An auxiliary device for quartz plate magnetorheological polishing

Abstract

This utility model relates to an auxiliary device for magnetorheological polishing of quartz plates, belonging to the field of quartz plate processing technology. It includes a support mechanism and a fixing unit. The support mechanism includes a base bracket for supporting the quartz plate. The fixing unit is fixedly connected to the base bracket and includes a clamping member and a limiting member. The limiting member and the clamping member are symmetrically arranged along the axis of the base bracket, and are used to fix two corners of the quartz plate respectively. The clamping member can move along the diagonal extension direction of the quartz plate, and the clamping member has a line contact structure with the quartz plate. This technical solution, through the symmetrically arranged clamping member and limiting member along the axis of the base bracket (i.e., the clamping member and limiting member are located on the diagonal of the quartz plate), ensures the stability of the quartz plate during polishing by dynamically adjustable clamping members. Furthermore, the clamping member makes line contact with the side of the quartz plate, significantly reducing the contact area between the clamping member and the quartz plate, lowering the risk of scratches on the quartz plate, and improving the yield rate.

Description

Technical Field

[0001] This utility model relates to the field of quartz plate processing technology, and in particular to an auxiliary device for magnetorheological polishing of quartz plates. Background Technology

[0002] With the rapid development of semiconductor and solar photovoltaic technologies both domestically and internationally, and the increasing market growth, the demand for quartz products in related industries is also growing rapidly, while higher requirements are being placed on the quality and processing of quartz products. In the processing of quartz plates, especially in applications such as high-precision optical components or semiconductor substrates, magnetorheological polishing, as an advanced precision polishing technology, is widely used due to its advantages of being non-contact, highly controllable, and having high processing efficiency. However, in actual operation, due to the inherent brittleness, high hardness, and easy surface damage of quartz material, higher requirements are placed on the precision and stability of the clamping device.

[0003] Existing fixtures for polishing quartz slab structures typically employ surface contact clamping, which can easily lead to stress concentration at the clamping points, causing micro-cracks or scratches on the quartz slab surface, affecting yield and surface quality. Furthermore, most fixtures are only suitable for quartz slabs of specific sizes, requiring frequent fixture changes for products of different specifications, thus reducing production efficiency.

[0004] Therefore, a well-designed structure is urgently needed to solve the above problems. Utility Model Content

[0005] The purpose of this invention is to overcome the shortcomings of the prior art and provide an auxiliary device for magnetorheological polishing of quartz plates.

[0006] To achieve the above objectives, this utility model provides an auxiliary device for magnetorheological polishing of quartz plates, employing the following technical solution:

[0007] An auxiliary device for magnetorheological polishing of quartz plates includes a support mechanism and a fixing unit. The support mechanism includes a base bracket for supporting the quartz plate. The fixing unit is fixedly connected to the base bracket and includes a clamping member and a limiting member. The limiting member and the clamping member are symmetrically arranged along the axis of the base bracket, and the limiting member and the clamping member are used to fix two corners of the quartz plate respectively. The clamping member can move along the extension direction of the diagonal of the quartz plate, and the clamping member has a line contact structure with the quartz plate.

[0008] Furthermore, the clamping member includes an abutment block, a mounting base, and a horizontal adjustment rod. The mounting base is fixedly connected to the base bracket. The mounting base is provided with an adjustment hole. The horizontal adjustment rod passes through the adjustment hole and is fixedly connected to the abutment block. The adjustment hole and the horizontal adjustment rod are threaded together for fixation.

[0009] Furthermore, the abutting block has a first side and a second side, the first side and the second side respectively abut against the quartz plate, and the included angle formed by the first side and the second side is smaller than the included angle of the quartz plate.

[0010] Furthermore, the auxiliary device also includes an angle adjustment unit, which is rotatably connected to the base bracket and is used to adjust the angle of the quartz plate on the base bracket.

[0011] Furthermore, the base support includes a clamp base and a plate mounting plate, the angle adjustment unit includes a first gear and a second gear meshing with the first gear, the clamp base is rotatably connected to the plate mounting plate, the first gear is rotatably connected to the clamp base, and the second gear is fixedly connected to the plate mounting plate.

[0012] Furthermore, the second gear and the plate mounting plate are integrally formed.

[0013] Furthermore, the fixing unit also includes at least two positioning plates, which are fixedly connected to the base bracket, and the positioning plates abut against the side of the quartz plate in the first direction and the side of the quartz plate in the second direction, respectively.

[0014] Furthermore, the positioning plate, the clamping member, and the limiting member form a support surface for supporting the quartz plate, and the support surface is higher than the upper surface of the base bracket.

[0015] Furthermore, the gap area between the support surface and the upper surface of the base bracket is provided with deionized water or a coating material.

[0016] Furthermore, the outer surfaces of the base bracket and the fixing unit are coated with Teflon.

[0017] The beneficial effects of this utility model are as follows:

[0018] By symmetrically distributing the limiting and clamping components, the quartz plate is held in place with uniform force, preventing deformation or displacement caused by unilateral stress. The clamping components can move diagonally along the quartz plate, and dynamic adjustment ensures the quartz plate remains stable during polishing, preventing displacement caused by vibration or external forces, reducing processing errors, and improving the efficiency of quartz plate replacement.

[0019] In addition, the contact method between the clamping component and the quartz plate is line contact, which significantly reduces the contact area between the clamping component and the quartz plate compared to traditional surface contact. This reduces the risk of scratches on the quartz plate, avoids surface scratches caused by traditional surface contact, improves the yield of quartz plates, and reduces frictional resistance, thus avoiding microcracks caused by excessive local pressure. Attached Figure Description

[0020] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on the structures shown in these drawings without creative effort.

[0021] Figure 1 This is a three-dimensional structural schematic diagram of the auxiliary device for magnetorheological polishing of quartz plates according to the present invention.

[0022] Figure 2 This is a top view of the auxiliary device for magnetorheological polishing of quartz plates according to the present invention.

[0023] Figure 3 This is a three-dimensional structural diagram of the plate mounting plate and fixing unit of this utility model.

[0024] In the diagram, 100 is the base bracket; 110 is the clamp base; 120 is the plate mounting plate; 200 is the fixing unit; 210 is the clamping component; 211 is the abutment block; 212 is the mounting base; 213 is the horizontal adjustment rod; 220 is the limiting component; 230 is the positioning plate; 300 is the quartz plate; 400 is the angle adjustment unit; 410 is the first gear; and 420 is the second gear. Detailed Implementation

[0025] The following is in conjunction with the appendix Figure 1 -Appendix Figure 3 The technical solutions in the embodiments of this application are clearly and completely described. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of the embodiments. Based on the embodiments in this application, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of this application.

[0026] It should be noted that all directional indicators (such as up, down, left, right, front, back, etc.) in the embodiments of this application are only used to explain the relative positional relationship and movement of each component in a certain specific posture (as shown in the figure). If the specific posture changes, the directional indicator will also change accordingly.

[0027] Furthermore, the use of terms such as "first," "second," etc., in this application is for descriptive purposes only and should not be construed as indicating or implying their relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this application, "multiple" means at least two, such as two, three, etc., unless otherwise explicitly specified.

[0028] In this application, unless otherwise expressly specified and limited, the terms "connection," "fixed," etc., should be interpreted broadly. For example, "fixed" can mean a fixed connection, a detachable connection, or an integral part; it can mean a mechanical connection or an electrical connection; it can mean a direct connection or an indirect connection through an intermediate medium; it can mean the internal communication of two components or the interaction between two components, unless otherwise expressly limited. Those skilled in the art can understand the specific meaning of the above terms in this application according to the specific circumstances.

[0029] Furthermore, the technical solutions of the various embodiments of this application can be combined with each other, but only if they are based on the ability of those skilled in the art to implement them. When the combination of technical solutions is contradictory or cannot be implemented, it should be considered that such combination of technical solutions does not exist and is not within the scope of protection claimed by this application.

[0030] This utility model discloses an auxiliary device for magnetorheological polishing of quartz plates, including a support mechanism and a fixing unit 200. The support mechanism includes a base bracket 100 for supporting the quartz plate 300. The fixing unit 200 is fixedly connected to the base bracket 100. The fixing unit 200 includes a clamping member 210 and a limiting member 220. The limiting member 220 and the clamping member 210 are symmetrically arranged along the axis of the base bracket 100, and the limiting member 220 and the clamping member 210 are used to fix two corners of the quartz plate 300 respectively. The clamping member 210 can move along the extension direction of the diagonal of the quartz plate 300, and the clamping member 210 and the quartz plate 300 have a line contact structure.

[0031] like Figure 1 , Figure 2As shown, this technical solution discloses an auxiliary device for magnetorheological polishing of quartz plates. The base support 100 supports the quartz plate 300, providing a stable support plane for the quartz plate 300 to be polished. The clamping member 210 can move along the extension direction of the diagonal of the quartz plate 300 to dynamically adjust the clamping position to adapt to quartz plates 300 of different sizes, improving the versatility of the auxiliary device for different quartz plates 300, and forming a line contact structure with the quartz plate 300. The limiting member 220 and the clamping member 210 are symmetrically arranged along the axis of the base support 100 to fix the other corner of the quartz plate 300.

[0032] Specifically, the limiting member 220 and the clamping member 210 are symmetrically distributed. This design ensures that the quartz plate 300 is subjected to uniform force when the fixing unit 200 fixes it, avoiding deformation or displacement caused by unilateral stress. The clamping member 210 can move along the diagonal direction. The dynamically adjustable clamping member 210 ensures that the quartz plate 300 remains stable during polishing, preventing displacement caused by vibration or external force, and reducing the probability of processing errors caused by loosening of the quartz plate 300. At the same time, when the quartz plate 300 needs to be replaced, the operator only needs to move the relative position of the clamping member 210 to complete the replacement action, improving the replacement efficiency of the quartz plate 300 and reducing the clamping and fixing time of the clamping member 210. In addition, the contact method between the clamping member 210 and the quartz plate 300 is line contact, which significantly reduces the contact area between the clamping member 210 and the quartz plate 300 compared to traditional surface contact, reduces the risk of scratches on the quartz plate 300, avoids surface scratches caused by traditional surface contact, and improves the yield of the quartz plate 300. Furthermore, the line contact structure can reduce frictional resistance, making the quartz plate 300 smoother when adjusted or fixed, while avoiding micro-cracks caused by excessive local pressure.

[0033] In one embodiment of the present invention, the clamping member 210 includes an abutment block 211, a mounting base 212 and a horizontal adjustment rod 213. The mounting base 212 is fixedly connected to the base bracket 100. The mounting base 212 is provided with an adjustment hole. The horizontal adjustment rod 213 passes through the adjustment hole and is fixedly connected to the abutment block 211. The adjustment hole and the horizontal adjustment rod 213 are threadedly engaged and fixed.

[0034] like Figure 1 , Figure 2 As shown, the abutment block 211 is used to directly contact the quartz plate 300 to provide clamping force. The mounting base 212 is fixed on the base bracket 100 and is provided with an adjustment hole to guide the movement direction of the horizontal adjustment rod 213. The horizontal adjustment rod 213 passes through the adjustment hole and is fixedly connected to the abutment block 211. The fine adjustment and locking of the clamping member 210 are realized through threaded engagement.

[0035] The horizontal adjusting rod 213 and the adjusting hole are connected by a threaded connection. When the horizontal adjusting rod 213 is rotated, the abutment block 211 moves precisely along the diagonal direction of the quartz plate 300, achieving micro-adjustment at the 0.1mm level, thus realizing high-precision positioning of the quartz plate 300. Furthermore, the self-locking characteristic of the thread prevents loosening caused by vibration during polishing, eliminating the need for frequent adjustments and ensuring clamping stability. The abutment block 211 moves in a controlled manner via the horizontal adjusting rod 213, avoiding the rigid impact of traditional clamps, ensuring even distribution of clamping force, and reducing localized stress on the quartz plate 300. The mounting base 212 is fixedly connected to the base bracket 100. By selecting and replacing the horizontal adjusting rod 213 or the abutment block 211 of different lengths, it can support the processing of quartz plates 300 of different sizes, improving the versatility of this auxiliary device.

[0036] In one embodiment of the present invention, the abutting block 211 is provided with a first side and a second side, the first side and the second side respectively abutting against the quartz plate 300, and the included angle formed by the first side and the second side is smaller than the included angle of the quartz plate 300.

[0037] like Figure 2 As shown, by setting the first and second sides of the abutment block 211 to form an angle smaller than the angle between the abutment block 211 and the quartz plate 300, the contact between the abutment block 211 and the quartz plate 300 becomes a line contact. Specifically, the first and second sides of the abutment block 211 form line contacts with the two sides of the quartz plate 300, respectively. Through the angle difference design, when the abutment block 211 is subjected to external pressure (such as the pressure provided by the mounting base 212 and the horizontal adjustment rod 213), it can automatically apply an inward clamping force to the quartz plate 300, thereby realizing a self-locking function. That is, when the quartz plate 300 is impacted by the polishing external force, the inclined surface of the abutment block 211 will convert part of the lateral force into a vertical clamping force, further enhancing the clamping stability. Moreover, the double-edge contact mode disperses the contact pressure to the non-functional area of ​​the quartz plate 300, reducing the scratch rate of the polished surface.

[0038] In one embodiment of the present invention, the auxiliary device further includes an angle adjustment unit 400, which is rotatably connected to the base support 100 and is used to adjust the angle of the quartz plate 300 on the base support 100.

[0039] like Figure 1 , Figure 2As shown, by setting the angle adjustment unit 400, the operator only needs to operate the angle adjustment unit 400 to achieve the relative rotation between the quartz plate 300 and the base support 100, which shortens the process of adjusting the straightness of the quartz plate 300 each time, solves the problem of frequent fixture adjustments during production, and improves processing accuracy. In addition, in another embodiment, an angle scale or digital display module can be set to facilitate the operator to accurately control and record the installation angle of the quartz plate 300.

[0040] In one embodiment of this utility model, the base support 100 includes a clamp base 110 and a plate mounting plate 120, the angle adjustment unit 400 includes a first gear 410 and a second gear 420 meshing with the first gear 410, the clamp base 110 is rotatably connected to the plate mounting plate 120, the first gear 410 is rotatably connected to the clamp base 110, and the second gear 420 is fixedly connected to the plate mounting plate 120.

[0041] like Figures 1 to 3 As shown, this technical solution achieves precise adjustment of the mounting angle of the quartz plate 300 through gear transmission. Specifically, the clamp base 110 and the plate mounting plate 120 rotate relative to each other via a rotating shaft. The first gear 410 is mounted on the clamp base 110 and can rotate around its axis; the second gear 420 is fixedly connected to the end of the plate mounting plate 120 away from the quartz plate 300 and meshes with the first gear 410. When the operator manually or through a drive device rotates the first gear 410, the meshing action between the gears drives the second gear 420 and the plate mounting plate 120 it is fixed to to rotate, thereby achieving adjustment of the tilt angle of the quartz plate 300.

[0042] This technical solution employs a gear meshing transmission method, which has good transmission rigidity and adjustment accuracy. It can achieve high-precision adjustment of the tilt angle of the quartz plate 300 in a confined space. Moreover, the adjustment process only requires rotating the gear to change the angle, making the adjustment process simple and easy for operators to operate. The structural design of the gear-driven angle adjustment unit 400 and the base bracket 100 realizes efficient and precise adjustment of the installation angle of the quartz plate 300, shortens the process of adjusting the straightness of the quartz plate 300 in a single operation, solves the problem of frequent fixture adjustments during production, and improves processing accuracy.

[0043] In one embodiment of this utility model, the second gear 420 and the plate mounting plate 120 are integrally formed.

[0044] In one embodiment of this utility model, the second gear 420 and the plate mounting plate 120 are integrally formed.

[0045] By designing the second gear 420 and the plate mounting plate 120 as an integral structure, the connecting parts (such as screws, keys, or interference fit structures) between the gear and the plate mounting plate 120 in traditional assembly are eliminated. This simplifies the assembly process of the angle adjustment unit 400, improves the overall integrity and reliability of the structure, reduces fitting errors in the assembly process, avoids gaps or loosening problems that may occur in traditional connection methods, enhances the connection rigidity between the second gear 420 and the plate mounting plate 120, and improves the stability and lifespan of the transmission system. The one-piece molding structure makes it easier to achieve automated assembly and angle calibration, avoids loosening or offset problems between the second gear 420 and the plate mounting plate 120 caused by vibration, and improves the stability and safety of the equipment in dynamic environments.

[0046] In one embodiment of the present invention, the fixing unit 200 further includes at least two positioning plates 230, the positioning plates 230 being fixedly connected to the base bracket 100, and the positioning plates 230 respectively abutting against the side of the quartz plate 300 in a first direction and the side of the quartz plate in a second direction.

[0047] like Figures 1 to 3 As shown, this technical solution uses multiple positioning plates 230 to limit and fix the position of the quartz plate 300 in different directions, thereby achieving precise positioning of it on the base support 100. Specifically, one positioning plate 230 can be attached to the side of the quartz plate 300 along a first direction (such as the transverse direction), while another one or more positioning plates 230 are in contact with the other side along a second direction (such as the longitudinal direction), forming a multi-directional constraint structure to prevent the quartz plate 300 from shifting, tilting, or sliding during the polishing process.

[0048] By using two or more positioning plates 230 to limit the different sides of the quartz plate 300, its translational freedom within the mounting plane of the base bracket 100 is effectively restricted, ensuring consistency and repeatability in the polishing position. At the same time, the multi-point positioning and fixing method enhances the structural stability of the quartz plate 300 under complex working conditions, making it particularly suitable for application environments with vibration or impact. In addition, the standardized design of the positioning plates 230 allows workers to quickly complete the fixing of the quartz plate 300 on the base bracket 100 without relying on experience, thus improving work efficiency.

[0049] In one embodiment of the present invention, the positioning plate 230, the clamping member 210 and the limiting member 220 are formed with a supporting surface for supporting the quartz plate 300, and the supporting surface is higher than the upper surface of the base bracket 100.

[0050] like Figure 3As shown, in one embodiment of the present invention, the positioning plate 230, the clamping member 210 and the limiting member 220 form a support surface for supporting the quartz plate 300, and the support surface is higher than the upper surface of the base bracket 100.

[0051] By setting the support surface to be higher than the upper surface of the base bracket 100, the quartz plate 300 is lifted and stably mounted on the support structure composed of multiple functional components during installation, rather than directly contacting the surface of the base bracket 100. This design not only helps improve the installation stability of the quartz plate 300, but also avoids direct contact between the quartz plate 300 and the surface of the base bracket 100, reducing the risk of damage to the quartz plate 300 due to unevenness or foreign objects on the upper surface of the base bracket 100. Specifically, the positioning plate 230, the clamping member 210, and the limiting member 220 each have a support boss or support plane of a specific height, and through precision machining, ensure that each support point is on the same horizontal plane, thereby constructing an overall stable and reliable support surface. Since the support surface is higher than the surface of the base bracket 100, a gap is left between the base and the quartz plate 300, which can prevent the particle residue generated during polishing from rubbing against the substrate, reducing the risk of scratches on the quartz plate 300.

[0052] In one embodiment of this utility model, the gap area between the supporting surface and the upper surface of the base bracket 100 is provided with deionized water or a coating material.

[0053] By setting deionized water or a coating material in the gap area between the support surface and the base bracket 100, multiple protections are achieved during the polishing process of the quartz plate 300. For example, the coating material can form a physical isolation layer between the quartz plate 300 and the base bracket 100 to prevent particulate contamination, chemical corrosion or mechanical damage, improve the cleanliness and safety of the overall structure, and avoid the risk of scratches to the substrate caused by particulate residue generated during the polishing process.

[0054] In one embodiment of this utility model, the outer surfaces of the base bracket 100 and the fixing unit 200 are coated with Teflon.

[0055] By coating the outer surfaces of the base bracket 100 and the fixing unit 200 with a Teflon coating, the device's functionality, durability, and ease of operation are enhanced by its excellent non-adhesiveness, low coefficient of friction, corrosion resistance, and good thermal stability. Simultaneously, the Teflon coating provides cushioning, reducing hard contact between the auxiliary device and the quartz plate 300, thus lowering the risk of quartz breakage due to scratches or impacts. The non-stick properties of the coating effectively prevent the adhesion of polishing particles and environmental dust and particulate matter, keeping the auxiliary device clean.

[0056] The above description is merely a preferred embodiment of this application and does not limit the patent scope of this application. Any equivalent structural transformations made based on the inventive concept of this application and the contents of the specification and drawings of this application, or direct / indirect applications in other related technical fields, are included within the patent protection scope of this application.

Claims

1. An auxiliary device for magnetorheological polishing of quartz plates, characterized in that, include: A support mechanism, the support mechanism including a base bracket (100) for supporting a quartz plate (300); A fixing unit (200) is fixedly connected to the base bracket (100). The fixing unit (200) includes a clamping member (210) and a limiting member (220). The limiting member (220) and the clamping member (210) are symmetrically arranged along the axis of the base bracket (100). The limiting member (220) and the clamping member (210) are used to fix the two corners of the quartz plate (300) respectively. The clamping member (210) can move along the extension direction of the diagonal of the quartz plate (300). The clamping member (210) and the quartz plate (300) have a line contact structure.

2. The auxiliary device for magnetorheological polishing of quartz plates according to claim 1, characterized in that: The clamping member (210) includes an abutment block (211), a mounting base (212), and a horizontal adjustment rod (213). The mounting base (212) is fixedly connected to the base bracket (100). The mounting base (212) is provided with an adjustment hole. The horizontal adjustment rod (213) passes through the adjustment hole and is fixedly connected to the abutment block (211). The adjustment hole and the horizontal adjustment rod (213) are threaded together for fixation.

3. The auxiliary device for magnetorheological polishing of quartz plates according to claim 2, characterized in that: The abutment block (211) has a first side and a second side, the first side and the second side respectively abut against the quartz plate (300), and the included angle formed by the first side and the second side is smaller than the included angle of the quartz plate (300).

4. The auxiliary device for magnetorheological polishing of quartz plates according to claim 1, characterized in that: The auxiliary device also includes an angle adjustment unit (400), which is rotatably connected to the base bracket (100) and is used to adjust the angle of the quartz plate (300) on the base bracket (100).

5. The auxiliary device for magnetorheological polishing of quartz plates according to claim 4, characterized in that: The base support (100) includes a clamp base (110) and a plate mounting plate (120). The angle adjustment unit (400) includes a first gear (410) and a second gear (420) meshing with the first gear (410). The clamp base (110) is rotatably connected to the plate mounting plate (120). The first gear (410) is rotatably connected to the clamp base (110). The second gear (420) is fixedly connected to the plate mounting plate (120).

6. The auxiliary device for magnetorheological polishing of quartz plates according to claim 5, characterized in that: The second gear (420) and the plate mounting plate (120) are integrally formed.

7. The auxiliary device for magnetorheological polishing of quartz plates according to claim 1, characterized in that: The fixing unit (200) further includes at least two positioning plates (230), which are fixedly connected to the base bracket (100). The positioning plates (230) abut against the side of the quartz plate (300) in a first direction and the side of the quartz plate (300) in a second direction, respectively.

8. The auxiliary device for magnetorheological polishing of quartz plates according to claim 7, characterized in that: The positioning plate (230), the clamping member (210) and the limiting member (220) form a support surface for supporting the quartz plate (300), and the support surface is higher than the upper surface of the base bracket (100).

9. The auxiliary device for magnetorheological polishing of quartz plates according to claim 8, characterized in that: The gap area between the support surface and the upper surface of the base bracket (100) is provided with deionized water or a coating material.

10. The auxiliary device for magnetorheological polishing of quartz plates according to claim 1, characterized in that: The outer surfaces of the base bracket (100) and the fixing unit (200) are coated with Teflon.

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