A remote plasma source isolation valve for a vapor deposition apparatus

Abstract

The utility model discloses a kind of remote plasma source isolation valves for vapor deposition equipment, including through body, screw rod and rotary cylinder, one side of through body middle part is equipped with joint, one end of screw rod passes through joint and is placed inside through body, and the valve piece is installed on one end of screw rod by screw, connecting block is installed on joint by bolt, the middle part of connecting block is equipped with bearing, bearing is sleeved with screw rod;The utility model passes through the switch action of valve piece, effectively prevent process gas backflow and remote plasma source particulate matter into cavity;Based on the improvement of existing remote plasma source installation base, add rotary cylinder, screw rod and valve piece etc., without complex modification;Close valve when depositing DEP process to protect remote plasma source, open valve when CLEAN process to ensure ionized gas circulation;Reduce pollution and particulate matter accumulation, reduce maintenance frequency and cost.

Description

Technical Field

[0001] This utility model relates to the field of vapor deposition equipment technology, specifically a remote plasma source isolation valve for vapor deposition equipment. Background Technology

[0002] In semiconductor manufacturing, remote plasma sources (RPS) in vapor deposition equipment (such as AMAT's 12-inch HDP equipment) are used to generate ionized gases to clean the process chamber. In traditional designs, the RPS is directly connected to the process chamber via a mounting base, lacking an isolation mechanism.

[0003] Defects and shortcomings of existing technology:

[0004] In the existing technology, the RPS mounting base of AMAT 12-inch HDP equipment only serves as a mounting support and through structure, without an effective isolation device.

[0005] 1. High risk of contamination: During the deposition process (DEP), reaction gases and products may flow back into the RPS, contaminating the RPS and reducing its lifespan.

[0006] 2. Particulate matter entering the cavity: Particulate matter inside the RPS may enter the cavity during process execution, contaminating the wafer and affecting product yield.

[0007] 3. Limited functionality: Existing designs cannot dynamically isolate the RPS from the cavity, resulting in limited process flexibility and equipment performance. Utility Model Content

[0008] The purpose of this invention is to provide a remote plasma source isolation valve for vapor deposition equipment to solve the problems mentioned in the background art.

[0009] To achieve the above objectives, this utility model provides the following technical solution: a remote plasma source isolation valve for a vapor deposition equipment, comprising a through body, a lead screw, and a rotary cylinder. A connector is provided on one side of the middle of the through body. One end of the lead screw passes through the connector and is placed inside the through body. A valve plate is installed on one end of the lead screw by a screw. A connecting block is installed on the connector by bolts. A bearing is installed in the middle of the connecting block. The bearing is sleeved with the lead screw. A connecting sleeve is provided at the other end of the lead screw. The connecting sleeve is snapped and fixed to the output end of the rotary cylinder. A cylinder fixing connecting block is installed on the rotary cylinder by bolts. Multiple cylinder fixing supports are inserted between the connecting block and the cylinder fixing connecting block.

[0010] In the initial state: the valve is in the open position, ensuring communication between the remote plasma source and the chamber. During the DEP deposition process: the equipment control system sends a signal, which is read by the solenoid valve and converted into an opening action of compressed air. The compressed air drives the rotary cylinder to close the valve, preventing gas backflow and particulate matter from entering. During the CLEAN process: the solenoid valve receives a signal and adjusts the direction of the compressed air. Driven by the compressed air, the rotary cylinder opens the valve, allowing ionized cleaning gas to smoothly enter the chamber.

[0011] Preferably, a Teflon gasket and a sealing ring are fitted at the connection position inside the joint where the lead screw is placed. The Teflon gasket is located between the sealing ring and the through-body passage to protect the sealing ring from ion corrosion generated by the remote plasma source RPS. The sealing ring is installed at the connection position inside the joint where the lead screw passes through the middle to achieve a vacuum seal.

[0012] Preferably, the upper side of the penetrating body is connected to a remote plasma source, and the lower side of the penetrating body is connected to a process cavity.

[0013] Preferably, the valve plate is located in the through-body passage, and the valve plate is made of aerospace aluminum.

[0014] Preferably, the rotary cylinder drives the lead screw to rotate via air pressure, and the lead screw drives the valve plate to achieve a 90° opening and closing action.

[0015] Compared with the prior art, the beneficial effects of this utility model are:

[0016] This invention effectively prevents process gas backflow and the entry of particles from the remote plasma source into the cavity through the opening and closing action of the valve plate. Based on the existing remote plasma source mounting base, it improves upon it by adding a rotary cylinder, lead screw, and valve plate, without requiring complex modifications. During the DEP deposition process, the valve is closed to protect the remote plasma source, and during the CLEAN process, the valve is opened to ensure the flow of ionized gas. This reduces pollution and particle accumulation, and lowers maintenance frequency and costs. Attached Figure Description

[0017] Figure 1 This is a schematic diagram of the structure of the present invention. Figure 1 ;

[0018] Figure 2 This is a schematic diagram of the structure of the present invention. Figure 2 ;

[0019] Figure 3 This is a schematic diagram of the exploded structure of this utility model;

[0020] Figure 4 This is a schematic diagram of the cross-sectional structure of this utility model.

[0021] In the diagram: 1. Through body; 2. Valve plate; 3. Screw; 4. Lead screw; 5. Cylinder fixing support; 6. Connecting sleeve; 7. Teflon gasket; 8. Sealing ring; 9. Connecting block; 10. Bearing; 11. Cylinder fixing connecting block; 12. Rotary cylinder; 13. Connector. Detailed Implementation

[0022] The technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present invention.

[0023] Please see Figure 1-4 This utility model provides a remote plasma source isolation valve for a vapor deposition equipment, including a through body 1, a lead screw 4, and a rotary cylinder 12. A connector 13 is provided on one side of the middle of the through body 1. One end of the lead screw 4 passes through the connector 13 and is placed inside the through body 1. A valve plate 2 is installed on one end of the lead screw 4 by a screw 3. A connecting block 9 is installed on the connector 13 by bolts. A bearing 10 is installed in the middle of the connecting block 9 and is sleeved with the lead screw 4. A connecting sleeve 6 is provided on the other end of the lead screw 4. The connecting sleeve 6 is snapped and fixed to the output end of the rotary cylinder 12. A cylinder fixing connecting block 11 is installed on the rotary cylinder 12 by bolts. Multiple cylinder fixing supports 5 are inserted between the connecting block 9 and the cylinder fixing connecting block 11.

[0024] Specifically, this invention relates to a remote plasma source isolation valve for a vapor deposition (VDC) system. Based on the original AMAT 12-inch HD equipment's RPS mounting base (left-side through-body), a butterfly valve structure is added. The butterfly valve structure includes a rotary cylinder 12, a lead screw 4, and a valve plate 2. The rotary cylinder 12 is connected to the lead screw 4, and the end of the lead screw 4 furthest from the rotary cylinder 12 is connected to the valve plate 2 located on the passageway (the passageway formed by the left-side through-body). The rotation of the rotary cylinder 12 drives the lead screw 4 to rotate, which in turn drives the valve plate 2 to rotate, thus opening and closing the valve plate 2 on the passageway, thereby achieving isolation and communication between the remote plasma source (RPS) and the process chamber.

[0025] A Teflon gasket 7 and a sealing ring 8 are fitted at the connection position inside the connector 13, with the Teflon gasket 7 located between the sealing ring 8 and the passage of the through body 1.

[0026] Specifically, the Teflon gasket 7 protects the sealing ring 8 from ion corrosion generated by the remote plasma source RPS. The sealing ring 8 is installed at the connection position where the lead screw 4 is placed inside the connector 13, and the lead screw 4 passes through the middle to achieve the function of vacuum sealing.

[0027] The upper side of the penetrating body 1 is connected to a remote plasma source, and the lower side of the penetrating body 1 is connected to the process chamber.

[0028] Specifically, the upper side of the through-body 1 is closely connected to the remote plasma source to ensure a stable supply of plasma; while the lower side is seamlessly connected to the process chamber to provide the necessary reaction environment for the vapor deposition process.

[0029] Valve plate 2 is located in the passage of the through body 1, and valve plate 2 is made of aviation aluminum.

[0030] Specifically, valve plate 2 is made of aerospace aluminum, which not only has a light weight, but also has good mechanical properties and corrosion resistance. It can withstand certain pressure and temperature changes in the vapor deposition equipment, ensuring the stability and reliability of the valve.

[0031] The rotary cylinder 12 drives the lead screw 4 to rotate via air pressure, and the lead screw 4 drives the valve plate 2 to achieve a 90° opening and closing action.

[0032] Working principle: Initially, valve 2 is in the open position, ensuring communication between the remote plasma source and the cavity. During the DEP deposition process, the equipment control system sends a signal, which is read by the solenoid valve and converted into an opening action of compressed air. The compressed air drives the rotary cylinder 12 to close valve 2, preventing gas backflow and particulate matter from entering. During the CLEAN process, the solenoid valve receives a signal and adjusts the direction of the compressed air. Driven by the compressed air, the rotary cylinder 12 opens valve 2, allowing ionized cleaning gas to smoothly enter the cavity.

[0033] Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments or make equivalent substitutions for some of the technical features. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention should be included within the protection scope of the present invention.

Claims

1. A remote plasma source isolation valve for a vapor deposition apparatus, comprising a through-body (1), a lead screw (4), and a rotary cylinder (12), characterized in that, A connector (13) is provided on one side of the middle part of the through body (1). One end of the lead screw (4) passes through the connector (13) and is placed inside the through body (1). A valve plate (2) is installed on one end of the lead screw (4) by a screw (3). A connecting block (9) is installed on the connector (13) by a bolt. A bearing (10) is installed in the middle of the connecting block (9). The bearing (10) is sleeved with the lead screw (4). A connecting sleeve (6) is provided on the other end of the lead screw (4). The connecting sleeve (6) is clamped and fixed to the output end of the rotary cylinder (12). A cylinder fixing connecting block (11) is installed on the rotary cylinder (12) by a bolt. Multiple cylinder fixing supports (5) are inserted between the connecting block (9) and the cylinder fixing connecting block (11).

2. The remote plasma source isolation valve for a vapor deposition equipment according to claim 1, characterized in that: The lead screw (4) is fitted with a Teflon gasket (7) and a sealing ring (8) at the connection position inside the connector (13). The Teflon gasket (7) is located between the sealing ring (8) and the passage of the through body (1).

3. The remote plasma source isolation valve for a vapor deposition equipment according to claim 1, characterized in that: The upper side of the penetrating body (1) is connected to a remote plasma source, and the lower side of the penetrating body (1) is connected to the process cavity.

4. A remote plasma source isolation valve for a vapor deposition equipment according to claim 1, characterized in that: The valve plate (2) is located in the passage of the through body (1), and the valve plate (2) is made of aviation aluminum.

5. A remote plasma source isolation valve for a vapor deposition equipment according to claim 1, characterized in that: The rotary cylinder (12) drives the lead screw (4) to rotate by air pressure, and the lead screw (4) drives the valve plate (2) to achieve a 90° switching action.

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