Graphite-based CVD (chemical vapor deposition) silicon carbide ring deposition tool

Abstract

The utility model belongs to the technical field of chemical vapor deposition, particularly relates to a graphite-based CVD (chemical vapor deposition) silicon carbide ring deposition tool, and aims to improve the production efficiency and the product quality in the silicon carbide ring deposition process. The tool comprises a diameter adjusting assembly and a plurality of supporting assemblies, the diameter adjusting assembly is composed of a base, a driving disc, a cover plate and a sliding base, the driving disc can rotate to drive the sliding base to move according to the diameter of the silicon carbide ring to be deposited, and accurate adjustment of the positions of the supporting assemblies is achieved; the supporting assembly is composed of stand columns, a transverse rod and a supporting base, the supporting base is of a conical design, the contact area between the supporting base and a silicon carbide ring is reduced, the risk of mutual pollution between materials is reduced, and uniform deposition of a silicon carbide film is ensured; the device is reasonable in structural design, convenient to operate and capable of adapting to silicon carbide rings of different specifications, and the use flexibility and the production stability of the device are improved.

Description

Technical Field

[0001] This utility model belongs to the field of chemical vapor deposition technology, specifically relating to graphite-based CVD silicon carbide ring deposition fixture. Background Technology

[0002] Graphite-based chemical vapor deposition (CVD) for silicon carbide ring deposition is a common high-temperature vapor-phase reaction technique widely used in the manufacture of high-performance materials in fields such as electronics, aerospace, and energy. The CVD silicon carbide ring fabrication process requires a high-temperature chemical reaction to generate a silicon carbide (SiC) thin film on a graphite substrate using a deposition apparatus. Due to its excellent chemical stability, high-temperature resistance, and corrosion resistance, silicon carbide is widely used in the fabrication of high-performance semiconductor devices, high-temperature coatings, and other high-end industrial materials.

[0003] In existing silicon carbide deposition technologies, the deposition process of silicon carbide rings faces the following technical challenges:

[0004] Firstly, in actual production, silicon carbide rings of different sizes require support structures of different specifications to ensure uniform deposition of silicon carbide films. However, most deposition fixtures commonly found on the market are designed with a fixed diameter, making frequent fixture changes necessary during production, leading to reduced production efficiency and increased fixture costs. Furthermore, due to the high-temperature environment during deposition, traditional support structures also suffer from workpiece deformation caused by thermal expansion, which in turn affects the deposition quality of the silicon carbide film.

[0005] Secondly, existing support structures typically have a large contact area with the silicon carbide ring to be deposited. This design can easily lead to cross-contamination between materials at high temperatures, affecting the purity and quality of the final product. Simultaneously, the large contact area can also cause uneven deposition around the support point, resulting in inconsistent deposition thickness of the silicon carbide ring and impacting device performance and lifespan. Utility Model Content

[0006] To address the problems existing in the prior art, the purpose of this invention is to provide a graphite-based CVD silicon carbide ring deposition fixture. This fixture allows for adjustment of the support component's position via a diameter adjustment assembly, utilizing the cooperation of a drive disk and a sliding seat, to accommodate silicon carbide rings of different sizes. The support seat employs a conical design, effectively reducing the contact area with the silicon carbide ring, thereby lowering the risk of cross-contamination between materials and ensuring uniform film deposition.

[0007] To achieve the above objectives, this utility model provides the following technical solution:

[0008] A graphite-based CVD silicon carbide ring deposition fixture includes a diameter adjustment component and multiple support components disposed above the diameter adjustment component. The support components are used to support the silicon carbide ring to be deposited, and the multiple support components are distributed at equal intervals around the axis of the diameter adjustment component.

[0009] The diameter adjustment assembly includes a base, a drive disk is rotatably connected inside the base, and a cover plate is connected to the top of the base, with a sliding seat slidably connected to the cover plate;

[0010] The support assembly includes a column connected to the top of the sliding seat, and horizontal bars are evenly spaced along the height direction on the column, with support seats inserted into the horizontal bars.

[0011] Furthermore, a receiving cavity for placing the drive disk is provided at the top of the base;

[0012] Furthermore, an adjustment groove is provided through the side of the drive disc;

[0013] A handle is connected to the outside of the drive disc;

[0014] When the drive disc is inserted into the receiving cavity, the handle can move within the adjustment slot.

[0015] Furthermore, a drive groove is provided through the top of the drive disk, the drive groove is arc-shaped, and the drive grooves are evenly distributed around the central axis of the drive disk.

[0016] The cover plate has a guide groove on its side, and a sliding seat is set in the guide groove. A first positioning post is fixedly connected to the bottom of the sliding seat and is inserted into the drive groove.

[0017] Furthermore, a first threaded post is fixedly connected to the top of the sliding seat, and a second threaded groove connected to the first threaded post is opened at the bottom of the column.

[0018] Furthermore, the side of the column is provided with evenly spaced threaded holes along its length;

[0019] One end of the crossbar is fixedly connected to a second threaded post.

[0020] Furthermore, a positioning hole is provided through the crossbar;

[0021] The support base is cone-shaped, and a second positioning post is fixedly connected to the bottom of the support base.

[0022] Furthermore, the top of the base is provided with a first threaded groove, which is evenly distributed around the central axis of the base, and the top of the cover plate is provided with a connecting hole corresponding to the first threaded groove.

[0023] Compared with the prior art, the beneficial effects of this utility model are:

[0024] Firstly, by employing a diameter adjustment component and multiple equally spaced support components surrounding it, this patent provides a flexible and adjustable deposition fixture design. The diameter adjustment component consists of a base, a drive disk, a cover plate, and a sliding seat. It can precisely adjust the position of the support components according to the diameter of the silicon carbide ring to be deposited by rotating the drive disk and causing the sliding seat to slide. This eliminates the need to replace support structures of different specifications to accommodate silicon carbide rings of different diameters, greatly improving production flexibility and efficiency while reducing production costs. This design effectively solves the problem of frequent fixture changes caused by fixed support structures in existing technologies, avoiding downtime and equipment wear caused by fixture changes, and improving production efficiency.

[0025] Secondly, the support assembly adopts a combined structure of columns, crossbars, and support bases. The support base is specially designed in a conical shape to reduce the contact area with the silicon carbide ring. By reducing the contact area, the conical support base lowers the risk of cross-contamination between materials and avoids the impact of chemical reactions between different materials at high temperatures on the purity of the silicon carbide film. Simultaneously, the support base design ensures uniform deposition of the silicon carbide film on the ring structure, solving the problem of uneven deposition around the support points in existing technologies, and improving the quality and performance of the final product.

[0026] Furthermore, the tooling design fully considers ease of operation and safety. A handle is located on the outside of the drive plate, facilitating manual operation and allowing users to easily adjust the position of the support components. The drive plate and sliding seat, through the cooperation of the arc-shaped drive groove and the first positioning post, ensure a smooth and stable adjustment process, minimizing the risk of jamming or errors. This not only improves operational convenience but also guarantees the precision of support component adjustment, effectively avoiding errors caused by improper operation and ensuring safety and reliability during the silicon carbide ring deposition process.

[0027] Furthermore, the cover plate and base are tightly connected by threads, ensuring the stability of the entire device. The cover plate design not only provides a stable support structure for the support components but also provides a stable sliding trajectory for the sliding seat through the guide groove design. This stable support structure enables the entire deposition fixture to maintain a reliable working state even under extreme environments such as high temperature and high pressure, avoiding structural deformation and failure of the device. Attached Figure Description

[0028] Figure 1 This is a schematic diagram of the structure of this utility model;

[0029] Figure 2 This is a schematic diagram of the disassembled structure of this utility model;

[0030] Figure 3 This is a schematic diagram of the structure of the base of this utility model;

[0031] Figure 4 This is a schematic diagram of the structure of the cover plate of this utility model;

[0032] Figure 5 This is a schematic diagram of the structure of the support component of this utility model;

[0033] Figure 6 This is a schematic diagram of the structure of the column of this utility model.

[0034] The attached diagram lists the components represented by each number as follows:

[0035] 1. Base; 11. Receiving cavity; 12. Adjustment groove; 13. First threaded groove;

[0036] 2. Drive disk; 21. Drive slot; 22. Handle;

[0037] 3. Cover plate; 31. Connecting hole; 32. Guide groove;

[0038] 4. Sliding seat; 41. First positioning pin; 42. First threaded pin;

[0039] 5. Support components;

[0040] 51. Column; 511. Threaded hole; 512. Second threaded groove;

[0041] 52. Crossbar; 521. Second threaded post; 522. Locating hole;

[0042] 53. Support base; 531. Second positioning column. Detailed Implementation

[0043] To make the objectives and advantages of this utility model clearer, the following detailed description is provided in conjunction with embodiments. It should be understood that the following text is merely used to describe one or more specific embodiments of this utility model and does not strictly limit the scope of protection specifically claimed by this utility model.

[0044] See Figure 1-6A graphite-based CVD silicon carbide ring deposition fixture includes a diameter adjustment assembly. Multiple support assemblies 5 are positioned above the diameter adjustment assembly to support the silicon carbide ring to be deposited. The support assemblies 5 are evenly spaced around the axis of the diameter adjustment assembly. The diameter adjustment assembly includes a base 1, with a drive disk 2 rotatably connected inside the base 1. The drive disk 2 adjusts the position of the support assemblies 5 to accommodate silicon carbide rings of different diameters. A cover plate 3 is connected to the top of the base 1, and a sliding seat 4 is slidably connected to the cover plate 3. The support assembly 5 can move within the guide groove 32. Through the cooperation of the drive disk 2 and the sliding seat 4, the support assembly 5 can be synchronously adjusted, thereby providing stable support for silicon carbide rings of different diameters. The support assembly 5 includes a column 51 connected to the top of the sliding seat 4. Horizontal bars 52 are evenly spaced along the height direction on the column 51, and support seats 53 are inserted into the horizontal bars 52. The support seat 53 adopts a conical design, which can reduce the contact area with the silicon carbide ring, reduce the risk of cross-contamination between materials, and ensure the uniformity of silicon carbide thin film deposition.

[0045] See Figure 1-3 The base 1 has a cavity 11 at its top for housing the drive disk 2. The design of the cavity 11 ensures the stable installation of the drive disk 2 while allowing it to be rotated and adjusted inside the base 1. An adjustment groove 12 is provided through the side of the drive disk 2, which provides rotation space for the drive disk 2, allowing the handle 22 to move freely within the adjustment groove 12. The handle 22 is connected to the outside of the drive disk 2, which facilitates manual adjustment of the rotation angle of the drive disk 2. When the drive disk 2 is embedded in the cavity 11, the handle 22 can move within the adjustment groove 12. The rotation of the handle 22 can drive the drive disk 2 to rotate, and further through the cooperation of the drive groove 21 and the first positioning post 41, it can drive the sliding seat 4 to slide within the guide groove 32, thereby adjusting the position of the support assembly 5.

[0046] See Figure 2-4 A drive groove 21 is provided through the top of the drive disk 2. The drive groove 21 is arc-shaped and is evenly distributed around the central axis of the drive disk 2. This arc-shaped drive groove 21 design enables the sliding seat 4 to achieve smooth synchronous adjustment when sliding in the guide groove 32. A guide groove 32 is provided on the side of the cover plate 3, which provides a sliding track for the sliding seat 4. The sliding seat 4 is set in the guide groove 32, and a first positioning post 41 is fixedly connected to the bottom of the sliding seat 4. The first positioning post 41 is inserted into the drive groove 21. The cooperation between the first positioning post 41 and the drive groove 21 ensures the stable movement of the sliding seat 4. This design can accurately adjust the position of the support component 5 during the deposition process, ensuring the stability of the silicon carbide ring and the uniformity of the deposition process.

[0047] See Figure 4-6The top of the sliding seat 4 is fixedly connected to a first threaded post 42, which cooperates with the bottom structure of the column 51. The bottom of the column 51 is provided with a second threaded groove 512 that connects to the first threaded post 42. Through the threaded connection of the first threaded post 42 and the second threaded groove 512, the sliding seat 4 can firmly fix the position of the column 51. This design ensures the fixing effect of the column 51 on the sliding seat 4, thereby further ensuring the stability of the support component 5 and the reliability of the deposition process.

[0048] See Figure 5-6 The side of the column 51 is provided with evenly spaced threaded holes 511 along its length; the threaded holes 511 provide fixing points for the installation of the crossbar 52, so that the crossbar 52 can be firmly installed on the column 51; one end of the crossbar 52 is fixedly connected to a second threaded post 521, and the second threaded post 521, through its cooperation with the threaded holes 511, enables the crossbar 52 to be stably installed and adjusted on the column 51; this design can effectively improve the structural strength and stability of the support component 5, and ensure the fixing and support effect of the silicon carbide ring during the deposition process.

[0049] See Figure 5-6 A positioning hole 522 is provided through the crossbar 52; the positioning hole 522 is used to insert the support base 53, so that the support base 53 can be stably installed on the crossbar 52; the support base 53 is shaped like a cone, and the cone shape can effectively reduce the contact area between the support base 53 and the silicon carbide ring, thereby reducing the risk of cross-contamination between materials and ensuring uniform deposition of silicon carbide film; a second positioning post 531 is fixedly connected to the bottom of the support base 53, and the second positioning post 531 is used to further fix the position of the support base 53 to ensure its stability during the deposition process.

[0050] See Figure 1-2 The base 1 has a first threaded groove 13 on its top, which is evenly distributed around the central axis of the base 1. The first threaded groove 13 is used to connect with the cover plate 3. The top of the cover plate 3 has a connecting hole 31 corresponding to the first threaded groove 13. The cooperation between the connecting hole 31 and the first threaded groove 13 allows the cover plate 3 to be stably installed on the top of the base 1. This design ensures the stability of the cover plate 3 on the base 1, thereby providing reliable support for the installation and adjustment of the diameter adjustment component and the support component 5.

[0051] The working principle of this utility model is as follows:

[0052] When in use, the diameter adjustment component is adjusted according to the diameter of the silicon carbide ring to be deposited. During adjustment, hold the handle 22 on the drive disk 2 and rotate the drive disk 2 through the handle 22. As the drive disk 2 rotates, with the cooperation of the drive groove 21 and the first positioning post 41, the sliding seat 4 can be driven to slide in the guide groove 32. As the sliding seat 4 moves, the support component 5 can move synchronously, thereby enabling the support component 5 to support silicon carbide rings of different diameters.

[0053] After the position of the support component 5 is adjusted, the silicon carbide ring to be deposited is placed on the support base 53. The support base 53 is set in a conical shape to reduce the contact area with the silicon carbide ring.

[0054] The above description is merely a preferred embodiment of this utility model. It should be noted that those skilled in the art can make various improvements and modifications without departing from the principle of this utility model, and these improvements and modifications should also be considered within the scope of protection of this utility model. Structures, devices, and operating methods not specifically described or explained in this utility model, unless otherwise specified or limited, shall be implemented using conventional methods in the field.

Claims

1. A graphite-based CVD silicon carbide ring deposition fixture, characterized in that: It includes a diameter adjustment component, and a plurality of support components (5) are disposed above the diameter adjustment component. The support components (5) are used to support the silicon carbide ring to be deposited, and the plurality of support components (5) are distributed at equal intervals around the axis of the diameter adjustment component. The diameter adjustment assembly includes a base (1), a drive disk (2) is rotatably connected inside the base (1), and a cover plate (3) is connected to the top of the base (1), and a sliding seat (4) is slidably connected to the cover plate (3). The support assembly (5) includes a column (51) connected to the top of the sliding seat (4), and crossbars (52) are provided at equal intervals along the height direction on the column (51), and support seats (53) are inserted into the crossbars (52).

2. The graphite-based CVD silicon carbide ring deposition fixture of claim 1, wherein: The top of the base (1) has a receiving cavity (11) for placing the drive disk (2); Furthermore, an adjustment groove (12) is provided through the side of the drive disc (2); A handle (22) is connected to the outside of the drive disk (2); When the drive disc (2) is inserted into the receiving cavity (11), the handle (22) can move within the adjustment groove (12).

3. The graphite-based CVD silicon carbide ring deposition tooling of claim 2, wherein: The top of the drive disk (2) is provided with a drive groove (21), the drive groove (21) is arc-shaped, and the drive groove (21) is distributed at equal intervals around the central axis of the drive disk (2). The cover plate (3) has a guide groove (32) on its side, and the sliding seat (4) is set in the guide groove (32). The bottom of the sliding seat (4) is fixedly connected to a first positioning post (41), which is inserted into the drive groove (21).

4. The graphite-based CVD silicon carbide ring deposition tooling of claim 3, wherein: The top of the sliding seat (4) is fixedly connected to a first threaded post (42), and the bottom of the column (51) is provided with a second threaded groove (512) that is connected to the first threaded post (42).

5. The graphite-based CVD silicon carbide ring deposition fixture of claim 1, wherein: The side of the column (51) is provided with evenly spaced threaded holes (511) along its length direction; One end of the crossbar (52) is fixedly connected to a second threaded post (521).

6. The graphite-based CVD silicon carbide ring deposition tooling of claim 5, wherein: A positioning hole (522) is provided through the crossbar (52); The support base (53) is cone-shaped, and a second positioning post (531) is fixedly connected to the bottom of the support base (53).

7. The graphite-based CVD silicon carbide ring deposition fixture of claim 1, wherein: The base (1) has a first threaded groove (13) on its top. The first threaded groove (13) is distributed at equal intervals around the central axis of the base (1). The top of the cover plate (3) has a connecting hole (31) corresponding to the first threaded groove (13).

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