Pre-analysis device and ion implanter
By employing a pre-analysis device with a dual-coil structure, the problem of magnetic leakage from the pre-analysis magnet affecting the ion beam was solved, resulting in more efficient ion beam deflection and lower magnetic field leakage, thus improving the performance of the ion implanter.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-03-25
- Publication Date
- 2026-03-03
AI Technical Summary
The leakage magnetic field of existing pre-analysis magnets can easily affect the ion beam, especially at the center of the ion source, thus affecting the extraction effect of the ion beam.
The pre-analytical device employs a dual-coil structure, with coils installed on both the upper and lower magnetic pole assemblies to reduce magnetic field leakage and minimize the impact on the ion source center.
It effectively reduces magnetic field leakage, minimizes the influence of the ion source center, and improves the accuracy and stability of ion beam deflection.
Smart Images
Figure CN223967181U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of semiconductor processing equipment technology, and more specifically, to a pre-analysis device and an ion implanter. Background Technology
[0002] Ion implantation technology utilizes an ion implanter to dope semiconductors. Specifically, it extracts ions generated by an ion source and, using acceleration, magnetic field screening, and ion beam parallelization devices, injects these ions into a silicon semiconductor crystal at a specific angle and energy. This alters the crystal's conductivity and ultimately forms a transistor structure. Among various implanter types, medium-current ion implanters employ two magnetic field screening devices: a pre-analysis magnet and an analysis magnet. By adjusting the magnet coil parameters, a corresponding magnetic field is generated. When the ion beam passes through this magnetic field, it is deflected at a specific angle. The pre-analysis magnet deflects the beam by 25°, while the analysis magnet deflects it by 90°. After these two stages of deflection, the desired ion beam is obtained.
[0003] Currently, the mainstream pre-analytical magnets on the market use a single-coil design, such as... Figure 1 As shown, the structure includes a magnetic yoke 1', an upper yoke arm 11', a lower yoke arm 12', a coil 2', and a magnetic pole 3'. The magnetic field generated by this coil is prone to magnetic leakage to the outside environment. Since the pre-analysis magnet is close to the ion source, its leakage magnetic field will have a certain impact on the extraction of the ion beam. Through simulation calculations and actual measurements, when the pre-analysis magnet current is 12A, the impact on the center of the ion source is approximately 38.7GS. Utility Model Content
[0004] In view of the shortcomings of the prior art, this utility model innovatively provides a pre-analysis device and an ion implanter, which can solve the technical problem that leakage of the pre-analysis magnet can easily affect the ion beam.
[0005] To achieve the aforementioned technical objectives, the first aspect of this utility model discloses a pre-analysis device, comprising:
[0006] A magnetic yoke, wherein the magnetic yoke is a long strip structure and mounting positions are formed at both ends of the magnetic yoke;
[0007] An upper magnetic pole assembly and a lower magnetic pole assembly are respectively mounted on the mounting positions at both ends of the magnetic yoke.
[0008] An ion channel is formed between the upper magnetic pole assembly and the lower magnetic pole assembly, and a magnetic field is generated in the ion channel after energization.
[0009] Furthermore, the upper magnetic pole assembly includes an upper magnetic head and an upper coil, the upper coil being sleeved on the upper magnetic head.
[0010] The lower magnetic pole assembly includes a lower magnetic head and a lower coil, with the lower coil sleeved on the lower magnetic head.
[0011] Furthermore, the upper magnetic head and the lower magnetic head have the same structure, both including a first segment and a second segment, the cross-section of the first segment and the second segment is fan-shaped, and a baffle is formed between the first segment and the second segment.
[0012] Furthermore, the upper coil is sleeved on the first segment of the upper magnetic head, and the lower coil is sleeved on the first segment of the lower magnetic head.
[0013] Furthermore, the second segment of the upper magnetic head and the second segment of the lower magnetic head are arranged opposite to each other, and the ion channel is formed between the second segment of the upper magnetic head and the second segment of the lower magnetic head.
[0014] Furthermore, the magnetic yoke is provided with an upper magnetic yoke arm and a lower magnetic yoke arm, which are respectively installed at two mounting positions on the magnetic yoke.
[0015] Furthermore, the first section of the upper magnetic head is connected to the upper magnetic yoke arm.
[0016] The first section of the lower magnetic head is connected to the lower magnetic yoke arm.
[0017] The second aspect of this utility model discloses an ion implanter, including the aforementioned pre-analysis device.
[0018] Furthermore, the ion implanter also includes a vacuum box and an ion source, wherein a vacuum chamber is formed within the vacuum box, and the ion source is disposed within the vacuum chamber.
[0019] The ion channel of the pre-analysis device is located in the vacuum chamber, and the ion channel is used to deflect the ion beam generated by the ion source by a preset angle.
[0020] The beneficial effects of this utility model are as follows:
[0021] The pre-analysis device provided by this utility model adopts a dual-coil structure, with coils set in the upper and lower magnetic pole components to reduce magnetic field leakage and reduce the impact on the ion source center. Attached Figure Description
[0022] Figure 1 This diagram illustrates the structure of a magnet analyzed using existing related technologies.
[0023] Figure 2 This diagram shows the structure of the pre-analysis device according to an embodiment of the present invention;
[0024] Figure 3This diagram shows an exploded structural schematic of the pre-analysis device according to an embodiment of the present invention;
[0025] Figure 4 A partial structural schematic diagram of the ion implanter according to an embodiment of the present invention is shown.
[0026] In the picture,
[0027] 1', Magnetic yoke; 11', Upper yoke arm; 12', Lower yoke arm; 2', Coil; 3', Magnetic pole;
[0028] 1. Magnetic yoke; 101. Mounting position; 11. Upper magnetic yoke arm; 12. Lower magnetic yoke arm; 2. Upper magnetic pole assembly; 21. Upper magnetic head; 22. Upper coil; 3. Lower magnetic pole assembly; 31. Lower magnetic head; 32. Lower coil; 4. Vacuum box; 5. Ion source; 51. Ion source center. Detailed Implementation
[0029] The pre-analysis device and ion implanter provided by this utility model will be explained and described in detail below with reference to the accompanying drawings.
[0030] The pre-analysis device provided by this invention adopts a dual-coil structure. Compared with the existing single-coil mode, under the same magnetic field requirements, the single coil is larger in size and has a greater impact on surrounding components. The upper and lower magnetic pole assemblies are equipped with coils respectively, which reduces the coil size and also reduces magnetic field leakage, thus minimizing the impact on the ion source center. Furthermore, the upper and lower coils are closer to the upper and lower magnetic heads respectively, allowing the generated magnetic field to be directly transmitted to the magnetic pole heads, thereby more effectively acting on the ion beam to generate the required deflection and screening.
[0031] The pre-analysis device provided by this utility model adopts a dual-coil structure, with coils respectively installed in the upper and lower magnetic pole assemblies to reduce magnetic field leakage and minimize the impact on the ion source center. The following detailed description of this utility model is provided in conjunction with specific embodiments:
[0032] In some embodiments, the present invention provides a pre-analysis device, such as... Figure 2 , Figure 3 As shown, it includes a magnetic yoke 1 and an upper magnetic pole assembly 2 and a lower magnetic pole assembly 3 disposed on the magnetic yoke 1. An ion channel is formed between the upper magnetic pole assembly 2 and the lower magnetic pole assembly 3, and a magnetic field is formed in the ion channel to pre-deflect the ion beam passing through the ion channel, so that the ion beam is deflected by 25°.
[0033] The magnetic yoke 1 is a long strip structure with mounting positions 101 formed at both ends. In use, the magnetic yoke 1 is in a vertical position. Mounting positions 101 are formed at the upper and lower ends of the magnetic yoke 1, respectively, for mounting the upper magnetic pole assembly 2 and the lower magnetic pole assembly 3. Optionally, the magnetic yoke 1 is made of iron, preferably pure iron, which has good magnetic permeability. The magnetic yoke 1 is used to conduct magnetic field lines and prevent magnetic field leakage.
[0034] The upper magnetic pole assembly 2 includes an upper magnetic head 21 and an upper coil 22, with the upper coil 22 mounted on the upper magnetic head 21. The lower magnetic pole assembly 3 includes a lower magnetic head 31 and a lower coil 32, with the lower coil 32 mounted on the lower magnetic head 31. Both the upper magnetic head and the lower magnetic head 31 are made of ferrous material, for example, pure iron. Optionally, the upper magnetic head 21 and the lower magnetic head 31 have the same structure, each including a first segment and a second segment. The cross-section of the first and second segments is fan-shaped, and a baffle is formed between the first and second segments. The upper coil 22 is mounted on the first segment of the upper magnetic head 21, and the lower coil 32 is mounted on the first segment of the lower magnetic head 31. Power lines are led out from the upper coil 22 and the lower coil 32 respectively for connecting to a power source. The baffle can block and limit the movement of the upper magnetic head 21 and the upper coil 22 and the lower magnetic head 31.
[0035] The second section of the upper magnetic head 21 and the second section of the lower magnetic head 31 are arranged opposite to each other, and an ion channel is formed between the second section of the upper magnetic head 21 and the second section of the lower magnetic head 31. The ion beam can be pre-deflected by 25° under the action of a magnetic field through the ion channel.
[0036] In some embodiments, the magnetic yoke 1 is provided with an upper magnetic yoke arm 11 and a lower magnetic yoke arm 12, which are respectively mounted on mounting positions 101 at both ends of the magnetic yoke 1. Optionally, the upper magnetic yoke arm 11 and the lower magnetic yoke arm 12 are separately provided from the magnetic yoke 1 and then connected by bolts or other connecting parts. Alternatively, the upper magnetic yoke arm 11 and the lower magnetic yoke arm 12 can also be integrally formed with the magnetic yoke 1.
[0037] The upper magnetic pole assembly 2 is mounted on the upper magnetic yoke arm 11, and the lower magnetic pole assembly 3 is mounted on the lower magnetic yoke arm 12. Optionally, the end of the first segment of the upper magnetic head 21 is connected to the upper magnetic yoke arm 11, and the end of the first segment of the lower magnetic head 31 is connected to the lower magnetic yoke arm 12.
[0038] In some embodiments, the present invention provides an ion implanter, such as... Figure 4 As shown, the device includes a vacuum box 4, an ion source 5, and the aforementioned pre-analysis device. A vacuum chamber is formed inside the vacuum box 4, and the ion source 5 is disposed inside the vacuum chamber. The ion channel of the pre-analysis device is located inside the vacuum chamber. Optionally, the upper magnetic head 21 and the lower magnetic head 31 extend into the vacuum chamber, and the upper magnetic yoke arm 11 and the lower magnetic yoke arm 12 are sealed to the top and bottom plates of the vacuum box 4.
[0039] When the upper coil 22 and lower coil 32 are energized, they both generate magnetic fields. These magnetic fields are conducted through the upper magnetic head 21, lower magnetic head 31, upper magnetic yoke arm 11, lower magnetic yoke arm 12, and magnetic yoke 1, forming a specifically distributed magnetic field within the ion channel between the upper and lower magnetic heads 21 and 31. The ion beam generated by the ion source 5 is deflected by 25° under the influence of the magnetic field. Furthermore, simulation calculations and actual measurements show that when the current in the upper coil 22 and lower coil 32 is 2A, the magnetic field leakage is greatly reduced, with an impact on the center of the ion source 5 of approximately 6.3GS, a significant reduction compared to the 38.7GS impact on the center of the ion source 51 in existing technologies.
[0040] In the description of this utility model, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc., indicating the orientation or positional relationship are based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this utility model and simplifying the description, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model.
[0041] In this utility model, unless otherwise explicitly specified and limited, the terms "installation," "connection," "joining," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components, unless otherwise explicitly limited. Those skilled in the art can understand the specific meaning of the above terms in this utility model according to the specific circumstances.
[0042] In the description of this specification, the references to terms such as "this embodiment," "an embodiment," "some embodiments," "example," "specific example," or "some examples," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment or example is included in at least one embodiment or example of the present invention. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in a suitable manner in any at least one embodiment or example. Moreover, without contradiction, those skilled in the art can combine and integrate the different embodiments or examples described in this specification, as well as the features of different embodiments or examples.
[0043] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this utility model, "a plurality of" means at least two, such as two, three, etc., unless otherwise explicitly specified.
[0044] The above are merely preferred embodiments of the present utility model and are not intended to limit the present utility model. Any modifications, equivalent substitutions, and simple improvements made on the substantive content of the present utility model should be included within the protection scope of the present utility model.
Claims
1. A pre-analysis device, characterized in that, include: A magnetic yoke, wherein the magnetic yoke is a long strip structure and mounting positions are formed at both ends of the magnetic yoke; An upper magnetic pole assembly and a lower magnetic pole assembly are respectively mounted on the mounting positions at both ends of the magnetic yoke. An ion channel is formed between the upper magnetic pole assembly and the lower magnetic pole assembly, and a magnetic field is generated in the ion channel after energization.
2. The pre-analysis apparatus according to claim 1, characterized in that, The upper magnetic pole assembly includes an upper magnetic head and an upper coil, with the upper coil sleeved on the upper magnetic head. The lower magnetic pole assembly includes a lower magnetic head and a lower coil, with the lower coil sleeved on the lower magnetic head.
3. The pre-analysis apparatus according to claim 2, characterized in that, The upper and lower magnetic heads have the same structure, each including a first segment and a second segment. The cross-sections of the first and second segments are fan-shaped, and a baffle is formed between the first and second segments.
4. The pre-analysis apparatus according to claim 3, characterized in that, The upper coil is sleeved on the first section of the upper magnetic head, and the lower coil is sleeved on the first section of the lower magnetic head.
5. The pre-analysis apparatus according to claim 4, characterized in that, The second segment of the upper magnetic head and the second segment of the lower magnetic head are arranged opposite to each other, and the ion channel is formed between the second segment of the upper magnetic head and the second segment of the lower magnetic head.
6. The pre-analysis apparatus according to claim 5, characterized in that, The magnetic yoke is provided with an upper magnetic yoke arm and a lower magnetic yoke arm, which are respectively installed in two mounting positions on the magnetic yoke.
7. The pre-analysis apparatus according to claim 6, characterized in that, The first section of the upper magnetic head is connected to the upper magnetic yoke arm. The first section of the lower magnetic head is connected to the lower magnetic yoke arm.
8. An ion implanter, characterized in that, Includes the pre-analysis apparatus as described in any one of claims 1-7.
9. The ion implanter according to claim 8, characterized in that, The ion implanter also includes a vacuum box and an ion source. A vacuum chamber is formed inside the vacuum box, and the ion source is disposed inside the vacuum chamber. The ion channel of the pre-analysis device is located in the vacuum chamber, and the ion channel is used to deflect the ion beam generated by the ion source by a preset angle.