Ultrasonic atomization device for chemical vapor deposition
By isolating the precursor solution from the ultrasonic atomizing plate in the ultrasonic atomizing device and combining it with a circulating water cooling system, the problems of precursor solution corrosion and excessive temperature were solved, achieving stable droplet density and long-term thin film deposition.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- WUHAN UNIV OF TECH
- Filing Date
- 2025-05-20
- Publication Date
- 2026-05-15
AI Technical Summary
Existing ultrasonic atomization devices suffer from problems such as precursor solution corrosion of ultrasonic atomizing plates, excessively high temperature of ultrasonic atomizing plates, and imperfect liquid replenishment methods, making it difficult for the equipment to operate stably for extended periods.
An ultrasonic atomization device was designed, comprising a water tank, an ultrasonic atomizing plate, and a precursor solution cavity. The precursor solution cavity and the ultrasonic atomizing plate are sealed by an isolation membrane, and a circulating water cooling system is set up to achieve constant volume and temperature control of the precursor solution.
It effectively prevents the precursor solution from corroding the ultrasonic atomizing plate, avoids excessive temperature, ensures stable droplet density, and supports long-term thin film deposition.
Smart Images
Figure CN224243201U_ABST
Abstract
Description
Technical Field
[0001] This utility model belongs to the technical field of new material preparation equipment, specifically relating to an ultrasonic atomization device for chemical vapor deposition. Background Technology
[0002] Developing low-cost, high-quality semiconductor thin film fabrication technologies can help support the rapid development of the semiconductor industry. Mist chemical vapor deposition (CVD) equipment, with its advantages of a non-vacuum deposition environment, low equipment cost, and low energy consumption, has demonstrated unique value in the fabrication of oxide and mixed anionic compound semiconductor thin films.
[0003] Mist CVD requires precursor molecules to be soluble in water or solvents, and the prepared precursor solution to be dispersed into micron-sized droplets under ultrasonic treatment.
[0004] Currently, existing ultrasonic atomization devices have the following problems: 1. The precursor solution directly contacts the ultrasonic atomizing plate, and some of the precursor solution corrodes the ultrasonic atomizing plate, reducing its lifespan and affecting the purity of the prepared film. 2. Prolonged operation of the ultrasonic atomizing plate leads to excessively high temperatures, affecting its lifespan; high temperatures are also harmful to the precursor solution, easily causing its decomposition. 3. The current liquid replenishment method is not perfect; the volume of the precursor solution in the precursor solution chamber affects the amount of mist generated, and existing technology still has shortcomings in maintaining a constant volume of the precursor solution.
[0005] Therefore, existing ultrasonic atomization devices currently struggle to achieve stable operation over extended periods. There is an urgent need to develop new types of ultrasonic atomization equipment to achieve a significant breakthrough in ultrasonic atomization technology. Summary of the Invention
[0006] The technical problem to be solved by this utility model is to provide an ultrasonic atomizing device for chemical vapor deposition that is compatible with a variety of precursor solutions and has a cooling function. The volume of the precursor solution is constant, and the amount of atomization is uniform and stable over a long period of time.
[0007] The embodiments of this application are implemented as follows:
[0008] This application provides an ultrasonic atomizing device for chemical vapor deposition, characterized in that it includes a water tank, an ultrasonic atomizing plate, and a precursor solution cavity. The ultrasonic atomizing plate is located at the center of the bottom of the water tank. The precursor solution cavity is a cylindrical structure with an open bottom. The bottom opening is sealed by an isolation membrane and positioned and sealed by a crimping member. The precursor solution cavity is placed inside the water tank, above the ultrasonic atomizing plate. The top of the precursor solution cavity is provided with an upwardly extending precursor solution adding pipe and a droplet output pipe, and a carrier gas pipe is provided on the upper side wall.
[0009] In some alternative embodiments, the crimping component includes an upper flange, a lower flange, and connecting bolts. The bottom opening of the precursor solution cavity is provided with an annular flange, which is located between the upper flange and the lower flange and is fixedly connected by connecting bolts.
[0010] In some alternative implementations, the water tank has a two-layer structure, with the precursor solution chamber located in the upper layer and the ultrasonic atomizing plate located in the lower layer.
[0011] In some optional implementations, the lower two side walls of the water tank are respectively connected to a circulating water inlet pipe and a circulating water return pipe, both of which are connected to the circulating water tank, and a circulating water pump is installed on the circulating water return pipe.
[0012] In some alternative embodiments, an annular sealing groove is provided on the bottom surface of the annular flange, and a rubber sealing ring is provided in the sealing groove.
[0013] In some alternative implementations, both the precursor solution addition connector and the droplet output connector are inverted conical structures.
[0014] In some alternative embodiments, the thickness of the separator is 0.01 mm to 0.1 mm, and the material is polytetrafluoroethylene, polyvinyl chloride, polyethylene, polypropylene, or polystyrene.
[0015] In some alternative embodiments, the precursor solution adding connector is provided with a matching solution input pipe, the contact area between the solution input pipe and the precursor solution adding connector is an inverted cone structure, and the droplet output connector is provided with a matching droplet output pipe, the droplet output pipe is a T-junction, the contact area between the droplet output pipe and the droplet output connector is an inverted cone structure.
[0016] In some optional embodiments, the precursor solution chamber is made of transparent glass, the precursor solution adding tube and the droplet output tube are both made of frosted glass, the part of the solution input tube that contacts the precursor solution adding tube is made of frosted glass, and the part of the droplet output tube that contacts the droplet output tube is made of frosted glass.
[0017] In some alternative implementations, the water tank has an inverted U-shaped structure with a downward-convex bottom center, and the ultrasonic atomizing plate is installed at the bottom center.
[0018] The beneficial effects of this application are as follows: 1. The ultrasonic atomizing device for chemical vapor deposition provided by this application isolates the precursor solution from direct contact with the piezoelectric atomizing plate, effectively preventing the precursor solution from corroding the ultrasonic atomizing plate, and avoiding the impact of the decomposition or corrosion byproducts of the ultrasonic atomizing plate on the purity of the prepared film; 2. The liquid replenishment method of the atomizing device is improved by adding the precursor solution to the chamber to maintain its constant volume, ensuring that the droplet density is stable for a long time, laying the foundation for long-term film deposition; 3. A circulating water system is set in the water tank, which has a self-cooling function to control the temperature of the ultrasonic atomizing plate and prevent the ultrasonic atomizing plate from overheating due to long-term operation, thus affecting its lifespan. Attached Figure Description
[0019] To more clearly illustrate the technical solutions of the embodiments of this application, the accompanying drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of this application and should not be regarded as a limitation of the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.
[0020] Figure 1 This is an isometric view of the ultrasonic atomizing device in the embodiments of this application;
[0021] Figure 2 This is a front view of the ultrasonic atomizing device in the embodiments of this application;
[0022] Figure 3 This is a side view of the ultrasonic atomizing device in the embodiments of this application;
[0023] Figure 4 This is a top view of the ultrasonic atomizing device in the embodiments of this application. Detailed Implementation
[0024] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. The components of the embodiments of this application described and shown in the accompanying drawings can generally be arranged and designed in various different configurations.
[0025] Therefore, the following detailed description of the embodiments of this application provided in the accompanying drawings is not intended to limit the scope of the claimed application, but merely to illustrate selected embodiments of the application. All other embodiments obtained by those skilled in the art based on the embodiments of this application without inventive effort are within the scope of protection of this application.
[0026] It should be understood that the sequence number of each step in the embodiment does not imply the order of execution. The execution order of each process should be determined by its function and internal logic, and should not constitute any limitation on the implementation process of the embodiments of this application.
[0027] It should be noted that similar labels and letters in the following figures indicate similar items. Therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures.
[0028] The features and performance of this application will be further described in detail below with reference to the embodiments.
[0029] like Figures 1-4 As shown, an ultrasonic atomizing device for chemical vapor deposition includes a water tank 1, an ultrasonic atomizing plate 2, and a precursor solution chamber 3. The ultrasonic atomizing plate is located at the center of the bottom of the water tank. The precursor solution chamber is a cylindrical structure with an open bottom. The bottom opening is sealed by an isolation membrane 4 and positioned and sealed by a crimping member 5. The precursor solution chamber is placed inside the water tank, above the ultrasonic atomizing plate. The top of the precursor solution chamber is provided with an upwardly extending precursor solution adding pipe 6 and a droplet output pipe 7. A carrier gas pipe 8 is provided on the upper side wall.
[0030] The crimping assembly includes an upper flange 51, a lower flange 52, and connecting bolts 53. The bottom opening of the precursor solution chamber is provided with an annular flange 54, located between the upper and lower flanges and secured in place by the connecting bolts. An annular sealing groove is provided on the bottom surface of the annular flange, and a rubber sealing ring is installed within the groove. The upper and lower flanges clamp the annular flange together with the connecting bolts, and the rubber sealing ring is compressed to form a seal.
[0031] By setting up a sealed precursor solution cavity, direct contact between the precursor solution and the ultrasonic atomizing plate is effectively isolated, effectively preventing the precursor solution from corroding the ultrasonic atomizing plate, and avoiding the impact of the decomposition or corrosion byproducts of the ultrasonic atomizing plate on the purity of the prepared film.
[0032] The separator membrane has a thickness of 0.01 mm to 0.1 mm and is made of polytetrafluoroethylene, polyvinyl chloride, polyethylene, polypropylene, or polystyrene. This diversity of membrane materials accommodates various precursor solutions, including different acid solutions, alkaline solutions, and organic solvents. Furthermore, the control over the membrane thickness allows for regulation of droplet size, enabling controlled thin-film deposition.
[0033] Furthermore, the water tank has a two-layer structure, with the precursor solution chamber located in the upper layer and the ultrasonic atomizing plate in the lower layer. The lower layer of the water tank has a circulating water inlet pipe 11 and a circulating water return pipe 12 connected to its two side walls, respectively. Both the circulating water inlet and return pipes are connected to a circulating water tank, and a circulating water pump is installed on the circulating water return pipe. A circulating water cooling system is used to control the temperature of the ultrasonic atomizing plate, preventing it from overheating during prolonged operation and affecting its lifespan. Simultaneously, it avoids accelerated decomposition of the precursor solution due to elevated temperature.
[0034] Furthermore, both the precursor solution addition connector and the droplet output connector have an inverted conical cylindrical structure. The precursor solution addition connector is equipped with a matching solution inlet pipe, and the contact area between the solution inlet pipe and the precursor solution addition connector is an inverted conical structure. The droplet output connector is equipped with a matching droplet output pipe 71, which is a T-junction pipe, and the contact area between the droplet output pipe and the droplet output connector is an inverted conical structure.
[0035] The precursor solution chamber is made of transparent glass, while the precursor solution adding tube and the droplet output tube are both made of frosted glass. The part of the solution inlet tube that contacts the precursor solution adding tube is made of frosted glass, and the part of the droplet output tube that contacts the droplet output tube is made of frosted glass.
[0036] The inverted cone structure serves as a limit and positioning element, while the frosted glass material increases the friction of the contact surface, providing an anti-slip effect. At the same time, the contact surfaces are pressed together to form a good sealing surface.
[0037] An external replenishment device can be connected to the solution inlet pipe. This device can be a pear-shaped separatory funnel, a syringe pump, a peristaltic pump, or other similar equipment. By replenishing the precursor solution at a constant rate, the volume of the solution in the precursor solution chamber is kept constant, thus achieving long-term uniform fogging.
[0038] The droplet output tube is a three-way tube, used for droplet input, output, and dilution gas input respectively. The droplet input and output diameters are relatively large, while the dilution gas input diameter is relatively small. The droplet output and dilution gas input are located in the same horizontal direction.
[0039] The precursor solution chamber, droplet output tube, and solution input tube are all made of glass, which is resistant to acid and alkali corrosion and facilitates observation of the droplet state.
[0040] Example 1
[0041] In this embodiment, the water tank has an inverted U-shaped structure with a downward-convex bottom center. The ultrasonic atomizing plate is installed at the center of the downward-convex bottom, and the precursor solution cavity is installed on the upper part of the water tank via a crimping component. The circulating water in the lower part is mainly used to control the temperature of the ultrasonic atomizing plate, while the water in the upper part is mainly used to transmit ultrasonic waves. The addition of an isolation membrane seals the precursor solution cavity and eliminates the influence of circulating water on ultrasonic wave transmission, ensuring the long-term stable operation of the ultrasonic atomizing plate.
[0042] Example 2
[0043] The aforementioned ultrasonic atomizing device is connected to a quartz tube placed in a central tube furnace to form an atomized chemical vapor deposition device.
[0044] The circulating water flow rate was set to 0.3 m / s. The carrier gas and dilution gas were selected as N2 and O2, respectively, and their flow rates were controlled by a digital gas mass flow meter.
[0045] Taking the epitaxial growth of BiOI thin films on strontium titanate single crystal substrates as an example:
[0046] 1. Use organic solvents acetone and ethanol to clean the substrate.
[0047] 2. First, select a quartz carrier of appropriate thickness, and after strictly fixing the substrate to the carrier surface, load it into the airflow confinement device. Then, vertically transfer the assembled confinement device into the crystal growth chamber, and calibrate the device position through the positioning slots to make the substrate working plane coincide with the central axis of the chamber.
[0048] 3. Set the growth temperature to 300℃. After the growth chamber temperature stabilizes at the set value, start the ultrasonic nebulizer. The precursor solution is a 0.1 mol / L BiI3N,N-dimethylformamide solution. After holding at this temperature for 5 minutes, simultaneously turn on the oxygen dilution gas (flow rate 0.2 L / min) and nitrogen carrier gas (flow rate 0.8 L / min) to start film deposition. Maintain a constant volume of the precursor solution in the precursor solution chamber by using a separatory funnel at a rate of 2.0 mL / min.
[0049] 4. Deposit the thin film for 15 minutes, then slowly cool it to room temperature and remove the sample.
[0050] This example ultimately yielded a high-quality BiOI epitaxial film with an XRD wobble width of less than 0.2° and a film thickness of approximately 30 nanometers.
Claims
1. An ultrasonic atomizing device for chemical vapor deposition, characterized in that, The device includes a water tank, an ultrasonic atomizing plate, and a precursor solution chamber. The ultrasonic atomizing plate is located at the center of the bottom of the water tank. The precursor solution chamber is a cylindrical structure with an open bottom. The bottom opening is sealed by an isolation membrane and positioned and sealed by a crimping component. The precursor solution chamber is placed inside the water tank, above the ultrasonic atomizing plate. The top of the precursor solution chamber is provided with an upwardly extending precursor solution adding pipe and a droplet output pipe, and a carrier gas pipe is provided on the upper side wall.
2. The ultrasonic atomizing device for chemical vapor deposition according to claim 1, characterized in that, The crimping component includes an upper flange, a lower flange, and connecting bolts. The bottom opening of the precursor solution cavity is provided with an annular flange, which is located between the upper flange and the lower flange and is fixedly connected by connecting bolts.
3. The ultrasonic atomizing device for chemical vapor deposition according to claim 2, characterized in that, The water tank has a two-layer structure, with the precursor solution chamber located in the upper layer and the ultrasonic atomizing plate located in the lower layer.
4. The ultrasonic atomizing device for chemical vapor deposition according to claim 3, characterized in that, The lower two side walls of the water tank are respectively connected to a circulating water inlet pipe and a circulating water return pipe. Both the circulating water inlet pipe and the circulating water return pipe are connected to the circulating water tank, and a circulating water pump is installed on the circulating water return pipe.
5. An ultrasonic atomizing device for chemical vapor deposition according to claim 2 or 4, characterized in that, The bottom surface of the annular flange is provided with an annular sealing groove, and a rubber sealing ring is provided in the sealing groove.
6. The ultrasonic atomizing device for chemical vapor deposition according to claim 5, characterized in that, Both the precursor solution addition connector and the droplet output connector have an inverted conical cylindrical structure.
7. An ultrasonic atomizing device for chemical vapor deposition according to claim 1 or 6, characterized in that, The thickness of the isolation membrane is 0.01 mm to 0.1 mm, and the material is polytetrafluoroethylene, polyvinyl chloride, polyethylene, polypropylene, or polystyrene.
8. An ultrasonic atomizing device for chemical vapor deposition according to claim 6, characterized in that, The precursor solution adding connector is equipped with a matching solution input pipe. The contact area between the solution input pipe and the precursor solution adding connector is an inverted cone structure. The droplet output connector is equipped with a matching droplet output pipe. The droplet output pipe is a T-junction pipe. The contact area between the droplet output pipe and the droplet output connector is an inverted cone structure.
9. An ultrasonic atomizing device for chemical vapor deposition according to claim 8, characterized in that, The precursor solution chamber is made of transparent glass, and the precursor solution addition connector and the droplet output connector are both made of frosted glass. The part of the solution inlet pipe that contacts the precursor solution addition connector is made of frosted glass, and the part of the droplet output pipe that contacts the droplet output connector is made of frosted glass.
10. An ultrasonic atomizing device for chemical vapor deposition according to claim 4 or 9, characterized in that, The water tank has an inverted U-shaped structure with a downward convex center at the bottom, and the ultrasonic atomizing plate is installed at the center of the bottom.