A tray assembly for a vapor deposition growth chamber

Abstract

The utility model relates to chemical vapor deposition technical field especially relates to a tray assembly for vapor deposition growth chamber, including shell, still include: air inlet portion, air inlet portion installs on the base of shell, transmission portion, transmission portion installs on air inlet portion and is located the inside of shell, through drive portion can drive hollow column rotation, and then through the gas injection hole can even gas injection in the shell, improved the uniformity of gas distribution in the shell, and then improved the uniformity of the film layer structure formed on the substrate, and rely on transmission portion can make the substrate autorotation, and then make the gas column swept in the gas injection hole in the substrate each surface area, through the uniform rotation of hollow column, can make the substrate keep uniform rotation, and then can make the gas column of gas injection hole whole and the contact time of each area of substrate surface, with it improved the uniformity of the film structure formed on the substrate surface, improved the film quality.

Description

Technical Field

[0001] This utility model relates to the field of chemical vapor deposition technology, and in particular to a tray assembly for a vapor deposition growth chamber. Background Technology

[0002] Chemical vapor deposition (CVD) is a thin film deposition technique commonly used in materials science. It involves introducing gaseous reactants into a reaction chamber at high temperatures, causing them to react chemically on the surface of a substrate to form a solid thin film or coating. This process not only allows for precise control of the thickness, composition, and structure of the thin film, but also has wide applications in semiconductors, optoelectronic devices, solar cells, and other fields to produce high-performance functional materials.

[0003] The patent, CN101560650B, entitled "A Chemical Vapor Deposition Reaction Chamber Structure with Multiple Spray Heads," describes: "The reaction chamber is a cylindrical cavity. The lower part of the reaction chamber is an integral graphite tray, on which up to dozens of wafers to be deposited (2 inches or 4 inches in diameter) can be placed. Below the tray is a resistance heater. The upper part of the reaction chamber has multiple evenly distributed spray heads, slightly larger than the wafers. Each spray head consists of densely packed micro-spray holes and a guide tube below. Each guide tube is aligned with one wafer, meaning the number of spray heads equals the number of wafers. The reaction gas is sprayed from the spray head towards the directly opposite wafer, forming a stagnant flow. The gas after the reaction is deflected 180 degrees and returns upward from around each spray head until it is discharged from the upper outlet."

[0004] However, during the reaction process of the above device, when the tray moves multiple substrates, as the substrates pass under the spray head, the position closer to the center of the substrate and the center of the tray is under the spray head for a longer time than the position closer to the edge of the substrate. This results in different contact times between different positions in the substrate and the sprayed gas, thereby reducing the quality of the film layer. Utility Model Content

[0005] The purpose of this invention is to address the shortcomings of existing technologies by using an air inlet to guide gas toward the substrate, and a drive unit to rotate the air inlet, which makes the gas evenly distributed inside the shell and causes the substrate to revolve around the air inlet. At the same time, the transmission unit makes the substrate rotate, so that the gas is evenly blown to each part of the substrate. This solves the technical problem of uneven film thickness caused by the different times when the gas is blown to different parts of the substrate during the reaction process.

[0006] To address the above technical issues, the following technical solution is adopted:

[0007] A tray assembly for a vapor deposition growth chamber, comprising a housing, characterized in that it further comprises:

[0008] An air intake section, which extends vertically through the base of the outer casing;

[0009] The transmission unit is mounted on the air intake and located inside the housing; and

[0010] A substrate, which is mounted on the transmission unit.

[0011] During the reaction, the substrate rotates on its own axis while revolving around the air intake via the transmission unit, so that the gas blown out by the air intake is evenly distributed on the surface of the substrate.

[0012] Preferably, the air intake includes:

[0013] U-shaped seat, the U-shaped seat being installed at the bottom of the base;

[0014] A hollow column, which vertically penetrates the base and the U-shaped seat, and is rotatably positioned on the opening between the base and the U-shaped seat;

[0015] The hollow column has multiple air jet holes on its sidewalls; and

[0016] An air intake pipe is installed on an opening at the bottom end of a hollow column.

[0017] Preferably, sealing rings are provided on both the opening of the base and the opening at the bottom of the hollow column.

[0018] Preferably, the system also includes a drive unit mounted below the base, the drive unit comprising:

[0019] The driving component is mounted on the U-shaped base;

[0020] The driving wheel is mounted on the output end of the drive element; and

[0021] The driven wheel is mounted on a hollow column and is driven by the driving wheel.

[0022] Preferably, both the driving wheel and the driven wheel are gear structures, and they are driven by meshing.

[0023] Preferably, the transmission unit includes:

[0024] The hollow column has multiple fixed shells installed on its outer wall, and the fixed shells correspond to the air jet holes.

[0025] A friction ring, wherein the friction ring is mounted on the inner wall of the housing, and the longitudinal section of the friction ring is trapezoidal;

[0026] An adjusting element is mounted on the fixed housing for adjusting the transmission ratio between the hollow column and the substrate; and

[0027] A support component is mounted on the fixed shell for loading the substrate.

[0028] Preferably, the adjusting element includes:

[0029] A rotating rod is rotatably mounted on the fixed shell, and the central axis of the rotating rod is parallel to the inclined surface of the friction ring;

[0030] A friction wheel, which is sleeved on a rotating rod;

[0031] Two limiting blocks are mounted on the outside of the rotating rod, and the two limiting blocks are respectively located on the upper and lower sides of the friction wheel, to limit the up and down movement of the friction wheel along the central axis of the rotating rod; and

[0032] The main drive wheel is mounted on the top of the rotating rod and located inside the fixed housing;

[0033] By adjusting the distance between the two limiting blocks, the friction wheel is clamped and fixed at the axial target position of the rotating rod.

[0034] Preferably, the portion of the rotating rod outside the fixed housing has a threaded structure, and the limiting block is threaded on the rotating rod.

[0035] Preferably, the support member includes:

[0036] A rotating shaft, which is rotatably mounted inside a fixed housing;

[0037] The driven wheel is mounted outside the rotating shaft and meshes with the main drive wheel; and

[0038] A tray, which is mounted on top of the rotating shaft, to support the substrate.

[0039] Preferably, it also includes an air outlet located on the outer casing, the air outlet comprising:

[0040] The outer shell has multiple exhaust gas troughs on its inner sidewall.

[0041] The outer casing has a connecting slot that communicates with the outside world, and the connecting slot is connected to multiple exhaust gas slots.

[0042] The beneficial effects of this utility model are:

[0043] (1) In this utility model, the hollow column can be driven to rotate by the drive unit, and then the gas can be evenly sprayed into the shell through the jet hole, which improves the uniformity of gas distribution in the shell and thus improves the uniformity of film structure formed on the substrate. Furthermore, the substrate can be rotated by the transmission unit, so that the gas column ejected from the jet hole sweeps across the surface area of ​​the substrate. By controlling the uniform rotation of the hollow column, the substrate can be kept rotating at a uniform speed, so that the gas column ejected from the jet hole can contact the surface area of ​​the substrate for the same amount of time, thereby improving the uniformity of film structure formed on the substrate surface and improving the quality of film.

[0044] (2) In this utility model, by adjusting the position of the friction wheel on the rotating rod, the transmission ratio between the rotation of the hollow column and the rotation of the substrate can be adjusted, thereby adjusting the speed at which the air column ejected from the jet hole sweeps across the surface of the substrate. Consequently, the rotational speed of the substrate in the air column ejected from the jet hole can be optimized, thereby affecting the motion trajectory of the substrate and the air column, so that the exposure time of the substrate in the airflow is moderate, thereby controlling the deposition rate.

[0045] In summary, this device has the advantage of forming a more uniform film structure. Attached Figure Description

[0046] To more clearly illustrate the technical solutions of the embodiments of this utility model, the drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0047] Figure 1 This is a schematic diagram of the overall structure of the tray assembly used in the vapor deposition growth chamber.

[0048] Figure 2 This is a schematic diagram of the internal structure of the outer shell of the tray assembly for a vapor deposition growth chamber.

[0049] Figure 3 This is a schematic diagram of the internal structure of a portion of the outer shell of a tray assembly for a vapor deposition growth chamber.

[0050] Figure 4 This is a schematic diagram of the internal structure of a partially hollow column in a tray assembly for a vapor deposition growth chamber.

[0051] Figure 5 This is a schematic diagram of the internal structure of a portion of the drive mechanism of a tray assembly used in a vapor deposition growth chamber.

[0052] Figure 6 This is an enlarged structural diagram of the adjusting and supporting components of the tray assembly for a vapor deposition growth chamber.

[0053] 1. Outer shell; 2. Base; 3. Air inlet; 31. U-shaped seat; 32. Hollow column; 33. Jet nozzle; 34. Air inlet pipe; 35. Sealing ring; 4. Drive unit; 41. Drive component; 42. Drive wheel; 43. Driven wheel; 5. Transmission unit; 51. Fixed shell; 52. Friction ring; 53. Adjusting component; 531. Rotating rod; 532. Friction wheel; 533. Limiting block; 534. Main transmission wheel; 54. Support component; 541. Rotating shaft; 542. Driven wheel; 543. Tray; 6. Base plate; 7. Air outlet; 71. Connecting groove; 72. Exhaust gas groove. Detailed Implementation

[0054] The technical solutions in the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings.

[0055] Example 1

[0056] like Figure 1 and Figure 5 As shown, a tray assembly for a vapor deposition growth chamber includes a housing 1, and further includes: an air inlet 3, which vertically extends through a base 2 of the housing 1; a transmission part 5, which is mounted on the air inlet 3 and located inside the housing 1; and a substrate 6, which is mounted on the transmission part 5. During the reaction, the substrate 6 revolves around the air inlet 3 via the transmission part 5 while simultaneously rotating on its own axis, thereby ensuring that the gas expelled from the air inlet 3 is evenly distributed on the surface of the substrate 6.

[0057] It is worth mentioning that the gas used for vapor deposition is guided into the housing 1 through the air inlet 3. The exhaust gas generated by the reaction with the substrate 6 can be pushed by the gas continuously ejected from the jet hole 33 to approach the exhaust 7 and then discharged outside the housing 1, reducing the contact time between the exhaust gas and the substrate 6, thereby reducing the contamination of the substrate 6. In addition, the base 2 is detachably and sealed at the bottom of the housing 1 by bolts to facilitate the installation of the substrate 6 and the adjustment of the transmission part 5. During the vapor deposition growth process, an induction coil can be used to heat the inside of the housing 1. The heating technology of the induction coil is a prior art well known to those skilled in the art, so it will not be described in detail.

[0058] Furthermore, such as Figures 1 to 4 As shown, the air intake 3 includes: a U-shaped seat 31, which is installed at the bottom of the base 2; a hollow column 32, which vertically penetrates the base 2 and the U-shaped seat 31, and is rotatably mounted on the opening between the base 2 and the U-shaped seat 31; jet holes 33, with multiple jet holes 33 provided on the side wall of the hollow column 32; and an air intake pipe 34, which is installed on the opening at the bottom end of the hollow column 32. Sealing rings 35 are provided on both the opening of the base 2 and the opening at the bottom end of the hollow column 32.

[0059] In this embodiment, the presence of two sealing rings 35 reduces gas leakage from the gap between the base 2 and the hollow column 32 and from the hollow column 32 and the air inlet pipe 34. Furthermore, the air inlet pipe 34 is rotatably mounted on the hollow column 32, ensuring that the air inlet pipe 34 remains stationary when the hollow column 32 rotates, thus reducing the likelihood of entanglement between the air supply pipe or power cord on the air supply assembly.

[0060] Furthermore, such as Figures 2 to 3 As shown, it also includes a drive unit 4 installed below the base 2. The drive unit 4 includes: a drive member 41, which is mounted on the U-shaped seat 31; a drive wheel 42, which is mounted on the output end of the drive member 41; and a driven wheel 43, which is mounted on the hollow column 32 and is driven by the drive wheel 42. Both the drive wheel 42 and the driven wheel 43 are gear structures, and they are driven by meshing.

[0061] In this embodiment, the driving member 41 can drive the hollow column 32 to rotate through the transmission between the driving wheel 42 and the driven wheel 43. In other embodiments, the transmission between the driving wheel 42 and the driven wheel 43 can be set as a belt drive, that is, both the driving wheel 42 and the driven wheel 43 are belt pulley structures, and the two are connected by a belt drive.

[0062] Furthermore, such as Figures 2 to 6As shown, the transmission unit 5 includes: a fixed housing 51, a plurality of fixed housings 51 are mounted on the outer wall of the hollow column 32, and the fixed housings 51 correspond to the jet holes 33; a friction ring 52, the friction ring 52 is mounted on the inner wall of the outer housing 1, and the longitudinal section of the friction ring 52 is trapezoidal; an adjusting member 53, an adjusting member 53 for adjusting the transmission ratio between the hollow column 32 and the substrate 6 is mounted on the fixed housing 51; and a support member 54, a support member 54 for loading the substrate 6 is mounted on the fixed housing 51. The adjusting component 53 includes: a rotating rod 531, rotatably mounted on the fixed housing 51, with the central axis of the rotating rod 531 parallel to the inclined surface of the friction ring 52; a friction wheel 532, sleeved on the rotating rod 531; two limiting blocks 533, installed on the outside of the rotating rod 531, located on the upper and lower sides of the friction wheel 532 respectively, to limit the up-and-down movement of the friction wheel 532 along the central axis of the rotating rod 531; and a main drive wheel 534, mounted on the top of the rotating rod 531 and located inside the fixed housing 51; wherein, by adjusting the distance between the two limiting blocks 533, the friction wheel 532 is clamped and fixed at the axial target position of the rotating rod 531. The portion of the rotating rod 531 outside the fixed housing 51 has a threaded structure, and the limiting blocks 533 are threaded onto the rotating rod 531. The support member 54 includes: a rotating shaft 541, which is rotatably disposed within the fixed housing 51; a drive wheel 542, which is mounted outside the rotating shaft 541 and meshes with the main drive wheel 534; and a tray 543, which is mounted on top of the rotating shaft 541 to support the substrate 6.

[0063] In this embodiment, a jet hole 33 is provided at each location where the fixed shell 51 is installed outside the hollow column 32. This allows the gas jet from the jet hole 33 to directly land on the substrate 6. Subsequently, as the substrate 6 rotates, the gas is evenly sprayed onto the substrate 6, thus forming a uniform film structure. In other embodiments, the portion of the rotating rod 531 outside the fixed shell 51 can be made into a smooth rod, and the limiting block 533 can be made into a clamp. Preferably, the rotating rod 531 outside the fixed shell 51 has a threaded structure, which allows for more precise adjustment of the position of the friction wheel 532. This enables precise control of the transmission ratio between the rotation of the substrate 6 and the rotation of the hollow column 32. Furthermore, the mechanical structure's adjustment of the transmission makes the device less prone to damage in high-temperature environments, ensuring its practicality.

[0064] Furthermore, such as Figures 2 to 3 As shown, it also includes an air outlet 7 located on the outer shell 1. The air outlet 7 includes: an exhaust gas trough 72, with multiple exhaust gas troughs 72 provided on the inner side wall of the outer shell 1; and a connecting groove 71, with a connecting groove 71 provided inside the outer shell 1 to communicate with the outside, and the connecting groove 71 is connected to multiple exhaust gas troughs 72.

[0065] In this embodiment, the exhaust gas that reacts with the substrate 6 can be guided to the outside through the exhaust section 7, thereby reducing the content of exhaust gas in the outer shell 1, thus reducing the possibility of exhaust gas contaminating the film structure on the substrate 6 and improving the quality of the final film.

[0066] Work steps

[0067] Step 1: First, place the substrate 6 on the tray 543, and adjust the position of the friction wheel 532 by adjusting the position of the limiting block 533 on the rotating rod 531. Then, assemble the outer shell 1 and the base 2.

[0068] Step 2: Connect the air intake pipe 34 to the air supply assembly. The air intake pipe 34 then guides the gas into the hollow column 32. The gas is then sprayed into the outer casing 1 through the jet nozzle 33. The gas ejected through the jet nozzle 33 blows towards the substrate 6, and the waste gas generated by the reaction between the gas and the substrate 6 approaches the inner wall of the outer casing 1 under the action of the continuously ejected gas. Finally, it is discharged through the waste gas trough 72 into the connecting groove 71. Simultaneously with the introduction of gas into the hollow column 32, the drive unit 41 can be activated to uniformly rotate the drive wheel 42, thereby driving the driven wheel... The wheel 43 causes the hollow column 32 to rotate, which in turn drives multiple fixed shells 51 to move, causing the substrate 6 to move around the hollow column 32. At the same time, the fixed shells 51 drive the rotating rod 531 and the friction wheel 532 to move relative to the friction ring 52. Under the action of the friction force between the friction wheel 532 and the friction ring 52, the rotating rod 531 rotates. Then, the main drive wheel 534 and the driven wheel 542 cause the rotating shaft 541 to rotate, which in turn drives the tray 543 and the substrate 6 to rotate. As a result, the air column ejected from the jet hole 33 sweeps evenly across the substrate 6.

[0069] In the description of this utility model, it should be understood that the terms "front and back", "left and right", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings. They are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or component referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on the utility model.

[0070] Of course, those skilled in the art should understand that the term "a" should be understood as "at least one" or "one or more". That is, in one embodiment, the number of an element can be one, while in another embodiment, the number of the element can be multiple. The term "a" should not be understood as a limitation on the quantity.

[0071] The above are merely preferred embodiments of this utility model, but the scope of protection of this utility model is not limited thereto. Any variations or substitutions that can be easily conceived by those skilled in the art under the technical guidance of this utility model should be included within the scope of protection of this utility model. Therefore, the scope of protection of this utility model should be determined by the scope of the claims.

Claims

1. A tray assembly for a vapor deposition growth chamber, comprising a housing, characterized in that, Also includes: An air intake section, which extends vertically through the base of the outer casing; The transmission unit is mounted on the air intake and located inside the housing; as well as A substrate, which is mounted on the transmission unit; During the reaction, the substrate rotates on its own axis while revolving around the air intake via the transmission unit, so that the gas blown out by the air intake is evenly distributed on the surface of the substrate.

2. The tray assembly for a vapor deposition growth chamber according to claim 1, characterized in that, The air intake section includes: U-shaped seat, the U-shaped seat being installed at the bottom of the base; A hollow column, which vertically penetrates the base and the U-shaped seat, and is rotatably positioned on the opening between the base and the U-shaped seat; The hollow column has multiple air jet holes on its sidewalls; and An air intake pipe is installed on an opening at the bottom end of a hollow column.

3. A tray assembly for a vapor deposition growth chamber according to claim 2, characterized in that, Both the opening of the base and the opening at the bottom of the hollow column are equipped with sealing rings.

4. A tray assembly for a vapor deposition growth chamber according to claim 2, characterized in that, It also includes a drive unit mounted below the base, the drive unit comprising: The driving component is mounted on the U-shaped base; The driving wheel is mounted on the output end of the drive element; and The driven wheel is mounted on a hollow column and is driven by the driving wheel.

5. A tray assembly for a vapor deposition growth chamber according to claim 4, characterized in that, Both the driving wheel and the driven wheel are gear structures, and they are driven by meshing.

6. A tray assembly for a vapor deposition growth chamber according to claim 2, characterized in that, The transmission unit includes: The hollow column has multiple fixed shells installed on its outer wall, and the fixed shells correspond to the air jet holes. A friction ring, wherein the friction ring is mounted on the inner wall of the housing, and the longitudinal section of the friction ring is trapezoidal; An adjusting element is mounted on the fixed housing for adjusting the transmission ratio between the hollow column and the substrate; and A support component is mounted on the fixed shell for loading the substrate.

7. A tray assembly for a vapor deposition growth chamber according to claim 6, characterized in that, The adjusting element includes: A rotating rod is rotatably mounted on the fixed shell, and the central axis of the rotating rod is parallel to the inclined surface of the friction ring; A friction wheel, which is sleeved on a rotating rod; Two limiting blocks are mounted on the outside of the rotating rod, and the two limiting blocks are respectively located on the upper and lower sides of the friction wheel, to limit the up and down movement of the friction wheel along the central axis of the rotating rod; and The main drive wheel is mounted on the top of the rotating rod and located inside the fixed housing; By adjusting the distance between the two limiting blocks, the friction wheel is clamped and fixed at the axial target position of the rotating rod.

8. A tray assembly for a vapor deposition growth chamber according to claim 7, characterized in that, The portion of the rotating rod located outside the fixed housing has a threaded structure, and the limiting block threaded transmission is on the rotating rod.

9. A tray assembly for a vapor deposition growth chamber according to claim 7, characterized in that, The support component includes: A rotating shaft, which is rotatably mounted inside a fixed housing; The driven wheel is mounted outside the rotating shaft and meshes with the main drive wheel; and A tray, which is mounted on top of the rotating shaft, to support the substrate.

10. A tray assembly for a vapor deposition growth chamber according to claim 1, characterized in that, It also includes an air vent located on the housing, the air vent comprising: The outer shell has multiple exhaust gas troughs on its inner sidewall. The outer casing has a connecting slot that communicates with the outside world, and the connecting slot is connected to multiple exhaust gas slots.

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