Photoresist supply structure and spin coater
By using a positioning mechanism and sensors to monitor the flow rate of the photoresist supply tube in the spin coater, the problem of residue in the photoresist bottle was solved, achieving efficient utilization of photoresist and reducing production costs.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- YANGZHOU JINGXIN MICROELECTRONICS CO LTD
- Filing Date
- 2025-04-22
- Publication Date
- 2026-04-14
AI Technical Summary
In existing technologies, 10%-15% of photoresist remains in the photoresist bottle, causing the spin coater to stop working, resulting in photoresist waste and increased production costs.
The photoresist bottle is held by a first positioning mechanism and a second positioning mechanism, and the flow rate in the supply tube is monitored by a sensor. An alarm signal is triggered only when the flow rate is insufficient to avoid photoresist residue.
By improving the positioning stability and flow monitoring accuracy of the photoresist bottle, the residual amount of photoresist in the bottle can be reduced, thereby increasing the utilization rate of the photoresist.
Smart Images
Figure CN224114426U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of spin coater technology, and in particular to a photoresist supply structure. Background Technology
[0002] A photoresist coater is a core piece of equipment in semiconductor manufacturing used to uniformly coat the surface of wafers with photoresist. Its working principle is to rotate the wafer at high speed, so that the photoresist forms a uniform nano-scale film under centrifugal force, in order to meet the stringent requirements of photolithography for the thickness and consistency of the photoresist layer.
[0003] Currently, the remaining photoresist level in the photoresist bottle is monitored using a sensor. The sensor is fixed to the lower side of the bottom of the photoresist bottle to monitor the remaining photoresist level. When a bottle of photoresist is about to be used up, the sensor on the lower side will issue an alarm signal, prompting the operator to replace the bottle.
[0004] However, since the sensor is installed on the lower side of the bottle, when the alarm is triggered during actual production, about 10%-15% of the photoresist remains in the bottle. The spin coater must stop working and the photoresist must be replaced. The remaining photoresist in the bottle must be discarded, resulting in serious waste of photoresist and increasing the company's production costs. Utility Model Content
[0005] This application provides a photoresist supply structure to reduce the amount of residual photoresist in the photoresist bottle, thereby improving the utilization rate of the photoresist. This application also provides a spin coater that employs the aforementioned photoresist supply structure.
[0006] The first aspect of this application provides a photoresist supply structure for a spin coater, comprising:
[0007] The first positioning mechanism is installed on the frame of the spin coater;
[0008] The displacement mechanism is mounted on the frame;
[0009] The second positioning mechanism is installed on the displacement mechanism. The displacement mechanism causes the second positioning mechanism to move toward or away from the first positioning mechanism. The first positioning mechanism and the second positioning mechanism form a clamping structure for the photoresist bottle.
[0010] A sensor is connected to the photoresist supply tube of the photoresist bottle. The sensor is used to detect the photoresist flow rate in the supply tube. The sensor is electrically connected to the controller of the spin coater.
[0011] The beneficial effects of the above embodiments are as follows: by clamping the photoresist bottle with the first positioning mechanism and the second positioning mechanism, the stability of the photoresist bottle positioning is improved; by monitoring the flow rate in the supply tube with a sensor, the accuracy of flow rate monitoring is improved; and an alarm signal is triggered only when the flow rate is insufficient, thereby reducing the amount of photoresist residue in the photoresist bottle.
[0012] Based on the above embodiments, the embodiments of this application can be further improved as follows:
[0013] In one embodiment of this application: the first positioning mechanism includes a first pressing block, and the second positioning mechanism includes a second pressing block, both the first pressing block and the second pressing block having positioning grooves that match the shape of the photoresist bottle. The beneficial effect of this step is that the positioning grooves improve the stability of the photoresist bottle positioning.
[0014] In one embodiment of this application: the displacement mechanism includes a sliding plate and an elastic element. The sliding plate is slidably disposed on the frame, the second pressure block is connected to the sliding plate, and the elastic element is disposed between the sliding plate and the frame. The elastic element applies an external force to the sliding plate, causing it to move in the direction of the first pressure block. The beneficial effect of this step is that this mechanism enables the clamping of the photoresist bottle, facilitating the handling of the photoresist bottle.
[0015] In one embodiment of this application, the displacement mechanism further includes a protective cover that encloses the elastic element. The beneficial effect of this step is that it protects the elastic element.
[0016] In one embodiment of this application, the device further includes a clamp connected to the first positioning mechanism, the clamp being used to hold the glue supply tube. The beneficial effect of this step is that the clamp improves the stability of the tube positioning, thereby ensuring the stability of the glue supply process.
[0017] The first aspect of this application provides a spin coater, including the photoresist supply structure of the spin coater. Attached Figure Description
[0018] To more clearly illustrate the specific embodiments of this utility model or the technical solutions in the prior art, the drawings used in the description of the specific embodiments or the prior art will be briefly introduced below. In all the drawings, similar elements or parts are generally identified by similar reference numerals. In the drawings, the elements or parts are not necessarily drawn to scale.
[0019] Figure 1 A schematic diagram of the photoresist supply structure for a spin coater;
[0020] Figure 2 for Figure 1 A magnified view of part A in the image.
[0021] Among them, 1 is the first positioning mechanism, 101 is the first bracket, 102 is the first pressure block, 2 is the displacement mechanism, 201 is the guide rail, 202 is the slider, 203 is the first limiting plate, 204 is the second limiting plate, 205 is the sliding plate, 206 is the elastic element, 207 is the first plate body, 208 is the second plate body, 209 is the guide sleeve, 210 is the guide post, 211 is the protective cover, 3 is the second positioning mechanism, 301 is the second bracket, 302 is the second pressure block, 4 is the sensor, 5 is the photoresist bottle, 6 is the glue supply tube, 7 is the clamp, and 8 is the clamping element. Detailed Implementation
[0022] In this application, unless otherwise expressly specified and limited, the terms used should be interpreted broadly. For example, a connection can be a fixed connection, a detachable connection, or an integral part; it can be a direct connection or an indirect connection through an intermediate medium. If electrical or electronic equipment is involved, it can also refer to an electrical connection or a communication signal connection, etc. For those skilled in the art, the specific meaning of different terms in this utility model can be understood according to the specific circumstances, and the scope of the specific meaning should be limited to achieving the function of this application.
[0023] In the description of this application, it should be understood that the directional terms or positional relationships described are based on the orientation or positional relationships shown in the accompanying drawings, or based on the orientation or positional relationships in actual use, and are only for the purpose of facilitating the description of the contents of this application and simplifying the description, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model.
[0024] Example 1
[0025] like Figure 1 , 2 As shown, a photoresist supply structure for a spin coater includes: a first positioning mechanism 1, a displacement mechanism 2, a second positioning mechanism 3, and a sensor 4. The first positioning mechanism 1 is mounted on the frame of the spin coater, the displacement mechanism 2 is mounted on the frame, and the second positioning mechanism 3 is mounted on the displacement mechanism 2. The displacement mechanism 2 causes the second positioning mechanism 3 to move toward or away from the first positioning mechanism 1. The first positioning mechanism 1 and the second positioning mechanism 3 form a clamping structure for the photoresist bottle 5. The sensor 4 is connected to the photoresist supply tube 6 of the photoresist bottle 5 and is used to detect the photoresist flow rate in the supply tube 6. The sensor 4 is electrically connected to the controller of the spin coater.
[0026] Among them, such as Figure 1As shown, the first positioning mechanism 1 includes a first support 101 and a first pressing block 102, and the second positioning mechanism 3 includes a second support 301 and a second pressing block 302. Both the first support 101 and the second support 301 are L-shaped structures. The first support 101 is connected to the frame, and the second support 301 is connected to the displacement mechanism 2. Both the first pressing block 102 and the second pressing block 302 have positioning grooves that match the shape of the photoresist bottle 5, thereby improving the positioning stability of the photoresist bottle 5.
[0027] Among them, such as Figure 2 As shown, the displacement mechanism 2 includes: a guide rail 201, a slider 202, a first limiting plate 203, and a second limiting plate 204. The guide rail 201 is mounted on the frame. The slider 202 is slidably disposed on the guide rail 201 in a direction away from or close to the first pressure block 102. The first limiting plate 203 and the second limiting plate 204 are both mounted on the frame. The first limiting plate 203 is disposed at one end of the guide rail 201, which is closer to the photoresist bottle 5. The second limiting plate 204 is disposed at the other end of the guide rail 201. The first limiting plate 203 and the second limiting plate 204 are used to restrict the slider 202 on the guide rail 201.
[0028] Among them, such as Figure 2 As shown, the displacement mechanism 2 includes a sliding plate 205 and an elastic element 206. The sliding plate 205 is slidably disposed on the frame, and the second pressure block 302 is connected to the sliding plate 205. The elastic element 206 is disposed between the sliding plate 205 and the frame, and the elastic element 206 applies an external force to the sliding plate 205 in the direction of the first pressure block 102. Specifically, the sliding plate 205 is mounted on the slider 202. This mechanism enables the clamping of the photoresist bottle 5, facilitating the placement and removal of the photoresist bottle 5.
[0029] Among them, such as Figure 2 As shown, the displacement mechanism 2 further includes: a first plate 207, a second plate 208, a guide sleeve 209, and a guide post 210. The first plate 207 is connected to the slide plate 205, the second plate 208 is connected to the second limiting plate 204, the guide post 210 is connected to the first plate 207, the guide sleeve 209 is connected to the second plate 208, and the guide post 210 is slidably inserted into the guide sleeve 209. The sliding direction of the guide post 210 is parallel to the sliding direction of the slider 202.
[0030] Among them, such as Figure 2 As shown, the elastic element 206 adopts a cylindrical compression spring (hereinafter referred to as the compression spring). The compression spring is fitted onto the guide sleeve 209. The guide sleeve 209 improves the stability of the compression spring's positioning. The compression spring is located between the first plate 207 and the second plate 208, and the compression spring is in a compressed state.
[0031] Among them, such as Figure 2As shown, the displacement mechanism 2 further includes a protective cover 211, which encloses the elastic element 206. Specifically, the protective cover 211 is an accordion cover, a conventional product with telescopic functionality. The end plates on both sides of the protective cover 211 are connected to the first plate 207 and the second plate 208, respectively, thus protecting the elastic element 206.
[0032] Among them, such as Figure 1 As shown, the photoresist supply structure of the spin coater also includes a clamp 7, which is connected to the first positioning mechanism 1 and is used to clamp the supply tube 6. Specifically, the clamp 7 is bolted to the first bracket 101. The clamp 7 has a through hole through which the supply tube 6 passes. The clamp 7 also has a threaded hole communicating with the through hole, in which a clamping member 8 is threadedly connected. The clamping member 8 has a stud in the middle, which is threadedly connected to the threaded hole. The upper end of the stud extends to the outside of the clamp 7 and is connected to a knob. The lower end of the stud is connected to a rubber block, which presses the supply tube 6 in the through hole, thereby stably positioning the supply tube 6 in the clamp 7. The sensor 4 is a METUOES photoelectric pipe level sensor. The sensor 4 is fitted onto the supply tube 6 with a self-fixing sleeve and is installed on the supply tube 6 between the clamp 7 and the photoresist bottle 5. The clamp 7 improves the stability of the tube positioning, thereby ensuring the stability of the supply process.
[0033] In use, the photoresist supply structure of the spin coater is operated by first dragging the second support 301 to create sufficient space between the second support 301 and the first support 101 to place the photoresist bottle 5. The photoresist bottle 5 is then placed in this space, with one side of the bottle pressed tightly against the first pressure block 102. The second support 301 is then released, and it slides under the force of the spring. The second pressure block 302 presses firmly against the other side of the photoresist bottle 5, stably positioning it. The supply tube 6 is then passed through the clamp 7, which positions it. During spin coater operation, the supply pump draws photoresist from the photoresist bottle 5 into the dispensing nozzle, which then drips the photoresist onto the wafer. During this process, sensor 4 constantly monitors the flow rate of photoresist in the supply tube 6. When the flow rate is insufficient, sensor 4 sends a signal to the spin coater controller, and the spin coater issues an alarm signal to remind the operator to replace the photoresist bottle 5 in time. Since sensor 4 directly monitors the flow rate in the supply tube 6, the controller only generates an alarm signal when the flow rate in the supply tube 6 is insufficient. Therefore, it can avoid triggering the alarm signal when the flow rate is sufficient (such as the situation mentioned in the background technology where there is 10%-15% photoresist remaining in the photoresist bottle 5), which greatly reduces the amount of residual photoresist in the photoresist bottle 5 and thus improves the utilization rate of photoresist.
[0034] Example 2
[0035] A spin coater includes the photoresist supply structure for a spin coater disclosed in Example 1.
[0036] The above are merely embodiments of this utility model. Commonly known structures and characteristics are not described in detail here. Those skilled in the art are aware of all common technical knowledge in the field prior to the application date or priority date, are aware of all existing technologies in that field, and have the ability to apply conventional experimental methods prior to that date. Those skilled in the art can, based on the guidance provided in this application, improve and implement this solution in combination with their own capabilities. Some typical known structures or methods should not be obstacles for those skilled in the art to implement this application. It should be noted that those skilled in the art can make several modifications and improvements without departing from the structure of this utility model. These should also be considered within the scope of protection of this utility model, and will not affect the effectiveness of the implementation of this utility model or the practicality of the patent.
Claims
1. A photoresist supply structure for a spin coater, characterized in that, include: The first positioning mechanism is installed on the frame of the spin coater; The displacement mechanism is mounted on the frame; The second positioning mechanism is installed on the displacement mechanism. The displacement mechanism causes the second positioning mechanism to move toward or away from the first positioning mechanism. The first positioning mechanism and the second positioning mechanism form a clamping structure for the photoresist bottle. A sensor is connected to the photoresist supply tube of the photoresist bottle. The sensor is used to detect the photoresist flow rate in the supply tube. The sensor is electrically connected to the controller of the spin coater.
2. The photoresist supply structure for the spin coater according to claim 1, characterized in that, The first positioning mechanism includes a first pressing block, and the second positioning mechanism includes a second pressing block. Both the first pressing block and the second pressing block have positioning grooves that match the shape of the photoresist bottle.
3. The photoresist supply structure for the spin coater according to claim 2, characterized in that, The displacement mechanism includes: a sliding plate and an elastic element. The sliding plate is slidably disposed on the frame. The second pressure block is connected to the sliding plate. The elastic element is disposed between the sliding plate and the frame. The elastic element applies an external force to the sliding plate, causing it to move toward the first pressure block.
4. The photoresist supply structure for the spin coater according to claim 3, characterized in that, The displacement mechanism further includes a protective cover, which encloses the elastic element therein.
5. The photoresist supply structure for the spin coater according to claim 1, characterized in that, Also includes: A clamp is connected to the first positioning mechanism and is used to hold the glue supply tube.
6. A spin coater, characterized in that, Includes the photoresist supply structure for a spin coater as described in any one of claims 1-5.