Device for removing particles on surface of MASK photomask

Abstract

The utility model discloses a MASK photomask surface particulate matter removing device which comprises a base, a supporting frame is fixedly arranged on the base, an adjusting arm is connected to the supporting frame, a mounting plate is connected to the top end of the adjusting arm, a spray head is fixedly arranged on the mounting plate, a flow adjusting mechanism is arranged at the top end of the spray head, and the flow adjusting mechanism is arranged on the top end of the spray head. The flow adjusting mechanism comprises a mounting sleeve, a sliding groove, a sliding block, baffles, a connecting plate, an adjusting sleeve and an external pipe, the flow adjusting mechanism adopts a multi-baffle linkage adjusting design, synchronous opening and closing of the baffles are achieved through cooperation of the sliding block and the sliding groove, and the sectional area of an airflow channel can be accurately adjusted according to the requirements of particulate matter with different particle sizes; the pain point that a traditional device cannot precisely control the air flow is solved.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor manufacturing process technology, and more specifically, it relates to a device for removing particulate matter from the surface of a mask. Background Technology

[0002] In semiconductor manufacturing processes, the cleanliness of the photomask surface directly affects the exposure quality and yield of the chip. When using gas purging to remove particulate matter from the photomask surface, existing technologies generally suffer from inaccurate gas flow control. Since particles of different sizes and materials require different airflow impact forces to be effectively removed, traditional devices cannot dynamically adjust the gas output according to the characteristics of the particles, resulting in either incomplete cleaning or damage to the photomask surface due to excessive airflow. Especially when dealing with nanoscale particles, this coarse airflow control method is difficult to meet the requirements of precision manufacturing and seriously affects the yield of advanced processes.

[0003] From the perspective of process stability, traditional gas cleaning methods still have the defect of uneven airflow distribution. The adhesion state of particles in different areas of the photomask surface is different, and the airflow parameters need to be adjusted accordingly. However, the existing technology lacks intelligent zone control capabilities, resulting in unstable cleaning effect and often requiring repeated operations. In addition, excessive gas flow not only wastes energy, but also generates turbulence in the chamber, causing the detached particles to re-attach to the photomask surface. Utility Model Content

[0004] (a) Technical problems to be solved

[0005] In view of the problems existing in the prior art, this utility model provides a device for removing particulate matter from the surface of a mask, so as to solve the technical problems mentioned in the background art.

[0006] (II) Technical Solution

[0007] To achieve the above objectives, this utility model provides the following technical solution: a device for removing particulate matter from the surface of a mask, comprising a base, a support frame fixedly mounted on the base, an adjusting arm connected to the support frame, a mounting plate connected to the top of the adjusting arm, a nozzle fixedly mounted on the mounting plate, and a flow adjustment mechanism at the top of the nozzle. The flow adjustment mechanism includes a mounting sleeve, a sliding groove, a slider, a baffle, a connecting plate, an adjusting sleeve, and an outer connecting pipe. The mounting sleeve is connected to the top of the nozzle. Multiple sets of sliding grooves are distributed inside the mounting sleeve. The slider slides within the multiple sets of sliding grooves. The baffle is fixed inside the multiple sets of sliders. The connecting plate is connected to the outer wall of the multiple sets of baffles. The adjusting sleeve slides within the mounting sleeve and is fixedly connected to multiple sets of elastic plates. The outer connecting pipe is connected within the adjusting sleeve.

[0008] The present invention is further configured such that the outer wall of the adjusting sleeve is provided with a guide groove, and multiple sets of the guide groove are provided; the inner wall of the mounting sleeve is provided with a guide block, and multiple sets of the guide block are provided and slidably connected to multiple sets of guide grooves respectively, so as to ensure that the adjusting sleeve maintains stable linear motion during movement and prevents deflection and jamming.

[0009] The present invention is further configured such that all of the connecting plates are elastic plates, and the flexible connection of the baffles is achieved through elastic deformation, which ensures the adjustment accuracy and avoids rigid impact.

[0010] The present invention is further configured such that a positioning mechanism is provided on the outer side of the mounting sleeve. The positioning mechanism includes a movable groove, abutting rod, a positioning block, a positioning groove, a push spring, and a limiting sleeve. The movable groove is provided inside multiple sets of guide blocks, the abutting rod slides on the outer wall of multiple sets of movable grooves, the positioning block is fixed to the bottom end of multiple sets of abutting rods, multiple sets of positioning grooves are provided distributed inside the guide grooves, the push spring is connected to the outer wall of multiple sets of positioning blocks and fixedly connected to the inner wall of the movable groove, and the limiting sleeve slides on the outer wall of the mounting sleeve, thereby realizing multi-position precise positioning and reliable locking functions.

[0011] The present invention is further configured such that all of the multiple sets of positioning blocks are spherical and the inner walls of the multiple sets of positioning grooves are arc-shaped, thereby reducing contact friction, making the positioning action smoother, and extending the service life.

[0012] The present invention is further configured such that an installation ring is fixedly provided on the outer wall of the mounting sleeve, and a compression spring is provided between the limiting sleeve and the mounting ring. Multiple sets of compression springs are provided to provide a stable reset force to ensure reliable operation of the positioning mechanism.

[0013] The present invention is further configured such that a support rod is fixedly provided on the support frame, and universal joints are connected to both ends of the support rod. Fixing clamps are connected to the outer ends of multiple sets of universal joints, so as to realize the free adjustment and stable clamping of the photomask at multiple angles.

[0014] The present invention is further configured such that the inner side of the limiting sleeve and the top of the multiple sets of abutting rods are all provided with rounded corners to reduce frictional resistance during relative movement, making the operation smoother and less strenuous.

[0015] (III) Beneficial Effects

[0016] Compared with the prior art, this utility model provides a device for removing particulate matter from the surface of a mask, which has the following beneficial effects:

[0017] 1. This particulate matter removal device on the photomask surface achieves precise control of gas flow rate through an innovative flow adjustment mechanism. The flow adjustment mechanism adopts a multi-baffle linkage adjustment design, and the synchronous opening and closing of the baffles is achieved through the cooperation of the slider and the slide groove. The cross-sectional area of ​​the airflow channel can be precisely adjusted according to the requirements of particles of different sizes, solving the pain point of traditional devices being unable to precisely control the airflow.

[0018] 2. The positioning mechanism achieves multi-level adjustment through the cooperation of the spherical positioning block and the positioning groove. The preload of the compression spring ensures stable locking after adjustment, which not only guarantees the adjustment accuracy but also prevents accidental displacement during operation.

[0019] 3. The combination of the universal joint and the fixing clamp enables multi-angle free adjustment of the photomask. This ensures optimal airflow impact angle at different positions while firmly securing the photomask to prevent vibration and displacement during cleaning. The entire device achieves stepless control of airflow through the linear adjustment characteristics of the flow regulating mechanism. Combined with the position locking function of the positioning mechanism, differentiated cleaning strategies can be implemented for different areas of the photomask based on their degree of contamination. The flexible steering of the universal joint and the reliable clamping of the fixing clamp allow operators to quickly adjust to the optimal cleaning position, significantly improving cleaning efficiency and effectiveness. These innovative designs collectively solve the problems of inaccurate adjustment, poor stability, and inconvenient operation of traditional gas cleaning devices, meeting the increasingly stringent precision requirements of semiconductor manufacturing for photomask cleaning processes. Attached Figure Description

[0020] Figure 1 This is a schematic diagram of the overall structure of a MASK photomask surface particulate matter removal device according to the present invention;

[0021] Figure 2 This is a schematic diagram of the flow regulation mechanism in this utility model;

[0022] Figure 3 This is a cross-sectional view of the flow regulation mechanism in this utility model;

[0023] Figure 4 This is a schematic diagram of the adjusting sleeve in this utility model;

[0024] Figure 5 This is a cross-sectional view of the mounting sleeve in this utility model.

[0025] In the diagram: 1. Base; 2. Support frame; 3. Adjusting arm; 4. Mounting plate; 5. Nozzle; 6. Mounting sleeve; 7. Slide groove; 8. Slider; 9. Baffle; 10. Connecting plate; 11. Adjusting sleeve; 12. Outer pipe; 13. Guide groove; 14. Guide block; 15. Movable groove; 16. Abutment rod; 17. Positioning block; 18. Positioning groove; 19. Push spring; 20. Limiting sleeve; 21. Mounting ring; 22. Compression spring; 23. Support rod; 24. Universal joint; 25. Fixing clamp. Detailed Implementation

[0026] It should be noted that, where there is no conflict, the embodiments and features described in this application can be combined with each other. The present invention will now be described in detail with reference to the accompanying drawings and embodiments.

[0027] It should be noted that, unless otherwise specified, all technical and scientific terms used in this application have the same meaning as commonly understood by one of ordinary skill in the art to which this application pertains.

[0028] In this utility model, unless otherwise stated, the orientations used, such as "up" and "down", usually refer to the direction shown in the accompanying drawings, or to the vertical, perpendicular, or gravitational direction; similarly, for ease of understanding and description, "left" and "right" usually refer to the left and right shown in the accompanying drawings; "inner" and "outer" refer to the inner and outer contours of each component itself, but the above directional terms are not used to limit this utility model.

[0029] Please see Figures 1-5 A device for removing particulate matter from the surface of a mask includes a base 1, a support frame 2 fixedly mounted on the base 1, an adjusting arm 3 connected to the support frame 2, a mounting plate 4 connected to the top of the adjusting arm 3, a nozzle 5 fixedly mounted on the mounting plate 4, and a flow adjustment mechanism at the top of the nozzle 5. The flow adjustment mechanism includes a mounting sleeve 6, a sliding groove 7, a slider 8, a baffle 9, a connecting plate 10, an adjusting sleeve 11, and an outer pipe 12. The mounting sleeve 6 is connected to the top of the nozzle 5. Multiple sets of sliding grooves 7 are distributed inside the mounting sleeve 6. The slider 8 slides within the multiple sets of sliding grooves 7. The baffle 9 is fixed inside the multiple sets of sliders 8. The connecting plate 10 is connected to the outer wall of the multiple sets of baffles 9. The adjusting sleeve 11 slides within the mounting sleeve 6 and is fixedly connected to multiple sets of elastic plates. The outer pipe 12 is connected within the adjusting sleeve 11.

[0030] The outer wall of the adjusting sleeve 11 is provided with a guide groove 13, and there are multiple sets of guide grooves 13. The inner wall of the mounting sleeve 6 is provided with a guide block 14, and there are multiple sets of guide blocks 14, which are slidably connected to multiple sets of guide grooves 13 respectively. The cooperation of 13 and 14 ensures that 11 maintains linear movement without deviation during the adjustment process.

[0031] All the connecting plates 10 are set as elastic plates, and the elasticity of 10 realizes the flexible connection and buffer protection of the baffle 9.

[0032] A positioning mechanism is provided on the outer side of the mounting sleeve 6. The positioning mechanism includes a movable groove 15, abutting rod 16, positioning block 17, positioning groove 18, push spring 19, and limiting sleeve 20. The movable groove 15 is located inside multiple sets of guide blocks 14. The abutting rod 16 slides on the outer wall of multiple sets of movable grooves 15. The positioning block 17 is fixed to the bottom end of multiple sets of abutting rods 16. Multiple sets of positioning grooves 18 are provided inside the guide grooves 13. The push spring 19 is connected to the outer wall of multiple sets of positioning blocks 17 and fixedly connected to the inner wall of the movable groove 15. The limiting sleeve 20 slides on the outer wall of the mounting sleeve 6. The graded positioning system composed of 16-20 realizes the locking of the gear position of the adjusting sleeve 11.

[0033] All the positioning blocks 17 are spherical, and the inner walls of all the positioning grooves 18 are arc-shaped. The spherical contact between 17 and 18 reduces frictional loss and improves positioning accuracy.

[0034] An installation ring 21 is fixedly provided on the outer wall of the mounting sleeve 6. A compression spring 22 is provided between the limiting sleeve 20 and the mounting ring 21. Multiple sets of compression springs 22 are provided, and 22 provides continuous elastic force to keep 20 stably pressing 16.

[0035] A support rod 23 is fixedly installed on the support frame 2. Universal joints 24 are connected to both ends of the support rod 23. Fixing clamps 25 are connected to the outer ends of multiple sets of universal joints 24. The photomask clamping system composed of 23-25 ​​can achieve free adjustment at multiple angles.

[0036] The inner side of the limiting sleeve 20 and the top of the multiple sets of abutment rods 16 are all provided with rounded corners. The rounded corner design reduces the frictional resistance when 20 and 16 move relative to each other.

[0037] In this embodiment, during use, the photomask is clamped by the fixing clamp 25, the cleaning angle of the photomask is adjusted by the universal joint 24, the external pipe 12 is connected to the output hose of the external air pump, and the particles on the outside of the photomask are removed by blowing through the nozzle 5. When it is necessary to adjust the blowing flow rate, the limiting sleeve 20 is pushed to squeeze the multiple sets of compression springs 22, releasing the contact with the multiple sets of abutment rods 16. The sliding adjustment sleeve 11 slides along the guide block 14 through the multiple sets of guide grooves 13. The adjustment sleeve 11 pulls the baffle 9 through the multiple sets of connecting plates 10 so that it slides along the slide groove 7 through the slider 8, and at the same time drives the multiple sets of baffles 9 to adjust the flow gap of the airflow channel, thereby adjusting the airflow output.

[0038] More specifically, when the adjusting sleeve 11 moves, multiple sets of positioning blocks 17 slide out in the positioning groove 18 and squeeze the push spring 19. When it moves to the next set of positioning grooves 18, the push spring 19 pushes the positioning block 17 to engage in the positioning groove 18, realizing equidistant positioning adjustment. After the adjustment is completed, the limiting sleeve 20 is released, and the limiting sleeve 20 is pushed to abut against the top of multiple sets of abutment rods 16 by multiple sets of compression springs 22, thereby locking multiple sets of positioning blocks 17 in the positioning groove 18 and fixing the adjusting sleeve 11.

[0039] In summary, during use or operation of the overall equipment: When in use, the photomask is clamped by the fixing clamp 25, the cleaning angle of the photomask is adjusted by the universal joint 24, the external pipe 12 is connected to the external air pump output hose, and the nozzle 5 blows air to remove particles from the outside of the photomask. When it is necessary to adjust the airflow, the limiting sleeve 20 is pushed to compress multiple compression springs 22, releasing the contact with multiple abutment rods 16. The sliding adjustment sleeve 11 slides along the guide block 14 through multiple guide grooves 13. The adjustment sleeve 11 pulls the baffle 9 through multiple connecting plates 10, causing it to slide along the slide groove 7 via the slider 8, simultaneously driving the multiple baffles 9 to adjust the flow gap of the airflow channel, thereby adjusting the airflow output.

[0040] When the adjusting sleeve 11 moves, multiple sets of positioning blocks 17 slide out in the positioning groove 18 and press the push spring 19. When it moves to the next set of positioning grooves 18, the push spring 19 pushes the positioning block 17 to engage in the positioning groove 18, realizing equidistant positioning adjustment. After the adjustment is completed, the limiting sleeve 20 is released, and the limiting sleeve 20 is pushed to abut against the top of multiple sets of abutment rods 16 by multiple sets of compression springs 22, thereby locking multiple sets of positioning blocks 17 in the positioning groove 18 and fixing the adjusting sleeve 11.

[0041] Of all the solutions mentioned above, those involving the connection between two components can be selected according to the actual situation, such as welding, bolt and nut connection, bolt or screw connection, or other known connection methods, which will not be elaborated here. For all the fixed connections mentioned above, welding is preferred. Although embodiments of this utility model have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and variations can be made to these embodiments without departing from the principles and spirit of this utility model. The scope of this utility model is defined by the appended claims and their equivalents.

Claims

1. A device for removing particulate matter from the surface of a mask, comprising a base (1), characterized in that: A support frame (2) is fixedly provided on the base (1). An adjusting arm (3) is connected to the support frame (2). An installation plate (4) is connected to the top of the adjusting arm (3). A nozzle (5) is fixedly provided on the installation plate (4). A flow adjustment mechanism is provided at the top of the nozzle (5). The flow adjustment mechanism includes an installation sleeve (6), a sliding groove (7), a slider (8), a baffle (9), a connecting plate (10), an adjusting sleeve (11), and an outer pipe (12). The installation sleeve (6) is connected to the top of the nozzle (5). Multiple sets of sliding grooves (7) are provided and distributed inside the installation sleeve (6). The slider (8) slides in multiple sets of sliding grooves (7). The baffle (9) is fixed inside multiple sets of sliders (8). The connecting plate (10) is connected to the outer wall of multiple sets of baffles (9). The adjusting sleeve (11) slides in the installation sleeve (6) and is fixedly connected to multiple sets of elastic plates. The outer pipe (12) is connected inside the adjusting sleeve (11).

2. The device for removing particulate matter from the surface of a mask according to claim 1, characterized in that: The outer wall of the adjusting sleeve (11) is provided with a guide groove (13), and there are multiple sets of the guide groove (13). The inner wall of the mounting sleeve (6) is provided with a guide block (14), and there are multiple sets of the guide block (14) which are slidably connected to multiple sets of guide grooves (13).

3. The device for removing particulate matter from the surface of a mask according to claim 2, characterized in that: All of the connecting plates (10) in the multiple sets are configured as elastic plates.

4. The device for removing particulate matter from the surface of a mask according to claim 3, characterized in that: The mounting sleeve (6) is provided with a positioning mechanism on its outer side. The positioning mechanism includes a movable groove (15), an abutment rod (16), a positioning block (17), a positioning groove (18), a push spring (19), and a limiting sleeve (20). The movable groove (15) is provided inside multiple sets of guide blocks (14). The abutment rod (16) slides on the outer wall of multiple sets of movable grooves (15). The positioning block (17) is fixed at the bottom of multiple sets of abutment rods (16). Multiple sets of positioning grooves (18) are provided inside the guide grooves (13). The push spring (19) is connected to the outer wall of multiple sets of positioning blocks (17) and fixedly connected to the inner wall of the movable groove (15). The limiting sleeve (20) slides on the outer wall of the mounting sleeve (6).

5. The device for removing particulate matter from the surface of a mask according to claim 4, characterized in that: The multiple sets of positioning blocks (17) are all spherical, and the inner walls of the multiple sets of positioning grooves (18) are all arc-shaped.

6. The device for removing particulate matter from the surface of a mask according to claim 5, characterized in that: The outer wall of the mounting sleeve (6) is fixedly provided with a mounting ring (21), and a compression spring (22) is provided between the limiting sleeve (20) and the mounting ring (21), and multiple sets of the compression spring (22) are provided.

7. The device for removing particulate matter from the surface of a mask according to claim 6, characterized in that: The support frame (2) is fixedly provided with a support rod (23), and both ends of the support rod (23) are connected with universal joints (24), and the outer ends of multiple sets of universal joints (24) are connected with fixing clips (25).

8. The device for removing particulate matter from the surface of a mask according to claim 7, characterized in that: The inner side of the limiting sleeve (20) and the top of the multiple sets of abutment rods (16) are all provided with rounded corners.

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