Dustproof cover of image generation unit for reducing sunlight backflow
By incorporating a grid structure and explosion-proof film into the HUD dust cover, the problem of functional layer variation under high temperatures was solved, product yield was improved, costs were reduced, and effective protection against backflow of sunlight was achieved.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- WUHU TOKEN SCI
- Filing Date
- 2025-05-30
- Publication Date
- 2026-05-15
AI Technical Summary
Existing HUD dust covers are prone to deformation between the functional layer and the glass substrate under long-term high-temperature environments, resulting in light effect distortion. Furthermore, the production yield is low, and the cost remains high.
The glass substrate has multiple protruding grid structures on one side and an explosion-proof film is bonded to the other side. The grid structure is made by electroplating a metal aluminum layer, imprinting with nano-imprint adhesive and ion etching, and has a polarizing function. The explosion-proof film is made of PET, polyurethane or polycarbonate film, which enables visible light to pass through near-infrared reflection.
Prevents wrinkles in high-temperature environments, improves product yield by 5%, reduces costs by 15%, and effectively reduces sunlight backflow.
Smart Images

Figure CN224247993U_ABST
Abstract
Description
Technical Field
[0001] This utility model belongs to the field of head-up display technology, and more specifically, it relates to a dust cover for reducing sunlight backflow into the image generation unit. Background Technology
[0002] With the rapid development of intelligent connected vehicles, HUDs have gradually gained attention, especially AR-HUD technology. Its augmented reality functionality offers a better user experience and more practical user value, making it a hot topic for automakers and related technology providers. In existing mass-produced AR-HUD TFT products (AR, Augmented Reality, HUD, Head-Up Display, TFT, Thin Film Transistor), sunlight flowing back into the PGU (Picture Generating Unit) can cause overheating due to light convergence, potentially even burning out the PGU. The industry typically uses methods such as removing the infrared spectrum of sunlight or removing the P-wave component to reduce the amount of light entering the PGU, thus ensuring its safety. To achieve this technology, the traditional dust cover solution uses upper and lower PCs to protect the internal structure, with adhesive connecting the PCs to the intermediate polarizer. This structure is prone to delamination under long-term high-temperature environments, and adhesive aging leads to localized deformation within the polarizer structure, ultimately causing distorted light effects. Furthermore, the yield rate of this structure is low, thus keeping the price of the dust cover structure consistently high.
[0003] Existing technology includes a technology entitled "A HUD Dustproof Mechanism" with publication number "CN208399809U". This technology provides a HUD dustproof mechanism, including a combiner display screen. A dustproof mechanism is mounted on the combiner display screen, and the dustproof cover is driven by a connecting rod via a drive mechanism. The connecting rod moves the dustproof cover within a preset guide rail trajectory, causing the dustproof cover to open or close. The HUD dustproof mechanism of this utility model uses a drive mechanism to drive a connecting rod, which in turn drives the dustproof cover (which is equipped with a spring), allowing the dustproof cover to move in a predetermined direction and achieve synchronous opening or closing of the dustproof cover.
[0004] However, this technology does not address the technical issues and solutions of this application. Utility Model Content
[0005] The technical problem to be solved by this utility model is: to provide a dust cover for the image generation unit that reduces sunlight backflow, which is simple in structure, solves the problem of changes between the functional layer and the glass substrate caused by long-term high temperature, improves product yield, and reduces product cost, in order to address the shortcomings of the existing technology.
[0006] To solve the above-mentioned technical problems, the technical solution adopted by this utility model is as follows:
[0007] This utility model is a dust cover for reducing sunlight backflow into the image generation unit, including a glass substrate, a grid structure, and an explosion-proof film. Multiple grid structures protruding from the surface of the glass substrate are provided on one side of the glass substrate, and adjacent grid structures are arranged with gaps. The explosion-proof film is adhered to the other side of the glass substrate.
[0008] The aforementioned wire grid structure is made of aluminum.
[0009] The height A of the described wire grid structure is in the range of 100nm-400nm.
[0010] The width B of the described wire grid structure is in the range of 50-200 nm.
[0011] The spacing C of the described wire grid structure is in the range of 100-400 nm.
[0012] The wire grid structure is perpendicular to the surface of the glass substrate.
[0013] The explosion-proof film is placed on the side where sunlight enters.
[0014] The aforementioned wire grid structure is a microstructure prepared by nanoimprinting of a filter layer on the surface of a glass substrate and an ion etching process.
[0015] The explosion-proof film is a polyethylene terephthalate (PET) film, a polyurethane film, or a polycarbonate film.
[0016] The working principle and beneficial effects of this utility model are as follows:
[0017] The dust cover for the image generation unit that reduces sunlight backflow, as described in this invention, features a wire grid structure on one side of the glass substrate and an explosion-proof film layer on the other side. The polarization function of the entire structure is achieved by the metal wire grid structure. The wire grid structure is fabricated by first electroplating an aluminum layer onto the glass substrate surface, then using nanoimprint adhesive to create a microstructure (masking effect), and finally using ion etching to form the wire grid structure. The glass substrate has high hardness, and with the addition of an ultra-thin explosion-proof film, wrinkles will not appear under high-temperature conditions. The wire grid structure provides polarization, allowing virtually all visible light to pass through while reflecting almost all near-infrared light, ensuring that only about half of the sunlight enters the interior, thus reducing sunlight backflow. Attached Figure Description
[0018] The following is a brief explanation of the contents depicted in the accompanying drawings and the markings therein:
[0019] Figure 1This is a partial structural schematic diagram of the dust cover of the image generation unit for reducing sunlight backflow as described in this utility model;
[0020] Figure 2 This is a partial structural schematic diagram of the dust cover of the image generation unit for reducing sunlight backflow as described in this utility model;
[0021] Figure 3 This is a schematic diagram illustrating the manufacturing process of the dust cover for the image generation unit that reduces sunlight backflow, as described in this utility model.
[0022] The labels in the attached diagram are as follows: 1. Glass substrate; 2. Grid structure; 3. Explosion-proof film; 4. Sunlight; 5. Transmitted light; 6. Reflected light. Detailed Implementation
[0023] The following description, with reference to the accompanying drawings, provides a more detailed explanation of the specific embodiments of this utility model, including the shape and structure of each component, the relative positions and connections between the parts, the functions and working principles of each part:
[0024] As attached Figure 1 -Appendix Figure 3 As shown, this utility model is a dust cover for reducing sunlight backflow into an image generation unit, comprising a glass substrate 1, a wire grid structure 2, and an explosion-proof film 3. Multiple wire grid structures 2 protruding from the surface of the glass substrate 1 are provided on one side of the glass substrate 1, with adjacent wire grid structures 2 arranged at intervals. The explosion-proof film 3 is adhered to the other side of the glass substrate 1. This structure addresses the shortcomings of existing technologies by proposing an improved technical solution. In this structural design, a wire grid structure 2 is provided on one side of the glass substrate 1, and an explosion-proof film layer 3 is provided on the other side. The polarization function of the entire structure is achieved by the metal wire grid structure. The wire grid structure 2 is manufactured by first electroplating an aluminum layer on the surface of the glass substrate 1, then using nano-imprint adhesive to imprint a microstructure (masking effect), and finally using ion etching to form the wire grid structure 2. The glass substrate 1 has high hardness, and after applying the ultra-thin explosion-proof film 3, wrinkles will not occur under high-temperature environments. The wire grid structure 2 has a polarization function, allowing most visible light to pass through while reflecting most near-infrared light, ensuring that only about half of the sunlight enters the interior, thus reducing sunlight backflow. The dust cover for reducing sunlight backflow into the image generation unit described in this utility model has a simple structure, solves the problem of deformation between the functional layer and the glass substrate caused by long-term high temperature, improves product yield, and reduces product cost.
[0025] The described wire grid structure 2 is made of aluminum. The height A of the wire grid structure 2 is in the range of 100nm-400nm. The width B of the wire grid structure 2 is in the range of 50-200nm. The spacing C of the wire grid structure 2 is in the range of 100-400nm. In this invention, only a three-layer structure—a wire grid structure with polarizing function, a glass substrate, and an explosion-proof film—is used, effectively simplifying the structure while simultaneously improving and reducing solar backflow and lowering costs.
[0026] The wire grid structure 2 is perpendicular to the surface of the glass substrate 1. The explosion-proof film 3 is disposed on the side where sunlight 4 enters. In the above structure, the wire grid structure 2 is electroplated onto the surface of the glass substrate. When sunlight 4 enters, it passes through the explosion-proof film 1, then through the glass substrate 1, and then through the wire grid structure 2 for polarization treatment. Half of the light passes through as transmitted light 5, and the other half is reflected as reflected light 6.
[0027] The described wire grid structure 2 is a microstructure fabricated from the filter layer on the surface of the glass substrate 1 using nanoimprint lithography and ion etching processes. This wire grid structure 2 has a simple manufacturing process and high overall yield. In practical applications, it improves yield by 5% and reduces price by 15%.
[0028] The explosion-proof film 3 is a polyethylene terephthalate (PET) film, a polyurethane film, or a polycarbonate film. With this structure, the explosion-proof film 3 reliably achieves its heat insulation and cooling function.
[0029] The dust cover for the image generation unit that reduces sunlight backflow, as described in this invention, has a wire grid structure 2 on one side of the glass substrate 1 and an explosion-proof film layer 3 on the other side. The polarization function of the entire structure is achieved by the metal wire grid structure. The wire grid structure 2 is fabricated by first electroplating an aluminum layer on the surface of the glass substrate 1, then using nanoimprint adhesive to imprint a microstructure (masking effect), and finally using ion etching to form the wire grid structure 2. The glass substrate 1 has high hardness, and after applying the ultra-thin explosion-proof film 3, wrinkles will not appear under high-temperature environments. The wire grid structure 2 has a polarization function, allowing most visible light to pass through while reflecting almost all near-infrared light, ensuring that only about half of the sunlight enters the interior, thus reducing sunlight backflow.
[0030] The present invention has been described above with reference to the accompanying drawings. Obviously, the specific implementation of the present invention is not limited to the above-described manner. Any improvements made using the inventive concept and technical solution of the present invention, or the direct application of the inventive concept and technical solution to other situations without modification, are all within the protection scope of the present invention.
Claims
1. A dust cover for reducing sunlight backflow into an image generation unit, characterized in that: It includes a glass substrate (1), a wire grid structure (2), and an explosion-proof film (3). Multiple wire grid structures (2) protruding from the surface of the glass substrate (1) are provided on one side of the glass substrate (1), and adjacent wire grid structures (2) are arranged with gaps. The explosion-proof film (3) is adhered to the other side of the glass substrate (1).
2. The dust cover for reducing sunlight backflow in the image generation unit according to claim 1, characterized in that: The wire grid structure (2) is made of aluminum.
3. The dust cover for reducing sunlight backflow in the image generation unit according to claim 1 or 2, characterized in that: The height A of the wire grid structure (2) is in the range of 100nm-400nm.
4. The dust cover for reducing sunlight backflow in the image generation unit according to claim 3, characterized in that: The width B of the wire grid structure (2) is in the range of 50-200 nm.
5. The dust cover for reducing sunlight backflow in the image generation unit according to claim 4, characterized in that: The spacing C of the wire grid structure (2) is in the range of 100-400nm.
6. The dust cover for reducing sunlight backflow in the image generation unit according to claim 1 or 2, characterized in that: The wire grid structure (2) is perpendicular to the surface of the glass substrate (1).
7. The dust cover for reducing sunlight backflow in the image generation unit according to claim 1 or 2, characterized in that: The explosion-proof film (3) is placed on the side where sunlight (4) enters.
8. The dust cover for reducing sunlight backflow in the image generation unit according to claim 1 or 2, characterized in that: The wire grid structure (2) is a microstructure prepared by nanoimprinting and ion etching process on the surface of the glass substrate (1) through a filter layer.
9. The dust cover for reducing sunlight backflow in the image generation unit according to claim 1 or 2, characterized in that: The explosion-proof film (3) is a polyethylene terephthalate (PET) film, a polyurethane film, or a polycarbonate film.