Dedusting mechanism for monocrystalline silicon wafer processing

By using a mobile dust removal mechanism and a pneumatic telescopic mechanism, the problem of limited adsorption range of the fixed dust suction head is solved, achieving efficient dust cleaning and improving the product quality of monocrystalline silicon wafers and the safety of the production environment.

CN224253716UActive Publication Date: 2026-05-19SHANDONG KEXIN ELECTRONICS
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
SHANDONG KEXIN ELECTRONICS
Filing Date
2025-06-17
Publication Date
2026-05-19

AI Technical Summary

Technical Problem

The fixed suction head in the existing technology has a limited adsorption range and cannot be flexibly adjusted, resulting in low dust cleaning efficiency during the processing of monocrystalline silicon wafers, which affects product quality and the production environment.

Method used

A movable dust removal mechanism is adopted, combined with a servo motor-driven chain transmission system and a pneumatic telescopic mechanism, to realize the movement and angle adjustment of the dust removal hood, expand the adsorption range, and create negative pressure to adsorb dust through a fan.

Benefits of technology

It significantly improves dust adsorption efficiency, reduces silicon wafer surface contamination, enhances product quality and yield, improves the production environment, and reduces equipment damage and employee health risks.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model discloses a dust removal mechanism for monocrystalline silicon wafer processing, which comprises a protection box, an L-shaped fixing frame is fixed at the upper end of the protection box, an air draft mechanism is mounted at the upper end of the L-shaped fixing frame, two rotating rods are rotatably connected to one side of the L-shaped fixing frame, a fixing pipe is fixed between the two rotating rods, and the fixing pipe is connected with the L-shaped fixing frame. A plurality of dust suction hoods are connected to the lower end of the fixing pipe at equal intervals, one end of the air draft mechanism is connected to the fixing pipe, and a pneumatic telescopic mechanism is connected to one side of the L-shaped fixing frame. According to the utility model, the coverage range of the dust hood is greatly increased, dust in a larger area can be effectively adsorbed, the problem that the adsorption range of a fixed dust collection head is limited is avoided, the dust collection efficiency is remarkably improved, the pollution of dust to the surface of a silicon wafer is reduced, and the probability of flaws of the silicon wafer is reduced; the product quality and the yield of the monocrystalline silicon wafer can be improved, the adaptability is very high, and the requirements of different production scenes can be met.
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Description

Technical Field

[0001] This utility model relates to the field of monocrystalline silicon wafer processing technology, and in particular to a dust removal mechanism for monocrystalline silicon wafer processing. Background Technology

[0002] During the processing of monocrystalline silicon wafers, various steps such as cutting, grinding, and polishing inevitably generate a large amount of dust. If this dust is not removed promptly and effectively, it can lead to a series of serious problems. From a product quality perspective, dust particles may adhere to the surface of the monocrystalline silicon wafers, causing defects, affecting their electrical and optical properties, and reducing product yield. Regarding the production environment, a large amount of dust permeating the workshop air not only affects visibility but also damages production equipment, shortening its lifespan and increasing maintenance costs. Furthermore, the health of operators exposed to dusty environments for extended periods is threatened, potentially leading to occupational diseases such as respiratory illnesses.

[0003] Currently, most companies use fixed dust collection heads for dust removal. This method has significant limitations. Because the dust collection head is fixed in position, its adsorption range is very limited, only able to adsorb dust in specific areas, while areas far from the dust collection head remain unattended. Furthermore, fixed dust collection heads cannot be flexibly adjusted according to dust distribution and concentration changes, resulting in low dust collection efficiency and failing to meet the demands of large-scale, high-efficiency monocrystalline silicon wafer production. Therefore, we propose a dust removal mechanism for monocrystalline silicon wafer processing to address these issues. Utility Model Content

[0004] The purpose of this invention is to address the shortcomings of existing technologies by proposing a dust removal mechanism for single-crystal silicon wafer processing.

[0005] To achieve the above objectives, the present invention adopts the following technical solution:

[0006] A dust removal mechanism for processing monocrystalline silicon wafers includes a protective box. An L-shaped fixing frame is fixed to the upper end of the protective box. A suction mechanism is installed on the upper end of the L-shaped fixing frame. Two rotating rods are rotatably connected to one side of the L-shaped fixing frame. A fixing tube is fixed between the two rotating rods. Multiple dust suction hoods are evenly spaced at the lower end of the fixing tube. One end of the suction mechanism is connected to the fixing tube. A pneumatic telescopic mechanism is connected to one side of the L-shaped fixing frame. One end of the pneumatic telescopic mechanism is connected to the rotating rods. Two connecting rods are rotatably sleeved between opposite side walls inside the protective box. A rotating device is provided inside the protective box and connected to the connecting rods. Rollers are fixed on both sides of the connecting rods.

[0007] Preferably, the exhaust mechanism includes a mounting bracket fixed to the upper end of an L-shaped fixed frame, an exhaust fan is mounted on the mounting bracket, a flexible hose is connected to the air inlet end of the exhaust fan, one end of the flexible hose is connected to the middle of the upper end of the fixed pipe, and a delivery pipe is connected to the air outlet end of the exhaust fan.

[0008] Preferably, the pneumatic telescopic mechanism includes two cylinders rotatably connected to one side of the L-shaped fixed frame, with the end of the piston rod of one cylinder on the same side rotatably connected to the lower end of a rotating rod on the same side, and the two cylinders are controlled by a synchronous control system.

[0009] Preferably, the rotating device includes a motor mounting base fixed inside a protective box, a servo motor is mounted on the motor mounting base, and sprockets are fixedly fitted on both the servo motor and the connecting rod, with the two sprockets connected by a chain.

[0010] Preferably, the lower end of the protective box is provided with guide rails on both sides, and two rollers on the same side are mounted on one guide rail on the same side.

[0011] Preferably, the L-shaped mounting bracket is fixed to the protective box with screws.

[0012] In this utility model, when dust removal is required:

[0013] 1. Equipment movement: When dust removal is required, the rotating equipment inside the protective box starts working. The servo motor starts and drives the sprocket on its shaft to rotate. The power is transmitted to the sprocket on the connecting rod through the chain, so that the connecting rod rotates. Since there are rollers fixed on both sides of the connecting rod, the rollers roll on the guide rail, driving the entire dust removal mechanism to move back and forth along the guide rail, so that the equipment can cover a larger working area.

[0014] 2. Dust adsorption: As the equipment moves, the exhaust mechanism starts to operate, and the exhaust fan installed on the mounting frame starts to create a negative pressure at the air inlet. Through the hose connected to the air inlet of the exhaust fan, the air in the fixed pipe is drawn out, so that a negative pressure is also created in the fixed pipe. Multiple dust collection hoods connected at equal intervals at the lower end of the fixed pipe begin to adsorb the surrounding dust and draw the dust-laden air into the fixed pipe.

[0015] 3. Adsorption range adjustment: In order to further expand the adsorption range, the pneumatic telescopic mechanism plays a role. Two cylinders rotatably connected on one side of the L-shaped fixed frame move synchronously under the control of the synchronous control system. The piston rod of the cylinder extends and retracts, pushing the rotating rod to rotate. Since the fixed tube is fixed between the two rotating rods, the rotation of the rotating rod will drive the fixed tube and the dust hood to rotate together, thereby adjusting the angle of the dust hood and expanding the adsorption range to effectively adsorb dust in different positions and directions.

[0016] 4. Dust conveying: The dust-laden air drawn into the fixed pipe enters the exhaust fan through the hose, and then is discharged from the exhaust fan's outlet through the conveying pipe to the designated collection device, completing the entire dust removal process.

[0017] This utility model has the following advantages:

[0018] 1. By rotating the equipment to make the dust removal mechanism move back and forth on the guide rail, and by adjusting the angle of the dust hood through the pneumatic telescopic mechanism, the coverage of the dust hood is greatly increased, which can effectively adsorb dust in a larger area, avoiding the problem of limited adsorption range of the fixed dust head, and significantly improving dust collection efficiency.

[0019] 2. Timely and effective removal of dust generated during the processing of monocrystalline silicon wafers reduces dust contamination on the wafer surface, lowers the probability of defects in the wafers, and helps improve the product quality and yield of monocrystalline silicon wafers;

[0020] 3. Reducing the dust content in the workshop air reduces the damage of dust to production equipment, extends the service life of equipment, reduces equipment maintenance costs, improves the working environment of operators, reduces their risk of occupational diseases, and protects the health of employees.

[0021] 4. The dust removal mechanism can flexibly adjust the movement path of the equipment and the angle of the dust hood according to the actual layout and dust distribution of the monocrystalline silicon wafer processing workshop. It has strong adaptability and can meet the needs of different production scenarios.

[0022] In summary, this invention significantly increases the coverage area of ​​the dust collection hood, enabling effective adsorption of dust over a larger area. It avoids the problem of limited adsorption range of fixed dust collection heads, significantly improves dust collection efficiency, reduces dust contamination of the silicon wafer surface, lowers the probability of defects in the silicon wafer, helps improve the product quality and yield of monocrystalline silicon wafers, and has strong adaptability to meet the needs of different production scenarios. Attached Figure Description

[0023] Figure 1 This is a structural diagram of the present invention;

[0024] Figure 2 This is a structural diagram of the internal structure of the protective box of this utility model;

[0025] Figure 3 This is a structural diagram of the L-shaped fixing frame of this utility model;

[0026] Figure 4 This is a structural diagram of the external structure of the protective box of this utility model.

[0027] In the diagram: 1 guide rail, 2 protective box, 3 L-shaped fixing bracket, 4 exhaust fan, 5 dust hood, 6 fixing pipe, 7 hose, 8 conveying pipe, 9 mounting bracket, 10 rotating rod, 11 cylinder, 12 roller, 13 connecting rod, 14 sprocket, 15 servo motor, 16 motor mounting base, 17 chain. Detailed Implementation

[0028] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present utility model. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments.

[0029] Reference Figure 1-4 A dust removal mechanism for processing monocrystalline silicon wafers includes a protective box 2, with an L-shaped fixing frame 3 fixed to the upper end of the protective box 2. The L-shaped fixing frame 3 is fixed to the upper end of the protective box 2 by screws, providing an installation platform for the exhaust mechanism and other related components.

[0030] The upper end of the L-shaped mounting bracket 3 is equipped with a ventilation mechanism. Two rotating rods 10 are rotatably connected to one side of the L-shaped mounting bracket 3. A fixing tube 6 is fixed between the two rotating rods 10. Multiple dust suction hoods 5 are connected at equal intervals at the lower end of the fixing tube 6. The dust suction hoods 5 adopt a horn structure. Their shape and distribution can effectively expand the adsorption range and draw dusty air into the fixing tube 6.

[0031] One end of the exhaust mechanism is connected to the fixed pipe 6. One side of the L-shaped fixed frame 3 is connected to a pneumatic telescopic mechanism. One end of the pneumatic telescopic mechanism is connected to the rotating rod 10. Two connecting rods 13 are rotatably sleeved between the opposite side walls inside the protective box 2. The protective box 2 is equipped with a rotating device, which is connected to the connecting rod 13. Rollers 12 are fixed on both sides of the connecting rod 13. The exhaust air is guided to the designated collection device through the conveying pipe 8. The collection device is equipped with a dust collection box and a filter. Its function is to separate dust from the air, realize the collection and treatment of dust, and ensure that the exhaust air meets environmental protection requirements.

[0032] The ventilation mechanism includes a mounting bracket 9 fixed to the upper end of the L-shaped fixed frame 3. An exhaust fan 4 is mounted on the mounting bracket 9. The air inlet end of the exhaust fan 4 is connected to a flexible hose 7. One end of the flexible hose 7 is connected to the upper middle part of the fixed pipe 6. The air outlet end of the exhaust fan 4 is connected to a delivery pipe 8. When the exhaust fan 4 is working, the air at the air inlet end is quickly drawn out, causing the air pressure in this area to be lower than the surrounding ambient air pressure, thus forming a negative pressure.

[0033] The pneumatic telescopic mechanism includes two cylinders 11 rotatably connected to one side of the L-shaped fixed frame 3. The end of the piston rod of one cylinder 11 on the same side is rotatably connected to the lower end of a rotating rod 10 on the same side. The two cylinders 11 are controlled by a synchronous control system. The synchronous control system ensures that the piston rods of the two cylinders 11 can extend and retract simultaneously, ensuring the smooth rotation of the rotating rod 10. By adjusting the angle of the dust suction hood 5, dust in different positions and directions can be effectively adsorbed, improving the efficiency and comprehensiveness of dust removal.

[0034] The rotating device includes a motor mounting base 16 fixed inside the protective box 2. A servo motor 15 is mounted on the motor mounting base 16. Sprockets 14 are fixedly mounted on both the servo motor 15 and the connecting rod 13. The two sprockets 14 are connected by a chain 17. The function of the servo motor 15, sprockets 14 and chain 17 is to drive the connecting rod 13 to rotate, thereby causing the roller 12 to roll on the guide rail 1, realizing the movement of the entire dust removal mechanism. The transmission system composed of sprockets 14 and chain 17 is a common and reliable mechanical transmission method, which can accurately transmit power from the servo motor 15 to the connecting rod 13.

[0035] The lower end of the protective box 2 is equipped with guide rails 1 on both sides. Two rollers 12 on the same side are installed on one guide rail 1 on the same side. The rollers 12 roll on the guide rail 1, and the entire dust removal mechanism moves back and forth along the guide rail 1, so that the equipment can cover a larger working area and ensure that the dust in the single crystal silicon wafer processing area is thoroughly cleaned.

[0036] The L-shaped mounting bracket 3 is fixed to the protective box 2 with screws, which facilitates installation, disassembly, and replacement.

[0037] In this utility model, when dust removal is required:

[0038] 1. Equipment movement: When dust removal is required, the rotating equipment in the protective box 2 starts to work. The servo motor 15 starts and drives the sprocket 14 on its shaft to rotate. The power is transmitted to the sprocket 14 on the connecting rod 13 through the chain 17, so that the connecting rod 13 rotates. Since there are rollers 12 fixed on both sides of the connecting rod 13, the rollers 12 roll on the guide rail 1, driving the entire dust removal mechanism to move back and forth along the guide rail 1, so that the equipment can cover a larger working area.

[0039] 2. Dust adsorption: As the equipment moves, the exhaust mechanism starts to operate. The exhaust fan 4 installed on the mounting frame 9 starts and creates a negative pressure at the air inlet. Through the hose 7 connected to the air inlet of the exhaust fan 4, the air in the fixed pipe 6 is drawn out, so that a negative pressure is also created in the fixed pipe 6. Multiple dust collection hoods 5 connected at equal intervals at the lower end of the fixed pipe 6 begin to adsorb the surrounding dust and draw the dust-laden air into the fixed pipe 6.

[0040] 3. Adsorption range adjustment: In order to further expand the adsorption range, the pneumatic telescopic mechanism plays a role. The two cylinders 11 connected to one side of the L-shaped fixed frame 3 move synchronously under the control of the synchronous control system. The piston rod of the cylinder 11 extends and retracts, pushing the rotating rod 10 to rotate. Since the fixed tube 6 is fixed between the two rotating rods 10, the rotation of the rotating rod 10 will drive the fixed tube 6 and the dust hood 5 to rotate together, thereby adjusting the angle of the dust hood 5, thus expanding the adsorption range and effectively adsorbing dust in different positions and directions.

[0041] 4. Dust conveying: The dust-laden air drawn into the fixed pipe 6 enters the exhaust fan 4 through the hose 7, and then is discharged from the exhaust end of the exhaust fan 4 through the conveying pipe 8 to the designated collection device, completing the entire dust removal process.

[0042] The above are merely preferred embodiments of this utility model, but the scope of protection of this utility model is not limited thereto. Any equivalent substitutions or modifications made by those skilled in the art within the scope of the technology disclosed in this utility model, based on the technical solution and inventive concept of this utility model, should be included within the scope of protection of this utility model.

Claims

1. A dust removal mechanism for processing single-crystal silicon wafers, comprising a protective box (2), characterized in that, The upper end of the protective box (2) is fixed with an L-shaped fixing frame (3). The upper end of the L-shaped fixing frame (3) is equipped with a ventilation mechanism. Two rotating rods (10) are rotatably connected to one side of the L-shaped fixing frame (3). A fixing tube (6) is fixed between the two rotating rods (10). Multiple dust collection hoods (5) are connected at equal intervals at the lower end of the fixing tube (6). One end of the ventilation mechanism is connected to the fixing tube (6). A pneumatic telescopic mechanism is connected to one side of the L-shaped fixing frame (3). One end of the pneumatic telescopic mechanism is connected to the rotating rod (10). Two connecting rods (13) are rotatably sleeved between the opposite side walls inside the protective box (2). A rotating device is provided inside the protective box (2). The rotating device is connected to the connecting rod (13). Rollers (12) are fixed on both sides of the connecting rod (13).

2. The dust removal mechanism for single-crystal silicon wafer processing according to claim 1, characterized in that: The exhaust mechanism includes a mounting bracket (9) fixed on the upper end of an L-shaped fixed frame (3), an exhaust fan (4) is mounted on the mounting bracket (9), the air inlet end of the exhaust fan (4) is connected to a hose (7), one end of the hose (7) is connected to the upper middle part of a fixed pipe (6), and the air outlet end of the exhaust fan (4) is connected to a delivery pipe (8).

3. The dust removal mechanism for single-crystal silicon wafer processing according to claim 1, characterized in that: The pneumatic telescopic mechanism includes two cylinders (11) rotatably connected to one side of the L-shaped fixed frame (3). The end of the piston rod of one cylinder (11) on the same side is rotatably connected to the lower end of a rotating rod (10) on the same side. The two cylinders (11) are controlled by a synchronous control system.

4. The dust removal mechanism for single-crystal silicon wafer processing according to claim 1, characterized in that: The rotating device includes a motor mounting base (16) fixed inside the protective box (2), a servo motor (15) is mounted on the motor mounting base (16), and sprockets (14) are fixedly mounted on both the servo motor (15) and the connecting rod (13), and the two sprockets (14) are connected by a chain (17).

5. The dust removal mechanism for single-crystal silicon wafer processing according to claim 1, characterized in that: The lower end of the protective box (2) is provided with guide rails (1) on both sides, and two rollers (12) on the same side are installed on one guide rail (1) on the same side.

6. The dust removal mechanism for single-crystal silicon wafer processing according to claim 1, characterized in that: The L-shaped bracket (3) is fixed to the protective box (2) by screws.