Polishing piece and polishing device for magnetic polishing
By combining the abrasive coating and magnetic components, the problem of abrasive particles easily falling off is solved, ensuring that the abrasive particles do not easily detach and guaranteeing the surface quality of the workpiece, thus extending the service life of the polished parts.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-05-06
- Publication Date
- 2026-03-31
AI Technical Summary
In existing magnetic polishing technology, abrasive particles are easily detached, resulting in defects such as impact pits on the workpiece surface.
It adopts a combination structure of abrasive coating and magnetic attraction. The abrasive particles are linked together to form the abrasive coating, and the magnetic attraction is placed in the mounting cavity or hole, and polishing is performed by magnetic drive.
It extends the service life of polished parts, avoids abrasive particles directly impacting the workpiece, and ensures the polishing quality of the workpiece.
Smart Images

Figure CN224059528U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of magnetic polishing technology, and in particular to a polishing part and polishing device for magnetic polishing. Background Technology
[0002] Magnetic abrasive polishing is an advanced processing method that uses a magnetic field to control abrasive particles for surface polishing, and it is widely used in the polishing and grinding of precision parts. It works by using a magnetic field to drive a magnetic needle, which scrapes and impacts the workpiece surface to achieve polishing and grinding.
[0003] However, magnetic needles typically consist of a magnetic substrate and abrasive particles bonded to the surface of the substrate. These abrasive particles are bonded to the surface of the magnetic substrate through processes such as sintering, bonding, or electroplating. Since the abrasive particles are individually bonded to the substrate, they cannot form a cohesive whole, making it difficult for the abrasive to firmly adhere to the substrate. During polishing, abrasive particles may detach, exposing the magnetic substrate and causing it to directly impact the workpiece, resulting in defects such as impact pits on the workpiece surface. Utility Model Content
[0004] In view of the above-mentioned shortcomings of the prior art, the technical problem to be solved by this utility model is to provide a polishing part and polishing device for magnetic polishing, so as to solve the problem of easy shedding of abrasive particles in magnetic polishing in the prior art.
[0005] The technical solution adopted by this utility model to solve its technical problem is a polishing part for magnetic polishing, comprising:
[0006] An abrasive coating for contacting and grinding a workpiece, wherein the abrasive coating has a sealed mounting cavity or a mounting hole penetrating its surface.
[0007] A magnetic suction element, which can be driven by magnetic force, is placed in the mounting cavity or the mounting hole.
[0008] This utility model has at least the following beneficial effects:
[0009] Multiple abrasive particles are linked together to form an abrasive coating, making it difficult for the particles to detach and extending the service life of the polished parts. Even if abrasive particles detach, they will not directly expose the magnetic chuck, preventing the magnetic chuck from directly impacting the workpiece and ensuring the polishing quality of the workpiece.
[0010] Furthermore, the abrasive coating includes a first lobe and a second lobe. The first lobe has a first connecting surface with a first notch. The second lobe has a second connecting surface with a second notch. The first connecting surface and the second connecting surface are connected so that the first notch and / or the second notch form the mounting cavity or the mounting hole.
[0011] Furthermore, the abrasive coating is configured as an integral structure formed by pressing abrasive media, and / or the magnetic absorbing element is configured as an integral structure formed by pressing magnetic absorbing media.
[0012] Furthermore, the mounting hole is a blind hole or a through hole.
[0013] Furthermore, the magnetic suction element is interference-fitted into the mounting hole.
[0014] Furthermore, the length of the magnetic element is less than or equal to the length of the mounting hole.
[0015] Furthermore, the abrasive coating is cylindrical, spherical, pyramidal, conical, hexahedral, disc-shaped, or spindle-shaped.
[0016] Furthermore, a polishing apparatus is also disclosed, comprising:
[0017] Multiple polished parts;
[0018] The container has a polishing space for accommodating the workpiece and the polished part;
[0019] The driving assembly includes at least one magnet unit disposed outside the polishing space and rotatable relative to the container, wherein the polishing element and the workpiece are covered in the magnetic field formed by the magnet unit.
[0020] Furthermore, the drive assembly also includes a turntable rotatably disposed below the container, and at least one of the magnet units is disposed on the turntable;
[0021] The container rotates coaxially with the turntable, and the direction of rotation of the container is opposite to the direction of rotation of the turntable.
[0022] Furthermore, the magnet unit includes at least one electromagnet;
[0023] The drive assembly also includes a power supply for supplying power to the plurality of electromagnets and an electronic control unit; the power supply and the electromagnets form a power supply circuit, and the electronic control unit is used to control the direction and magnitude of the current in the power supply circuit.
[0024] Additional aspects and advantages of this invention will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. Attached Figure Description
[0025] The present invention will be further described below with reference to the accompanying drawings and embodiments, wherein:
[0026] Figure 1This is a cross-sectional view of the polished part in Embodiment 1 of this utility model;
[0027] Figure 2 This is a schematic diagram of the structure of the polished part in Embodiment 1 of this utility model;
[0028] Figure 3 This is a cross-sectional view of the polishing device in Embodiment 2 of this utility model;
[0029] Figure 4 This is a cross-sectional view of the polishing device when the container is tilted in Embodiment 2 of this utility model;
[0030] Figure 5 This is a top view of the driving component in Embodiment 2 of this utility model;
[0031] Figure 6 This is a cross-sectional view of the polishing device in Embodiment 3 of this utility model;
[0032] Reference numerals: 100, container; 200, polished part; 210, abrasive coating part; 220, magnetic part; 300, workpiece; 400, turntable; 500, magnet unit; 510, magnet. Detailed Implementation
[0033] The embodiments of this utility model are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain this utility model, and should not be construed as limiting this utility model.
[0034] In the description of this utility model, it should be understood that the directional descriptions, such as up, down, front, back, left, right, etc., indicate the directional or positional relationship based on the directional or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model.
[0035] In the description of this utility model, "several" means one or more, "multiple" means two or more, "greater than," "less than," and "exceeding" are understood to exclude the stated number, while "above," "below," and "within" are understood to include the stated number. The use of "first" and "second" in the description is merely for distinguishing technical features and should not be construed as indicating or implying relative importance, or implicitly indicating the number of indicated technical features, or implicitly indicating the order of the indicated technical features.
[0036] In the description of this utility model, unless otherwise explicitly defined, terms such as "setting," "installation," and "connection" should be interpreted broadly, and those skilled in the art can reasonably determine the specific meaning of the above terms in this utility model in conjunction with the specific content of the technical solution.
[0037] In the description of this utility model, the terms "one embodiment," "some embodiments," "illustrative embodiment," "example," "specific example," or "some examples," etc., refer to specific features, structures, materials, or characteristics described in connection with that embodiment or example, which are included in at least one embodiment or example of this utility model. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.
[0038] Example 1
[0039] Please refer to Figures 1-2 This embodiment discloses a polishing part 200 for magnetic polishing, comprising:
[0040] Abrasive coating 210 is used to contact and grind workpiece 300. The abrasive coating 210 has a sealed mounting cavity or a mounting hole through its surface.
[0041] The magnetic element 220 can be driven by magnetic force and is placed in the mounting cavity or mounting hole.
[0042] In this embodiment, abrasive particles or powder are formed into an abrasive coating 210, making the abrasive particles or powder a single unit. A magnetic chuck 220 is assembled into a mounting cavity or mounting hole within the abrasive coating 210, so that the abrasive coating 210 encloses the magnetic chuck 220. When the polishing workpiece 200 is in a magnetic field, the magnetic chuck 220 is driven by magnetic force, causing the abrasive coating 210 to move together. The abrasive coating 210 then contacts the surface of the workpiece 300, thereby achieving polishing of the workpiece 300.
[0043] In this way, multiple abrasive particles are linked together to form an abrasive coating 210, making it difficult for the abrasive particles to detach and extending the service life of the polished part 200. At the same time, even if abrasive particles fall off, they will not directly expose the magnetic suction part 220, and the magnetic suction part 220 will not directly impact the workpiece 300, ensuring the polishing quality of the workpiece 300.
[0044] This embodiment provides the composition and manufacturing method of one of the polishing parts 200: the abrasive coating part 210 includes a first petal and a second petal, the first petal has a first connecting surface and a first notch is provided on the first connecting surface; the second petal has a second connecting surface and a second notch is provided on the second connecting surface; the first connecting surface and the second connecting surface are connected so that the first notch and / or the second notch form a mounting cavity or mounting hole.
[0045] Specifically, the first petal has a first connecting surface, and the second petal has a second connecting surface. After the first and second petals are formed by pressing or other processes, the first and second connecting surfaces are connected by bonding or other means to form an abrasive-coated part 210. When manufacturing the first petal, a first notch can be made on the first connecting surface. After the first and second connecting surfaces are joined, the first notch forms a mounting cavity or mounting hole for mounting the magnetic component 220. Alternatively, when manufacturing the second petal, a second notch can be made on the second connecting surface. After the first and second connecting surfaces are joined, the second notch forms a mounting cavity or mounting hole for mounting the magnetic component 220. Alternatively, a first notch can be made on the first connecting surface, and a second notch can be made on the second connecting surface. After the first and second connecting surfaces are joined, the first and second notches together form a mounting cavity or mounting hole for mounting the magnetic component 220.
[0046] Of course, the abrasive coating 210 can be composed of multiple petals, including the first petal and the second petal, as well as the third petal and the fourth petal.
[0047] Furthermore, if the abrasive coating 210 is cylindrical, then the first and second lobes are half of a cylinder, and the first and second connecting surfaces are square cylindrical cross-sections. If the abrasive coating 210 is spherical, then the first and second lobes are hemispherical, and the first and second connecting surfaces are circular spherical cross-sections. The abrasive coating 210 can also be configured as a pyramid, cone, hexahedron, disc, or spindle shape, etc.
[0048] This embodiment provides another composition and manufacturing method for the polishing part 200: the abrasive coating part 210 is configured as an integral structure formed by pressing abrasive media, and / or, the magnetic attracting part 220 is configured as an integral structure formed by pressing magnetic attracting media. The abrasive media is made of materials such as diamond, cubic boron nitride (CBN), alumina, and silicon carbide, and the magnetic attracting media is a metal material that can be attracted by the magnet 510, such as stainless steel or carbonyl iron.
[0049] Specifically, during manufacturing, a portion of the abrasive medium is first placed into the pressing mold. Then, a magnetic medium is placed in the middle of the abrasive medium, followed by another portion of abrasive medium to enclose the magnetic medium. Finally, they are pressed together to form the final shape. In this way, the abrasive-coated part 210 and the magnetic part 220 are integrally formed, resulting in higher overall structural strength.
[0050] This embodiment provides another composition and manufacturing method for the polished part 200: the mounting hole is a blind hole or a through hole. The magnetic chuck 220 is interference-fitted into the mounting hole. The length of the magnetic chuck 220 is less than or equal to the length of the mounting hole.
[0051] Specifically, the abrasive coating 210 is first manufactured through pressing or other processes, and a mounting hole is formed inside the abrasive coating 210, with one or both ends of the mounting hole penetrating the surface of the abrasive coating 210. Finally, the magnetic chuck 220 is pressed into the mounting hole and interference-fitted therewith. Meanwhile, to prevent the end of the magnetic chuck 220 from protruding from the mounting hole and to avoid the magnetic chuck 220 directly impacting the surface of the workpiece 300 during polishing, the length of the magnetic chuck 220 is designed to be less than or equal to the length of the mounting hole, so that the end face of the magnetic chuck 220 is within the mounting hole or aligned with the surface of the abrasive coating 210.
[0052] Example 2
[0053] Please refer to Figures 3-5 This embodiment discloses a polishing apparatus for polishing the outer surface of a workpiece 300, comprising:
[0054] The container 100 has a polishing space for accommodating the workpiece 300, and a number of polishing parts 200 are arranged in the polishing space; wherein the workpiece 300 is covered by a number of polishing parts 200, and when the polishing parts 200 are driven by a magnetic field, they can move along the surface of the workpiece 300 and polish the workpiece 300.
[0055] The driving assembly includes at least one magnet unit 500 disposed outside the polishing space and rotatable relative to the container 100, and the polishing part 200 is covered in the magnetic field formed by the magnet unit 500.
[0056] First, it should be noted that the container 100 can be specifically configured as a cylindrical tank or similar structure, with a polishing space formed within the tank capable of simultaneously accommodating the workpiece 300 and the polishing part 200. One or more workpieces 300 can be placed in the polishing space for polishing at the same time.
[0057] Specifically, the workpiece 300 and the polishing part 200 are placed in the polishing space within the container 100. A magnetic unit 500 outside the polishing space generates a magnetic field that covers the polishing part 200 and drives it to move along the magnetic field lines, thus polishing and grinding the outer surface of the workpiece 300. If only one magnetic unit 500 is provided on the turntable 400, the position of the magnetic field generated by the magnetic unit 500 changes as the turntable 400 rotates. This causes the magnitude and direction of the magnetic force experienced by the polishing part 200 in the polishing space to continuously change. The polishing part 200 moves continuously in the constantly changing magnetic field, achieving continuous polishing of the workpiece 300. If multiple magnetic units 500 are provided on the turntable 400, then at least two of the magnetic units 500 should have magnetic fields with opposite directions. When the magnetic field of one of the magnetic units 500 passes over a certain area of the polishing space, the polishing part 200 in that area moves forward along the surface of the workpiece 300 and polishes the workpiece 300. When another magnetic unit 500 with an opposite magnetic field direction passes over that area, the polishing part 200 moves backward along the surface of the workpiece 300 and polishes the workpiece 300. In this way, by having at least two magnetic units 500 with opposite magnetic field directions continuously pass over the same area, the polishing part 200 in that area can be driven to reciprocate along the surface of the workpiece 300 until the polishing of the workpiece 300 is completed.
[0058] Furthermore, the shapes of the multiple polished parts 200 are set as one or more combinations of cylindrical, spherical, pyramidal, conical, hexahedral, dish-shaped and spindle-shaped.
[0059] Furthermore, the drive assembly also includes a turntable 400, which is rotatably disposed below the container 100, and at least one magnet unit 500 is disposed on the turntable 400.
[0060] Specifically, a rotating shaft is fixedly connected to the center of the turntable 400, and the upper end of the rotating shaft is rotatably connected to the bottom of the container 100. One or more magnetic units 500 are arranged on the turntable 400. The turntable 400 drives the magnetic units 500 to rotate, so that the magnetic field generated by the magnetic units 500 continuously sweeps across different areas in the polishing space, thereby causing changes in the magnetic field in the same area of the polishing space. This drives the polishing workpiece 200 to move continuously and polish the outer surface of the workpiece 300.
[0061] Of course, depending on different polishing requirements, the drive component can also be set on the outer periphery of the container 100 and move continuously along the outer periphery of the polishing space to achieve polishing. For example, a rotatable cylinder can be set outside the container 100, and multiple magnet units 500 can be set on the inner wall of the cylinder. Rotating the cylinder can drive the multiple magnet units 500 to move.
[0062] Furthermore, the drive assembly includes a plurality of magnet units 500, which are evenly arranged along the circumference of the turntable 400; each magnet unit 500 includes one or more magnets 510, which are arranged along the radial direction of the turntable 400.
[0063] In the same magnet unit 500, the magnetic poles of any two adjacent magnets 510 near the container 100 are opposite; in any two adjacent magnet units 500, the magnetic poles of any two adjacent magnets 510 near the container 100 are opposite.
[0064] Specifically, when the magnet unit 500 has only one magnet 510, the magnet 510 is arranged laterally on the turntable 400, and the minimum distance from the two magnetic poles at both ends of the magnet 510 to the polishing space is equal. When the magnet unit 500 has two or more magnets 510, the multiple magnets 510 are arranged along the radial direction of the turntable 400 and longitudinally on the turntable 400, and the magnetic poles of any two adjacent magnets 510 are distributed in opposite directions. For example, in the same magnet unit 500, if the magnetic pole of one magnet 510 facing the container 100 is the N pole, then the magnetic pole of the adjacent magnet 510 facing the container 100 is set as the S pole.
[0065] Simultaneously, multiple magnet units 500 are arranged circumferentially along the turntable 400. For example, in Figure 5 In this configuration, each magnet unit 500 includes two magnets 510. The centers of the four outer magnets 510 are located on the same circumference, and the centers of the four inner magnets 510 are also located on the same circumference. The advantage of this arrangement is that the magnetic field strength generated by each magnet unit 500 is more uniform, and when the magnetic fields of different magnet units 500 pass over the same position, the area covered by the magnetic field is consistent.
[0066] Under the above premise, the magnetic field directions of two adjacent magnetic units 500 are set to be opposite. When one of the magnetic units 500 is in a certain position, the magnetic field of the magnetic unit 500 covers the corresponding area and drives the polishing part 200 in that area to move forward and polish the workpiece 300; as the turntable 400 rotates, when the next magnetic unit 500 adjacent to the previous magnetic unit 500 is in that position, the magnetic field of the magnetic unit 500 can also cover the area in the same way. Since their magnetic field directions are opposite, they can drive the polishing part 200 in that area to move in the opposite direction and polish the workpiece 300.
[0067] Furthermore, the container 100 rotates coaxially with the turntable 400, and the rotation direction of the container 100 is opposite to the rotation direction of the turntable 400.
[0068] Specifically, the container 100 can be set to a stationary, vibrating, or rotatable state. In this embodiment, the container 100 is set to be rotatable, and the direction of rotation is opposite to the direction of rotation of the turntable 400. The advantage of this setting is that the counter-rotating container 100 can drive the polishing part 200 and the workpiece 300 inside it to rotate in the opposite direction, so that the relative motion speed of the polishing part 200, the workpiece 300 and the magnetic field is faster, the magnetic field transformation speed is faster, the movement of the polishing part 200 is more intense, and the polishing efficiency is higher.
[0069] Further, please refer to Figure 4 The drive assembly includes multiple permanent magnets 510, which are arranged along their rotation direction. The minimum distance from any permanent magnet 510 to the polishing space is greater than or less than the minimum distance from the adjacent permanent magnet 510 to the polishing space.
[0070] Specifically, the magnet 510 is set as a permanent magnet 510. Since the magnetic strength of the permanent magnet 510 itself is not adjustable, but the magnetic field strength varies at different locations—stronger at closer locations and weaker at farther locations—the polishing intensity of the polished part 200 in different areas can be set by adjusting the minimum distance from the permanent magnet 510 at different locations to the polishing space. For example, in… Figure 2 In the container 100, the permanent magnet 510 on the left has a larger minimum distance to the polishing space, resulting in a weaker magnetic field strength for the polishing workpiece 200 above it, and consequently, a weaker polishing force. Conversely, the permanent magnet 510 on the right has a smaller minimum distance to the polishing space, resulting in a stronger magnetic field strength for the polishing workpiece 200 above it, and consequently, a stronger polishing force. Therefore, for different workpieces 300 or different polishing requirements, workpieces 300 requiring less polishing force can be placed on the left side of the container 100, while workpieces requiring more polishing force can be placed on the right side. This allows for the simultaneous polishing of different workpieces 300 or the polishing of workpieces 300 with different requirements, providing greater flexibility.
[0071] It should be noted that the minimum distance from the permanent magnet 510 to the polishing space actually refers to the minimum distance from the top of the permanent magnet 510 to the bottom surface of the polishing space. This minimum distance can reflect the different relative positions of the polished part 200 in the magnetic field, corresponding to different magnetic field strengths and different driving forces.
[0072] Furthermore, the minimum distance between the multiple permanent magnets 510 and the polishing space gradually increases or decreases along their rotation direction.
[0073] Specifically, the minimum distance is set to gradually increase or decrease along the circumference of the turntable 400, so that the magnetic field strength in the polishing space can change continuously and uniformly. The magnetic force on the polished parts 200 at each position has more refined gradation and more uniform change, thereby meeting the polishing needs of more different workpieces 300.
[0074] Furthermore, the drive assembly also includes a turntable 400, the upper surface of which is used to mount the magnet unit 500, and the angle between the bottom surface of the polishing space and the upper surface of the turntable 400 is an acute or obtuse angle.
[0075] Specifically, the plane containing the upper surface of the turntable 400 intersects with the plane containing the bottom surface of the polishing space. The minimum distance from multiple permanent magnets 510 to the polishing space gradually increases or decreases, causing the polishing force of the polishing part 200 at each position to gradually increase or decrease.
[0076] Furthermore, the container 100 is set horizontally and the turntable 400 is set tilted, or the turntable 400 is set horizontally and the container 100 is set tilted.
[0077] To achieve the above objectives, the container 100 can be set horizontally while the turntable 400 is tilted, or the turntable 400 can be set horizontally while the container 100 is tilted, or both can be tilted simultaneously, but at different angles, as long as there is a suitable angle between them.
[0078] Furthermore, the drive assembly includes a plurality of electromagnets 510, a power supply for supplying power to the plurality of electromagnets 510, and an electronic control unit.
[0079] The power supply forms a power supply circuit with the multiple electromagnets 510, and the electronic control unit is used to control the direction and magnitude of the current in the power supply circuit.
[0080] Specifically, the magnet 510 can also be set as an electromagnet 510. By controlling the magnitude and direction of the current of the electromagnet 510 through the electronic control unit, the magnitude and direction of the magnetic field can be changed, thereby adjusting the movement direction and polishing force of the polished part 200.
[0081] Example 3
[0082] Please refer to Figure 6 This embodiment discloses a polishing apparatus for polishing the inner surface of a workpiece 300, comprising:
[0083] Clamping component, used to clamp workpiece 300;
[0084] A polishing assembly, comprising a plurality of polishing parts 200 disposed inside the workpiece 300;
[0085] The drive assembly includes at least one magnet unit 500 disposed outside the workpiece 300 and capable of rotating relative to the workpiece 300, and the polished part 200 is covered in the magnetic field formed by the magnet unit 500.
[0086] Specifically, the workpiece 300 is fixed by a clamping member, several polishing parts 200 are placed inside the workpiece 300, and a driving assembly is set on the outer periphery of the workpiece 300 to form a magnetic field and drive the polishing parts 200 inside the workpiece 300 to move, polishing the inner surface of the workpiece 300. For example, a rotatable cylinder can be set on the outer periphery of the workpiece 300, and multiple magnetic units 500 can be set on the inner wall of the cylinder. The rotation of the cylinder drives the multiple magnetic units 500 to rotate relative to the workpiece 300, thereby driving the polishing parts 200 inside the workpiece 300 to move and polish the workpiece 300.
[0087] Furthermore, the shapes of the multiple polished parts 200 are set as one or more combinations of cylindrical, spherical, pyramidal, conical, hexahedral, dish-shaped and spindle-shaped.
[0088] Furthermore, the clamping component can drive the workpiece 300 to rotate, and the rotation direction of the workpiece 300 is opposite to the rotation direction of the magnet unit 500.
[0089] Specifically, the workpiece 300 can be set to a stationary or rotatable state. In this embodiment, the workpiece 300 is set to be rotatable, and the direction of rotation is opposite to the direction of rotation of the magnet unit 500. The advantage of this setting is that the reverse-rotating workpiece 300 can drive the polishing part 200 inside it to rotate in the opposite direction as well, so that the relative motion speed between the polishing part 200 and the magnetic field is faster, the magnetic field transformation speed is faster, the movement of the polishing part 200 is more intense, and the polishing efficiency is higher.
[0090] The embodiments of the present invention have been described in detail above with reference to the accompanying drawings. However, the present invention is not limited to the above embodiments. Within the scope of knowledge possessed by those skilled in the art, various changes can be made without departing from the spirit of the present invention. Furthermore, the embodiments of the present invention and the features thereof can be combined with each other unless otherwise specified.
Claims
1. A polishing member for magnetic force polishing, characterized by, The polishing member comprises: an abrasive cover for contacting and grinding a workpiece, the abrasive cover having a sealed mounting cavity formed inside or a mounting hole formed through the surface thereof; a magnetic member capable of being driven by a magnetic force, the magnetic member being disposed in the mounting cavity or the mounting hole.
2. The polishing member for magnetic force polishing according to claim 1, characterized by, The abrasive cover comprises a first cover body having a first abutting surface with a first gap formed therein, and a second cover body having a second abutting surface with a second gap formed therein, the first and second abutting surfaces being abutted to form the mounting cavity or the mounting hole.
3. The polishing member for magnetic force polishing according to claim 1, wherein The abrasive cover is formed as an integral structure by press molding of abrasive medium, and / or the magnetic member is formed as an integral structure by press molding of magnetic medium.
4. The polishing piece for magnetic force polishing according to claim 1, wherein The mounting hole is a blind hole or a through hole.
5. The polishing piece for magnetic force polishing according to claim 1, wherein The magnetic member is interference-fitted in the mounting hole.
6. The polishing piece for magnetic force polishing according to claim 5, wherein The length of the magnetic member is less than or equal to the length of the mounting hole.
7. The polishing piece for magnetic force polishing according to claim 1, wherein The abrasive cover has a cylindrical shape, a spherical shape, a pyramidal shape, a conical shape, a hexahedral shape, a disc shape or a shuttle shape.
8. A polishing apparatus characterized by The polishing device comprises a plurality of polishing members as claimed in any one of claims 1-7, and further comprises: a container having a polishing space for accommodating the workpiece and the polishing members; a driving assembly comprising at least one magnet unit disposed outside the polishing space and capable of rotating relative to the container, the polishing members and the workpiece being covered in a magnetic field formed by the magnet unit.
9. The polishing apparatus according to claim 8, wherein The driving assembly further comprises a rotating disc rotatably disposed below the container, the rotating disc having at least one magnet unit disposed thereon; The container and the rotating disc rotate coaxially, and the rotating direction of the container is opposite to that of the rotating disc.
10. The polishing apparatus according to claim 8, wherein The magnet unit comprises at least one electromagnet. The driving assembly further comprises a power supply for supplying power to the plurality of electromagnets and an electronic control unit, a power supply circuit being formed between the power supply and the electromagnets, the electronic control unit being configured to control the current direction and the current size in the power supply circuit.