Film forming device and CVD (Chemical Vapor Deposition) reactor
By using a combination of shielding and elastic components in the film-forming device, the problem of high-temperature detachment between the exhaust duct and the exhaust ring was solved, thus achieving the stability of the exhaust system and the cleanliness of the film-forming environment.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- WUXI LEADPRO TECH CO LTD
- Filing Date
- 2025-04-21
- Publication Date
- 2026-04-10
AI Technical Summary
In the film-forming device, the exhaust duct and exhaust ring are prone to detachment due to the failure of the elastic mechanism at high temperatures, resulting in poor exhaust and contamination of the cavity environment.
The structure employs a combination of shielding and elastic components. The shielding components block heat transfer, while the elastic components are indirectly connected to the flow guide tube assembly through the shielding components, forming a thermal barrier, reducing the temperature of the elastic components, and ensuring the stability of the support structure.
It effectively reduces the risk of elastic components failing due to high temperatures, ensures the stability of the exhaust system, prevents exhaust ring detachment, and maintains the cleanliness of the film-forming environment.
Smart Images
Figure CN224105933U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The present application relates to the technical field of semiconductor film forming, in particular to a film forming device and a CVD reactor. BACKGROUND
[0002] In the field of film forming devices, a common structural design includes an exhaust ring and an exhaust duct, and a gas guiding path is constructed by the contact between the exhaust ring and the exhaust duct, which is used to exhaust the reaction gas and particles in the reaction chamber.
[0003] However, the exhaust duct and the exhaust ring in the film forming device are prone to disconnection due to the failure of the elastic mechanism at high temperature. CONTENT OF THE UTILITY MODEL
[0004] The present application provides a film forming device to solve the technical problem that the exhaust duct and the exhaust ring are prone to disconnection, and further provides a CVD reactor.
[0005] In order to achieve the above-mentioned purpose, according to the present application, a film forming device is disclosed, comprising:
[0006] A shell having a top plate and a bottom plate spaced apart in the up-down direction, and an exhaust port is formed on the bottom plate;
[0007] A susceptor is arranged in the shell and surrounded by the top plate to form a reaction chamber;
[0008] An exhaust assembly is arranged in the shell and surrounds the outer periphery of the susceptor, and the exhaust assembly comprises an exhaust ring, a flow guide pipe group, an elastic member and a shielding member, the exhaust ring is in communication with the reaction chamber, the flow guide pipe group is arranged on the side of the exhaust ring away from the top plate and is provided with an exhaust passage, the shielding member is connected to the outer wall of the flow guide pipe group, the elastic member is connected to the shielding member and the bottom plate to support the connection between the flow guide pipe group and the exhaust ring, and the exhaust passage is in communication with the exhaust ring and the exhaust port.
[0009] In some embodiments, the shielding member comprises a separation part and a guide part connected together, the separation part is arranged between the flow guide pipe group and the elastic member, and the guide part is sleeved with the elastic member and is spaced apart.
[0010] In some embodiments, the guide part is arranged on the outside of the elastic member and extends towards the bottom plate along the up-down direction, and the guide part is spaced apart from the bottom plate;
[0011] The elastic member is arranged as a compression spring, the elastic member has a first inner diameter and a first outer diameter, the separation part has a second inner diameter, the guide part has a third inner diameter, the difference between the third inner diameter and the first outer diameter is a, and the difference between the first inner diameter and the second inner diameter is b, and a < b.
[0012] In some embodiments, the guide portion is disposed on the inner side of the elastic member, the guide portion comprises a first guide block and a second guide block, the first guide block is connected with the isolation portion, the second guide block is connected with the bottom plate, one of the first guide block and the second guide block is provided with a protrusion, and the other is provided with a groove, and the protrusion is at least partially and slidably disposed in the groove.
[0013] In some embodiments, the guide tube set comprises a transfer ring and a guide tube, the transfer ring is connected with the exhaust ring, and the guide tube is connected to one side of the transfer ring away from the exhaust ring.
[0014] In a plane perpendicular to the up-down direction, the orthographic projection of the exhaust ring outlet is located within the orthographic projection of the internal passage of the transfer ring.
[0015] In some embodiments, the guide tube comprises a first tube segment and a second tube segment connected with each other, the first tube segment is sleeved on the outer side of the transfer ring, and the second tube segment is connected to the end of the transfer ring.
[0016] A first flange is arranged on the inner wall of the first tube segment, the first flange surrounds the transfer ring, so that a gap is maintained between the inner wall of the first tube segment and the transfer ring.
[0017] In some embodiments, the second tube segment comprises a first tube wall and a second tube wall connected with each other, the outer diameter of the first tube wall is greater than the outer diameter of the second tube wall.
[0018] The shielding member abuts against one side of the first tube wall away from the first tube segment, and a second flange is arranged on the inner wall of the shielding member, the second flange surrounds the second tube wall, so that a gap is maintained between the inner wall of the shielding member and the second tube wall.
[0019] In some embodiments, the shielding member is sleeved on the outer side of the guide tube and connected to one end of the first tube segment away from the second tube segment.
[0020] The first tube segment comprises a third tube wall and a fourth tube wall connected with each other, the outer diameter of the fourth tube wall is greater than the outer diameter of the third tube wall.
[0021] The shielding member abuts against the fourth tube wall, and a third flange is arranged on the side of the shielding member facing the third tube wall, the third flange surrounds the third tube wall, so that a gap is maintained between the inner wall of the shielding member and the third tube wall.
[0022] In some embodiments, the guide tube group is partially accommodated in the exhaust port, and the film forming device further comprises a sleeve structure fixedly arranged on the bottom plate, and the guide tube group is slidably arranged in the sleeve structure, and the elastic member is connected with the sleeve structure.
[0023] The application also discloses a CVD reactor comprising the film forming device.
[0024] The film forming device comprises a shell, a base and an exhaust assembly. The shell has a top plate and a bottom plate arranged in a vertical direction. The bottom plate is provided with an exhaust port. The base is arranged in the shell and forms a reaction cavity with the top plate. The exhaust assembly is arranged in the shell and surrounds the outer periphery of the base. The exhaust assembly comprises an exhaust ring, a guide tube group, an elastic member and a shielding member. The exhaust ring is in communication with the reaction cavity. The guide tube group is arranged on the side of the exhaust ring away from the top plate and is provided with an exhaust passage. The shielding member is connected to the outer wall of the guide tube group. The elastic member is connected to the shielding member and the bottom plate to support the connection between the guide tube group and the exhaust ring. The exhaust passage is in communication between the exhaust ring and the exhaust port. The shielding member separates the guide tube group and the elastic member to form a heat shield, effectively blocking the heat transfer to the spring. At the same time, the elastic member indirectly connects the guide tube through the shielding member, which not only maintains the elastic buffering function of the elastic member, but also reduces the direct impact of high temperature on the elastic member, reduces the risk of elastic modulus decline and fatigue failure of the elastic member due to long-term high-temperature environment, ensures the stability of the support structure, and ensures the cleanliness of the film forming environment.
[0025] The application also discloses a CVD reactor comprising the film forming device. Therefore, the film forming device can have the technical features and technical effects described above. BRIEF DESCRIPTION OF DRAWINGS
[0026] In order to more clearly illustrate the technical solutions in the embodiments of the application, the following will briefly introduce the drawings needed in the embodiment description. Obviously, the drawings in the following description are only some embodiments of the application, and other drawings can be obtained by those skilled in the art without creative labor.
[0027] In order to more completely understand the application and its beneficial effects, the following will be described in conjunction with the drawings, wherein the same reference numerals in the following description represent the same parts.
[0028] Figure 1 is the overall structure schematic diagram provided in the exemplary embodiment of the present disclosure;
[0029] Figure 2 is the partial sectional view provided in the exemplary embodiment of the present disclosure;
[0030] Figure 3 is a schematic diagram of the connection relationship of the flow guide pipe group, the elastic member and the shielding member in another example embodiment of the present disclosure;
[0031] Figure 4 is a schematic diagram of the connection relationship of the flow guide pipe group, the elastic member and the shielding member in another example embodiment of the present disclosure;
[0032] Figure 5 is a schematic diagram of the connection relationship of the flow guide pipe group, the elastic member and the shielding member in another example embodiment of the present disclosure.
[0033] Legend:
[0034] 10, housing; X, up-down direction; 101, top plate; 102, bottom plate; 103, exhaust port; 20, base; 200, reaction cavity; 30, exhaust assembly; 310, exhaust ring; 320, flow guide pipe group; 330, elastic member; 340, shielding member; 300, exhaust passage; 341, isolation part; 342, guide part; 343, first guide block; 344, second guide block; 3431, protrusion; 3441, groove; 321, transfer ring; 322, guide pipe; 323, first pipe segment; 324, second pipe segment; 325, first flange; 3241, first pipe wall; 3242, second pipe wall; 345, second flange; 3231, third pipe wall; 3232, fourth pipe wall; 346, third flange; 40, sleeve structure. DETAILED DESCRIPTION
[0035] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only some of the embodiments of the present application, not all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative labor fall within the scope of protection of the present application.
[0036] In the description of the present application, it should be understood that the terms "upper", "lower", "inner", "outer", "top", "bottom" and the like indicate the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the devices or components referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the present application. In the description of the present application, the meaning of "multiple" is two or more, at least one of which can be one, two or more, unless otherwise explicitly specified. The terms "first", "second", "third" and the like are only for the convenience of description and naming of parts or embodiments, and do not imply an important order between the parts or between the embodiments.
[0037] It should be noted that in the drawings of the present application, an arrow marked X indicates a first direction, which is introduced in the description of the present application for more clearly defining the structure and relative position relationship of the components in the film forming device. In actual implementation, the first direction is generally a vertical direction or a height direction. It should be noted that the CVD (Chemical Vapor Deposition) reactor in the present application refers to a chemical vapor deposition reactor.
[0038] As a prologue of the embodiments of the present application, in the field of film forming devices, a common structural design includes an exhaust ring and an exhaust duct, and a gas guiding passage is constructed by the contact of the exhaust ring and the exhaust duct, which is used for exhausting the reaction gas and particles in the reaction chamber. However, the exhaust duct and the exhaust ring in the film forming device are prone to disengagement. Since the exhaust duct is connected with the exhaust ring by a spring, and the high-temperature gas flows in the gas guiding passage, the direct contact of the spring with the exhaust duct will cause overheating of the spring, resulting in elastic failure of the spring, so that the exhaust duct loses sufficient supporting force to maintain contact with the exhaust ring, and further causes disengagement of the two, and part of the process gas will not be exhausted from the chamber through the exhaust ring, polluting the chamber environment.
[0039] Therefore, the embodiments of the present application provide a film forming device, which aims to solve at least one of the above technical problems.
[0040] Please refer to Figure 1 and Figure 2 It should be noted that in the drawings of the present application, an arrow marked X indicates a first direction, which is introduced in the description of the present application for more clearly defining the structure and relative position relationship of the components in the film forming device. In actual implementation, the first direction is generally a vertical direction or a height direction. It should be noted that the CVD (Chemical Vapor Deposition) reactor in the present application refers to a chemical vapor deposition reactor.
[0041] It needs to be understood that the shielding member 340 is connected to the outer wall of the flow guide pipe group 320, and is used to block the heat conduction between the high-temperature gas in the flow guide pipe group 320 and the elastic member 330. The shielding member 340 is made of a high-temperature-resistant and low-heat-conductivity material, which serves as a physical barrier to reduce the heat transfer from the flow guide pipe group 320 to the elastic member 330. This can effectively reduce the working temperature of the elastic member 330, avoid the elastic failure caused by overheating, reduce the risk of elastic modulus decline and fatigue failure of the elastic member 330 caused by long-term exposure to high-temperature environment, and ensure the stability of the support structure. The elastic member 330 is connected to the shielding member 340 and the bottom plate 102 respectively, and provides support for the flow guide pipe group 320 and the exhaust ring 310. The elastic member 330 can deform elastically to overcome the thermal expansion and contraction of the connecting components caused by temperature changes and other factors, and ensure that the flow guide pipe group 320 and the exhaust ring 310 always maintain a good connection state. The exhaust assembly 30 is arranged around the outer periphery of the base 20, which helps to uniformly exhaust the gas in the reaction chamber 200 and reduces the local pressure difference. At the same time, the shielding member 340 and the elastic member 330 work together to ensure the stability of the entire exhaust system in a high-temperature environment, reduce the risk of the exhaust guide pipe and the exhaust ring 310 being separated due to spring failure, and thus ensure the cleanliness of the film forming environment.
[0042] Referring to Figure 3 In some embodiments, as shown in the drawings, the shielding member 340 includes a connected isolation portion 341 and a guide portion 342, the isolation portion 341 is clamped between the flow guide pipe group 320 and the elastic member 330, and the guide portion 342 is sleeved with the elastic member 330 and is arranged in a spaced manner. It needs to be understood that by arranging the isolation portion 341, the isolation portion 341 is clamped between the flow guide pipe group 320 and the elastic member 330, which can effectively block the heat transfer from the flow guide pipe group 320 to the elastic member 330. The guide portion 342 is sleeved with the elastic member 330, and the two are arranged in a spaced manner. The sleeving structure can provide a guide path for the expansion and contraction of the elastic member 330. In addition, when the elastic member 330 deforms due to thermal expansion and contraction, gas pressure changes and other factors during the operation of the device, the guide portion 342 can constrain the deformation direction of the elastic member 330, so that it expands and contracts along the predetermined direction, avoiding irregular deformation such as bending and twisting of the elastic member 330. At the same time, the spaced arrangement can avoid direct contact and friction between the guide portion 342 and the elastic member 330, reduce the wear of the elastic member 330, and prolong its service life.
[0043] In some embodiments, the isolation portion 341 and the guide portion 342 can be an integrated structure, and can be made of one or more low-thermal-conductivity materials such as quartz, ceramic fiber, aerogel felt, and composite materials.
[0044] Referring to Figure 3As shown, in some embodiments, the guide portion 342 is arranged outside the elastic member 330 and extends towards the bottom plate 102 along the up-down direction X, and the guide portion 342 is arranged in a spaced manner with the bottom plate 102; the elastic member 330 is arranged as a compression spring, the elastic member 330 has a first inner diameter and a first outer diameter, the isolation portion 341 has a second inner diameter, the guide portion 342 has a third inner diameter, the difference between the third inner diameter and the first outer diameter is a, and the difference between the first inner diameter and the second inner diameter is b, and a < b is satisfied. It needs to be understood that the guide portion 342 is arranged in a spaced manner with the bottom plate 102, so that the guide portion 342 does not directly contact and rub with the bottom plate 102 when providing a guiding effect for the elastic member 330, and at the same time, a space is provided for the expansion and contraction of the elastic member 330, so that the elastic member 330 can freely compress and rebound. It needs to be explained that the length of the guide portion 342 along the up-down direction X accounts for a proportion of the length of the elastic member 330, which can be adjusted as appropriate and is not specifically limited.
[0045] It also needs to be understood that the elastic member 330 is a compression spring, and the compression spring has a first inner diameter and a first outer diameter, and the first inner diameter and the first outer diameter are the dimensions of the orthogonal projection of the elastic member 330 on a plane perpendicular to the up-down direction X; the isolation portion 341 has a second inner diameter, and the second inner diameter is the dimension of the orthogonal projection of the isolation portion 341 on a plane perpendicular to the up-down direction X, and the guide portion 342 has a third inner diameter, and the third inner diameter is the dimension of the orthogonal projection of the guide portion 342 on a plane perpendicular to the up-down direction X. The difference (a) between the third inner diameter and the first outer diameter is the distance between the inner wall of the guide portion 342 and the outer wall of the spring, and the difference (b) between the first inner diameter and the second inner diameter is the distance between the inner wall of the spring and the inner wall of the isolation portion 341. By limiting a to be less than b, the elastic member 330 is closer to the guide portion 342 than to the flow guide pipe group 320, so that the guide portion 342 can better constrain the elastic member 330 during expansion and contraction, so as to limit the activity space of the elastic member 330 in the radial direction through the guide portion 342, to avoid the elastic member 330 directly contacting the flow guide pipe group 320 inside the shielding member 340 due to assembly and other factors, that is, to prevent the elastic member 330 from shifting or shaking in a direction perpendicular to the up-down direction X, and to improve the stability of the overall support structure; on the other hand, it ensures that the elastic member 330 and the flow guide pipe group 320 have a relatively large gap therebetween, to achieve heat isolation through air medium, to reduce the heat transfer from the flow guide pipe group 320 to the elastic member 330, and to further improve the stability of the overall support structure.
[0046] Please refer to Figure 4As shown, in some embodiments, the guide portion 342 is arranged on the inner side of the elastic member 330, and the guide portion 342 includes a first guide block 343 and a second guide block 344, the first guide block 343 is connected with the isolation portion 341, and the second guide block 344 is connected with the bottom plate 102, one of the first guide block 343 and the second guide block 344 is provided with a protrusion 3431, and the other is provided with a groove 3441, and the protrusion 3431 is at least partially and slidably arranged in the groove 3441. It should be understood that by arranging the guide portion 342 on the inner side of the elastic member 330, the internal space of the elastic member 330 is fully utilized, the overall structure is more compact, and at the same time, the stretching and contraction of the elastic member 330 can be better constrained and guided, and the deformation of the elastic member 330 in the working process can be ensured according to the predetermined direction. Specifically, by dividing the guide portion 342 into the first guide block 343 and the second guide block 344, by arranging the protrusion 3431 on one of the first guide block 343 and the second guide block 344, and arranging the groove 3441 on the other, the groove 3441 extends along the up-down direction X, and in the process of elastic deformation of the elastic member 330, the sliding fit formed by the protrusion 3431 and the groove 3441 can effectively limit the elastic deformation direction of the elastic member 330, so as to ensure that the elastic member 330 stretches and contracts along the correct path. At the same time, the first guide block 343 and the second guide block 344 physically separate the elastic member 330 from the flow guide pipe group 320, enhance the heat insulation effect, further block the heat from being transmitted from the flow guide pipe group 320 to the elastic member 330, and improve the stability of the overall support structure.
[0047] Please refer to Figure 1 and Figure 2 As shown, in some embodiments, the flow guide pipe group 320 includes a transfer ring 321 and a guide pipe 322, the transfer ring 321 is connected with the exhaust ring 310, and the guide pipe 322 is connected to the side of the transfer ring 321 away from the exhaust ring 310; in the plane perpendicular to the up-down direction X, the orthographic projection of the outlet of the exhaust ring 310 is located within the orthographic projection of the internal passage of the transfer ring 321. It should be understood that the transfer ring 321 is made of a high-temperature-resistant and corrosion-resistant material, which can generally be made of corrosion-resistant ceramic. By designing a split structure and using a material with low thermal conductivity to make the transfer ring 321, the transfer ring 321 is directly connected with the exhaust ring 310, which can withstand the impact of high-temperature gas at the outlet of the exhaust ring 310 without deformation or damage; at the same time, its corrosion resistance can effectively resist the erosion of corrosive gas, ensure the structural integrity and service life of the transfer ring 321, and thus ensure the stable operation of the entire exhaust system. Furthermore, the transfer ring 321 can make the temperature distribution of the guide pipe 322 on the exhaust path more uniform, reduce the thermal stress difference between the end of the flow guide pipe group 320 in contact with the exhaust ring 310 and the end of the flow guide pipe group 320 away from the exhaust ring 310.
[0048] It is also understood that, by setting the front projection of the outlet of the exhaust ring 310 inside the front projection of the internal passage of the transfer ring 321, that is, the internal diameter of the internal passage of the transfer ring 321 is greater than or equal to the internal diameter of the outlet of the exhaust ring 310, so that the high-temperature gas discharged through the outlet of the exhaust ring 310 can smoothly enter the transfer ring 321, reducing the resistance and energy loss of the gas flow, helping to improve the exhaust efficiency, allowing the gas in the reaction chamber 200 to be quickly and timely discharged, maintaining the stability of the pressure in the reaction chamber 200 and the uniformity of the gas environment, thereby providing good conditions for the film forming process. On the other hand, the larger the internal diameter of the internal passage of the transfer ring 321, the lower the gas pressure at the outlet of the exhaust ring 310, the smaller the impact force borne by the connection between the transfer ring 321 and the exhaust ring 310, and the relative displacement amount between the transfer ring 321 and the exhaust ring 310 due to thermal stress expansion, ensuring the tightness of the connection between the transfer ring 321 and the exhaust ring 310, effectively improving the connection stability of the transfer ring 321 and the exhaust ring 310, avoiding the leakage of process gas into the cavity environment, thereby ensuring the cleanliness of the cavity interior and improving the quality and yield of the film forming product.
[0049] Referring to FIGS. 1-3, Figure 3 and Figure 4 In some embodiments, the guide pipe 322 includes a first pipe segment 323 and a second pipe segment 324 connected to each other, the first pipe segment 323 is sleeved on the outside of the transfer ring 321, and the second pipe segment 324 is connected to the end of the transfer ring 321; the inner wall of the first pipe segment 323 is provided with a first flange 325, and the first flange 325 surrounds the transfer ring 321, so that a gap is maintained between the inner wall of the first pipe segment 323 and the transfer ring 321. It is understood that the guide pipe 322 adopts a segmented structure, the first pipe segment 323 is sleeved on the outside of the transfer ring 321, and the second pipe segment 324 is connected to the end of the transfer ring 321 away from the exhaust ring 310, so that the guide pipe 322 has a stepped structure as a whole, thereby enhancing the connection stability between the guide pipe 322 and the transfer ring 321.
[0050] Meanwhile, the inner wall of the first pipe segment 323 is provided with a first flange 325. The first flange 325 can be in the form of a ring-shaped protrusion 3431, or a plurality of first flanges 325 can be provided and distributed along the circumference to surround and connect the transfer ring 321. The first flange 325 keeps a gap between the inner wall of the first pipe segment 323 and the outer wall of the transfer ring 321, ensuring that the first pipe segment 323 is not in direct contact with the transfer ring 321. The gap forms a thermal barrier between the first pipe segment 323 and the transfer ring 321, thereby reducing the heat transferred from the transfer ring 321 to the guide pipe 322, blocking the direct heat conduction path of the high-temperature gas, and reducing the temperature of the first pipe segment 323. Meanwhile, the gap allows free displacement between the first pipe segment 323 and the transfer ring 321 to adapt to thermal expansion and contraction under different working conditions. Furthermore, the first flange 325 provides circumferential support for the transfer ring 321, preventing it from sagging or deforming due to its own weight or gas flow impact at high temperatures.
[0051] Referring to FIG. 1, Figure 4 In some embodiments, the second pipe segment 324 includes a first pipe wall 3241 and a second pipe wall 3242 connected to each other, the outer diameter of the first pipe wall 3241 is larger than that of the second pipe wall 3242, the shielding member 340 abuts against one side of the first pipe wall 3241 away from the first pipe segment 323, and the inner wall of the shielding member 340 is provided with a second flange 345 surrounding the second pipe wall 3242 to keep a gap between the inner wall of the shielding member 340 and the second pipe wall 3242. It should be understood that the second pipe segment 324 includes the first pipe wall 3241 and the second pipe wall 3242 connected to form a stepped variable-diameter structure, the shielding member 340 abuts against the first pipe wall 3241, the outer diameter of the first pipe wall 3241 is larger, forming a heat buffer area to reduce the heat transfer from the second pipe wall 3242 to the shielding member 340. The inner wall of the shielding member 340 is provided with the second flange 345, which can be in the form of a ring-shaped protrusion 3431, or a plurality of second flanges 345 can be provided and distributed along the circumference to surround and connect the second pipe wall 3242. The second flange 345 keeps a gap between the second pipe wall 3242 of the second pipe segment 324 and the shielding member 340, ensuring that the second pipe wall 3242 is not in direct contact with the shielding member 340. The gap forms a thermal barrier between the second pipe wall 3242 and the shielding member 340, reducing the heat transferred from the guide pipe 322 to the shielding member 340, blocking the direct heat conduction path of the high-temperature gas, reducing the temperature of the shielding member 340, and further reducing the temperature of the elastic member 330, thereby protecting the shielding member 340 and the elastic member 330 from high temperatures.
[0052] Furthermore, the gap between the second pipe wall 3242 and the shielding member 340 allows the second pipe segment 324 to freely expand radially at high temperatures, preventing structural deformation or sealing failure caused by thermal stress.
[0053] Referring to Figure 5 As shown in the drawings, in some embodiments, the shielding member 340 is sleeved outside the guide pipe 322 and connected to one end of the first pipe section 323 away from the second pipe section 324; the first pipe section 323 comprises a third pipe wall 3231 and a fourth pipe wall 3232 connected to each other, and the outer diameter of the fourth pipe wall 3232 is greater than that of the third pipe wall 3231; the shielding member 340 abuts against the fourth pipe wall 3232, and a third flange 346 is arranged on the side of the shielding member 340 facing the third pipe wall 3231, which surrounds the third pipe wall 3231 so as to keep a gap between the inner wall of the shielding member 340 and the third pipe wall 3231. It should be understood that the first pipe section 323 comprises the third pipe wall 3231 and the fourth pipe wall 3232, and the fourth pipe wall 3232 and the third pipe wall 3231 form a stepped variable-diameter structure; by abutting the shielding member 340 against the fourth pipe wall 3232, the direct heat conduction between the third pipe wall 3231 and the shielding member 340 is blocked, the heat transfer path between the transfer ring 321 and the shielding member 340 is prolonged, the heat transfer is reduced, and the shielding member 340 and the elastic member 330 are protected from high temperature. By arranging the third flange 346 on the side of the shielding member 340 facing the third pipe wall 3231, a gap is kept between the inner wall of the shielding member 340 and the third pipe wall 3231, and the heat transferred from the third pipe wall 3231 to the shielding member 340 is reduced through the air barrier in the gap, thereby further reducing the temperature of the shielding member 340 and the temperature of the elastic member 330, and protecting the shielding member 340 and the elastic member 330 from high temperature.
[0054] Furthermore, the gap between the inner wall of the shielding member 340 and the third pipe wall 3231 allows the third pipe wall 3231 to freely expand radially at high temperature, avoiding rigid extrusion with the shielding member 340.
[0055] In some embodiments, a first flange 325 is arranged on the inner wall of the first pipe section 323, which surrounds the transfer ring 321 so as to keep a gap between the inner wall of the first pipe section 323 and the transfer ring 321; at the same time, a third flange 346 is arranged on the side of the shielding member 340 facing the third pipe wall 3231, which surrounds the third pipe wall 3231 so as to keep a gap between the inner wall of the shielding member 340 and the third pipe wall 3231. It should be understood that by arranging the first flange 325 and the second flange 345, the distance between the transfer ring 321 and the shielding member 340 in the radial direction is increased, and the heat transfer path between the transfer ring 321 and the shielding member 340 is further increased, thereby reducing the temperature of the shielding member 340 and the temperature of the elastic member 330, and protecting the shielding member 340 and the elastic member 330 from high temperature.
[0056] Referring to Figure 2 and Figure 5As shown, in some embodiments, the flow guide group 320 is partially accommodated in the exhaust port 103, and the film forming device further comprises a sleeve structure 40 fixedly arranged on the bottom plate 102, the flow guide group 320 is slidably arranged in the sleeve structure 40, and the elastic member 330 is connected with the sleeve structure 40. It should be understood that by arranging the sleeve structure 40, on the one hand, the sleeve structure 40 can provide support for the elastic member 330, further reducing the heat transfer between the bottom plate 102 and the elastic member 330, so as to improve the overall structural stability of the elastic member 330; on the other hand, the sleeve structure 40 can sealingly connect the flow guide group 320 and the bottom plate 102, ensuring the sealing between the flow guide group 320 and the bottom plate 102, reducing the risk of high-temperature gas discharged by the flow guide group 320 overflowing into the shell 10, and ensuring the structural stability of the elastic member 330 and the cleanliness of the film forming environment.
[0057] The embodiments of the present application also disclose a CVD reactor comprising the film forming device in the above embodiments. Therefore, the film forming device can have the technical features and effects of the above embodiments.
[0058] In the above embodiments, the description of each embodiment has its own focus, and the parts not described in detail in a certain embodiment can be referred to the related description of other embodiments.
[0059] The film forming device and the CVD reactor provided by the embodiments of the present application are described in detail above, and the principles and implementation manners of the present application are described by using specific examples; the above embodiment descriptions are only used to help understand the technical solutions and core ideas of the present application; those skilled in the art should understand that the technical solutions recorded in the above embodiments can be modified, or some technical features can be replaced by equivalents; and these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the scope of the technical solutions of the embodiments of the present application.
Claims
1. A film forming apparatus characterized by comprising: The application relates to a shell (10) with a top plate (101) and a bottom plate (102) arranged in the up-down direction (X), wherein an exhaust port (103) is arranged on the bottom plate (102); a base (20) is arranged in the shell (10) and forms a reaction cavity (200) with the top plate (101); an exhaust assembly (30) is arranged in the shell (10) and surrounds the outer periphery of the base (20), wherein the exhaust assembly (30) comprises an exhaust ring (310), a flow guide pipe group (320), an elastic member (330) and a shielding member (340), the exhaust ring (310) is communicated with the reaction cavity (200), the flow guide pipe group (320) is arranged on the side of the exhaust ring (310) away from the top plate (101) and is provided with an exhaust passage (300), the shielding member (340) is connected to the outer wall of the flow guide pipe group (320), the elastic member (330) is connected to the shielding member (340) and the bottom plate (102) respectively, the flow guide pipe group (320) and the exhaust ring (310) are connected by the elastic member (330), and the exhaust passage (300) is communicated with the exhaust ring (310) and the exhaust port (103). The shielding member (340) comprises a separation part (341) and a guide part (342), the separation part (341) is arranged between the flow guide pipe group (320) and the elastic member (330), and the guide part (342) is sleeved with the elastic member (330) and is arranged at intervals. The guide part (342) is arranged on the outer side of the elastic member (330) and extends towards the bottom plate (102) along the up-down direction (X), and the guide part (342) is arranged at intervals with the bottom plate (102). The elastic member (330) is arranged as a compression spring, the elastic member (330) has a first inner diameter and a first outer diameter, the separation part (341) has a second inner diameter, the guide part (342) has a third inner diameter, the difference between the third inner diameter and the first outer diameter is a, and the difference between the first inner diameter and the second inner diameter is b, and a < b.
2. The film forming apparatus according to claim 1, wherein The guide part (342) is arranged on the inner side of the elastic member (330), the guide part (342) comprises a first guide block (343) and a second guide block (344), the first guide block (343) is connected with the separation part (341), the second guide block (344) is connected with the bottom plate (102), one of the first guide block (343) and the second guide block (344) is provided with a protrusion (3431), and the other is provided with a groove (3441), and the protrusion (3431) is at least partially arranged in the groove (3441) in a slidable manner.
3. The film forming apparatus according to claim 2, wherein The flow guide pipe group (320) comprises a transfer ring (321) and a guide pipe (322), the transfer ring (321) is connected with the exhaust ring (310), and the guide pipe (322) is connected to the side of the transfer ring (321) away from the exhaust ring (310). 4. The film forming apparatus according to claim 2, wherein 5. The film forming apparatus according to claim 1, wherein A projection of the exhaust ring (310) outlet in a plane perpendicular to the up-down direction (X) is located within a projection of the transfer ring (321) internal passage.
6. The film forming apparatus according to claim 5, wherein The guide tube (322) comprises a first tube segment (323) and a second tube segment (324) connected to each other, the first tube segment (323) is sleeved on the outside of the transfer ring (321), and the second tube segment (324) is connected to the end of the transfer ring (321). A first flange (325) is arranged on the inner wall of the first tube segment (323), the first flange (325) surrounds the transfer ring (321) to keep a gap between the inner wall of the first tube segment (323) and the transfer ring (321).
7. The film forming apparatus according to claim 6, wherein The second tube segment (324) comprises a first tube wall (3241) and a second tube wall (3242) connected to each other, the outer diameter of the first tube wall (3241) is greater than the outer diameter of the second tube wall (3242); The shielding member (340) abuts against one side of the first tube wall (3241) away from the first tube segment (323), and the inner wall of the shielding member (340) is provided with a second flange (345) surrounding the second tube wall (3242) to keep a gap between the inner wall of the shielding member (340) and the second tube wall (3242).
8. The film forming apparatus according to claim 6, wherein The shielding member (340) is sleeved on the outside of the guide tube (322) and connected to one end of the first tube segment (323) away from the second tube segment (324); The first tube segment (323) comprises a third tube wall (3231) and a fourth tube wall (3232) connected to each other, the outer diameter of the fourth tube wall (3232) is greater than the outer diameter of the third tube wall (3231); The shielding member (340) abuts against the fourth tube wall (3232), and the shielding member (340) is provided with a third flange (346) on the side facing the third tube wall (3231), the third flange (346) surrounds the third tube wall (3231) to keep a gap between the inner wall of the shielding member (340) and the third tube wall (3231).
9. The film forming apparatus according to claim 1, wherein The flow guide pipe group (320) is partially accommodated in the exhaust port (103), and the film forming device further comprises a sleeve structure (40) fixedly arranged on the bottom plate (102), the flow guide pipe group (320) is slidably arranged in the sleeve structure (40), and the elastic member (330) is connected with the sleeve structure (40).
10. A CVD reactor characterized by, The film forming device comprises the film forming device according to any one of claims 1 to 9. The film forming device comprises the film forming device according to any one of claims 1 to 9.