A silicon wafer diffusion apparatus

Abstract

The utility model discloses a kind of silicon wafer diffusion devices, including furnace tube and the boat support of bearing silicon wafer, furnace tube bottom is provided with base, base forms control cavity, control cavity is communicated with furnace tube inner chamber by sedimentation mouth;Sedimentation mouth is provided with sedimentation platform, sedimentation platform bottom is provided with trigger block, trigger block has guide structure between control cavity;Control cavity is symmetrically provided with pivot along the length direction of boat support, each pivot rotationally sets rotation block, and clamping structure is arranged between rotation block and boat support;Action channel for trigger block action is formed between two rotation blocks, and linkage mechanism for controlling clamping structure is provided on rotation block.When boat support is placed on sedimentation platform, trigger block is moved down by gravity, rotation block is rotated by linkage mechanism drive, so that clamping structure locks the supporting leg of boat support, the device is locked by gravity trigger type automatic locking mechanism, solve the shaking problem of boat support in high-temperature process, avoid silicon wafer pollution, breakage and process unevenness.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor technology, and in particular to a silicon wafer diffusion device. Background Technology

[0002] With the development of the semiconductor industry, the demand for material processing equipment is increasing. A furnace support is a high-temperature resistant component used in furnace tubes to load silicon wafers for high-temperature processing. Due to its high-temperature resistance, chemical corrosion resistance, and good thermal stability, silicon carbide is widely used in various heat treatment processes, such as diffusion, oxidation, CVD, and annealing.

[0003] Currently, in the process of placing silicon wafers in a boat tray, the silicon wafers are fed into the furnace tube by a boat-pushing mechanism. The boat tray, which carries the silicon wafers, is then placed in the furnace tube. This method of placing the boat tray results in the silicon wafers not being fixed in place. During the process of the boat tray entering the furnace and the high-temperature treatment inside the furnace, the boat tray is prone to shaking. The shaking of the silicon wafers can cause particulate contamination or even fragmentation due to friction between the silicon wafers and the boat tray, as well as unevenness in the process (such as diffusion and oxidation) caused by positional displacement, which seriously affects the product yield and performance.

[0004] Therefore, there is an urgent need for a silicon wafer diffusion device to solve the problem that existing shelving boat carriers are prone to shaking during the pushing of the boat into the furnace and high-temperature processes, which leads to silicon wafer contamination, damage and poor process uniformity. Utility Model Content

[0005] The purpose of this invention is to provide a silicon wafer diffusion device that solves the problem of wobbling of the wafer carrier during high-temperature processes by using a gravity-triggered automatic locking mechanism, thereby avoiding silicon wafer contamination, damage, and process inhomogeneity.

[0006] The above-mentioned technical objective of this utility model is achieved through the following technical solution:

[0007] A silicon wafer diffusion device includes a furnace tube and a boat support for carrying silicon wafers. A base is provided at the bottom of the furnace tube, and the base forms a control cavity. The control cavity and the inner cavity of the furnace tube form a settling port. A settling platform is provided at the settling port, and a trigger block is provided at the bottom of the settling platform. A guide structure is provided between the trigger block and the control cavity. Rotating shafts are symmetrically arranged along the length of the boat support inside the control cavity. Each rotating shaft rotatably provides a rotating block. A locking structure is provided between the rotating block and the boat support. An action channel for the trigger block to move is formed between two rotating blocks. A linkage mechanism is provided on the rotating block to control the locking structure to be in an engaged or disengaged state.

[0008] By adopting the above technical solution, the trigger block automatically presses down when the boat carrier is placed, and the linkage mechanism converts gravity into the rotational force of the rotating block, driving the locking structure to lock the support foot, thereby achieving rigid fixation of the silicon wafer carrier and completely eliminating the risk of shaking during the process of pushing the boat into the furnace and high-temperature treatment.

[0009] The guide structure is further configured such that: a guide post is vertically disposed at the bottom of the control cavity, and a guide groove is opened at the bottom of the trigger block, wherein the guide groove is slidably disposed on the guide post.

[0010] By adopting the above technical solution, the guide post and guide groove work together to ensure that the trigger block moves accurately in the vertical direction, avoiding jamming caused by skew and improving the reliability of the action.

[0011] Further configured as follows: the snap-fit ​​structure includes a pair of support feet symmetrically arranged at the bottom of the boat support, symmetrical slots opened on the support feet, and a claw arranged at the end of the rotating block facing the slot.

[0012] By adopting the above technical solution, the claw and the slot of the support foot form a mechanical interlock, fixing the boat support and the base together as one, thereby suppressing shaking.

[0013] The further configuration is as follows: the claw has a triangular structure, the slot is adapted to the shape of the claw, and the hypotenuse of the triangular claw faces the slot inlet.

[0014] By adopting the above technical solution, the triangular hypotenuse design enables the claw to generate a self-centering effect during the locking process, ensuring smooth engagement; after locking, the right-angled side provides shear resistance to prevent disengagement under high temperature conditions.

[0015] The linkage mechanism is further configured such that: an action channel for triggering block action is formed between the two rotating blocks, and a pushing part is located at the other end of the rotating block facing the sinking port, the pushing part being located on the movement path of the trigger block.

[0016] By adopting the above technical solution, the trigger block directly presses the pushing part when it moves down, which efficiently converts the linear motion into the rotational motion of the rotating block. The structure is simple and the power transmission is lossless.

[0017] A further configuration is provided: a reset spring is connected between the two pushing parts, and the reset spring resets the pushing parts to the movement path of the trigger block.

[0018] By adopting the above technical solution, the return spring automatically pulls back the rotating block after the boat support is removed, causing the pawl to disengage from the slot, achieving quick unlocking, and at the same time preparing the initial position for the next locking.

[0019] Further configuration: the guide structure, snap-fit ​​structure and linkage mechanism are all made of high-temperature resistant materials.

[0020] By adopting the above technical solutions, it is ensured that all moving parts are free from deformation and oxidation failure in the high-temperature environment of the furnace tube, thus guaranteeing long-term stability. Attached Figure Description

[0021] Figure 1 This is a schematic diagram of the separated state in this embodiment;

[0022] Figure 2 This is a schematic diagram of the engaged state in this embodiment;

[0023] In the diagram: 1. Furnace tube; 11. Boat support; 12. Base; 13. Control chamber; 14. Settling port; 15. Settling platform; 16. Trigger block; 17. Rotating shaft; 18. Rotating block; 21. Guide column; 22. Guide groove; 31. Support leg; 32. Slot; 33. Claw; 51. Action channel; 52. Pushing part; 6. Return spring; Detailed Implementation

[0024] The present invention will be further described in detail below with reference to the accompanying drawings.

[0025] refer to Figures 1 to 2 A silicon wafer diffusion device suitable for 4-inch and 5-inch compatible silicon wafers includes a furnace tube 1 and a boat support 11 for supporting 5-inch silicon wafers. The boat support 11 is arc-shaped. A square base 12 is welded to the bottom of the furnace tube 1. A cuboid control cavity 13 is milled inside the base 12. A circular settling port 14 is opened at the top of the control cavity 13 to connect to the inner cavity of the furnace tube 1. An arc-shaped settling platform 15 is installed at the settling port 14. A cylindrical trigger block 16 is vertically welded to the bottom center of the settling platform 15. A guide structure is provided between the trigger block 16 and the control cavity 13. A rotating shaft 17 is installed on each of the two side walls of the control cavity 13. The axis of the rotating shaft 17 is parallel to the length direction of the boat support 11. Each rotating shaft 17 is sleeved with a rotating block 18. A snap-fit ​​structure is provided between the rotating block 18 and the boat support 11. A rectangular action channel 51 is reserved between the two rotating blocks 18. The trigger block 16 is located directly above the action channel 51. The rotating block 18 is provided with a linkage mechanism to control the snap-fit ​​structure to be in an engaged or disengaged state.

[0026] The guiding structure includes a vertically welded stainless steel guide post 21 at the bottom of the control cavity 13 and a guide groove 22 at the bottom of the trigger block 16, the guide groove 22 being slidably fitted onto the guide post 21. The locking structure includes a pair of semi-circular support feet 31 symmetrically arranged at the bottom of the boat support 11, triangular slots 32 symmetrically arranged on the support feet 31, and a claw 33 located on the rotating block 18 facing the slot 32. The claw 33 has a triangular structure, and the shape of the slot 32 matches that of the claw 33, with the hypotenuse of the triangular claw 33 facing the inlet of the slot 32. When the boat support 11 is placed on the settling platform 15, the trigger block 16 moves downward under gravity, driving the rotating block 18 to rotate through the linkage mechanism, thereby locking the support feet 31 of the boat support 11 with the locking structure. The linkage mechanism includes an action channel 51 formed between the two rotating blocks 18 for the trigger block 16 to move, and a pushing part 52 located at the other end of the rotating block 18 facing the settling port 14, the pushing part 52 being located on the movement path of the trigger block 16. A nickel-based alloy return spring 6 is connected between the push parts 52. In its natural state, the spring keeps the push parts 52 in a horizontal position. The return spring 6 returns the push parts 52 to the movement path of the trigger block 16. The guide post 21, the claw 33, and the push parts 52 are all made of silicon carbide sintering.

[0027] Overall workflow: The boat-pushing mechanism moves the boat support 11 carrying silicon wafers onto the settling platform 15; the boat support 11 presses down on the trigger block 16 due to gravity, and the trigger block 16 moves down along the guide column 21; the bottom of the trigger block 16 presses against the V-shaped pushing part 52, driving the rotating block 18 to rotate around the rotating shaft 17; the triangular claw 33 at the end of the rotating block 18 wedges into the slot 32 of the support foot 31 to achieve mechanical locking; after the process is completed, the boat support 11 is removed, the reset spring 6 pulls the pushing part 52 to reset, the trigger block 16 is pushed up by the pushing part 52, and the claw 33 disengages from the slot 32.

[0028] This specific embodiment is merely an explanation of the present utility model and is not intended to limit the present utility model. After reading this specification, those skilled in the art can make modifications to this embodiment without contributing any inventive step, but as long as they are within the scope of the claims of the present utility model, they are protected by patent law.

Claims

1. A silicon wafer diffusion apparatus, comprising a furnace tube (1) and a boat support (11) for carrying silicon wafers, characterized in that: The bottom of the furnace tube (1) is provided with a base (12), the base (12) forms a control cavity (13), the control cavity (13) and the inner cavity of the furnace tube (1) form a settling port (14) connected to each other, a settling platform (15) is provided at the settling port (14), a trigger block (16) is provided at the bottom of the settling platform (15), a guide structure is provided between the trigger block (16) and the control cavity (13), a rotating shaft (17) is symmetrically arranged in the control cavity (13) along the length direction of the boat support (11), each rotating shaft (17) is rotatably provided with a rotating block (18), a snap-fit ​​structure is provided between the rotating block (18) and the boat support (11), an action channel (51) for the trigger block (16) to move is formed between two rotating blocks (18), and a linkage mechanism is provided on the rotating block (18) to control the snap-fit ​​structure to be in a snap-fit ​​state or a disengaged state.

2. The silicon wafer diffusion device according to claim 1, characterized in that: The guide structure includes a guide post (21) vertically disposed at the bottom of the control cavity (13) and a guide groove (22) opened at the bottom of the trigger block (16), the guide groove (22) being slidably disposed on the guide post (21).

3. The silicon wafer diffusion device according to claim 1, characterized in that: The snap-fit ​​structure includes a pair of support feet (31) symmetrically arranged at the bottom of the boat support (11), a snap-fit ​​groove (32) symmetrically opened on the support feet (31), and a snap-fit ​​claw (33) arranged on the rotating block (18) facing the snap-fit ​​groove (32).

4. The silicon wafer diffusion apparatus according to claim 3, characterized in that: The claw (33) has a triangular structure, and the shape of the slot (32) is adapted to the claw (33). The hypotenuse of the triangular claw (33) faces the entrance of the slot (32).

5. A silicon wafer diffusion device according to claim 1, characterized in that: The linkage mechanism includes an action channel (51) formed between the two rotating blocks (18) for the trigger block (16) to move, and a pushing part (52) located at the other end of the rotating block (18) facing the sinking port (14), the pushing part (52) being located on the movement path of the trigger block (16).

6. The silicon wafer diffusion apparatus according to claim 5, characterized in that: A reset spring (6) is connected between the two pushers (52), and the reset spring (6) resets the pusher (52) to the movement path of the trigger block (16).

7. A silicon wafer diffusion apparatus according to claim 1, characterized in that: The guiding structure, snap-fit ​​structure, and linkage mechanism are all made of high-temperature resistant materials.

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