A light-proof controllable reaction device for photosensitive compound synthesis

Abstract

The utility model relates to compound synthetic technique field, concretely relates to a kind of light-controlled reaction device for photosensitive compound synthesis, including reaction tank, the inside movable joint of reaction tank has receiving plate, the upper end of reaction tank is connected with frame body, and the fixed mounting of emitter is installed on the frame body;It further includes the magnetic ring of reaction tank outer wall, the energized spring is arranged between the magnetic ring and reaction tank middle part, and the magnetic adsorption between the magnetic ring and receiving plate, the lower end fixed mounting of reaction tank has support pipe, the lower end fixed connection of receiving plate has guide rod, the sliding fit between the guide rod and support pipe, reaction groove is set in the reaction tank. Through the magnetic ring of movable joint on the outer wall of reaction tank, and the magnetic adsorption relationship between the magnetic ring and receiving plate, with the continuation of photosensitive reaction, the distance between corresponding receiving plate and emitter increases, corresponding photosensitive intensity reduces, and the synthesis quality of photosensitive compound is guaranteed.

Description

Technical Field

[0001] This invention relates to the field of compound synthesis, and more particularly to a light-proof, controllable reaction apparatus for the synthesis of photosensitive compounds. Background Technology

[0002] Photosensitive substances are substances that initiate photochemical reactions by absorbing ultraviolet light. Based on their molecular structure, they can be divided into inorganic photosensitive small molecule compounds and organic photosensitive polymer compounds. In actual production and preparation processes, the synthesis of reactants is controlled by controlling the intensity of the external light source. However, the power of the external light source is usually fixed during the synthesis of existing photosensitive compounds and cannot be flexibly adjusted according to the progress of compound synthesis. Therefore, we designed a light-shielding and controllable reaction device for the synthesis of photosensitive compounds. Summary of the Invention

[0003] In view of the above-mentioned shortcomings of the existing technology, the present invention provides a light-proof and controllable reaction device for the synthesis of photosensitive compounds, which can effectively solve the problem that the power of the external light source is usually fixed during the synthesis of photosensitive compounds and cannot be flexibly adjusted according to the synthesis progress of the compound.

[0004] To achieve the above objectives, the present invention adopts the following technical solution:

[0005] A light-proof and controllable reaction apparatus for the synthesis of photosensitive compounds includes a reaction vessel, a receiving plate movably connected inside the reaction vessel, a frame connected to the upper end of the reaction vessel, and an emitter fixedly installed on the frame.

[0006] It also includes a magnetic ring fitted on the outer wall of the reaction vessel, with an energized spring between the magnetic ring and the middle of the reaction vessel, and the magnetic ring magnetically adsorbed to the receiving plate.

[0007] Preferably, a support pipe is fixedly installed at the lower end of the reaction vessel, and a guide rod is fixedly connected to the lower end of the receiving plate. The guide rod and the support pipe are slidably fitted together, and a reaction tank is opened inside the reaction vessel.

[0008] Preferably, an overlapping block is fixedly installed on the outer wall of the reaction vessel, the overlapping block is fixedly connected to the frame, and the lower end of the frame slides in engagement with the upper inner wall of the magnetic ring.

[0009] Preferably, a baffle is fixedly installed on the lower outer wall of the magnetic ring, and a transverse groove is formed through the outer wall of the baffle. A discharge chute is formed on the outer wall of the reaction vessel.

[0010] Preferably, it also includes a heat-conducting ring fixedly installed on the frame, the inner wall of the heat-conducting ring overlapping the outer wall of the transmitter, a thermistor fixedly installed on the outer wall of the heat-conducting ring, and the thermistor and the energized spring being connected in the same circuit.

[0011] Preferably, the higher the temperature of the thermistor, the greater the resistance value and the smaller the current in the circuit. Consequently, the energized spring will extend and return to its original position, causing the magnetic ring to move downwards.

[0012] Compared with the prior art, the present invention has the following beneficial effects:

[0013] This invention utilizes a magnetic ring movably connected to the outer wall of the reaction vessel, and the magnetic adsorption relationship between the magnetic ring and the receiving plate. As the photosensitive reaction continues, the distance between the receiving plate and the emitter increases, and the corresponding photosensitive intensity decreases adaptively, thus ensuring the synthesis quality of the photosensitive compound. Attached Figure Description

[0014] To more clearly illustrate the technical solutions in the embodiments of the present invention, the accompanying drawings used in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0015] Figure 1 This is a schematic diagram of the overall structure of the controllable reaction device of the present invention;

[0016] Figure 2 This is a schematic diagram of the overall explosion structure of the controllable reaction device of the present invention;

[0017] Figure 3 This is a schematic diagram of the exploded structure at the magnetic ring of the present invention.

[0018] Drawing number explanation:

[0019] 100. Reaction vessel; 101. Reaction tank; 102. Discharge chute; 103. Overlapping block; 110. Support pipe;

[0020] 200. Receiving plate; 210. Guide rod;

[0021] 300. Magnetic ring; 301. Electrified spring; 310. Baffle; 311. Horizontal groove; 320. Frame; 330. Thermistor; 340. Thermally conductive ring;

[0022] 400. Transmitter. Detailed Implementation

[0023] The present invention will now be described in further detail with reference to the accompanying drawings.

[0024] The following description is intended to disclose the invention so that those skilled in the art can implement it. The preferred embodiments described below are merely examples, and other obvious modifications will be apparent to those skilled in the art. The basic principles of the invention defined in the following description can be used in other embodiments, modifications, improvements, equivalents, and other technical solutions that do not depart from the spirit and scope of the invention.

[0025] Those skilled in the art should understand that, in the disclosure of this invention, the terms "longitudinal," "lateral," "upper," "lower," "left," "right," "front," "rear," "vertical," "horizontal," "top," "bottom," "inner," and "outer," etc., indicate the orientation or position based on the orientation or positional relationship shown in the accompanying drawings. They are merely simplified descriptions for the convenience of describing this invention and do not indicate or imply that the device or component referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, the above terms should not be construed as limitations on this invention.

[0026] It is understood that the term "a" should be understood as "at least one" or "one or more", that is, in one embodiment, the number of an element can be one, while in another embodiment, the number of the element can be multiple, and the term "a" should not be understood as a limitation on the number. Example

[0027] See attached document Figure 1-3 As shown, a light-proof, controllable reaction apparatus for synthesizing photosensitive compounds includes a reaction vessel 100, with a receiving plate 200 movably connected inside the reaction vessel 100. A frame 320 is connected to the upper end of the reaction vessel 100, and an emitter 400 is fixedly mounted on the frame 320. It also includes a magnetic ring 300 sleeved on the outer wall of the reaction vessel 100, with an energized spring 301 positioned between the magnetic ring 300 and the middle of the reaction vessel 100, and the magnetic ring 300 and the receiving plate 200 are magnetically attracted to each other. Specifically, in this application, the compound to be reacted is placed on the receiving plate 200 movably connected inside the reaction vessel 100. During the actual reaction process, the emitter 400 on the frame 320 illuminates the inside of the reaction vessel 100, thereby achieving the production and preparation of the photosensitive compound.

[0028] Specifically, in this application, a support tube 110 is fixedly installed at the lower end of the reaction vessel 100, and a guide rod 210 is fixedly connected to the lower end of the receiving plate 200. The guide rod 210 and the support tube 110 are slidably engaged. A reaction tank 101 is provided inside the reaction vessel 100. The magnetic ring 300 and the receiving plate 200 are magnetically attracted to each other. During the photosensitive reaction, the installation position of the corresponding emitter 400 is fixed. As the photosensitive reaction continues, the power of the external light source does not need to be maintained at the same high power as in the initial stage of the reaction. As the reaction continues, the corresponding power can be adaptively reduced, thereby reducing energy consumption while ensuring sufficient photosensitive reaction.

[0029] Correspondingly, the application also includes a heat-conducting ring 340 fixedly installed on the frame 320. The inner wall of the heat-conducting ring 340 overlaps with the outer wall of the transmitter 400. A thermistor 330 is fixedly installed on the outer wall of the heat-conducting ring 340. The thermistor 330 and the energized spring 301 are installed in the same circuit. The higher the temperature of the thermistor 330, the higher the resistance value and the lower the current in the circuit. The corresponding energized spring 301 will extend and return to its original position, causing the magnetic ring 300 to move downward. As the transmitter 400 continues to be used, its temperature will rise, and the temperature of the heat-conducting ring 340 on the outer wall of the transmitter 400 will also rise. This will cause the resistance of the thermistor 330 laid on the frame 320 to increase. Since the energized spring 301 and the thermistor 330 are connected in the same circuit, when the resistance of the thermistor 330 increases, the current in the circuit will decrease when the voltage is constant. When the current decreases, the length of the energized spring 301 will return to its original length.

[0030] Furthermore, an overlapping block 103 is fixedly installed on the outer wall of the reaction vessel 100. The overlapping block 103 is fixedly connected to the frame 320, and the lower end of the frame 320 slides against the inner wall of the upper end of the magnetic ring 300. When the length of the energized spring 301 increases, the magnetic ring 300, which is movably connected to the outer wall of the reaction vessel 100, will move downward. Combined with the magnetic adsorption relationship between the magnetic ring 300 and the receiving plate 200, when the magnetic ring 300 moves downward, the corresponding receiving plate 200 will also move downward, thereby causing the compound located on the upper side of the receiving plate 200 to move downward synchronously. During this process, due to the increased distance between the compound and the emitter 400, the intensity of the light source irradiating the compound will decrease, ensuring the quality of compound synthesis and making adaptive adjustments according to the progress of compound synthesis.

[0031] Specifically, in this application, a baffle 310 is fixedly installed on the lower outer wall of the magnetic ring 300, and a transverse groove 311 is formed through the outer wall of the baffle 310. A discharge chute 102 is formed on the outer wall of the reaction vessel 100. As the photosensitive reaction continues, the corresponding magnetic ring 300 will continue to move downward. The baffle 310 is fixedly connected to the lower end of the magnetic ring 300, and the baffle 310 will move downward synchronously. Correspondingly, the transverse groove 311 formed on the baffle 310 will move down to the position corresponding to the discharge chute 102. At this time, the photosensitive reaction ends, and the discharge chute 102 is used to unload the material. Furthermore, a guide rod 210 is fixedly installed at the lower end of the receiving plate 200. The guide rod 210 will slide inside the support tube 110 and... Furthermore, when the lower end of the guide rod 210 contacts the inner wall of the support tube 110, the corresponding discharge trough 102 will be aligned with the transverse groove 311 to facilitate unloading. As one implementation method, a trigger switch is provided on the bottom inner wall of the support tube 110. When the lower end of the guide rod 210 contacts the trigger switch, the corresponding emitter 400 will disconnect the power supply, realizing automatic control of the power supply of the emitter 400. Subsequently, when it is necessary to re-synthesize the compound, the power supply of the emitter 400 can be reconnected.

[0032] Those skilled in the art should understand that the embodiments of the present invention described above and shown in the accompanying drawings are merely examples and do not limit the present invention. The objectives of the present invention have been fully and effectively achieved. The functions and structural principles of the present invention have been shown and explained in the embodiments, and any modifications or variations of the embodiments of the present invention may be made without departing from the stated principles.

Claims

1. A light-protected, controllable reaction apparatus for the synthesis of photosensitive compounds, characterized in that, include: A reaction vessel (100) is provided with a support plate (200) movably connected inside the reaction vessel (100), and a frame (320) is connected to the upper end of the reaction vessel (100). A transmitter (400) is fixedly installed on the frame (320). It also includes a magnetic ring (300) fitted on the outer wall of the reaction vessel (100), with an electric spring (301) provided between the magnetic ring (300) and the middle of the reaction vessel (100), and the magnetic ring (300) and the receiving plate (200) are magnetically attracted to each other.

2. The light-proof and controllable reaction apparatus for the synthesis of photosensitive compounds according to claim 1, characterized in that: The lower end of the reaction vessel (100) is fixedly installed with a support pipe (110), and the lower end of the receiving plate (200) is fixedly connected with a guide rod (210). The guide rod (210) and the support pipe (110) are slidably engaged. A reaction tank (101) is opened inside the reaction vessel (100).

3. The light-proof and controllable reaction apparatus for the synthesis of photosensitive compounds according to claim 2, characterized in that: An overlapping block (103) is fixedly installed on the outer wall of the reaction vessel (100). The overlapping block (103) is fixedly connected to the frame (320). The lower end of the frame (320) slides in cooperation with the upper inner wall of the magnetic ring (300).

4. The light-proof and controllable reaction apparatus for the synthesis of photosensitive compounds according to claim 3, characterized in that: A baffle (310) is fixedly installed on the lower outer wall of the magnetic ring (300), and a transverse groove (311) is opened through the outer wall of the baffle (310). A discharge chute (102) is opened on the outer wall of the reaction vessel (100).

5. The light-proof and controllable reaction apparatus for the synthesis of photosensitive compounds according to claim 4, characterized in that: It also includes a heat-conducting ring (340) fixedly installed on the frame (320), the inner wall of the heat-conducting ring (340) overlapping the outer wall of the transmitter (400), a thermistor (330) fixedly installed on the outer wall of the heat-conducting ring (340), and the thermistor (330) and the energized spring (301) connected in the same circuit.

6. The light-proof and controllable reaction apparatus for the synthesis of photosensitive compounds according to claim 5, characterized in that: The higher the temperature of the thermistor (330), the greater the resistance value and the smaller the current in the circuit. The corresponding energized spring (301) will extend and return to its original position, causing the magnetic ring (300) to move downward.

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