A device for the treatment of waste gas cold traps used in semiconductor chip production

Abstract

The utility model provides a device for waste gas cold trap processing for semiconductor chip production, including conical cylinder wind cover, cold trap, auxiliary acceleration neck, extraction fan and alkali spray tower connection, wherein: cold trap fixed mounting is in the ground right below conical cylinder wind cover, and auxiliary acceleration neck fixed mounting is in the top of conical cylinder wind cover, and this extraction fan fixed mounting is in the top of auxiliary acceleration neck, alkali spray tower connection fixed mounting is in the top of extraction fan, and is connected with the air inlet pipe of alkali spray tower, the inner wall of conical cylinder wind cover is provided with hydrogen chloride concentration detection equipment, the setting of the utility model conical cylinder wind cover and auxiliary acceleration neck can effectively extract harmful gas outward, will not scatter out gas outward, and the scattered gas can be recycled again.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor chip manufacturing technology, and in particular to a device for treating waste gas cold traps used in semiconductor chip manufacturing. Background Technology

[0002] Semiconductor chip manufacturing involves nearly a thousand processes, and the main equipment used, referred to as modules, is assembled from different components.

[0003] One type of machine used to manufacture wires between chips is called an etching machine, which includes an electrical control system, a reaction chamber system, a gas supply pipeline system, a plasma system, a wafer carrier transport system, and an exhaust gas treatment system.

[0004] The working principle of an etching machine is to inject specific etching gases, such as fluorine-containing or chlorine-containing gases, into the reaction chamber. These gases are activated into free radicals under the action of plasma, and react chemically with the material on the wafer surface, etching away the material not protected by photoresist. The remaining material forms the required microstructure (such as wires, transistor gates, etc.).

[0005] These types of etching machines mostly use halogen-based etching gases, primarily chlorine-containing gases such as chlorine (Cl2), benzotrichloride (BCl3), silicon tetrachloride (SiCl4), titanium tetrachloride (TiCl4), and hexachloroethane (C2Cl6). These gases have a corrosive effect on the machine's piping and are environmentally damaging. Therefore, most machines are equipped with a cold trap at the tail end to capture and collect residual chlorine-containing gases, forming chlorine-containing waste liquid or solid waste, which facilitates subsequent treatment and recycling. This not only reduces environmental pollution but also helps protect equipment such as the extraction system from corrosion caused by chlorine-containing gases. However, existing waste gas cold trap treatment devices for semiconductor chip manufacturing still have the problem of not being able to effectively extract harmful gases, easily escaping, and the escaped gases cannot be recovered.

[0006] Therefore, it is essential to invent a device for treating waste gas cold traps used in semiconductor chip manufacturing. Utility Model Content

[0007] To address the aforementioned technical problems, this utility model provides a device for treating waste gas from semiconductor chip manufacturing using a cold trap. This solves the problem that existing devices for treating waste gas from semiconductor chip manufacturing still cannot effectively extract harmful gases, easily escaping and failing to recycle the released gas. The device includes a conical cylindrical hood, a cold trap, an auxiliary accelerating neck, an extraction fan, and an alkaline spray tower connection port. The cold trap is fixedly installed on the ground directly below the conical cylindrical hood, and the auxiliary accelerating neck is fixedly installed on the top of the conical cylindrical hood. The extraction fan is also fixedly installed on the top of the auxiliary accelerating neck. The alkaline spray tower connection port is fixedly installed above the extraction fan and connected to the inlet pipe of the alkaline spray tower. A hydrogen chloride concentration detection device is installed on the inner wall of the conical cylindrical hood.

[0008] An opening and closing door is rotatably installed on the outer side of the conical cylindrical wind shroud; a stabilizing reinforcing frame is fixedly installed between the conical cylindrical wind shroud and the auxiliary acceleration neck.

[0009] The conical cylindrical hood includes a hood body, an inlet / outlet gate, a support frame, and a grounding plate. The inlet / outlet gate is located on the outside of the hood body. The grounding plate is fixedly installed at the bottom of the hood body by the support frame and connected to the ground.

[0010] A water injection pipe interface is fixedly installed on the side of the main body of the hood opposite to the inlet and outlet gates, and a water injection pipe is fixedly installed inside the water injection pipe interface.

[0011] The auxiliary acceleration neck includes an acceleration pipe, a connecting neck, a pressurization chamber, and an acceleration fan. The acceleration pipe is fixedly installed on the top of the conical cylindrical shroud, and the connecting neck is fixedly installed on the outside of the acceleration pipe. The pressurization chamber is fixedly installed on the outer end of the connecting neck, and the acceleration fan is fixedly installed inside the pressurization chamber. The pressurization chamber and the conical cylindrical shroud are supported and fixed by a stabilizing reinforcing frame.

[0012] The conical cylindrical hood adopts a stainless steel metal structure that is narrow at the top and wide at the bottom, and the overall conical cylindrical hood forms an inverted trumpet shape. The main body of the hood does not directly contact the ground, and is supported on the ground by a grounding plate connected to a support frame. A gap is left between the main body of the hood and the grounding plate to form an air intake window. The inlet and outlet gate adopts a fan-shaped gate structure, and can be opened and closed by a rotating door. The water injection pipe interface has an internally fixed water injection pipe that can determine the amount of water input through an electric regulating valve and accurately inject it into the cold trap.

[0013] The acceleration pipe inside the auxiliary acceleration neck is a stainless steel metal pipe, and the acceleration pipe can generate negative pressure through the extraction fan to draw the gas inside the conical cylindrical fan hood to the air inlet pipe of the alkali spray tower; the connecting neck is a downward-sloping metal pipe, the inclination direction of which matches the gas flow direction inside the acceleration pipe; the pressurization chamber is a set of stainless steel metal chambers that are narrow at the top and wide at the bottom, and the narrow end of the pressurization chamber is connected to the connecting neck, and the acceleration fan is installed inside the wide end of the pressurization chamber; at least one set of auxiliary acceleration necks is used, and multiple sets of auxiliary acceleration necks can be added as needed.

[0014] Compared with the prior art, the present invention has the following beneficial effects:

[0015] 1. The conical cylindrical hood of this utility model, through its unique inverted trumpet-shaped structure and optimized fluid dynamics design, achieves multiple functions: First, for hydrogen chloride gas with a relatively high specific gravity, its wide-mouth design at the bottom can completely cover the cold trap reaction zone, combined with the narrow-mouth design at the top connecting with the auxiliary accelerating neck and the air inlet window between the hood body and the grounding plate, forming a highly efficient capture airflow to ensure that the waste gas enters the treatment process; Second, the integrated infrared hydrogen chloride sensor system can monitor and dynamically adjust the extraction parameters in real time, automatically increasing the speed of the accelerating fan in case of abnormalities. Compared with the traditional rectangular hood, this design greatly improves the capture rate of hydrogen chloride, solving the efficiency and safety problems in semiconductor waste gas treatment.

[0016] 2. The auxiliary accelerating neck of this utility model generates a high-speed upward airflow through an accelerating fan, creating a high-speed airflow within the accelerating duct and generating a continuous negative pressure inside the conical cylindrical shroud. This design provides dual protection: firstly, the negative pressure environment effectively prevents the leakage of internal hydrogen chloride gas; secondly, the high-speed airflow draws any hydrogen chloride that may have escaped from the outside of the shroud back into the system, ensuring that harmful gases completely enter the treatment process. This forms a self-circulating negative pressure barrier system, improving both exhaust gas transmission efficiency and operational safety. Attached Figure Description

[0017] Figure 1 This is a schematic diagram of the structure of this utility model.

[0018] Figure 2 This is a schematic diagram of the structure of the conical cylindrical wind shield of this utility model.

[0019] Figure 3 This is a schematic diagram of the structure of the auxiliary acceleration neck of this utility model.

[0020] In the picture:

[0021] 1. Conical cylindrical hood, 2. Opening and closing door, 3. Cold trap, 4. Auxiliary acceleration neck, 5. Stabilizing reinforcement frame, 6. Extraction fan, 7. Alkali spray tower connection port, 11. Main body of hood, 12. Inlet and outlet door, 13. Support frame, 14. Grounding plate, 15. Water injection pipe interface, 41. Acceleration pipe, 42. Connection neck, 43. Pressurization chamber, 44. Acceleration fan. Detailed Implementation

[0022] To enable those skilled in the art to better understand the present invention, the technical solutions in the embodiments of the present invention will be clearly and completely described below. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort should fall within the protection scope of the present invention.

[0023] As attached Figure 1 To be continued Figure 3 As shown.

[0024] This utility model provides a device for treating waste gas cold traps in semiconductor chip manufacturing, comprising a conical cylindrical hood 1, a cold trap 3, an auxiliary accelerating neck 4, an extraction fan 6, and an alkaline spray tower connection port 7. The cold trap 3 is fixedly installed on the ground directly below the conical cylindrical hood 1, and the auxiliary accelerating neck 4 is fixedly installed on the top of the conical cylindrical hood 1. The extraction fan 6 is fixedly installed on the top of the auxiliary accelerating neck 4. The alkaline spray tower connection port 7 is fixedly installed above the extraction fan 6 and connected to the inlet pipe of the alkaline spray tower. A hydrogen chloride concentration detection device is installed on the inner wall of the conical cylindrical hood 1.

[0025] An opening and closing door 2 is rotatably installed on the outer side of the conical cylindrical wind shroud 1; the conical cylindrical wind shroud 1 and the auxiliary acceleration neck 4 are fixedly installed with a stabilizing reinforcing frame 5.

[0026] The conical cylindrical hood 1 includes a hood body 11, an inlet / outlet gate 12, a support frame 13, and a grounding plate 14. The inlet / outlet gate 12 is located on the outside of the hood body 11. The grounding plate 14 is fixedly installed at the bottom of the hood body 11 by the support frame 13 and is connected and fixed to the ground.

[0027] A water injection pipe interface 15 is fixedly installed on the side of the main body 11 of the hood opposite to the inlet / outlet gate 12, and a water injection pipe is fixedly installed inside the water injection pipe interface 15.

[0028] The auxiliary acceleration neck 4 includes an acceleration pipe 41, a connecting neck 42, a pressurization chamber 43, and an acceleration fan 44. The acceleration pipe 41 is fixedly installed on the top of the conical cylindrical shroud 1, and the connecting neck 42 is fixedly installed on the outside of the acceleration pipe 41. The pressurization chamber 43 is fixedly installed on the outer end of the connecting neck 42, and the acceleration fan 44 is fixedly installed inside the pressurization chamber 43. The pressurization chamber 43 and the conical cylindrical shroud 1 are supported and fixed by a stabilizing reinforcing frame 5.

[0029] The conical cylindrical hood 1 adopts a stainless steel metal structure that is narrow at the top and wide at the bottom, and the conical cylindrical hood 1 forms an inverted trumpet shape. The hood body 11 does not directly contact the ground, and the hood body 11 is supported on the ground by a grounding plate 14 connected by a support frame 13. A gap is left between the hood body 11 and the grounding plate 14 to form an air intake window. The inlet and outlet gate 12 adopts a fan-shaped gate structure, and the inlet and outlet gate 12 can be opened and closed by a rotating door 2. The water injection pipe fixed inside the water injection pipe interface 15 can determine the amount of water input by an electric regulating valve and accurately inject it into the interior of the cold trap 3.

[0030] The acceleration pipe 41 inside the auxiliary acceleration neck 4 is a stainless steel metal pipe, and the acceleration pipe 41 can generate negative pressure through the extraction fan 6 to draw the gas inside the conical cylindrical hood 1 to the air inlet pipe of the alkali spray tower; the connecting neck 42 is a downwardly inclined metal pipe, and its inclination direction matches the gas flow direction inside the acceleration pipe 41; the pressurization chamber 43 is a set of stainless steel metal chambers that are narrow at the top and wide at the bottom, and the narrow end of the pressurization chamber 43 is connected to the connecting neck 42, and the acceleration fan 44 is installed inside the wide end of the pressurization chamber 43; at least one set of auxiliary acceleration neck 4 is used, and multiple sets of auxiliary acceleration neck 4 can be added as needed.

[0031] This device achieves efficient and safe treatment of chlorine-containing waste gas through the synergistic effect of multiple systems. Its core working principle can be divided into four stages.

[0032] 1. Waste gas generation stage:

[0033] After the chlorine-containing waste liquid in the cold trap 3 is injected with reaction water through the water injection pipe interface 15, a hydrolysis reaction immediately occurs, producing a large amount of hydrogen chloride gas and byproducts. At this time, the hydrogen chloride concentration detection device embedded in the conical cylindrical hood 1 monitors the gas concentration in real time.

[0034] 2. Exhaust gas capture stage

[0035] The acceleration fan 44 inside the auxiliary acceleration neck 4 starts, forming a high-speed airflow in the acceleration duct 41. This airflow generates a stable negative pressure inside the conical cylindrical shroud 1, ensuring that the heavier hydrogen chloride gas is completely confined within the system. The bottom of the shroud receives additional air through an annular air intake window formed by the support frame 13 and the grounding plate 14, preventing hydrogen chloride from sinking and overflowing.

[0036] 3. Exhaust gas transmission stage

[0037] The high-speed airflow carrying hydrogen chloride gas enters the pressurization chamber 43 through the connecting neck 42. After the speed is increased, it is finally delivered to the treatment system by the extraction fan 6 through the alkali spray tower connection port 7.

[0038] 4. Emergency Protection Phase

[0039] When the hydrogen chloride concentration exceeds the standard, the system automatically activates the emergency mode: the fan speed is increased to 400m³ / min in an instant, and the hydrogen chloride gas that may escape from the outside of the fan shroud will be drawn back into the system by the high-speed airflow, forming a self-cleaning protection.

[0040] Any technical solution that achieves the above-mentioned technical effects by utilizing the technical solution described in this utility model, or by designing a similar technical solution inspired by the technical solution described in this utility model, falls within the protection scope of this utility model.

Claims

1. An apparatus for treating waste gas cold traps used in semiconductor chip manufacturing, characterized in that: The device includes a conical cylindrical hood (1), a cold trap (3), an auxiliary accelerating neck (4), an extraction fan (6), and an alkali spray tower connection port (7). The cold trap (3) is fixedly installed on the ground directly below the conical cylindrical hood (1), and the auxiliary accelerating neck (4) is fixedly installed on the top of the conical cylindrical hood (1). The extraction fan (6) is fixedly installed on the top of the auxiliary accelerating neck (4). The alkali spray tower connection port (7) is fixedly installed above the extraction fan (6) and connected to the air inlet pipe of the alkali spray tower. A hydrogen chloride concentration detection device is installed on the inner wall of the conical cylindrical hood (1).

2. The apparatus for treating waste gas cold traps in semiconductor chip manufacturing as described in claim 1, characterized in that: An opening and closing door (2) is rotatably installed on the outer side of the conical cylindrical wind hood (1); a stabilizing reinforcing frame (5) is fixedly installed between the conical cylindrical wind hood (1) and the auxiliary acceleration neck (4).

3. The apparatus for treating waste gas cold traps in semiconductor chip manufacturing as described in claim 1, characterized in that: The conical cylindrical hood (1) includes a hood body (11), an inlet / outlet gate (12), a support frame (13), and a grounding plate (14). The inlet / outlet gate (12) is located on the outside of the hood body (11). The grounding plate (14) is fixedly installed at the bottom of the hood body (11) by the support frame (13) and is connected and fixed to the ground.

4. The apparatus for treating waste gas cold traps in semiconductor chip manufacturing as described in claim 3, characterized in that: The main body of the hood (11) is fixedly installed with a water injection pipe interface (15) on the side opposite to the inlet / outlet gate (12), and a water injection pipe is fixedly installed inside the water injection pipe interface (15).

5. The apparatus for treating waste gas cold traps in semiconductor chip manufacturing as described in claim 1, characterized in that: The auxiliary acceleration neck (4) includes an acceleration pipe (41), a connecting neck (42), a pressurization chamber (43), and an acceleration fan (44). The acceleration pipe (41) is fixedly installed on the top of the conical cylindrical shroud (1), and the connecting neck (42) is fixedly installed on the outside of the acceleration pipe (41). The pressurization chamber (43) is fixedly installed on the outer end of the connecting neck (42), and the acceleration fan (44) is fixedly installed inside the pressurization chamber (43). The pressurization chamber (43) and the conical cylindrical shroud (1) are supported and fixed by a stabilizing reinforcing frame (5).

6. The apparatus for treating waste gas cold traps in semiconductor chip manufacturing as described in claim 4, characterized in that: The conical cylindrical hood (1) adopts a stainless steel metal structure that is narrow at the top and wide at the bottom, and the conical cylindrical hood (1) forms an inverted trumpet shape as a whole; the hood body (11) does not directly contact the ground, and the hood body (11) is supported on the ground by the grounding plate (14) connected by the support frame (13). There is a gap between the hood body (11) and the grounding plate (14) to form an air intake window; the inlet and outlet gate (12) adopts a fan-shaped gate structure, and the inlet and outlet gate (12) can be opened and closed by a rotating door (2); the water injection pipe fixed inside the water injection pipe interface (15) can determine the amount of water input by an electric regulating valve and accurately inject it into the interior of the cold trap (3).

7. The apparatus for treating waste gas cold traps in semiconductor chip manufacturing as described in claim 5, characterized in that: The acceleration pipe (41) inside the auxiliary acceleration neck (4) is a stainless steel metal pipe, and the acceleration pipe (41) can generate negative pressure by the extraction fan (6) to draw the gas inside the conical cylindrical hood (1) to the air inlet pipe of the alkali spray tower; the connecting neck (42) is a downward inclined metal pipe, and its inclination direction matches the gas flow direction inside the acceleration pipe (41); the pressurization chamber (43) is a set of stainless steel metal chambers that are narrow at the top and wide at the bottom, and the narrow end of the pressurization chamber (43) is connected to the connecting neck (42), and the wide end of the pressurization chamber (43) is equipped with an acceleration fan (44); the auxiliary acceleration neck (4) uses at least one set, and multiple sets of auxiliary acceleration necks (4) can be added as needed.

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