Photolithography principle demonstration device

Abstract

This utility model discloses a photolithography principle demonstration device, comprising: an outer frame including a frame and multiple baffles; a lighting system including an ultraviolet lamp group and a lens group, the lens group being disposed below the ultraviolet lamp group; an imaging system including an optical lens and a photomask, the photomask being disposed between the optical lens and the lens group; a focusing system including a power module, a moving module, and a support platform, the support platform being connected to the moving module and located below the optical lens, the power module being connected to the moving module and capable of driving it to move up and down, thereby causing the support platform to move along the optical axis of the optical lens; a power supply module connected to the lighting system and the power module; and a control module connected to the lighting system, the power module, and the power supply module. This utility model is applicable to teaching demonstrations of photolithography processes.

Description

Technical Field

[0001] This utility model relates to a photolithography teaching device, and more particularly to a demonstration device for demonstrating the principles of photolithography during the teaching of photolithography technology. Background Technology

[0002] With the rapid development of semiconductor-related technologies, photolithography, as one of the key technologies, is becoming increasingly popular among younger learners, creating a demand for teaching photolithography. However, photolithography involves complex physical and chemical processes. Traditional teaching methods mainly rely on theoretical explanations and two-dimensional image demonstrations, making it difficult for learners to intuitively understand the practical operational principles of photolithography, such as light propagation, mask imaging, and film coating. This results in poor teaching effectiveness and learners' limited grasp of the technical principles.

[0003] Currently, there are few devices specifically designed for teaching photolithography principles. Some devices have simple structures but limited functions, failing to realistically and intuitively demonstrate the changes in light and the precise imaging process during photolithography. While other devices can more realistically demonstrate the photolithography process, they are expensive, structurally and operationally complex, and require harsh working environments, making them unsuitable for use in ordinary school settings. Furthermore, existing photolithography teaching equipment does not consider the safety of learners during the teaching process, nor does it address the issue of providing diverse learning opportunities such as hands-on practice.

[0004] Therefore, how to design a photolithography principle demonstration device that can overcome the defects in the existing technology has become an urgent problem to be solved by those skilled in the art. Utility Model Content

[0005] This invention provides a photolithography principle demonstration device, which is suitable for teaching and demonstrating photolithography processes.

[0006] To achieve the above objectives, this utility model provides a photolithography principle demonstration device, comprising:

[0007] An outer frame includes a frame and a plurality of baffles, the baffles being disposed on a plurality of sides of the frame;

[0008] A lighting system is located inside the upper part of the outer frame. The lighting system includes an ultraviolet lamp assembly and a lens assembly, with the lens assembly located below the ultraviolet lamp assembly.

[0009] An imaging system includes an optical lens and a photomask, the photomask being disposed between the optical lens and the lens group;

[0010] A focusing system includes a power module, a moving module, and a support platform. The support platform is connected to the moving module and located below the optical lens. The power module is connected to the moving module and can drive it to move up and down, thereby moving the support platform along the optical axis of the optical lens.

[0011] A power module, connected to the lighting system and the power module; and

[0012] A control module is connected to the lighting system, the power module, and the power supply module.

[0013] The multiple baffles include a top plate, a bottom plate, a left side plate, a right side plate, a back plate, and a front baffle. The frame and the multiple baffles together form a cuboid structure, and the front baffle can open or close the cuboid structure.

[0014] The front panel is a transparent ultraviolet light protection panel, while the left side panel, the right side panel, and the back panel are either transparent ultraviolet light protection panels or opaque panels.

[0015] The ultraviolet light protection panel is a transparent panel covered with a yellow light film.

[0016] The lighting system includes a heat sink, the ultraviolet lamp assembly is mounted on the heat sink, and the control module and the power module are connected to the ultraviolet lamp assembly.

[0017] The lighting system includes a heat sink and a white light auxiliary lamp group. The ultraviolet lamp group and the white light auxiliary lamp group are disposed on the heat sink and are evenly distributed alternately on the heat sink.

[0018] The control module and the power module are connected to the ultraviolet lamp group and the white light auxiliary lamp group.

[0019] The imaging system also includes a light shield with a light-transmitting window in the center. The size of the light-transmitting window is the same as the aperture of the optical lens, and the optical lens is positioned below the light shield corresponding to the position of the light-transmitting window.

[0020] The optical lens includes a medium-short focal length manual optical lens.

[0021] The power module of the focusing system is a motor, and the moving module is a lead screw slide.

[0022] The support platform is either a magnetic support platform or a bracket support platform, and can accommodate a coated film.

[0023] The power module includes a first power source and a second power source. The first power source is connected to the lighting system and the control module, and the second power source is connected to the power module and the control module.

[0024] The power of the first power source is greater than that of the second power source. The first power source is a 24V high-power power source, and the second power source is a 12V low-power power source.

[0025] The power module also includes a relay, through which the first power source is connected to the lighting system and the control module.

[0026] The control module includes a control motherboard assembly and a control device. The control motherboard assembly is connected to the lighting system, the power module, and the power supply module, and the control device is connected to the control motherboard assembly.

[0027] The control device can be a remote control or a control panel.

[0028] The present invention will be described in detail below with reference to the accompanying drawings and specific embodiments, but this is not intended to limit the present invention. Attached Figure Description

[0029] Figure 1 This is a front view of the photolithography principle demonstration device provided in an embodiment of the present invention.

[0030] Figure 2 This is a side cross-sectional view of the photolithography principle demonstration device provided in an embodiment of the present invention;

[0031] Figure 3 A schematic diagram of the outer frame structure of a photolithography principle demonstration device provided in an embodiment of this utility model;

[0032] Figure 4 This is a front view of the lighting system structure of a photolithography principle demonstration device provided in an embodiment of the present invention;

[0033] Figure 5 This is a top view of the mask structure of a photolithography principle demonstration device provided in an embodiment of the present invention;

[0034] Figure 6 This is a top view of the light-shielding plate structure of a photolithography principle demonstration device provided in an embodiment of the present invention;

[0035] Figure 7 This is a three-dimensional structural diagram of a photolithography principle demonstration device provided in an embodiment of the present invention;

[0036] In the attached figures, the following labels are used:

[0037] 1. Outer frame

[0038] 11 Framework

[0039] 12 baffles

[0040] 121 Top Plate

[0041] 122 base plate

[0042] 123 Left side panel

[0043] 124 right side panel

[0044] 125 backplate

[0045] 126 front bezel

[0046] 2 Lighting System

[0047] 21 UV lamp groups

[0048] 22 lens groups

[0049] 23 heatsinks

[0050] 3 Imaging System

[0051] 31 optical lenses

[0052] 32-mask version

[0053] 321 photolithography pattern

[0054] 33 visor

[0055] 331 light-transmitting window

[0056] 4-focus system

[0057] 41 Power Module

[0058] 42 mobile modules

[0059] 43 bearing platform

[0060] 5 power modules

[0061] 6 control modules

[0062] 61 controller

[0063] 9. Coated film Detailed Implementation

[0064] To clearly explain the technical features of this utility model, enabling those skilled in the art to clearly understand its structure, characteristics, usage, and technical effects, the following detailed embodiments, in conjunction with the accompanying drawings, illustrate the solution of this utility model. However, the following descriptions are merely illustrative and do not constitute a limitation of this utility model.

[0065] Please refer to Figures 1 to 4 as well as Figure 7 . Figure 1 This is a front view of the photolithography principle demonstration device provided in an embodiment of the present invention. Figure 2This is a side cross-sectional view of the photolithography principle demonstration device provided in an embodiment of the present invention; Figure 3 A schematic diagram of the outer frame structure of a photolithography principle demonstration device provided in an embodiment of this utility model; Figure 4 This is a front view of the lighting system structure of a photolithography principle demonstration device provided in an embodiment of the present invention; Figure 7 This is a three-dimensional structural diagram of a photolithography principle demonstration device provided in an embodiment of the present invention.

[0066] It should be noted that, in order to clearly show the layout and positional relationship of the components, some detailed structural features of the components and electrical connection lines will be omitted in the accompanying drawings. Also, the structure of some components is not the main improvement of this utility model, so they will be represented in a modular form in the drawings.

[0067] This utility model provides a photolithography principle demonstration device, including an outer frame 1, a lighting system 2, an imaging system 3, a focusing system 4, a power supply module 5, and a control module 6.

[0068] The outer frame 1 includes a frame 11 and multiple baffles 12. The baffles 12 are disposed on multiple sides of the frame 11, and the frame 11 and the baffles 12 together form a cuboid structure (in other embodiments, it can also be a multi-faceted three-dimensional structure or a cylindrical three-dimensional structure). The lighting system 2 is disposed inside the upper part of the outer frame 1 (i.e., inside the upper part of the cuboid structure), and includes an ultraviolet lamp group 21 and a lens group 22. The lens group 22 is disposed below the ultraviolet lamp group 21. The imaging system 3 includes an optical lens 31 and a mask 32. The mask 32 is disposed between the optical lens 31 and the lens group 22. The focusing system 4 includes a power module 41, a moving module 42, and a support platform 43. The support platform 43 is connected to the moving module 42 and is located below the optical lens 31. The power module 41 is connected to the moving module 42 and can drive it to move up and down, thereby moving the support platform 43 along the optical axis of the optical lens 31. The power module 5 is connected to the lighting system 2 and the power module 41. The control module 6 is connected to the lighting system 2, the power module 41, and the power module 5.

[0069] Please refer to Figure 3 In one embodiment, the plurality of baffles 12 include a top plate 121, a bottom plate 122, a left side plate 123, a right side plate 124, a back plate 125, and a front baffle 126, which can open or close the cuboid structure.

[0070] The frame 11 of the outer frame 1 is a cubic frame, which is composed of multiple horizontal beams and multiple vertical beams. Multiple baffles 12 are respectively disposed on each side of the frame 11 to form the cuboid structure, making the outer frame 1 a cabinet-like structure as a whole. The frame 11 can be constructed using standard aluminum profiles (or other materials that can ensure structural strength) to ensure the stability of the overall structure, as well as ease of assembly and long-term use.

[0071] In addition, the frame 11 can be equipped with beam structures or snap-fit ​​structures to securely fix the various components. For example, crossbeams or longitudinal beams can be added to each side of the frame 11 (such as...). Figure 3 , Figure 7 As shown), clips can also be added to the four main longitudinal beams. The optical lens 31 and the moving module 42 can be fixed to the crossbeam or longitudinal beam added at the back plate 125 using a bracket (e.g., Figure 2 , Figure 7 (As shown). The mask plate 32 and the light-shielding plate 33 can also be mounted on the crossbeams added at the left and right side plates 123 and 124, or the four corners of the plate can be mounted on the buckles added to the four main longitudinal beams.

[0072] In one embodiment, the plurality of baffles 12 are transparent ultraviolet light protection panels. Specifically, the front baffle 126 is a transparent ultraviolet light protection panel, and the left side panel 123, the right side panel 124, and the back panel 125 are transparent ultraviolet light protection panels or opaque panels. The ultraviolet light protection panel is a transparent panel covered with a yellow light film.

[0073] The multiple baffles 12 of the outer frame 1 are made of transparent ultraviolet light protection plates. On the one hand, the plate can filter ultraviolet rays, and users can effectively protect their eyes while observing the photolithography process through the plate to prevent damage to their eyes from ultraviolet rays. On the other hand, it can also prevent external ultraviolet rays from interfering with the photolithography process of the film coating, ensuring the stability and accuracy of the demonstration process.

[0074] To ensure both visibility and UV protection, the multiple baffles 12 can be made of white transparent acrylic sheets and covered with a yellow film used for UV protection in semiconductor workshops.

[0075] Among the multiple baffles 12, the front baffle 126 forms the front door of the cabinet-style structure. When the front baffle 126 is open, the user can manually adjust the optical lens 31; when the front baffle 126 is closed, the user can turn on the ultraviolet lamp assembly 21 and observe the photolithography process. If only observation from the front is required, only the front baffle 126 can be set as an ultraviolet light protection plate; if observation from all sides of the outer frame 1 is required, the left and right side panels 123, 124 and the back panel 125 can all be set as ultraviolet light protection plates.

[0076] Alternatively, the front baffle 126 can be configured to cover the entire front side of the outer frame 1, or only cover the upper half of the front side of the outer frame 1 (i.e., the part above the light shield 33 on the front side). Because the part of the front side of the outer frame 1 below the light shield 33 will not be exposed to ultraviolet light under the action of the light shield 33, ultraviolet light protection is not required. In this case, another openable baffle can be provided for the part of the front side of the outer frame 1 below the light shield 33. When the demonstration device is not in use, the lower baffle can be closed to protect the optical lens 31 in the cuboid structure. Figure 3 and Figure 7 This shows the shape where the front baffle 126 only covers the upper half of the front side of the outer frame 1. In order to clearly show the layout of the internal components, Figure 1 and Figure 2 The front baffle 126 is omitted from the drawing. Figure 1 and Figure 2 The image shows the location of the front baffle 126, whose lower edge can be set to be flush with or slightly lower than the sunshade 33.

[0077] Please refer to Figure 4 In one embodiment, the lighting system 2 includes a heat sink 23, and the ultraviolet lamp assembly 21 is disposed on the heat sink 23. The first power supply of the control module 6 and the power module 5 is connected to the ultraviolet lamp assembly 21.

[0078] In another embodiment, the lighting system 2 includes a heat sink 23 and a white light auxiliary lamp group. The ultraviolet lamp group 21 and the white light auxiliary lamp group are disposed on the heat sink 23 and are evenly distributed alternately on the heat sink 23. The control module 6 is connected to the ultraviolet lamp group 21 and the white light auxiliary lamp group, and the first power supply of the power module 5 is connected to the ultraviolet lamp group 21 and the white light auxiliary lamp group.

[0079] The lighting system 2 is housed within the cuboid structure and includes at least the ultraviolet lamp assembly 21 and the lens assembly 22. The ultraviolet lamp assembly 21 can employ a 10.1-inch 400W parallel matrix light source, which offers advantages such as energy efficiency, environmental friendliness, and ozone-free emission. The ultraviolet lamp assembly 21 emits ultraviolet light in the 380-650nm range. Each lens of the lens assembly 22 corresponds to each LED in the ultraviolet lamp assembly 21 to adjust the direction of light propagation, ensuring that the ultraviolet light emitted by the ultraviolet lamp assembly 21 penetrates the lens assembly 22 to form vertical light that uniformly and stably illuminates the mask 32 below. This vertical and uniform light is crucial for the accurate imaging of the photolithographic pattern.

[0080] The lighting system 2 may also include a white light auxiliary lamp group. Each LED in the white light auxiliary lamp group corresponds to each lens in the lens group 22. When adjusting the parameters of the optical lens 31 and the position of the support platform 43, the ultraviolet lamp group 21 can be turned off and the white light auxiliary lamp group can be turned on. This protects the user's eyes and prevents the film 9 from blurring due to overexposure in a low-power mode, thereby improving focusing efficiency.

[0081] Each lighting component of the lighting system 2 (including the ultraviolet lamp group 21 and the white light auxiliary lamp group) can be fixed on the heat sink 23 to ensure good heat dissipation performance and extend the service life of the lighting components. The heat sink 23 can be made of aluminum. The ultraviolet lamp group 21 and the white light auxiliary lamp group can be evenly distributed alternately on the heat sink 23 to ensure that both types of light emit parallel light. For example, one ultraviolet lamp and one white lamp can be installed in one lamp bead at the same time, or a row of white lamps and a row of ultraviolet lamps can be arranged alternately.

[0082] The lighting system 2 may also include a housing, in which the heat sink 23, the ultraviolet lamp group 21 (and the white light auxiliary lamp group) and the lens group 22 are arranged from top to bottom. Figure 1 , Figure 2 and Figure 7 The overall shape of the lighting system 2 is shown. Figure 4 The arrangement of the heat sink 23, the ultraviolet lamp assembly 21, and the lens assembly 22 within the housing is shown.

[0083] Please refer to Figure 1 , Figure 2 , Figure 5 and Figure 6 . Figure 5 This is a top view of the mask structure of a photolithography principle demonstration device provided in an embodiment of the present invention; Figure 6 This is a top view of the light-shielding plate structure of a photolithography principle demonstration device provided in an embodiment of the present invention.

[0084] In one embodiment, the imaging system 3 further includes a light-shielding plate 33, with a light-transmitting window 331 at its center. The size of the light-transmitting window 331 is the same as the aperture of the optical lens 31, and the optical lens 31 is positioned below the light-shielding plate 33, corresponding to the position of the light-transmitting window 331. The optical lens 31 includes a medium-short focal length manual optical lens.

[0085] The imaging system 3 is disposed within the cuboid structure and includes at least the optical lens 31 and the photomask 32. The optical lens 31 can integrate and reduce the light passing through the photomask 32 and project it onto the coating film 9 below. The photomask 32 can carry a photolithographic pattern 321.

[0086] The optical axis of the optical lens 31 is precisely matched with the lighting system 2 and the focusing system 4. During the photolithography demonstration, the lighting system 2 shines light downwards, which passes through the mask 32 and is integrated by the optical lens 31, ultimately forming a scaled-down image of the photolithographic pattern 321 on the coating film 9 supported by the stage 43. For example, if the photolithographic pattern 321 is 15-20 mm in size, after integration by the optical lens 31, a miniature photolithographic image of 0.3-0.5 mm can be formed on the coating film 9.

[0087] The optical lens 31 is a medium-short focal length manual optical lens, whose focal length and aperture can be manually adjusted to obtain lithographic imaging effects with different magnifications and depths of field. Users can flexibly adjust the parameters of the optical lens 31 according to actual demonstration needs to meet the requirements of different teaching scenarios and knowledge point explanations. In addition, the optical lens 31 can also be replaced as a whole, and different light processing effects can be obtained through lenses with different parameters. Furthermore, the replaceable design of the optical lens 31 also facilitates the maintenance of the entire device.

[0088] The photomask 32 is a transparent acrylic sheet with a thickness of no more than 3mm. This thickness is designed to balance structural strength and imaging effect. If the sheet is too thick, light may refract inside the transparent sheet, resulting in ghosting and other problems that affect the imaging effect. The photolithographic pattern 321 is formed by printing an opaque coating onto the photomask 32, or by attaching a photolithographic pattern sticker onto the photomask 32. Users can design and create different photolithographic pattern stickers using a computer, thereby creating multiple photomasks 32 with different photolithographic patterns. Users can then replace the photomask 32 and observe the photolithographic images of different patterns formed on the coated sheet 9, which not only enhances the intuitiveness and interest of the teaching demonstration but also improves the user's hands-on skills.

[0089] The imaging system 3 may also include a light-shielding plate 33, which is made of opaque, non-reflective frosted black material, and has a light-transmitting window 331 in its center, the size of which is the same as the aperture of the optical lens 31. The optical lens 31 is located below the light-shielding plate 33 and is directly connected to the light-transmitting window 331. Thus, the light projected by the lighting system 2 will only enter the optical lens 31 through the light-transmitting window 331, and after being integrated by it, will be projected onto the coating sheet 9 below, so that a clear and complete photolithographic image is formed on the coating sheet 9, without additional discoloration or unclear photolithographic image caused by light leakage from other positions illuminating the coating sheet 9.

[0090] Please refer to Figure 1 , Figure 2 and Figure 7In one embodiment, the power module 41 of the focusing system 4 is a motor, and the moving module 42 is a lead screw slide. The support platform 43 is a magnetic support platform or a bracket support platform, and can accommodate a coating sheet 9. The figure shows a bracket support platform.

[0091] The focusing system 4 is housed within the cuboid structure and includes at least a power module 41, a moving module 42, and a support platform 43. The power module 41 can be positioned at a suitable location within the cuboid structure of the outer frame 1, such as at the bottom, to lower the center of gravity and enhance stability. A coating sheet 9 is mounted on the support platform 43, and its position is aligned with the optical axis of the optical lens 31. Thus, the light integrated by the optical lens 31 can be directly projected onto the coating sheet 9. After the user initiates a control command via the control device 61, under the coordinated control of the control module 6, the moving module 42, powered by the power module 41, can move the support platform 43 up and down, thereby moving the coating sheet 9 closer to or further away from the optical lens 31, thus completing the focusing adjustment for photolithography imaging.

[0092] Specifically, the power module 41 can be a motor, and the moving module 42 can be a lead screw slide. The lead screw slide includes a vertical lead screw and a moving platform. The vertical lead screw is connected to the motor, the moving platform is mounted on the vertical lead screw, and the support platform 43 is connected to the moving platform. The forward and reverse rotation of the motor will drive the moving platform to move up and down on the vertical lead screw, thereby driving the support platform 43 to move up and down.

[0093] The adhesive sheet 9 can be fixed to the support platform 43 in several ways, including magnetic and bracket types. Magnetic fixing involves placing the adhesive sheet 9 in the magnetic slot, securing it to the support platform 43 through magnetic attraction. This method is convenient, quick, and facilitates the replacement of the adhesive sheet 9. Bracket fixing involves configuring the support platform 43 as a bracket (e.g., a Y-shaped bracket) and placing the adhesive sheet 9 directly on the bracket. This method is simple to operate and provides stable and reliable fixation.

[0094] The coated sheet 9 is an imaging item with photochromic properties, capable of displaying photolithographic patterns under light, visually demonstrating the photolithographic effect. Specifically, the coated sheet 9 can be a photolithography card with photochromic properties for teaching purposes, or a circular acrylic plate coated with photolithography for teaching purposes. Both photolithography cards and photolithography for teaching purposes meet safety and environmental protection requirements.

[0095] Please refer to Figure 1 and Figure 7 It should be noted that this utility model primarily utilizes the power supply function of the power module, rather than modifying its own structure. Figure 1 and Figure 7 The power module 5 is represented as a module, without showing the first power supply, the second power supply, and the electrical connection lines separately.

[0096] In one embodiment, the power module 5 includes a first power source and a second power source. The first power source is connected to the lighting system 2 and the control module 6, and the second power source is connected to the power module 41 and the control module 6. The power of the first power source is greater than the power of the second power source.

[0097] In one embodiment, the first power supply is a 24V high-power power supply, and the second power supply is a 12V low-power power supply. The power module 5 also includes a relay, through which the first power supply is connected to the lighting system 2 and the control module 6.

[0098] The power module 5 is housed within the cuboid structure and includes a first power supply and a second power supply. The first power supply is dedicated to driving the lighting system 2, providing it with stable and sufficient power to ensure the normal operation of the ultraviolet lamp group 21 and the white light auxiliary lamp group. The second power supply powers the control motherboard group in the control module 6 and the power module 41 in the focusing system 4 to ensure their stable operation.

[0099] Specifically, the first power supply can be a 24V 500W high-power power supply, and the second power supply can be a 12V low-power power supply. Because the first power supply has a relatively high power, it is incompatible with other electronic components; therefore, it can be connected to the control main board of the lighting system 2 and the control module 6 via a relay.

[0100] Please refer to Figure 1 and Figure 7 It should be noted that this utility model mainly utilizes the control function of control module 6, rather than improving the structure of the control motherboard. Figure 1 and Figure 7 The control module 6 is represented as a module, and the specific control motherboard assembly and electrical connection lines in the control module 6 are not shown separately.

[0101] In one embodiment, the control module 6 includes a control motherboard assembly and a control device 61. The control motherboard assembly is connected to the lighting system 2, the power module 41, and the power supply module 5, and the control device 61 is connected to the control motherboard assembly. The control device 61 can be a remote control or a control panel.

[0102] The control module 6 may include a control motherboard assembly and a control device 61. The control motherboard assembly is disposed within the cuboid structure and includes a voltage regulator circuit, logic circuit, and control circuit. The control device 61 allows the user to input commands to control the lighting system 2, the power module 41, and the power supply module 5.

[0103] The control device 61 can be, for example, a remote control or a control panel located outside the outer frame 1. By operating the control device 61, the user can control the power module 41, thereby changing the position of the support platform 43 (for example, by controlling the forward and reverse rotation of the motor to raise or lower the support platform 43), thus precisely adjusting the position of the coating film 9 to achieve the best photolithography imaging effect; on the other hand, the user can also control the on / off switch and brightness adjustment of the lighting system 2 to meet the operational requirements of different teaching environments and demonstration needs.

[0104] The photolithography principle demonstration device of this utility model can be operated in the following steps:

[0105] 1) In the teaching scenario, the user first installs the coating film 9 on the support platform 43, and controls the power module 41 through the controller 61 to drive the moving module 42 to lift and lower the support platform 43, so as to adjust the position of the coating film 9 so that it is in a suitable focusing plane.

[0106] 2) Turn on the lighting system 2, select the ultraviolet lamp group 21 or the white light auxiliary lamp group as needed, and adjust the focal length and aperture of the optical lens 31 so that the light emitted by the lighting system 2 passes through the mask 32, and after being scaled and integrated by the optical lens 31, it finally forms a clear photolithography pattern on the coating film 9.

[0107] 3) During the demonstration, users can adjust the device components and parameters according to the actual situation (e.g., change the mask 32 with different patterns, change the coating film 9, change the optical lens 31 with different parameters, adjust the focal length and aperture of the optical lens 31, adjust the focusing system 4 to change the focusing position of the coating film 9, etc.) to demonstrate different aspects and effects of photolithography principles.

[0108] Compared with existing technologies, the photolithography principle demonstration device of this invention has at least the following significant technical advantages:

[0109] 1) It can intuitively demonstrate the principle of photolithography: The photolithography principle demonstration device of this utility model can present the photolithography process to users intuitively and clearly through the coordinated work of various components, making the abstract principle of photolithography more visual and concrete, which helps users to better understand and master this complex technical principle, and improve teaching quality and learning effect.

[0110] 2) Safety protection function: The photolithography principle demonstration device of this utility model has an ultraviolet light protection plate (such as a transparent plate with a yellow light film attached) on the outer frame. These ultraviolet light protection plates can effectively filter ultraviolet rays, which can protect the user's eyes from the ultraviolet light emitted by the lighting system, and at the same time prevent external ultraviolet rays from interfering with the demonstration process, thus providing a safe and reliable environment for teaching demonstrations.

[0111] 3) Flexible Adjustment Function: The photolithography principle demonstration device of this invention features an imaging system with manually adjustable focal length and aperture for the optical lens, and a focusing system that precisely controls the focusing position of the film. This allows the demonstration device to adapt to different teaching needs and demonstration conditions, enabling users to flexibly adjust parameters according to actual circumstances to achieve the best demonstration results.

[0112] 4) Stable and reliable operation: The photolithography principle demonstration device of this utility model adopts a frame and baffle combination structure in its outer frame, which can ensure the stable installation of each component; the heat dissipation design of its lighting system, the stable power supply of the power module, and the precise control of each component by the control module can ensure the stability and reliability of the demonstration device during long-term use, reduce the probability of failure, improve the durability and practicality of the equipment, reduce maintenance costs, and thus meet the needs of frequent use by schools and other educational institutions.

[0113] 5) Easy to operate manually: The photolithography principle demonstration device of this utility model provides users with a variety of self-operable adjustment functions (such as mask replacement, optical lens focusing, film replacement, film focusing, photolithography control, etc.). On the one hand, this utility model has flexible adjustment functions, and on the other hand, these adjustment functions are easy to operate, which can exercise hands-on ability and enhance the diversity and fun of teaching.

[0114] Of course, there may be other embodiments of this utility model. Without departing from the spirit and essence of this utility model, those skilled in the art can make various corresponding changes and modifications based on this utility model, but these corresponding changes and modifications should all fall within the protection scope of the claims of this utility model.

Claims

1. A demonstration device for the principle of photolithography, characterized in that, include: An outer frame includes a frame and a plurality of baffles, the baffles being disposed on a plurality of sides of the frame; A lighting system is located inside the upper part of the outer frame. The lighting system includes an ultraviolet lamp assembly and a lens assembly, with the lens assembly located below the ultraviolet lamp assembly. An imaging system includes an optical lens and a photomask, the photomask being disposed between the optical lens and the lens group; A focusing system includes a power module, a moving module, and a support platform. The support platform is connected to the moving module and located below the optical lens. The power module is connected to the moving module and can drive it to move up and down, thereby moving the support platform along the optical axis of the optical lens. A power module, connected to the lighting system and the power module; and A control module is connected to the lighting system, the power module, and the power supply module.

2. The demonstration of the principle of photolithography according to claim 1, characterized in that, The multiple baffles include a top plate, a bottom plate, a left side plate, a right side plate, a back plate, and a front baffle. The frame and the multiple baffles together form a cuboid structure, and the front baffle can open or close the cuboid structure.

3. The demonstration of the principle of photolithography according to claim 2, characterized in that, The front panel is a transparent ultraviolet light protection panel, and the left side panel, the right side panel, and the back panel are either transparent ultraviolet light protection panels or opaque panels.

4. The demonstration of the principle of photolithography according to claim 3, characterized in that, The ultraviolet protection panel is a transparent panel covered with a yellow light film.

5. The demonstration of the principle of photolithography according to claim 1, characterized in that, The lighting system includes a heat sink, the ultraviolet lamp assembly is mounted on the heat sink, and the control module and the power module are connected to the ultraviolet lamp assembly.

6. The demonstration of the principle of photolithography according to claim 1, characterized in that, The lighting system includes a heat sink and a white light auxiliary lamp group. The ultraviolet lamp group and the white light auxiliary lamp group are disposed on the heat sink and are evenly distributed alternately on the heat sink.

7. The demonstration of the principle of photolithography according to claim 6, characterized in that, The control module and the power module are connected to the ultraviolet lamp group and the white light auxiliary lamp group.

8. The demonstration of the principle of photolithography according to claim 1, characterized in that, The imaging system also includes a light shield with a light-transmitting window in the center. The size of the light-transmitting window is the same as the aperture of the optical lens, and the optical lens is positioned below the light shield corresponding to the position of the light-transmitting window.

9. The photolithography principle demonstration device according to claim 1, characterized in that, The optical lens includes medium to short telephoto manual optical lenses.

10. The demonstration of the principle of photolithography according to claim 1, characterized in that, The power module of the focusing system is an electric motor, and the moving module is a lead screw slide.

11. The photoetching principle demonstration device according to claim 1, characterized in that, The support platform is a magnetic support platform or a bracket support platform, and can accommodate a coated film.

12. The demonstration of the principle of photolithography according to claim 1, characterized in that, The power module includes a first power source and a second power source. The first power source is connected to the lighting system and the control module, and the second power source is connected to the power module and the control module.

13. The demonstration of the principle of photolithography according to claim 12, characterized in that, The power of the first power source is greater than that of the second power source. The first power source is a 24V power source, and the second power source is a 12V power source.

14. The demonstration of the principle of photolithography according to claim 12 or 13, characterized in that, The power module also includes a relay, through which the first power source is connected to the lighting system and the control module.

15. The photoetching demonstration apparatus according to claim 1, wherein The control module includes a control motherboard assembly and a control device. The control motherboard assembly is connected to the lighting system, the power module, and the power supply module, and the control device is connected to the control motherboard assembly.

16. The photoetching demonstration apparatus according to claim 15, wherein The control device is either a remote control or a control panel.

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