Transmission protection structure of vacuum reaction cavity

Abstract

The utility model provides a transmission protection structure of a vacuum reaction cavity, and relates to the technical field of semiconductor equipment. The device comprises an outer cavity and an inner cavity which are designed to be nested, and further comprises a heating device and a rotating mechanism, the outer cavity is arranged outside the inner cavity in a sleeving mode, and a gas filling gap is formed between the outer cavity and the inner cavity; the heating device is arranged on the outer side of the outer cavity so as to transfer heat into the inner cavity through heat conduction and heat radiation of the outer cavity. The problems of particle pollution, space occupation, uneven temperature, limited applicability and the like can be remarkably solved, and the operation reliability and maintenance convenience of equipment are improved.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor equipment technology, and more specifically, to a transmission protection structure for a vacuum reaction chamber. Background Technology

[0002] In existing thermal ALD processes, isolation methods such as sealing rings or shaft seals are generally used to protect the rotating mechanism, or labyrinth channels are used to delay the impact on the rotating mechanism, or magnetic coupling rotary drives are used, with one or a combination of these methods to block the reactive gases. However, due to limitations in material properties, process conditions, or cost, using isolation methods to protect the transmission structure in thermal ALD processes can introduce particles during rotation, affecting the process. Labyrinth channel isolation methods require space and introduce particles from the ALD reaction within the labyrinth channel, also impacting the process. Magnetic coupling rotary drives are limited by their inherent parameters and cannot be widely applied. Utility Model Content

[0003] This utility model discloses a transmission protection structure for a vacuum reaction chamber, which aims to solve the problems mentioned above.

[0004] The present invention adopts the following solution:

[0005] A transmission protection structure for a vacuum reaction chamber includes an outer cavity and an inner cavity, and further includes a heating device and a rotating mechanism. The outer cavity is sleeved outside the inner cavity, and a gas-filled gap is formed between the outer cavity and the inner cavity. The heating device is arranged outside the outer cavity to transfer heat to the inner cavity through heat conduction and heat radiation from the outer cavity.

[0006] The rotating mechanism includes a magnetic fluid sealed on the outer cavity, a rotating disk rotatably connected to the inner cavity, and a transmission shaft connecting the magnetic fluid and the rotating disk. The magnetic fluid is adapted to drive the rotating disk to rotate via the transmission shaft.

[0007] The outer cavity is provided with an air inlet channel that connects to the gas filling gap, and the gas filling gap connects to the assembly gap between the rotating disk and the inner cavity.

[0008] Furthermore, a precursor inlet channel is provided on one side of the air intake channel, the precursor inlet channel extends into the inner cavity, and the precursor inlet channel is located above the rotating disk so that the precursor reacts in the inner cavity.

[0009] Furthermore, the rotating mechanism is provided with a tail exhaust port on the other side of the air intake channel to extract the filling gas from the precursor.

[0010] Furthermore, the tail exhaust port includes a first exhaust port and a second exhaust port. The first exhaust port is connected to the inner cavity, and the second exhaust port is connected to the gas filling gap. It is adapted to adjust and control the extraction speed of the precursor and the filling gas by adjusting the cross-sectional area of ​​the first exhaust port and the second exhaust port.

[0011] Furthermore, it also includes a first pressure detection device and a second pressure detection device. The first pressure detection device is disposed in the air intake channel or the gas filling gap to detect the pressure of the filling gas, and the second pressure detection device is disposed in the inner cavity or the source channel to detect the pressure of the precursor.

[0012] Furthermore, the magnetorheological fluid is externally connected to a water-cooling protection device, and the filling gas is adapted to flow into the assembly gap to heat the rotating disk and the drive shaft.

[0013] Furthermore, the diameter of the rotating disk body is 2 to 3.5 times the diameter of the rotating disk mounting hole in the inner cavity, so that the filling gas entering the inner cavity is kept below the rotating disk, thereby reducing the interference of the filling gas on the precursor.

[0014] Furthermore, the flow rate of the filling gas is adjustable in the range of 1 to 10 torr.

[0015] Furthermore, the heating device includes several heat sources that are closely attached to the outer wall of the outer cavity to heat the outer cavity.

[0016] Furthermore, the gas filling gap is less than 1 mm.

[0017] Beneficial effects:

[0018] This design involves directly fitting an outer cavity onto the outside of an inner cavity, placing the heating device on the outer cavity, and filling a gas-filled gap between the outer and inner cavities. This gas-filled gap accelerates heat transfer to the inner cavity and also allows the filling gas to flow through the gaps between the drive shaft, rotating disk, and inner cavity, further heating the drive shaft and rotating disk. This ensures the temperature of the rotating disk and inner cavity are similar, improving process stability and uniformity. Furthermore, the filling gas pressure is higher than the internal pressure of the inner cavity, preventing precursor leakage through assembly gaps and ensuring equipment safety. Therefore, this design results in a simple reaction chamber structure, convenient maintenance, and minimal limitations imposed by temperature and process reaction gases. Attached Figure Description

[0019] Figure 1 This is a schematic diagram of the transmission protection structure of a vacuum reaction chamber according to an embodiment of the present invention;

[0020] Figure 2This is another schematic diagram of the transmission protection structure of a vacuum reaction chamber according to an embodiment of this utility model;

[0021] Figure 3 This is a schematic diagram of the gas flow direction of a transmission protection structure for a vacuum reaction chamber according to an embodiment of this utility model;

[0022] Reference numerals: 1. First heat source, 2. Second heat source, 3. Third heat source, 4. Fourth heat source, 5. Fifth heat source, 6. Magnetofluid, 7. Drive shaft, 8. Rotating disk, 9. Outer cavity, 10. Inner cavity, 11. Filling gas, 12. Inlet channel, 13. Precursor, 14. Gas filling gap, 15. Assembly gap, 16. Source channel, 17 / 18 / 19. First pressure detection device, 20 / 21 / 22. Second pressure detection device, 23. Tail exhaust port. Detailed Implementation

[0023] Combination Figures 1 to 3 As shown, this embodiment provides a transmission protection structure for a vacuum reaction chamber, including an outer cavity 9 and an inner cavity 10, and further including a heating device and a rotating mechanism. The outer cavity 9 is sleeved outside the inner cavity 10, and a gas-filled gap 14 is formed between the outer cavity 9 and the inner cavity 10. The heating device is arranged outside the outer cavity 9 to transfer heat to the inner cavity 10 through heat conduction and heat radiation from the outer cavity 9.

[0024] The rotating mechanism includes a magnetic fluid 6 sealed on the outer cavity 9, a rotating disk 8 rotatably connected to the inner cavity 10, and a transmission shaft 7 connecting the magnetic fluid 6 and the rotating disk 8. The magnetic fluid 6 is adapted to drive the rotating disk 8 to rotate via the transmission shaft 7.

[0025] The outer cavity 9 is provided with an air inlet channel 12 that connects to the gas filling gap 14, and the gas filling gap 14 connects to the assembly gap 15 between the rotating disk 8 and the inner cavity 10. By continuously inputting filling gas 11 into the gas filling gap 14, the gas pressure in the gas filling gap 14 is made higher than the pressure in the inner cavity 10, thereby preventing the precursor 13 from entering the assembly gap 15.

[0026] In this embodiment, the magnetic fluid 6 is an existing device that can achieve a good sealing effect and drive the transmission shaft 7 to rotate. The heating device adopts an existing heating structure, specifically using a resistance heating strip or an induction coil to achieve temperature control. Multiple heat sources are arranged in close contact with the outside of the outer cavity 9. For example, a first heat source 1, a second heat source 2, a third heat source 3, a fourth heat source 4, and a fifth heat source 5 are arranged in close contact with the outside of the outer cavity 9 on all sides. By heating the outer cavity 9, the heat is then conducted to the inner cavity 10 through heat conduction and radiation from the outer cavity 9. This structural design reduces the space required inside the outer cavity 9, facilitating equipment maintenance and saving the required volume space of the cavity, while the heat transfer effect is largely unaffected.

[0027] The sleeved structure of the outer cavity 9 and the inner cavity 10 forms an annular gas channel. The heat generated by the heating device is conducted through the outer cavity 9 to the gas filling gap 14, and then transferred to the inner cavity 10. When the filling gas 11 is continuously input into the gas filling gap 14, a gas pressure layer higher than that of the process chamber is formed. This pressure difference effectively prevents the precursor 13 from penetrating into the rotating shaft area. The non-contact isolation layer formed by the gas pressure gradient fundamentally eliminates the source of frictional particles. Compared with the complex flow channel of the labyrinth structure, this solution achieves effective sealing through a single annular gap, significantly simplifying the equipment structure. Compared with the speed limitation of magnetic coupling drive, this solution adopts a direct drive method, expanding the range of equipment operating parameters.

[0028] A precursor 13 inlet channel 16 is provided on one side of the air intake channel 12. The precursor 13 inlet channel 16 extends into the inner cavity 10 and is located above the rotating disk 8 so that the precursor 13 reacts in the inner cavity 10.

[0029] The precursor 13 inlet channel 16 refers to the gas channel used to transport the special precursor 13 to the inner cavity 10. Its inlet can be located in the area above the rotating disk 8, for example, by using an independent pipe extending into the inner cavity 10. This design allows the precursor 13 to react fully within the inner cavity 10, avoiding interference from the filling gas 11 in the process. "Inlet at the same or similar location" means that the inlets of the special precursor 13 and the filling gas 11 are located in the same or adjacent areas. "Convection in the same flow direction" means that the flow directions of the precursor 13 and the filling gas 11 are consistent, for example, both flow along the axial direction of the rotating disk 8. This design forms a stable airflow barrier near the transmission mechanism, preventing the precursor 13 from diffusing back into non-process areas.

[0030] After the precursor 13 enters the inner cavity 10 through the inlet channel 16, it reacts in the process chamber above the rotating disk 8. Meanwhile, the filling gas 11 enters from an adjacent position into the gas filling gap 14 and is confined to the area below the rotating disk 8. Because the inlet positions of both are close and their flow directions are consistent, the filling gas 11 forms a continuous airflow below the rotating disk 8, preventing the precursor 13 from diffusing towards the transmission mechanism. During this process, the majority of the filling gas 11 flows only in the non-reaction area and does not interfere with the deposition or reaction process of the precursor 13. Simultaneously, the exhaust system discharges both gases synchronously to avoid residue. It should be noted that the trace amount of filling gas 11 has no impact on the process; for example, the flow rate of filling gas 11 entering a typical 60L inner cavity 10 is below 50 sccm, which will not affect the process.

[0031] The rotating mechanism has a tail exhaust port 23 on the opposite side of the air intake channel 12 to extract the filling gas 11 from the precursor 13. The tail exhaust port 23 is an exhaust structure located at a specific position within the cavity, which can be implemented using a pipe interface with a regulating valve. Its function is to actively discharge the filling gas 11 and residual precursor 13 after the reaction, preventing gas accumulation within the cavity that could lead to contamination or pressure imbalance. The "opposite side of the rotating mechanism to the air intake channel 12" means that the tail exhaust port 23 and the air intake channel 12 are symmetrically or diagonally distributed within the cavity, thus forming a stable flow path for the filling gas 11 to enter from the front and exit from the rear. This arrangement ensures that the flow direction of the precursor 13 is the same as that of the filling gas 11. With the tail exhaust port 23 in place, the filling gas 11 enters the gas filling gap 14 from the intake channel 12 near the inlet channel 16 of the precursor 13. Driven by the pressure difference, it flows towards the tail exhaust port 23, simultaneously carrying the reacted precursor 13 mixed gas in the inner cavity 10 out with it. The suction effect of the tail exhaust port 23 can maintain the dynamic pressure balance between the gas filling gap 14 and the inner cavity 10, preventing the precursor 13 from diffusing back to the assembly gap 15 between the drive shaft 7 and the rotating disk 8, thereby avoiding the precursor 13 from depositing or reacting inside the rotating mechanism. Through the active extraction mechanism of the tail exhaust port 23, combined with the relative distribution of the intake channel 12 and the exhaust port, a directional airflow barrier is formed, effectively blocking the migration of the precursor 13 to non-process areas. It achieves directional removal of filling gas 11 and precursor 13, avoids the precursor 13 from depositing or reacting in the contact area between drive shaft 7 and rotating disk 8, reduces particulate contamination caused by gas residue, and maintains dynamic balance of internal and external pressure in the cavity, thereby improving the long-term operational stability of the rotating mechanism in a high-temperature vacuum environment.

[0032] In this embodiment, the tail exhaust port 23 includes a first exhaust port and a second exhaust port. The first exhaust port is connected to the inner cavity 10, and the second exhaust port is connected to the gas filling gap 14. The exhaust speed of the precursor 13 and the filling gas 11 can be adjusted by regulating the cross-sectional areas of the first and second exhaust ports. The first exhaust port refers to the exhaust structure directly connected to the inner cavity 10, specifically a pipe connected to the interior of the inner cavity 10, used to discharge the reacted precursor 13 and byproducts. The second exhaust port refers to the exhaust structure connected to the gas filling gap 14, specifically an independent pipe connected to the gap area, used to discharge the protective filling gas 11. Cross-sectional area adjustment refers to the control of the size of the flow cross-section of the exhaust port, specifically achieved using an adjustable valve or a variable orifice device. By adjusting the ratio of the two, the discharge speeds of the precursor 13 and the filling gas 11 can be controlled respectively. During the process, the filling gas 11 continuously enters the gas filling gap 14 to form a high-pressure area, preventing the precursor 13 from permeating into the assembly gap 15 through the pressure difference. The first extraction port actively removes the precursor 13 from the inner cavity 10, while the second extraction port simultaneously removes the filling gas 11 from the gap. By adjusting the cross-sectional areas of the two extraction ports, the extraction speed ratio of the precursor 13 and the filling gas 11 can be controlled separately. For example, increasing the cross-sectional area of ​​the first extraction port accelerates the discharge of the precursor 13, while maintaining the cross-sectional area of ​​the second extraction port to stabilize the pressure of the filling gas 11. This creates a dynamically balanced airflow barrier around the rotating disk 8, preventing the precursor 13 from overflowing and contaminating the transmission mechanism, and preventing excessive entry of the filling gas 11 into the process chamber, which could interfere with the reaction. In addition, by dynamically adjusting the extraction speed ratio, the system can adapt to changes in gas flow rate at different process stages, improving the reliability and consistency of the system operation.

[0033] In a preferred embodiment, the system further includes a first pressure detection device 17 / 18 / 19 and a second pressure detection device 20 / 21 / 22. The first pressure detection device can be located at the air intake channel 12 to detect the pressure of the filling gas 11, and the second pressure detection device can be located inside the inner cavity 10 or at the inlet channel 16 to detect the pressure of the precursor 13.

[0034] The first pressure detection device 17 / 18 / 19 refers to the device used to acquire the pressure data of the filling gas 11 in real time. Specifically, it can be implemented using a piezoelectric sensor or a capacitive pressure transmitter. The sensor is integrated into the inlet channel 12 or placed within the gas filling gap 14 to directly collect the dynamic pressure signal during gas flow. The function of this device is to provide feedback for the pressure regulation of the filling gas 11, ensuring that the pressure in the gas filling gap 14 is consistently higher than the pressure inside the inner cavity 10. The second pressure detection device 20 / 21 / 22 refers to the device used to monitor the pressure state of the precursor 13 in the inner cavity 10 or the exhaust path. Specifically, it can be implemented using a diaphragm pressure sensor or a fiber optic pressure sensor to capture pressure changes in the flow environment of the precursor 13 in real time. The function of this device is to establish pressure balance monitoring between the inner cavity 10 and the filling gas 11 area, preventing the precursor 13 from diffusing into the assembly gap 15 due to abnormal pressure.

[0035] This embodiment of the solution enables precise control of the pressure gradient between the filling gas 11 and the precursor 13, effectively preventing the precursor 13 from intruding into the rotating mechanism. The distributed layout of the pressure detection device not only covers key nodes in the gas flow path but also allows for flexible adjustment of the monitoring position to meet different process requirements. While maintaining stable operation of the vacuum reaction chamber, it significantly reduces the risk of corrosion or contamination of the transmission mechanism.

[0036] In this embodiment, a water-cooling protection device is externally connected to the magnetic fluid 6, and the filling gas 11 is adapted to flow into the assembly gap 15 to heat the rotating disk 8 and the drive shaft 7. The water-cooling protection device refers to a circulating cooling system installed outside the magnetic fluid 6, which can be implemented using an annular cooling pipe surrounding the outer shell of the magnetic fluid 6. The water-cooling protection device continuously removes the heat generated by the magnetic fluid 6 during operation through coolant circulation, preventing mechanical damage to the magnetic fluid 6 due to high temperature. This process can affect the drive shaft 7 and the rotating disk 8, thereby affecting the process temperature. However, in this application, because the filling gas 11 is positioned under the heat conduction and heat radiation of the outer cavity 9, the temperature of the filling gas 11 is close to that of the outer cavity 9. When it flows to the assembly gap 15, it can heat the drive shaft 7 and the rotating disk 8 to compensate for the temperature drop caused by the water-cooling protection device, thus helping to improve the reaction uniformity.

[0037] In a preferred embodiment, the diameter of the rotating disk 8 is 2 to 3.5 times the diameter of the mounting hole in the inner cavity 10, so that the filling gas 11 entering the inner cavity 10 is kept below the rotating disk 8, thereby reducing the interference of the filling gas 11 on the precursor 13. This ratio range allows the rotating disk 8 to cover and block the inlet of the mounting hole, preventing the filling gas 11 from directly entering the process area. Keeping the filling gas 11 below the rotating disk 8 means that the gas forms a retention layer in the gap between the rotating disk 8 and the inner cavity 10. This retention layer forms a physical isolation barrier, preventing the filling gas 11 from diffusing upwards to the reaction area of ​​the precursor 13. Inside the inner cavity 10, the diameter of the rotating disk 8 is much larger than the diameter of the mounting hole, forming an annular blocking area around the mounting hole. After the filling gas 11 enters the inner cavity 10 through the gas filling gap 14, it is blocked by the rotating disk 8 and cannot rise vertically to the process area where the precursor 13 is located; it can only diffuse outwards along the lower surface of the rotating disk 8. When the gas moves to the edge of the rotating disk 8, its trajectory has deviated from the main reaction space of the process area. At this point, the exhaust port 23 can directly discharge the gas. In this way, the filling gas 11 is always confined to the non-process area below the rotating disk 8, avoiding contact interference with the precursor 13 being deposited. This solution utilizes the dimensional matching relationship between the rotating disk 8 and the mounting hole to directly form a gas isolation barrier using the structure of the rotating component itself, eliminating the need for additional sealing devices. This simplifies the equipment structure and eliminates the risk of particulate contamination caused by seal wear.

[0038] In this embodiment, the flow rate of the filling gas 11 is adjustable within the range of 1 to 10 torr. By controlling the input flow rate of the filling gas 11, the pressure within the gas filling gap 14 is dynamically maintained at a level higher than the internal pressure of the inner cavity 10. When gas is continuously input through the air inlet channel 12, the flow regulation system automatically adjusts the valve opening according to the real-time pressure changes within the inner cavity 10. For example, it quickly compensates for gas flow when the pressure within the inner cavity 10 fluctuates, ensuring that the filling gas 11 always overflows from the assembly gap 15 at a stable pressure. This dynamic air curtain formed by the pressure difference effectively blocks the diffusion of the precursor 13 towards the rotating mechanism, while also preventing excessive gas from entering the process area and affecting the coating reaction.

[0039] Furthermore, the gas filling gap 14 is less than 1 mm. Its size is designed to be less than 1 mm to form a compact sealed space, maintaining a high pressure of the filling gas 11 within the gas filling gap 14, thereby effectively preventing the precursor 13 from permeating into the assembly gap 15. A stable high-pressure region is formed within the gap by continuously inputting the filling gas 11. Due to the small gap size, the gas flow path is restricted, allowing the filling gas 11 to be distributed more efficiently and uniformly within the gap, forming a pressure barrier that prevents the precursor 13 from entering the rotating mechanism through the assembly gap 15. Simultaneously, the smaller gap reduces the amount of filling gas 11 used, avoiding excessive gas interference with the reaction environment within the process chamber, ensuring that the reaction process of the precursor 13 within the inner cavity 10 is not affected by gas diffusion, and facilitating heat radiation and conduction from the outer cavity 9 to the inner cavity 10.

[0040] This embodiment achieves reliable protection of the transmission mechanism with less space and lower gas consumption while maintaining a stable reaction environment inside the process chamber. It also reduces the risk of particulate contamination caused by the precursor 13 seeping into the assembly gap 15, thereby improving the stability of the coating process and product yield. The entire reaction chamber has a simple structure, is easy to maintain, and is less restricted by temperature and process reaction gases.

[0041] It should be understood that the above are only preferred embodiments of the present utility model, and the protection scope of the present utility model is not limited to the above embodiments. All technical solutions that fall within the scope of the present utility model are protected by the present utility model.

[0042] The accompanying drawings used in the above description of the embodiments only show some embodiments of the present invention and should not be regarded as a limitation of the scope. For those skilled in the art, other related drawings can be obtained from these drawings without creative effort.

Claims

1. A transmission protection structure for a vacuum reaction chamber, comprising an outer cavity and an inner cavity, characterized in that, Also includes: A heating device and a rotating mechanism, wherein the outer cavity is sleeved outside the inner cavity, and a gas-filled gap is formed between the outer cavity and the inner cavity; the heating device is arranged outside the outer cavity to transfer heat to the inner cavity through heat conduction and heat radiation from the outer cavity; The rotating mechanism includes a magnetic fluid sealed on the outer cavity, a rotating disk rotatably connected to the inner cavity, and a transmission shaft connecting the magnetic fluid and the rotating disk. The magnetic fluid is adapted to drive the rotating disk to rotate via the transmission shaft. One side of the rotating mechanism is provided with an air inlet channel that connects to the gas filling gap, and the gas filling gap connects to the assembly gap between the rotating disk and the inner cavity.

2. The transmission protection structure for the vacuum reaction chamber according to claim 1, characterized in that, A precursor inlet channel is provided on one side of the air intake channel. The precursor inlet channel extends into the inner cavity and is located above the rotating disk so that the precursor reacts in the inner cavity.

3. The transmission protection structure for the vacuum reaction chamber according to claim 2, characterized in that, The rotating mechanism is provided with a tail exhaust port on the other side of the air intake channel to extract the filling gas from the precursor.

4. The transmission protection structure for the vacuum reaction chamber according to claim 3, characterized in that, The tail exhaust port includes a first exhaust port and a second exhaust port. The first exhaust port is connected to the inner cavity, and the second exhaust port is connected to the gas filling gap. It is adapted to adjust and control the extraction speed of the precursor and the filling gas by adjusting the cross-sectional areas of the first exhaust port and the second exhaust port.

5. The transmission protection structure for the vacuum reaction chamber according to claim 4, characterized in that, It also includes a first pressure detection device and a second pressure detection device. The first pressure detection device is disposed in the air intake channel or the gas filling gap to detect the pressure of the filling gas, and the second pressure detection device is disposed in the inner cavity or the source channel to detect the pressure of the precursor.

6. The transmission protection structure for the vacuum reaction chamber according to claim 1, characterized in that, The magnetofluid is externally connected to a water-cooling protection device, and the filling gas is adapted to flow into the assembly gap to heat the rotating disk and the drive shaft.

7. The transmission protection structure for the vacuum reaction chamber according to claim 1, characterized in that, The diameter of the rotating disk body is 2 to 3.5 times the diameter of the rotating disk mounting hole in the inner cavity, so that the filling gas entering the inner cavity is kept below the rotating disk, thereby reducing the interference of the filling gas on the precursor.

8. The transmission protection structure for the vacuum reaction chamber according to claim 1, characterized in that, The flow rate of the filling gas is adjustable in the range of 1 to 10 torr.

9. The transmission protection structure for the vacuum reaction chamber according to claim 1, characterized in that, The heating device includes several heat sources that are closely attached to the outer wall of the outer cavity to heat the outer cavity.

10. The transmission protection structure for the vacuum reaction chamber according to claim 1, characterized in that, The gas filling gap is less than 1 mm.

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