Chemical vapor deposition apparatus with exhaust treatment structure

Abstract

The utility model discloses a chemical vapor deposition device with tail gas treatment structure relates to chemical vapor deposition technical field, tar is gathered on the condensing plate easily causes the condensing plate to the cooling effect of tail gas to be worse, leads to tar subsequent processing efficiency to be low, does not carry out the recycling of the waste heat in tail gas, and the practicability is low problem, present the following scheme, including chemical vapor deposition furnace body, the tail gas exhaust end of chemical vapor deposition furnace body is equipped with mounting mechanism, the mounting mechanism includes the mounting box and mounting frame through bolt connection on the one side outer wall of chemical vapor deposition furnace body. The utility model can carry out primary filtration treatment to the tail gas that chemical vapor deposition furnace body emits, prevents a large number of tar from being attached on the heat exchange plate and causes the cooling effect to be worse, improves tar processing efficiency, can carry out the recycling of residual heat in tail gas, and the recycled heat is used again, improves the practicability.

Description

Technical Field

[0001] This utility model relates to the field of chemical vapor deposition technology, and in particular to a chemical vapor deposition apparatus with a tail gas treatment structure. Background Technology

[0002] Chemical vapor deposition is a chemical technology that uses one or more gaseous compounds or elements containing thin film elements to chemically react on a substrate surface to form a thin film. During the operation of a chemical vapor deposition furnace, it is necessary to treat the tail gas containing tar.

[0003] A search revealed a Chinese patent (application number "202122834054.6") disclosing "a tail gas treatment device for a chemical vapor deposition furnace." This tail gas treatment device includes a shell and a top cover. The shell contains a condensation chamber, and the top of the shell has an opening communicating with the condensation chamber. The top cover covers the opening. The shell has an air inlet and an exhaust outlet communicating with the condensation chamber on opposite sides. A condensation plate is provided on the side of the top cover facing the condensation chamber, extending into the condensation chamber and located between the air inlet and the exhaust outlet. However, the above-mentioned tail gas treatment device has the following problems during use:

[0004] 1. The tar in the exhaust gas from the chemical vapor deposition furnace was not filtered. The tar accumulated on the condenser plate, which easily reduced the cooling effect of the condenser plate on the exhaust gas, resulting in low efficiency of subsequent tar treatment.

[0005] 2. It does not recover the residual heat from the exhaust gas, making it impractical. Utility Model Content

[0006] This invention provides a chemical vapor deposition apparatus with an exhaust gas treatment structure, which solves the problems of the exhaust gas treatment apparatus proposed in the prior art, where tar accumulates on the condenser plate during exhaust gas treatment, which easily leads to a decrease in the cooling effect of the condenser plate on the exhaust gas, resulting in low efficiency of subsequent tar treatment, lack of recovery of residual heat in the exhaust gas, and low practicality.

[0007] To achieve the above objectives, the present invention adopts the following technical solution:

[0008] A chemical vapor deposition (CVD) apparatus with a tail gas treatment structure includes a CVD furnace body. The tail gas discharge end of the CVD furnace body is equipped with an installation mechanism. The installation mechanism includes an installation box bolted to an outer wall of one side of the CVD furnace body and an installation frame bolted to an inner wall of the installation box. A filtration mechanism is located on the upper part of the installation box. The filtration mechanism includes a fixing frame with an installation opening on one side of the outer wall and a ceramic filter plate fitted into the installation opening. A heat exchange assembly is located inside the installation box. The heat exchange assembly includes a connecting plate, several corrugated heat exchange plates, and several corrugated heat dissipation plates. A collection assembly is located below the installation box, and a fan is located below the installation box. A recovery assembly is located above the installation box. The recovery assembly includes a conical reflux hood, an installation ring embedded in the reflux hood, and a filter screen embedded in the installation ring.

[0009] Preferably, an upper cover plate is bolted to the top outer wall of the mounting box, and a lower cover plate is bolted to the bottom outer wall of the mounting box.

[0010] Preferably, the fixing frame is bolted to the top outer wall of the upper cover plate, and a box cover is bolted to the top outer wall of the fixing frame. A tail gas pipe is fixed on the outer wall of the box cover, and one end of the tail gas pipe is connected to the outer wall of the tail gas discharge pipe of the chemical vapor deposition furnace body by a clamp. A fixing plate is bolted to one side outer wall of the ceramic filter plate, and the fixing plate is bolted to one side outer wall of the fixing frame.

[0011] Preferably, the connecting plate is embedded in the inner wall of the mounting frame, the heat exchange plate is fixed on the outer wall of one side of the connecting plate, and the heat dissipation plate is fixed on the outer wall of the connecting plate away from the heat exchange plate.

[0012] The above scheme involves discharging the exhaust gas into a fixed frame through the exhaust outlet of the chemical vapor deposition furnace body, and using a ceramic filter plate to adsorb the tar in the exhaust gas in the upper space of the fixed frame.

[0013] Preferably, the collection assembly includes a flow guide shroud bolted to the bottom outer wall of the lower cover plate and a collection box embedded in the bottom inner wall of the flow guide shroud, with several exhaust holes on the upper two outer walls of the collection box.

[0014] Preferably, the fan is bolted to the bottom outer wall of the lower cover plate, and the lower cover plate has a ventilation opening on the outer wall near the fan.

[0015] Preferably, the reflux hood is bolted to the top outer wall of the upper cover plate, and a recovery pipe is fixed on the top inner wall of the reflux hood, with one end of the recovery pipe connected to the interior of the chemical vapor deposition furnace body.

[0016] The above scheme uses multiple heat exchange plates to exchange heat with the filtered exhaust gas. The heat exchange plates then transfer the heat to the connecting plate and multiple heat dissipation plates. The wavy heat exchange plates reduce the movement speed of the exhaust gas, allowing the heat exchange plates to fully exchange heat with the residual heat in the exhaust gas. This also lowers the temperature of the tar in the exhaust gas and causes it to adhere to the heat exchange plates. The fan operates to discharge the heat from the heat dissipation plates into the return hood, and the recovery pipe delivers the hot air to the main body of the chemical vapor deposition furnace.

[0017] The beneficial effects of this utility model are as follows:

[0018] 1. The exhaust outlet of the chemical vapor deposition furnace body discharges the exhaust gas into the fixed frame. The ceramic filter plate adsorbs the tar in the exhaust gas in the upper space of the fixed frame, which can perform primary filtration of the exhaust gas discharged from the chemical vapor deposition furnace body, prevent a large amount of tar from adhering to the heat exchange plate and causing poor cooling effect, and improve the tar treatment efficiency.

[0019] 2. Multiple heat exchange plates exchange heat with the filtered exhaust gas. The heat exchange plates then transfer the heat to the connecting plate and multiple heat dissipation plates. The corrugated heat exchange plates reduce the movement speed of the exhaust gas, allowing the heat exchange plates to fully exchange heat with the residual heat in the exhaust gas. This also lowers the temperature of the tar in the exhaust gas and causes it to adhere to the heat exchange plates. The fan operates to discharge the heat from the heat dissipation plates into the return hood. The recovery pipe delivers the hot air to the chemical vapor deposition furnace body, which can recover the residual heat in the exhaust gas and reuse the recovered heat, improving its practicality.

[0020] In summary, this invention can perform primary filtration of the exhaust gas emitted from the chemical vapor deposition furnace body, preventing a large amount of tar from adhering to the heat exchange plate and causing a decrease in cooling effect, thereby improving tar treatment efficiency. It can also recover residual heat in the exhaust gas and reuse the recovered heat, thus improving its practicality. Attached Figure Description

[0021] Figure 1 This is a schematic diagram of the overall main structure of a chemical vapor deposition apparatus with a tail gas treatment structure proposed in this utility model.

[0022] Figure 2 This is a schematic diagram of the overall cross-sectional main view of a chemical vapor deposition apparatus with a tail gas treatment structure proposed in this utility model.

[0023] Figure 3 This is a front view schematic diagram of the installation mechanism of a chemical vapor deposition device with a tail gas treatment structure proposed in this utility model.

[0024] Figure 4 This is a bottom view of the installation mechanism of a chemical vapor deposition apparatus with a tail gas treatment structure proposed in this utility model.

[0025] Figure 5 This is a schematic diagram of the main structure of the filter mechanism of a chemical vapor deposition device with an exhaust gas treatment structure proposed in this utility model.

[0026] Figure 6 This is a schematic diagram of the main structure of the heat exchange component of a chemical vapor deposition device with an exhaust gas treatment structure proposed in this utility model.

[0027] Figure 7 This is a schematic diagram of the main structure of the collection component of a chemical vapor deposition device with a tail gas treatment structure proposed in this utility model.

[0028] Figure 8 This is a bottom view of the recovery component of a chemical vapor deposition device with a tail gas treatment structure proposed in this utility model.

[0029] In the diagram: 1. Chemical vapor deposition furnace body; 2. Mounting mechanism; 201. Mounting box; 202. Mounting frame; 203. Upper cover plate; 204. Lower cover plate; 3. Filtration mechanism; 301. Fixing frame; 302. Box cover; 303. Exhaust pipe; 304. Ceramic filter plate; 305. Fixing plate; 4. Heat exchange assembly; 401. Connecting plate; 402. Heat exchange plate; 403. Heat dissipation plate; 5. Collection assembly; 501. Flow guide hood; 502. Collection box; 6. Fan; 7. Recovery assembly; 701. Reflux hood; 702. Mounting ring; 703. Filter screen; 704. Recovery pipe. Detailed Implementation

[0030] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present utility model. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments.

[0031] Example 1, referring to Figure 1-6A chemical vapor deposition (CVD) apparatus with a tail gas treatment structure includes a CVD furnace body 1. The structure and function of the CVD furnace body 1 can be referenced from the existing CVD furnace model CVDCY-CVD1200-3TH with three-zone rotary automatic feed and discharge. The tail gas discharge end of the CVD furnace body 1 is provided with an installation mechanism 2. The installation mechanism 2 includes an installation box 201 bolted to one side of the outer wall of the CVD furnace body 1 and an installation frame 202 bolted to the inner wall of the installation box 201. The installation frame 202 divides the installation box 201 into a heat exchange chamber and a recovery chamber. An upper cover plate 203 is bolted to the top outer wall of the installation box 201, and a lower cover plate 204 is bolted to the bottom outer wall of the installation box 201. A filter mechanism 3 is provided on the upper part of the installation box 201. The filter mechanism 3 includes a fixing frame 301 with an installation opening on one side of the outer wall and a ceramic filter plate 304 fitted into the installation opening. The fixing frame 301 is bolted to... A box cover 302 is bolted to the top outer wall of the top cover plate 203 and the top outer wall of the fixing frame 301. A tail gas pipe 303 is fixed to the outer wall of the box cover 302. One end of the tail gas pipe 303 is connected to the outer wall of the tail gas discharge pipe of the chemical vapor deposition furnace body 1 by a clamp. A fixing plate 305 is bolted to one side outer wall of the ceramic filter plate 304. The fixing plate 305 is bolted to one side outer wall of the fixing frame 301. A heat exchange assembly 4 is provided inside the mounting box 201. The heat exchange assembly 4 includes... The assembly includes a connecting plate 401, several corrugated heat exchange plates 402, and several corrugated heat dissipation plates 403. The connecting plate 401 is embedded in the inner wall of the mounting frame 202. The heat exchange plates 402 are fixed on one outer wall of the connecting plate 401, and the heat dissipation plates 403 are fixed on the outer wall of the connecting plate 401 away from the heat exchange plates 402. The heat exchange plates 402 are located in the heat exchange chamber, and the heat dissipation plates 403 are located in the recovery chamber. The connecting plate 401, the multiple heat exchange plates 402, and the multiple heat dissipation plates 403 are all made of brass.

[0032] Example 2, refer to Figure 7-8 A chemical vapor deposition apparatus with an exhaust gas treatment structure further includes a collection component 5. The collection component 5 includes a flow guide shroud 501 bolted to the bottom outer wall of the lower cover plate 204 and a collection box 502 embedded in the bottom inner wall of the flow guide shroud 501. Several exhaust holes are opened on the upper two outer walls of the collection box 502. A fan 6 is bolted to the bottom outer wall of the lower cover plate 204. A recovery component 7 is provided above the mounting box 201. The recovery component 7 includes a conical reflux shroud 701, a mounting ring 702 embedded in the reflux shroud 701, and a filter screen 703 embedded in the mounting ring 702. The reflux shroud 701 is bolted to the top outer wall of the upper cover plate 203. A recovery pipe 704 is fixed on the top inner wall of the reflux shroud 701. One end of the recovery pipe 704 is connected to the interior of the chemical vapor deposition furnace body 1.

[0033] Working principle: The exhaust gas from the exhaust port of the chemical vapor deposition furnace body 1 is discharged into the fixed frame 301. The ceramic filter plate 304 adsorbs the tar in the exhaust gas in the upper space of the fixed frame 301. Multiple heat exchange plates 402 exchange heat with the filtered exhaust gas. Then, the heat exchange plates 402 transfer the heat to the connecting plate 401 and multiple heat dissipation plates 403. The wave-shaped heat exchange plates 402 reduce the movement speed of the exhaust gas, allowing the heat exchange plates 402 to fully exchange heat with the residual heat in the exhaust gas, and lowering the temperature of the tar in the exhaust gas so that it adheres to the heat exchange plates 402. Then, under the impact of the exhaust gas flow, the tar drips into the collection box 502. The fan 6 operates to discharge the heat from the heat dissipation plate 403 into the return hood 701. The recovery pipe 704 delivers the hot air into the chemical vapor deposition furnace body 1.

[0034] The above are merely preferred embodiments of this utility model, but the scope of protection of this utility model is not limited thereto. Any equivalent substitutions or modifications made by those skilled in the art within the scope of the technology disclosed in this utility model, based on the technical solution and inventive concept of this utility model, should be included within the scope of protection of this utility model.

Claims

1. A chemical vapor deposition apparatus with a tail gas treatment structure, comprising a chemical vapor deposition furnace body (1), characterized in that, The exhaust end of the chemical vapor deposition furnace body (1) is provided with an installation mechanism (2). The installation mechanism (2) includes an installation box (201) that is bolted to the outer wall of one side of the chemical vapor deposition furnace body (1) and an installation frame (202) that is bolted to the inner wall of the installation box (201). The upper part of the mounting box (201) is provided with a filter mechanism (3), which includes a fixed frame (301) with an installation opening on one side of the outer wall and a ceramic filter plate (304) fitted inside the installation opening; The installation box (201) is equipped with a heat exchange assembly (4), which includes a connecting plate (401), a number of corrugated heat exchange plates (402) and a number of corrugated heat dissipation plates (403). A collection component (5) is provided below the installation box (201), and a fan (6) is provided below the installation box (201); The mounting box (201) is provided with a recycling component (7) above it. The recycling component (7) includes a conical reflux hood (701), a mounting ring (702) embedded in the reflux hood (701), and a filter screen (703) embedded in the mounting ring (702).

2. The chemical vapor deposition apparatus with a tail gas treatment structure according to claim 1, characterized in that, The top outer wall of the mounting box (201) is bolted with an upper cover plate (203), and the bottom outer wall of the mounting box (201) is bolted with a lower cover plate (204).

3. A chemical vapor deposition apparatus with a tail gas treatment structure according to claim 2, characterized in that, The fixed frame (301) is bolted to the top outer wall of the upper cover plate (203), and the box cover (302) is bolted to the top outer wall of the fixed frame (301). The tail gas pipe (303) is fixed on the outer wall of the box cover (302), and one end of the tail gas pipe (303) is connected to the outer wall of the tail gas discharge pipe of the chemical vapor deposition furnace body (1) by a clamp. The fixed plate (305) is bolted to one side outer wall of the ceramic filter plate (304), and the fixed plate (305) is bolted to one side outer wall of the fixed frame (301).

4. A chemical vapor deposition apparatus with a tail gas treatment structure according to claim 1, characterized in that, The connecting plate (401) is embedded in the inner wall of the mounting frame (202), the heat exchange plate (402) is fixed on the outer wall of one side of the connecting plate (401), and the heat dissipation plate (403) is fixed on the outer wall of the connecting plate (401) away from the heat exchange plate (402).

5. A chemical vapor deposition apparatus with a tail gas treatment structure according to claim 2, characterized in that, The collection assembly (5) includes a flow guide (501) bolted to the bottom outer wall of the lower cover plate (204) and a collection box (502) embedded in the bottom inner wall of the flow guide (501). Several exhaust holes are opened on the upper two outer walls of the collection box (502).

6. A chemical vapor deposition apparatus with a tail gas treatment structure according to claim 2, characterized in that, The fan (6) is bolted to the bottom outer wall of the lower cover plate (204), and the lower cover plate (204) has a ventilation opening on the outer wall near the fan (6).

7. A chemical vapor deposition apparatus with a tail gas treatment structure according to claim 1, characterized in that, The reflux hood (701) is bolted to the top outer wall of the upper cover plate (203), and a recovery pipe (704) is fixed on the top inner wall of the reflux hood (701), with one end of the recovery pipe (704) connected to the interior of the chemical vapor deposition furnace body (1).

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