Graphite surface treatment device for semiconductor processing equipment

Abstract

The utility model discloses a graphite surface treatment device for semiconductor processing equipment, which comprises a vacuum drying oven, a liquid distribution pipe, a heating pipe, a sliding seat and a lifting seat, a cover plate is arranged at the top of the vacuum drying oven, the lifting seat is arranged in the vacuum drying oven in a liftable manner, cushion blocks are arranged on the lifting seat at intervals, a graphite plate is horizontally arranged on the cushion blocks, and the heating pipe is arranged on the lifting seat. A connecting rod for driving the cover plate to synchronously ascend and descend is arranged on the lifting base, the sliding base is arranged below the cover plate in a transverse moving mode, the liquid distribution pipe and the heating pipe are arranged at the bottom of the sliding base in a left-right spaced mode, and spray heads distributed in the width direction of the graphite plate at intervals are arranged at the bottom of the liquid distribution pipe. After construction is completed, the sliding seat is reset, and the heating pipe and the vacuum pump are started in the reset process for heating and vacuumizing, so that the drying effect of the anti-oxidation coating is improved, and the thickness distribution uniformity of the anti-oxidation coating is ensured.

Description

TECHNICAL FIELD

[0001] The utility model relates to graphite processing technical field especially relates to a graphite surface treatment device for semiconductor processing equipment. BACKGROUND

[0002] The thermal stability of graphite is good, can be used as heater, heat insulating material or wafer processing medium material, thereby providing uniform, stable high temperature environment for the growth or processing of semiconductor material in semiconductor processing equipment.

[0003] In fact, the graphite plate works in high temperature environment for a long time, is easy to react with oxygen, causes the high temperature resistance and chemical stability to drop, shortens the service life, has influenced the efficient operation of semiconductor processing equipment. In the prior art, the utility model discloses a graphite surface oxidation resistant coating coating device for semiconductor industry, and the oxidation resistant coating is constructed on the top surface of graphite block through the coating device, and drying is carried out by using a fan, but the blowing process not only easily causes dust to contaminate the oxidation resistant coating, but also the wind force accelerates the flow of the oxidation resistant coating, causes the thickness of part of the surface oxidation resistant coating to be uneven, and even exposes the problem, and improvement is needed. UTILITY MODEL CONTENT

[0004] The utility model discloses a graphite surface treatment device for semiconductor processing equipment, ensures the construction convenience and drying effect of oxidation resistant coating, and improves the thickness distribution uniformity of oxidation resistant coating.

[0005] To achieve this purpose, the utility model adopts the following technical scheme:

[0006] A graphite surface treatment device for semiconductor processing equipment, comprising: a vacuum drying box, a liquid distribution pipe, a heating pipe, a sliding seat and a lifting seat, the top of the vacuum drying box is provided with a cover plate, the lifting seat is arranged in the vacuum drying box in a lifting manner, the lifting seat is provided with spacers at intervals, the graphite plate is horizontally arranged on the spacers, the lifting seat is provided with a connecting rod for driving the cover plate to lift synchronously, the sliding seat is transversely arranged below the cover plate, the liquid distribution pipe and the heating pipe are arranged at the bottom of the sliding seat in a left-right interval, and the bottom of the liquid distribution pipe is provided with spray heads distributed at intervals along the width direction of the graphite plate.

[0007] The vacuum pump is arranged on one side of the vacuum drying box, and a gas pipe is arranged between the vacuum drying box and the vacuum pump.

[0008] The heating pipe adopts a quartz electric heating pipe, and the heating pipe is provided with a light shield.

[0009] The sliding seat adopts an I-shaped structure, and one end of the liquid distribution pipe is connected with a liquid supply hose.

[0010] The cover plate is provided with a through hole corresponding to the connecting rod, and the connecting rod is provided with a nut above and below the cover plate.

[0011] The vacuum drying box is provided with a sealing ring on the top.

[0012] The vacuum drying box is vertically provided with a telescopic mechanism for driving the lifting seat to lift.

[0013] The telescopic mechanism is a gas cylinder, a hydraulic cylinder or an electric telescopic rod, the bottom of the lifting seat is provided with a guide sleeve, and the bottom of the vacuum drying box is provided with a guide column extending into the guide sleeve.

[0014] The bottom surface of the cover plate is horizontally provided with a linear drive mechanism for driving the sliding seat to move horizontally.

[0015] The linear drive mechanism is an electric screw rod sliding table.

[0016] The graphite surface treatment device for semiconductor processing equipment has the advantages that: the movement of the liquid distribution pipe is driven by the sliding seat, the oxidation-resistant coating on the top surface of the graphite plate is constructed by the spray head, the sliding seat is reset after the oxidation-resistant coating construction is completed, the heating pipe and the vacuum pump are turned on during the resetting process, heating and vacuumizing are performed, the drying effect of the oxidation-resistant coating is improved, and the thickness distribution uniformity of the oxidation-resistant coating is not affected. BRIEF DESCRIPTION OF DRAWINGS

[0017] Figure 1 is a structural schematic view of the utility model;

[0018] Figure 2 is Figure 1 the cover plate is raised and opened;

[0019] Figure 3 is Figure 2 the assembly structure schematic view of the liquid distribution pipe, the heating pipe and the sliding seat. DETAILED DESCRIPTION

[0020] The technical scheme of the utility model will be further illustrated in combination with specific embodiments. Figures 1 to 3 The technical scheme of the utility model will be further illustrated in combination with specific embodiments.

[0021] As Figure 1 and Figure 2 shown in the graphite surface treatment device for semiconductor processing equipment, the surface of the graphite plate 7 is subjected to oxidation-resistant coating spraying construction and drying, which comprises a vacuum drying box 1, a liquid distribution pipe 13, a heating pipe 14, a sliding seat 5 and a lifting seat 3, the top of the vacuum drying box 1 is provided with a cover plate 4, the top of the vacuum drying box 1 is provided with a sealing ring 15, the cover plate 4 is pressed on the sealing ring 15 after being lowered, and the sealing of the vacuum drying box 1 is realized.

[0022] A vacuum pump 2 is arranged on one side of the vacuum drying oven 1, and a gas pipe 12 is arranged between the vacuum drying oven 1 and the vacuum pump 2. The vacuum pump 2 can be controlled by PLC, and after being turned on, the vacuum drying oven 1 is vacuumized to form a negative pressure environment.

[0023] The lifting seat 3 is arranged to be liftable in the vacuum drying oven 1. In this embodiment, the lifting seat 3 is provided with a guide sleeve 16 at the bottom, and the vacuum drying oven 1 is provided with a guide column 17 extending into the guide sleeve 16, so as to guide the lifting of the lifting seat 3 and improve the lifting stability.

[0024] A telescopic mechanism 11 is arranged vertically in the vacuum drying oven 1 to drive the lifting seat 3 to lift. In this embodiment, the telescopic mechanism 11 is a gas cylinder, a hydraulic cylinder or an electric telescopic rod, which can be controlled to extend and retract by PLC, so as to realize the lifting of the lifting seat 3.

[0025] As shown in Figure 1 A spacer 10 is arranged on the lifting seat 3, and the graphite plate 7 is arranged horizontally on the spacer 10. The spacer 10 makes the bottom of the graphite plate 7 suspended, as shown in Figure 2 which facilitates the forklift to fork the graphite plate 7.

[0026] A connecting rod 8 is arranged on the lifting seat 3 to drive the cover plate 4 to lift synchronously, so that the cover plate 4 is opened and closed with the lifting of the lifting seat 3, and the graphite plate 7 is conveniently fed and discharged. The cover plate 4 is provided with a through hole corresponding to the connecting rod 8, and the connecting rod 8 is provided with a nut 9 above and below the cover plate 4, which is stable in connection and flexible in adjustment.

[0027] The sliding seat 5 is arranged to be transversely movable below the cover plate 4. A linear driving mechanism 6 is arranged horizontally on the bottom surface of the cover plate 4 to drive the sliding seat 5 to move transversely. In this embodiment, the linear driving mechanism 6 is an electric screw sliding table, which can be controlled by PLC to realize the left and right transverse movement of the sliding seat 5.

[0028] The liquid distribution pipe 13 and the heating pipe 14 are arranged at the bottom of the sliding seat 5, as shown in Figure 3 The sliding seat 5 adopts an I-shaped structure, which facilitates the installation and fixation of the liquid distribution pipe 13 and the heating pipe 14. The liquid distribution pipe 13 is provided with a plurality of nozzles 19 arranged at intervals along the width direction of the graphite plate 7. One end of the liquid distribution pipe 13 is connected with a liquid supply hose 20, and the liquid supply hose 20 can be externally connected with a liquid pump to send the antioxidant coating material into the liquid distribution pipe 13.

[0029] The graphite plate 7 is sprayed downwards by the spray head 19, the movement of the liquid distribution pipe 13 is driven by the sliding base 5, the top surface of the graphite plate is atomized and sprayed by the spray head 19 for the oxidation-resistant coating construction, and the thickness uniformity of the oxidation-resistant coating is ensured.

[0030] In the embodiment, the heating pipe 14 is a quartz electric heating pipe, the heating pipe 14 is provided with a light-reflecting cover 18 for reflecting infrared radiation and improving the heating and drying effect on the oxidation-resistant coating. After the oxidation-resistant coating construction is completed, the sliding base 5 is reset, the heating pipe 14 and the vacuum pump 2 are started during the resetting process, heating and vacuumizing are performed, and the drying effect of the oxidation-resistant coating is improved without affecting the thickness distribution uniformity of the oxidation-resistant coating.

[0031] The above is only a preferred embodiment of the present application, and for those skilled in the art, the specific implementation and application range can be changed according to the idea of the present application, and the content of the specification should not be understood as a limitation of the present application.

Claims

1. A graphite surface treatment apparatus for semiconductor processing equipment, comprising spraying and drying an anti-oxidation coating on the surface of a graphite plate, characterized in that, include: The vacuum drying chamber comprises a liquid distribution pipe, a heating pipe, a sliding seat, and a lifting seat. The vacuum drying chamber is topped with a cover plate. The lifting seat is vertically mounted inside the vacuum drying chamber and has spaced-apart pads. A graphite plate is horizontally mounted on the pads. The lifting seat is equipped with a connecting rod that drives the cover plate to move synchronously. The sliding seat is horizontally mounted below the cover plate. The liquid distribution pipe and the heating pipe are spaced apart at the bottom of the sliding seat. The bottom of the liquid distribution pipe has nozzles spaced apart along the width of the graphite plate.

2. The graphite surface treatment apparatus for semiconductor processing equipment according to claim 1, characterized in that, A vacuum pump is installed on one side of the vacuum drying oven, and an air pipe is installed between the vacuum drying oven and the vacuum pump.

3. The graphite surface treatment apparatus for semiconductor processing equipment according to claim 1, characterized in that, The heating element is a quartz electric heating element, and a reflector is provided on the heating element.

4. The graphite surface treatment apparatus for semiconductor processing equipment according to claim 1, characterized in that, The slide block adopts an I-shaped structure, and one end of the liquid distribution pipe is connected to a liquid supply hose.

5. The graphite surface treatment apparatus for semiconductor processing equipment according to claim 1, characterized in that, The cover plate is provided with through holes corresponding to the connecting rod, and nuts are provided on the connecting rod located above and below the cover plate.

6. The graphite surface treatment apparatus for semiconductor processing equipment according to claim 1, characterized in that, The vacuum drying oven is equipped with a sealing ring on the top.

7. The graphite surface treatment apparatus for semiconductor processing equipment according to claim 1, characterized in that, The vacuum drying oven is vertically equipped with a telescopic mechanism that drives the lifting seat to move up and down.

8. The graphite surface treatment apparatus for semiconductor processing equipment according to claim 7, characterized in that, The telescopic mechanism is a pneumatic cylinder, a hydraulic cylinder, or an electric telescopic rod. The bottom of the lifting seat is provided with a guide sleeve, and the bottom of the vacuum drying oven is provided with a guide post extending into the guide sleeve.

9. The graphite surface treatment apparatus for semiconductor processing equipment according to claim 1, characterized in that, The bottom surface of the cover plate is horizontally provided with a linear drive mechanism for driving the slide to move laterally.

10. The graphite surface treatment apparatus for semiconductor processing equipment according to claim 1, characterized in that, The linear drive mechanism uses an electric lead screw slide.

Images