Nourishing and soothing type mask base cloth

Abstract

The utility model relates to the technical field of mask base cloth, and discloses nourishing and soothing mask base cloth which comprises a protection mechanism, an attaching mechanism is arranged at the top of the protection mechanism, limiting rings are fixedly connected to the two sides of the protection mechanism, the attaching mechanism comprises two first auxiliary grooves, and the two first auxiliary grooves are arranged in the first auxiliary grooves. The outer portions of the two first auxiliary grooves are formed in the outer portion of the protection mechanism, two second auxiliary grooves are formed in the outer portion of the protection mechanism, a third auxiliary groove is formed in the outer portion of the protection mechanism, and a positioning assembly is arranged on the outer side of the protection mechanism. According to the utility model, firstly, accurate initial positioning is realized through the positioning assembly; the mask covers the face, the eye holes are accurately aligned to the eyes, the nostril is attached to the nose, smooth breathing is guaranteed, meanwhile, the skin around the nose is tightly wrapped by the mask, essence is absorbed to improve the skin quality, the mouth hole is aligned to the mouth, a user can normally open the mouth to communicate and do simple actions, and the skin around the mouth can also absorb effective ingredients through the mask.

Description

Technical Field

[0001] This utility model relates to the field of facial mask base fabric technology, and in particular to a nourishing and soothing facial mask base fabric. Background Technology

[0002] With the increasing demand for beauty and skincare, facial masks, as a convenient and effective skincare product, have been widely used in the market. The mask base fabric, as a crucial component of the mask, directly affects its effectiveness and user experience. Early mask base fabrics were mainly non-woven fabrics, which, while possessing a certain capacity to hold essence, had limitations in terms of skin affinity, breathability, and nutrient delivery efficiency.

[0003] A search revealed Chinese Patent Publication No. CN221512918U, which discloses a camellia flower facial mask base fabric. The mask assembly includes a mouth opening and two eye openings, with the two eye openings located at the top of the mouth opening. The mask assembly comprises an outer layer, a base fabric layer, a camellia flower essence layer, and a skin-friendly mesh layer. One edge of the outer layer is bonded to the base fabric layer, one edge of the base fabric layer is bonded to the camellia flower essence layer, and one edge of the camellia flower essence layer is bonded to the skin-friendly mesh layer. An alginate strip is movably disposed at the bottom of the mask assembly, and the outer layer, base fabric layer, camellia flower essence layer, and skin-friendly mesh layer are all bonded to the alginate strip. This invention uses the alginate strip to seal the bottom edge of the camellia flower essence layer, reducing dripping of the camellia flower essence along the bottom edge, resulting in better performance.

[0004] The aforementioned patent specification mentions the beneficial effects of "sealing the edges of the mask to reduce essence loss." While the patent reduces essence loss, it doesn't provide a good fit to the face. Therefore, a nourishing and soothing mask base fabric is proposed. Utility Model Content

[0005] To overcome the above shortcomings, this utility model provides a nourishing and soothing mask base fabric, which aims to improve the problem of non-adhesion to the face in the prior art.

[0006] To achieve the above objectives, the present invention adopts the following technical solution:

[0007] A nourishing and soothing facial mask base fabric includes a protective mechanism, wherein a fitting mechanism is provided on the top of the protective mechanism, and limit rings are fixedly connected to both sides of the protective mechanism;

[0008] The fitting mechanism includes two auxiliary grooves, the two auxiliary grooves are formed on the outside of the protective mechanism, the protective mechanism has two auxiliary grooves, the protective mechanism has an auxiliary groove, and a positioning component is provided on the outside of the protective mechanism.

[0009] Through the above technical solutions, the functionality and practicality of the mask base fabric are significantly improved. The positioning component, with its precise placement of the eye, nostril, and mouth openings, ensures that the mask accurately covers the corresponding areas of the face. Users can enjoy unobstructed vision, breathe freely, and move easily while wearing the mask, allowing for full absorption of the essence by all facial areas. The auxiliary grooves one, two, and three in the fitting mechanism achieve a perfect fit to the sides of the face, chin, and forehead according to different face shapes, increasing the contact area between the mask and the skin and promoting efficient penetration of nourishing and soothing ingredients. The limiting ring securely holds the mask in place, preventing it from falling off during use, greatly improving ease of use and stability, and providing users with a comfortable and effective nourishing and soothing skincare experience.

[0010] As a further description of the above technical solution:

[0011] The positioning component includes eye holes, two of which are located on the outside of the protective mechanism, and a nostril is located on the outside of the positioning component.

[0012] Through the above technical solutions, the positioning components bring great convenience to users. The eye openings allow users to maintain unobstructed vision while wearing a face mask, enabling them to carry out their daily activities normally, while ensuring that the skin around the eyes can fully absorb the mask's essence, relieving dryness and reducing fine lines. The nostril design ensures smooth breathing and allows the skin around the nose to closely contact the essence, regulating oil secretion, improving pore condition, and comprehensively enhancing the mask's user experience and skincare efficacy.

[0013] As a further description of the above technical solution:

[0014] The protective mechanism includes a protective film, an essence layer fixedly connected to the inner side of the protective film, and a maintenance layer fixedly connected to the inner side of the essence layer;

[0015] Through the aforementioned technical solutions, the protective structure constructs a comprehensive and efficient protection and nourishing system. The protective film acts like a loyal guardian, effectively blocking external bacteria and impurities when the mask is not in use, ensuring the purity of the essence and skincare layers. The essence layer stores rich, nourishing, and soothing essence, which is continuously released during use to revitalize the skin. The skincare layer further deeply cares for the skin, improving its condition. These three elements work closely together, from protection to nourishment to skincare, comprehensively enhancing the mask's efficacy and quality.

[0016] As a further description of the above technical solution:

[0017] The protective mechanism has an opening on its exterior;

[0018] Through the aforementioned technical solution, the nozzle design greatly enhances the convenience of using face masks. Users can freely open their mouths to speak, drink water, or perform simple movements while wearing the mask, without any restrictions. Simultaneously, the nozzle design allows the skin around the mouth to fully contact the mask's essence, specifically addressing issues such as dullness and sagging around the mouth, thus improving the overall skincare effect.

[0019] As a further description of the above technical solution:

[0020] A support layer is fixedly connected to the inner side of the maintenance layer;

[0021] In the aforementioned technical solution, the support layer plays a crucial role. It firmly supports the mask, ensuring it always conforms to the contours of the face during use, especially in the top area, preventing wrinkles or shifting. This not only optimizes the user experience but also promotes more efficient absorption of the essence released by the skincare layer, enhancing the nourishing and soothing effects.

[0022] As a further description of the above technical solution:

[0023] The two limiting rings are fixedly connected to the outside of the essence layer on their adjacent sides;

[0024] Through the above technical solution, the two retaining rings are firmly connected to the essence layer, providing a strong fixing effect. When using the mask, hanging the retaining rings around the ears effectively prevents the mask from falling off, ensuring stability during use. At the same time, the tight connection allows the essence layer to adhere more closely to the facial skin, helping the essence to penetrate the skin more efficiently and enhancing the nourishing and soothing skincare effects.

[0025] As a further description of the above technical solution:

[0026] The two limiting rings are fixedly connected to the outside of the maintenance layer on their adjacent sides;

[0027] Through the above technical solution, the two retaining rings are firmly connected to the skincare layer. When using the mask, hanging the retaining rings around the ears securely fixes the mask, preventing it from shifting or moving. Simultaneously, this connection allows the skincare layer to adhere closely to the skin, promoting the full penetration of the active ingredients and enhancing deep skincare, significantly improving the nourishing and soothing effects.

[0028] As a further description of the above technical solution:

[0029] The two limiting rings are fixedly connected to the outside of the support layer on their adjacent sides;

[0030] Through the above technical solution, the two retaining rings are securely connected to the support layer. When in use, they are hung around the ears to strongly prevent the mask from slipping, ensuring stability throughout. At the same time, this connection method strengthens the support layer's support for the mask, allowing it to fit closely to the face, enabling better absorption of the essence and greatly enhancing the effectiveness of nourishing and soothing masks.

[0031] This utility model has the following beneficial effects:

[0032] 1. In this utility model, precise initial positioning is achieved firstly through a positioning component. The mask is then placed over the face, with the eye openings precisely aligned with the eyes. This not only allows the user to maintain normal vision while wearing the mask, but also ensures unobstructed breathing by fitting the nostrils against the nose. Simultaneously, the mask tightly wraps around the nose, allowing for absorption of the essence and improving skin texture. With the mouth opening aligned with the mouth, the user can open their mouth normally to communicate and perform simple actions, while the skin around the mouth also absorbs the active ingredients.

[0033] 2. In this invention, the retaining rings on both sides hang on the ears, effectively preventing the mask from falling off and ensuring stability during use. Throughout use, the protective film isolates external bacteria, ensuring that the essence layer and skincare layer remain uncontaminated. The essence layer continuously releases a large amount of nourishing and soothing essence, replenishing the skin with moisture and nutrients. The skincare layer further releases deep-care ingredients, enhancing the skin's resistance and repair capabilities. The support layer firmly supports the top of the mask, ensuring close contact with the face and comprehensively improving the skin's absorption of the mask's ingredients, achieving highly effective nourishing and soothing skincare. Attached Figure Description

[0034] Figure 1 This is a three-dimensional schematic diagram of a nourishing and soothing facial mask base fabric proposed in this utility model;

[0035] Figure 2 This is a schematic diagram of the limiting ring structure of a nourishing and soothing facial mask base fabric proposed in this utility model;

[0036] Figure 3 This is a schematic diagram of the structure of the protective film of the base fabric of a nourishing and soothing facial mask proposed in this utility model;

[0037] Figure 4 for Figure 3 Enlarged view of point A in the middle.

[0038] Legend:

[0039] 1. Positioning component; 2. Adhesion mechanism; 3. Limiting ring; 4. Protection mechanism; 101. Eye hole; 102. Nose hole; 103. Mouth hole; 201. Auxiliary groove one; 202. Auxiliary groove two; 203. Auxiliary groove three; 401. Essence layer; 402. Maintenance layer; 403. Support layer; 404. Protective film. Detailed Implementation

[0040] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0041] Reference Figure 1 and Figure 2 This utility model provides an embodiment of a nourishing and soothing facial mask base fabric, including a protective mechanism 4. The protective mechanism 4 has a positioning component 1 on its outer side, which can accurately position the facial mask base fabric so that the facial mask can accurately cover the corresponding parts of the face during use, thereby improving the effect. The top of the protective mechanism 4 is provided with a fitting mechanism 2, which allows the facial mask base fabric to better fit different areas of the face, increasing the contact area between the facial mask and the skin, thereby promoting the absorption of the effective ingredients in the facial mask. Limiting rings 3 are fixedly connected to both sides of the protective mechanism 4. The limiting rings 3 serve to fix the facial mask base fabric, preventing the facial mask from falling off during use and ensuring the convenience and stability of the user during use.

[0042] The fitting mechanism 2 includes two auxiliary slots 1 201, which are located on the outside of the protective mechanism 4. The auxiliary slots 1 201 can be moved and adjusted to a certain extent according to the facial contour, so that the mask base can better fit the side area of ​​the face, especially suitable for people with different facial lines on both sides, improving the applicability of the mask. The protective mechanism 4 has two auxiliary slots 202 on its outside. The auxiliary slots 202 are mainly used to fit the chin area. Its unique design can closely adapt to the chin contour, avoiding gaps at the chin and ensuring that the mask essence can fully act on the chin skin. The protective mechanism 4 has an auxiliary slot 3 203 on its outside. The auxiliary slot 3 203 is used to fit the forehead area. By moving the auxiliary slot 3 203, the mask base can be closely fitted to the forehead, ensuring that the forehead skin can also fully absorb the nourishing and soothing ingredients in the mask, and it is suitable for different face shapes.

[0043] Specifically, the mask is composed of a positioning component 1, a fitting mechanism 2, a limiting ring 3, and a protective mechanism 4. The positioning component 1 provides precise positioning for the mask base fabric, ensuring accurate coverage of the corresponding parts of the face during use, thereby improving the effect. The fitting mechanism 2 includes auxiliary groove 1 201, auxiliary groove 202, and auxiliary groove 3 203. Auxiliary groove 1 201 can be adjusted according to the facial contour to adapt to different facial side lines, enhancing applicability. Auxiliary groove 202 is specially designed to fit the chin, closely fitting the chin contour to prevent essence waste. Auxiliary groove 3 203 is used to fit the forehead, meeting the needs of different face shapes and promoting the absorption of nourishing and soothing ingredients by the forehead skin. The limiting rings 3 on both sides fix the mask base fabric during use to prevent it from falling off, ensuring convenience and stability.

[0044] Reference Figure 1 , Figure 3 and Figure 4 The protective mechanism 4 includes a protective film 404, with an essence layer 401 fixedly connected to the inner side of the protective film 404. The protective film 404 plays a protective role when the mask is not in use, effectively reducing the entry of external bacteria and ensuring the hygiene and effectiveness of the essence layer 401 and other layers. The essence layer 401 can store a large amount of nourishing and soothing essence ingredients. When using the mask, the essence layer 401 will gradually release these ingredients to replenish the facial skin, providing the skin with the necessary nutrients and moisture, achieving the nourishing and soothing effects 401. A maintenance layer 402 is fixedly connected to the inner side of the essence layer 401. The maintenance layer 402 can further release ingredients that are beneficial to the skin, deeply nourish the facial skin, improve the skin condition, and enhance the skin's resistance and repair ability.

[0045] The inner side of the protective layer 402 is fixedly connected to the support layer 403. The support layer 403 can play a supporting role, so that the top of the mask base fabric can better contact the face, ensuring the stability of the shape and position of the mask, thereby allowing the facial skin to better absorb the ingredients in the mask and improve the effect of the mask.

[0046] The two limiting rings 3 are fixedly connected to the outside of the essence layer 401 on the adjacent side. The limiting rings 3 are fixed to the outside of the essence layer 401, which can effectively fix the mask base cloth to the face without affecting the release of ingredients from the essence layer 401, preventing it from falling off. At the same time, it can also ensure that the essence layer 401 is in close contact with the facial skin and promote the absorption of the essence.

[0047] The two limiting rings 3 are fixedly connected to the outside of the skin care layer 402 on their adjacent sides. The limiting rings 3 are connected to the skin care layer 402, which will not hinder the release of skin care ingredients from the skin care layer 402, and can further enhance the stability of the mask base fabric, ensuring that the skin care layer 402 can continuously care for the facial skin.

[0048] Specifically, the outermost protective film 404 effectively blocks external bacteria when not in use, ensuring the hygiene and effectiveness of the inner essence layer 401 and other layers. The essence layer 401 stores a large amount of nourishing and soothing essence, which is gradually released during use to replenish the skin with nutrients and moisture, achieving a nourishing and soothing effect. The innermost maintenance layer 402 further releases beneficial ingredients, deeply nourishing the skin and enhancing its resistance and repair capabilities. The innermost support layer 403 supports the mask base, ensuring good contact between its top and the face, stabilizing the mask's shape and position, and helping the skin better absorb the ingredients. The limiting rings 3 on both sides are fixed to the outside of the essence layer 401 and the maintenance layer 402, respectively, without affecting the efficacy of each layer, while firmly fixing the mask base to prevent it from falling off, promoting the absorption of essence and the continuous effect of skincare.

[0049] Reference Figures 1 to 3 The positioning component 1 includes two eye holes 101 on the outside of the protective mechanism 4. The eye holes 101 are designed to be precisely aligned with the eyes so that the mask does not obstruct vision during use, and also allow the skin around the eyes to fully come into contact with the essence ingredients in the mask, achieving the effect of nourishing and soothing the skin around the eyes. The positioning component 1 also has a nostril 102 on the outside. The design of the nostril 102 allows the mask to fit the nose better, ensuring that the user can breathe smoothly during use, and also allowing the skin around the nose to receive full care.

[0050] The protective mechanism 4 has a mouth hole 103 on its exterior. The mouth hole 103 allows the user to speak freely or do some simple actions when using the mask, while also allowing the skin around the mouth to fully come into contact with the effective ingredients in the mask, thus achieving skin care for the skin around the mouth.

[0051] Specifically, the eye openings 101, nostrils 102, and mouth openings 103 on the outside of the protective structure 4 achieve precise positioning and all-round skincare. The design of the eye openings 101 is extremely ingenious, allowing users to accurately align the mask with their eyes when applying it. This prevents the mask from obstructing their vision and affecting normal activities, while allowing the delicate skin around the eyes to be fully immersed in the mask essence, effectively nourishing and soothing the skin around the eyes and improving problems such as dryness and fine lines. The nostrils 102 ensure that users can breathe smoothly during the mask application process. At the same time, its close fit to the nose allows the skin around the nose to be completely covered by the mask, enabling it to fully absorb the essence and achieve the desired skincare effect. The mouth opening 103 greatly enhances the ease of use, allowing users to freely open their mouths to speak and perform simple movements, while also allowing the skin around the mouth to fully contact the mask's active ingredients for targeted care.

[0052] Working principle: When using this nourishing and soothing mask base, the positioning component 1 first achieves precise initial positioning, covering the face with the mask and accurately aligning the eye holes 101 with the eyes. This not only allows the user to maintain normal vision and not affect movement while wearing the mask, but also ensures that the delicate, dry, and fine-lined skin around the eyes can fully contact the mask essence to achieve a nourishing and soothing effect. The nostrils 102 fit the nose to ensure smooth breathing, while the skin around the nose is tightly wrapped by the mask to absorb the essence and improve skin texture, such as regulating oil secretion and shrinking pores. The mouth hole 103 is aligned with the mouth, allowing the user to open their mouth normally to communicate and perform simple actions. The skin around the mouth can also absorb the effective ingredients, enhance skin elasticity, and improve problems such as nasolabial folds.

[0053] Next, the fitting mechanism 2 is used to improve the fit. The moving auxiliary groove 3 203 can make the mask fit closely to the forehead. Regardless of the width of the forehead, it can make the skin on the forehead fully absorb the nourishing and soothing ingredients. The moving auxiliary groove 1 201 can be adjusted according to the facial contour to adapt to different facial side lines, increase the contact area with the skin on the side of the face, and promote the absorption of essence. The moving auxiliary groove 2 202 is uniquely designed to fit closely to the chin contour, avoid gaps, and allow the skin on the chin to fully absorb the mask essence, improve dullness, sagging and other phenomena, and is suitable for all face shapes.

[0054] The limiting rings 3 on both sides hang on the ears to effectively prevent the mask from falling off and ensure stability during use. Throughout the use, the protective film 404 isolates external bacteria, ensuring that the essence layer 401 and the nourishing layer 402 are not contaminated. The essence layer 401 continuously releases a large amount of nourishing and soothing essence to replenish the skin with moisture and nutrients. The nourishing layer 402 further releases deep nourishing ingredients to enhance the skin's resistance and repair ability. The support layer 403 firmly supports the top of the mask, allowing it to make close contact with the face, comprehensively improving the absorption effect of the mask ingredients on the facial skin, and achieving highly effective nourishing and soothing skin care.

[0055] Finally, it should be noted that the above description is only a preferred embodiment of the present utility model and is not intended to limit the present utility model. Although the present utility model has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments or make equivalent substitutions for some of the technical features. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present utility model should be included within the protection scope of the present utility model.

Claims

1. A nourishing and soothing facial mask base fabric, comprising a protective mechanism (4), characterized in that: The top of the protective mechanism (4) is provided with a fitting mechanism (2), and the two sides of the protective mechanism (4) are fixedly connected with limit rings (3). The fitting mechanism (2) includes two auxiliary grooves (201), the two auxiliary grooves (201) are opened on the outside of the protection mechanism (4), the protection mechanism (4) has two auxiliary grooves (202) on the outside, the protection mechanism (4) has an auxiliary groove (203) on the outside, and a positioning component (1) is provided on the outside of the protection mechanism (4).

2. The nourishing and soothing mask base fabric according to claim 1, characterized in that: The positioning component (1) includes eye holes (101), two eye holes (101) are opened on the outside of the protective mechanism (4), and a nostril (102) is opened on the outside of the positioning component (1).

3. The nourishing and soothing mask base fabric according to claim 1, characterized in that: The protective mechanism (4) includes a protective film (404), an essence layer (401) is fixedly connected to the inner side of the protective film (404), and a maintenance layer (402) is fixedly connected to the inner side of the essence layer (401).

4. The nourishing and soothing mask base fabric according to claim 2, characterized in that: The protective mechanism (4) has a mouth hole (103) on its exterior.

5. The nourishing and soothing mask base fabric according to claim 3, characterized in that: A support layer (403) is fixedly connected to the inner side of the maintenance layer (402).

6. The nourishing and soothing mask base fabric according to claim 3, characterized in that: The two limiting rings (3) are fixedly connected to the outside of the essence layer (401) on their adjacent sides.

7. The nourishing and soothing mask base fabric according to claim 6, characterized in that: The two retaining rings (3) are fixedly connected to the outside of the maintenance layer (402) on their adjacent sides.

8. The nourishing and soothing mask base fabric according to claim 5, characterized in that: The two limiting rings (3) are fixedly connected to the outside of the support layer (403) on their adjacent sides.

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