Ion source extraction device

Abstract

The utility model relates to the technical field of ion beam coating, and discloses an ion source extraction device which comprises a high-voltage end flange, a suppression electrode, a ground electrode and a ground-level flange. When the ion source lead-out device is used, through the arrangement of the high-voltage end flange and the ground-level flange, a three-layer flange structure of a traditional ion source lead-out device is changed into a two-layer flange structure, and meanwhile, an electrode mounting seat of the traditional ion source lead-out device is simplified into a plurality of supporting sleeves playing a connecting and supporting role, so that the processing difficulty and the processing cost of parts are greatly reduced; and meanwhile, in the installation process, the electrode positioning difficulty is reduced, and the installation accuracy is improved. Through the arrangement of the shielding ring and the suppression electrode, a cooperative electric field control structure is formed. The positioning steps are respectively processed on the flanges, so that the installation concentricity of the flanges and other components is ensured, and the use effect of the ion source extraction device is ensured. The ion source extraction device solves the problems that a traditional ion source extraction device is low in air extraction rate, and the sparking phenomenon is easily caused due to the vacuum difference between electrodes.

Description

TECHNICAL FIELD

[0001] The utility model belongs to ion beam coating technology field, concretely relates to a kind of ion source extraction device. BACKGROUND

[0002] 45GHz ECR ion source extraction device is a kind of device for extracting plasma generated by ion source, generating ion beam current, wherein the concentricity between electrodes, the vacuum degree inside the device when running has a very big influence on the extraction transmission of beam.

[0003] Traditional 2.45GHz ECR ion source ion source extraction device usually adopts three-layer flange structure, wherein the suppression electrode and the ground electrode are respectively installed on the suppression electrode installation flange and the ground electrode flange by oxygen-free copper mounting seat. High-voltage cable is connected on the suppression electrode installation flange to provide high voltage for the suppression electrode. The insulation between the flanges is realized by high-voltage insulating ceramic ring. Water-cooled interlayer is arranged above the suppression electrode installation flange and the ground electrode flange. In order to reduce the influence of water-cooled interlayer welding deformation on electrode installation precision, machining allowance needs to be reserved during waterway welding, and then flange finishing machining is carried out after waterway machining is completed. At the same time, since the suppression electrode and the ground electrode are respectively installed on different flanges, in order to ensure the concentricity of the electrodes, different positioning steps need to be designed and processed on the flanges to ensure the concentricity between the insulating ceramic, the electrodes and the flanges. In this way, the process of the parts of the ion source extraction system in the machining process becomes more complex, the processing cost increases, and at the same time, during the subsequent system assembly process, due to the need to select different positioning references for the concentricity cooperation between the electrodes and the electrode mounting seat, the electrode mounting seat and the flange and the flange and the insulating ceramic, the cumulative installation error may be caused, which affects the spacing and concentricity of the ground electrode and the suppression electrode, and reduces the extraction efficiency of the beam. At the same time, the complex structure also blocks the space inside the whole device, reduces the pumping speed, and causes the vacuum between the electrodes to be poor, which easily causes the sparking phenomenon.

[0004] Therefore, the utility model provides a novel ion source extraction device to solve the problems existing in the prior art. UTILITY MODEL CONTENTS

[0005] Therefore, the main purpose of the utility model is to provide an ion source extraction device to solve the problems of low pumping speed, poor vacuum between electrodes and easy sparking phenomenon existing in traditional ion source extraction device.

[0006] To achieve the above purpose, the technical scheme of the utility model is as follows:

[0007] An ion source extraction device, comprising:

[0008] The high-voltage end flange is arranged at one end of the ground flange away from the suppression electrode through a supporting rod, an insulating ceramic ring is arranged between the high-voltage end flange and the ground flange, and a lead-out vacuum chamber is arranged at one end of the ground flange away from the high-voltage end flange.

[0009] The suppression electrode is arranged at the middle of one end of the ground flange close to the high-voltage end flange and is arranged concentrically with the high-voltage end flange and the ground flange.

[0010] The ground electrode is arranged at the inner side of the suppression electrode through a ground electrode supporting sleeve and is arranged concentrically with the suppression electrode.

[0011] The ground flange is arranged between the high-voltage end flange and the lead-out vacuum chamber and a shielding ring is arranged between the ground flange and the high-voltage end flange.

[0012] In a preferred embodiment, the supporting rods are uniformly arranged between the high-voltage end flange and the ground flange, and positioning pins are arranged at both ends of the supporting rods and connected with the high-voltage end flange and the ground flange.

[0013] In a preferred embodiment, the insulating ceramic ring is connected with the high-voltage end flange and the ground flange through a second seal.

[0014] In a preferred embodiment, the shielding ring is arranged at one side of the ground flange through a positioning step arranged on the ground flange and a connecting pin.

[0015] In a preferred embodiment, the suppression electrode is arranged in the positioning step at one side of the ground flange through a connecting pin, and the suppression electrode is located between the vacuum chamber and the ground flange.

[0016] In a preferred embodiment, a suppression electrode supporting sleeve is further arranged outside the connecting pin and in contact with the suppression electrode.

[0017] In a preferred embodiment, the ground electrode is arranged at one side of the ground flange through a positioning column and is located at the inner side of the suppression electrode.

[0018] In a preferred embodiment, a ground electrode supporting sleeve is further arranged outside the positioning column and in contact with the ground electrode.

[0019] In a preferred embodiment, a first seal is arranged between the lead-out vacuum chamber and the ground flange, and a flange plate is further arranged at one side of the lead-out vacuum chamber away from the ground flange.

[0020] In a preferred embodiment, a high-voltage feedthrough interface is arranged on the lead-out vacuum chamber.

[0021] Compared with the prior art, the ion source lead-out device has the following beneficial effects:

[0022] 1. Through the setting of high pressure end flange and ground level flange, the three layer flange structure of traditional ion source extraction device is changed into two layer flange structure, and the electrode mounting seat of traditional ion source extraction device is simplified to a plurality of support sleeves which play the role of connecting and supporting, so that the machining difficulty and machining cost of parts are greatly reduced, and in the process of installing integration, the positioning difficulty of the electrode is reduced, and the distance and concentricity between the suppression electrode and the ground electrode can be more accurate.

[0023] 2. Through the setting of the insulating ceramic column, the ground insulation of the device is ensured.

[0024] 3. Through the setting of the shielding ring and the suppression electrode, a synergistic electric field control structure is formed. On the one hand, the annular geometric profile of the shielding ring can homogenize the electric field gradient of the edges of the ground electrode and the suppression electrode, so as to avoid local field strength being too high to cause gas breakdown or arc discharge. On the other hand, the shielding ring reduces the probability of high-energy secondary electrons escaping from the surface of the suppression electrode through physical shielding, thereby reducing the charge accumulation effect in the beam transmission process.

[0025] 4. By machining positioning steps on the flanges respectively, the concentricity of the two flanges and the concentricity of the installation of other components are effectively ensured, and the use effect of the ion source extraction device is ensured. The problems of low pumping speed, vacuum difference between electrodes and easy to cause sparking phenomenon of the traditional ion source extraction device are solved. BRIEF DESCRIPTION OF DRAWINGS

[0026] In order to more clearly illustrate the technical scheme in the embodiments of the present application or the prior art, the drawings needed to be used in the embodiment or prior art description will be briefly introduced as follows. Obviously, the drawings in the following description are only some embodiments of the present application, and other drawings can be obtained by those skilled in the art without creative labor.

[0027] Figure 1 It is a front view of the ion source extraction device of the present application;

[0028] Figure 2 It is a front view of the ion source extraction device of the present application; Figure 1 It is a sectional view of the ion source extraction device A-A of the present application;

[0029] Figure 3 It is a right view of the ion source extraction device of the present application;

[0030] Figure 4 It is a front view of the ion source extraction device of the present application; Figure 2 It is a local enlarged view of A in the present application;

[0031] Figure 5 It is a front view of the ion source extraction device of the present application; Figure 2A local enlarged view at B.

[0032] [Explanation of main component symbols]

[0033] 1, support rod; 2, high voltage end flange; 3, insulating ceramic ring; 4, suppression electrode support sleeve; 5, shielding ring; 6, suppression electrode; 7, ground electrode support sleeve; 8, ground electrode; 9, ground flange; 10, extraction vacuum chamber; 11, high voltage feedthrough interface; 12, insulating base; 13, flange plate; 14, first seal; 15, second seal; 16, positioning column; 17, connecting bolt. DETAILED DESCRIPTION

[0034] The structure of the ion source extraction device will be further described in detail below in combination with the drawings and embodiments of the present application.

[0035] It should be noted that the embodiments and features in the embodiments in the present application can be combined with each other without conflict. The present application will be described in detail below with reference to the drawings and in combination with the embodiments.

[0036] It should be noted that the terms used herein are only for describing specific embodiments and are not intended to limit the exemplary embodiments of the present application. As used herein, the singular form is intended to include the plural form, unless the context clearly indicates otherwise, and it should be understood that, when the terms "comprise" and / or "include" are used in the specification, there is a presence of the features, steps, operations, devices, components and / or combinations thereof.

[0037] It should be noted that the terms "first", "second", etc. in the specification and claims of the present application and the above-described drawings are used to distinguish similar objects and do not necessarily describe a specific order or sequence. It should be understood that the data used in this way can be interchanged under appropriate circumstances, so that the embodiments of the present application described herein can be implemented in an order other than those illustrated or described herein. In addition, the terms "include" and "have" and any variations thereof are intended to cover non-exclusive inclusion, for example, a process, method, system, product or device that includes a series of steps or units does not necessarily have to be limited to those steps or units listed, but can include other steps or units not listed or inherent to these processes, methods, products or devices.

[0038] For purposes of the description hereinafter, spatial relative terms, such as "above", "below", "top", "bottom", "upper", "lower", and the like, can be used to describe the relative position of one element or feature to another element or feature as illustrated in the figures. It will be understood that the spatial relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientations depicted in the figures. For example, if a device in the figures is inverted, elements described as "above" or "above" other elements or features would then be oriented "below" or "below" the other elements or features. Thus, the exemplary term "above" can encompass both an orientation of above and below. The device can be otherwise oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein interpreted accordingly. The terms "first", "second" and other similar

[0039] As shown in the accompanying drawings Figures 1-5 The utility model provides a technical scheme:

[0040] A kind of ion source extraction device, including extraction high voltage end flange 2, suppression electrode 6, ground electrode 8 and ground level flange 9;Wherein:The high voltage end flange 2 is installed in ground level flange 9 far from suppression electrode 6 one end by support rod 1, and the insulating ceramic ring 3 that plays the role of insulation high pressure is arranged between high voltage end flange 2 and ground level flange 9, and extraction vacuum chamber 10 is installed in the one end of ground level flange 9 far from high voltage end flange 2;The suppression electrode 6 is installed in the middle part of ground level flange 9 close to high voltage end flange 2 one end, and is concentrically arranged with high voltage end flange 2 and ground level flange 9;The ground electrode 8 is installed in the inside of suppression electrode 6 by ground electrode support sleeve 7, and is concentrically arranged with suppression electrode 6;The ground level flange 9 is installed between high voltage end flange 2 and extraction vacuum chamber 10, and shielding ring 5 playing the role of shielding is also installed between ground level flange 9 and high voltage end flange 2.

[0041] In the above description, by the setting of high voltage end flange 2 and ground level flange 9, the three-layer flange structure of traditional ion source extraction device is changed into two-layer flange structure, and the electrode mounting seat of traditional ion source extraction device is simplified to several support sleeves 1 playing the role of connection support, greatly reduce the machining difficulty and machining cost of parts, and in the process of installation integration, due to the simplified structure, the positioning difficulty of electrode can be reduced, and the distance and concentricity between suppression electrode 9 and ground electrode 8 are more accurate. This relatively simple structure also reduces the space block in the extraction device, improves the pumping efficiency, improves the vacuum between the electrodes, and is more conducive to the extraction and transmission of beam. And this structure electrode is more convenient to disassemble, and maintenance in the later use also becomes more convenient.

[0042] In a preferred embodiment, as Figure 1、 Figure 2 and Figure 4 As shown in FIG. 1 and FIG. 2, the support rods 1 are evenly arranged between the high-voltage flange 2 and the ground flange 9, and the support rods 1, the high-voltage flange 2 and the ground flange 9 are connected by the positioning bolts arranged at both ends of the support rods 1, forming an overall structure. The arrangement of multiple support rods 1 replaces the traditional electrode mounting seat, making the installation and disassembly and maintenance process more flexible and convenient.

[0043] In a preferred embodiment, as shown in FIG. 1 and FIG. 2, the insulating ceramic ring 3 is connected with the high-voltage flange 2 and the ground flange 9 through the second seal 15 on the two end faces, effectively ensuring the airtightness and high electrical isolation between the high-voltage flange 2, the insulating ceramic ring 3 and the ground flange 9. Figure 1 Figure 2 In a preferred embodiment, as shown in FIG. 1 and FIG. 2, the insulating ceramic ring 3 is connected with the high-voltage flange 2 and the ground flange 9 through the second seal 15 on the two end faces, effectively ensuring the airtightness and high electrical isolation between the high-voltage flange 2, the insulating ceramic ring 3 and the ground flange 9.

[0044] In a preferred embodiment, as shown in FIG. 1 and FIG. 2, the insulating ceramic ring 3 is connected with the high-voltage flange 2 and the ground flange 9 through the second seal 15 on the two end faces, effectively ensuring the airtightness and high electrical isolation between the high-voltage flange 2, the insulating ceramic ring 3 and the ground flange 9. Figure 1 Figure 2 In a preferred embodiment, as shown in FIG. 1 and FIG. 2, the insulating ceramic ring 3 is connected with the high-voltage flange 2 and the ground flange 9 through the second seal 15 on the two end faces, effectively ensuring the airtightness and high electrical isolation between the high-voltage flange 2, the insulating ceramic ring 3 and the ground flange 9.

[0045] In a preferred embodiment, as shown in FIG. 1 and FIG. 2, the insulating ceramic ring 3 is connected with the high-voltage flange 2 and the ground flange 9 through the second seal 15 on the two end faces, effectively ensuring the airtightness and high electrical isolation between the high-voltage flange 2, the insulating ceramic ring 3 and the ground flange 9. Figure 1 Figure 2 ​​​As shown, the suppression electrode 6 is installed in the positioning step on the right side of the ground flange 9 through the connecting bolt 17, the suppression electrode 6 is located on the right side of the vacuum chamber 10, and the suppression electrode support sleeve 4 is further sleeved outside the connecting bolt 17. Through the setting of the positioning step, the guiding and restraining effect on the suppression electrode 6 during installation can be facilitated, so as to ensure the concentricity of the suppression electrode 6 with the ground flange 9 after installation, and facilitate the accurate regulation and control of the extraction electric field distribution of the ion beam current by the suppression electrode 6. The suppression electrode support sleeve 4 is made of high-strength insulating materials such as alumina ceramics, which can withstand the mechanical load of the electrode assembly in a vacuum environment, and can avoid displacement of the connecting bolt 17 due to thermal expansion or vibration; secondly, the insulation characteristics of the suppression electrode support sleeve 4 block the leakage current between the suppression electrode 6 and the ground flange 9, ensuring the reliability of high-voltage isolation; at the same time, the cooperation design of the suppression electrode support sleeve 4 and the positioning step can assist the axial alignment of the suppression electrode 6 with the shielding ring 5 and the ground electrode 8, further reducing the influence of assembly error on the symmetry of the electric field, thereby improving the beam transmission efficiency and system anti-discharge capability.

[0046] In a preferred embodiment, as shown in Figure 1 and Figure 2 , the ground electrode 8 is installed on one side of the ground flange 9 through the positioning column 16 and the ground electrode support sleeve 7, and is located inside the suppression electrode 6, and the ground electrode support sleeve 7 is movably sleeved on the positioning column 16 for positioning the ground electrode 8 during use. During use, the ground electrode 8 provides a stable potential reference for the ion beam current and regulates the electric field distribution, while forming an axial electric field gradient with the suppression electrode 6 applying negative high voltage, guiding the ion beam to be extracted along the set trajectory with high efficiency.

[0047] In a preferred embodiment, as shown in Figure 2 and Figure 5 , the extraction vacuum chamber 10 is installed on the right side of the ground flange 9, and a first seal 14 for sealing is installed between the extraction vacuum chamber 10 and the ground flange 9, which ensures the sealing of the connection between the extraction vacuum chamber 10 and the ground flange 9, and a flange plate 13 is integrally formed on the side of the extraction vacuum chamber 10 away from the ground flange 9.

[0048] In the above description, the extraction vacuum chamber 10 is rigidly and sealingly connected to the ground flange 9 through the first seal 14, and a stable high-vacuum environment is constructed to ensure efficient transmission of the ion beam current.

[0049] In a preferred embodiment, as shown in Figure 2 and Figure 5 , the extraction vacuum chamber 10 is further provided with a high-voltage feedthrough interface 11 for installing an SHV high-voltage connector on the high-voltage feedthrough interface 11 during use to provide high voltage for the suppression electrode 9.

[0050] In a preferred embodiment, as shown in Figure 1 、 Figure 2 and Figure 3 , the ion source extraction device further comprises an insulating base 12 mounted at the lower end of the high-voltage flange 2 and the ground flange for fixing the device.

[0051] The use principle of the ion source extraction device comprises:

[0052] The high-voltage flange 2 applies high voltage, and the electrical isolation is realized by the insulating ceramic ring 3 and the ground flange 9, the shielding ring 5 optimizes the electric field distribution between the two flanges to suppress partial discharge; the suppression electrode 6 and the ground electrode 8 (ground) maintain precise concentricity on the ground flange 9, forming an axial gradient electric field to guide the directional acceleration of the ion beam, while suppressing the escape of secondary electrons; the rigid structure composed of the ground electrode support sleeve 7 and the support rod 1 ensures the stability of the electrode spacing, and the compact design of the double-layer flange reduces the internal space obstruction of the vacuum chamber 10, so that the pumping speed can be effectively improved, and the scattering effect of the ionization of residual gas on the beam is effectively reduced.

[0053] The simplified structure makes the ion beam complete the acceleration-focusing-extraction process in a low-loss and high-symmetry electric field, and realizes quick disassembly and maintenance through the modular flange interface, so that the overall transmission efficiency is effectively improved compared with the traditional three-layer structure.

[0054] The above is only a preferred embodiment of the utility model, and is not used to limit the protection scope of the utility model.

Claims

1. An ion source extraction apparatus, characterized by: The application relates to a high-voltage terminal flange (2) arranged at one end of a ground flange (9) away from a suppression electrode (6) through a support rod (1), an insulating ceramic ring (3) is arranged between the high-voltage terminal flange (2) and the ground flange (9), and a lead-out vacuum chamber (10) is arranged at one end of the ground flange (9) away from the high-voltage terminal flange (2); the suppression electrode (6) is arranged in the middle of one end of the ground flange (9) close to the high-voltage terminal flange (2) and is arranged concentrically with the high-voltage terminal flange (2) and the ground flange (9); the ground electrode (8) is arranged on the inner side of the suppression electrode (6) through a ground electrode support sleeve (7) and is arranged concentrically with the suppression electrode (6); the ground flange (9) is arranged between the high-voltage terminal flange (2) and the lead-out vacuum chamber (10) and a shielding ring (5) is arranged between the ground flange (9) and the high-voltage terminal flange (2). The support rod (1) is uniformly arranged between the high-voltage terminal flange (2) and the ground flange (9) and positioning pins are arranged at both ends of the support rod (1) and connected with the high-voltage terminal flange (2) and the ground flange (9). The insulating ceramic ring (3) is connected with the high-voltage terminal flange (2) and the ground flange (9) through a second seal (15). The shielding ring (5) is arranged on one side of the ground flange (9) through a positioning step arranged on the ground flange (9) and a connecting pin (17). The suppression electrode (6) is arranged in the positioning step on one side of the ground flange (9) through the connecting pin (17) and is located between the vacuum chamber (10) and the ground flange (9).

2. An ion source extraction device as claimed in claim 1, characterized in that: The connecting pin (17) is further sleeved with a suppression electrode support sleeve (4) which is in contact with the suppression electrode (6).

3. An ion source extraction device as claimed in claim 1, characterized in that: The ground electrode (8) is arranged on one side of the ground flange (9) through a positioning column (16) and is located on the inner side of the suppression electrode (6).

4. An ion source extraction device as claimed in claim 1, characterized in that: The positioning column (16) is further sleeved with a ground electrode support sleeve (7) which is in contact with the ground electrode (8).

5. An ion source extraction device as in claim 1, wherein: A first seal (14) is arranged between the lead-out vacuum chamber (10) and the ground flange (9) and a flange plate (13) is further arranged on one side of the lead-out vacuum chamber (10) away from the ground flange (9).

6. An ion source extraction device as claimed in claim 5, characterised in that: A high-voltage feedthrough interface (11) is arranged on the lead-out vacuum chamber (10).

7. An ion source extraction device as in claim 1, wherein: ​ 8. An ion source extraction device as claimed in claim 7, characterised in that: ​ 9. An ion source extraction device as in claim 1, wherein: ​ 10. An ion source extraction device as in claim 1, wherein: ​

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