Exposure device
By detecting mask contamination with an image acquisition device and using a switcher to replace the cleaner, the problem of poor exposure caused by mask contamination was solved, and the stability and production efficiency of the exposure device were improved.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-04-07
- Publication Date
- 2026-03-06
AI Technical Summary
In the photovoltaic module production line process, foreign particles on the mask and the surface of the solar cells can interfere with the exposure light source, causing batch printing contamination and poor exposure, which affects production efficiency.
An image acquisition device is used to acquire images of the mask, dark spots are detected, and a switcher is used to replace the mask with a spare. A cleaner is used to clean the contaminated mask to ensure exposure quality.
It improves the operational stability of the exposure device, avoids the impact of mask contamination on exposure quality, and increases production efficiency.
Smart Images
Figure CN223977498U_ABST
Abstract
Description
Technical Field
[0001] This application relates to the field of exposure technology, and in particular to an exposure apparatus. Background Technology
[0002] In the photovoltaic module production line process, the entire process flow includes: incoming yellow film solar cells - coating - printing - developing - edge wrapping - electroplating, etc. The printing process involves exposing the surface of the coated solar cell with the photosensitive emulsion film to light, causing a change in the properties of the photosensitive emulsion. Simultaneously, a patterned mask blocks the light source. As the light shines through the mask onto the underlying solar cell, the patterned areas on the mask prevent the light from reaching the cell surface, while the photosensitive emulsion in the unshaded areas changes its properties upon exposure. In the subsequent developing process, the unchanged photosensitive emulsion is washed away, revealing the underlying copper film, thus achieving the purpose of grooving. Copper grid lines are then grown in these grooves.
[0003] However, in actual production, due to the less-than-ideal cleanliness of the workshop, the coated solar cells will have some foreign particles attached to their surface when transported to the printing process, including debris, dust particles, etc. During the exposure process, because the distance between the mask and the solar cell is small (only tens of micrometers), the dust particles on the surface of the solar cell can easily stick to the mask. After the dust particles accumulate, they will interfere with the exposure light source, resulting in subsequent batch printing contamination and causing poor batch exposure of solar cells at the same location. Utility Model Content
[0004] Based on this, this application provides an exposure device that can ensure the cleanliness of the photomask.
[0005] This application provides an exposure apparatus, the exposure apparatus comprising:
[0006] An exposure mechanism, the exposure mechanism including a platform for placing the workpiece to be exposed.
[0007] A switcher includes a first fixing member, a second fixing member, and a first driving component. The first fixing member and the second fixing member are respectively disposed on different sides of the first driving component. A mask is respectively disposed on the first fixing member and the second fixing member. The mask on the first fixing member or the mask on the second fixing member is located within the exposure mechanism. The first driving component is used to switch the positions of the first fixing member and the second fixing member.
[0008] An image acquisition device is used to acquire images of the mask in the exposure mechanism.
[0009] In some embodiments, the exposure mechanism further includes an exposure light source for illuminating the workpiece to be exposed, the exposure light source being inclined relative to the mask.
[0010] In some embodiments, the angle between the line connecting the exposure light source and the center of the mask and the plane on which the mask is located is 30° to 60°.
[0011] In some embodiments, the exposure apparatus further includes a pick-up device for removing the mask switched out by the switcher.
[0012] In some embodiments, the exposure apparatus further includes a processing stage for holding a mask plate removed by the feeder.
[0013] In some embodiments, the feeder includes a guide rail, an adsorption element, and a second driving component. The guide rail is arranged along the switch toward the processing table. The adsorption element is slidably disposed on the guide rail and is used to pick up the mask plate. The second driving component is used to drive the adsorption element to slide along the guide rail.
[0014] In some embodiments, the exposure apparatus further includes a cleaner disposed on the processing stage, the cleaner being used to clean the mask.
[0015] In some embodiments, the cleaner includes an air jet disposed on the processing table for purging opposite side surfaces of the mask.
[0016] In some embodiments, the first driving component includes a rotary driving component, one end of which is connected to the first fixing member and the other end of which is connected to the second fixing member. The rotary driving component is used to drive the first fixing member and the second fixing member to exchange positions.
[0017] In some embodiments, the first fixing member includes a first fixing frame, the inner side of which is provided with a first recessed step platform along the circumferential direction, and the mask plate is placed on the first recessed step platform; and / or,
[0018] The second fixing member includes a second fixing frame, and a second concave ladder is provided on the inner side of the second fixing frame along the circumferential direction. The mask plate is placed on the second concave ladder.
[0019] Compared with traditional technologies, this application has at least the following beneficial effects:
[0020] This application utilizes an image acquisition device to acquire images of a mask within the exposure mechanism. When dark spots appear in the unobstructed area of the image, indicating that dust particles are attached to the mask, the positions of the first and second fixing components are adjusted by a switcher to replace the spare mask in the exposure mechanism and remove the contaminated mask from the mask, thus avoiding mask contamination from affecting the exposure quality and improving the operational stability of the exposure device. Attached Figure Description
[0021] Figure 1 This is a front view of an exposure apparatus provided in one embodiment of this application;
[0022] Figure 2 This is a top view of an exposure apparatus provided in one embodiment of this application;
[0023] Figure 3 This is a partial view of a second fastener provided in one embodiment of this application.
[0024] Among them, 100-exposure mechanism; 110-stage; 120-exposure light source; 200-switcher; 210-first fixing component; 220-second fixing component; 221-second concave ladder; 230-first driving component; 300-image acquisition device; 400-material picker; 410-guide rail; 420-adsorption component; 500-processing table. Detailed Implementation
[0025] The present application will be further described in detail below with reference to the accompanying drawings, embodiments, and examples. These embodiments and examples are for illustrative purposes only and are not intended to limit the scope of the present application. The purpose of providing these embodiments and examples is to enable a more thorough and comprehensive understanding of the disclosure of the present application. It should also be understood that the present application can be implemented in many different forms and is not limited to the embodiments and examples described herein. Those skilled in the art can make various modifications or alterations without departing from the spirit of the present application, and the equivalent forms obtained also fall within the protection scope of the present application. Furthermore, numerous specific details are set forth in the following description to provide a fuller understanding of the present application. It should be understood that the present application can be implemented without one or more of these details.
[0026] It should be understood that the terms "upper", "lower", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", and "outer" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this application.
[0027] In the description of this application, unless otherwise expressly specified and limited, the terms "connected," "linked," "fixed," and "set" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the meaning of the above terms in this application according to the specific circumstances.
[0028] In this application, "optionally," "optionally," and "optional" mean that something is optional, that is, it means that it is selected from either "with" or "without." If there are multiple "optional" entries in a technical solution, unless otherwise specified, and there are no contradictions or mutual constraints, each "optional" entry shall be independent.
[0029] In this application, the technical features described in an open-ended manner include both closed technical solutions consisting of the listed features and open technical solutions that include the listed features.
[0030] In this application, the terms "first," "second," etc., are used for descriptive purposes only and should not be construed as indicating or implying relative importance or quantity, nor should they be construed as implicitly indicating the importance or quantity of the indicated technical features. Moreover, "first," "second," etc., serve only as a non-exhaustive enumeration and should be understood not to constitute a closed limitation on quantity.
[0031] All references to this application are incorporated herein by reference as if each document were individually incorporated herein by reference. Unless they conflict with the purpose and / or technical solution of this application, all cited references are incorporated herein by reference in their entirety and for all purposes. When references are cited in this application, the definitions of relevant technical features, terms, nouns, phrases, etc., are also incorporated herein by reference. Examples and preferred embodiments of the cited technical features may also be incorporated herein by reference, but only to the extent that they enable the implementation of this application. It should be understood that when the cited content conflicts with the description in this application, this application shall prevail or modifications shall be made adaptably to the description in this application.
[0032] In traditional technology, the photomask can easily come into contact with the solar cell in the exposure device, leading to photomask contamination. Dust particles on the photomask may block the exposure light, resulting in incomplete exposure of the part of the solar cell to be exposed. Moreover, if this is discovered too late, it will cause poor exposure of a batch of solar cells, seriously affecting production efficiency.
[0033] Based on this, this application provides an exposure device, such as... Figure 1 and Figure 2As shown, the exposure device includes an exposure mechanism 100, a switcher 200, and an image acquisition device 300.
[0034] The exposure mechanism 100 includes a platform 110, which is used to place the object to be exposed.
[0035] The switcher 200 includes a first fixing member 210, a second fixing member 220, and a first driving component 230. The first fixing member 210 and the second fixing member 220 are respectively disposed on different sides of the first driving component 230. A mask is respectively disposed on the first fixing member 210 and the second fixing member 220. The mask on the first fixing member 210 or the mask on the second fixing member 220 is located within the exposure mechanism 100. The first driving component 230 is used to switch the positions of the first fixing member 210 and the second fixing member 220. The image acquisition unit 300 is used to acquire images of the masks in the exposure mechanism 100.
[0036] This application utilizes an image acquisition device 300 to acquire images of a mask plate located within the exposure mechanism 100. When dark spots appear in the unobstructed area of the image, indicating that dust particles are attached to the mask plate, the positions of the first fixing member 210 and the second fixing member 220 are adjusted by the switcher 200 to replace the spare mask plate into the exposure mechanism 100 and remove the contaminated mask plate from the mask plate, thereby avoiding mask plate contamination from affecting the exposure quality and improving the operational stability of the exposure device.
[0037] It is understood that in this application, the first fixing member 210 and the second fixing member 220 are used to support the mask plate, respectively. When contamination is detected on the mask plate located between the exposure light source 120 and the stage 110, the mask plate in the exposure mechanism 100 can be replaced by switching the first fixing member 210 and the second fixing member 220.
[0038] Understandably, a photomask is a light-transmitting plate with a light-blocking pattern. When the exposure light source 120 shines on the photomask, the parts with the light-blocking pattern will block the light from passing through, thereby forming patterned light on the other side of the photomask, so that only the parts of the workpiece that are not blocked by the light-blocking pattern on the photomask are exposed.
[0039] Understandably, the switcher 200 can also be equipped with multiple fixtures for placing photomasks. This means multiple photomasks can be installed for backup.
[0040] In some embodiments, the exposure mechanism 100 further includes an exposure light source 120, which is used to illuminate the workpiece to be exposed. The exposure light source 120 is inclined relative to the mask. That is, the exposure light source 120 is not positioned directly above the mask, and the light emitted by the exposure light source 120 is clamped to the center of the mask. This application arranges the exposure light source 120 and the mask at an angle, so that the exposure light source 120 can form reflected light on the mask, thereby improving the acquisition effect of the image acquisition device 300 and further ensuring the accuracy of the image acquisition device 300 in detecting dirt on the mask.
[0041] Understandably, due to the different refractive indices of the photomasks, the position of the part to be exposed or the position of the exposure light source 120 can be adjusted according to different photomasks so that the light projected by the exposure light source 120 through the photomask can be perpendicularly illuminating the part to be exposed.
[0042] In some embodiments, the angle between the line connecting the exposure light source 120 and the center of the mask and the plane on which the mask is located is 30° to 60°, for example, 30°, 35°, 40°, 45°, 50°, 55° or 60°.
[0043] In some embodiments, such as Figure 2 As shown, the exposure apparatus also includes a picker 400, which is used to remove the mask switched out by the switcher 200. Optionally, the picker 400 can be located on the side of the switcher 200 away from the exposure mechanism 100. The picker 400 can remove the contaminated mask replaced in the exposure mechanism 100 from the switcher 200, thereby cleaning or replacing the contaminated mask.
[0044] In some embodiments, such as Figure 2 As shown, the exposure apparatus also includes a processing stage 500 for holding the mask plate removed by the feeder 400. This application provides a processing stage 500 for holding the mask plate, which can process contaminated mask plates, facilitating handling and operation.
[0045] In some embodiments, such as Figure 2 As shown, the feeder 400 includes a guide rail 410, an adsorption element 420, and a second driving component (not shown in the figure). The guide rail 410 is arranged along the direction of the switch 200 toward the processing table 500. The adsorption element 420 is slidably disposed on the guide rail 410 and is used to pick up the mask plate. The second driving component is used to drive the adsorption element 420 to slide along the guide rail 410. The adsorption element 420 can be a suction cup. This application utilizes the second driving component to drive the adsorption element 420 to move along the guide rail 410, thereby realizing the loading and unloading of the mask plate.
[0046] In some embodiments, the exposure apparatus further includes a cleaner (not shown) disposed on the processing stage 500, which is used to clean the mask.
[0047] In some embodiments, the cleaner includes a jetting element disposed on a processing table 500 for purging opposite side surfaces of a mask.
[0048] This application uses a cleaner to treat contaminated photomasks. Since the dirt on the photomasks is mainly dust particles with weak adhesion, an air jet can be used to blow the photomasks, thereby removing the dust particles adhering to the photomasks and cleaning them.
[0049] In some embodiments, such as Figure 1 and Figure 2 As shown, the first driving component 230 includes a rotary driving component. One end of the rotary driving component is connected to the first fixing member 210, and the other end is connected to the second fixing member 220. The rotary driving component is used to drive the first fixing member 210 and the second fixing member 220 to exchange positions. This application utilizes a rotary driving component to drive the first fixing member 210 and the second fixing member 220 to switch positions. The switching method is simple and efficient, effectively ensuring exposure efficiency.
[0050] In some embodiments, the first fixing member 210 includes a first fixing frame, and a first concave step is provided on the inner side of the first fixing frame along the circumferential direction, and the mask plate is placed on the first concave step.
[0051] In some embodiments, such as Figure 3 As shown, the second fixing member 220 includes a second fixing frame, and a second concave step 221 is provided on the inner side of the second fixing frame along the circumferential direction. The mask plate is placed on the second concave step 221. In this application, the fixing member is configured with a concave step 221 provided along the inner circumference, which can limit and fix the mask plate, thereby improving the stability of the mask plate.
[0052] In some embodiments, the exposure apparatus further includes a controller, which is electrically connected to the image acquisition unit 300 and the switcher 200 respectively. The controller is used to receive the identification signal from the image acquisition unit 300 and to feed back and control the switcher 200 to replace the mask in the exposure mechanism 100.
[0053] In some embodiments, the exposure apparatus further includes an alarm electrically connected to the image acquisition unit 300. When the image acquisition unit 300 detects dust particles on the mask, the alarm sounds an alarm signal to remind staff to clean or replace the contaminated mask and check the exposure quality of the solar cells.
[0054] In some embodiments, the image acquisition device 300 may be a camera. It is understood that the images acquired by the image acquisition device 300 can be manually identified or identified with the assistance of a computer. Optionally, the image acquisition device 300 is positioned on the side of the mask closer to the exposure light source 120, and can detect whether the mask is contaminated by dust affecting the exposure effect by detecting the reflected light from the mask.
[0055] In some embodiments, the stage 110 is disposed on a slide rail, and the stage 110 moves on the slide rail to expose different objects to be exposed.
[0056] An exposure method for the above-described exposure apparatus is provided, comprising the following steps:
[0057] S1. Place the mask plate on the first fixing member 210 between the exposure light source 120 and the object to be exposed, and start the exposure process.
[0058] S2. The image acquisition unit 300 acquires images of the mask located in the exposure mechanism 100 and determines whether the mask is contaminated based on whether there are dark spots in the non-occluded area of the mask in the image. When no dark spots are detected in the non-occluded area of the mask, that is, the mask is not contaminated, the exposure mechanism 100 continues to work. When dark spots are detected in the non-occluded area of the mask, that is, the mask is contaminated, the switcher 200 removes the first fixing member 210 from the exposure mechanism 100 and replaces the mask on the second fixing member 220 with the mask in the exposure mechanism 100.
[0059] S3. For the mask plate replaced by the switcher 200, the adsorption component 420 is used to remove the mask plate from the first fixing component 210 and transfer it to the processing table 500. The air jet component is used to clean the mask plate and remove the dust particles on the mask plate.
[0060] S4. The cleaned mask plate is transferred to the first fixing member 210 using the adsorption member 420 for later use.
[0061] In summary, this application utilizes the image acquisition unit 300 to acquire images of the mask plate located within the exposure mechanism 100. When dark spots appear in the unobstructed area of the image, indicating that dust particles are attached to the mask plate, the positions of the first fixing member 210 and the second fixing member 220 are adjusted by the switcher 200 to replace the spare mask plate into the exposure mechanism 100 and remove the contaminated mask plate from the mask plate, thereby avoiding mask plate contamination from affecting the exposure quality and improving the operational stability of the exposure device.
[0062] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.
[0063] The above embodiments are merely illustrative of several implementation methods of this application, and their descriptions are relatively specific and detailed, but they should not be construed as limiting the scope of the application. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this application, and these all fall within the protection scope of this application. Therefore, the protection scope of this application should be determined by the appended claims.
Claims
1. An exposure apparatus characterized by comprising: The exposure device comprises: An exposure mechanism (100), wherein the exposure mechanism (100) comprises a placing table (110) for placing a piece to be exposed; A switcher (200), wherein the switcher (200) comprises a first fixing piece (210), a second fixing piece (220) and a first driving component (230), the first fixing piece (210) and the second fixing piece (220) are respectively arranged on different sides of the first driving component (230), the first fixing piece (210) and the second fixing piece (220) are respectively provided with mask plates, the mask plate on the first fixing piece (210) or the mask plate on the second fixing piece (220) is located in the exposure mechanism (100), and the first driving component (230) is used for switching the positions of the first fixing piece (210) and the second fixing piece (220); and An image collector (300), wherein the image collector (300) is used for collecting images of the mask plates in the exposure mechanism.
2. The exposure apparatus according to claim 1, wherein The exposure device further comprises an exposure light source (120), wherein the exposure light source (120) is used for irradiating the piece to be exposed, and the exposure light source (120) is arranged obliquely relative to the mask plates.
3. The exposure apparatus according to claim 2, wherein An angle between a line connecting the exposure light source (120) and the center of the mask plate and a plane where the mask plate is located is 30°-60°.
4. The exposure apparatus according to claim 1, wherein The exposure device further comprises a material taking device (400), wherein the material taking device (400) is used for disassembling the mask plate switched out by the switcher (200).
5. The exposure apparatus according to claim 4, wherein The exposure device further comprises a processing table (500), wherein the processing table (500) is used for placing the mask plate disassembled by the material taking device (400).
6. The exposure apparatus according to claim 5, wherein The material taking device (400) comprises a guide rail (410), a suction accessory (420) and a second driving component, the guide rail (410) is arranged along a direction from the switcher (200) to the processing table (500), the suction accessory (420) is slidingly arranged on the guide rail (410), the suction accessory (420) is used for sucking the mask plate, and the second driving component is used for driving the suction accessory (420) to slide along the guide rail (410).
7. The exposure apparatus according to claim 5, wherein The exposure device further comprises a cleaning device, wherein the cleaning device is arranged on the processing table (500), and the cleaning device is used for cleaning the mask plate.
8. The exposure apparatus according to claim 7, wherein The cleaning device comprises a gas spraying device arranged on the processing table (500), and the gas spraying device is used for blowing the opposite two side surfaces of the mask plate.
9. The exposure apparatus according to any one of claims 1-8, wherein The first driving component (230) comprises a rotary driving component, one end of the rotary driving component is connected with the first fixing piece (210), the other end of the rotary driving component is connected with the second fixing piece (220), and the rotary driving component is used for driving the first fixing piece (210) and the second fixing piece (220) to exchange positions.
10. The exposure apparatus according to any one of claims 1 to 8, wherein The first fixing piece (210) comprises a first fixed frame, an inner side of the first fixed frame is provided with a first inner concave terrace along a circumference, and the mask plate is arranged on the first inner concave terrace; and / or, The second fixing member (220) comprises a second fixing frame, and a second inner concave step (221) is arranged on the inner side of the second fixing frame in a circumferential direction, and the mask is arranged on the second inner concave step (221).