Polishing solution residue cleaning equipment

Abstract

The utility model provides polishing solution residue cleaning equipment, and relates to the field of cleaning equipment, the polishing solution residue cleaning equipment is used for cleaning an integrated circuit board, and comprises a box body, the top of the box body is provided with a shower groove, the box body is connected with a shell cover, the shell cover covers the shower groove, the bottom of the inner wall of the shower groove is pivoted with a rotating disc driven by a motor, and the rotating disc is connected with a motor. Lifting rods are symmetrically arranged on the two sides of the top of the rotary disc, and a placement block is connected between the two lifting rods. According to the polishing solution residue cleaning equipment, the shell cover is arranged on the box body, water splashing in the washing process is avoided, the shower groove is formed in the box body, the placement block is arranged in the shower groove, the first through groove and the second through groove are formed in the placement block, the integrated circuit board is placed in the first through groove, and the spin-drying effect after washing is achieved by driving the placement block to rotate. The integrated circuit boards are separately placed through the first through grooves, the situation that cleaning is not thorough due to accumulation cleaning is avoided, and the cleaning efficiency is improved. And through cooperation of the air bellow and the transfer bin, the spin-drying effect is improved.

Description

Technical Field

[0001] This utility model relates to the field of cleaning equipment technology, specifically to a polishing fluid residue cleaning device. Background Technology

[0002] Chemical mechanical polishing (CMP) is a key process for achieving global planarization in integrated circuit manufacturing. CMP slurry is the main material used in the CMP process. After use, the slurry needs to be cleaned to remove any residual slurry from the surface of the integrated circuit.

[0003] Traditional equipment has a simple structure, and during the cleaning of circuit boards, they are usually piled up together for cleaning, which is inconvenient to operate and results in poor cleaning effect. Therefore, a new type of equipment was developed. Utility Model Content

[0004] (a) Technical problems to be solved

[0005] To address the shortcomings of existing technologies, this invention provides a polishing fluid residue cleaning device, which solves the problems mentioned in the background section.

[0006] (II) Technical Solution

[0007] To achieve the above objectives, this utility model is implemented through the following technical solution: a polishing liquid residue cleaning device for cleaning integrated circuit boards, including a box body, a shower tank at the top of the box body, a cover connected to the box body, the cover covering the shower tank, a motor-driven turntable pivotally connected to the bottom of the inner wall of the shower tank, lifting rods symmetrically arranged on both sides of the top of the turntable, and a mounting block connecting the two lifting rods.

[0008] The mounting block is cubic in shape. A through slot 1 is formed on the top of the mounting block, and a through slot 2 is formed on the front of the mounting block. The integrated circuit board is placed in the through slot 1. Screws are threaded through both the top and bottom ends of the mounting block, and nuts are threaded to the ends of the screws.

[0009] The enclosure is equipped with a shower head located directly above the mounting block. The shower head is connected to a connecting pipe. A water tank is connected to the left side of the enclosure, and a water pipe is connected to the top of the water tank. A bellows is connected to the top of the enclosure, and a bellows is connected to a duct.

[0010] The enclosure contains a transfer compartment. The left side of the transfer compartment is connected to a water pipe, the right side is connected to a receiving pipe, and the top of the transfer compartment is connected to an air duct.

[0011] Preferably, the transfer compartment is pivotally connected to a motor-driven rotating block, which has a guide groove in the shape of a T and can be deflected 90° to the right.

[0012] Preferably, the mounting block is connected to a rotating shaft on its side, and a motor is connected to the top of the lifting rod, with the motor drive shaft connected to the rotating shaft.

[0013] Preferably, the front of the box has a groove, in which a wastewater tank is placed. The wastewater tank is located directly below the mounting block, and a drain pipe is connected to the bottom of the inner wall of the shower tank, with the lower end of the drain pipe facing into the wastewater tank.

[0014] Preferably, the top of the housing is equipped with a control module, and a cover plate is hinged to the top of the front of the shell.

[0015] (III) Beneficial Effects

[0016] This invention provides a device for cleaning polishing slurry residue. It has the following beneficial effects:

[0017] 1. This polishing fluid residue cleaning equipment features a casing to prevent water splashing during rinsing. The casing includes a shower tank with a placement block containing two through-holes. Integrated circuit boards are placed in through-hole one, and the rotation of the placement block achieves a spin-drying effect after rinsing. Through-hole one separates the integrated circuit boards, preventing accumulation and incomplete cleaning, thus improving cleaning efficiency. The use of a bellows and transfer chamber further enhances the spin-drying effect. Attached Figure Description

[0018] Figure 1 This is a three-dimensional view of the structure of this utility model;

[0019] Figure 2 This is a front view of the structure of this utility model;

[0020] Figure 3 This is a schematic diagram of the box structure of this utility model;

[0021] Figure 4 This is a schematic diagram of the mounting block structure of this utility model;

[0022] Figure 5 This is a schematic diagram of the internal structure of the transit warehouse of this utility model.

[0023] In the diagram: 1. Box body, 11. Shower tank, 12. Sewage pipe, 13. Groove, 2. Turntable, 21. Lifting rod, 3. Control module, 4. Housing, 41. Cover plate, 5. Shower head, 51. Connecting pipe, 6. Air box, 61. Air duct, 7. Water tank, 71. Water pipe, 8. Transfer compartment, 81. Rotating block, 82. Guide groove, 9. Installation block, 91. Through groove one, 92. Through groove two, 93. Screw, 94. Nut, 95. Rotating shaft, 10. Wastewater tank. Detailed Implementation

[0024] This utility model embodiment provides a polishing fluid residue cleaning device, such as... Figure 1-5As shown, the cleaning process for the integrated circuit board includes a housing 1, a shower tank 11 on the top of the housing 1, a cover 4 fixedly installed on the top of the housing 1, the cover 4 covering the shower tank 11, a motor-driven turntable 2 pivotally connected to the bottom of the inner wall of the shower tank 11, lifting rods 21 symmetrically fixedly installed on both sides of the top of the turntable 2, and a mounting block 9 connecting the two lifting rods 21.

[0025] The mounting block 9 is cubic in shape. A through slot 91 runs vertically through the top of the mounting block 9, and a through slot 92 runs front to back through the front of the mounting block 9. The integrated circuit board is placed within the through slot 91. Screws 93 extend through both the top and bottom of the mounting block 9, and nuts 94 are threaded onto the ends of the screws 93. The screws 93 prevent the integrated circuit board from falling out of the through slot 91.

[0026] A shower head 5 is fixedly installed inside the housing 4. The shower head 5 is located directly above the mounting block 9. The shower head 5 is connected to a connecting pipe 51. A water tank 7 is fixedly installed on the left side of the housing 1. A water pipe 71 is fixedly installed on the top of the water tank 7. A blower box 6 is fixedly installed on the top of the housing 4. A blower box 6 is connected to a blower pipe 61.

[0027] During operation, water from water tank 7 is fed into shower head 5, which sprays water onto mounting block 9. At this time, turntable 2 drives mounting block 9 to rotate, achieving the purpose of rinsing and drying.

[0028] A transfer chamber 8 is fixedly installed inside the housing 4. The left side of the transfer chamber 8 is connected to the water pipe 71, the right side of the transfer chamber 8 is connected to the connecting pipe 51, and the top of the transfer chamber 8 is connected to the air duct 61.

[0029] The transfer compartment 8 is pivotally connected to a motor-driven rotating block 81. The rotating block 81 has a guide groove 82, which is T-shaped and can be deflected 90° to the right.

[0030] The state of the rotating block 81 during rinsing is shown in the attached image. Figure 5 After the shower is finished, the rotating block 81 rotates 90°. At this time, the water pipe 71 is not connected to the transfer chamber 8. The air pipe 81 is connected to the connecting pipe 51 through the guide groove 82.

[0031] A rotating shaft 95 is welded to the side of the mounting block 9, and a motor is fixedly installed on the top of the lifting rod 21. The motor drive shaft is welded to the rotating shaft 95. The mounting block 9 can rotate back and forth by the motor.

[0032] The front of the box 1 has a groove 13, and a wastewater tank 10 is placed in the groove 13. The wastewater tank 10 is located directly below the mounting block 9. A drain pipe 12 is fixedly installed on the bottom of the inner wall of the shower tank 11, with the lower end of the drain pipe 12 facing into the wastewater tank 10.

[0033] A control module 3 is fixedly installed on the top of the housing 1. The control module 3 is used to control the operation of various electronic components. A cover plate 41 is hinged to the top of the front of the cover 4.

[0034] In summary, this polishing fluid residue cleaning equipment features a cover 4 on the housing 1 to prevent water splashing during rinsing. The housing 1 has a shower tank 11 containing a placement block 9. The placement block 9 has two through slots 92 and 91. Integrated circuit boards are placed in through slot 91, and the rotation of the placement block 9 achieves the effect of spin-drying after rinsing. The through slot 91 separates the integrated circuit boards, preventing accumulation and incomplete cleaning, thus improving cleaning efficiency. The combined effect of the air box 6 and the transfer chamber 8 further enhances the spin-drying effect.

[0035] Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the present invention, the scope of which is defined by the appended claims and their equivalents.

Claims

1. A polishing slurry residue cleaning device for cleaning integrated circuit boards, characterized in that: Including box (1), the shower tray (11) is opened at the top of the box (1), the box (1) is connected with the shell cover (4), the shell cover (4) covers the shower tray (11), the inner wall bottom of the shower tray (11) is pivotally connected with the motor-driven rotating disc (2), the lifting rod (21) is arranged on both sides of the top of the rotating disc (2), and the placing block (9) is connected between the two lifting rods (21); The placing block (9) is a cube, the placing block (9) is provided with an upper and lower through groove one (91) at the top, and the front and rear through grooves two (92) are formed in the front face of the placing block (9), the integrated circuit board is placed in the through groove one (91), and the screw rod (93) penetrates the upper and lower ends of the placing block (9); the nut (94) is threadedly connected to the end of the screw rod (93); The shell cover (4) is provided with a shower head (5), the shower head (5) is located directly above the placing block (9), the shower head (5) is connected with the connecting pipe (51), the water tank (7) is connected to the left side of the box (1), the water pipe (71) is connected to the top of the water tank (7), the air tank (6) is connected to the top of the shell cover (4), and the air pipe (61) is connected to the air tank (6); The shell cover (4) is provided with a transfer warehouse (8), the transfer warehouse (8) is connected with the water pipe (71) on the left side, the transfer warehouse (8) is connected with the connecting pipe (51) on the right side, and the transfer warehouse (8) is connected with the air pipe (61) on the top.

2. The polishing liquid residue cleaning apparatus according to claim 1, wherein: The transfer warehouse (8) is pivotally connected with the motor-driven rotating block (81), the rotating block (81) is provided with a guide groove (82), the guide groove (82) is a T-shaped, and the guide groove (82) can be deflected by 90° to the right.

3. The polishing liquid residue cleaning apparatus according to claim 2, wherein: The placing block (9) is connected with the rotating shaft (95), the lifting rod (21) is connected with the motor, and the motor transmission shaft is connected with the rotating shaft (95).

4. The polishing liquid residue cleaning apparatus according to claim 3, wherein: The box (1) is provided with a recess (13) in the front face, the wastewater tank (10) is placed in the recess (13), the wastewater tank (10) is located directly below the placing block (9), the inner wall bottom of the shower tray (11) is connected with the sewage pipe (12), and the lower end of the sewage pipe (12) faces the wastewater tank (10).

5. The polishing liquid residue cleaning apparatus according to claim 4, wherein: The box (1) is provided with a control module (3) on the top, and the shell cover (4) is hingedly connected with the cover plate (41) on the top.

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