A dual-closed-loop plasma surgical device
By employing a dual-closed-loop control structure, combining pre-stage and post-stage closed-loop control circuits, the problems of inaccurate output and insufficient safety in single-closed-loop plasma surgical equipment are solved, achieving higher output power accuracy and safety.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- YUNYI STAR (SHANGHAI) TECH CO LTD
- Filing Date
- 2025-07-11
- Publication Date
- 2026-07-03
AI Technical Summary
Traditional single-loop plasma surgical equipment has poor output power accuracy and low safety, and is prone to causing risks even under non-extreme failure conditions.
It adopts a dual closed-loop control structure, including a front-end closed-loop control circuit and a rear-end closed-loop control circuit. Through communication and independent control between the front-end microprocessor and the rear-end microprocessor, the accuracy and safety of the output power are ensured.
The accuracy of the output power of the plasma surgical equipment has been improved, ensuring that the power remains within a safe range even in the event of a closed-loop control failure, thus avoiding harm to the patient and improving the safety of the equipment.
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Figure CN224459667U_ABST
Abstract
Description
Technical Field
[0001] This application relates to the field of plasma surgical equipment, and more specifically, to a dual closed-loop plasma surgical device. Background Technology
[0002] Traditional plasma surgical equipment typically employs a single closed-loop control method. This means that a feedback unit collects the voltage and / or current signals output from the power module and sends them to the control unit. The control unit then compares the feedback signal with the set signal and adjusts the output voltage and / or current of the power module accordingly. (See appendix) Figure 4 Traditional plasma surgical equipment typically consists of a power module, a plasma generator, a feedback unit, and a control unit. The power module provides direct current (DC) power, the plasma generator converts the DC power into alternating current (AC) power of a specific frequency and waveform, the feedback unit collects the power signals, and the control unit controls the power module and / or the plasma generator based on the feedback signals and preset parameters.
[0003] This traditional single-loop controlled plasma surgical device has the following two main drawbacks:
[0004] 1. The accuracy of output power in single-loop controlled plasma surgical equipment is poor. Because single-loop control only controls the input energy of the plasma generator, the output energy is completely uncontrolled (open-loop). Changes in the load on the radio frequency electrodes can lead to variations in the plasma generator's efficiency, resulting in a significant deviation between the actual and expected output power. This inaccurate output affects surgical outcomes.
[0005] 2. Single-loop controlled plasma surgical equipment has low safety. A fault in the single-loop control circuit will inevitably lead to uncontrolled output power, posing a serious risk. Therefore, single-loop control circuits generally include over-limit protection, such as overvoltage, overcurrent, and overpower protection. However, this circuit protection only addresses extreme fault conditions. If the fault does not reach an extreme state, such as a feedback signal deviation causing an increase in output power that does not reach the over-limit protection threshold, this situation can still pose a significant danger. Utility Model Content
[0006] In view of one of the defects in the prior art, the purpose of this application is to provide a dual closed-loop plasma surgical device.
[0007] In a first aspect, this application provides a dual-closed-loop plasma surgical device, comprising: a pre-stage closed-loop control circuit, a post-stage closed-loop control circuit, a radio frequency electrode, and a display component;
[0008] The front-end closed-loop control circuit is communicatively connected to the rear-end closed-loop control circuit, and the rear-end closed-loop control circuit, the radio frequency electrode, and the display component are communicatively connected.
[0009] The front-end closed-loop control circuit includes a front-end microprocessor and a power module, wherein the front-end microprocessor is used to control the output power of the power module.
[0010] The post-stage closed-loop control circuit includes a post-stage microprocessor and a plasma generator. The input terminal of the post-stage microprocessor is connected to the display component, and the output terminal is connected to the pre-stage microprocessor, used to control the output power of the plasma generator.
[0011] Optionally, the front-end closed-loop control circuit further includes a front-end feedback circuit and a front-end control circuit;
[0012] The input terminal of the pre-stage microprocessor is connected to the output terminal of the post-stage microprocessor, the output terminal of the pre-stage microprocessor is connected to the input terminal of the pre-stage control circuit, the output terminal of the pre-stage control circuit is connected to the input terminal of the power module, the output terminal of the power module is connected to the input terminal of the pre-stage feedback circuit, and the output terminal of the pre-stage feedback circuit is connected to the pre-stage microprocessor, forming a pre-stage closed-loop control.
[0013] The front-end microprocessor acquires the control signal from the back-end microprocessor and controls the output power of the power module through the front-end control circuit. The front-end feedback circuit is used to feed back the output power of the power module to the front-end microprocessor.
[0014] The output terminal of the power module is also connected to the input terminal of the plasma generator.
[0015] Optionally, the power module includes: a full-bridge rectifier chip U1, an automatic voltage switching circuit, capacitors C1 and C2, resistors R1 and R2, MOSFETs Q1, Q2, Q3, and Q4, a transformer T1, resistors R3 and R4, capacitors C4 and C5, diodes D1 and D2, inductor L1, and capacitor C6; wherein:
[0016] The positive DC output of the full-bridge rectifier chip U1 is connected to one end of capacitors C1 and C2, and to the automatic voltage switching circuit. The negative DC output of the full-bridge rectifier chip U1 is connected to PGND. Capacitors C1 and C2 are connected in parallel. The other end of the parallel connection of capacitors C1 and C2 is connected to one end of resistors R1 and R2, and simultaneously connected to the sources of MOSFETs Q1 and Q2. Resistors R1 and R2 are connected in series. The drain of MOSFET Q1 is connected to one end of the primary winding of transformer T1, and the gate of MOSFET Q1 is connected to... The transformer T1 receives a drive signal; the drain of MOSFET Q2 is connected to the other end of the primary winding of MOSFET T1, and the gate of MOSFET Q2 receives the drive signal; the source of MOSFET Q3 is connected to the terminal where the primary winding of MOSFET T1 is connected to the drain of MOSFET Q2, the drain of MOSFET Q3 is connected to PGND, and the gate of MOSFET Q3 receives the drive signal; the source of MOSFET Q4 is connected to the terminal where the primary winding of MOSFET T1 is connected to the drain of MOSFET Q1, the drain of MOSFET Q4 is connected to PGND, and the gate of MOSFET Q4 receives the drive signal.
[0017] One end of the secondary winding of the transformer T1 is connected to the resistor R3, the capacitor C4, and the anode of the diode D1; the other end of the MOSFET Q3 is connected to the resistor R4, the capacitor C5, and the anode of the diode D2; the other end of the resistor R3 is connected to the capacitor C4, the cathode of the diode D1, the resistor R5, and the inductor L1; the other end of the resistor R4 is connected to the capacitor C5, the cathode of the diode D2, and DGND.
[0018] The other end of capacitor C4 is connected to resistor R3, the cathode of diode D1, resistor R5, and inductor L1. The other end of capacitor C5 is connected to resistor R4, the cathode of diode D2, and DGND. The anode of diode D1 is connected to one end of the secondary winding of transformer T1, resistor R3, and capacitor C4. The cathode of diode D1 is connected to resistor R3, capacitor C4, resistor R5, and inductor L1. The anode of diode D2 is connected to the other end of the secondary winding of transformer T1, resistor R4, and capacitor C5. The cathode of diode D2 is connected to resistor R4, capacitor C5, and DGND. One end of inductor L1 is connected to resistor R3, capacitor C4, and the cathode of diode D1. The other end of inductor L1 is connected to resistor R5, capacitor C6, and +HVDC. The other end of capacitor C6 is connected to DGND. One end of resistor R6 is connected to +HVDC.
[0019] Optionally, the front-end feedback circuit includes a front-end voltage sampling circuit and a front-end current sampling circuit; the front-end voltage sampling circuit outputs a front-end voltage sampling signal; the front-end current sampling circuit outputs a front-end current sampling signal.
[0020] The front-end sampling circuit includes a resistor R5 and a differential amplifier circuit. The differential amplifier circuit is disposed across the resistor R5. One end of the resistor R51 is connected to one end of the inductor L1 and the capacitor C6, respectively, to pass the voltage signal across the resistor R5 through the differential amplifier circuit to obtain the front-end current sampling signal.
[0021] The pre-amplifier voltage sampling circuit includes: resistor R6, resistor R7, a filter circuit, and an operational amplifier circuit; one end of resistor R6 is connected to the other end of resistor R5, one end of resistor R6 is connected to one end of resistor R7, and the other end of resistor R7 is grounded; the filter circuit and the operational amplifier circuit are connected to the other end of resistor R6 and one end of resistor R7, and are used to divide the output voltage of the power module, and then process it through the filter circuit and amplify it through the operational amplifier circuit to obtain the pre-amplifier voltage sampling signal.
[0022] Optionally, the subsequent closed-loop control circuit further includes: a subsequent feedback circuit and a subsequent control circuit;
[0023] The input terminal of the plasma generator is connected to the input terminal of the power supply module and the output terminal of the subsequent control circuit. The output terminal of the plasma generator is connected to the input terminal of the subsequent feedback circuit. The output terminal of the subsequent feedback circuit is connected to the input terminal of the subsequent microprocessor. The output terminal of the subsequent microprocessor is connected to the input terminal of the subsequent control circuit, forming a subsequent closed-loop control.
[0024] Optionally, the post-processor obtains the output power of the plasma generator through the post-feedback circuit, and controls the output power of the plasma generator through the post-control circuit by setting the output power through the display component.
[0025] The output terminal of the plasma generator is simultaneously connected to the input terminal of the radio frequency electrode.
[0026] Optionally, the plasma generator includes: MOSFET Q5, MOSFET Q6, MOSFET Q7, MOSFET Q8, transformer T2, capacitor C3, and inductor L2;
[0027] MOSFETs Q5, Q6, Q7, and Q8 form a full-bridge topology to convert the DC power output from the power module into AC power. Transformer T2 is a step-up isolation transformer. Capacitor C3 is an isolation capacitor used to block DC and low-frequency currents. Inductor L2 is a filter inductor used to filter out high-frequency spike currents. Wherein:
[0028] The source of MOSFET Q5 is connected to the drain of MOSFET Q6. The drain of MOSFET Q5 is connected to the power supply +HVCC, and its gate is connected to the drive signal. The source of MOSFET Q6 is connected to analog ground, and its gate is connected to the drive signal. The source of MOSFET Q7 is connected to analog ground, and its drain is connected to the source of MOSFET Q8. Its gate is connected to the drive signal. The drain of MOSFET Q8 is connected to the power supply +HVCC, and its gate is connected to the drive signal.
[0029] One end of the primary winding of the transformer T2 is connected to the drain of the MOSFETs Q5 and Q8, and the other end is connected to the source of the MOSFETs Q6 and Q7; the other end of the secondary winding is connected to the capacitor C3 and the inductor L2; one end of the capacitor C3 is connected to the secondary winding of the transformer T2, and the other end is connected to the inductor L2.
[0030] Optionally, the subsequent feedback circuit includes: a subsequent voltage sampling circuit and a subsequent current sampling circuit; the subsequent voltage sampling circuit outputs a subsequent voltage sampling signal; the subsequent current sampling circuit outputs a subsequent current sampling signal; wherein:
[0031] The subsequent voltage sampling circuit includes: resistor R8, resistor R9, resistor R10, transformer T3, and a first true RMS conversion circuit;
[0032] Among them, resistors R8 and R9 are current-limiting resistors used to limit the voltage sampling current; transformer T3 is a voltage sampling transformer used for electrical isolation and signal coupling, converting the AC high voltage output by the plasma generator into an AC low current signal; resistor R10 is a voltage sampling resistor used to convert the AC low current signal into an AC low voltage signal; the first true RMS conversion circuit converts the AC low voltage signal into a DC low voltage signal as the output of the subsequent voltage sampling signal;
[0033] The subsequent current sampling circuit is used to output the subsequent current sampling signal;
[0034] The subsequent current sampling circuit includes a transformer T4, a resistor R11, and a second true RMS conversion circuit, wherein...
[0035] The transformer T4 is a current transformer used to convert the large AC current output by the plasma generator into a low AC current signal; the resistor R11 is a current sampling resistor used to convert the low AC current signal into a low AC voltage signal; the second true RMS conversion circuit converts the low AC voltage signal into a low DC voltage signal as the output current sampling signal for the subsequent stage.
[0036] Optionally, the subsequent control circuit includes a switching power supply control circuit and an isolation drive transformer, wherein the switching power supply control circuit has four PWM output channels, which drive four MOS transistors in the full-bridge topology of the plasma generator after passing through the isolation transformer, namely MOS transistor Q5, MOS transistor Q6, MOS transistor Q7, and MOS transistor Q8.
[0037] Optionally, both the front-end microprocessor and the back-end microprocessor are 8-bit single-chip microcontrollers ATMEGA32;
[0038] The radio frequency electrode is a plasma surgical electrode, equipped with a start switch, which is connected to the output terminal of the plasma generator. The start switch controls the energy output and stops the operation.
[0039] The dual-closed-loop plasma surgical device provided in this application employs a combined front-end and rear-end closed-loop control circuit design. This ensures the continuity and stability of plasma generation when the medium is excited, resulting in better surgical outcomes and improved accuracy of the plasma surgical device's output power. Even if one closed-loop control circuit fails, the output power of the plasma surgical device remains within a safe range, preventing accidental harm to the patient and enhancing the safety of the plasma surgical device. Furthermore, it utilizes two independent microprocessors (a front-end microprocessor and a rear-end microprocessor) that communicate with each other. Even if one microprocessor fails, the plasma surgical device still ensures safe output, and the other microprocessor immediately detects the fault and issues an alarm.
[0040] Other technical effects resulting from additional features will be further illustrated in the corresponding embodiments. Attached Figure Description
[0041] Other features, objects, and advantages of this application will become more apparent from the following detailed description of non-limiting embodiments with reference to the accompanying drawings:
[0042] Figure 1 This is a structural block diagram illustrating a dual-closed-loop plasma surgical setup according to an exemplary embodiment.
[0043] Figure 2 This is a circuit diagram of a power module and a front-end feedback circuit in a front-end closed-loop control power supply according to an exemplary embodiment.
[0044] Figure 3 This is a circuit diagram illustrating a plasma generator and a subsequent feedback circuit in a closed-loop control power supply according to an exemplary embodiment.
[0045] Figure 4 This is a schematic diagram of a traditional plasma device. Detailed Implementation
[0046] The present application will now be described in detail with reference to specific embodiments. These embodiments will help those skilled in the art to further understand the present application, but do not limit the present application in any way. It should be noted that those skilled in the art can make several modifications and improvements without departing from the concept of the present application, and these all fall within the protection scope of the present application. Parts not described in detail in the following embodiments can be implemented using existing technology.
[0047] In the description of the embodiments of this application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "bottom", "inner", "outer", "clockwise", "counterclockwise", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings. They are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this application.
[0048] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined with "first" or "second" may explicitly or implicitly include one or more of that feature.
[0049] In the description of the embodiments in this application, "multiple" means two or more, unless otherwise explicitly specified. In this application, unless otherwise explicitly specified and limited, the terms "installed," "connected," "linked," "fixed," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this application according to the specific circumstances.
[0050] The terms "comprising" and "having," and any variations thereof, in the embodiments of this application are intended to cover non-exclusive inclusion. For example, a process, method, system, product, or device that includes a series of steps or units is not limited to the steps or units listed, but may optionally include steps or units not listed, or may optionally include other steps or units inherent to such processes, methods, products, or devices.
[0051] In traditional plasma equipment, reference Figure 4 As shown, the single closed-loop control structure suffers from low equipment safety and poor output power accuracy. To address these issues, this application provides a dual closed-loop plasma surgical device.
[0052] Reference Figure 1 As shown in one embodiment of this application, a dual-closed-loop plasma surgical device includes: a pre-stage closed-loop control circuit, a post-stage closed-loop control circuit, a radio frequency electrode, and a display component.
[0053] The pre-stage closed-loop control circuit is communicatively connected to the post-stage closed-loop control circuit, and the post-stage closed-loop control circuit, RF electrodes, and display components are also communicatively connected. The pre-stage closed-loop control circuit includes a pre-stage microprocessor and a power supply module. The pre-stage microprocessor is used to control the output power of the power supply module. The post-stage closed-loop control circuit includes a post-stage microprocessor and a plasma generator. The input terminal of the post-stage microprocessor is connected to the display component, and the output terminal is connected to the pre-stage microprocessor. It is used to control the output power of the plasma generator.
[0054] Specifically, by connecting the pre-stage closed-loop control circuit to the post-stage closed-loop control circuit, and the post-stage closed-loop control circuit is connected to the radio frequency electrode and the display component respectively, the post-stage microprocessor communicates with the display component to obtain the set output power information and sends it to the pre-stage microprocessor. The pre-stage microprocessor controls the power supply module to output the corresponding voltage and power, and the post-stage microprocessor sends a signal to the post-stage control circuit to control the plasma generator to output the corresponding voltage and power.
[0055] It should be noted that the plasma generator outputs radio frequency (RF) AC power, while the power supply module outputs direct current (DC). Therefore, in terms of the energy output circuit, the 220V / 50Hz mains power is converted into controllable DC power by the power supply module, and then the DC power is converted back into RF AC power by the plasma generator for output. Thus, the power output by the plasma generator is the actual output power of this device.
[0056] The dual-closed-loop plasma surgical device provided in the above embodiments of this application effectively solves the problems of low equipment safety and poor output power accuracy of traditional single-closed-loop control structure plasma devices by setting a dual-closed-loop structure with a front-stage closed-loop control circuit and a rear-stage closed-loop control circuit. This dual-closed-loop structure can ensure that the system output power remains within a safe range even if one of the closed-loop controls fails, avoiding accidental harm to the patient. At the same time, the two independent microprocessors communicate with each other, so even if one microprocessor fails, the system still ensures safe output, and the other microprocessor immediately knows the fault and issues an alarm.
[0057] In order to achieve the purpose of front-end closed-loop control, in some specific embodiments of this application, the front-end closed-loop control circuit also includes a front-end feedback circuit and a front-end control circuit.
[0058] The input terminal of the pre-stage microprocessor is connected to the output terminal of the post-stage microprocessor. The output terminal of the pre-stage microprocessor is connected to the input terminal of the pre-stage control circuit. The output terminal of the pre-stage control circuit is connected to the input terminal of the power supply module. The output terminal of the power supply module is connected to the input terminal of the pre-stage feedback circuit. The output terminal of the pre-stage feedback circuit is connected to the pre-stage microprocessor, forming a pre-stage closed-loop control.
[0059] The pre-stage microprocessor acquires the control signal from the post-stage microprocessor and controls the output power of the power module through the pre-stage control circuit. The pre-stage feedback circuit is used to feed back the output power of the power module to the pre-stage microprocessor. The output terminal of the power module is also connected to the input terminal of the plasma generator.
[0060] In some specific embodiments of this application, the power supply module includes: a full-bridge rectifier chip U1, an automatic voltage switching circuit, capacitors C1 and C2, resistors R1 and R2, MOSFETs Q1, Q2, Q3, and Q4, a transformer T1, resistors R3 and R4, capacitors C4 and C5, diodes D1 and D2, an inductor L1, and a capacitor C6.
[0061] Reference Figure 2 As shown, the two ends of the AC power supply (110V / 220V) are connected to the AC input pins of the full-bridge rectifier chip U1. The positive DC output of the full-bridge rectifier chip U1 is connected to one end of capacitor C1, one end of capacitor C2, and the automatic voltage switching circuit, while the negative DC output is connected to the circuit's common ground (PGND).
[0062] Capacitors C1 and C2 are connected in parallel, with one end connected to the positive DC output of the full-bridge rectifier chip U1, and the other end connected to one end of resistor R1 and one end of R2, and simultaneously connected to the sources of MOSFETs Q1 and Q2. Resistors R1 and R2 are connected in series in the line connecting capacitors C1 and C2, with resistor R1 close to the positive output of the full-bridge rectifier chip U1, and the other end of resistor R2 connected to the sources of MOSFETs Q1 and Q2.
[0063] The source of MOSFET Q1 is connected to the common connection point of capacitors C1 and C2, and resistors R1 and R2. Its drain is connected to one end of the primary winding of transformer T1, and its gate is connected to the drive signal input. The source of MOSFET Q2 is connected to the common connection point of capacitors C1 and C2, and resistors R1 and R2. Its drain is connected to the other end of the primary winding of transformer T1, and its gate is connected to the drive signal input. The source of MOSFET Q3 is connected to the other end of the primary winding of transformer T1 (the end connected to the drain of MOSFET Q2), its drain is connected to PGND, and its gate is connected to the drive signal input. The source of MOSFET Q4 is connected to one end of the primary winding of transformer T1 (the end connected to the drain of MOSFET Q1), its drain is connected to PGND, and its gate is connected to the drive signal input.
[0064] The primary winding of transformer T1 is connected to the drain of MOSFET Q1 and the drain of MOSFET Q2, and the source of MOSFET Q4 and the source of MOSFET Q3, respectively. One end of the secondary winding is connected to one end of resistor R3, one end of capacitor C4, and the anode of diode D1, and the other end is connected to one end of resistor R4, one end of capacitor C5, and the anode of diode D2.
[0065] The other end of resistor R3 is connected to the other end of capacitor C4, the cathode of diode D1, one end of resistor R5, and one end of inductor L1. One end of resistor R4 is connected to the other end of the secondary winding of transformer T1, and the other end is connected to the other end of capacitor C5, the cathode of diode D2, and the analog ground (DGND) of the circuit.
[0066] One end of capacitor C4 is connected to one end of the secondary winding of transformer T1, and the other end is connected to the other end of resistor R3, the cathode of diode D1, one end of resistor R5, and one end of inductor L1. One end of capacitor C5 is connected to the other end of the secondary winding of transformer T1, and the other end is connected to the other end of resistor R4, the cathode of diode D2, and common ground DGND.
[0067] Diode D1's anode is connected to one end of the secondary winding of transformer T1, one end of resistor R3, and one end of capacitor C4; its cathode is connected to the other end of resistor R3, the other end of capacitor C4, one end of resistor R5, and one end of diode L1. Diode D2's anode is connected to the other end of the secondary winding of transformer T1, one end of resistor R4, and one end of capacitor C5; its cathode is connected to the other end of resistor R4, the other end of capacitor C5, and DGND. One end of inductor L1 is connected to the other end of resistor R3, the other end of capacitor C4, and the cathode of diode D1; the other end is connected to the other end of resistor R5, one end of capacitor C6, and the output power supply (+HVDC). One end of capacitor C6 is connected to the other end of capacitor L1, the other end of resistor R5, and +HVDC; the other end is connected to DGND.
[0068] The other end of resistor R5 is connected to a differential amplifier circuit for front-end current sampling signal processing; one end of resistor R6 is connected to +HVDC, and the other end is connected to R7. The intermediate node is connected to the filter circuit and operational amplifier circuit for outputting the front-end voltage sampling signal; the differential amplifier circuit amplifies the front-end current sampling signal and outputs the front-end current sampling signal.
[0069] Specifically, refer to Figure 2 As shown, the full-bridge rectifier chip U1 in the power module is model KBU808, which is used to convert AC power from the power grid into pulsating DC power.
[0070] In this application, the automatic voltage switching circuit is based on the power management chip AVS1ACP08 and the bidirectional thyristor AVS12CB. The automatic voltage switching circuit enables this device to be compatible with 110Vac and 220Vac mains power supplies.
[0071] Capacitors C1 and C2 are aluminum electrolytic capacitors, which act as filters, converting pulsating DC current into smooth DC current +HVE. Resistors R1 and R2 are power resistors, which serve to discharge the voltage.
[0072] The MOSFETs Q1 to Q4 are IRF840, forming a full-bridge switching power supply topology to convert DC +HVE to 100KHz AC.
[0073] Transformer T1 is a step-down isolation transformer that couples 100KHz AC power to the secondary side. After being rectified by ultra-fast recovery rectifier diodes D1 and D2, it becomes pulsating DC power. The model of D1 and D2 is RURG3060.
[0074] The pulsating DC current is then filtered by an LC filter circuit composed of inductor L1 and capacitor C6, becoming a smooth DC current. This DC current then passes through the current sampling resistor R5 and becomes the output +HVCC of the power module.
[0075] Resistors R3 and R4 and capacitors C4 and C5 form a glitch voltage absorption circuit.
[0076] In some specific embodiments of this application, the front-end feedback circuit includes a front-end voltage sampling circuit and a front-end current sampling circuit. The front-end voltage sampling circuit outputs a front-end voltage sampling signal, and the front-end current sampling circuit outputs a front-end current sampling signal.
[0077] The preamplifier sampling circuit includes a resistor R5 and a differential amplifier circuit. The differential amplifier circuit is located across the resistor R5. One end of the resistor R51 is connected to one end of the inductor L1 and one end of the capacitor C6, respectively. It is used to pass the voltage signal across the resistor R5 through the differential amplifier circuit to obtain the preamplifier current sampling signal. The differential amplifier circuit can directly adopt an existing conventional circuit structure.
[0078] It should be noted that the pre-amplifier current sampling signal represents the DC current sampling signal output by the power module, which is used to feed back the actual current value output by the power module. Multiplying it by the voltage sampling signal gives the power output of the power module, which is the input power of the plasma generator.
[0079] The pre-amplifier voltage sampling circuit includes: resistor R6, resistor R7, a filter circuit, and an operational amplifier circuit. One end of resistor R6 is connected to the other end of resistor R5, and another end of resistor R6 is connected to one end of resistor R7. The other end of resistor R7 is grounded. The filter circuit and the operational amplifier circuit are connected between the other end of resistor R6 and one end of resistor R7. They are used to divide the output voltage of the power module, and then process it through the filter circuit and amplify it through the operational amplifier circuit to obtain the pre-amplifier voltage sampling signal. The filter circuit and the operational amplifier circuit can directly adopt existing conventional circuit structures.
[0080] It should be noted that the pre-amplifier voltage sampling signal represents the DC voltage sampling signal output by the power module, which is used to feed back the actual voltage value output by the power module. Multiplying it by the current sampling signal gives the power output of the power module, which is the input power of the plasma generator.
[0081] In some specific embodiments of this application, the front-end control circuit includes a switching power supply control circuit and an isolation drive transformer; the switching power supply control circuit is based on the switching power supply management chip UC3879DW, which has 4 PWM output channels, and drives the 4 MOSFETs (MOSFET Q1, MOSFET Q2, MOSFET Q3, and MOSFET Q4) in the full-bridge topology of the power module after passing through the isolation transformer.
[0082] The front-end microprocessor is an 8-bit ATMEGA32 microcontroller. It calculates the output power of the power module based on the front-end voltage acquisition signal and the front-end current sampling signal. At the same time, it communicates with the back-end microprocessor and the display component to obtain the set power signal. It compares the difference between the set power and the actual output power and then sends a signal to the front-end control circuit to adjust the drive signal of the power module, thereby controlling the output power of the power module.
[0083] To achieve the purpose of subsequent closed-loop control, in some specific embodiments of this application, the subsequent closed-loop control circuit further includes: a subsequent feedback circuit and a subsequent control circuit; the input terminal of the plasma generator is connected to the input terminal of the power supply module and the output terminal of the subsequent control circuit, the output terminal of the plasma generator is connected to the input terminal of the subsequent feedback circuit, the output terminal of the subsequent feedback circuit is connected to the input terminal of the subsequent microprocessor, and the output terminal of the subsequent microprocessor is connected to the input terminal of the subsequent control circuit, thus forming the subsequent closed-loop control.
[0084] The post-processor obtains the output power of the plasma generator through the post-feedback circuit, sets the output power through the display component, and controls the output power of the plasma generator through the post-control circuit; the output terminal of the plasma generator is simultaneously connected to the input terminal of the radio frequency electrode.
[0085] It's important to note that the pre-amplifier microprocessor controls the output power of the power module, while the post-amplifier microprocessor controls the output power of the plasma generator (i.e., the device's output power, which is generally consistent with the settings). Both the pre-amplifier and post-amplifier microprocessors have power adjustment capabilities, but the energy for the post-amplifier closed-loop control circuit comes from the pre-amplifier closed-loop control circuit. Therefore, the adjustment range of the post-amplifier closed-loop control circuit is limited. For example, if the pre-amplifier closed-loop control circuit outputs 100W, the post-amplifier closed-loop control circuit will not adjust to more than 100W. However, if the setting is 100W, and the post-amplifier closed-loop control circuit outputs 100W, the pre-amplifier closed-loop control circuit might output 120W, as there will be some inherent power loss.
[0086] In some specific embodiments of this application, the plasma generator includes: MOSFETs Q5, Q6, Q7, and Q8; transformer T2; capacitor C3; and inductor L2. MOSFETs Q5, Q6, Q7, and Q8 form a full-bridge topology to convert the DC power output from the power module into AC power. Transformer T2 is a step-up isolation transformer. Capacitor C3 is an isolation capacitor used to block DC and low-frequency currents. Inductor L2 is a filter inductor used to filter out high-frequency spike currents. The source of MOSFET Q5 is connected to the drain of MOSFET Q6. The drain of MOSFET Q5 is connected to the power supply +HVCC, and its gate is connected to the drive signal; the source of MOSFET Q6 is connected to analog ground, and its gate is connected to the drive signal; the source of MOSFET Q7 is connected to analog ground, and its drain is connected to the source of MOSFET Q8, with its gate connected to the drive signal; the drain of MOSFET Q8 is connected to the power supply +HVCC, and its gate is connected to the drive signal; one end of the primary winding of transformer T2 is connected to the drain of MOSFETs Q5 and Q8, and the other end is connected to the source of MOSFETs Q6 and Q7; the other end of the secondary winding is connected to capacitor C3 and inductor L2; one end of capacitor C3 is connected to the secondary winding of transformer T2, and the other end is connected to inductor L2.
[0087] Reference Figure 3 As shown in some specific embodiments of this application, the subsequent feedback circuit includes: a subsequent voltage sampling circuit and a subsequent current sampling circuit. The subsequent voltage sampling circuit outputs a subsequent voltage sampling signal. The subsequent current sampling circuit outputs a subsequent current sampling signal; wherein: the subsequent voltage sampling circuit includes: resistors R8, R9, and R10, transformer T3, and a first true RMS conversion circuit;
[0088] Among them, resistors R8 and R9 are current-limiting resistors used to limit the voltage sampling current;
[0089] Transformer T3 is a voltage sampling transformer used for electrical isolation and signal coupling, converting the high AC voltage output from the plasma generator into a low AC current signal;
[0090] Resistor R10 is a voltage sampling resistor that converts a low-current AC signal into a low-voltage AC signal.
[0091] The first true RMS conversion circuit converts the AC low-voltage signal into a DC low-voltage signal as the output voltage sampling signal for the subsequent stage.
[0092] The subsequent current sampling circuit includes transformer T4, resistor R11, and a second true RMS conversion circuit. Transformer T4 is a current transformer used to convert the large AC current output from the plasma generator into a low AC current signal. Resistor R11 is a current sampling resistor that converts the low AC current signal into a low AC voltage signal. The second true RMS conversion circuit converts the low AC voltage signal into a low DC voltage signal as the output current sampling signal for the subsequent stage.
[0093] Reference Figure 3 As shown, in a specific embodiment, the specific circuit connections between the plasma generator and the subsequent feedback circuit are as follows: the source of MOSFET Q5 is connected to the drain of MOSFET Q6, the drain of the MOSFET is connected to the power supply +HVCC, and the gate is connected to the drive signal. The source of MOSFET Q6 is connected to analog ground, and the gate (G) is connected to the drive signal. The source of MOSFET Q7 is connected to analog ground (DGND), the drain is connected to the source of MOSFET Q8, and the gate is connected to the drive signal. The drain of MOSFET Q8 is connected to the power supply +HVCC, and the gate is connected to the drive signal.
[0094] One end of the primary winding of transformer T2 is connected to the drain (+HVCC) of MOSFETs Q5 and Q8, and the other end is connected to the source (DGND) of MOSFETs Q6 and Q7. The other end of the secondary winding is connected to capacitor C3 and inductor L2. One end of capacitor C3 is connected to the secondary winding of transformer T2, and the other end is connected to inductor L2. One end of inductor L2 is connected to capacitor C3, and the other end is connected to resistor R9 and the primary winding of transformer T3. One end of resistor R9 is connected to inductor L2 and the primary winding of transformer T3, and the other end is connected to DGND.
[0095] One end of the primary winding of transformer T3 is connected to the connection point of inductor L2 and resistor R9, and the other end is connected to DGND; one end of the secondary winding is connected to resistor R10, and the other end is connected to DGND. The voltage sampling signal of the subsequent stage is taken out from the connection point of resistor R10 and secondary winding, and connected to the first true RMS conversion circuit. After conversion processing, the voltage sampling signal of the subsequent stage is output.
[0096] One end of resistor R8 is connected to the primary winding of transformer T4, and the other end is connected to the junction of inductor L2 and resistor R9, and then connected to DGND. One end of the primary winding of transformer T4 is connected to resistor R8, and the other end is connected to DGND; one end of the secondary winding is connected to resistor R11, and the other end is connected to DGND. The current sampling signal of the subsequent stage is taken out from the junction of resistor R11 and the secondary winding, and fed into the second true RMS conversion circuit. After conversion processing, the current sampling signal of the subsequent stage is output.
[0097] It should be noted that the first true RMS conversion circuit is... Figure 3 In the first circuit, connected to resistor R10, the output is a true RMS conversion circuit for voltage sampling signals; the second true RMS conversion circuit is... Figure 3 In the middle, connected to resistor R11, the output is the true RMS value conversion circuit of the current sampling signal of the subsequent stage.
[0098] In some specific embodiments of this application, the subsequent control circuit includes a switching power supply control circuit and an isolation drive transformer. The switching power supply control circuit has four PWM output channels, which drive four MOSFETs in the full-bridge topology of the plasma generator, namely MOSFET Q5, MOSFET Q6, MOSFET Q7 and MOSFET Q8, after passing through the isolation transformer.
[0099] The microprocessor calculates the output power of the plasma generator based on the voltage and current sampling signals. It also communicates with the display unit to obtain the set power signal, compares the difference between the set power and the actual output power, and sends a signal to the control circuit to adjust the drive signal of the plasma generator, thereby controlling the output power of the plasma generator.
[0100] In some specific embodiments of this application, both the front-end microprocessor and the back-end microprocessor are 8-bit ATMEGA32 microcontrollers; the display component can be a display screen or a touch screen, used to display device information and further output parameter settings. Specifically, the display component can be a 6.86-inch touch screen.
[0101] The microprocessor calculates whether the output should be increased or decreased based on the sampled signal and the set power. The adjustment method is to output an analog signal to the control circuit. The subsequent closed-loop control circuit is the same as the previous closed-loop control circuit. Both are based on the switching power management chip UC3879DW. The output control is achieved by adjusting the pulse width of the UC3879DW drive signal.
[0102] The radio frequency (RF) electrode is a plasma surgical electrode equipped with a start switch connected to the output of the plasma generator. The start switch controls energy output and shutdown. Specifically, the RF electrode can be a disposable plasma surgical electrode with a manual start switch. It connects to the plasma surgical equipment via an output port, which has a manual signal detection function, allowing energy output and shutdown to be controlled via the switch button on the plasma electrode. The output port also features electrode recognition, automatically matching and setting parameters based on the different inserted plasma electrodes.
[0103] Output and stop are controlled by detecting button signals. The electrode identification function uses resistors with different resistance values built into different electrodes, and reads the voltage division values of different resistors through the microprocessor's AD sampling port to determine the electrode.
[0104] The working principle of the dual closed-loop control plasma surgical device is as follows: After power-on, the device performs a self-test. The front-end microprocessor controls the power module to output a preset voltage within a short period of time. The front-end feedback circuit collects the voltage output by the power module and transmits it to the front-end microprocessor. The front-end microprocessor compares the voltage transmitted back from the front-end feedback circuit with the preset voltage. If the deviation is less than the set threshold, the front-end closed-loop control is considered normal and the device self-test passes. Otherwise, the front-end closed-loop control is considered abnormal, the self-test fails, power output is prohibited, and the display component issues an error warning.
[0105] After passing the self-test, the equipment operates normally. The downstream microprocessor communicates with the display unit to obtain the set output power information and sends it to the upstream microprocessor. The upstream microprocessor sends a signal to the upstream control circuit to control the power module to output the corresponding voltage and power. The downstream microprocessor sends a signal to the downstream control circuit to control the plasma generator to output the corresponding voltage and power. Therefore, the output power of the plasma generator is the actual output power of the dual-closed-loop controlled plasma surgical device. Since the working efficiency of the plasma generator is less than 100%, the output power of the power module must be greater than the output power of the plasma generator. The load of the plasma generator consists of the output port, connecting cables, plasma electrodes, and biological tissue in contact with the electrolyte. This load is a variable value under normal operating conditions, which causes the efficiency of the plasma generator to vary. If the load value deviates too much from the rated value, resulting in very low working power efficiency of the plasma generator, the downstream microprocessor will know from the signal transmitted by the downstream feedback circuit that the output power is much lower than the set value. It will then send a signal to the upstream microprocessor to request an increase in the output power of the power module, thereby increasing the output power of the plasma generator. Therefore, the dual-closed-loop control plasma surgical equipment can maintain stable power output even when the load changes, ensuring the continuity and stability of plasma generation by the electrolyte, thus achieving good surgical results. It must be specifically noted that the load changes are within permissible limits. Increases in the power module's output power are also within permissible limits to prevent a failure in the downstream closed-loop control from causing the equipment's output power to exceed the maximum permissible value under a single fault condition.
[0106] In addition, the plasma generator operating in a low-efficiency state will inevitably lead to excessive heat generation in some components. Therefore, the plasma surgical device with dual closed-loop control in the above embodiments of this application can be further equipped with a fan cooling device and a high-temperature protection device for heat dissipation.
[0107] The preferred features in the above embodiments can be used individually in any embodiment, or in any combination thereof, provided they do not conflict with each other. Furthermore, parts not described in detail in the embodiments can be implemented using existing technologies.
[0108] The foregoing has described some specific embodiments of this application. It should be understood that this application is not limited to the specific embodiments described above, and those skilled in the art can make various modifications or variations within the scope of the claims, which do not affect the substantive content of this application. The above-described preferred features can be used in any combination without conflict.
Claims
1. A dual closed loop electrosurgical apparatus, comprising: include: The front-end closed-loop control circuit, the rear-end closed-loop control circuit, the radio frequency electrodes, and the display components; The front-end closed-loop control circuit is communicatively connected to the rear-end closed-loop control circuit, and the rear-end closed-loop control circuit, the radio frequency electrode, and the display component are communicatively connected. The front-end closed-loop control circuit includes a front-end microprocessor and a power module, wherein the front-end microprocessor is used to control the output power of the power module. The post-stage closed-loop control circuit includes a post-stage microprocessor and a plasma generator. The input terminal of the post-stage microprocessor is connected to the display component, and the output terminal is connected to the pre-stage microprocessor, used to control the output power of the plasma generator.
2. A dual closed loop electrosurgical apparatus according to claim 1, wherein, The front-end closed-loop control circuit also includes a front-end feedback circuit and a front-end control circuit. The input terminal of the pre-stage microprocessor is connected to the output terminal of the post-stage microprocessor, the output terminal of the pre-stage microprocessor is connected to the input terminal of the pre-stage control circuit, the output terminal of the pre-stage control circuit is connected to the input terminal of the power module, the output terminal of the power module is connected to the input terminal of the pre-stage feedback circuit, and the output terminal of the pre-stage feedback circuit is connected to the pre-stage microprocessor, forming a pre-stage closed-loop control. The front-end microprocessor acquires the control signal from the back-end microprocessor and controls the output power of the power module through the front-end control circuit. The front-end feedback circuit is used to feed back the output power of the power module to the front-end microprocessor. The output terminal of the power module is also connected to the input terminal of the plasma generator.
3. A dual closed loop electrosurgical apparatus according to claim 2, wherein, The power module includes: a full-bridge rectifier chip U1, an automatic voltage switching circuit, capacitors C1 and C2, resistors R1 and R2, MOSFETs Q1, Q2, Q3, and Q4, a transformer T1, resistors R3 and R4, capacitors C4 and C5, diodes D1 and D2, inductor L1, and capacitor C6; wherein: The positive DC output of the full-bridge rectifier chip U1 is connected to one end of capacitors C1 and C2, and to the automatic voltage switching circuit. The negative DC output of the full-bridge rectifier chip U1 is connected to PGND. Capacitors C1 and C2 are connected in parallel. The other end of the parallel connection of capacitors C1 and C2 is connected to one end of resistors R1 and R2, and simultaneously connected to the sources of MOSFETs Q1 and Q2. Resistors R1 and R2 are connected in series. The drain of MOSFET Q1 is connected to one end of the primary winding of transformer T1, and the gate of MOSFET Q1 is connected to... The transformer T1 receives a drive signal; the drain of MOSFET Q2 is connected to the other end of the primary winding of MOSFET T1, and the gate of MOSFET Q2 receives the drive signal; the source of MOSFET Q3 is connected to the terminal where the primary winding of MOSFET T1 is connected to the drain of MOSFET Q2, the drain of MOSFET Q3 is connected to PGND, and the gate of MOSFET Q3 receives the drive signal; the source of MOSFET Q4 is connected to the terminal where the primary winding of MOSFET T1 is connected to the drain of MOSFET Q1, the drain of MOSFET Q4 is connected to PGND, and the gate of MOSFET Q4 receives the drive signal. One end of the secondary winding of the transformer T1 is connected to the resistor R3, the capacitor C4, and the anode of the diode D1; the other end of the MOSFET Q3 is connected to the resistor R4, the capacitor C5, and the anode of the diode D2; the other end of the resistor R3 is connected to the capacitor C4, the cathode of the diode D1, the resistor R5, and the inductor L1; the other end of the resistor R4 is connected to the capacitor C5, the cathode of the diode D2, and DGND. The other end of capacitor C4 is connected to resistor R3, the cathode of diode D1, resistor R5, and inductor L1. The other end of capacitor C5 is connected to resistor R4, the cathode of diode D2, and DGND. The anode of diode D1 is connected to one end of the secondary winding of transformer T1, resistor R3, and capacitor C4. The cathode of diode D1 is connected to resistor R3, capacitor C4, resistor R5, and inductor L1. The anode of diode D2 is connected to the other end of the secondary winding of transformer T1, resistor R4, and capacitor C5. The cathode of diode D2 is connected to resistor R4, capacitor C5, and DGND. One end of inductor L1 is connected to resistor R3, capacitor C4, and the cathode of diode D1. The other end of inductor L1 is connected to resistor R5, capacitor C6, and +HVDC. The other end of capacitor C6 is connected to DGND. One end of resistor R6 is connected to +HVDC.
4. A dual closed loop electrosurgical apparatus according to claim 3, wherein, The front-end feedback circuit includes a front-end voltage sampling circuit and a front-end current sampling circuit. The front-end voltage sampling circuit outputs a front-end voltage sampling signal; the front-end current sampling circuit outputs a front-end current sampling signal; wherein: The front-end sampling circuit includes a resistor R5 and a differential amplifier circuit. The differential amplifier circuit is disposed across the resistor R5. One end of the resistor R51 is connected to one end of the inductor L1 and the capacitor C6, respectively, to pass the voltage signal across the resistor R5 through the differential amplifier circuit to obtain the front-end current sampling signal. The pre-amplifier voltage sampling circuit includes: resistor R6, resistor R7, filter circuit, and operational amplifier circuit. One end of resistor R6 is connected to the other end of resistor R5, and one end of resistor R6 is connected to one end of resistor R7. The other end of resistor R7 is grounded. The filter circuit and the operational amplifier circuit are connected to the other end of resistor R6 and one end of resistor R7 to divide the output voltage of the power module. The voltage is then processed by the filter circuit and amplified by the operational amplifier circuit to obtain the pre-amplifier voltage sampling signal.
5. The dual-closed-loop plasma surgical device according to claim 1, characterized in that, The subsequent closed-loop control circuit also includes: a subsequent feedback circuit and a subsequent control circuit; The input terminal of the plasma generator, the input terminal of the power supply module, and the output terminal of the subsequent control circuit are connected. The output terminal of the plasma generator is connected to the input terminal of the subsequent feedback circuit. The output terminal of the subsequent feedback circuit is connected to the input terminal of the subsequent microprocessor. The output terminal of the subsequent microprocessor is connected to the input terminal of the subsequent control circuit, forming a subsequent closed-loop control.
6. A dual closed loop electrosurgical apparatus according to claim 5, wherein, The post-processor obtains the output power of the plasma generator through the post-feedback circuit, and controls the output power of the plasma generator through the post-control circuit by setting the output power through the display component. The output terminal of the plasma generator is simultaneously connected to the input terminal of the radio frequency electrode.
7. The dual closed loop electrosurgical apparatus of claim 5, wherein, The plasma generator includes: MOSFET Q5, MOSFET Q6, MOSFET Q7, MOSFET Q8, transformer T2, capacitor C3, and inductor L2; MOSFETs Q5, Q6, Q7, and Q8 form a full-bridge topology to convert the DC power output from the power module into AC power. Transformer T2 is a step-up isolation transformer. Capacitor C3 is an isolation capacitor used to block DC and low-frequency currents. Inductor L2 is a filter inductor used to filter out high-frequency spike currents. Wherein: The source of MOSFET Q5 is connected to the drain of MOSFET Q6. The drain of MOSFET Q5 is connected to the power supply +HVCC, and its gate is connected to the drive signal. The source of MOSFET Q6 is connected to analog ground, and its gate is connected to the drive signal. The source of MOSFET Q7 is connected to analog ground, and its drain is connected to the source of MOSFET Q8. Its gate is connected to the drive signal. The drain of MOSFET Q8 is connected to the power supply +HVCC, and its gate is connected to the drive signal. One end of the primary winding of the transformer T2 is connected to the drain of the MOSFETs Q5 and Q8, and the other end is connected to the source of the MOSFETs Q6 and Q7; the other end of the secondary winding is connected to the capacitor C3 and the inductor L2; one end of the capacitor C3 is connected to the secondary winding of the transformer T2, and the other end is connected to the inductor L2.
8. A dual closed loop electrosurgical apparatus according to claim 7, wherein, The subsequent feedback circuit includes: a subsequent voltage sampling circuit and a subsequent current sampling circuit, wherein the subsequent voltage sampling circuit outputs a subsequent voltage sampling signal; and the subsequent current sampling circuit outputs a subsequent current sampling signal; wherein: The subsequent voltage sampling circuit includes: resistors R8, R9, and R10, transformer T3, and a first true RMS conversion circuit. Resistors R8 and R9 are current-limiting resistors used to limit the voltage sampling current. Transformer T3 is a voltage sampling transformer used for electrical isolation and signal coupling, converting the high AC voltage output from the plasma generator into a low AC current signal. Resistor R10 is a voltage sampling resistor that converts the low AC current signal into a low AC voltage signal. The first true RMS conversion circuit converts the low AC voltage signal into a low DC voltage signal as the subsequent voltage sampling signal output. The subsequent current sampling circuit includes a transformer T4, a resistor R11, and a second true RMS conversion circuit. The transformer T4 is a current transformer that converts the large AC current output by the plasma generator into a low AC current signal. The resistor R11 is a current sampling resistor that converts the low AC current signal into a low AC voltage signal. The second true RMS conversion circuit converts the low AC voltage signal into a low DC voltage signal as the output current sampling signal for the subsequent stage.
9. The dual closed loop electrosurgical apparatus of claim 5, wherein, The subsequent control circuit includes a switching power supply control circuit and an isolation drive transformer. The switching power supply control circuit has four PWM output channels, which drive four MOSFETs in the full-bridge topology of the plasma generator, namely MOSFET Q5, MOSFET Q6, MOSFET Q7 and MOSFET Q8, after passing through the isolation transformer.
10. The dual closed loop electrosurgical apparatus of claim 1, wherein, Both the front-end microprocessor and the rear-end microprocessor are 8-bit single-chip microcomputers ATMEGA32. The radio frequency electrode is a plasma surgical electrode, equipped with a start switch, which is connected to the output terminal of the plasma generator. The start switch controls the energy output and stops the operation.