Gas outlet device and plasma processing apparatus

Abstract

This utility model discloses a gas exhaust device and a plasma processing equipment, relating to the technical field of plasma processing equipment. The gas exhaust device is used in a plasma processing equipment, which includes a main body with a process chamber. The gas exhaust device includes a bottom shell and a diffuser plate. The bottom shell includes a bottom plate and a side plate, which enclose a gas chamber with a first opening. The diffuser plate covers the first opening. The diffuser plate has multiple diffusion holes for gas exhaust from the process chamber, and the side plate has a first gas outlet communicating with the gas chamber. The technical solution of this utility model, by incorporating a bottom shell and a diffuser plate into the gas exhaust device, allows the gas within the process chamber to be exhausted through the diffusion holes on the diffuser plate when the gas exhaust device is installed in the process chamber. This results in a more uniform plasma distribution within the process chamber, improving the processing efficiency of the plasma processing equipment.

Description

Technical Field

[0001] This utility model relates to the field of plasma processing equipment technology, and in particular to a gas outlet device and a plasma processing equipment. Background Technology

[0002] Plasma processing equipment is used to process the surfaces of integrated circuits, integrated optical circuits, and various solid-state electronic devices. The equipment combines ionized plasma with the surface of the workpiece to be processed, causing a reaction that produces volatile substances. These substances are then removed by vacuum, ultimately completing the surface treatment. However, many existing plasma processing devices suffer from uneven plasma distribution within the processing chamber, resulting in low processing efficiency for the workpieces. Utility Model Content

[0003] The main purpose of this utility model is to propose an exhaust device and a plasma processing equipment, which aims to improve the processing efficiency of plasma processing equipment on workpieces.

[0004] To achieve the above objectives, the present invention proposes a gas outlet device for use in plasma processing equipment. The plasma processing equipment includes a main body with a process chamber. The gas outlet device includes a bottom shell and a diffuser plate. The bottom shell includes a bottom plate and a side plate. The bottom plate is installed on the main body and is located on the gas outlet side of the process chamber. The bottom plate and the side plate enclose a gas chamber with a first opening. The diffuser plate covers the first opening. The diffuser plate is provided with a plurality of diffusion holes for the gas to be discharged from the process chamber. The side plate is provided with a first gas outlet communicating with the gas chamber.

[0005] In one embodiment, the air outlet device further includes a support plate connected to the bottom plate and side plate of the bottom shell, and the support plate has a second air outlet communicating with the first air outlet.

[0006] In one embodiment, the side plate has a first sidewall, the first air outlet is formed on the first sidewall, the support plate extends axially along the diffuser hole, the support plate is attached to and connected to the first sidewall, and the second air outlet corresponds to the position of the first air outlet.

[0007] In one embodiment, the plurality of diffusion holes are arranged at intervals along a first direction to form multiple rows of diffusion hole groups, each row of the diffusion hole group including a plurality of diffusion holes spaced at intervals along a second direction, wherein the first direction and the second direction intersect.

[0008] In one embodiment, the diameter of the diffusion hole is 4 mm to 6 mm.

[0009] In one embodiment, a connecting groove is provided on the side of the support plate opposite to the diffuser plate, and the connecting groove is connected to the second air outlet.

[0010] In one embodiment, the air outlet device further includes a mounting member, which is disposed on the side of the support plate near the diffuser plate and corresponds to the position of the second air outlet. The mounting member has a through groove extending along the extension direction of the diffuser plate, and the diffuser plate and the bottom shell are inserted into the through groove at the ends near the first air outlet.

[0011] This utility model also proposes a plasma processing device, comprising: a main body and a gas outlet device. The main body has a process cavity and a gas inlet and a gas outlet communicating with the process cavity. The main body includes an inlet side plate and an outlet side plate arranged opposite to each other along a first direction. The gas inlet is opened on the inlet side plate, and the gas outlet is opened on the outlet side plate. The gas outlet device is disposed in the process cavity and is located on the side of the process cavity near the gas outlet. The gas outlet device is any of the gas outlet devices described above. The diffusion holes of the diffusion plate allow the gas in the process cavity to be discharged.

[0012] In one embodiment, the process cavity has an inlet cavity and an outlet cavity that are arranged opposite to each other along a first direction and are interconnected. The inlet cavity is located on the side of the process cavity near the gas inlet and is connected to the gas inlet. The outlet cavity is located on the side of the process cavity near the gas outlet and is connected to the gas outlet. The outlet device is located in the outlet cavity.

[0013] In one embodiment, the system further includes a carrier disposed within the process cavity. Two carriers are disposed opposite each other along a first direction, one of which is disposed in the air inlet cavity and the other in the air outlet cavity.

[0014] The technical solution of this utility model adopts a bottom shell and a diffuser plate in the gas outlet device. The bottom shell includes a bottom plate and a side plate. The bottom plate is used to install on the main body and is located on the gas outlet side of the process cavity. The bottom plate and the side plate enclose a gas chamber with a first opening. The diffuser plate covers the first opening. The diffuser plate is provided with a plurality of diffusion holes for the gas to be discharged from the process cavity. The side plate is provided with a first gas outlet communicating with the gas chamber. When the gas outlet device is installed in the process cavity, the gas in the process cavity can be discharged from the cavity through the diffusion holes on the diffuser plate. When the gas in the process cavity is discharged through the diffusion holes, it is dispersed by the large-area diffusion holes, thereby making the plasma distribution in the process cavity more uniform. This avoids the impact on the processing quality of the workpiece due to uneven plasma distribution in the cavity, and improves the processing efficiency of the plasma processing equipment. Attached Figure Description

[0015] To more clearly illustrate the technical solutions in the embodiments of this utility model or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on the structures shown in these drawings without creative effort.

[0016] Figure 1 A front view of the structure of an embodiment of the air outlet device provided by this utility model;

[0017] Figure 2 for Figure 1 A magnified view of a section at point A in the middle;

[0018] Figure 3 for Figure 1 A magnified view of a section at point B in the middle;

[0019] Figure 4 A top view of an embodiment of the air outlet device provided by this utility model;

[0020] Figure 5 A schematic diagram of the structure of an embodiment of the plasma processing equipment provided by this utility model;

[0021] Figure 6 for Figure 5 Sectional view at point AA;

[0022] Figure 7 for Figure 6 Enlarged view of point C in the middle.

[0023] Explanation of icon numbers:

[0024] 100. Exhaust device; 1. Bottom shell; 11. Bottom plate; 12. Side plate; 121. First exhaust port; 13. Gas chamber; 2. Diffuser plate; 21. Diffuser hole; 3. Support plate; 31. Second exhaust port; 32. Connecting groove; 4. Mounting component; 200. Main body; 201. Inlet side plate; 202. Exhaust side plate; 203. Inlet chamber; 204. Exhaust chamber; 205. Carrier.

[0025] The realization of the purpose, functional features and advantages of this utility model will be further explained in conjunction with the embodiments and with reference to the accompanying drawings. Detailed Implementation

[0026] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of the present utility model.

[0027] It should be noted that if the embodiments of this utility model involve directional indicators (such as up, down, left, right, front, back, etc.), the directional indicators are only used to explain the relative positional relationship and movement of the components in a specific posture. If the specific posture changes, the directional indicators will also change accordingly.

[0028] Furthermore, if the embodiments of this utility model involve descriptions such as "first" or "second," these descriptions are for descriptive purposes only and should not be construed as indicating or implying their relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined with "first" or "second" may explicitly or implicitly include at least one of those features. Additionally, the use of "and / or" or "and / or" throughout the text includes three parallel solutions. For example, "A and / or B" includes solution A, solution B, or a solution where both A and B are satisfied simultaneously. Furthermore, the technical solutions of the various embodiments can be combined with each other, but this must be based on the ability of those skilled in the art to implement them. When the combination of technical solutions is contradictory or impossible to implement, it should be considered that such a combination of technical solutions does not exist and is not within the scope of protection claimed by this utility model.

[0029] This utility model proposes an air outlet device 100.

[0030] Please see Figures 1 to 7 In one embodiment of this utility model, the gas outlet device 100 is used in a plasma processing device. The plasma processing device includes a main body 200 with a process cavity. The gas outlet device 100 includes a bottom shell 1 and a diffuser plate 2. The bottom shell 1 includes a bottom plate 11 and a side plate 12. The bottom plate 11 is installed on the main body 200 and is located on the gas outlet side of the process cavity. The bottom plate 11 and the side plate 12 enclose a gas chamber 13 with a first opening. The diffuser plate 2 covers the first opening. The diffuser plate 2 is provided with a plurality of diffuser holes 21 for the gas to be discharged from the process cavity. The side plate 12 is provided with a first gas outlet 121 communicating with the gas chamber 13.

[0031] In this embodiment, the gas exhaust device 100 is used in the plasma processing equipment, specifically to cover the gas outlet of the process chamber in the plasma processing equipment. This allows the gas generated by the reaction within the process chamber to be discharged through the gas exhaust device 100 when it exits the process chamber. When the gas generated within the process chamber is discharged, the gas exhaust device 100 can disperse the gas, thereby making the gas molecules in the process chamber more dispersed and the plasma more evenly distributed within the process chamber. This allows the workpiece to be processed in a more uniform plasma environment, thereby improving the processing quality and efficiency of the workpiece. The gas exhaust device 100 includes a bottom shell 1 and a diffuser plate 2. The bottom shell and the diffuser plate 2 enclose a gas chamber 13. The byproduct gas produced by the reaction enters the gas chamber 13 through the diffusion holes 21 on the diffuser plate 2 and is discharged through the first gas outlet 121 of the gas chamber 13. The first gas outlet 121 is connected to the gas outlet of the process chamber, and the gas exits the process chamber sequentially through the first gas outlet 121 and the gas outlet. Multiple diffusion holes 21 are spaced apart on the diffusion plate 2, and each diffusion hole 21 is smaller in size, so that the gas is diffused when it enters the gas chamber 13 through the diffusion holes 21, which drives the gas flow in the process chamber. The gas composition in the process chamber is more evenly distributed with the gas flow, thus improving the processing efficiency of the workpiece.

[0032] The technical solution of this utility model adopts a bottom shell 1 and a diffuser plate 2 in the gas outlet device 100. The bottom shell 1 includes a bottom plate 11 and a side plate 12. The bottom plate 11 is used to install on the main body 200 and is located on the gas outlet side of the process cavity. The bottom plate 11 and the side plate 12 enclose a gas chamber 13 with a first opening. The diffuser plate 2 covers the first opening. The diffuser plate 2 is provided with a plurality of diffuser holes 21 for the gas to be discharged from the process cavity. The side plate 12 is provided with a first gas outlet 121 communicating with the gas chamber 13. When the gas outlet device 100 is installed in the process cavity, the gas in the process cavity can be discharged from the cavity through the diffuser holes 21 on the diffuser plate 2. When the gas in the process cavity is discharged through the diffuser holes 21, it will be dispersed by the large area of ​​the diffuser holes 21, thereby making the plasma distribution in the process cavity more uniform. This avoids the impact on the processing quality of the workpiece due to uneven plasma distribution in the cavity, and improves the processing efficiency of the plasma processing equipment.

[0033] In one embodiment, the gas outlet device 100 further includes a support plate 3, which is connected to the bottom plate 11 and side plate 12 of the bottom shell 1. The support plate 3 has a second gas outlet 31 communicating with the first gas outlet 121. The support plate 3 supports the gas outlet device 100 and is perpendicular to the gas outlet device 100. The gas outlet device 100 can be suspended at a predetermined height in the process cavity by the support plate 3. The second gas outlet 31 communicating with the first gas outlet 121 is provided on the support plate 3 so that gas can be discharged from the process cavity through the second gas outlet 31. The bottom plate 11 and side plate 12 can be installed on one side of the support plate 3 by welding.

[0034] In one embodiment, the side plate 12 has a first sidewall, the first air outlet 121 is formed on the first sidewall, the support plate 3 extends axially along the diffuser hole 21, the support plate 3 is attached to and connected to the first sidewall, and the second air outlet 31 corresponds to the position of the first air outlet 121. In this embodiment, the base plate 11 is rectangular, and the side plate 12 includes a first sidewall, a second sidewall, a third sidewall, and a fourth sidewall. The first sidewall, the second sidewall, the third sidewall, and the fourth sidewall are sequentially arranged around the rectangular base plate 11. The first sidewall is located on the side of the rectangular base plate 11 closest to the support plate 3, the first air outlet 121 is formed on the first sidewall, and the support plate 3 is attached to the side of the first sidewall away from the diffuser plate 2. In another embodiment, the first air outlet 121 can also be provided through the first side wall, that is, only the second side wall, the third side wall and the fourth side wall are provided; so that the bottom shell 1 and the diffuser plate 2 form a cavity structure with an opening facing the support plate 3, and the support plate 3 is sealed at the opening to save material costs.

[0035] In one embodiment, the plurality of diffusion holes 21 are arranged in multiple rows of diffusion hole groups along a first direction, and each row of the diffusion hole groups includes a plurality of diffusion holes 21 spaced apart along a second direction, wherein the first direction and the second direction intersect. The diffusion holes 21 are arranged in multiple rows of diffusion hole groups along the first direction, and each row of the diffusion hole groups includes a plurality of diffusion holes 21 spaced apart along the second direction, such that the plurality of diffusion holes 21 are arranged in a matrix, which facilitates the machine to open the diffusion holes 21 on the diffusion plate 2, thereby also facilitating the mass production of the diffusion plate 2.

[0036] In one embodiment, the diameter of the diffusion hole 21 is 4 mm to 6 mm. In this embodiment, the diameter of the diffusion hole 21 is set to 5 mm so that the diffusion hole 21 can diffuse the gas without affecting the gas outlet, thereby making the plasma distribution in the process chamber more uniform.

[0037] In one embodiment, the support plate 3 has a connecting groove 32 on the side opposite to the diffuser plate 2, and the connecting groove 32 is connected to the second gas outlet 31. The connecting groove 32 is used to connect the second gas outlet 31 and the gas outlet of the process chamber. The connecting groove 32 has a large opening area. When there is more than one gas outlet in the process chamber or the outlet is large in size, the connecting groove 32 can completely cover multiple gas outlets or outlets with a large area, so that the gas in the process chamber is discharged only through the diffuser in the gas outlet device 100 and not discharged from other outlets. This ensures that the plasma in the process chamber can be evenly distributed during workpiece processing, thereby improving the processing efficiency of the plasma treatment equipment for workpieces.

[0038] In one embodiment, the air outlet device 100 further includes a mounting member 4, which is disposed on the side of the support plate 3 near the diffuser plate 2 and corresponds to the position of the second air outlet 31. The mounting member 4 has a through groove extending along the extension direction of the diffuser plate 2, and the diffuser plate 2 and the bottom shell 1 are inserted into the through groove at the end near the first air outlet 121. Mounting member 4 is used to support diffuser plate 2 and bottom shell 1, so that diffuser plate 2 and bottom shell 1 can be set perpendicularly to support plate 3 through mounting member 4. In this embodiment, mounting member 4 has a through groove extending along the extension direction of diffuser plate 2, so that mounting member 4 forms a hollow rectangular cylindrical structure. The area of ​​the through groove is larger than the area of ​​second gas outlet 31, so that the rectangular cylindrical structure can surround the second gas outlet 31, preventing the gas in the process chamber from flowing out without passing through diffuser hole 21. Mounting member 4 is set corresponding to second gas outlet 31. The ends of diffuser plate 2 and bottom shell 1 near the first opening are inserted into rectangular cylindrical structure and sealed by welding to mounting member 4, so that the gas in the process chamber flows out through diffuser hole 21 in gas outlet device 100, thereby improving the processing efficiency of plasma processing equipment on workpiece.

[0039] This utility model also proposes a plasma processing device, which includes a main body 200 and a gas outlet device 100. The specific structure of the gas outlet device 100 is as described in the above embodiments. Since this plasma processing device adopts all the technical solutions of all the above embodiments, it has at least all the beneficial effects brought about by the technical solutions of the above embodiments, and will not be described in detail here. The plasma processing device includes: a main body 200 and a gas outlet device 100. The main body 200 has a process cavity and a gas inlet and a gas outlet communicating with the process cavity. The main body 200 includes an inlet side plate 201 and an outlet side plate 202 arranged opposite to each other along a first direction. The gas inlet is opened on the inlet side plate 201, and the gas outlet is opened on the outlet side plate 202. The gas outlet device 100 is disposed in the process cavity, located on the side of the process cavity near the gas outlet. The gas outlet device 100 is any of the gas outlet devices described above. The diffusion holes 21 of the diffusion plate 2 allow the gas from the process cavity to be discharged. The process chamber is used for etching or deposition processes on the workpiece. The gas outlet 100 is located in the process chamber and seals the gas outlet, so that the by-product gas generated in the process chamber flows out through the gas outlet 100. As a result, the plasma in the process chamber is more evenly distributed, thereby improving the processing efficiency of the plasma processing equipment on the workpiece.

[0040] In one embodiment, the process chamber has an inlet chamber 203 and an outlet chamber 204 that are arranged opposite to each other along a first direction and are interconnected. The inlet chamber 203 is located on the side of the process chamber near the gas inlet and is connected to the gas inlet. The outlet chamber 204 is located on the side of the process chamber near the gas outlet and is connected to the gas outlet. The outlet device 100 is located within the outlet chamber 204. In this embodiment, considering the flow field distribution, the outlet device 100 is only located in the outlet chamber 204. The diffuser hole 21 is not provided on the side of the inlet chamber 203 closest to the inlet to prevent the gas from being drawn away by the extraction device at the gas outlet before the gas is activated.

[0041] In one embodiment, a carrier 205 is further included. The carrier 205 is disposed within the process chamber. Two carriers 205 are arranged opposite each other along a first direction, one carrier 205 being disposed in the air inlet chamber 203 and the other carrier 205 being disposed in the air outlet chamber 204. In this embodiment, the carrier 205 is a graphite boat, a support tool made of graphite material. It can support the workpiece to be processed in process environments requiring high temperature, corrosiveness, or high purity, allowing the workpiece to be processed within the process chamber. The above description is merely an exemplary embodiment of this utility model and does not limit the patent scope of this utility model. Any equivalent structural transformations made based on the technical concept of this utility model and the contents of this utility model's specification and drawings, or direct / indirect applications in other related technical fields, are included within the patent protection scope of this utility model.

Claims

1. A gas outlet device for use in a plasma processing apparatus, the plasma processing apparatus comprising a main body having a process chamber, characterized in that, The air outlet device includes: A bottom shell, including a bottom plate and side plates, wherein the bottom plate is mounted on the main body and located on the gas outlet side of the process cavity, and the bottom plate and side plates enclose a gas chamber having a first opening; and A diffuser plate is provided, which covers the first opening; the diffuser plate is provided with a plurality of diffuser holes for the gas to be discharged from the process chamber, and the side plate is provided with a first gas outlet communicating with the gas chamber.

2. The air outlet device as described in claim 1, characterized in that, The air outlet device also includes a support plate, which is connected to the bottom plate and side plate of the bottom shell, and the support plate has a second air outlet that communicates with the first air outlet.

3. The air outlet device as described in claim 2, characterized in that, The side plate has a first side wall, the first air outlet is opened on the first side wall, the support plate extends along the axial direction of the diffuser hole, the support plate is attached to and connected to the first side wall, and the second air outlet corresponds to the position of the first air outlet.

4. The air outlet device as described in any one of claims 1 to 3, characterized in that, The plurality of diffusion holes are arranged in multiple rows of diffusion hole groups at intervals along a first direction, and each row of the diffusion hole groups includes a plurality of diffusion holes spaced apart along a second direction, wherein the first direction and the second direction intersect.

5. The air outlet device as described in claim 4, characterized in that, The diameter of the diffusion hole is 4 mm to 6 mm.

6. The air outlet device as described in claim 2, characterized in that, The support plate also has a connecting groove on the side opposite to the diffuser plate, and the connecting groove is connected to the second air outlet.

7. The air outlet device as described in claim 2, characterized in that, The air outlet device also includes a mounting component, which is located on the side of the support plate near the diffuser plate and corresponds to the position of the second air outlet. The mounting component has a through groove extending along the extension direction of the diffuser plate, and the diffuser plate and the bottom shell are inserted into the through groove at the ends near the first air outlet.

8. A plasma processing device, characterized in that, include: The main body has a process cavity and a gas inlet and a gas outlet communicating with the process cavity. The main body includes an inlet side plate and an outlet side plate disposed opposite to each other along a first direction. The gas inlet is located on the inlet side plate, and the gas outlet is located on the outlet side plate. A gas outlet device is provided in the process chamber, the gas outlet device is located on the side of the process chamber near the gas outlet, the gas outlet device is the gas outlet device as described in any one of claims 1 to 7, and the diffusion holes of the diffusion plate allow the gas in the process chamber to be discharged.

9. The plasma processing apparatus as described in claim 8, characterized in that, The process chamber has an inlet chamber and an outlet chamber that are arranged opposite to each other along a first direction and are interconnected. The inlet chamber is located on the side of the process chamber near the gas inlet and is connected to the gas inlet. The outlet chamber is located on the side of the process chamber near the gas outlet and is connected to the gas outlet. The outlet device is located in the outlet chamber.

10. The plasma processing apparatus as described in claim 9, characterized in that, It also includes a carrier, which is disposed in the process cavity. Two carriers are arranged opposite each other along a first direction, one of which is disposed in the air inlet cavity and the other of which is disposed in the air outlet cavity.

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