Device for enhancing the uniformity and deposition rate of magnetron sputtered thin films on curved parts

Abstract

This utility model discloses a device for enhancing the uniformity and deposition rate of magnetron sputtered thin films on curved parts. The device includes a fixed rod, a disk permanent magnet, mounting posts, and a housing. The disk permanent magnet is mounted on the fixed rod, and adjacent disk permanent magnets are spaced apart by mounting posts. The disk permanent magnet is completely encased in the housing. The magnetic poles of adjacent disk permanent magnets are the same on their relative circular surfaces. During the coating process, an additional magnetic field can be provided on the substrate surface, enhancing the constraint of discharge particles on the substrate surface, thereby solving the problem of low plasma density and uneven distribution near the concave curved surface.

Description

Technical Field

[0001] This invention belongs to the field of ion plating technology, specifically relating to a device for enhancing the uniformity and deposition rate of magnetron sputtered thin film layers on arc-shaped parts. Background Technology

[0002] Vacuum ion plating is an advanced surface treatment technology that deposits target materials onto a substrate using chemical or physical methods in a high-vacuum environment to obtain thin films with specific functions. This technology offers advantages such as dense film layers, strong adhesion, and a wide range of plating materials, and is widely used in various fields including optical devices, aerospace, electronic components, and medical devices, playing a significant role in extending product lifespan and improving performance.

[0003] Magnetron sputtering, a type of vacuum ion plating technology, improves sputtering efficiency by confining electron trajectories and increasing plasma density through a magnetic field on the back of the target. The magnetic field distribution in magnetron sputtering directly affects the spatial distribution of the plasma. However, magnetron sputtering still faces the challenge of simultaneously achieving high deposition rate and uniform film coverage. First, traditional planar target magnetic field designs often result in higher plasma density in the central region of the target and lower density at the edges, leading to uneven film thickness distribution. Second, increasing the deposition rate typically requires increasing sputtering power or decreasing the working gas pressure. This further exacerbates the uneven plasma distribution and broadens the energy distribution of sputtered atoms, further intensifying the film thickness inhomogeneity. For complex-shaped parts, such as those with obstructed inner curved surfaces, the uniformity problem of coating on the curved surface is particularly prominent. The target-substrate spacing varies significantly at different locations on a deep inner curved surface, leading to uneven plasma distribution and affecting both film thickness uniformity and deposition rate. Furthermore, the presence of blind zones on the obstructed inner curved surface can easily generate shadowing effects, further exacerbating the film inhomogeneity problem. Utility Model Content

[0004] To overcome the aforementioned shortcomings, the inventors of this utility model, through long-term exploration, experimentation, and continuous reform and innovation, have proposed a device to enhance the uniformity and deposition rate of magnetron sputtering thin films on curved parts. This device can provide an additional magnetic field on the substrate surface during the coating process, enhancing the constraint of discharge particles on the substrate surface, thereby solving the problem of low plasma density and uneven distribution near the concave curved surface.

[0005] To achieve the above objectives, the technical solution adopted by this utility model is as follows: a device for enhancing the uniformity and deposition rate of magnetron sputtering thin films on arc-shaped parts, comprising a fixed rod, a disk permanent magnet, a mounting column, and a housing. The disk permanent magnet is mounted on the fixed rod, and adjacent disk permanent magnets are spaced apart by the mounting column. The disk permanent magnet is completely covered by a housing, and the magnetic poles of adjacent disk permanent magnets on their respective circular surfaces are the same or opposite.

[0006] A further preferred embodiment of the device for enhancing the uniformity and deposition rate of magnetron sputtered thin films on arc-shaped parts according to the present invention is as follows: the disk permanent magnet is provided with a through hole along the center line, the diameter of the through hole corresponds to the outer diameter of the fixing rod and is fitted onto the fixing rod.

[0007] A further preferred embodiment of the device for enhancing the uniformity and deposition rate of magnetron sputtered thin films on arc-shaped parts according to the present invention is as follows: the mounting post is made of polytetrafluoroethylene or ceramic material, and a through hole is provided along the center line. The diameter of the through hole corresponds to the outer diameter of the fixing rod and is fitted onto the fixing rod.

[0008] A device for enhancing the uniformity and deposition rate of magnetron sputtered thin film on curved parts, according to the present invention, further preferred technical solution is: the outer shell is a hollow cylinder with holes at the center of two end faces, and the two ends of the fixing rod extend beyond the outer shell.

[0009] A further preferred embodiment of the apparatus for enhancing the uniformity and deposition rate of magnetron sputtered thin films on arc-shaped parts according to the present invention is that the inner diameter of the outer shell is larger than the outer diameter of the disk permanent magnet and the mounting post.

[0010] A further preferred embodiment of the apparatus for enhancing the uniformity and deposition rate of magnetron sputtered thin films on arc-shaped parts according to the present invention is: the disk permanent magnets are placed at equal intervals inside the outer shell.

[0011] A further preferred embodiment of the device for enhancing the uniformity and deposition rate of magnetron sputtered thin films on arc-shaped parts according to the present invention is that the fixing rod and the outer shell are made of non-magnetic or weakly magnetic materials.

[0012] A further preferred embodiment of the apparatus for enhancing the uniformity and deposition rate of magnetron sputtering thin films on arc-shaped parts according to the present invention is that the apparatus is mounted on the front of a concave arc surface and provides an additional magnetic field to the concave arc surface when used for film deposition.

[0013] Compared with the prior art, the technical solution of this utility model has the following advantages / benefits:

[0014] 1. The device for enhancing the magnetic field on the surface of a concave arc-shaped substrate provided by this utility model can provide a magnetic field perpendicular to the direction of electron movement on the substrate surface during the coating process, thereby enhancing the constraint of the substrate surface on the discharge particles and solving the problem of low plasma density and uneven distribution near the concave arc surface.

[0015] 2. The device provided by this utility model is simple to assemble and can flexibly change its size and mounting position. The magnetic field can be changed by increasing or decreasing the number of disc permanent magnets or changing the arrangement, thereby enhancing the magnetic field on the surface of the coating area. It is convenient to use and can be reused. Attached Figure Description

[0016] To more clearly illustrate the technical solutions of the embodiments of this utility model, the drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of this utility model and should not be regarded as a limitation of the scope. For those skilled in the art, other related drawings can be obtained from these drawings without creative effort.

[0017] Figure 1 This is a schematic diagram of the device for enhancing the uniformity and deposition rate of magnetron sputtered thin films on curved parts according to this invention.

[0018] Figure 2 This is a schematic diagram of the magnetic pole installation of the device for enhancing the uniformity and deposition rate of magnetron sputtered thin films on curved parts according to this invention.

[0019] Figure 3 This is a schematic diagram of the device for enhancing the uniformity and deposition rate of magnetron sputtering thin films on curved parts according to this invention.

[0020] Figure 4 This is a schematic diagram of the magnetic field of the device for enhancing the uniformity and deposition rate of magnetron sputtered thin films on curved parts according to this invention.

[0021] Figure 5 This is a schematic diagram of the part to be coated, which is part of the device for enhancing the uniformity and deposition rate of magnetron sputtering thin film on curved parts according to this invention.

[0022] The markings in the diagram are as follows: 1. Fixed rod 2. Disk permanent magnet 3. Mounting column 4. Outer shell 5. Part to be processed 6. Curved edge 7. Handle center 8. Part center 9. Edge center. Detailed Implementation

[0023] To make the objectives, technical solutions, and advantages of this utility model clearer, the technical solutions in the embodiments of this utility model are described clearly and completely below. Obviously, the described embodiments are only a part of the embodiments of this utility model, not all of them. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this utility model. Therefore, the detailed description of the embodiments of this utility model provided below is not intended to limit the scope of the claimed utility model, but merely represents selected embodiments of this utility model.

[0024] It should be noted that similar labels and letters in the following figures indicate similar items. Therefore, once an item is defined in one figure, it need not be further defined and explained in subsequent figures.

[0025] Example 1:

[0026] like Figures 1-2 As shown, an apparatus for enhancing the uniformity and deposition rate of magnetron sputtered thin films on curved parts includes a fixed rod, a circular permanent magnet, mounting posts, and a housing. The circular permanent magnets are mounted on the fixed rod, and adjacent circular permanent magnets are spaced apart by mounting posts. The housing completely encloses the circular permanent magnets, and adjacent circular permanent magnets have the same magnetic poles on their respective circular surfaces, meaning they are installed with mutual repulsion. During the coating process, an additional magnetic field can be provided on the substrate surface. The confinement of discharge particles is enhanced at positions where the magnetic field direction is perpendicular to the electron motion direction, thus solving the problem of low plasma density and uneven distribution near the concave curved surface. The number of circular permanent magnets is not limited, but an odd number is generally used for ease of installation. To enhance the magnetic field, they are usually grouped in sets of three or more, with the number of circular permanent magnets increased according to the actual required magnetic field strength.

[0027] The disk permanent magnet has a through hole along its center line. The diameter of the through hole corresponds to the outer diameter of the fixing rod and is fitted onto the fixing rod. The through hole is mainly used for installation, ensuring that it is installed in place. The fixing rod is made of non-magnetic or weakly magnetic material. If necessary, the fixing rod can also be replaced with other materials that meet the requirements. Its main function is installation.

[0028] The mounting post is made of polytetrafluoroethylene (PTFE) or ceramic and has a through hole along its center line. The material must be one that does not affect the magnetic field; other suitable materials can also be used. The diameter of the through hole corresponds to the outer diameter of the fixing rod and is fitted onto the fixing rod. This is just one installation method for the mounting post; other suitable methods are also possible. The material of the mounting post can be adjusted according to the actual usage environment and is not limited to the specific material mentioned, as long as it can withstand higher temperatures and does not affect the magnetic field. Similarly, the mounting posts do not necessarily have to be through-mounted; they can also be distributed around the fixing rod, and their number is not limited.

[0029] The outer diameter of the mounting post is equal to the outer diameter of the disk permanent magnet. Of course, this is only for the convenience of installation, so the outer diameters are not necessarily equal. In fact, the mounting post only serves as a spacer and its form is not restricted. Therefore, it can be set as an additional pad directly between the two disk permanent magnets instead of a disk shape.

[0030] The height of the mounting column is mainly used to adjust the spacing between the permanent magnets, thereby adjusting the magnetic field. Therefore, its actual spacing is not limited; it only needs to serve as an installation interval. The actual impact on the magnetic field can be set according to the actual situation.

[0031] The outer shell is a hollow cylinder with holes at the center of both ends. The two ends of the fixing rod extend beyond the outer shell, and the outer shell completely covers the mounting column and the disk permanent magnet. The fixing rod can be used for hoisting or installing the entire device.

[0032] The inner diameter of the outer shell is larger than the outer diameter of the disk permanent magnet and the mounting post, meaning there is a gap between the outer shell and the disk permanent magnet to avoid direct contact.

[0033] The disk-shaped permanent magnets are placed at equal intervals inside the metal shell. This equal spacing helps to control the magnetic field and makes the magnetic field more uniform.

[0034] The fixing rod and the outer shell are made of non-magnetic or weakly magnetic metals to avoid affecting the magnetic field of the disk permanent magnet and to prevent them from being magnetized, such as stainless steel or ceramic materials.

[0035] like Figure 3 As shown, the device, when mounted on a concave arc surface for coating purposes, provides an additional magnetic field to the concave arc surface, such as... Figure 4As shown, to enhance the plasma density near the arc surface, thereby improving the uniformity and deposition rate of the thin film, the device must be installed in accordance with the arc surface, that is, along the direction of the center line of the arc surface. The center line of the device must be parallel to or coincide with the center line of the arc surface, and the required distance must be met. During installation, the distance between the device and all parts of the arc surface should be kept as consistent as possible to make the magnetic field as uniform as possible. For relatively regular arc surfaces, the device is installed in a symmetrical layout.

[0036] Table 1. Film thickness at different locations on the inner curved surface with handle

[0037]

[0038] like Figure 5 As shown, the film thickness at several locations—the corner of the curved surface (6), the middle of the handle (7), the center of the part (8), and the middle of the edge (9)—was measured on an inner curved surface with a handle. Table 1 shows the film thickness at different locations on the part before and after mounting the device for enhancing the uniformity and deposition rate of magnetron sputtered thin films on curved parts according to this invention. The film thickness at the edge of the curved surface, the middle of the handle, and the middle of the edge is significantly lower than that at the center of the part. After mounting the device, the film thickness in each region increases and becomes more uniform, indicating that the device for enhancing the uniformity and deposition rate of magnetron sputtered thin films on curved parts proposed in this invention significantly improves the uniformity and deposition rate of the thin film.

[0039] Example 2:

[0040] Based on Example 1, three disk permanent magnets are used, including a fixing rod, a housing, three disk permanent magnets with through holes in the center, and two polytetrafluoroethylene (PTFE) cylinders with through holes in the center. The disk permanent magnets are placed inside the metal tube, and the permanent magnets are separated by two PTFE cylinders. The magnetic poles of adjacent permanent magnets have the same direction on opposite circular surfaces. The fixing rod passes through the hole between the housing, the permanent magnets, and the PTFE cylinders, and the magnetic poles of adjacent surfaces of the built-in permanent magnets have the same direction.

[0041] This magnetic field enhancement device provides a magnetic field perpendicular to the direction of electron movement from the target material by stacking a built-in disk permanent magnet and polytetrafluoroethylene pillars. It is directly mounted in front of the substrate coating area to enhance the magnetic field, increase the plasma density near the curved surface, and thus improve the uniformity and deposition rate of the film.

[0042] In the description of this utility model, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", etc., indicating the orientation or positional relationship are based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this utility model and simplifying the description, and are not intended to indicate or imply that the device or component referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model.

[0043] In this utility model, unless otherwise explicitly specified and limited, the terms "installation," "connection," "joining," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model according to the specific circumstances.

[0044] In this invention, unless otherwise explicitly specified and limited, "above" or "below" the second feature can include direct contact between the first and second features, or contact between the first and second features through another feature between them. Furthermore, "above," "over," and "on top" of the second feature includes the first feature directly above or diagonally above the second feature, or simply indicates that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature includes the first feature directly below or diagonally below the second feature, or simply indicates that the first feature is at a lower horizontal level than the second feature.

[0045] The above are merely preferred embodiments of this utility model. It should be noted that the above preferred embodiments should not be considered as limitations on this utility model, and the scope of protection of this utility model should be determined by the scope defined in the claims. For those skilled in the art, several improvements and modifications can be made without departing from the spirit and scope of this utility model, and these improvements and modifications should also be considered within the scope of protection of this utility model.

Claims

1. A device for enhancing the uniformity of the film layer and the deposition rate of the magnetron sputtering thin film of the arc-shaped part, characterized in that, It includes a fixed rod, a disc permanent magnet, a mounting post, and a housing. The disc permanent magnet is mounted on the fixed rod, and adjacent disc permanent magnets are installed at intervals through the mounting post. The disc permanent magnet is encased in a housing and completely covered. The magnetic poles of adjacent disc permanent magnets are the same on their respective circular surfaces.

2. The apparatus for enhancing the uniformity of the thin film layer and the deposition rate of the arc-shaped part according to claim 1, wherein, The disk permanent magnet has a through hole along its center line. The diameter of the through hole corresponds to the outer diameter of the fixing rod and is fitted onto the fixing rod.

3. The apparatus for enhancing the uniformity of the thin film layer and the deposition rate of the arc-shaped part according to claim 1, wherein, The mounting post is made of polytetrafluoroethylene or ceramic and has a through hole along the center line. The diameter of the through hole corresponds to the outer diameter of the fixing rod and is fitted onto the fixing rod.

4. The apparatus for enhancing the uniformity of the thin film layer and the deposition rate of the arc-shaped part according to claim 1, wherein, The outer shell is a hollow cylinder with holes at the center of both ends, and the two ends of the fixing rod extend beyond the outer shell.

5. The apparatus for enhancing the uniformity of the thin film layer and the deposition rate of the arc-shaped part according to claim 4, wherein, The inner diameter of the outer shell is larger than the outer diameter of the disk permanent magnet and the mounting post.

6. The apparatus for enhancing the uniformity of the thin film layer and the deposition rate of the arc-shaped part according to claim 5, wherein, The disk-shaped permanent magnets are placed inside the outer shell at equal intervals.

7. The apparatus for enhancing the uniformity and deposition rate of magnetron sputtered thin films on arc-shaped parts according to claim 1, characterized in that, The fixing rod and the outer shell are made of non-magnetic or weakly magnetic materials.

8. The apparatus for enhancing the uniformity and deposition rate of thin film layers of magnetron sputtered arc-shaped parts of claim 1, wherein, This device is mounted on a concave arc surface and provides an additional magnetic field to the concave arc surface when used for coating.

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