Wafer cleaning turntable and wafer cleaning machine

Abstract

The utility model provides a wafer cleaning rotating disc and a wafer cleaning machine, the wafer cleaning rotating disc comprises a rotating disc, the rotating disc is uniformly provided with a plurality of placing positions used for placing wafer boxes, and the placing positions are defined by a plurality of limiting columns; a fixing column is arranged in front of the placing position, and the wafer box is limited through cooperation of the fixing column and the limiting column. The utility model further provides a wafer cleaning machine which adopts the wafer cleaning rotary table, and the wafer cleaning rotary table is arranged in a cleaning cavity. And the rotary driving device is arranged on the lower side of the rotary table to drive the rotary table to rotate. A plurality of fixing columns are arranged in front of the placing position of the turntable, the fixing columns are arranged in front of the placing position, the wafer box is limited through matching of the fixing columns and the limiting columns, it is ensured that the position of the wafer box is placed correctly, and in the working process of the wafer cleaning machine, when the turntable rotates, wafers cannot be thrown out, and the wafers are prevented from being broken.

Description

Technical Field

[0001] This utility model belongs to the field of semiconductor processing equipment technology, specifically relating to a wafer cleaning turntable. Background Technology

[0002] In the semiconductor industry, batch wafer cleaning machines are widely used due to their ability to efficiently process large numbers of wafers. During operation, wafer cassettes must be symmetrically placed on the turntable to ensure dynamic balance and stability during rotation. Improper placement of the wafer cassettes can lead to breakage of the entire cassette. Currently used wafer cleaning machines have some limiting posts on the turntable to secure the wafer cassettes. However, these posts cannot completely secure the cassettes. Therefore, during actual operation, if the wafer cassettes are not properly positioned, wafers can still be easily ejected and broken during turntable rotation.

[0003] Based on the above problems, a wafer cleaning turntable and a wafer cleaning machine are needed to ensure that the wafer cassette is placed in the correct position and to prevent the wafers from being thrown out during rotation. Utility Model Content

[0004] The purpose of this invention is to solve all or part of the above-mentioned problems by providing a wafer cleaning turntable and a wafer cleaning machine. The technical solution of this invention is as follows: multiple fixing posts are installed in front of the turntable placement position. These fixing posts, in conjunction with limiting posts, limit the wafer cassette's position, ensuring the correct placement of the wafer cassette and preventing the wafers from being thrown out and breaking when the turntable rotates.

[0005] This invention provides a wafer cleaning turntable, including a turntable with multiple placement positions evenly arranged on the turntable for placing wafer cassettes. Each placement position is defined by multiple limiting posts. A fixing post is positioned in front of each placement position, and the fixing post cooperates with the limiting posts to limit the wafer cassette. The fixing post and the limiting post in front of the placement position work together to ensure the wafer cassette is correctly placed, preventing wafers from being thrown out during turntable rotation and protecting the wafers from physical damage.

[0006] The placement position is defined by two first limiting posts and two second limiting posts. The two first limiting posts are located on the side closer to the center of the turntable, abutting against both ends of the wafer cassette opening for positioning. The two second limiting posts are located on the side farther from the center of the turntable, abutting against both ends of the bottom of the wafer cassette for positioning. The first and second limiting posts determine the placement position of the wafer cassette during cleaning.

[0007] The first limiting post is an integral structure composed of two identical support segments. Two adjacent placement positions share one first limiting post, and the two support segments respectively limit the position of two adjacent wafer cassettes. This reduces the number of first limiting posts required, simplifies the structure, and improves space utilization.

[0008] The second limiting post has an L-shaped structure, and one side of the second limiting post is provided with a slot that matches the bottom of the wafer cassette. This provides more stable support for the wafer cassette and reduces vibration and movement of the wafer cassette during cleaning.

[0009] The second limiting post is installed with the slot facing the center of the turntable, which facilitates the cleaning of the wafers in the wafer cassette.

[0010] The fixing post is positioned in front of the first limiting post, and two adjacent placement positions share one fixing post. The fixing post and the limiting post cooperate to limit the position of the wafer cassette, preventing positional deviation of the wafer cassette.

[0011] The fixing column is a metal column encased in a fluoropolymer. The fluoropolymer shell has good corrosion resistance, and the metal material ensures its stability during use, thereby improving the service life of the fixing column.

[0012] Multiple support pillars are evenly arranged within the placement position to support the wafer cassette and provide a stable support point for the wafer cassette.

[0013] There are four placement positions. The spatial layout on the turntable is optimized to enhance stability and safety.

[0014] A wafer cleaning machine is also provided, which uses the wafer cleaning turntable described above. The wafer cleaning turntable is disposed in the cleaning chamber and is used for batch cleaning of wafers. The wafer cleaning turntable ensures that the wafer cassette is correctly positioned in the wafer cleaning machine.

[0015] The wafer cleaning machine also includes a rotary drive device, which is located on the underside of the turntable to drive the turntable to rotate, facilitating the cleaning process.

[0016] Compared with the prior art, the beneficial effects of this utility model mainly include the following: It provides a wafer cleaning turntable and a wafer cleaning machine, with multiple fixing posts set on the turntable placement position. The fixing posts are set in front of the placement position, and the wafer cassette is limited by the cooperation of the fixing posts and the limiting posts. During the operation of the wafer cleaning machine, it ensures that the wafer cassette is correctly placed in the wafer cleaning machine, and the wafer will not be thrown out when the turntable rotates, thus preventing the wafer from breaking. Attached Figure Description

[0017] To more clearly illustrate the technical solutions in the specific embodiments of this utility model, the drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0018] Figure 1 This is a schematic diagram of a wafer cleaning turntable.

[0019] Figure 2 This is a top view of a wafer cassette.

[0020] Figure 3 This is a schematic diagram of the wafer cleaning turntable after the wafer cassette is placed.

[0021] Attached reference numerals: 1-turntable, 11-fixed post, 12-first limiting post, 13-second limiting post, 14-slot, 2-placement position, 21-support post. Detailed Implementation

[0022] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0023] Example 1

[0024] This embodiment provides a wafer cassette positioning device, such as... Figure 1 As shown, the device includes a turntable 1 with multiple placement positions 2 evenly arranged on it for placing wafer cassettes. Each placement position 2 is defined by multiple limiting posts. A fixing post 11 is positioned in front of each placement position 2, and the fixing post 11 cooperates with the limiting posts to limit the wafer cassette position. A schematic diagram of the wafer cassette is shown below. Figure 2 As shown, there are two protrusions at the bottom of the wafer cassette, and protrusions at both ends of the opening. Figure 3 As shown, the fixing post 11 set in front of the placement position 2 works in conjunction with the limiting post to ensure that the wafer cassette can be correctly placed and fixed, preventing the wafer cassette from being thrown out during the rotation of the turntable 1 due to improper placement, thus protecting the wafer from physical damage.

[0025] The placement position 2 is defined by two first limiting posts 12 and two second limiting posts 13. The two first limiting posts 12 are located on the side closer to the center of the turntable 1, abutting against both ends of the wafer cassette opening for limiting. The two second limiting posts 13 are located on the side farther from the center of the turntable 1, abutting against both ends of the bottom of the wafer cassette for limiting. The first limiting post is an integral structure composed of two identical support sections. In this embodiment, the first limiting post 12 is an L-shaped structure with two perpendicular support sections. Two adjacent placement positions 2 share one first limiting post 12, and the two support sections respectively limit the two adjacent wafer cassettes. The second limiting post 13 is an L-shaped structure, and one side of the second limiting post 13 is provided with a slot 14 that matches the bottom of the wafer cassette. This facilitates the cleaning of the wafers in the wafer cassette, ensures that the wafer cassette is placed correctly and provides stable support, and reduces the movement of the wafer cassette during the cleaning process.

[0026] The fixing post 11 is positioned in front of the first limiting post 12, and two adjacent placement positions 2 share one fixing post 11. The fixing post 11 cooperates with the limiting post to limit the position of the wafer cassette, preventing positional deviation of the wafer cassette. The fixing post 11 is a metal column coated with a fluoropolymer, which improves the service life of the fixing post. In this embodiment, the fixing post 11 uses Teflon (PTFE) coated steel, which is both corrosion-resistant and has high strength.

[0027] Multiple support columns 21 are evenly arranged in the placement position 2 to support the wafer cassette and provide a stable support point for the wafer cassette. In this embodiment, four support columns 21 are evenly arranged in each placement position 2.

[0028] The placement position 2 is provided with 4 positions. In this embodiment, the first limiting post 12 is provided with 4 corresponding posts, the second limiting post 13 is provided with 8 corresponding posts, and the fixing post 11 is provided with 4 corresponding posts. This optimizes the spatial layout on the turntable and ensures that the wafer cassette is placed in the correct position.

[0029] Example 2

[0030] This embodiment provides a wafer cleaning machine that uses the wafer cleaning turntable described in Embodiment 1. The wafer cleaning turntable is disposed within the cleaning chamber and includes a rotation drive device disposed below the turntable 1 to drive the turntable 1 to rotate. During the operation of the wafer cleaning machine, it ensures that the wafer cassette is correctly positioned within the machine, preventing the wafers from being thrown out and thus avoiding wafer breakage when the turntable 1 rotates.

[0031] The working principle of this utility model is as follows: When wafers need to be cleaned in batches, the wafers to be cleaned are placed in the wafer cassette, and then the wafer cassette is placed in the placement position 2 on the turntable 1. The protruding parts at both ends of the bottom of the wafer cassette are placed in the slots 14 of the second limiting post 13, and the protruding parts at both ends of the opening of the wafer cassette are placed between the first limiting post 12 and the fixing post 11. The limiting post and the fixing post 11 ensure that the wafer cassette can be correctly placed and fixed. After confirming that the wafer cassette is correctly placed, cleaning is performed.

[0032] It will be apparent to those skilled in the art that this invention is not limited to the details of the exemplary embodiments described above, and that it can be implemented in other specific forms without departing from the spirit or essential characteristics of this invention. Therefore, the embodiments should be considered illustrative and non-limiting in all respects, and the scope of this invention is defined by the appended claims rather than the foregoing description. Thus, it is intended that all variations falling within the meaning and scope of equivalents of the claims be included within this invention. No reference numerals in the claims should be construed as limiting the scope of the claims.

Claims

1. A wafer cleaning turntable, characterized in that, Includes a turntable (1), on which a plurality of placement positions (2) for placing wafer cassettes are evenly arranged, and the placement positions (2) are defined by a plurality of limiting posts; a fixing post (11) is provided in front of the placement position (2), and the wafer cassette is limited by the cooperation of the fixing post (11) and the limiting post.

2. The wafer cleaning turntable according to claim 1, characterized in that, The placement position (2) is defined by two first limiting posts (12) and two second limiting posts (13); Two first limiting posts (12) are located on one side near the center of the turntable (1) and abut against both ends of the wafer cassette opening for limiting. Two second limiting posts (13) are located on one side away from the center of the turntable (1) and abut against both ends of the bottom of the wafer cassette for limiting.

3. The wafer cleaning turntable according to claim 2, characterized in that, The first limiting post (12) is an integral structure composed of two identical support segments. Two adjacent placement positions (2) share one first limiting post (12), and the two support segments limit the adjacent two wafer cassettes respectively.

4. The wafer cleaning turntable according to claim 2, characterized in that, The second limiting post (13) has an L-shaped structure, and one side of the second limiting post (13) is provided with a slot (14) that matches the bottom of the wafer cassette.

5. The wafer cleaning turntable according to claim 2, characterized in that, The fixing post (11) is located in front of the first limiting post (12), and two adjacent placement positions (2) share one fixing post (11).

6. The wafer cleaning turntable according to claim 1, characterized in that, The fixed column (11) is a column of metal encapsulated with a fluoropolymer.

7. The wafer cleaning turntable according to claim 1, characterized in that, Multiple support pillars (21) are evenly arranged in the placement position (2) to support the wafer cassette.

8. The wafer cleaning turntable according to claim 1, characterized in that, The placement position (2) is provided in four places.

9. A wafer cleaning machine, characterized in that, The wafer cleaning turntable according to any one of claims 1-8 is used, wherein the wafer cleaning turntable is disposed in the cleaning chamber.

10. The wafer cleaning machine according to claim 9, characterized in that, It also includes a rotation drive device, which is located on the underside of the turntable (1) to drive the turntable (1) to rotate.

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