A mega-sound vibration plate protection system for an automatic silicon wafer cleaning machine.

Abstract

This application provides a megasonic oscillator protection system for an automatic silicon wafer cleaning machine, relating to the semiconductor manufacturing field. The system includes a cleaning tank; a water bath for mounting the megasonic oscillator, with the cleaning tank mounted above the water bath; a control module; a water inlet assembly connected to the water bath and electrically connected to the control module; a drainage assembly connected to the water bath and electrically connected to the control module; a water level measurement module for measuring the water level in the water bath and transmitting the value to the control module; and a pH measurement module for measuring the pH value of the liquid in the water bath and transmitting the value to the control module. The control module controls the operating states of the water inlet assembly and the drainage assembly based on the water level and / or pH value. This invention, by real-time monitoring of the pH and water level in the water bath, can detect or predict abnormalities in advance, enabling preventative maintenance and effectively avoiding damage to the megasonic oscillator caused by water bath abnormalities.

Description

Technical Field

[0001] This application relates to the field of semiconductor manufacturing, and more specifically, to a megohmmeter vibration plate protection system for an automatic silicon wafer cleaning machine. Background Technology

[0002] In the semiconductor component manufacturing process, megasonic assisted cleaning is widely used in tank-type automatic silicon wafer cleaning equipment. The megasonic vibrator plate is installed in the water bath, not in direct contact with the silicon wafer cleaning tank. During operation, it cleans the silicon wafers in the water bath through water conduction. A float switch detects the water level in the water bath. When the megasonic system starts, the water inlet valve opens to prevent insufficient water in the bath from affecting the cleaning effect and to prevent the vibrator plate from operating in a waterless environment for extended periods, which could lead to poor heat dissipation and dry burning. Typically, each automatic cleaning system is equipped with at least one to three megasonic units. One megasonic unit consists of a controller (containing two matching boxes) and a vibrator plate. The vibrator plate and matching boxes must be used in pairs; if the vibrator plate is damaged, the entire set, including both matching boxes, must be replaced. Because the vibrator plate is expensive and not a readily available spare part, it is generally not stocked. Therefore, if it is damaged, the resulting losses from spare parts depletion and production downtime can be substantial. In actual production applications, many complex usage scenarios and special situations will be encountered, and the protection of the equipment for the vibrating plate by the float switch and starting water injection is far from enough.

[0003] The inventors of this utility model discovered the following objective drawbacks of existing technology during long-term production: 1. The float switch lead wire must not come into contact with water or chemicals at any time, requiring high standards for installation and use environment, and is relatively prone to aging, resulting in low reliability. Once the switch fails, it will not provide protection. 2. The float switch is a mechanical switching output, which can only monitor a fixed water level and is not easy to observe, making it unsuitable for daily monitoring. 3. Leakage in the chemical cleaning tank, leakage at the interface, and droplets falling from the tank cover during opening and closing, as well as the process of the robotic arm retrieving silicon wafers from the chemical cleaning tank and moving them to other workstations, can all cause changes in the water quality in the water bath. It is impossible to guarantee that the pH value of the pure water in the water bath remains neutral. If exposed to strong acid or strong alkali environments for a long time, it will cause corrosion damage to the megohmonic vibrating plate and accelerate the aging and damage of the vibrating plate's sealing ring. Once liquid enters the internal structure of the vibrating plate, it may cause more serious electrical and other consequences. Based on the above objective problems existing in the prior art, the inventors of this utility model proposed this technical solution. Utility Model Content

[0004] To overcome the aforementioned shortcomings in the prior art, the purpose of this application is to provide a megasonic oscillator protection system for an automatic silicon wafer cleaning machine. This system, by real-time monitoring of the pH value and water level of the water bath, can detect or predict abnormalities in advance, enabling preventative maintenance and significantly improving the reliability of the megasonic oscillator. Furthermore, it provides indiscriminate protection even when no one is present or at night, effectively preventing damage to the megasonic oscillator caused by abnormalities in the water bath.

[0005] This utility model provides a megohmmeter vibration plate protection system for an automatic silicon wafer cleaning machine. The system, used to protect the megohmmeter vibration plate, includes:

[0006] A cleaning tank, the cleaning tank being used to clean silicon wafers;

[0007] A water bath tank is used to install the megohmmeter vibration plate, and a cleaning tank is installed above the water bath tank;

[0008] Control module;

[0009] A water inlet assembly is connected to the water bath and electrically connected to the control module. The control module is used to control the water inlet assembly to introduce water into the water bath.

[0010] A drainage assembly is connected to the water bath and electrically connected to the control module, the control module being used to control the drainage assembly to drain water from the water bath.

[0011] A water level measurement module is connected to the water bath and electrically connected to the control module, used to measure the water level value of the liquid in the water bath and transmit the water level value to the control module.

[0012] A pH value measuring module is connected to the water bath and electrically connected to the control module. It is used to measure the pH value of the liquid in the water bath and transmit the water level value to the control module.

[0013] The control module is also used to control the working state of the water inlet component and the working state of the drainage component according to the water level value and / or the pH value.

[0014] Furthermore, in an optional embodiment of this utility model, the pH measurement module includes an immersion sensing electrode and a transmitter electrically connected to each other. The immersion sensing electrode extends into the liquid in the water bath and is used to measure the pH value of the liquid in the water bath. The transmitter is electrically connected to the control module and is used to transmit the pH value to the control module.

[0015] Furthermore, in an optional embodiment of this utility model, the water level measurement module includes an air inlet pipe, a flow rate control valve, a detection pipe, and a digital differential pressure sensor. The air inlet pipe is connected to the flow rate control valve, and the exhaust port of the air inlet pipe extends into the liquid in the water bath. One end of the detection pipe is connected between the exhaust port of the air inlet pipe and the flow rate control valve, and the other end is connected to the digital differential pressure sensor. The digital differential pressure sensor is connected to the control module.

[0016] Furthermore, in an optional embodiment of this utility model, the water level measuring module further includes an air inlet tee pipe, two of the ports of which are respectively connected to the flow rate control valve and the exhaust port of the air inlet pipe, and the third port is connected to the detection pipe.

[0017] Furthermore, in an optional embodiment of this utility model, the water inlet assembly includes a water inlet pipe and a water inlet valve. The water inlet pipe is connected to the water bath, and the water inlet valve is disposed on the water inlet pipe and electrically connected to the control module. The control module is used to control the working state of the water inlet valve (123).

[0018] Furthermore, in an optional embodiment of this utility model, the water inlet valve is a pneumatic valve with flow control and a bypass circuit.

[0019] Furthermore, in an optional embodiment of this utility model, the drainage component includes a drainage pipe and a drainage valve. The drainage pipe is connected to the water bath, and the drainage valve is disposed on the drainage pipe and electrically connected to the control module. The control module is used to control the working state of the drainage valve.

[0020] Furthermore, in an optional embodiment of this utility model, the drainage pipe includes a first pipe and a second pipe, both of which are connected to the water bath. The drainage valve includes a drainage pneumatic valve and a drainage regulating manual valve. The drainage pneumatic valve is disposed on the first pipe and electrically connected to the control module. The control module is used to control the working state of the drainage pneumatic valve, and the drainage regulating manual valve is disposed on the second pipe.

[0021] Furthermore, in an optional embodiment of this utility model, the drainage pipe further includes a drainage tee, through which the first pipe and the second pipe are connected to the water bath tank.

[0022] Furthermore, in an optional embodiment of this utility model, the megohmmeter vibration plate protection system of the automatic silicon wafer cleaning machine further includes a mounting bracket, and the cleaning tank is mounted above the water bath tank via the mounting bracket.

[0023] Compared with the prior art, this application has the following beneficial effects: This utility model embodiment provides a megasonic oscillator plate protection system for an automatic silicon wafer cleaning machine, used to protect the megasonic oscillator plate. In this utility model embodiment, the water inlet component, the drainage component, the water level measuring module, and the pH value measuring module are all electrically connected to the control module. The control module can obtain the water level value in the water bath measured by the water level measuring module and the pH value in the water bath measured by the pH value measuring module to control the above-mentioned water inlet component and drainage component, so as to achieve protection of the megasonic oscillator plate. Attached Figure Description

[0024] To more clearly illustrate the technical solutions of the embodiments of this application, the accompanying drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of this application and should not be regarded as a limitation of the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0025] Figure 1 A schematic diagram of the mega-sound vibration plate protection system and the mega-sound vibration plate of the automatic silicon wafer cleaning machine provided in the embodiments of this application;

[0026] Figure 2 This is a schematic diagram of the structure of the mega-sound vibration plate protection system for the automatic silicon wafer cleaning machine provided in this application embodiment;

[0027] Figure 3 This is a schematic diagram of the structure of the water inlet assembly provided in an embodiment of this application;

[0028] Figure 4 This is a schematic diagram of the drainage assembly provided in an embodiment of this application;

[0029] Figure 5 This is a schematic diagram of the structure of the water level measurement module provided in the embodiments of this application;

[0030] Figure 6 This is a schematic diagram of the structure of the pH measurement module provided in the embodiments of this application.

[0031] Icons: 100, Automatic silicon wafer cleaning machine mega-sound vibration plate protection system; cleaning tank; 102, water bath; 103, mounting bracket; 110, control module; 120, water inlet assembly; 121, water inlet pipe; 123, water inlet valve; 130, drainage assembly; 131, drainage pipe; 1311, first pipe; 1312, second pipe; 1313, drainage tee; 133, drainage valve; 1331, drainage pneumatic valve; 1332, drainage regulating manual valve; 140, water level measurement module; 141, air inlet pipe; 142, flow rate control valve; 143, detection pipe; 144, digital differential pressure sensor; 145, air inlet tee; 150, pH measurement module; 151, submersible sensing electrode; 152, transmitter; 200, mega-sound vibration plate. Detailed Implementation

[0032] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. The components of the embodiments of this application described and shown in the accompanying drawings can generally be arranged and designed in various different configurations.

[0033] Therefore, the following detailed description of the embodiments of this application provided in the accompanying drawings is not intended to limit the scope of the claimed application, but merely to illustrate selected embodiments of the application. All other embodiments obtained by those skilled in the art based on the embodiments of this application without inventive effort are within the scope of protection of this application.

[0034] It should be noted that similar labels and letters in the following figures indicate similar items. Therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures.

[0035] In the description of this application, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, or the orientation or positional relationship commonly used when the utility model product is in use. They are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this application. In addition, the terms "first," "second," and "third," etc., are only used to distinguish descriptions and should not be construed as indicating or implying relative importance.

[0036] Furthermore, terms such as "horizontal," "vertical," and "sag" do not imply that components must be absolutely horizontal or suspended, but rather that they can be slightly tilted. For example, "horizontal" simply means that its direction is more horizontal relative to "vertical," and does not mean that the structure must be completely horizontal, but can be slightly tilted.

[0037] In the description of this application, it should also be noted that, unless otherwise expressly specified and limited, the terms "set up," "install," "connect," and "link" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this application based on the specific circumstances.

[0038] Please see Figure 1 and Figure 2 This utility model provides a megasonic oscillator protection system 100 for an automatic silicon wafer cleaning machine, used to protect the megasonic oscillator 200. This system 100 monitors the pH value and water level of the water bath 102 in real time, enabling early detection or prediction of abnormalities and allowing for preventative maintenance, significantly improving the reliability of the megasonic oscillator 200. Furthermore, it provides indiscriminate protection even when no one is present or at night, effectively preventing damage to the megasonic oscillator 200 caused by abnormalities in the water bath 102.

[0039] like Figure 1 and Figure 2As shown in this embodiment of the present invention, the megohmmeter vibration plate protection system 100 of the automatic silicon wafer cleaning machine includes: a cleaning tank 101 for cleaning silicon wafers; a water bath 102 for mounting the megohmmeter vibration plate 200, with the cleaning tank 101 mounted above the water bath 102; a control module 110; a water inlet assembly 120 connected to the water bath 102 and electrically connected to the control module 110, the control module 110 controlling the water inlet assembly 120 to introduce water into the water bath 102; and a drainage assembly 130 connected to the water bath 102 and electrically connected to the control module 110, the control module 110 controlling the drainage... A water component 130 is used to drain water from the water bath 102; a water level measuring module 140 is connected to the water bath 102 and electrically connected to the control module 110, used to measure the water level value of the liquid in the water bath 102 and transmit the water level value to the control module 110; a pH value measuring module 150 is connected to the water bath 102 and electrically connected to the control module 110, used to measure the pH value of the liquid in the water bath 102 and transmit the water level value to the control module 110; the control module 110 is also used to control the working state of the water inlet component 120 and the working state of the drain component 130 according to the water level value and / or pH value.

[0040] It should be noted that in this embodiment of the present invention, the water inlet component 120, the drainage component 130, the water level measuring module 140, and the pH value measuring module 150 are all electrically connected to the control module 110. The control module 110 can obtain the water level value in the water bath 102 measured by the water level measuring module 140 and the pH value in the water bath 102 measured by the pH value measuring module 150 to control the water inlet component 120 and the drainage component 130 to achieve protection of the megasonite oscillator 200.

[0041] The following is an example illustrating the working state of the megohmmeter vibration plate protection system 100 of the automatic silicon wafer cleaning machine provided in this embodiment of the present invention. It should be understood that the following description should not be construed as a limitation of the present invention.

[0042] When the equipment enters the silicon wafer cleaning stage, the cleaning tank 101 begins cleaning, and the water inlet assembly 120 opens to fill the water bath 102 with water. Simultaneously, the water level measurement module 140 monitors the water level in the water bath 102 in real time. If the water level is sufficient, the megasonic oscillator 200 starts; if the water level is insufficient, an alarm is triggered, and the megasonic oscillator 200 does not start. The megasonic oscillator's startup and operation are always interlocked with the water level; it stops immediately if the water level is insufficient. When the chip cleaning is complete, the water inlet assembly 120 and the megasonic oscillator 200 shut down.

[0043] When the pH value of the water bath 102 is abnormal, the pH value of the water bath 102 is transmitted to the control module in real time through the pH value measurement module 150. When the actual pH value is greater than the set value, an alarm is output. At the same time, the pH value of the water bath 102 is kept in a neutral state by controlling the water inlet component 120 and the water outlet component.

[0044] When the water level in the water bath 102 is abnormal, and the water level in the water bath 102 is lower than the preset water level, the control module controls the water inlet component 120 to open automatically and inject water into the water bath 102 until the highest water level is reached, and then controls the water inlet component 120 to stop injecting water into the water bath 102.

[0045] Additionally, it should be noted that the control module can also store historical water level data for the water bath 102, allowing for comparison of real-time water level data with historical data. Optionally, the control module can be a PLC (Programmable Logic Controller).

[0046] like Figure 6 As shown, in this embodiment, the pH measurement module 150 includes an immersion sensing electrode 151 and a transmitter 152 that are electrically connected to each other. The immersion sensing electrode 151 extends into the liquid in the water bath 102 and is used to measure the pH value of the liquid in the water bath 102. The transmitter 152 is electrically connected to the control module 110 and is used to transmit the pH value to the control module 110.

[0047] It should be noted that, in the embodiment, the pH value signal of the water in the water bath 102 is transmitted to the transmitter 152 through the submersible sensing electrode 151, and real-time monitoring and logic control can be achieved through communication with the control module via digital signals, analog signals and digital signals.

[0048] like Figure 5 As shown, in this embodiment, the water level measurement module 140 includes an air inlet pipe 141, a flow rate control valve 142, a detection pipe 143, and a digital differential pressure sensor 144. The air inlet pipe 141 is connected to the flow rate control valve 142, and the exhaust port of the air inlet pipe 141 extends into the liquid in the water bath 102. One end of the detection pipe 143 is connected between the exhaust port of the air inlet pipe 141 and the flow rate control valve 142, and the other end is connected to the digital differential pressure sensor. The digital differential pressure sensor is connected to the control module 110.

[0049] It should be noted that the air inlet pipe 141 is used to introduce gas, such as high-purity nitrogen. The flow rate control valve 142 can control the flow rate within the air inlet pipe 141. The detection pipe 143 is designed to allow gas to be introduced into the water bath 102 and the digital differential pressure sensor 144 respectively, thereby achieving water level measurement. The digital differential pressure sensor 144 can be a device with analog output, two-way switch output, and a digital display screen. It identifies pressure changes in the high-purity nitrogen pipeline inserted into the water bath 102 and displays the pressure value in real time on the digital display screen. The analog pressure output value can be converted into water level height by communicating with the control module. For example, no water level corresponds to 0.05 kPa and 0 mm, 1 / 3 water level corresponds to 0.1 kPa and 30 mm, 2 / 3 water level corresponds to 0.15 kPa and 60 mm, and full water level corresponds to 0.2 kPa and 90 mm.

[0050] Optionally, the water level measuring module 140 also includes an air inlet tee pipe 145, two of which are connected to the flow rate control valve 142 and the exhaust port of the air inlet pipe 141, respectively, and the third port is connected to the detection pipe 143.

[0051] like Figure 3 As shown, in this embodiment, the water inlet assembly 120 includes a water inlet pipe 121 and a water inlet valve 123. The water inlet pipe 121 is connected to the water bath 102. The water inlet valve 123 is disposed on the water inlet pipe 121 and electrically connected to the control module 110. The control module 110 is used to control the working state of the water inlet valve (123).

[0052] Optionally, in this embodiment, the inlet valve 123 can be a pneumatic valve with flow control and a bypass circuit. This pneumatic valve regulates the water flow through the bypass circuit, allowing a small flow of pure water to pass through even when the pneumatic valve is closed. This function enables real-time replacement of pure water in the water bath 102, thereby ensuring the pH value of the pure water in the water bath 102.

[0053] like Figure 4 As shown, in this embodiment, the drainage component 130 includes a drainage pipe 131 and a drainage valve 133. The drainage pipe 131 is connected to the water bath 102, and the drainage valve 133 is disposed on the drainage pipe 131 and electrically connected to the control module 110. The control module 110 is used to control the working state of the drainage valve 133. Optionally, in this embodiment, the drainage pipe 131 includes a first pipe 1311 and a second pipe 1312, both of which are connected to the water bath 102. The drainage valve 133 includes a drainage pneumatic valve 1331 and a drainage regulating manual valve 1332. The drainage pneumatic valve 1331 is disposed on the first pipe 1311 and electrically connected to the control module 110. The control module 110 is used to control the working state of the drainage pneumatic valve 1331, and the drainage regulating manual valve 1332 is disposed on the second pipe 1312.

[0054] It should be noted that the drain regulating hand valve 1332 and the inlet valve 123 are designed as pneumatic valves with flow control and bypass circuit. In the standby process, the inlet component 120 can be closed. The inlet valve 123 is a pneumatic valve with flow control and bypass circuit. It can continuously inject a small flow of water into the water bath 102 through the flow control and bypass circuit function. The drain regulating hand valve 1332 can adjust the drainage of the water bath 102 to achieve dynamic balance between water inlet and drainage.

[0055] Furthermore, in an optional embodiment of this utility model, the drainage pipe 131 further includes a drainage tee pipe 1313, and the first pipe 1311 and the second pipe 1312 are connected to the water bath tank 102 through the drainage tee pipe 1313.

[0056] In this embodiment, the above-mentioned megohmmeter vibration plate protection system 100 for the automatic silicon wafer cleaning machine further includes a mounting bracket 103, and the cleaning tank 101 is mounted above the water bath tank 102 via the mounting bracket 103. The mounting bracket 103 enables convenient installation of the cleaning tank 101.

[0057] Please refer to the following: Figures 1 to 6 This utility model provides a megasonic oscillator plate protection system 100 for an automatic silicon wafer cleaning machine, used to protect the megasonic oscillator plate 200. In this utility model embodiment, the water inlet assembly 120, the drainage assembly 130, the water level measuring module 140, and the pH value measuring module 150 are all electrically connected to the control module 110. The control module 110 can obtain the water level value in the water bath 102 measured by the water level measuring module 140 and the pH value in the water bath 102 measured by the pH value measuring module 150 to control the water inlet assembly 120 and the drainage assembly 130 to achieve protection of the megasonic oscillator plate 200.

[0058] It should be noted that, in this document, relational terms such as "first" and "second" are used only to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes said element.

[0059] The above descriptions are merely various embodiments of this application, but the scope of protection of this application is not limited thereto. Any variations or substitutions that can be easily conceived by those skilled in the art within the technical scope disclosed in this application should be included within the scope of protection of this application. Therefore, the scope of protection of this application should be determined by the scope of the claims.

Claims

1. A tank type automatic silicon wafer cleaning machine megasonic vibration plate protection system for protecting a megasonic vibration plate (200), characterized in that, The mega-sound vibration plate protection system (100) of the automatic silicon wafer cleaning machine includes: A cleaning tank (101) is used for cleaning silicon wafers; A water bath (102) is provided for mounting the megason oscillator plate (200), and a cleaning tank (101) is installed above the water bath (102). Control module (110); A water inlet assembly (120) is connected to the water bath (102) and electrically connected to the control module (110). The control module (110) is used to control the water inlet assembly (120) to introduce water into the water bath (102). A drainage assembly (130) is connected to the water bath (102) and electrically connected to the control module (110), the control module (110) being used to control the drainage assembly (130) to drain water from the water bath (102). A water level measuring module (140) is connected to the water bath (102) and electrically connected to the control module (110) for measuring the water level value of the liquid in the water bath (102) and transmitting the water level value to the control module (110). pH value measuring module (150), the pH value measuring module (150) is connected to the water bath (102) and electrically connected to the control module (110), used to measure the pH value of the liquid in the water bath (102) and transmit the water level value to the control module (110). The control module (110) is also used to control the working state of the water inlet assembly (120) and the working state of the drainage assembly (130) according to the water level value and / or the pH value.

2. The mega-sound vibration plate protection system for the automatic silicon wafer cleaning machine according to claim 1, characterized in that, The pH measurement module (150) includes an immersion sensing electrode (151) and a transmitter (152) that are electrically connected to each other. The immersion sensing electrode (151) extends into the liquid in the water bath (102) and is used to measure the pH value of the liquid in the water bath (102). The transmitter (152) is electrically connected to the control module (110) and is used to transmit the pH value to the control module (110).

3. The mega-sound vibration plate protection system for the automatic silicon wafer cleaning machine according to claim 1, characterized in that, The water level measurement module (140) includes an air inlet pipe (141), a flow rate control valve (142), a detection pipe (143), and a digital differential pressure sensor (144). The air inlet pipe (141) is connected to the flow rate control valve (142). The exhaust port of the air inlet pipe (141) extends into the liquid in the water bath (102). One end of the detection pipe (143) is connected between the exhaust port of the air inlet pipe (141) and the flow rate control valve (142), and the other end is connected to the digital differential pressure sensor. The digital differential pressure sensor is connected to the control module (110).

4. The mega-sound vibration plate protection system for the automatic silicon wafer cleaning machine according to claim 3, characterized in that, The water level measurement module (140) also includes an air inlet tee pipe (145), two of which are connected to the flow rate control valve (142) and the exhaust port of the air inlet pipe (141), respectively, and the third port is connected to the detection pipe (143).

5. The megahertz vibration plate protection system for the automatic silicon wafer cleaning machine according to claim 1, characterized in that, The water inlet assembly (120) includes a water inlet pipe (121) and a water inlet valve (123). The water inlet pipe (121) is connected to the water bath (102). The water inlet valve (123) is located on the water inlet pipe (121) and electrically connected to the control module (110). The control module (110) is used to control the working state of the water inlet valve (123).

6. The megahertz vibration plate protection system for the automatic silicon wafer cleaning machine according to claim 5, characterized in that, The inlet valve (123) is a pneumatic valve with flow control and bypass circuit.

7. The megahertz vibration plate protection system for the automatic silicon wafer cleaning machine according to claim 1, characterized in that, The drainage assembly (130) includes a drainage pipe (131) and a drain valve (133). The drainage pipe (131) is connected to the water bath (102). The drain valve (133) is disposed on the drainage pipe (131) and electrically connected to the control module (110). The control module (110) is used to control the working state of the drain valve (133).

8. The megahertz vibration plate protection system for the automatic silicon wafer cleaning machine according to claim 7, characterized in that, The drainage pipe (131) includes a first pipe (1311) and a second pipe (1312), both of which are connected to the water bath (102). The drainage valve (133) includes a drainage pneumatic valve (1331) and a drainage regulating manual valve (1332). The drainage pneumatic valve (1331) is located on the first pipe (1311) and electrically connected to the control module (110). The control module (110) is used to control the working state of the drainage pneumatic valve (1331), and the drainage regulating manual valve (1332) is located on the second pipe (1312).

9. The megahertz vibration plate protection system for the automatic silicon wafer cleaning machine according to claim 8, characterized in that, The drainage pipe (131) also includes a drainage tee (1313), through which the first pipe (1311) and the second pipe (1312) are connected to the water bath (102).

10. The megahertz vibration plate protection system for a trough-type automatic silicon wafer cleaning machine according to any one of claims 1-9, characterized in that, The megohmmeter vibration plate protection system (100) of the automatic silicon wafer cleaning machine also includes a mounting bracket (103), and the cleaning tank (101) is mounted above the water bath tank (102) via the mounting bracket (103).

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