven wheels and has an output end connected to the driving column, and the outer edge surface of the driving column is in contact with the outer edge surfaces of the driven wheels; when the extension member is extended or retracted, the plurality of cleaning pipes are driven to be intermittently tilted towards the valve plate surface and the valve cavity wall surface.

[0013] In an embodiment of the first aspect, the driven wheels are in contact with the driving column in a meshing connection or an abutting connection.

[0014] In an embodiment of the first aspect, the cleaning assembly comprises a containing member having a containing cavity and a plurality of cleaning pipes; the containing member is implemented as a ring, and the plurality of cleaning pipes are arranged at intervals along the circumference of the ring-shaped containing member and are tilted towards the valve plate surface; one end of each of the cleaning pipes is communicated with the containing cavity, and the other end forms the cleaning port.

[0015] In an embodiment of the first aspect, the cleaning assembly comprises a containing member, a plurality of cleaning pipes and an adjusting member; the containing member comprises a containing cavity; each of the cleaning pipes is rotationally connected to the containing member, and one end of each of the cleaning pipes is communicated with the containing cavity through a pipe, and the other end forms the cleaning port; the adjusting member is implemented as comprising a plurality of motors, and each of the motors is drivingly connected to one of the cleaning pipes.

[0016] In an embodiment of the first aspect, the controllable valve further comprises a driving member connected to the valve plate; the driving member is implemented by a servo motor; and / or, the controllable valve comprises a first valve shell and a second valve shell connected detachably; the valve plate is arranged in the first valve shell, and the cleaning assembly is arranged in the second valve shell; and / or, the first preset inclination angle ranges from 30 degrees to 60 degrees.

[0017] A wafer processing equipment is provided in a second aspect of the present disclosure, comprising the controllable valve.

[0018] As described above, the embodiments of the present disclosure provide a controllable valve and a wafer processing equipment. The controllable valve comprises a valve cavity, a valve plate and a cleaning assembly. The valve plate is arranged rotatably in the valve cavity to open or block the valve cavity. The cleaning assembly is arranged in the valve cavity and comprises a plurality of cleaning ports for spraying cleaning fluid; the cleaning assembly is arranged to comprise at least a first posture cooperating with the valve plate in the state of opening the valve cavity, so that part of the cleaning ports can be directed towards the surface of the valve plate at a first preset inclination angle; the cleaning ports emit a first beveling fluid capable of peeling off the attachments on the surface of the valve plate at the first preset inclination angle. The wafer processing equipment comprises the controllable valve. In the embodiments of the present disclosure, the plurality of cleaning ports arranged at an inclination can emit the first beveling fluid directed obliquely towards the surface of the valve plate to separate the impurities attached to the surface of the valve plate from the surface of the valve plate, thereby avoiding the situation that the valve plate cannot rotate normally due to the deposition of too many impurities on the surface, and thereby avoiding the situation that the wafer processing equipment cannot operate due to the failure of the controllable valve. BRIEF DESCRIPTION OF DRAWINGS

[0019] Figure 1 FIG. 1 shows a cross-sectional view of a controllable valve according to an embodiment of the present disclosure;

[0020] Figure 2 FIG. 2 shows a cross-sectional view of the controllable valve from another perspective according to an embodiment of the present disclosure;

[0021] Figure 3 FIG. 3 shows a schematic diagram of the component forces of a first beveling fluid according to an embodiment of the present disclosure;

[0022] Figure 4 FIG. 4 shows a cross-sectional view of another embodiment of a cleaning tube according to an embodiment of the present disclosure;

[0023] Figure 5 FIG. 5 shows a cross-sectional view of another embodiment of a cleaning member according to an embodiment of the present disclosure;

[0024] Figure 6 FIG. 6 shows a cross-sectional view of a controllable valve comprising a cleaning member according to an embodiment of the present disclosure; Figure 5 FIG. 7 shows a cross-sectional view of a controllable valve comprising a cleaning member according to an embodiment of the present disclosure;

[0025] Figure 7Fig. 1 shows a schematic view of a valve according to an embodiment of the present disclosure. Figure 5 Fig. 2 shows a schematic view of a valve according to an embodiment of the present disclosure.

[0026] Reference signs:

[0027] 10 controllable valve; 101 valve chamber; 1011 inlet; 1012 outlet; 11 valve plate; 12 purge assembly; 1201 purge port; 121 containing member; 1211 containing cavity; 122 purge tube; 123 adjusting member; 1231 linkage member 12311 driven wheel; 12312 driving post; 1232 telescopic member; 13 driving member; 14 supply tube; 15 first valve housing; 16 second valve housing. DETAILED DESCRIPTION

[0028] The specific embodiments of the present disclosure will be described hereinafter with reference to particular embodiments. Those skilled in the art will readily understand other advantages and benefits of the present disclosure from the description of the embodiments without departing from the spirit of the present disclosure. The present disclosure can also be implemented or applied in other different embodiments and applications. Those skilled in the art will readily understand that the specific embodiments described herein can be combined with other embodiments and features of the present disclosure without departing from the spirit of the present disclosure. It is intended that the present disclosure covers all such modifications and variations of the specific embodiments described herein.

[0029] The embodiments of the present disclosure will be described in detail hereinafter with reference to the drawings, so that those skilled in the art can easily implement the present disclosure. The present disclosure can be embodied in various different forms, and is not limited to the embodiments described herein.

[0030] In the description of the present disclosure, the expressions "one embodiment", "some embodiments", "an example", "a specific example", or "some examples" mean that a specific feature, structure, material or characteristic represented in connection with the embodiment or example is included in at least one embodiment or example of the present disclosure. Also, the specific feature, structure, material or characteristic represented can be combined in any appropriate manner in any one or more embodiments or examples. In addition, the skilled person can combine and combine the features of different embodiments or examples represented in the present disclosure and the features of different embodiments or examples, without contradiction.

[0031] In addition, the terms "first", "second", etc. are used only for the purpose of description, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the technical features indicated. Therefore, the features limited by "first", "second" can explicitly or implicitly include at least one of the features. In the description of the present disclosure, the meaning of "a group" is two or more, unless otherwise specifically limited.

[0032] For the purpose of clearness of the present disclosure, devices irrelevant to the description are omitted, and the same reference numerals are assigned to the same or similar constituent elements throughout the specification.

[0033] Throughout the specification, when it is said that a certain device is "connected" to another device, this includes not only the case of "direct connection" but also the case of "indirect connection" in which other elements are interposed therebetween. In addition, when it is said that a certain device "includes" a certain constituent element, other constituent elements are not excluded unless specifically stated to the contrary, but it means that other constituent elements can be further included.

[0034] Although the terms first, second, etc. are used herein to refer to various elements, these elements should not be limited by these terms. These terms are only used to distinguish one element from another. For example, a first interface and a second interface, etc. are denoted. Also, as used herein, the singular forms "a," "an" and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise. It will be further understood that the terms "comprises," "comprising," "includes" and / or "including," when used herein, specify the presence of stated features, steps, operations, elements, modules, items, components, and / or groups thereof, but do not preclude the presence or addition of one or more other features, steps, operations, elements, modules, items, components, and / or groups thereof. As used herein, the terms "or" and "and / or" are construed to be inclusive, or mean one and / or any combination. Therefore, "A, B, or C" or "A, B, and / or C" means "any of the following: A; B; C; A and B; A and C; B and C; A, B, and C." Exceptions to this definition are only present when items, components, or functions are inherently mutually exclusive between different implementations.

[0035] The professional terms used herein are used only to refer to specific embodiments, and are not intended to limit the present disclosure. As used herein, the singular form is intended to include the plural form as well, unless the context clearly indicates otherwise. The meaning of "include," as used in the specification, is to encompass a specific feature, region, integer, step, operation, element, and / or component, but not to exclude the presence or addition of another feature, region, integer, step, operation, element, and / or component.

[0036] Although not differently defined, including technical terms and scientific terms used herein, all terms have the same meaning as generally understood by those skilled in the art to which the present disclosure belongs. Terms defined in a generally used dictionary are additionally interpreted to have the meaning consistent with the related technical literature and the currently prompted message, unless defined, and should not be over-interpreted as an ideal or very formal meaning.

[0037] In the prior art, the plasma stripping mainly removes the photoresist by the reaction between oxygen atoms and the photoresist in the plasma environment. Since the basic component of the photoresist is a hydrocarbon polymer, under the action of radio frequency or microwave, oxygen is ionized into oxygen atoms and reacts with the photoresist to generate carbon monoxide, carbon dioxide and water, etc. The reaction products are pumped out of the vacuum chamber to complete the removal of the photoresist.

[0038] However, a controllable valve is usually arranged on the pipeline connecting the pump and the reaction chamber to control the conduction or disconnection of the pump and the reaction chamber. Therefore, when the controllable valve is in the conduction state, part of the reaction products will adhere to the surface of the valve plate and the wall of the valve cavity during the pumping process, and the accumulation of the reaction products over time will cause the controllable valve to be unstable or the valve plate to be stuck.

[0039] Based on the above problems, the plurality of cleaning ports arranged obliquely in the embodiment of the present disclosure can emit first oblique cutting fluid obliquely towards the surface of the valve plate to detach the impurities adhering to the surface of the valve plate from the surface of the valve plate, thereby avoiding the situation that the valve plate cannot rotate normally due to the deposition of too many impurities on the surface of the valve plate, and avoiding the situation that the stripping equipment cannot operate due to the failure of the controllable valve.

[0040] However, a controllable valve is usually arranged on the pipeline connecting the pump and the reaction chamber to control the conduction or disconnection of the pump and the reaction chamber. Therefore, when the controllable valve is in the conduction state, part of the reaction products will adhere to the surface of the valve plate and the wall of the valve cavity during the pumping process, and the accumulation of the reaction products over time will cause the controllable valve to be unstable or the valve plate to be stuck.

[0041] Figure 1 Fig. 2 shows a cross-sectional view of the controllable valve according to the embodiment of the present disclosure. Figure 2 Fig. 3 shows another cross-sectional view of the controllable valve according to the embodiment of the present disclosure. Figure 1 and Figure 2 In the example, the controllable valve 10 includes a valve cavity 101, a valve plate 11 and a cleaning assembly 12. The valve plate 11 is rotatably arranged in the valve cavity 101 to conduct or block the valve cavity 101. The cleaning assembly 12 is arranged in the valve cavity 101 and includes a plurality of cleaning ports 1201 for spraying cleaning fluid; the cleaning assembly 12 is arranged to include at least a first posture cooperating with the valve plate 11 in the conduction state of the valve cavity 101, so that part of the cleaning ports 1201 can be directed towards the surface of the valve plate 11 at a first preset oblique angle; the cleaning ports 1201 emit first oblique cutting fluid capable of peeling off the adherents on the surface of the valve plate 11 at the first preset oblique angle.

[0042] The benefit of the above arrangement is that the plurality of the cleaning ports 1201 arranged obliquely in the embodiment of the present disclosure can emit the first oblique fluid to the surface of the valve plate 11 to detach the impurities adhering to the surface of the valve plate 11, thereby avoiding the situation that the valve plate 11 cannot rotate normally due to the deposition of too many impurities on the surface of the valve plate 11, and avoiding the situation that the degumming equipment cannot operate due to the failure of the controllable valve 10.

[0043] Figure 3 Fig. 2 shows the schematic diagram of the component force of the first oblique fluid in the embodiment of the present disclosure. As shown in Fig. 2, the first oblique fluid has a vertical component force and a horizontal component force. Figure 3 As an example, when the valve plate 11 is obliquely flushed, the first oblique fluid acts on the impurities on the surface of the valve plate 11 at a certain angle. This angle makes the first oblique fluid have not only the impact force in the direction perpendicular to the surface of the valve plate 11, but also the horizontal component force flowing along the valve cavity 101. For the impurities with a certain oblique angle or the impurities with a large area and closely adhering to the surface of the valve plate 11, the horizontal component force of the first oblique fluid helps to push the impurities to slide on the surface of the valve plate 11, thereby being more conducive to removing the impurities from the surface of the valve plate 11.

[0044] In Figure 1 As an example, the valve cavity 101 includes an inlet 1011 and an outlet 1012. As an example, the cleaning assembly 12 is arranged at the inlet 1011 of the valve cavity 101. The benefit of this arrangement is that the impurities stripped by the cleaning assembly 12 can directly flow along the valve cavity to the outlet 1012.

[0045] As an example, the cleaning assembly 12 includes a containing component 121 having a containing cavity 1211 and a plurality of cleaning pipes 122; the containing component 121 is implemented as a ring, and the plurality of cleaning pipes 122 are arranged along the circumference of the ring-shaped containing component 121 and obliquely face the surface of the valve plate 11. One end of each of the cleaning pipes 122 communicates with the containing cavity 1211, and the other end forms the cleaning port 1201.

[0046] As an example, the first preset oblique angle ranges from 30 degrees to 60 degrees; as a preferred example, the first preset oblique angle is 45 degrees. In this way, the size of the impact force in the direction perpendicular to the surface of the valve plate 11 is the same as the size of the horizontal component force flowing along the airway, thereby improving the cleaning effect on the impurities on the surface of the valve plate 11.

[0047] Figure 4 Fig. 4 shows the cross-sectional schematic diagram of another embodiment of the cleaning pipe in the embodiment of the present disclosure. In Figure 4In an example, the inner diameter of the cleaning pipe 122 gradually decreases in the direction away from the containing component 121. Those skilled in the art can understand that the smaller inner diameter of the cleaning port 1201 can increase the flow rate of the first beveling fluid sprayed through the cleaning port 1201, thereby further improving the cleaning effect of the first beveling fluid on the impurities on the surface of the valve plate 11.

[0048] Again, referring back to Figure 2 In an example, preferably, the containing component 121 is implemented in a ring shape with a circular cross section, and a plurality of cleaning ports 1201 are arranged along the circumference of the ring-shaped containing component 121. The advantage of such an arrangement is that the ring-shaped containing component 121 can not block the smooth flow of impurities in the valve cavity 101.

[0049] In other embodiments, the containing component 121 can also be implemented in a ring shape with a rectangular cross section, and the length direction of the rectangle is parallel to the axis of rotation of the valve plate 11.

[0050] In an example, the controllable valve 10 further comprises a driving member 13 drivingly connected to the valve plate 11; the driving member 13 is implemented as a servo motor.

[0051] In an example, the controllable valve 10 further comprises a supply pipe 14; one end of the supply pipe 14 is located outside the controllable valve 10 (communicating with a fluid supply device outside), and the other end penetrates into the valve cavity 101 and communicates with the containing component 121. For example, the controllable valve 10 is formed with a mounting hole (not shown in the figure) communicating with the valve cavity 101, and the other end of the supply pipe 14 penetrates into the valve cavity 101 through the mounting hole and communicates with the containing cavity 1211 of the containing component 121. It should be noted that the supply pipe 14 and the mounting hole are sealed.

[0052] Those skilled in the art can understand that impurities not only adhere to the surface of the valve plate 11 when flowing through the controllable valve 10, but also adhere to the wall surface of the valve cavity 101, especially when the valve plate 11 is in a position to conduct the air path, the area of the valve cavity 101 wall surface that is in contact with the outer edge surface of the valve plate 11 will have more impurities adhered, which will cause the valve plate 11 to fail to smoothly rotate to a position to block the air path.

[0053] Figure 5 Fig. 4 shows a cross-sectional view of another embodiment of a cleaning assembly in the present disclosure. Figure 6 Fig. 5 shows a cross-sectional view of a controllable valve containing the cleaning assembly. Figure 5 Fig. 6 shows a cross-sectional view of a controllable valve of the cleaning assembly. In combination with Figure 5 and Figure 6It can be seen that the direction of the cleaning port 1201 is adjustably arranged. The cleaning assembly 12 further comprises a second posture matched with the wall surface of the valve cavity 101 after the air path is opened, so that the plurality of cleaning ports 1201 can be directed at a second preset inclination angle to the wall surface of the valve cavity 101; the cleaning port 1201 emits a second oblique cutting fluid capable of peeling off the attachments on the wall surface of the valve cavity 101 at the second preset inclination angle; wherein the cleaning port 1201 can be intermittently arranged between the first posture and the second posture.

[0054] It should be noted that, Figure 5 In the example, only two cleaning pipes 122 and driven wheels in the same cross-sectional plane are shown, and the specific structures of the remaining cleaning pipes 122 and driven wheels are the same as those shown in Figure 5 In the example, only two cleaning pipes 122 and driven wheels in the same cross-sectional plane are shown, and the specific structures of the remaining cleaning pipes 122 and driven wheels are the same as those shown in

[0055] Since the present application Figure 5 In the example, the cleaning port 1201 can be intermittently switched between the first posture and the second posture to intermittently remove impurities attached to the surface of the valve plate 11 and the wall surface of the valve cavity 101. Thus, the valve plate 11 cannot be smoothly rotated to a position to block the air path due to the impurities attached to the area of the wall surface of the valve cavity 101 that is in contact with the outer edge surface of the valve plate 11.

[0056] Exemplarily, the force analysis diagram of the second oblique cutting fluid acting on the wall surface of the valve cavity 101 is similar to Figure 3 The example is similar, so it is not shown here.

[0057] Exemplarily, the cleaning assembly 12 comprises a containing member 121, a plurality of cleaning pipes 122, and an adjusting member 123; the containing member 121 comprises a containing cavity 1211; each cleaning pipe 122 is rotationally connected to the containing member 121, and one end of each cleaning pipe 122 is connected to the containing cavity 1211 through a hose, and the other end forms the cleaning port 1201; the adjusting member 123 comprises a plurality of linkage members 1231 and a telescopic member 1232 drivingly connected to the plurality of linkage members 1231; wherein when the telescopic member 1232 is extended or retracted, the plurality of cleaning pipes 122 can be intermittently inclined towards the wall surface of the valve cavity 101 and the surface of the valve plate 11 through the plurality of linkage members 1231.

[0058] In Figure 5 In the example, the containing member 121 is implemented as a ring-shaped cross section, and the plurality of cleaning pipes 122 are rotationally connected to the containing member 121 at intervals along the circumference of the containing member 121; ( Figure 5(The dashed line in the middle shows a schematic diagram of the connector between the cleaning tube 122 and the receiving component 121.) The linkage component 1231 includes multiple driven wheels 12311 and a driving column 12312; each driven wheel 12311 is connected to a corresponding cleaning tube 122, and the telescopic member 1232 is disposed between the multiple driven wheels 12311 and its output end is connected to the driving column 12312. The outer edge surface of the driving column 12312 is in contact with the outer edge surfaces of the multiple driven wheels 12311; wherein, when the telescopic member 1232 extends or retracts, it drives the multiple cleaning tubes 122 to intermittently tilt toward the surface of the valve plate 11 and the wall of the valve cavity 101.

[0059] For example, the driven wheel 12311 is connected to the driving column 12312 in an engaging or abutting manner.

[0060] exist Figure 4 In the example, the driven wheel 12311 is connected to the output end of the driving column 12312 in an abutting manner, that is, the outer edge surface of the driven wheel 12311 abuts against the outer edge surface of the driving column 12312. It can be understood that when the telescopic member 1232 extends or retracts, the friction between the outer edge surface of the driving column 12312 and the outer edge surface of the driven wheel 12311 drives the multiple driven wheels 12311 to rotate, thereby driving the cleaning pipe 122 to rotate, so that the cleaning port 1201 can intermittently switch between the first posture and the second posture.

[0061] Figure 7 The image shown is Figure 5 A cross-sectional view of the driven wheel mates with the output end of the telescopic component in the example. Figure 7 In the example, the outer edge surface of each driven wheel 12311 is configured as an arcuate surface that conforms to the outer edge surface of the driving post 12312. This configuration increases the contact area between the driven wheel 12311 and the driving post 12312, thereby increasing the friction between them. Further exemplarily, the outer edge surface of the driven wheel 12311 is provided with an anti-slip layer, such as a rubber layer, further enhancing the friction between the driving post 12312 and the driven wheel 12311.

[0062] In other embodiments, the driven wheel is connected to the output end of the telescopic member 1232 in an engaging connection. That is, the outer edge surface of the driven wheel and the outer edge surface of the output end of the telescopic member 1232 are respectively provided with mating teeth.

[0063] Combination Figure 2 and Figure 5As shown in the examples, when the valve plate 11 is rotated to open the valve cavity 101, a part of the cleaning ports 1201 can be swung to different positions on the outer edge surface of the valve plate 11, and the other part of the cleaning ports 1201 can be intermittently tilted towards the surface of the valve plate 11 and the inner wall of the valve cavity 101. For example, when the valve plate 11 is rotated to open the air passage of the suction pipe 32, the two cleaning pipes 122 opposite to the outer edge surface of the valve plate 11 towards the cleaning assembly 12 are driven by the adjusting component 123 to swing to different positions on the outer edge surface of the valve plate 11, and the other cleaning pipes 122 not opposite to the outer edge surface of the valve plate 11 are driven by the adjusting component 123 to intermittently tilt towards the surface of the valve plate 11 and the inner wall of the valve cavity 101. Figure 2

[0064] In the examples, the telescopic component 1232 is implemented as an oil cylinder, a gas cylinder or an electric cylinder. Further, the stroke of the telescopic component 1232 is configured to allow a part of the cleaning ports 1201 to be aligned with the area on the inner wall of the valve cavity 101 abutting the outer edge surface of the valve plate 11 at the starting position, and to allow a part of the cleaning ports 1201 to be aligned with the edge of the valve plate 11 close to the cleaning assembly 12 at the ending position. In other embodiments, a part of the cleaning ports 1201 can also be allowed to pass the edge of the valve plate 11 close to the cleaning assembly 12 at the ending position.

[0065] In other embodiments, the adjusting component 123 is implemented as a plurality of motors, each of which is drivingly connected to one of the cleaning pipes 122. It can be understood that the orientation of the cleaning ports 1201 is adjusted by the driving of the motors.

[0066] In another embodiment, the linkage component 1231 is implemented as a plurality of pulleys, a plurality of pull belts and a plurality of torsional springs. Each of the pulleys is correspondingly connected to one of the cleaning pipes 122, one end of each of the pull belts is fixedly connected to the wheel groove of the pulley, and the other end is fixedly connected to the output end of the telescopic component 1232. The torsional spring is arranged between each of the cleaning pipes 122 and the accommodating component 121 for reverse rotation. For example, when the telescopic component 1232 is retracted, the output end of the telescopic component 1232 drives the pulley to rotate through the pull belt, thereby driving the cleaning pipe 122 to rotate to switch the cleaning port 1201 from the surface of the valve plate 11 to the inner wall of the valve cavity 101, and the torsional spring is charged in this process. When the telescopic component 1232 is extended, the pull belt has no force transmission, and the torsional spring releases the force to drive the cleaning pipe 122 to reverse rotate to the surface of the valve plate 11 again, and the above process is intermittently repeated.

[0067] ​It is to be noted that in the above embodiment, the lines of the driving member 13 and the telescopic member 1232 are drawn out of the mounting hole together with the supply pipe 14.

[0068] Exemplarily, the time interval for switching the purge port 1201 is set to 30 seconds. In other embodiments, the time interval for switching the purge port 1201 is set to 1 minute.

[0069] Exemplarily, the purge port 1201 still sprays fluid when switching the orientation. Those skilled in the art can understand that, during the process of switching the orientation of the purge port 1201 from the surface of the valve plate 11 to the wall surface of the valve cavity 101, the fluid sprayed from the purge port 1201 will sequentially hit different positions on the surface of the valve plate 11 and part of the wall surface of the valve cavity 101, thereby improving the cleaning effect inside the controllable valve 10.

[0070] Returning to Figure 6 In an example, the controllable valve 10 comprises a first valve shell 15 and a second valve shell 16 connected detachably; the valve plate 11 is arranged in the first valve shell 15, and the purge assembly 12 is arranged in the second valve shell 16. The above arrangement has the advantage that the user can repair or replace the purge assembly 12 by separating the first valve shell 15 and the second valve shell 16.

[0071] In another embodiment of the present disclosure, a wafer processing device is provided, which comprises the controllable valve 10.

[0072] In summary, the embodiments of the present disclosure provide a controllable valve and a wafer processing device. The controllable valve comprises a valve cavity, a valve plate and a purge assembly. The valve plate is arranged rotatably in the valve cavity to open or block the valve cavity. The purge assembly is arranged in the valve cavity and comprises a plurality of purge ports for spraying cleaning fluid; the purge assembly is arranged to include at least a first attitude cooperating with the valve plate in the open state of the valve cavity, so that part of the purge ports can be oriented at a first preset inclination angle towards the surface of the valve plate; the purge ports spray first beveled fluid at the first preset inclination angle, which can strip the attachments on the surface of the valve plate. The wafer processing device comprises the controllable valve. In the embodiments of the present disclosure, the plurality of purge ports arranged at an inclination can emit first beveled fluid inclined to the surface of the valve plate, so as to strip the impurities attached to the surface of the valve plate from the surface of the valve plate, thereby avoiding the situation that the valve plate cannot rotate normally due to the deposition of too many impurities on the surface, and thereby avoiding the situation that the wafer processing device cannot operate due to the failure of the controllable valve.

[0073] The above embodiments are only illustrative of the principles of the present disclosure and its effects, and are not intended to limit the present disclosure. Any modification or change made by any person skilled in the art without departing from the spirit and scope of the present disclosure shall be covered by the protection scope of the present disclosure.

Claims

1. A controllable valve, characterized in that, include: Valve cavity; A valve plate is rotatably disposed in the valve cavity to open or close the valve cavity; A cleaning assembly is disposed in the valve chamber and includes a plurality of cleaning ports for spraying cleaning fluid; the cleaning assembly is configured to include a first posture that cooperates at least with a valve plate that is in the valve chamber, such that a portion of the cleaning ports can be oriented toward the surface of the valve plate at a first preset tilt angle; the cleaning ports eject a first oblique fluid capable of peeling off the adhering material on the surface of the valve plate at the first preset tilt angle.

2. The controllable valve according to claim 1, characterized in that, The orientation of the cleaning port is adjustable; the cleaning assembly also includes a second posture that cooperates with the valve cavity wall after it is turned on, so that the plurality of cleaning ports can face the valve cavity wall at a second preset tilt angle; the cleaning port ejects a second oblique fluid that can peel off the deposits on the valve cavity wall at the second preset tilt angle; wherein the cleaning port can be intermittently switched between the first posture and the second posture.

3. The controllable valve according to claim 1, characterized in that, The cleaning assembly includes a receiving component, multiple cleaning tubes, and an adjusting component; the receiving component includes a receiving cavity; each cleaning tube is rotatably connected to the receiving component, and one end of each cleaning tube is connected to the receiving cavity through a pipe, and the other end forms the cleaning port; the adjusting component includes multiple linkage components and a telescopic component that drives and connects the multiple linkage components; each linkage component is correspondingly connected to one cleaning tube; wherein, when the telescopic component extends or retracts, it can drive the cleaning tube to intermittently tilt towards the valve cavity wall and the valve plate surface through the linkage components.

4. The controllable valve according to claim 3, characterized in that, When the valve plate rotates to open the valve cavity, a portion of the clearing port can swing toward different positions on the outer edge of the valve plate, while another portion intermittently tilts toward the valve cavity wall and the valve plate surface.

5. The controllable valve according to claim 3, characterized in that, The receiving component is implemented as a ring, and a plurality of the cleaning tubes are rotatably connected to the receiving component at circumferential intervals; the linkage component includes a plurality of driven wheels and a driving column; each driven wheel is connected to a corresponding cleaning tube, the telescopic member is disposed between the plurality of driven wheels and its output end is connected to the driving column, and the outer edge surface of the driving column is in contact with the outer edge surfaces of the plurality of driven wheels; wherein, when the telescopic member extends or retracts, it drives the plurality of cleaning tubes to intermittently tilt toward the valve plate surface and the valve cavity wall surface.

6. The controllable valve according to claim 5, characterized in that, The driven wheel is connected to the driving column in an engaging or abutting manner.

7. The controllable valve according to claim 1, characterized in that, The cleaning assembly includes a receiving component with a receiving cavity and a plurality of cleaning tubes; the receiving component is implemented as annular, and the plurality of cleaning tubes are arranged circumferentially spaced along the annular receiving component and inclined toward the valve plate surface; one end of each cleaning tube communicates with the receiving cavity, and the other end forms the cleaning port.

8. The controllable valve according to claim 1, characterized in that, The cleaning assembly includes a receiving component, multiple cleaning tubes, and an adjusting component; the receiving component includes a receiving cavity; each cleaning tube is rotatably connected to the receiving component, and one end of each cleaning tube is connected to the receiving cavity through a pipe, and the other end forms the cleaning port; the adjusting component is implemented to include multiple motors, each motor driving a cleaning tube.

9. The controllable valve according to claim 1, characterized in that, The controllable valve further includes a drive component connected to the valve plate; the drive component is implemented by a servo motor; and / or, the controllable valve includes a first valve housing and a second valve housing that are detachably connected; the valve plate is disposed on the first valve housing, and the clearing component is disposed on the second valve housing; and / or, the range of the first preset tilt angle is 30 degrees to 60 degrees.

10. A wafer processing equipment, characterized in that, include: The controllable valve as described in any one of claims 1-9.

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