Macroscopic detection light source device of visual inspection machine
By introducing fine-tuning knobs, filter components, and multi-angle illumination components into the semiconductor visual inspection machine, the limitations of light source adjustment and the problem of missed detection caused by a single light source have been solved, resulting in more efficient inspection and improved product yield.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-04-30
- Publication Date
- 2026-03-10
AI Technical Summary
Existing semiconductor visual inspection machines have limitations in illuminance adjustment, single illumination position, and a high probability of missed detection due to the single light source, which affects product yield.
It employs a light source module with a fine-tuning knob, a filter assembly, and a multi-angle illumination assembly to achieve micro-adjustment of light source parameters and multi-color, multi-angle illumination, thereby enhancing the selection of light source conditions.
By selecting light sources with multiple angles and colors, the probability of missed detections can be reduced, and the product yield can be improved.
Smart Images

Figure CN223985098U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model relates to the technical field of semiconductor manufacturing, especially relates to a macroscopical detection light source device of visual inspection machine. BACKGROUND
[0002] With the rapid development of semiconductor process technology, the chip volume is smaller and smaller, and the function is stronger and stronger, and the requirement of chip manufacturing is higher and higher. Wafer detection is an indispensable process in chip manufacturing process, which verifies and improves the quality of process and improves yield through wafer detection.
[0003] In the semiconductor industry, visual inspection equipment (visual inspection machine) is an instrument for observing wafer defects under a specific light source. Visual inspection is an important work in semiconductor wafer testing, which observes whether the measured wafer has defects by naked eye. Visual inspection mainly includes the following inspection contents: detecting whether there are defects (mainly referring to dust particles, scratches, residues, etc.) on the measured wafer, and for pattern wafer products with circuit patterns printed, mainly performing appearance inspection on the flatness, coplanarity, pin distance, printing clarity and damage of the adhesive of the external pins.
[0004] However, the detection light source used in the visual inspection process of the prior art still has many problems. UTILITY MODEL CONTENTS
[0005] The technical problem solved by the utility model is to provide a macroscopical detection light source device of visual inspection machine to reduce the missed detection probability and improve product yield.
[0006] To solve the above problems, the utility model technical scheme provides a macroscopical detection light source device of visual inspection machine, which comprises: a light source module, the light source module has a fine tuning knob, the fine tuning knob is used for adjusting the light source parameters in the light source module; a light filtering assembly, the light filtering assembly has a plurality of light filters of different colors, the light filters are used for filtering the light emitted by the light source module; a first light transmission assembly, the first light transmission assembly is connected with the light source module, and the first light transmission assembly is used for transmitting the filtered light to the visual inspection machine; a multi-angle irradiation assembly, the multi-angle irradiation assembly is used for irradiating the wafer to be detected on the visual inspection machine at different angles.
[0007] Optionally, the light source parameters include: illuminance and color temperature.
[0008] Optionally, the illuminance adjustment range in the light source parameters is: 1000 lux~2000 lux; the color temperature adjustment range in the light source parameters is: 5000 K~6500 K.
[0009] Optionally, the light filtering assembly further comprises a converter, the plurality of filters are connected with the converter, and the converter is used to convert the filters of different colors to filter the light emitted by the light source module.
[0010] Optionally, the light transmitted after the light filtering treatment of the filters comprises yellow light, blue light, white light, gray light, purple light or orange light.
[0011] Optionally, the first light transmission assembly uses optical fiber as a medium for light transmission.
[0012] Optionally, the multi-angle irradiation assembly is arranged in the detection cavity of the inspection machine.
[0013] Optionally, the multi-angle irradiation assembly comprises a light splitting prism arranged at the transmission end of the first light transmission assembly, the light splitting prism is used to deflect the light transmitted by the first light transmission assembly to the inspection machine in different directions; a plurality of light reflection plates, each light reflection plate has a different light reflection angle, the light deflected by the light splitting prism is transmitted to the corresponding light reflection plate, the light reflection plate reflects the light to the wafer to be detected, and each light reflection plate has a control baffle for blocking the light transmitted to the light reflection plate.
[0014] Optionally, the multi-angle irradiation assembly further comprises a plurality of condensers, each condenser is used to condense the light in the corresponding deflected direction of the light splitting prism.
[0015] Optionally, the condenser is a convex lens.
[0016] Compared with the prior art, the technical scheme of the utility model has the following advantages:
[0017] In the macroscopic detection light source device of the inspection machine, the light source module has the fine tuning knob, the fine tuning knob can realize the micro adjustment of the light source parameters, so as to increase the adjustment selection of the light source parameters. By adding the light filtering assembly, the light filtering assembly can filter the light emitted by the light source module, so that the light has more color selection. By adding the multi-angle irradiation assembly, the multi-angle irradiation assembly can have more angle selection irradiation to the wafer to be detected. By adding the fine tuning knob, the light filtering assembly and the multi-angle irradiation assembly, more light source conditions can be selected in the inspection process, thereby effectively reducing the missed detection probability and improving the product yield.
[0018] Further, the light filtering assembly further comprises a converter, a plurality of the filters are connected with the converter, and the converter is used for converting the filters of different colors to filter the light emitted by the light source module. By integrating the filters of different colors on the converter, the filters of different colors can be selected by rotating the converter, thereby providing a more convenient operation path for the detector.
[0019] Further, the multi-angle irradiation assembly further comprises a plurality of condensers, and each condenser is used for condensing the light of the corresponding deflection direction of the light splitting prism. The light deflected by the light splitting prism in different directions is condensed by the condensers and transmitted to the corresponding light-emitting plate, so as to improve the irradiation effect of the light. BRIEF DESCRIPTION OF DRAWINGS
[0020] Figure 1 is a structural schematic diagram of a macroscopic detection light source device of an example of the inspection machine table of the utility model;
[0021] Figure 2 is a partial structural schematic diagram of a multi-angle irradiation assembly in the macroscopic detection light source device of the example of the inspection machine table of the utility model;
[0022] Figure 3 is another partial structural schematic diagram of a multi-angle irradiation assembly in the macroscopic detection light source device of the example of the inspection machine table of the utility model. DETAILED DESCRIPTION
[0023] As described in the background, the detection light source used in the existing technology in the inspection process still has many problems. The following will be specifically explained.
[0024] At present, the illuminance of the light source in the macroscopic inspection process of the semiconductor inspection machine table is divided into low, medium and high, and some manufacturers even set a single illuminance light source. The use is limited, and the illuminance demand cannot be well adjusted in reality. Moreover, the irradiation position of the light source is single and fixed, and details are easily ignored when viewed at different angles. In addition, the light source uses a single white light source, and it is difficult to observe small, slender and shallow defects. Therefore, using the existing detection light source for inspection is easy to miss, which affects the yield of the product.
[0025] On this basis, the utility model provides a kind of macroscopical detection light source device of visual inspection machine, the light source module has the fine adjustment knob, the fine adjustment knob can be realized to the light source parameter Micro-quantitative adjustment, to this increase the adjustment selection of light source parameter.By adding the light filter component, the light filter component can carry out light filtering treatment to the light of light source module, so that light has more color selection.By adding the multi-angle irradiation component, the multi-angle irradiation component can have more angle selection and be irradiated to the wafer to be detected.By adding the fine adjustment knob, the light filter component and the multi-angle irradiation component, more light source conditions can be provided in the visual inspection process Selection, to effectively reduce the probability of missed detection, improve product yield.
[0026] In order to make the above-mentioned purpose, characteristics and advantages of the utility model more obvious and easy to understand, the technical scheme in the embodiment of the utility model will be described clearly and completely in the embodiment of the utility model below, obviously, the described examples are only a part of the examples of the utility model, not all examples. Based on the examples in the utility model, all other examples obtained by those skilled in the art without creative labor belong to the scope of protection of the utility model.
[0027] In the description of the utility model, it is understood that the orientation or position relationship indicated by the terms "upper", "lower", "top surface", "bottom surface" and the like is based on the orientation or position relationship shown in the drawings, only for the convenience of describing the utility model and simplifying the description, and does not indicate or imply that the position or element must have a specific orientation, constitute and operate in a specific orientation, therefore, it cannot be understood as the limitation of the utility model. In addition, the terms "first", "second" are only used to distinguish entities or operations from another entity or operation, and do not require or imply any actual relationship, order or relative importance between these entities or operations.
[0028] Figure 1 It is the structure schematic view of the macroscopical detection light source device of visual inspection machine of the utility model embodiment; Figure 2 It is the partial structure schematic view of multi-angle irradiation component in the macroscopical detection light source device of visual inspection machine of the utility model embodiment; Figure 3 It is another partial structure schematic view of multi-angle irradiation component in the macroscopical detection light source device of visual inspection machine of the utility model embodiment.
[0029] Please refer to Figures 1 to 3The application discloses a macroscopic detection light source device of an optical inspection machine, which comprises a light source module 100, a light filter assembly 102, a first light transmission assembly 103 and a multi-angle irradiation assembly 105.
[0030] It should be noted that due to the different visual conditions of each inspector, if the adjustment options of the light source parameters are less, the inspector will have difficulty in finding the most comfortable light source detection environment, which will increase the risk of missed detection. Since the to-be-detected wafer 106 has a film layer stack of different materials in the process, the detection of defects of different materials needs more suitable color light for detection to be more easily found. If white light is used for the detection of defects of different materials, many small defects will not be easily found, which will increase the probability of missed detection. In addition, the detection of defects with different appearances needs more suitable light irradiation angles for detection to be more easily found. If a fixed angle is used to irradiate the to-be-detected wafer 106, small defects will also be easily ignored.
[0031] Therefore, the light source module 100 has the fine tuning knob 101, through which the fine adjustment of the light source parameters can be realized, so as to increase the adjustment options of the light source parameters. Through the addition of the light filter assembly 102, the light filter assembly 102 can perform light filtering processing on the light emitted by the light source module 100, so that the light has more color options. Through the addition of the multi-angle irradiation assembly 105, the multi-angle irradiation assembly 105 can have more angle options to irradiate the to-be-detected wafer 106. Through the addition of the fine tuning knob 101, the light filter assembly 102 and the multi-angle irradiation assembly 105, more light source conditions can be provided for selection in the optical inspection process, which can effectively reduce the probability of missed detection and improve the product yield.
[0032] In the embodiment, the visual inspection process of the wafer 106 to be detected is as follows: first, the wafer 106 to be detected is placed on the stage 107 of the visual inspection machine 104, the light source module 100 is turned on, and the detector adjusts the light source detection environment to the most suitable requirement of the detector by the fine adjustment knob 101. The light source initially emitted by the light source module 100 is white light. If yellow light is required for this detection (which can be switched according to actual requirements), the yellow filter in the light filtering assembly 102 is moved to the optical transmission path, and the yellow light is allowed to pass through the filter after the light filtering treatment of the yellow filter. The yellow light after the light filtering treatment is transmitted to the visual inspection machine 104 through the first light transmission assembly 103. When the yellow light is transmitted from the first light transmission assembly 103, the yellow light is further processed by the multi-angle irradiation assembly 105 to irradiate the wafer 106 to be detected at the required angle (which can be switched according to actual requirements).
[0033] In the embodiment, the light source parameters include: illuminance and color temperature. The adjustment range of the illuminance in the light source parameters is: 1000 lux~2000 lux; the adjustment range of the color temperature in the light source parameters is: 5000 K~6500 K.
[0034] In the embodiment, the light filtering assembly 102 further comprises a converter (not shown), and the filters are connected with the converter. The converter is used to convert the filters of different colors to filter the light emitted by the light source module 100. By integrating the filters of different colors on the converter, the filters of different colors can be selected by rotating the converter, thereby providing a more convenient operation path for the detector.
[0035] In the embodiment, the light transmitted after the light filtering treatment of the filters includes: yellow light, blue light, white light, gray light, purple light or orange light.
[0036] In the embodiment, the first light transmission assembly 103 uses optical fiber as the medium for light transmission. Optical fiber is a slender fiber that uses the principle of total reflection of light to transmit optical signals. The material of optical fiber is mainly quartz glass, which has very small transmission loss of light. Optical fiber is not affected by external electromagnetic interference during light transmission. In a complex electromagnetic environment, the optical fiber communication system can still work stably. The propagation speed of optical fiber is slightly lower than the speed in vacuum, but it is still very fast, about 200,000 km / s.
[0037] In the embodiment, the multi-angle irradiation assembly 105 is arranged in the detection cavity of the visual inspection machine 104.
[0038] Please continue to refer toFigure 2 and Figure 3 In this embodiment, the multi-angle illumination component 105 includes: a beam splitter 1051, which is disposed at the transmission end of the first light transmission component 103 and is used to deflect the light transmitted from the first light transmission component 103 to the visual inspection machine 104 in different directions; and a plurality of reflectors 1052, each of which has a different reflection angle. The light deflected by the beam splitter 1051 is transmitted to the corresponding reflector 1052, and the reflector 1052 reflects the light onto the wafer 106 to be inspected. Each reflector 1052 has a control baffle 1053 for blocking the light transmitted to the reflector 1052.
[0039] It should be noted that, in this embodiment, the light deflected by the beam splitter 1051 is still transmitted to the corresponding reflector 1052 via the second light transmission component 1055, which uses optical fiber as a medium. The surface of the reflector 1052 is coated with a reflective coating. The light transmitted from the second light transmission component 1055 is only a single spot, so the reflector 1052 is needed to reflect and amplify the spot to meet the requirements of illuminating and inspecting the wafer 106 to be inspected. Each reflector 1052 is provided with a control baffle 1053. When the control baffle 1053 is closed, the light deflected by the beam splitter 1051 will be blocked and cannot illuminate the reflector 1052; when the control baffle 1053 is open, the light deflected by the beam splitter 1051 can illuminate the reflector 1052, thereby allowing free selection and control of the number of illumination angles.
[0040] Please continue to refer to this. Figure 2 In this embodiment, the angles at which the light reflected by the plurality of reflectors 1052 illuminates the wafer 106 to be tested include: illuminating perpendicularly toward the surface of the wafer 106 to be tested, illuminating obliquely to the left toward the surface of the wafer 106 to be tested, and illuminating obliquely to the right toward the surface of the wafer 106 to be tested.
[0041] Please continue to refer to this. Figure 3 In this embodiment, the multi-angle illumination component 105 further includes a plurality of condenser lenses 1054, each condenser lens 1054 being used to focus the light rays deflected in the corresponding direction by the beam splitter 1051. By focusing the light rays deflected in different directions by the beam splitter 1051 through the condenser lenses 1054 and transmitting them to the corresponding light-emitting plate, the illumination effect of the light is improved.
[0042] In this embodiment, the condenser lens 1054 is a convex lens.
[0043] While the present invention has been disclosed above, it is not limited thereto. Any person skilled in the art can make various modifications and alterations without departing from the spirit and scope of the present invention; therefore, the scope of protection of the present invention should be determined by the scope defined in the claims.
Claims
1. A macroscopic inspection light source device for a visual inspection machine, characterized in that, The utility model relates to a multi-angle illumination component for wafer inspection, and belongs to the field of wafer inspection. The utility model discloses a multi-angle illumination component for wafer inspection, which comprises a light source module, a light filter assembly, a first light transmission assembly and a multi-angle illumination component. The light source module has a fine tuning knob for adjusting light source parameters in the light source module. The light filter assembly has a plurality of different color filters for filtering light emitted by the light source module. The first light transmission assembly is connected with the light source module and is used for transmitting the filtered light to the wafer inspection machine.
2. The macroscopic detection light source device of the visual inspection machine table according to claim 1, characterized in that, The multi-angle illumination component is used for illuminating the wafer to be detected at different angles.
3. The macroscopic detection light source device of the visual inspection machine table according to claim 2, characterized in that, The light source parameters include illuminance and color temperature.
4. The macroscopic detection light source device of the visual inspection machine table according to claim 1, characterized in that, The illuminance adjustment range of the light source parameters is 1000 lux to 2000 lux, and the color temperature adjustment range of the light source parameters is 5000 K to 6500 K.
5. The macroscopic detection light source device of the visual inspection machine table according to claim 1, characterized in that, The light filter assembly further comprises a converter, and the plurality of different color filters are connected with the converter.
6. The macroscopic detection light source device of the visual inspection machine table according to claim 1, characterized in that, The converter is used for converting the different color filters to filter the light emitted by the light source module.
7. The macroscopic detection light source device of the visual inspection machine table according to claim 1, characterized in that, The light transmitted through the filter includes yellow light, blue light, white light, gray light, purple light or orange light.
8. The macroscopic detection light source device of the visual inspection machine table according to claim 1, characterized in that, The first light transmission assembly uses optical fiber as the medium for light transmission.
9. The macroscopic detection light source device of the visual inspection machine table according to claim 8, characterized in that, The multi-angle illumination component is arranged in the detection cavity of the wafer inspection machine.
10. The macroscopic detection light source device of the visual inspection machine table according to claim 9, characterized in that, The multi-angle illumination component comprises a light splitting prism arranged at the transmission end of the first light transmission assembly. The light splitting prism is used for deflecting the light transmitted by the first light transmission assembly to the wafer inspection machine in different directions. The multi-angle illumination component further comprises a plurality of reflecting plates. Each reflecting plate has a different reflecting angle. The light deflected by the light splitting prism is transmitted to the corresponding reflecting plate. The reflecting plate reflects the light to the wafer to be detected. Each reflecting plate has a control baffle for blocking the light transmitted to the reflecting plate. The multi-angle illumination component further comprises a plurality of condensers. Each condenser is used for condensing the light in the corresponding deflected direction of the light splitting prism. The condenser is a convex lens.