Polishing jig

Abstract

The utility model relates to a polishing jig, which comprises a pressing head, a pressing rod, a pressing rod and a pressing rod, and is characterized in that the pressing head is used for providing pressing force for a to-be-polished part; the positioning ring is connected with the pressing head, a limiting groove is formed in the end, away from the pressing head, of the positioning ring, and a pressing air bag is arranged at the bottom of the limiting groove and used for transmitting pressing force provided by the pressing head to the to-be-polished part; the slide glass is mounted in the limiting groove, a plurality of mounting holes for placing the to-be-polished parts are formed in the slide glass, the mounting holes formed in the slide glass are mutually independent, the situation that the to-be-polished parts are damaged due to mutual collision can be avoided through the slide glass, and then the multiple to-be-polished parts are machined at a time through the CMP polishing device; and the processing efficiency of the AVGG product is greatly improved.

Description

TECHNICAL FIELD

[0001] The utility model relates to polishing technical field, concretely relates to a polishing fixture. BACKGROUND

[0002] In the polishing field, the AVGG product (micro-nano grating cathode assembly) may produce burrs in the cutting process of the micro-nano grating substrate during the production process, which not only affects the appearance quality of the product, but also may cause the sharp end discharge phenomenon. Therefore, during the processing, the burrs need to be treated to ensure the performance and reliability of the product.

[0003] The CMP (chemical mechanical polishing) technology is an advanced surface treatment technology, which realizes the uniform polishing of complex surfaces through the combination of chemical reaction and mechanical friction, can not only remove the burrs and scratches on the surface, but also can significantly improve the surface finish and consistency of the product. However, when the existing CMP polishing device processes multiple AVGG products at the same time, the AVGG products will produce radial displacement due to friction or centrifugal force, and will collide or rub with each other, which seriously affects the polishing effect of the final product. Therefore, in the prior art, the CMP polishing device can only process one AVGG product at a time, and the processing efficiency is low.

[0004] Therefore, there is an urgent need for a polishing fixture that can improve the processing efficiency of AVGG products. UTILITY MODEL CONTENT

[0005] In order to solve the above problems, the utility model provides a polishing fixture, which isolates multiple polishing pieces by a carrier, so that the polishing device can process multiple polishing pieces at the same time, and improves the processing efficiency of AVGG products.

[0006] In order to achieve the above purpose, the utility model provides the following scheme:

[0007] A polishing fixture, comprising:

[0008] A pressure head for providing a pressing force to the polishing piece;

[0009] A positioning ring connected with the pressure head, an end of the positioning ring away from the pressure head is provided with a limiting groove, and the bottom of the limiting groove is provided with a pressing air bag for transmitting the pressing force provided by the pressure head to the polishing piece;

[0010] A carrier installed in the limiting groove, and a plurality of mounting holes for placing the polishing piece are formed in the carrier.

[0011] Preferably, the size of the mounting hole matches the size of the polishing piece.

[0012] Preferably, the plurality of mounting holes are equidistant from the center of the carrier sheet.

[0013] Preferably, the thickness of the carrier sheet is less than the height of the workpiece to be polished, so that both ends of the workpiece to be polished can protrude from both ends of the mounting hole.

[0014] Preferably, an auxiliary air bag is further included, the auxiliary air bag is arranged in the mounting hole, and the auxiliary air bag is located on the side of the workpiece to be polished close to the compression air bag, the sum of the height of the auxiliary air bag and the height of the workpiece to be polished is greater than the thickness of the carrier sheet.

[0015] Preferably, the end of the auxiliary air bag away from the workpiece to be polished is provided with an anti-skid structure.

[0016] Preferably, the sum of the thickness of the carrier sheet and the thickness of the compression air bag is not less than the depth of the limiting groove.

[0017] Preferably, the compression head is connected with a rotary driving device, and the rotation direction of the compression head is opposite to the rotation direction of the polishing pad.

[0018] Preferably, the size of the carrier sheet matches the size of the limiting groove, so that the carrier sheet is limited from moving along the radial direction of the limiting groove by the side wall of the limiting groove.

[0019] Preferably, the end of the carrier sheet away from the compression air bag is smooth.

[0020] The utility model discloses relative to prior art has obtained following technical effect:

[0021] In the polishing jig disclosed in the application, the carrier sheet is installed in the positioning ring of the compression head, the workpiece to be polished is installed in the mounting hole of the carrier sheet, and when polishing, the compression head provides compression force for the workpiece to be polished through the compression air bag, and the workpiece to be polished is compressed on the polishing pad to realize polishing treatment of the workpiece to be polished, wherein the plurality of mounting holes formed on the carrier sheet are independent of each other, and damage caused by mutual collision between the plurality of workpieces to be polished can be avoided through the carrier sheet, and thus single processing of the plurality of workpieces to be polished through the CMP polishing device is realized, and the processing efficiency of the AVGG product is greatly improved. BRIEF DESCRIPTION OF DRAWINGS

[0022] In order to more clearly illustrate the technical scheme in the utility model or prior art, the following will briefly introduce the drawings needed to be used in the embodiments, and obviously, the drawings in the following description are only some embodiments of the utility model, and for those skilled in the art, other drawings can also be obtained according to these drawings without creative labor.

[0023] ATTACHMENT Fig. 1 It is a schematic view of one embodiment of the utility model.

[0024] attached Fig. 2 is a schematic view of the carrier in an embodiment of the present application;

[0025] attached Fig. 3 is a schematic view of the compression air bag in an embodiment of the present application.

[0026] Among them, 1, pressure head; 2, positioning ring; 3, limiting groove; 4, compression air bag; 5, carrier; 6, mounting hole; 7, auxiliary air bag; 8, polishing pad. DETAILED DESCRIPTION

[0027] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative labor fall within the scope of protection of the present application.

[0028] The purpose of the present application is to provide a polishing jig, which can avoid mutual collision of multiple pieces to be polished during polishing by using a carrier, prevent the pieces to be polished from being damaged due to mutual collision, and enable a CMP device to process multiple pieces to be polished at a time, thereby improving the processing efficiency of AVGG products.

[0029] In order to make the above-mentioned purposes, features and advantages of the present application more apparent, understandable and easy to understand, the present application will be further described in detail below with reference to the drawings and specific embodiments.

[0030] Reference Figs. 1-3 The polishing jig disclosed in the embodiments of the present application comprises a pressure head 1, a positioning ring 2 and a carrier 5. The pressure head 1 is used to provide compression force for the pieces to be polished. The positioning ring 2 is connected with the pressure head 1. A limiting groove 3 is formed in the end of the positioning ring 2 away from the pressure head 1. A compression air bag 4 is arranged at the bottom of the limiting groove 3. The compression air bag 4 is used to transmit the compression force provided by the pressure head 1 to the pieces to be polished. The carrier 5 is installed in the limiting groove 3. Multiple mounting holes 6 for placing the pieces to be polished are formed in the carrier 5. During polishing, the pieces to be polished are installed in the mounting holes 6. The pressure head 1 presses the pieces to be polished on the polishing pad 8 through the compression air bag 4 arranged in the limiting groove 3. The pressure head 1 rotates relative to the polishing pad 8, that is, the pieces to be polished rotate relative to the polishing pad 8 for polishing. Since the multiple mounting holes 6 are independent of each other, the multiple pieces to be polished can be isolated by the mounting holes 6 to prevent mutual collision or friction of the multiple pieces to be polished during polishing. The carrier 5 can avoid damage of the multiple pieces to be polished due to mutual collision or friction. Furthermore, the CMP device can process multiple AVGG products at a time, thereby greatly improving the processing efficiency of the AVGG products.

[0031] The skilled in the art can understand that the relative rotation of the pressing head 11 and the polishing pad 8 can be the active rotation of any one of the pressing head 11 and the polishing pad 8, or the simultaneous rotation of the pressing head 11 and the polishing pad 8.

[0032] Preferably, the inner wall of the mounting hole 6 is provided with a flexible layer to prevent the mutual collision or friction between the workpiece to be polished and the inner wall of the mounting hole 6 during polishing, thereby ensuring the quality of the product to be produced; the flexible layer is made of materials such as silica gel, polyurethane, and rubber, which will not cause abrasion to the workpiece to be polished.

[0033] As a preferred embodiment, the size of the mounting hole 6 matches the size of the workpiece to be polished, thereby avoiding the mutual friction or collision between the workpiece to be polished and the inner wall of the mounting hole 6 due to the displacement of the workpiece to be polished in the radial direction of the pressing head 1.

[0034] As a preferred embodiment, the distances from the mounting holes 6 to the center of the carrier 5 are the same, thereby ensuring that the relative movement distance of any one of the workpieces to be polished and the polishing pad 8 is the same during polishing, and thereby ensuring the consistency of the polishing degree of the plurality of workpieces to be polished. Further, when the pressing head 1 can be actively rotated, the spacing between any two adjacent mounting holes 6 in the rotation direction of the pressing head 1 is the same, and the pressing head 1 drives the carrier 5 and the workpiece to be polished to rotate together through the compression air bag 4. The mounting hole 6 is arranged in the above-mentioned form, thereby ensuring that the center of gravity of the carrier 5 can be kept at the center position of the carrier 5, avoiding the vibration of the carrier 5 due to the unstable center of gravity during rotation, on the one hand, reducing the noise during the working process of the polishing jig, and on the other hand, reducing the risk of fatigue damage of the carrier 5, thereby prolonging the service life of the carrier 5.

[0035] Further, when the number of mounting holes 6 is three, the included angle between the connecting lines of each mounting hole 6 and the center point of the carrier 5 is 120°. When the number of mounting holes 6 is four, the included angle between the connecting lines of each mounting hole 6 and the center point of the carrier 5 is 90°, and so on.

[0036] As a preferred embodiment, the thickness of the carrier 5 is less than the height of the workpiece to be polished, so that the two ends of the workpiece to be polished can protrude from the upper and lower ends of the mounting hole 6, and the compression air bag 4 can provide sufficient compression force to the workpiece to be polished to complete the polishing.

[0037] As a preferred embodiment, an auxiliary air bag 7 is further included, the auxiliary air bag 7 is arranged in the mounting hole 6, and the auxiliary air bag 7 is located on the side of the workpiece to be polished close to the compression air bag 4, the sum of the height of the auxiliary air bag 7 and the height of the workpiece to be polished is greater than the thickness of the carrier 5; when the height of the workpiece to be polished is less than the thickness of the carrier 5, the compression force provided by the compression air bag 4 can be transmitted to the workpiece to be polished through the auxiliary air bag 7 to press the workpiece to be polished on the polishing pad 8.

[0038] Preferably, the auxiliary air bag 7 is provided with an anti-skid structure at the end away from the polishing piece, so as to avoid relative sliding between the auxiliary air bag 7 and the pressing air bag 4 during polishing.

[0039] Further, the auxiliary air bag 7 is integrally arranged with the pressing air bag 4.

[0040] As a preferred embodiment, the sum of the thickness of the carrier sheet 5 and the thickness of the pressing air bag 4 is not less than the depth of the limiting groove 3, so that the carrier sheet 5 and the polishing piece can be kept relatively stationary during polishing by the pressing air bag 4, and relative movement between the inner wall of the carrier sheet 5 and the polishing piece is avoided.

[0041] As a preferred embodiment, the pressing head 1 is connected with the rotary driving device, so that the pressing head 1 can be actively rotated to drive the carrier sheet 5 and the polishing piece to rotate; preferably, the rotating direction of the pressing head 1 is opposite to the rotating direction of the polishing pad 8, further improving the polishing efficiency.

[0042] As a preferred embodiment, the carrier sheet 5 is matched with the size of the limiting groove 3, and the inner wall of the limiting groove 3 can provide a support force for the carrier sheet 5 pointing to the center of the carrier sheet 5, so that the side wall of the limiting groove 3 can limit the movement of the carrier sheet 5 along the radial direction of the limiting groove 3, ensuring the stability of the polishing piece during polishing.

[0043] As a preferred embodiment, the end of the carrier sheet 5 away from the pressing air bag 4 is smoothly arranged, effectively reducing the friction between the carrier sheet 5 and the polishing pad 8, and further reducing the resistance during polishing.

[0044] As a preferred embodiment, the carrier sheet 5 is made of wear-resistant material, including but not limited to alumina ceramic, silicon carbide ceramic, polytetrafluoroethylene, and diamond composite material, ensuring the service life of the carrier sheet 5.

[0045] As a preferred embodiment, the positioning ring 2 is detachably connected with the pressing head 1, so that the new and old parts can be replaced when the positioning ring 2 is damaged.

[0046] Preferably, the carrier sheet 5 is in a whole cylindrical shape.

[0047] Further, the mounting holes 6 are circular holes.

[0048] The adaptive changes according to actual needs are within the protection scope of the present application.

[0049] It should be noted that for those skilled in the art, it is obvious that the utility model is not limited to the details of the above-mentioned exemplary embodiments, and the utility model can be realized in other specific forms without departing from the spirit or basic characteristics of the utility model. Therefore, from any point of view, the embodiments should be regarded as exemplary and non-limiting, the scope of the utility model is defined by the appended claims rather than the above description, and therefore all changes falling within the meaning and scope of the equivalent elements of the claims are intended to be included in the utility model. Any reference signs in the claims should not be regarded as limiting the claims involved.

Claims

1. A polishing fixture, characterized in that, include: A pressure head (1) is used to provide a clamping force to the workpiece to be polished; Positioning ring (2), the positioning ring (2) is connected to the pressure head (1), the positioning ring (2) has a limiting groove (3) at one end away from the pressure head (1), and a clamping airbag (4) is provided at the bottom of the limiting groove (3). The clamping airbag (4) is used to transmit the clamping force provided by the pressure head (1) to the workpiece to be polished. Carrier plate (5) is installed in the limiting groove (3) and the carrier plate (5) has a plurality of mounting holes (6) for placing the workpiece to be polished.

2. The polishing fixture according to claim 1, characterized in that, The size of the mounting hole (6) matches the size of the workpiece to be polished.

3. The polishing fixture according to claim 2, characterized in that, The mounting holes (6) are all at the same distance from the center of the carrier (5).

4. The polishing fixture according to claim 1, characterized in that, The thickness of the carrier (5) is less than the height of the workpiece to be polished, so that both ends of the workpiece to be polished can extend out from both ends of the mounting hole (6).

5. The polishing fixture according to claim 4, characterized in that, It also includes an auxiliary airbag (7), which is disposed in the mounting hole (6) and is located on the side of the workpiece to be polished near the pressing airbag (4). The sum of the height of the auxiliary airbag (7) and the height of the workpiece to be polished is greater than the thickness of the carrier (5).

6. The polishing fixture according to claim 5, characterized in that, The auxiliary airbag (7) has an anti-slip structure at the end away from the workpiece to be polished.

7. The polishing fixture according to claim 1, characterized in that, The sum of the thickness of the carrier (5) and the thickness of the compression airbag (4) is not less than the depth of the limiting groove (3).

8. The polishing fixture according to claim 1, characterized in that, The pressure head (1) is connected to the rotary drive device, and the rotation direction of the pressure head (1) is opposite to the rotation direction of the polishing pad (8).

9. The polishing fixture according to claim 1, characterized in that, The size of the carrier (5) is matched with that of the limiting groove (3) so as to restrict the movement of the carrier (5) in the radial direction of the limiting groove (3) by means of the sidewall of the limiting groove (3).

10. The polishing fixture according to claim 1, characterized in that, The carrier (5) is smoothly disposed at the end away from the compression airbag (4).

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