Low-reflection film

By combining wet coating and dry coating processes, the low-reflection film structure design solves the problems of low production efficiency and high cost of low-reflection films, achieving a high-efficiency and low-cost low-reflection effect, which is suitable for building exterior walls to eliminate light pollution.

CN224137470UActive Publication Date: 2026-04-17JIANGSU RIJIU OPTOELECTRONICS LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
JIANGSU RIJIU OPTOELECTRONICS LTD
Filing Date
2025-06-11
Publication Date
2026-04-17

AI Technical Summary

Technical Problem

Existing low-reflection films have low production efficiency and high cost, making it difficult to meet the low-reflection requirements for large-area outdoor applications, and existing technologies are unable to further improve the anti-reflection effect.

Method used

The low-reflection film structure design adopts a combination of wet coating and dry coating processes. By combining a high-refractive-index high-reflection coating, a nickel coating, a nickel-chromium alloy coating, and a low-refractive-index silicon dioxide coating, the film thickness and optical matching are optimized to reduce reflectivity and increase transmittance.

Benefits of technology

It achieves a low reflectivity of less than 0.5% while maintaining good transmittance and environmental resistance, reducing production costs and improving production efficiency.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model discloses a low-reflection film, which comprises a base material layer, a high-refractive-index coating, a nickel plating layer, a nickel-chromium alloy plating layer and a silicon dioxide plating layer which are sequentially laminated, wherein the refractive index of the high-refractive-index coating ranges from 1.75 to 1.80. The low-reflection film provided by the utility model has a certain transmittance and an excellent anti-reflection effect at the same time, and is low in production cost and high in production efficiency.
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Description

Technical Field

[0001] This invention belongs to the field of antireflective film technology, specifically relating to a low-reflection film. Background Technology

[0002] With the advancement of technology, skyscrapers are springing up in cities, beautifying them but also causing some problems. Currently, most buildings use tempered glass for their walls for aesthetic purposes, which can cause light pollution under strong outdoor sunlight. Pedestrians crossing the street may experience blind spots due to light reflected from the glass curtain walls, leading to accidents.

[0003] To eliminate light pollution, the mainstream approach is to apply low-reflection films or directly coat the glass with them. As people's requirements for safety and environmental protection increase, the requirements for the anti-reflection effect of low-reflection films are also gradually increasing. Therefore, how to further improve the anti-reflection effect of low-reflection films remains to be solved.

[0004] In the prior art, conventional low-reflection films typically employ a technique of stacking high-refractive-index coating layers and low-refractive-index coating layers as needed. Although low-reflection films produced using dry coating processes alone have excellent anti-reflection effects, their production efficiency is very low and their cost is high due to limitations in the manufacturing process. For low-reflection films used outdoors, the anti-reflection requirements are not very high, and since the application area is large, cost control is relatively more critical. Based on this, the present invention was created.

[0005] The information disclosed in this background section is intended only to enhance the understanding of the overall background of this utility model and should not be construed as an admission or in any way implying that the information constitutes prior art known to those skilled in the art. Utility Model Content

[0006] The purpose of this invention is to provide a low-reflection film with excellent anti-reflection effect.

[0007] To achieve the above objectives, the technical solution provided by a specific embodiment of this utility model is as follows:

[0008] A low-reflection thin film includes a substrate layer, a high-refractive-index coating layer, a nickel plating layer, a nickel-chromium alloy plating layer, and a silicon dioxide plating layer stacked sequentially.

[0009] The high-refractive-index coating has a refractive index of 1.75-1.80.

[0010] In one or more embodiments of this utility model, the thickness of the high-refractive-index coating is 145-155 nm.

[0011] In one or more embodiments of this utility model, the thickness of the silicon dioxide coating is 80-90 nm.

[0012] In one or more embodiments of this utility model, the thickness of the nickel plating layer is 0.5-2.5 nm.

[0013] In one or more embodiments of this utility model, the thickness of the nickel-chromium alloy plating layer is 1-3 nm.

[0014] In one or more embodiments of this utility model, the substrate layer is a PET layer or a glass layer.

[0015] In one or more embodiments of the present invention, a hardening layer is further provided between the substrate layer and the high-refractive-index coating layer.

[0016] Compared with existing technologies, this invention utilizes a low-reflection film structure design combining wet coating and dry deposition processes. It leverages the synergy of a high-refractive-index coating layer obtained through wet coating, a nickel-chromium alloy coating obtained through dry deposition, and a low-refractive-index silica coating. Optical matching is achieved through the design of the high and low refractive index film thicknesses, effectively reducing the reflectivity of the low-reflection film to less than 0.5%, while maintaining a certain level of transmittance. Furthermore, the nickel coating ensures strong interlayer adhesion between the wet high-refractive-index coating and the dry high-refractive-index nickel-chromium alloy coating, while also guaranteeing good environmental resistance. In addition, the low-reflection film of this invention exhibits superior interlayer adhesion, excellent environmental resistance performance, and low production cost with high production efficiency. Attached Figure Description

[0017] To more clearly illustrate the technical solutions in the embodiments of this utility model or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments recorded in this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0018] Figure 1 This is a schematic diagram of the structure of the low-reflection film in one embodiment of the present invention;

[0019] Figure 2 The reflection curve of the low-reflection film in Embodiment 1 of this utility model;

[0020] Figure 3 The reflection curve of the low-reflection film in Embodiment 2 of this utility model;

[0021] Figure 4 The reflection curve of the low-reflection film in Embodiment 3 of this utility model;

[0022] Figure 5 The reflection curve of the low-reflection film in Comparative Example 1 of this utility model;

[0023] Figure 6 The reflection curve of the low-reflection film in Comparative Example 2 of this invention;

[0024] Figure 7 The reflection curve of the low-reflection film in Comparative Example 3 of this invention;

[0025] Figure 8 The reflection curve of the low-reflection film in Comparative Example 4 of this invention is shown.

[0026] Explanation of key figure labels:

[0027] 1. Substrate layer; 2. High-refractive-index coating; 3. Nickel plating; 4. Nickel-chromium alloy plating; 5. Silica plating. Detailed Implementation

[0028] To enable those skilled in the art to better understand the technical solutions of this utility model, the technical solutions of the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this utility model, and not all embodiments. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort should fall within the protection scope of this utility model.

[0029] A specific embodiment of this utility model provides a low-reflection thin film, such as... Figure 1 As shown, it includes a substrate layer 1, a high-refractive-index coating layer 2, a nickel plating layer 3, a nickel-chromium alloy plating layer 4, and a silicon dioxide plating layer 5, which are stacked in sequence; wherein, the refractive index of the high-refractive-index coating layer 2 is 1.75-1.80.

[0030] Specifically, the low-reflection film in this invention employs a specific layer structure design, namely, a low-reflection film layer structure design that combines wet coating and dry coating processes. By utilizing the synergistic effect of a high-refractive-index coating layer obtained through wet coating, a nickel-chromium alloy coating layer obtained through dry coating, and a silicon dioxide coating layer with a low refractive index, the reflectivity of the film material is reduced to less than 0.5%. When the film material is applied to building exterior walls, it can greatly reduce light reflection and eliminate light pollution.

[0031] Furthermore, the substrate layer can be a PET layer or a glass layer. The thickness of the PET layer is 50-250μm, while the thickness of the glass layer is not limited and has little impact on the optical effect. It can be selected according to actual needs.

[0032] Furthermore, the high-refractive-index coating thickness is 145-150nm. When the refractive index of the high-refractive-index coating is designed to be 1.75, it is formed by coating with Toyo Ink TYZ75-RA01-CN coating liquid. When the refractive index is designed to be 1.80, it is formed by coating with Toyo Ink TYZ80-RA01-CN coating liquid.

[0033] Furthermore, the nickel plating thickness is 0.5-2.5 nm, and the nickel-chromium alloy plating thickness is 1-3 nm. The nickel plating can improve the environmental resistance of the film material, and at the same time, it plays an optical matching role with the nickel-chromium alloy plating, thereby improving the anti-reflective effect of the film material.

[0034] Furthermore, the thickness of the silicon dioxide coating is 80-90nm. By controlling the thickness, the anti-reflection effect of the film material can be improved, making the reflectivity of the film material less than 0.5%.

[0035] Furthermore, a hardening layer can be provided between the substrate layer and the high-refractive-index coating layer, such as by coating with Arakawa Chemical's CHT-X1-NS coating liquid, to improve the hardness of the membrane material.

[0036] The present invention will be further described in detail below with reference to specific embodiments.

[0037] Example 1

[0038] The structure of the low-reflection film in this embodiment is shown in the table below:

[0039] Material PET High-refractive-index coating (1.75) Ni <![CDATA[NiCr2]]> <![CDATA[SiO2]]> thickness 50μm 147.8nm 1.2nm 2.4nm 84.41nm

[0040] The reflectance and transmittance of the low-reflection film in this embodiment were tested, and the results are as follows: Figure 2 And as shown in the table below:

[0041] wavelength Reflectivity R Transmission rate TT 400nm-700nm 0.443% 80.15%

[0042] Example 2

[0043] The structure of the low-reflection film in this embodiment is shown in the table below:

[0044] Material PET High-refractive-index coating (1.75) Ni <![CDATA[NiCr2]]> <![CDATA[SiO2]]> thickness 50μm 153.8nm 1.4nm 2.7nm 85.41nm

[0045] The reflectance and transmittance of the low-reflection film in this embodiment were tested, and the results are as follows: Figure 3 And as shown in the table below:

[0046] wavelength Reflectivity R Transmission rate TT 400nm-700nm 0.446% 78.12%

[0047] Example 3

[0048] The structure of the low-reflection film in this embodiment is shown in the table below:

[0049] Material PET High-refractive-index coating (1.80) Ni <![CDATA[NiCr2]]> <![CDATA[SiO2]]> thickness 50μm 148.8nm 2.0nm 1.0nm 82.17nm

[0050] The reflectance and transmittance of the low-reflection film in this embodiment were tested, and the results are as follows: Figure 4 And as shown in the table below:

[0051] wavelength Reflectivity R Transmission rate TT 400nm-700nm 0.383% 81.39%

[0052] Comparative Example 1

[0053] The structure of the low-reflection film in this comparative example is shown in the table below:

[0054] Material PET High-refractive-index coating (1.62) Ni <![CDATA[NiCr2]]> <![CDATA[SiO2]]> thickness 50μm 181.33nm 2.0nm 1.0nm 82.17nm

[0055] In this comparative example, the high-refractive-index coating with a refractive index of 1.62 can be prepared using Toyo Ink Coating Liquid, model TYZ62-RA01-CN.

[0056] The reflectance and transmittance of the low-reflectance film in this comparative example were tested, and the results are as follows: Figure 5 And as shown in the table below:

[0057] wavelength Reflectivity R Transmission rate TT 400nm-700nm 0.603% 80.65%

[0058] Comparative Example 2

[0059] The structure of the low-reflection film in this comparative example is shown in the table below:

[0060] Material PET High-refractive-index coating (1.75) Ni <![CDATA[NiCr2]]> <![CDATA[SiO2]]> thickness 50μm 0 1.2nm 2.4nm 84.41nm

[0061] The reflectance and transmittance of the low-reflectance film in this comparative example were tested, and the results are as follows: Figure 6 And as shown in the table below:

[0062] wavelength Reflectivity R Transmission rate TT 400nm-700nm 0.89% 78.98%

[0063] Comparative Example 3

[0064] The structure of the low-reflection film in this comparative example is shown in the table below:

[0065] Material PET <![CDATA[Nb2O5]]> <![CDATA[SiO2]]> <![CDATA[Nb2O5]]> <![CDATA[SiO2]]> thickness 50μm 12.75nm 34.38nm 111.04nm 92.12nm

[0066] The reflectance and transmittance of the low-reflectance film in this comparative example were tested, and the results are as follows: Figure 7 And as shown in the table below:

[0067] wavelength Reflectivity R Transmission rate TT 400nm-700nm 0.379% 98.845%

[0068] Although the reflectivity of the low-reflection film in this comparative example is slightly lower than that in the example, in actual production, the low-reflection film in this comparative example is prepared by a dry coating process. The niobium pentoxide layer has a slow deposition speed (generally 0.8-1.0 m / min), low efficiency, and high cost. In contrast, the present invention uses a combination of wet coating (the high-refractive-index layer is formed by wet coating) and dry coating (nickel plating, nickel-chromium alloy plating, and silicon dioxide plating are formed by magnetron sputtering), which is more efficient and less costly. The reflectivity of the low-reflection film prepared is only slightly lower than that in the comparative example, and the impact on the performance is minimal. In summary, the present invention can better balance low cost and high anti-reflection effect, making it a better choice.

[0069] Comparative Example 4

[0070] The structure of the low-reflection film in this comparative example is shown in the table below:

[0071] Material PET High-refractive-index coating (1.75) Ni <![CDATA[NiCr2]]> <![CDATA[SiO2]]> thickness 50μm 147.80nm 0 2.4nm 84.41nm

[0072] The reflectance and transmittance of the low-reflectance film in this comparative example were tested, and the results are as follows: Figure 8 And as shown in the table below:

[0073] wavelength Reflectivity R Transmission rate TT 400nm-700nm 0.721% 87.046%

[0074] Cross-cut adhesion tests were conducted on the low-reflection films in each embodiment and comparative example, and the results are shown in the table below:

[0075]

[0076] In summary, this utility model, through the combination of a high-refractive-index coating, a nickel plating layer, a nickel-chromium alloy plating layer, and a silicon dioxide plating layer, effectively improves the anti-reflective effect of the film material while ensuring that the film material has a certain transmittance and excellent interlayer adhesion, making the reflectivity of the film material less than 0.5%, and also has low cost and high production efficiency.

[0077] It will be apparent to those skilled in the art that this invention is not limited to the details of the exemplary embodiments described above, and that it can be implemented in other specific forms without departing from the spirit or essential characteristics of this invention. Therefore, the embodiments should be considered illustrative and non-limiting in all respects, and the scope of this invention is defined by the appended claims rather than the foregoing description. Thus, it is intended that all variations falling within the meaning and scope of equivalents of the claims be included within this invention. No reference numerals in the claims should be construed as limiting the scope of the claims.

[0078] Furthermore, it should be understood that although this specification describes embodiments, not every embodiment contains only one independent technical solution. This narrative style is merely for clarity. Those skilled in the art should consider the specification as a whole, and the technical solutions in each embodiment can also be appropriately combined to form other embodiments that can be understood by those skilled in the art.

Claims

1. A low-reflectance film, characterized by, It includes a substrate layer, a high-refractive-index coating layer, a nickel plating layer, a nickel-chromium alloy plating layer, and a silicon dioxide plating layer, which are stacked sequentially. The high-refractive-index coating has a refractive index of 1.75-1.

80.

2. The low reflection film according to claim 1, wherein The thickness of the high-refractive-index coating is 145-155 nm.

3. The low reflection film according to claim 1, wherein The thickness of the silicon dioxide coating is 80-90 nm.

4. The low reflection film according to claim 1, wherein The thickness of the nickel plating layer is 0.5-2.5 nm.

5. The low reflection film according to claim 1, wherein The thickness of the nickel-chromium alloy coating is 1-3 nm.

6. The low-reflection thin film according to claim 1, characterized in that, The substrate layer is a PET layer or a glass layer.

7. The low reflection film according to claim 1, wherein A hardening layer is also provided between the substrate layer and the high-refractive-index coating layer.