Electrode cleaning equipment

Abstract

The utility model relates to the technical field of semiconductor processing, and provides an electrode cleaning device which comprises a cleaning chamber and an electrode fixing piece, cleaning fluid is contained in the cleaning chamber, the cleaning chamber is provided with a rotating shaft, and the electrode fixing piece is arranged on the rotating shaft and can rotate relative to the cleaning chamber. According to the electrode cleaning device, the electrode fixing piece is arranged, the electrode is fixed to the electrode fixing piece, the electrode fixing piece rotates relative to the cleaning cavity through the rotating shaft, the electrode fixing piece can make full contact with the cleaning liquid in the rotating process, pollutants on the surface of the electrode and in holes can be rapidly and efficiently removed, and compared with the prior art, the electrode cleaning device is convenient to use. In the rotating process of the electrode fixing piece, the flow speed of the cleaning liquid is increased, the cleaning strength on the electrode can be improved, and the cleaning efficiency and the cleaning effect can be improved to a certain degree.

Description

Technical Field

[0001] This utility model belongs to the field of semiconductor processing technology, and in particular relates to an electrode cleaning device. Background Technology

[0002] Currently, the main fabrication processes for modern very large-scale integrated circuits include thin film preparation (CVD, PVD), diffusion doping, ion implantation, high-temperature processes (oxidation, annealing), photolithography, and etching. Among these, etching is an important step in wafer fabrication, which mainly involves selectively removing unwanted materials from the silicon wafer surface using chemical or physical methods. Dry etching, on the other hand, involves bombarding the silicon wafer surface with plasma gas.

[0003] Electrodes, also known as plasma distribution disks, are disc-shaped materials with a certain thickness and a uniformly distributed number of micropores. They are used to disperse plasma gas, thereby ensuring that the plasma bombards the wafer surface evenly. With increasingly refined layout designs for very large-scale integrated circuits, current wafer fabrication processes have generally entered the nanometer era, thus placing extremely high demands on cleanliness throughout the entire process. Since the electrodes and wafers are in direct contact within the dry etching machine cavity, the electrodes also need to have high cleanliness to avoid contaminating the wafer during dry etching. Electrode cleanliness is mainly reflected in the absence of excessive particles, metals, and organic matter on the surface and within the micropores. Traditional cleaning methods typically involve immersing the electrodes in a tank filled with cleaning solution using a basket or similar fixture. The liquid molecules undergo random Brownian motion, reacting with contaminants through physical or chemical processes to remove them. However, this method results in stagnant cleaning solutions, particularly hindering the free diffusion of liquids into the high aspect ratio micropores, requiring long immersion times, and yielding unsatisfactory cleaning results.

[0004] To solve the above-mentioned technical problems, this utility model designs an electrode cleaning device. Utility Model Content

[0005] This invention provides an electrode cleaning device that has a simple structure, provides thorough cleaning, and has high cleaning efficiency.

[0006] To achieve the above objectives, the present invention provides the following technical solution: an electrode cleaning device, comprising a cleaning chamber and an electrode fixing component, wherein the cleaning chamber is filled with cleaning fluid, the cleaning chamber is provided with a rotating shaft, and the electrode fixing component is disposed on the rotating shaft and is rotatable relative to the cleaning chamber.

[0007] Based on the above technical solution, the height of the cleaning fluid in the cleaning chamber is greater than or equal to the height of the electrode fixing component when it rotates to the bottom of the cleaning chamber.

[0008] Based on the above technical solution, the inner wall of the cleaning chamber is provided with an overflow groove in the circumferential direction, and the bottom wall of the overflow groove is provided with a first flow outlet.

[0009] Furthermore, the bottom wall of the cleaning chamber is provided with an arc-shaped bottom plate, and the bottom end of the arc-shaped bottom plate is provided with a second flow outlet. The arc-shaped bottom plate matches the outer edge trajectory of the electrode fixing component when it rotates.

[0010] Based on the above technical solution, the electrode fixing component is provided with a through hole and a limiting block, and the limiting block fixes the electrode in the through hole.

[0011] Furthermore, the electrode fixing component is provided with a mounting groove, the through hole is provided in the bottom wall of the mounting groove, and the side wall of the mounting groove is provided with a chamfer.

[0012] Specifically, the shaft extends in a horizontal direction.

[0013] Based on the above technical solution, the rotating shaft is located in the middle of the cleaning chamber or near the side wall of the cleaning chamber.

[0014] Based on the above technical solution, the electrode cleaning equipment also includes a driving component, which is connected to the rotating shaft and is used to drive the electrode fixing component to rotate relative to the cleaning chamber.

[0015] Furthermore, the electrode cleaning equipment also includes an evaporation chamber located above the cleaning chamber, with a vent at the top and an observation window on the side.

[0016] Compared with related technologies, the beneficial effects of this utility model are as follows:

[0017] This invention uses an electrode fixing component to fix the electrode to the cleaning chamber. The electrode fixing component rotates relative to the cleaning chamber via a rotating shaft. During the rotation, the electrode fixing component can fully contact the cleaning fluid, which can quickly and efficiently remove contaminants from the electrode surface and the holes. Moreover, compared with the prior art, the flow rate of the cleaning fluid increases during the rotation of the electrode fixing component, which can increase the cleaning force on the electrode and improve the cleaning efficiency and effect to a certain extent. Attached Figure Description

[0018] To more clearly illustrate the technical solutions in the embodiments of this utility model or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only one embodiment of this utility model. For those skilled in the art, other embodiments can be derived from the provided drawings without creative effort.

[0019] Figure 1This is a schematic diagram of the structure of an electrode cleaning device provided by this utility model;

[0020] Figure 2 This utility model provides Figure 1 The diagram shows a cross-sectional structure along the AA direction;

[0021] Figure 3 This is a schematic diagram of the structure of an electrode fixing component and a rotating shaft provided by this utility model;

[0022] Figure 4 This is a schematic diagram of another electrode cleaning device provided by this utility model.

[0023] In the diagram: 1. Cleaning chamber; 11. Rotating shaft; 12. Overflow groove; 13. First outlet; 14. Arc-shaped bottom plate; 15. Second outlet; 16. First connecting pipe; 17. Second connecting pipe; 2. Electrode fixing component; 21. Through hole; 22. Limiting block; 23. Mounting groove; 24. Chamfer; 3. Evaporation chamber; 31. Ventilation port; 32. Observation window. Detailed Implementation

[0024] The present invention will be further described below with reference to the accompanying drawings and examples:

[0025] The embodiments of this utility model are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain this utility model, and should not be construed as limiting this utility model.

[0026] In the description of this utility model, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a direct connection or an indirect connection through an intermediate medium. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0027] In the description of this utility model, it should be understood that the terms "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model.

[0028] Combination Figure 1-4As shown, this embodiment of the present disclosure provides an electrode cleaning device, including a cleaning chamber 1 and an electrode fixing member 2. The cleaning chamber 1 is filled with cleaning fluid, and the cleaning chamber 1 is provided with a rotating shaft 11. The electrode fixing member 2 is disposed on the rotating shaft 11 and can rotate relative to the cleaning chamber 1.

[0029] The electrode cleaning device provided in this embodiment of the present disclosure uses an electrode fixing member 2 to fix the electrode. The electrode is rotated relative to the cleaning chamber 1 via a rotating shaft 11. During the rotation, the electrode fixing member 2 can fully contact the cleaning fluid, which can quickly and efficiently remove contaminants from the electrode surface and the hole. Moreover, compared with the prior art, the flow rate of the cleaning fluid increases during the rotation of the electrode fixing member, which can increase the cleaning force on the electrode and improve the cleaning efficiency and cleaning effect to a certain extent.

[0030] To ensure full contact between the electrode holder 2 and the cleaning solution, the height of the cleaning solution in the cleaning chamber 1 is greater than or equal to the height of the electrode holder 2 when rotated to the bottom of the cleaning chamber 1. This allows the electrode holder 2 to be completely immersed in the cleaning solution, resulting in more thorough cleaning and improved cleaning effect.

[0031] Combination Figure 2 As shown, to avoid excessive cleaning fluid in the cleaning chamber 1, based on the above technical solution, an overflow groove 12 is provided circumferentially on the inner wall of the cleaning chamber 1, and a first outlet 13 is provided on the bottom wall of the overflow groove 12. When the level of the cleaning fluid in the cleaning chamber 1 reaches the opening height of the overflow groove 12, the excess cleaning fluid will overflow into the overflow groove 12, and the cleaning fluid in the overflow groove 12 can flow out of the cleaning chamber 1 through the first outlet 13.

[0032] Specifically, the top of the side wall of the overflow channel 12 near the interior of the cleaning chamber 1 is serrated. The serrated structure can disperse the overflowing cleaning liquid into multiple small streams, making the cleaning liquid more evenly distributed and flowing more smoothly when it flows out. Moreover, the serrated structure can disrupt the surface tension of the cleaning liquid and accelerate the outflow of excess cleaning liquid.

[0033] Furthermore, combined Figure 2 As shown, the bottom wall of the cleaning chamber 1 is provided with an arc-shaped bottom plate 14, and the bottom end of the arc-shaped bottom plate 14 is provided with a second outlet 15. The arc-shaped bottom plate 14 matches the outer edge trajectory of the electrode fixing member 2 when it rotates. When the arc-shaped bottom plate 14 matches the outer edge trajectory of the electrode fixing member 2 when it rotates, the installation space of the cleaning chamber 1 can be saved to a certain extent. Moreover, the arc-shaped bottom plate 14 can cooperate with the rotation of the electrode fixing member 2, which can avoid the cleaning fluid from having a violent collision with the side wall and bottom wall of the cleaning chamber 1, and avoid the reaction force after the collision from affecting the rotation of the electrode fixing member 2, thus avoiding affecting the cleaning process.

[0034] To facilitate the outflow of cleaning fluid from the cleaning chamber 1 after use, a second outlet 15 is provided at the bottom end of the arc-shaped base plate 14. Preferably, the second outlet 15 is located at the lowest point of the arc-shaped base plate 14, allowing the cleaning fluid to flow downwards along the arc-shaped base plate 14 and out of the cleaning chamber 1 through the second outlet 15. Specifically, the first outlet 13 is connected to the cleaning fluid recovery unit via a first connecting pipe 16, and the second outlet 15 is connected to the cleaning fluid recovery unit via a second connecting pipe 17. The first connecting pipe 16 and the second connecting pipe 17 converge into a main pipe, which is connected to the cleaning fluid recovery unit.

[0035] Combination Figure 3 As shown, in order to improve the stability of electrode fixation, the electrode fixing component 2 is provided with a through hole 21 and a limiting block 22, and the limiting block 22 fixes the electrode in the through hole 21.

[0036] Specifically, there can be multiple limiting blocks 22, which are evenly distributed circumferentially around the through hole 21. This even distribution of multiple limiting blocks 22 ensures a uniform distribution of the fixing force on the electrode within the through hole 21. This design prevents the electrode from tilting or loosening due to uneven force, thereby improving the stability of the electrode during the cleaning process. Multiple limiting blocks 22 provide multi-point support, which, compared to single-point or few support points, can more effectively limit electrode displacement, especially when the electrode is impacted by the cleaning fluid during rotation, better maintaining its fixed state.

[0037] To accommodate electrodes of different sizes and models, the limiting block 22 has multiple mounting positions, which can be adjusted according to the size of the electrode to achieve a better fixing effect.

[0038] Furthermore, combined Figure 3 As shown, the electrode fixing member 2 is provided with a mounting groove 23, the through hole 21 is provided in the bottom wall of the mounting groove 23, and the side wall of the mounting groove 23 is provided with a chamfer 24.

[0039] Specifically, there can be two mounting grooves 23, each located on one side of the electrode holder 2. The presence of the mounting grooves 23 provides additional flow space for the cleaning fluid, allowing for better circulation around the electrode. This design ensures that the cleaning fluid evenly contacts the electrode surface and the hole, thereby improving cleaning efficiency. The chamfer 24 reduces the retention of cleaning fluid on the sidewalls of the mounting grooves 23, preventing the formation of "dead water zones." This design allows the cleaning fluid to flow more smoothly, further improving the cleaning effect.

[0040] Specifically, the rotating shaft 11 extends horizontally. The rotating shaft 11 can be positioned in the middle of the cleaning chamber 1 or near the side wall of the cleaning chamber 1. When the rotating shaft 11 is positioned in the middle of the cleaning chamber 1, there is one rotating shaft 11. When the rotating shaft 11 is positioned near the side wall of the cleaning chamber 1, there can be two rotating shafts 11, which are positioned opposite each other on the two side walls of the cleaning chamber 1. Increasing the number of rotating shafts 11 and electrode fixing components 2 can improve the electrode cleaning efficiency.

[0041] Based on the above technical solution, the electrode cleaning equipment also includes a driving component, which is connected to the rotating shaft 11 and is used to drive the electrode fixing component 2 to rotate relative to the cleaning chamber 1. The driving component can be a motor, a hydraulic driving component, a pneumatic driving component, or an electromagnetic driving device.

[0042] Furthermore, combined Figure 2 and 4 As shown, the electrode cleaning equipment also includes an evaporation chamber 3, which is located above the cleaning chamber 1. The top of the evaporation chamber 3 is provided with a vent 31, and the side of the evaporation chamber 3 is provided with an observation window 32.

[0043] The cleaning fluid in cleaning chamber 1 generates volatile gases during use. These gases are discharged from evaporation chamber 3 through vent 31 to prevent accumulation inside the equipment. Since these volatile gases may be toxic or flammable, vent 31 allows for timely removal, reducing safety risks. The observation window 32 allows operators to monitor the operating status of evaporation chamber 3 in real time during equipment operation, promptly identifying any abnormalities. The observation window 32 allows for inspection of stains or residues within evaporation chamber 3, facilitating timely cleaning and maintenance. Furthermore, operators can adjust the equipment's operating parameters based on the conditions observed through the observation window 32 to achieve better cleaning results.

[0044] The present invention has been described above by way of example, but the present invention is not limited to the specific embodiments described above. Any modifications or variations made based on the present invention shall fall within the scope of protection claimed by the present invention.

Claims

1. An electrode cleaning apparatus, characterized by, The device includes a cleaning chamber and an electrode holder. The cleaning chamber contains cleaning fluid and has a rotating shaft. The electrode holder is located on the rotating shaft and can rotate relative to the cleaning chamber. The electrode holder has a through hole and a limiting block. The limiting block fixes the electrode in the through hole.

2. The electrode cleaning apparatus according to claim 1, characterized by The height of the cleaning fluid in the cleaning chamber is greater than or equal to the height of the electrode fixing component when rotated to the bottom of the cleaning chamber.

3. The electrode cleaning apparatus according to claim 1, characterized by The inner wall of the cleaning chamber is provided with an overflow groove in the circumferential direction, and the bottom wall of the overflow groove is provided with a first flow outlet.

4. The electrode cleaning apparatus according to claim 1, characterized by The bottom wall of the cleaning chamber is provided with an arc-shaped bottom plate, and the bottom end of the arc-shaped bottom plate is provided with a second flow outlet. The arc-shaped bottom plate matches the outer edge trajectory of the electrode fixing component when it rotates.

5. The electrode cleaning apparatus according to claim 1, wherein The electrode fixing component is provided with a mounting groove, the through hole is provided in the bottom wall of the mounting groove, and the side wall of the mounting groove is provided with a chamfer.

6. The electrode cleaning equipment according to any one of claims 1 to 5, characterized in that, The shaft extends horizontally.

7. The electrode cleaning apparatus according to any one of claims 1 to 5, characterized by, The rotating shaft is located in the middle of the cleaning chamber or near the side wall of the cleaning chamber.

8. The electrode cleaning apparatus according to any one of claims 1 to 5, characterized by, It also includes a drive unit connected to the rotating shaft for driving the electrode holder to rotate relative to the cleaning chamber.

9. The electrode cleaning apparatus according to any one of claims 1 to 5, characterized by, It also includes an evaporation chamber, which is located above the cleaning chamber. The top of the evaporation chamber has a vent, and the side of the evaporation chamber has an observation window.

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