Cleaning device for auxiliary chamber of single crystal furnace

Abstract

The embodiment of the utility model provides a cleaning device for an auxiliary chamber of a single crystal furnace. Relates to the technical field of single crystal furnaces. The cleaning device for the auxiliary chamber of the single crystal furnace comprises a cleaning assembly, the cleaning assembly comprises a cleaning part and an adjusting part, the cleaning part is used for cleaning the auxiliary chamber, the cleaning part is arranged on the adjusting part, and the adjusting part adjusts the distance between the cleaning part and the inner wall of the auxiliary chamber so as to avoid devices in the auxiliary chamber; and the lifting assembly is connected with the adjusting piece, and the lifting assembly drives the cleaning piece to move in the auxiliary chamber. According to the cleaning device, the risk that devices in the auxiliary chamber are damaged in the cleaning process is reduced.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of single crystal furnace, in particular to a single crystal furnace sub-chamber cleaning device. BACKGROUND

[0002] The single crystal furnace sub-chamber is an important part of the single crystal furnace, and needs to be cleaned regularly during use to maintain crystal growth quality, prolong equipment service life, improve production efficiency, and ensure production safety.

[0003] In the prior art, the operator needs to wrap the dust-free paper around the sub-chamber rod end multiple times, and manually hold up the sub-chamber rod to extend into the sub-chamber to clean the inner wall of the sub-chamber.

[0004] However, during the cleaning process using the sub-chamber rod, the sensors and other devices inside the sub-chamber are easily damaged. UTILITY MODEL CONTENT

[0005] The present application provides a single crystal furnace sub-chamber cleaning device to solve the problem of damage to sensors and other devices inside the sub-chamber during cleaning with a sub-chamber rod.

[0006] The present application provides a single crystal furnace sub-chamber cleaning device, comprising:

[0007] A cleaning assembly, the cleaning assembly comprises a cleaning piece and an adjusting piece, the cleaning piece is used to clean the sub-chamber, the cleaning piece is arranged on the adjusting piece, and the adjusting piece adjusts the distance between the cleaning piece and the inner wall of the sub-chamber to avoid the internal devices of the sub-chamber;

[0008] A lifting assembly, the lifting assembly is connected with the adjusting piece, and the lifting assembly drives the cleaning piece to lift in the sub-chamber.

[0009] In a possible implementation, the adjusting piece comprises a support rod and a plurality of telescopic rods, the support rod is connected with the lifting assembly, and a plurality of telescopic rods are arranged circumferentially on the support rod, the cleaning piece is arranged on the telescopic rod, and the telescopic rod adjusts the distance between the cleaning piece and the inner wall of the sub-chamber by telescoping of the telescopic rod.

[0010] In a possible implementation, the telescopic rod comprises a first connecting rod, a second connecting rod and an elastic piece, the first connecting rod is connected with the support rod, the second connecting rod is slidingly inserted into the first connecting rod, and the elastic piece is arranged on the first connecting rod and connected with the second connecting rod to drive the second connecting rod to slide out of the first connecting rod.

[0011] In a possible implementation, the cleaning member comprises a flexible ring and a cleaning part, the telescopic rods are connected in the flexible ring, and the cleaning part is arranged on the outer sidewall of the flexible ring to clean the sub-chamber.

[0012] In a possible implementation, the top diameter of the flexible ring is smaller than the diameter of the bottom of the flexible ring.

[0013] In a possible implementation, the lifting assembly comprises a base and a scissor lifting member, the scissor lifting member is arranged on the base, and the adjusting member is arranged on the top of the scissor lifting member.

[0014] In a possible implementation, a plurality of traveling wheels are arranged on the base to move the base.

[0015] In a possible implementation, a water spraying assembly is further included, the water spraying assembly comprises a water pump, a connecting pipe and a water spraying pipe, the water pump is arranged in the base to pump water in the base, the connecting pipe is connected with the water pump and the water spraying pipe respectively, the water spraying pipe is arranged on the cleaning member, and a plurality of water outlets are arranged on the water spraying pipe to spray water towards the sub-chamber.

[0016] In a possible implementation, an observation window is arranged on the base to observe the water level in the base.

[0017] In a possible implementation, a control assembly is further included, the control assembly comprises a pressure detector and a controller, the pressure detector is arranged on the water spraying pipe to detect the water outlet pressure of the water spraying pipe, and the controller is electrically connected with the water pump and the pressure detector respectively to control the water outlet pressure of the water spraying pipe.

[0018] The single crystal furnace sub-chamber cleaning device provided by the embodiment of the application can effectively clean the single crystal furnace sub-chamber by arranging the adjusting member on the lifting assembly and installing the cleaning member on the adjusting member; the lifting assembly lifts and moves the adjusting member together with the cleaning member into the single crystal furnace sub-chamber, and the cleaning member cleans the sidewall of the sub-chamber immediately. When the cleaning member contacts the internal device of the sub-chamber, the adjusting member can timely adjust the distance between the cleaning member and the inner wall of the sub-chamber to avoid the internal device of the sub-chamber, so that the cleaning work can be continuously completed, thereby effectively reducing the risk of damaging the internal device of the sub-chamber in the cleaning process. BRIEF DESCRIPTION OF DRAWINGS

[0019] The drawings incorporated into the specification and forming a part thereof, illustrate embodiments consistent with the application and, together with the description, serve to explain the principles of the application.

[0020] Figure 1A structure schematic diagram of a single crystal furnace auxiliary chamber cleaning device provided in the present application is shown in the drawings.

[0021] Figure 2 For Figure 1 A cross-sectional view of the cleaning assembly.

[0022] Explanation of reference signs:

[0023] 100, cleaning assembly; 110, cleaning piece; 111, flexible ring; 112, cleaning part; 120, adjusting piece; 121, support rod; 122, telescopic rod; 1221, first connecting rod; 1222, second connecting rod; 1223, elastic piece;

[0024] 200, lifting assembly; 210, base; 211, walking wheel; 212, first control switch; 213, second control switch; 214, first indicator light; 215, second indicator light; 216, counterweight; 217, water inlet pipe; 218, water outlet pipe; 220, scissor lifting piece;

[0025] 300, water spraying assembly; 310, water pump; 320, connecting pipe; 330, water spraying pipe; 331, water outlet; 340, observation window.

[0026] The specific embodiments of the present application have been shown in the above drawings, and will be described in more detail hereinafter. These drawings and the written description are not intended to restrict the scope of the present application in any way, but to illustrate the concept of the present application to those skilled in the art by referring to specific embodiments. DETAILED DESCRIPTION

[0027] The exemplary embodiments will be described in detail herein with reference to the attached drawings. In the following description, the same numbers are used to indicate the same or similar components. The embodiments described in the following exemplary embodiments do not represent all the embodiments consistent with the present application. Rather, they are merely examples of apparatuses and methods consistent with some aspects of the present application as detailed in the appended claims.

[0028] The single crystal furnace auxiliary chamber is an important part of the single crystal furnace. The single crystal furnace auxiliary chamber needs to be cleaned regularly during use to maintain the crystal growth quality, prolong the service life of the equipment, improve the production efficiency, and ensure the production safety.

[0029] In the prior art, the operator needs to wrap dust-free paper around the end of the auxiliary chamber rod multiple times, and manually hold up the auxiliary chamber rod to extend into the auxiliary chamber to clean the inner wall of the auxiliary chamber.

[0030] However, during the cleaning process using the auxiliary chamber rod by the operator, the sensors and other equipment in the auxiliary chamber are easily damaged.

[0031] The single crystal furnace auxiliary chamber cleaning device provided by the application can effectively clean the single crystal furnace auxiliary chamber.

[0032] The technical solutions of the application and how the technical solutions solve the above technical problems will be described in detail below with specific embodiments. The following specific embodiments can be combined with each other, and the same or similar concepts or processes can not be described again in some embodiments. The embodiments of the application will be described below with reference to the drawings.

[0033] The single crystal furnace auxiliary chamber cleaning device provided by the application can effectively clean the single crystal furnace auxiliary chamber. Figure 1 The single crystal furnace auxiliary chamber cleaning device comprises:

[0034] The cleaning assembly 100 comprises a cleaning piece 110 and an adjusting piece 120. The cleaning piece 110 is used for cleaning the auxiliary chamber, and the cleaning piece 110 is arranged on the adjusting piece 120. The adjusting piece 120 adjusts the distance between the cleaning piece 110 and the inner wall of the auxiliary chamber to avoid the internal devices of the auxiliary chamber.

[0035] The lifting assembly 200 is connected with the adjusting piece 120, and the lifting assembly 200 drives the cleaning piece 110 to lift and lower in the auxiliary chamber.

[0036] The cleaning piece 110 in the cleaning assembly 100 directly acts on the cleaning work of the auxiliary chamber, and the adjusting piece 120 can flexibly adjust the position of the cleaning piece 110 to effectively avoid the devices in the auxiliary chamber and avoid damaging the devices in the cleaning process. At the same time, the lifting assembly 200 drives the cleaning piece 110 to move up and down in the auxiliary chamber, so that the cleaning piece 110 can fully cover all parts of the auxiliary chamber, thereby realizing the cleaning of the auxiliary chamber. Not only the cleaning efficiency is improved, but also the risk of equipment damage is significantly reduced, the service life of the single crystal furnace auxiliary chamber and related devices is prolonged, and the stable operation of the single crystal furnace is ensured.

[0037] In a possible implementation, referring to Figure 1 and Figure 2 The adjusting piece 120 comprises a support rod 121 and a plurality of telescopic rods 122. The support rod 121 is connected with the lifting assembly 200, and the plurality of telescopic rods 122 are arranged circumferentially on the support rod 121. The cleaning piece 110 is arranged on the telescopic rod 122. The telescopic rod 122 adjusts the distance between the cleaning piece 110 and the inner wall of the auxiliary chamber by telescoping.

[0038] The support rod 121 is arranged along a vertical direction, a plurality of telescopic rods 122 are uniformly arranged on the support rod 121 along an axial direction of the support rod 121, the plurality of telescopic rods 122 are located in the same plane, and the cleaning member 110 is mounted on the telescopic rods 122. The position of the cleaning member 110 is adjusted by the telescopic rods 122 to avoid the sensors and other devices in the sub-chamber.

[0039] In a possible implementation, referring to Figure 2 The telescopic rod 122 includes a first connecting rod 1221, a second connecting rod 1222, and an elastic member 1223. The first connecting rod 1221 is connected with the support rod 121. The second connecting rod 1222 is slidingly inserted into the first connecting rod 1221. The elastic member 1223 is arranged on the first connecting rod 1221 and connected with the second connecting rod 1222 to drive the second connecting rod 1222 to slide out of the first connecting rod 1221.

[0040] The first connecting rod 1221 is fixed on the support rod 121 by welding or screwing, and the first connecting rod 1221 is perpendicular to the connecting rod. The first connecting rod 1221 is a hollow pipe. One end of the second connecting rod 1222 is slidingly inserted into the first connecting rod 1221, and the end of the second connecting rod 1222 is further welded with a limiting piece to limit the second connecting rod 1222 from sliding out of the first connecting rod 1221. The sliding direction of the second connecting rod 1222 is along the length direction of the first connecting rod 1221. The elastic member 1223 is located in the first connecting rod 1221, and the elastic member 1223 abuts against the end of the second connecting rod 1222. When the elastic member 1223 is in a normal state, the second connecting rod 1222 extends out of the first connecting rod 1221 by the maximum distance. The elastic member 1223 pushes the second connecting rod 1222 to slide out of the first connecting rod 1221 to push the cleaning member 110 to abut against the inner side wall of the sub-chamber, and the cleaning member 110 cleans the side wall of the sub-chamber. When the cleaning member 110 touches the device inside the sub-chamber, the cleaning member 110 is driven to move toward the support rod 121 together with the second connecting rod 1222, and the elastic member 1223 is compressed to avoid the device inside the sub-chamber and ensure good cleaning effect.

[0041] For example, the elastic member 1223 is a spring, and the end of the spring abuts against the end of the second connecting rod 1222. In other embodiments, the elastic member 1223 can also be an elastic sheet or other structure, which is not described in detail here.

[0042] In a possible implementation, referring to Figure 2The cleaning component 110 includes a flexible ring 111 and a cleaning part 112. The telescopic rods 122 are all connected inside the flexible ring 111. The cleaning part 112 is disposed on the outer wall of the flexible ring 111 for cleaning the auxiliary chamber.

[0043] The flexible ring 111 is an annular ring designed to achieve comprehensive cleaning of the peripheral wall of the auxiliary chamber. Made of a flexible material, the flexible ring 111 possesses the ability to contract and deform, allowing it to avoid contact with internal devices within the auxiliary chamber by deforming and contracting. This reduces the risk of damage to internal devices.

[0044] For example, the flexible ring 111 can be a rubber ring, a foam ring, etc., which will not be described in detail here.

[0045] In one possible implementation, the top diameter of the flexible ring 111 is smaller than the bottom diameter of the flexible ring 111.

[0046] The top diameter of the flexible ring 111 is smaller than its bottom diameter, so that the cross-section of the flexible ring 111 along the axis of the support rod 121 is trapezoidal. The top diameter of the flexible ring 111 is smaller than the inner diameter of the auxiliary chamber, while the bottom diameter is slightly larger than the inner diameter of the auxiliary chamber. The smaller top diameter of the flexible ring 111 facilitates direct placement into the auxiliary chamber and provides a certain guiding function, making it easier to place the flexible ring 111 into the auxiliary chamber at the start of operation and reducing operational difficulty. The larger bottom diameter of the flexible ring 111 ensures that the bottom of the flexible ring 111 abuts against the inner wall of the auxiliary chamber, improving the cleaning effect.

[0047] The cleaning section 112 is a lint-free cloth. The lint-free cloth is adhered to or tied to the outer wall of the flexible ring 111 to clean the auxiliary chamber, thereby improving the cleaning effect. Furthermore, by pasting or wrapping around the lint-free cloth, the possibility of the lint-free cloth falling off the flexible ring 111 is reduced, thus improving the stability of the connection of the cleaning section 112.

[0048] For example, refer to Figure 1 The lifting assembly 200 includes a base 210 and a scissor lift 220. The scissor lift 220 is mounted on the base 210, and the adjusting member 120 is mounted on the top of the scissor lift 220.

[0049] Among them, the scissor lift component 220 is a scissor lift machine, which will not be described in detail here.

[0050] Furthermore, a rotating component (not shown in the figure) is also provided on the scissor lift 220. The rotating component is a motor gear structure. The rotating component is installed on the top of the scissor lift 220 and connected to the support rod 121 to drive the support rod 121 to rotate, thereby driving the cleaning component 110 on the support rod 121 to rotate, further improving the cleaning effect on the inner wall of the auxiliary room.

[0051] In other embodiments, the lifting assembly 200 can also be an electric lifting rod, a screw sliding mechanism, a pneumatic cylinder, a hydraulic cylinder, etc., which will not be described in detail here.

[0052] In a possible implementation, referring to Figure 1 The base 210 is provided with a plurality of walking wheels 211 for moving the base 210.

[0053] In the embodiment of the present application, the walking wheels 211 are provided as four universal wheels. The provision of the walking wheels 211 facilitates the movement of the entire device, facilitates the operation of the operator, and reduces the labor intensity of the operator.

[0054] In a possible implementation, referring to Figure 1 The water spraying assembly 300 further includes a water pump 310, a connecting pipe 320, and a water spraying pipe 330. The water pump 310 is arranged in the base 210 to draw water in the base 210. The connecting pipe 320 is connected to the water pump 310 and the water spraying pipe 330, respectively. The water spraying pipe 330 is arranged on the cleaning member 110 and is provided with a plurality of water outlets 331 to spray water towards the sub-chamber.

[0055] The base 210 is a box structure with an internal cavity for storing cleaning water. The sidewall of the base 210 is provided with a water outlet pipe 218 and a water inlet pipe 217. The water inlet pipe 217 is located above the sidewall of the base 210, and the water outlet pipe 218 is located at the bottom of the sidewall of the base 210. Valves are installed on the water inlet pipe 217 and the water outlet pipe 218 to open and close the water inlet pipe 217 and the water outlet pipe 218, respectively.

[0056] The connecting pipe 320 is a flexible pipe. One end of the connecting pipe 320 is connected to the water pump 310, and the other end is connected to the water spraying pipe 330. The connecting pipe 320 is attached to the lifting assembly 200. The water spraying pipe 330 is a circular ring pipe. The water spraying pipe 330 is installed on the top of the flexible ring 111 and has the same diameter as the top of the flexible ring 111. The water outlets are circumferentially arranged on the outer sidewall of the water spraying pipe 330 to spray water towards the sub-chamber, further improving the cleaning effect on the sub-chamber.

[0057] When the flexible ring 111 needs to rotate, the connecting pipe 320 is divided into two parts. One part is installed on the lifting assembly 200, and the other part is arranged from the central axis of the support rod 121 into the flexible ring 111 and connected to the water spraying pipe 330. The two parts are connected by a rotating pipe to realize the relative rotation of the two parts.

[0058] The application further improves the cleaning effect and efficiency by integrating the water spraying assembly 300. The water pump 310 in the water spraying assembly 300 is arranged in the base 210 to draw water in the base 210 and deliver the water to the water spraying pipe 330 through the connecting pipe 320. The plurality of water outlets 331 arranged on the water spraying pipe 330 spray water towards the side wall of the secondary chamber, which can effectively moisten the side wall of the secondary chamber, soften and remove stubborn stains, and reduce the cleaning difficulty. At the same time, the water spraying and flushing can also reduce the friction between the cleaning element 110 and the wall surface of the secondary chamber, reduce the wear of the cleaning element 110, and prolong the service life thereof. In addition, the water spraying assembly 300 cooperates with the cleaning assembly 100 and the lifting assembly 200 to form a comprehensive cleaning solution, which ensures that the interior of the secondary chamber is thoroughly cleaned, further reduces the risk of damage to the devices in the interior of the secondary chamber during the cleaning process, and improves the cleaning quality and maintenance efficiency of the secondary chamber of the single crystal furnace.

[0059] Further, with reference to Figure 1 The base 210 is provided with an observation window 340 for observing the water level in the base 210.

[0060] The observation window 340 is located on the side wall of the base 210. The observation window 340 can observe the water level in the base 210, and the highest water level line and the lowest water level line are arranged on the observation window 340. When it is observed that the water level in the base 210 is lower than the lowest water level line, water needs to be supplemented into the base 210 in time; when it is observed that the water level in the base 210 is higher than the highest water level line, water needs to be immediately stopped from being supplemented into the base 210.

[0061] The base 210 is further fixed with a counterweight 216. The counterweight 216 is used to increase the weight of the base 210 to avoid the possibility that the device is tilted and overturned after the cleaning assembly 100 is lifted by the lifting assembly 200.

[0062] In a possible implementation, a control assembly is further included. The control assembly includes a pressure detector and a controller. The pressure detector is arranged on the water spraying pipe 330 to detect the water outlet pressure of the water spraying pipe 330. The controller is electrically connected with the water pump 310 and the pressure detector respectively to control the water outlet pressure of the water spraying pipe 330.

[0063] The pressure detector is installed at the water outlet 331 of the water spraying pipe 330 to detect the water outlet pressure of the water outlet 331. The controller has a preset water pressure. The water outlet pressure is compared with the preset water pressure to control the water pump 310 to adjust the water outlet pressure of the water outlet 331 and keep the water outlet pressure at the preset water pressure.

[0064] The base 210 is further provided with a first control switch 212 and a second control switch 213, the first control switch 212 is electrically connected with the water pump 310 to manually control the opening and closing of the water pump 310. The second control switch 213 is in communication connection with the lifting assembly 200 to control the lifting of the lifting assembly 200.

[0065] Further, referring to Figure 1 The base 210 is further provided with a first indicator lamp 214 and a second indicator lamp 215, both of which are electrically connected with the controller, the first indicator lamp 214 is turned on when the water pressure of the water outlet 331 is equal to the preset water pressure, and the second indicator lamp 215 is turned on when the water pressure of the water outlet 331 is greater than the preset pressure, so that the operator can judge the water pressure of the water outlet 331 in real time.

[0066] The single crystal furnace auxiliary chamber cleaning device provided by the embodiment of the present application realizes effective cleaning of the single crystal furnace auxiliary chamber by arranging the adjusting piece 120 on the lifting assembly 200 and installing the cleaning piece 110 on the adjusting piece 120; the lifting assembly 200 lifts and moves the adjusting piece 120 together with the cleaning piece 110 into the single crystal furnace auxiliary chamber, and then the cleaning piece 110 cleans the side wall of the auxiliary chamber. When the cleaning piece 110 contacts the internal device of the auxiliary chamber, the adjusting piece 120 can timely adjust the position of the cleaning piece 110 to avoid the internal device of the auxiliary chamber, so as to continue the cleaning work, thereby effectively reducing the risk of damaging the internal device of the auxiliary chamber in the cleaning process.

[0067] Finally, it should be noted that: other embodiments of the present application will be easily conceived by those skilled in the art after considering the specification and practicing the invention disclosed herein. The present application is intended to cover any variations, uses or adaptive changes of the present application, which follow the general principles of the present application and include common knowledge or conventional technical means in the art which are not disclosed by the present application, and are not limited to the precise structure described above and shown in the drawings, and various modifications and changes can be made without departing from the scope thereof. The scope of the present application is only limited by the appended claims.

Claims

1. A cleaning device for a sub-chamber of a single crystal furnace, characterized by, The utility model relates to a cleaning device for a secondary chamber of a fuel cell, comprising: a cleaning assembly (100) including a cleaning piece (110) for cleaning the secondary chamber and an adjusting piece (120) for adjusting the distance between the cleaning piece (110) and the inner wall of the secondary chamber to avoid the internal devices in the secondary chamber; a lifting assembly (200) connected with the adjusting piece (120) and driving the cleaning piece (110) to lift in the secondary chamber.

2. The cleaning device for a subchamber of a single crystal furnace according to claim 1, wherein The adjusting piece (120) includes a support rod (121) connected with the lifting assembly (200) and a plurality of telescopic rods (122) circumferentially arranged on the support rod (121), and the cleaning piece (110) is arranged on the telescopic rods (122) to adjust the distance between the cleaning piece (110) and the inner wall of the secondary chamber through the telescopic rods (122).

3. The cleaning device for a subchamber of a single crystal furnace according to claim 2, wherein The telescopic rod (122) includes a first connecting rod (1221) connected with the support rod (121), a second connecting rod (1222) slidingly inserted into the first connecting rod (1221), and an elastic piece (1223) arranged on the first connecting rod (1221) and connected with the second connecting rod (1222) to drive the second connecting rod (1222) to slide out of the first connecting rod (1221).

4. The cleaning device for a subchamber of a single crystal furnace according to claim 2, wherein The cleaning piece (110) includes a flexible ring (111) and a cleaning part (112), the telescopic rods (122) are connected in the flexible ring (111), and the cleaning part (112) is arranged on the outer sidewall of the flexible ring (111) to clean the secondary chamber.

5. The cleaning device for a subchamber of a single crystal furnace according to claim 4, wherein The top diameter of the flexible ring (111) is smaller than the diameter of the bottom of the flexible ring (111).

6. The crystal furnace sub-chamber cleaning apparatus according to any one of claims 1 to 5, characterized by, The lifting assembly (200) includes a base (210) and a scissor lifting piece (220) arranged on the base (210), and the adjusting piece (120) is arranged on the top of the scissor lifting piece (220).

7. The cleaning device for a sub-chamber of a single crystal furnace according to claim 6, wherein A plurality of walking wheels (211) are arranged on the base (210) to move the base (210).

8. The cleaning device for a subchamber of a single crystal furnace according to claim 6, wherein The utility model further includes a water spraying assembly (300) including a water pump (310), a connecting pipe (320), and a water spraying pipe (330), the water pump (310) is arranged in the base (210) to pump water in the base (210), the connecting pipe (320) is connected with the water pump (310) and the water spraying pipe (330) respectively, the water spraying pipe (330) is arranged on the cleaning piece (110), and a plurality of water outlets (331) are arranged on the water spraying pipe (330) to spray water towards the secondary chamber.

9. The cleaning device for a sub-chamber of a single crystal furnace according to claim 8, wherein An observation window (340) is arranged on the base (210) for observing the water level in the base (210).

10. The cleaning apparatus for a sub-chamber of a single crystal growth furnace according to claim 8, wherein The control assembly includes a pressure detector arranged on the water spraying pipe (330) for detecting the water outlet pressure of the water spraying pipe (330), and a controller electrically connected with the water pump (310) and the pressure detector respectively for controlling the water outlet pressure of the water spraying pipe (330).

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