Chain type cleaning tank and chain type cleaning equipment

Abstract

This utility model belongs to the field of photovoltaic cell cleaning technology, specifically relating to a chain cleaning tank and chain cleaning equipment. The chain cleaning tank includes: a water jet, with a spray nozzle for spraying cleaning fluid on the side of the water jet facing the photovoltaic cell; a main cleaning tank, which includes at least: a coarse cleaning section, with the water jet arranged on both the upper and lower sides of the photovoltaic cell; a fine cleaning section, with a liquid storage structure arranged below the photovoltaic cell and a water jet arranged on one side above the photovoltaic cell; the chain cleaning tank also includes a conveyor wheel arranged below the photovoltaic cell, with multiple sets of conveyor wheels cooperating to form a driving structure for moving the photovoltaic cell in the main cleaning tank. The chain cleaning equipment proposed in this utility model performs segmented cleaning of the photovoltaic cell by combining the coarse and fine cleaning sections, forming a stable cleaning fluid layer on both the upper and lower surfaces of the photovoltaic cell to reduce the number of water jets while ensuring thorough cleaning of the photovoltaic cell surface.

Description

Technical Field

[0001] This utility model belongs to the field of photovoltaic cell cleaning technology, specifically relating to a chain cleaning device. Background Technology

[0002] Chain cleaning equipment is commonly used in automated photovoltaic (PV) wafer production lines. The chain conveyor system in the equipment transfers PV wafers, while the cleaning components simultaneously clean the upper and lower surfaces of the wafers, removing chemicals left from previous processes. In the prior art, Chinese patent CN 210523246 U discloses a chain-type silicon wafer cleaning tank. This patent fixes the PV wafers between upper and lower rollers for transfer. Multiple spray mechanisms are symmetrically arranged on both sides of the transfer path. The cleaning tank is divided into a front tank and a rear tank based on the amount of chemicals adhering to the wafer surface. In the front tank, where the amount of chemicals adhering to the wafers is large, the cleaning solution flows in a non-circulating manner; in the rear tank, where the amount of chemicals adhering to the wafers is small, the cleaning solution flows in a circulating manner. The spray cleaning process has the following drawbacks: On the one hand, during the conveying process, the upper and lower rollers will always block part of the photovoltaic panel surface, so it is necessary to increase the number of water jets to ensure that the photovoltaic panel surface is thoroughly cleaned, which complicates the equipment structure; on the other hand, when spraying from bottom to top, the contact time between the cleaning liquid and the photovoltaic panel surface is short, and the cleaning effect depends on the mechanical scouring of the liquid flow, but excessive spray pressure will cause the photovoltaic panel to shake on the equipment. Utility Model Content

[0003] In view of this, the present invention aims to provide a chain cleaning tank and chain cleaning equipment that reduces the number of water jets while achieving better cleaning results.

[0004] This utility model is achieved through the following technical solution:

[0005] A chain cleaning tank, characterized in that it comprises:

[0006] A water jet, wherein the side of the water jet facing the photovoltaic cell is provided with a spray nozzle for spraying cleaning fluid;

[0007] The main cleaning tank includes at least:

[0008] The coarse washing section is provided with water jets arranged on both sides above and below the photovoltaic cells;

[0009] The fine cleaning section is provided with a liquid storage structure arranged below the photovoltaic cell and a water jet arranged on one side above the photovoltaic cell;

[0010] The chain cleaning tank also includes a conveyor wheel located below the photovoltaic panel. Multiple sets of the conveyor wheels work together to form a driving structure for the photovoltaic panel to move in the main cleaning tank.

[0011] Compared with existing technologies, the chain cleaning tank proposed in this invention performs segmented cleaning of photovoltaic panels by combining a coarse cleaning section and a fine cleaning section, reducing the number of water jets while ensuring thorough cleaning of the photovoltaic panel surface. The coarse cleaning section uses a double-sided spraying method, rapidly cleaning the photovoltaic panel with a highly fluid cleaning solution. The fine cleaning section uses a combination of spraying and immersion. Water jets are arranged on the upper surface of the photovoltaic panel, and the cleaning solution sprayed by the water jets naturally accumulates on the upper surface of the photovoltaic panel due to gravity, forming a stable cleaning solution layer. A liquid storage structure is arranged on the lower surface of the photovoltaic panel, forming a stable cleaning solution layer on the lower surface of the photovoltaic panel through immersion in the cleaning solution. Both sides of the photovoltaic panel are effectively cleaned.

[0012] Preferably, the chain cleaning tank further includes an upper pressure roller disposed above the conveyor wheel; the upper pressure roller is provided with a protruding pressure ring, and the surface of the pressure ring cooperates with the surface of the conveyor wheel to form a limiting structure for the vertical position of the photovoltaic cell.

[0013] The sprayed liquid flow can cause the photovoltaic panels to shake or slip. This solution eliminates the upper roller, instead using an upper pressure roller and a conveyor roller beneath the photovoltaic panel to fix it in place. The upper pressure roller contacts the photovoltaic panel surface via a raised pressure ring, limiting the shading area to the area of ​​the pressure ring's action. This allows the cleaning liquid to still reach other areas of the photovoltaic panel surface, ensuring thorough cleaning.

[0014] Preferably, the upper pressure roller includes:

[0015] The central rod has a motion trajectory that rotates around its own axis;

[0016] An upper pressure unit is nested outside the central rod, and the pressure ring is fixed to the upper pressure unit;

[0017] The retaining rings are nested outside the central rod and located at both ends of the upper pressing unit along the axial direction. The retaining rings constitute an axial positioning structure for the upper pressing unit.

[0018] The center rod drives the upper pressure unit to rotate circumferentially through surface friction, and the retaining ring structure prevents the upper pressure unit from sliding axially on the center rod.

[0019] Preferably, the retaining ring is fixed to the center rod by a set screw.

[0020] In existing technologies, the retaining ring is fixed by a groove on the surface of the central rod, and its position is not adjustable, making it unsuitable for applications where the size and position of the photovoltaic cell change. This solution uses a set screw fixing method, which is detachable. When the specifications of the photovoltaic cell change, the retaining ring can be moved to adjust the position of the pressure ring.

[0021] Preferably, the retaining ring is provided with multiple sets of recessed limiting platforms, and the end of the pressing unit is provided with multiple sets of protruding retaining teeth; when the retaining teeth and the limiting platforms are engaged in the axial direction of the central rod, the limiting platforms allow space for the retaining teeth to move circumferentially.

[0022] Ideally, during operation, the contact position between the pressure ring and the photovoltaic cell surface changes constantly, and at each moment, there is only static friction without relative slippage. If the pressure ring slides relative to the photovoltaic cell surface, it may cause damage to the surface. The allowance design of the limiting stage allows for buffer space when the pressure ring rotates with the central rod, and can be adjusted in time if a tendency to slide relative to the photovoltaic cell surface occurs, thus avoiding damage.

[0023] Preferably, the main cleaning tank is provided with multiple sets of liquid level baffles, which form a separation structure between the fine washing section and the coarse washing section.

[0024] The liquid level baffle separates the fine washing section and the rough washing section at the process level in terms of physical structure. The two have independent liquid flows and are configured with circulating or non-circulating flow modes according to the consumption of cleaning fluid.

[0025] Preferably, the water jet includes a spray pipe and a water supply pipe; the spray nozzle is opened on the spray pipe, and multiple connecting parts are provided between the water supply pipe and the spray pipe.

[0026] The spraying effect of a single water jet is optimized. To avoid uneven water pressure and volume distribution within the spray pipe, multiple connecting parts are installed at different locations in the spray pipe for water replenishment. At the same time, the water supply equipment is not directly connected to the spray pipe, but rather flows into the spray pipe after rectification and distribution through the water supply pipe, thereby improving the stability and balance of the spray flow.

[0027] Preferably, the coarse washing section is further provided with a water-blocking roller, which is positioned in front of the water jet on the moving path of the photovoltaic cell.

[0028] Water-blocking rollers can quickly and evenly remove the liquid layer adhering to the surface of photovoltaic cells. When placed before water jet spraying, they allow subsequent spray liquid streams to directly contact the surface of the photovoltaic cells, improving the cleaning efficiency of the spraying process.

[0029] Preferably, the coarse washing section is arranged at least at the beginning and / or end of the photovoltaic cell movement path.

[0030] The initial coarse cleaning section rapidly removes surface cleaning solutions using fast-flowing water jets and water-blocking rollers, reducing the amount of cleaning solution carried by the photovoltaic panels when they enter the fine cleaning section, thus lowering the pollution and cleaning load of the fine cleaning environment. The final coarse cleaning section maintains a rapidly flowing, constantly replenished cleaning solution environment on both sides of the photovoltaic panels, preserving their surface cleanliness.

[0031] This utility model also proposes a chain cleaning device, characterized in that it includes the chain cleaning tank described in any of the preceding claims, and further includes a cleaning fluid supply device connected to the chain cleaning tank; the cleaning fluid supply device is used to provide the chain cleaning tank with any one of water, microbubble cleaning fluid, nanobubble cleaning fluid or micro-nano bubble cleaning fluid.

[0032] In addition to residual chemicals, the surface of photovoltaic cells entering the chain cleaning tank may also contain oil, metal particles, and unreacted silica. Therefore, this solution includes an independent cleaning fluid supply device within the chain cleaning equipment, providing a variety of cleaning fluids to the chain cleaning tank. The cleaning fluid selection further optimizes the cleaning quality of the chain cleaning tank. The cleaning fluid can be deionized water, ultrapure water, or bubble cleaning fluids such as microbubble cleaning fluid, nanobubble cleaning fluid, or micro / nanobubble cleaning fluid, which provides a more efficient cleaning effect through micro / nanobubbles.

[0033] This invention proposes a chain-type cleaning tank and chain-type cleaning equipment. Through a segmented design of coarse and fine cleaning sections, combined with a cleaning method that integrates spraying and immersion, the number of water jets is effectively reduced while ensuring thorough cleaning of the photovoltaic panel surface. The coarse cleaning section uses a double-sided spraying method, utilizing a highly fluid cleaning solution to quickly clean the photovoltaic panels. The fine cleaning section combines spraying and immersion to form a stable cleaning solution layer, ensuring effective cleaning of both sides of the photovoltaic panels. Furthermore, the equipment further improves cleaning efficiency and stability by optimizing the water jet spray effect, incorporating water-blocking rollers, and adding liquid level baffles. The adjustable upper pressure roller design adapts to photovoltaic panels of different specifications, preventing surface damage. The overall solution reduces the number of water jets while balancing cleaning effectiveness and equipment flexibility. Attached Figure Description

[0034] Figure 1 A schematic diagram of the upper structure of the main cleaning tank;

[0035] Figure 2 A schematic diagram of the lower structure of the main cleaning tank;

[0036] Figure 3 Side view of the main cleaning tank;

[0037] Figure 4 This is a schematic diagram of the components related to the upper pressure roller;

[0038] Figure 5 This is a schematic diagram of the water jet components.

[0039] Figure 6 This is a schematic diagram of the components related to the liquid level baffle.

[0040] Legend:

[0041] 1. Main cleaning tank; 110. Preliminary cleaning section; 120. Fine cleaning section;

[0042] 2 water jet, 210 upper water jet, 220 lower water jet, 230 spray pipe, 240 water supply pipe, 250 spray nozzle, 260 connecting part, 270 reinforcing rod, 280 retaining ring;

[0043] 3. Upper pressure roller, 310. Center rod, 320. Upper pressure unit, 321. Clamping tooth, 330. Contact ring, 340. Clamping ring, 341. Limiting platform, 342. Ejector screw;

[0044] 4. Liquid level baffle, 410. Fixed plate, 420. Adjusting plate, 430. Adjusting connection part;

[0045] 5 water-blocking rollers;

[0046] 6 transfer wheels;

[0047] 7. Photovoltaic cells. Detailed Implementation

[0048] The present invention will be further described below with reference to the accompanying drawings and specific embodiments. Those skilled in the art will be able to implement the present invention based on these descriptions. Furthermore, the embodiments of the present invention described below are generally only a part of the embodiments of the present invention, and not all of the embodiments. Therefore, all other embodiments obtained by those skilled in the art based on the embodiments of the present invention without inventive effort should fall within the scope of protection of the present invention.

[0049] Example 1

[0050] This embodiment describes a photovoltaic wafer chain cleaning tank. In this embodiment, the cleaning tank is used for the ultrapure water cleaning process after acid etching; therefore, the "cleaning solution" is directly described as "ultrapure water," and the "removed reagent" is described as "acid," to visually demonstrate the structure and operation of the equipment. In other embodiments, the cleaning solution and the removed reagent used in the operation of this equipment can be other reagents.

[0051] Please see Figure 1 , Figure 2The main cleaning tank 1 is equipped with a conveyor wheel 6 and water jets 2. The axis of the conveyor wheel 6 is perpendicular to the delivery direction of the photovoltaic panel 7, and the conveyor wheel 6 rotates around its own axis. The photovoltaic panel 7 is placed horizontally on the conveyor wheel 6, and multiple sets of conveyor wheels 6 rotate in relay to deliver the photovoltaic panel 7 from the right side to the left side as shown in the figure. Multiple sets of water jets 2 are arranged and distributed at different positions along the movement path of the photovoltaic panel 7. The main body of the water jet 2 is a long pipe fixed at both ends to the tank body of the main cleaning tank 1. The surface of the long pipe facing the photovoltaic panel 7 has multiple sets of spray nozzles 250. Specifically, the water jet 2 located above the photovoltaic panel 7 is the upper water jet 210, and the lower surface of the upper water jet 210 has spray nozzles 250, which spray ultrapure water vertically downward to clean the upper surface of the photovoltaic panel 7; the water jet 2 located below the photovoltaic panel 7 is the lower water jet 220, and the upper surface of the lower water jet 220 has spray nozzles 250, which spray ultrapure water vertically upward to clean the lower surface of the photovoltaic panel 7.

[0052] The spraying of the water jet 2 will cause the photovoltaic panel 7 to shake and slip. Therefore, an upper pressure roller 3 is set above the photovoltaic panel 7 to fix the photovoltaic panel 7 in the gap between the upper pressure roller 3 and the conveyor roller 6.

[0053] Please refer to the structure of the upper pressure roller 3. Figure 4 The upper pressure roller 3 includes a central rod 310, an upper pressure unit 320 sleeved on the outside of the central rod 310, and a retaining ring 340 for fixing the upper pressure unit 320. The axis of the central rod 310 is parallel to the axis of the conveyor wheel 6, but the rotation direction is opposite to that of the conveyor wheel 6; the central rod 310 rotates to cooperate with the movement of the photovoltaic cell 7, so that the upper pressure roller 3 and the upper surface of the photovoltaic cell 7 maintain a static friction state. The upper pressure unit 320 is a hollow cylindrical structure with two protruding contact rings 330 on its outer surface. The contact rings 330 are the contact parts between the upper pressure roller 3 and the photovoltaic cell 7, so a flexible material is used. During the cleaning process, the area of ​​the upper pressure roller 3 blocking the photovoltaic cell 7 is limited to the area of ​​action of the contact rings 330, and the cleaning fluid can still fill other areas on the surface of the photovoltaic cell 7 to ensure a thorough cleaning effect. The retaining rings 340 are disposed at both ends of the upper pressing unit 320 along the axial direction. When the retaining rings 340 at both ends of the upper pressing unit 320 are pressed against each other along the axial direction of the upper pressing roller 3, they can restrict the sliding of the upper pressing unit 320 in the axial direction of the upper pressing roller 3.

[0054] In a preferred embodiment, the upper pressing unit 320 has multiple sets of protruding teeth 321 at both ends, and the retaining ring 340 has several recessed limiting platforms 341. The width of the limiting platforms 341 is greater than the width of the teeth 321. A single tooth 321 can move within a small range of circumferential movement within the corresponding limiting platform 341, meaning the pressing ring 330 can rotate independently of the central rod 310 within a small range. Ideally, during operation, the contact position between the pressing ring 330 and the surface of the photovoltaic cell 7 changes constantly, and at each moment, there is only static friction without relative slippage. If the pressing ring 330 slides relative to the surface of the photovoltaic cell 7, it may cause damage to the surface of the photovoltaic cell 7. The allowance design of the limiting platforms 341 allows the pressing ring 330 to have buffer space when rotating with the central rod 310. Once a tendency for relative slippage occurs, it can be adjusted in time to avoid damage to the surface of the photovoltaic cell 7.

[0055] To limit the position of the pressing unit 320 on the central rod 310, the retaining ring 340 itself should have a fixed position. In this embodiment, the retaining ring 340 is fixed to the central rod 310 by a set screw 342. The set screw 342 is detachable, and when the specifications of the photovoltaic cell 7 change, the position of the pressure ring 330 can be adjusted by loosening the set screw 342, moving the retaining ring 340 and the pressing unit 320 on the central rod 310, and then re-tightening the set screw 342.

[0056] To simplify the configuration of the water jet 2, the cleaning process is divided into a coarse cleaning section 110 and a fine cleaning section 120. The two cleaning sections correspond to different physical areas in the main cleaning tank 1, and the areas are separated by liquid level baffles 4.

[0057] In the coarse washing section 110, the washing solution has high fluidity, and the washing away of the chemicals is mainly carried out by spraying. Please refer to [link / reference]. Figure 1 , Figure 3 The coarse washing section 110 has water jets 2 on both the upper and lower sides of the photovoltaic cell 7, and sprays purified water onto the upper and lower surfaces of the photovoltaic cell 7.

[0058] In the fine washing section 120, the cleaning solution has relatively low fluidity, and the cleaning solution is removed using a combination of spraying, soaking, and overflow methods. Please refer to [link / reference]. Figure 1 , Figure 2 Two level baffles 4 and the side wall of the main cleaning tank 1 form a purified water pool. The purified water level overflows the conveyor wheel 6 and submerges the lower surface of the photovoltaic cell 7. The fine washing section 120 is only equipped with an upper water jet 210 and no lower water jet 220. The fluidity of the purified water is lower than that of the coarse washing section 110.

[0059] In a preferred embodiment, the liquid level baffle 4 includes Figure 6The fixed plate 410 and the adjusting plate 420 are shown. The fixed plate 410 is welded to the bottom of the tank, and the adjusting plate 420 is detachably fixed to the fixed plate 410 through the adjusting connection 230. By changing the fixed position of the adjusting plate 420, the height of the liquid level baffle 4 can be adjusted, and finally the liquid level of the purified water can be adjusted.

[0060] Since the number of water jets 2 is relatively reduced, the spraying effect of a single water jet 2 is optimized to compensate for the corresponding cleaning quality.

[0061] Please see Figure 5 Taking the upper water jet 210 as an example, the upper water jet 210 includes a lower spray pipe 230 and an upper water supply pipe 240; spray nozzles 250 are opened on the spray pipe 230, and two connecting parts 260 are provided between the water supply pipe 240 and the spray pipe 230, and the two connecting parts 260 are symmetrically distributed on the spray pipe 230. The water supply equipment is connected to the water supply pipe 240. The supplied water flow first passes through the rectification and distribution of the water supply pipe 240, and then enters the spray pipe 230 through the connecting parts 260, so as to avoid uneven distribution of water pressure and water volume in the spray pipe 230 and improve the stability and balance of the spray liquid flow.

[0062] Since the water jet 2 has a long pipe, there may be a risk of deformation. Therefore, a carbon fiber steel reinforcing rod 270 that is not easily deformed is added inside the spray pipe 230 of the water jet 2. The reinforcing rod 270 is fixed to the inner surface of the spray pipe 230 by a retaining ring 280 to improve the durability of the water jet 2.

[0063] To improve the cleaning rate, the equipment is also equipped with water-blocking rollers 5.

[0064] Please see Figure 1 The water-blocking roller 5 is a cylindrical roller positioned above the photovoltaic panel 7 to clean its upper surface. The surface material of the water-blocking roller 5 can be selected based on the fluidity, acidity, and alkalinity of the cleaning solution, and can be corrosion-resistant engineering plastics, corrosion-resistant sponges, etc. In a preferred embodiment, the water-blocking roller 5 is positioned before the water jet 2 along the movement path of the photovoltaic panel 7; that is, the photovoltaic panel 7 passes the water-blocking roller 5 first, then the water jet 2. The water-blocking roller 5 can quickly and evenly remove the liquid layer carried by the photovoltaic panel 7 from the previous step, allowing the subsequent sprayed liquid to directly contact the surface of the photovoltaic panel 7, thus improving the cleaning efficiency of the spray.

[0065] The sequence of different cleaning stages is designed to improve cleaning efficiency and quality.

[0066] Please see Figure 1The coarse washing section 110 is positioned at the beginning and end of the cleaning process. At the beginning, the coarse washing section 110 rapidly removes surface acid through the fast-flowing water jet 2 and water-blocking rollers 5, reducing the amount of acid carried by the photovoltaic panel 7 when it enters the fine washing section 120 for immersion. This reduces acid contamination of the purified water in the fine washing section 120 and also lowers the cleaning load on the fine washing section 120's spray equipment. At the end, the coarse washing section 110 maintains a rapid flow, ensuring a constantly updated cleaning solution environment on both sides of the photovoltaic panel 7, thus maintaining the cleanliness of the photovoltaic panel 7 surface.

[0067] Example 2

[0068] This embodiment is a photovoltaic wafer chain cleaning device. The device includes the chain cleaning tank described in Embodiment 1, and also includes a cleaning fluid supply device. Part of the outlet pipe of the cleaning fluid supply device is connected to the water supply pipe 240 of the water jet 2, and another part of the outlet pipe is connected to the inlet of the liquid storage structure in the fine cleaning section 120. The cleaning fluid supply device is used to provide the chain cleaning tank with a selectable type of cleaning fluid, such as deionized water, ultrapure water, microbubble cleaning fluid, nanobubble cleaning fluid, or micro / nanobubble cleaning fluid.

[0069] In some embodiments, the cleaning fluid supply device is equipped with a bubble cleaning fluid preparation module. This module uses known techniques such as jet cleaning, pressurized dissolved gas cleaning, gyratory shearing, and collision cleaning to prepare a bubble cleaning fluid from ultrapure water and clean gas (ozone, hydrogen, clean air, nitrogen, or oxygen, etc.). When the average bubble size is less than 1 micrometer, it is a nanobubble cleaning fluid; when the average bubble size is between 1 and 100 micrometers, it is a microbubble cleaning fluid; and when both bubble sizes are mixed, it is a micro-nanobubble cleaning fluid. Besides residual cleaning fluid, the surface of the photovoltaic cells introduced into the chain cleaning tank may also contain oil, metal particles, unreacted silica, etc. Compared to deionized water and purified water, the micro-nanobubble cleaning fluid, nanobubble cleaning fluid, or micro-nanobubble cleaning fluid can further enhance the cleaning effect of the chain cleaning tank.

Claims

1. A chain cleaning tank, characterized in that, include: Water jet (2), the water jet (2) is provided with a spray nozzle (250) for spraying cleaning liquid on the side facing the photovoltaic cell (7); A main cleaning tank (1), wherein the main cleaning tank (1) comprises at least: The coarse washing section (110) is provided with water jets (2) arranged on both sides above and below the photovoltaic cell (7); The fine cleaning section (120) is provided with a liquid storage structure arranged below the photovoltaic cell (7) and a water jet (2) arranged on one side above the photovoltaic cell (7); The chain cleaning tank also includes a conveyor wheel (6) located below the photovoltaic panel (7). Multiple sets of the conveyor wheels (6) work together to form a driving structure for the photovoltaic panel (7) to move in the main cleaning tank (1).

2. The chain cleaning tank according to claim 1, characterized in that, The chain cleaning tank also includes an upper pressure roller (3) disposed above the conveyor wheel (6); the upper pressure roller (3) is provided with a protruding pressure ring (330), and the surface of the pressure ring (330) cooperates with the surface of the conveyor wheel (6) to form a limiting structure for the vertical position of the photovoltaic cell (7).

3. The chain cleaning tank according to claim 2, characterized in that, The upper pressure roller (3) includes: The central rod (310) has a motion trajectory that rotates around its own axis; The upper pressure unit (320) is nested outside the central rod (310), and the pressure ring (330) is fixed to the upper pressure unit (320); A retaining ring (340) is nested outside the center rod (310) and disposed at both ends of the upper pressing unit (320) in the axial direction. The retaining ring (340) constitutes an axial positioning structure for the upper pressing unit (320).

4. The chain cleaning tank according to claim 3, characterized in that, The retaining ring (340) is fixed to the center rod (310) by a set screw.

5. The chain cleaning tank according to claim 3, characterized in that, The retaining ring (340) is provided with multiple sets of recessed limiting platforms (341), and the end of the pressing unit (320) is provided with multiple sets of protruding retaining teeth (321); when the retaining teeth (321) and the limiting platforms (341) are engaged in the axial direction of the central rod (310), the limiting platforms (341) provide space for the retaining teeth (321) to move circumferentially.

6. The chain cleaning tank according to claim 1, characterized in that, The main cleaning tank (1) is provided with multiple sets of liquid level baffles (4), which form a separation structure between the fine cleaning section (120) and the coarse cleaning section (110).

7. The chain cleaning tank according to claim 1, characterized in that, The water jet (2) includes a spray pipe (230) and a water supply pipe (240); the spray nozzle (250) is opened on the spray pipe (230), and multiple connecting parts (260) are provided between the water supply pipe (240) and the spray pipe (230).

8. The chain cleaning tank according to claim 1, characterized in that, The coarse washing section (110) is also provided with a water-blocking roller (5), which is positioned in front of the water jet (2) on the moving path of the photovoltaic cell (7).

9. The chain cleaning tank according to claim 1, characterized in that, The coarse washing section (110) is arranged at least at the beginning and / or end of the movement path of the photovoltaic cell (7).

10. A chain cleaning device, characterized in that, The chain cleaning tank according to any one of claims 1 to 9 further includes a cleaning fluid supply device connected to the chain cleaning tank; the cleaning fluid supply device is used to provide the chain cleaning tank with any one of water, microbubble cleaning fluid, nanobubble cleaning fluid or micro-nano bubble cleaning fluid.

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