A metallographic specimen cleaning device with adjustable concentration
By designing an adjustable concentration metallographic sample cleaning device, dynamic adjustment of the etching solution concentration and deionized water cleaning are achieved, solving the problems of fixed etching solution concentration and safety hazards in traditional metallographic etching technology, and improving work efficiency and safety.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- 新疆湘润新材料科技有限公司
- Filing Date
- 2025-07-16
- Publication Date
- 2026-07-21
Smart Images

Figure CN224535566U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of metallographic sample preparation equipment, and in particular to a metallographic sample cleaning device with adjustable concentration. Background Technology
[0002] Titanium alloys have become key materials in high-end fields such as aerospace, medical, chemical and energy due to their unique strength-to-weight ratio, excellent corrosion resistance, good high and low temperature performance and excellent biocompatibility. However, the full realization of their performance depends heavily on the precise control of microstructure.
[0003] Metallographic corrosion, as a key to revealing the microscopic world of titanium alloys, is a core means of quality control, process optimization and verification, and failure analysis in engineering, ensuring reliable material performance, stable processes, and product safety. In academia, it is an indispensable basic tool for studying phase transformation mechanisms, establishing microstructure-property relationships, developing new alloys, and exploring microscopic defects and interface behavior, driving the continuous development of titanium alloy science and technology. Without reliable metallographic corrosion technology, it is impossible to achieve accurate characterization, understanding, and control of the microstructure of titanium alloys, and thus it is impossible to fully realize their excellent performance potential and ensure the reliability of their engineering applications. It is an indispensable key link in the chain connecting titanium alloy composition, process, microstructure, and properties.
[0004] Traditional metallographic etching uses an immersion method, which has three major drawbacks: the concentration of the etching solution is fixed, requiring repeated solution changes to obtain the best etching effect; the operator comes into direct contact with the etching agent, posing a safety hazard; and sample transfer and cleaning can easily lead to surface scratches.
[0005] To address the aforementioned issues, we propose an integrated metallographic sample etching and cleaning device with adjustable concentration, providing an innovative solution. Utility Model Content
[0006] To overcome the problems of existing metallographic sample cleaning devices that require repeated solution changes, resulting in low work efficiency and safety hazards due to operators' direct contact with corrosive agents.
[0007] The technical solution of this utility model is as follows: an adjustable concentration metallographic sample cleaning device, including a base, a protective box fixedly connected to the upper end of the base, and a sample placement stage fixedly installed on the upper end of the base. The sample placement stage is used to place metallographic samples, and a positioning component for clamping the metallographic samples is provided on the sample placement stage. A fixed column is fixedly connected to the side of the upper end of the base, and a deionized water nozzle is provided on the surface of the fixed column. A mounting frame is provided on the top of the protective box, and an etchant nozzle is provided on the mounting frame. A rotary valve is provided between the etchant nozzle and the mounting frame. The rotary valve is used to control the concentration of the etchant. A liquid inlet pipe is installed at the rear end of the fixed column.
[0008] The protective box has an anti-corrosion coating on its surface. The front of the protective box is an openable door, and both sides of the protective box surface are equipped with glass windows. The door surface is also equipped with the same glass windows, which are used for personnel to observe the cleaning process.
[0009] Preferably, the metallographic sample is placed on the sample placement stage, clamped and fixed by the positioning component, and the etching solution is sprayed by the etchant nozzle. The concentration can be adjusted by a rotary valve to avoid repeated solution changes in order to obtain the best etching effect. The sample is also adapted to a deionized water nozzle for cleaning.
[0010] Preferably, the sample placement stage has a double-layer structure, consisting of a base plate and an overhead frame. The metallographic sample is placed on the overhead frame. The double-layer structure of the sample placement stage facilitates the collection of water. The base plate can adopt a ramp structure to guide the water flow.
[0011] Preferably, the positioning component includes a side fixing plate fixedly connected to the base plate. Two side fixing plates are provided. A threaded rod is threadedly installed on the surface of the side fixing plate. One end of the threaded rod extends to the inner side of the side fixing plate and is rotatably connected to a clamping plate. The other end of the threaded rod is fixedly connected to a handle. When the threaded rod rotates, it drives the clamping plate to move and fit against the surface of the metallographic sample, thereby achieving clamping and fixing of the metallographic sample.
[0012] Preferably, a liquid storage pipe is fixedly connected to the top of the mounting bracket. The liquid storage pipe and the corrosive agent nozzle are interconnected. A liquid filling port is provided at the top of the liquid storage pipe. The liquid storage pipe is used to store the corrosive liquid. When adding the corrosive liquid, the liquid storage pipe should not be filled to facilitate the extraction of negative pressure.
[0013] Preferably, an electric air pump is installed on the side of the mounting frame surface. One end of the electric air pump is connected to the liquid storage pipe, and the other end of the electric air pump is connected to the top of the fixed column through a pipeline. The electric air pump is used to extract air from the liquid storage pipe to make the liquid storage pipe reach negative pressure. An air pressure balance tank is installed in the fixed column. The electric air pump extracts air to make the liquid storage pipe negative pressure.
[0014] Preferably, the corrosive nozzle has a dual-channel structure, with the two channels being a corrosive liquid channel and an ionized water channel. The corrosive liquid channel is connected to the storage pipe. A water pump is installed on the side of the mounting bracket next to the electric vacuum pump, and the water pump is connected to the ionized water channel. The dual-channel corrosive nozzle can be adapted to a rotary valve to change the opening range of the two channels, adjust the mixing amount of corrosive liquid and ionized water, change the concentration of the corrosive liquid, and then spray the corrosive liquid from the corrosive nozzle. Each spray from the corrosive nozzle lasts for 10-15 seconds.
[0015] Preferably, the inlet pipe is used to connect to an external water supply pump. The inlet pipe is an ionized water inlet pipe, which can supply water to the deionized water nozzle. The water pump is connected to the ionized water inlet pipe through a pipeline. The external water supply pump can send ionized water through the ionized water inlet pipe and spray it out by the deionized water nozzle to clean the metallographic sample.
[0016] The beneficial effects of this utility model are:
[0017] 1. This adjustable concentration metallographic sample cleaning device sprays etchant solution from an etchant nozzle, and the concentration can be adjusted by a rotary valve, avoiding the need to repeatedly change the solution to obtain the best etching effect and improving work efficiency.
[0018] 2. This adjustable concentration metallographic sample cleaning device uses a spray nozzle to treat both the cleaning and corrosion of the metallographic sample, and the protective box provides protection, which can effectively prevent the operator from coming into contact with the corrosive agent and eliminate safety hazards.
[0019] 3. This adjustable concentration metallographic sample cleaning device uses a rotary valve to control the concentration of the etching solution, allowing for multiple sprays of the etching solution without the need for multiple sample transfers. This avoids surface scratches and waste caused by transferring and cleaning the sample during the etching process. Attached Figure Description
[0020] Figure 1 The diagram shown is a schematic representation of the internal structure of the adjustable concentration metallographic sample cleaning device of this utility model.
[0021] Figure 2 The diagram shown is a schematic representation of the protective box structure of the adjustable concentration metallographic sample cleaning device of this utility model.
[0022] Figure 3 The diagram shown is a schematic representation of the sample placement stage of the adjustable concentration metallographic sample cleaning device of this utility model.
[0023] Figure 4 The diagram shown is a schematic representation of the mounting frame structure of the adjustable concentration metallographic sample cleaning device of this utility model.
[0024] Figure 5 The diagram shown is a schematic representation of the internal structure of the fixed column of the adjustable concentration metallographic sample cleaning device of this invention.
[0025] Explanation of reference numerals in the attached drawings: 1. Base; 2. Sample placement stage; 201. Box door; 21. Side fixing plate; 22. Threaded rod; 23. Clamping plate; 24. Handle; 3. Fixed column; 4. Deionized water nozzle; 5. Mounting bracket; 51. Liquid storage pipe; 52. Electric vacuum pump; 53. Water pump; 6. Corrosive agent nozzle; 7. Rotary valve; 8. Deionized water inlet pipe. Detailed Implementation
[0026] The present invention will be further described below with reference to the accompanying drawings and embodiments.
[0027] Please see Figures 1-5 This utility model provides an embodiment: an adjustable concentration metallographic sample cleaning device, including a base 1, a protective box fixedly connected to the upper end of the base 1, and a sample placement platform 2 fixedly installed on the upper end of the base 1. The sample placement platform 2 is used to place metallographic samples, and a positioning component for clamping the metallographic samples is provided on the sample placement platform 2. The sample placement platform 2 has a double-layer structure, consisting of a base plate and a suspended frame. The metallographic samples are placed in close contact with the suspended frame. The double-layer structure of the sample placement platform 2 facilitates the collection of water. The base plate can adopt a ramp structure to guide the water flow. A fixed column 3 is fixedly connected to the side of the upper end of the base 1. A deionized water nozzle 4 is provided on the surface of the fixed column 3. A mounting frame 5 is provided on the top of the protective box. An etchant nozzle 6 is provided on the mounting frame 5. A rotary valve 7 is installed between the mounting brackets 5 to control the concentration of the corrosive agent. An inlet pipe is installed at the rear end of the fixed column 3. The surface of the protective box is coated with an anti-corrosion coating. The front of the protective box is an openable door 201, and glass windows are provided on both sides of the protective box surface. The surface of the door 201 is also equipped with the same glass windows, which are used for personnel to observe the cleaning process. The metallographic sample is placed in the protective box and received by the sample placement platform 2. After being clamped and fixed by the positioning component, the corrosive agent is first sprayed through the corrosive agent nozzle 6 to form a corrosion effect, and then the deionized water nozzle 4 sprays deionized water for cleaning after corrosion. The entire process takes place in the protective box, and the concentration of the corrosive agent is adjusted by the rotary valve 7, so there is no need to transfer the sample, avoid contact with the corrosive agent, eliminate safety hazards, and prevent scratching the surface of the sample, thus improving practicality.
[0028] Please see Figure 1 and Figure 3 In this embodiment, the positioning component includes a side fixing plate 21 fixedly connected to the base plate. Two side fixing plates 21 are provided. A threaded rod 22 is threadedly installed on the surface of the side fixing plate 21. One end of the threaded rod 22 extends to the inner side of the side fixing plate 21 and is rotatably connected to a clamping plate 23. The other end of the threaded rod 22 is fixedly connected to a handle 24. When the threaded rod 22 rotates, it drives the clamping plate 23 to move and fit against the surface of the metallographic sample, thereby clamping and fixing the metallographic sample. The clamping plate 23 is coated with an etched coating to increase corrosion resistance. The clamping plate 23 and the threaded rod 22 can be detachably installed for easy replacement.
[0029] Please see Figure 1 , Figure 4 and Figure 5In this embodiment, a liquid storage pipe 51 is fixedly connected to the top of the mounting frame 5. The liquid storage pipe 51 and the corrosive agent nozzle 6 are interconnected. A liquid filling port is provided at the top of the liquid storage pipe 51. The liquid storage pipe 51 is used to store corrosive liquid. When adding corrosive liquid, the liquid storage pipe 51 should not be filled to facilitate the extraction of negative pressure. An electric air pump 52 is provided on the side of the surface of the mounting frame 5. One end of the electric air pump 52 is connected to the liquid storage pipe 51, and the other end of the electric air pump 52 is connected to the top of the fixed column 3 through a pipeline. The electric air pump 52 is used to extract air from the liquid storage pipe 51 to make the liquid storage pipe 51 reach negative pressure. A pressure balance tank is provided in the fixed column 3. The electric air pump 52 extracts air to make the liquid storage pipe 51 negative pressure. After negative pressure is achieved, the corrosive agent nozzle 6 is turned on to spray corrosive agent (the gas extracted for negative pressure needs to be recovered and treated so that it can be connected to an external gas purification treatment device).
[0030] Please see Figure 5 In this embodiment, the corrosive nozzle 6 has a dual-channel structure. The dual channels of the corrosive nozzle 6 are a corrosive liquid channel and an ionized water channel. The corrosive liquid channel is connected to the storage pipe 51. A water pump 53 is provided on the side of the mounting bracket 5 next to the electric vacuum pump 52. The water pump 53 is connected to the ionized water channel. The dual-channel corrosive nozzle 6 can be adapted to a rotary valve 7 to change the opening range of the dual channels, adjust the mixing amount of corrosive liquid and ionized water, change the concentration of corrosive liquid, and then the corrosive liquid is sprayed out by the corrosive nozzle 6. Each spray of the corrosive nozzle 6 lasts for 10-15 seconds.
[0031] Please see Figure 1 and Figure 5 In this embodiment, the inlet pipe is used to connect to an external water supply pump. The inlet pipe is an ionized water inlet pipe 8, which can supply water to the deionized water nozzle 4. The water pump 53 is connected to the ionized water inlet pipe 8 through a pipeline. The external water supply pump can send ionized water through the ionized water inlet pipe 8 and spray it out by the deionized water nozzle 4 to clean the metallographic sample. The external water supply pump can extract ionized water and deliver it under high pressure, which facilitates the spray cleaning of the deionized water nozzle 4.
[0032] During operation, after opening the chamber door 201, the metallographic sample is placed in the protective chamber and placed on the sample placement platform 2. Personnel can rotate the threaded rod 22 by rotating the two side handles 24, thereby clamping and fixing the sample with the two side clamping plates 23. Then, the chamber door 201 is closed, and the etchant nozzle 6 and deionized water nozzle 4 work together to spray water liquid to achieve sample etching and cleaning. The etchant nozzle 6 sprays for 10-15 seconds each time, and the concentration of the etchant can be adjusted by rotating the valve 7 to achieve multiple etching operations with different concentrations, thus eliminating the need for transfer, ensuring the quality of sample preparation, and avoiding sample damage. At the same time, the deionized water cleans the sample, which is convenient for multiple operations. The etchant liquid is located in the protective chamber. When taking it out, the waste liquid is treated first to avoid personnel contact with the etchant liquid and improve safety.
[0033] Through the above steps, the metallographic sample is placed on the sample placement stage 2, and the metallographic sample is clamped and fixed by the positioning component. The etchant spray head 6 sprays the etchant solution, and the concentration can be adjusted by the rotary valve 7. This avoids the need to repeatedly change the solution in order to obtain the best etchant effect. The sample is also adapted to the deionized water spray head 4 for cleaning. This solves the problem that the existing metallographic sample cleaning device requires repeated solution changes, resulting in low work efficiency and safety hazards due to the operator's direct contact with the etchant.
Claims
1. An adjustable concentration metallographic sample cleaning device, comprising a base (1), wherein a protective box is fixedly connected to the upper end of the base (1), characterized in that: It also includes a sample placement platform (2) fixedly installed on the upper end of the base (1). The sample placement platform (2) is used to place metallographic samples, and the sample placement platform (2) is provided with a positioning component for clamping the metallographic samples. A fixed column (3) is fixedly connected to the side of the upper end of the base (1). A deionized water nozzle (4) is provided on the surface of the fixed column (3). A mounting frame (5) is provided on the top of the protective box. A corrosive nozzle (6) is provided on the mounting frame (5), and a rotary valve (7) is provided between the corrosive nozzle (6) and the mounting frame (5). The rotary valve (7) is used to control the concentration of the corrosive agent. A liquid inlet pipe is installed at the rear end of the fixed column (3). The protective box has an anti-corrosion coating on its surface. The front of the protective box is an openable door (201), and both sides of the protective box surface are equipped with glass windows. The door (201) surface is equipped with the same glass windows, which are used for personnel to observe the cleaning process.
2. The metallographic sample cleaning device with adjustable concentration according to claim 1, characterized in that: The sample placement stage (2) has a double-layer structure. The sample placement stage (2) consists of a base plate and an overhead frame. Metallographic samples are placed on the overhead frame.
3. The metallographic sample cleaning device with adjustable concentration according to claim 2, characterized in that: The positioning assembly includes a side fixing plate (21) fixedly connected to the base plate. There are two side fixing plates (21). A threaded rod (22) is threadedly installed on the surface of the side fixing plate (21). One end of the threaded rod (22) extends to the inside of the side fixing plate (21) and is rotatably connected to a clamping plate (23). The other end of the threaded rod (22) is fixedly connected to a handle (24). When the threaded rod (22) rotates, it drives the clamping plate (23) to move and fit against the surface of the metallographic sample.
4. The metallographic sample cleaning device with adjustable concentration according to claim 1, characterized in that: The top of the mounting bracket (5) is fixedly connected to a liquid storage pipe (51), which is connected to the corrosive agent nozzle (6). The top of the liquid storage pipe (51) is provided with a liquid filling port, and the liquid storage pipe (51) is used to store corrosive liquid.
5. The metallographic sample cleaning device with adjustable concentration according to claim 4, characterized in that: An electric air pump (52) is installed on the side of the mounting bracket (5). One end of the electric air pump (52) is connected to the liquid storage pipe (51), and the other end of the electric air pump (52) is connected to the top of the fixed column (3) through a pipeline. The electric air pump (52) is used to extract air from the liquid storage pipe (51) so that the liquid storage pipe (51) reaches negative pressure. A pressure balance tank is installed in the fixed column (3).
6. The metallographic sample cleaning device with adjustable concentration according to claim 1, characterized in that: The corrosive nozzle (6) has a dual-channel structure. The two channels of the corrosive nozzle (6) are the corrosive liquid channel and the ion water channel. The corrosive liquid channel is connected to the storage pipe (51). The surface of the mounting bracket (5) is located on the side of the electric air pump (52) and a water pump (53) is provided. The water pump (53) is connected to the ion water channel.
7. The metallographic sample cleaning device with adjustable concentration according to claim 1, characterized in that: The inlet pipe is used to connect to an external water supply pump. The inlet pipe is an ion water inlet pipe (8). The ion water inlet pipe (8) can supply water to the deion water nozzle (4), and the water pump (53) is connected to the ion water inlet pipe (8) through a pipeline.