Plasma etching apparatus

Abstract

This application provides a plasma etching apparatus, including a worktable. A feeding assembly, a material holding tray, a transition assembly, a moving assembly, and an etching assembly are sequentially arranged on the worktable along a first path. The material holding tray is used to hold material. The feeding end of the feeding assembly can push the material on top of the material holding tray to the transition assembly. The moving assembly includes a first disk and a second disk that move along the first path, respectively. The first disk and the second disk can respectively move material to the etching assembly for etching processing. A transition section is formed at the top of the transition assembly, which can move material onto the first disk or the second disk. In the plasma etching apparatus provided by this application, the first disk operates on the etching assembly, while the second disk can simultaneously prepare new material on the transition assembly, shortening the waiting time of the etching assembly, improving the overall processing cycle time, and enhancing the processing efficiency, stability, and flexibility of the plasma etching apparatus.

Description

Technical Field

[0001] This application belongs to the field of etching machine technology, specifically relating to a plasma etching device. Background Technology

[0002] Etching machines are core equipment in semiconductor manufacturing for fabricating micro and nanostructures. They precisely remove material to form critical structures such as transistors and interconnects. Their core principle utilizes the synergistic effect of physical bombardment and chemical reaction of plasma to achieve directional etching of materials.

[0003] The typical process involves transporting finished products from a tray to the plasma vacuum chamber via a conveyor plate. After the reaction is complete, the products are moved back to the tray via the conveyor plate. The entire process relies on the conveyor plate to move materials to their respective workstations. This causes the plasma vacuum chamber to wait for the conveyor plate to finish etching the finished product before transporting a new product from the tray, resulting in long work intervals and low efficiency. The etching cycle time is limited by the conveyor plate speed; if the conveyor plate malfunctions, the entire process must be stopped, posing a high risk of failure. Furthermore, individual conveyor plates have poor adaptability, requiring adjustments for different types of materials, increasing the workload for employees. Utility Model Content

[0004] This application provides a plasma etching apparatus, which aims to solve the technical problems of long working intervals, low processing efficiency, and high failure risk of individual transport plates in the existing etching process plasma vacuum chamber.

[0005] To achieve the above objectives, the technical solution adopted in this application is as follows: A plasma etching apparatus is provided, including a worktable, wherein a feeding assembly, a holding tray, a transition assembly, a moving assembly, and an etching assembly are sequentially arranged on the worktable along a first path; The material tray is vertically and adjustablely connected to the worktable and is used to hold materials. The pushing component is disposed on the worktable and has a pushing end that moves along the first path. The pushing end can push the material on the top of the holding tray to the transition component. The moving component includes a first disk and a second disk that move along a first path. The first disk and the second disk are movably connected to the worktable and each has a degree of freedom to move up and down. The length of the first disk is less than the length of the second disk. The first disk and the second disk can receive materials from the transition component and move the materials to the etching component for etching. When the first disk and the second disk overlap in the vertical direction, the height of the first disk is higher than that of the second disk. The transition component is fixed to the workbench, and the top of the transition component forms a transition section that can move along the first path. The transition section can transfer material from the material tray to the first tray or the second tray.

[0006] In one possible implementation, the pusher assembly includes: A support frame is slidably disposed on the upper surface of the workbench along the first path; Multiple push rods are spaced apart at the top of the support frame along a direction perpendicular to the first path. Each push rod is located on the side of the support frame near the material tray, and the end of each push rod near the material tray forms the push end. A first driving member is disposed on the top of the workbench. The first driving member has a telescopic end that extends and retracts along the first path, and the telescopic end is connected to the bottom of the support frame.

[0007] In one possible implementation, the transition component includes: A transition platform is installed on the workbench. The transition platform includes multiple movable plates, which are spaced apart along a direction perpendicular to the first path. The second driving component is installed inside the worktable. The second driving component has a rotatable output shaft with the rotation axis perpendicular to the first path. The output shaft is connected to an output rod, which sequentially passes through multiple moving plates and rotatably engages with each of the multiple moving plates. Multiple driven wheel assemblies are respectively installed on the sidewalls of the corresponding movable plates. Each driven wheel assembly includes two driven wheels located at both ends of the corresponding movable plate, and the rotation axis of the driven wheels is parallel to the rotation axis of the output shaft; and Multiple conveyor belts are provided, each corresponding to a second drive component. The multiple conveyor belts are respectively fitted onto two corresponding driven wheels and the output shaft to achieve synchronous rotation of the driven wheels and the corresponding output shaft. The outer surface of the conveyor belt can contact the material to drive the material to move along the first path to the first or second disc. The conveyor belt forms the transition section.

[0008] In one possible implementation, the transition component further includes a plurality of limiting wheels, which are rotatably mounted on the side of the corresponding moving plate, with their rotation axes perpendicular to the first path. The bottom of the limiting wheel is higher than the top of the moving plate, and the limiting wheel can roll into contact with the upper surface of the material to limit the displacement of the material in the vertical direction.

[0009] In one possible implementation, the etching component includes: A fixed frame is installed on the workbench; A plasma vacuum chamber, fixed to the mounting frame, has an opening at its bottom. One of the openings of the plasma vacuum chamber mates with either the first or second disk to form a sealed vacuum. A power matching device is mounted on the mounting bracket. The power matching device is electrically connected to the plasma vacuum chamber and also electrically connected to a power source.

[0010] In one possible implementation, a lifting drive is installed directly below the material tray, and the top of the lifting drive forms a lifting end that can be raised and lowered, with the material tray installed on the lifting end.

[0011] In one possible implementation, the plasma etching apparatus further includes a pusher assembly, the pusher assembly comprising: A fixed bracket is mounted on the workbench and located on one side of the transition assembly, the fixed bracket having a sliding block that slides along the first path; A sliding bracket, one end of which is slidably connected to the sliding block, the long axis of which is perpendicular to the first path, and a sliding groove is provided at the bottom of which extends in a direction perpendicular to the first path; The movable frame, with its top slidably disposed in the sliding groove; and Multiple push plates are spaced apart at the bottom of the movable frame along a direction perpendicular to the first path. The push plates are located between two adjacent movable plates, and the two ends of the push plates are used to push the material away from the movable plates along the first path.

[0012] In one possible implementation, the moving component further includes a first lifting member and a second lifting member mounted on the worktable. The first lifting member is adjacent to the transition portion, and the second lifting member is located below the etching component. The top of the first lifting member has a first lifting plate that can be raised and lowered, and the top of the second lifting member has a second lifting plate that can be raised and lowered. The first lifting plate and the second lifting plate can respectively lift the first tray or the second tray to raise and lower. The first plate has a first sliding part installed on both sides, and the second plate has a second sliding part installed on both sides; The moving component further includes two first guide rails and two second guide rails, the first guide rails and the second guide rails extending along the first path respectively, the first sliding part slidingly engaging with the first guide rail, the second sliding part slidingly engaging with the second guide rail, and the bottom of the first guide rail being higher than the bottom of the second guide rail.

[0013] In one possible implementation, the workbench is equipped with casters at the bottom; the top of the workbench is covered with a protective shell, and the side of the protective shell is provided with a closing door.

[0014] In one possible implementation, the plasma etching apparatus further includes a warning component, which includes multiple sensors and a warning light. The multiple sensors are respectively installed on the feeding component, the material tray, the transition component, the moving component, and the etching component, and the multiple sensors are respectively communicatively connected to the warning light; the warning light is installed on the top of the outer surface of the protective shell.

[0015] Compared with existing technologies, the plasma etching apparatus provided in this application places the material on top of the material tray. The pushing component, transition component, first tray, second tray, and etching component are all in a standby state. The material tray can adjust the position of the top material according to the stacking height of the material, facilitating the pushing component to push the corresponding material. The pushing end of the pushing component moves along the first path, pushing the material on top of the material tray to the transition component. The transition part of the transition component moves along the first path, transferring the material to the liftable first or second tray. The first or second tray carrying the material moves along the first path to the etching component. The tray body rises and falls in coordination with the etching component to form a sealed vacuum environment for etching. At the same time, another unused tray (if the first tray is working, the second tray is ready) can be prepared to receive new material at the transition component. After etching is completed, the moving component moves the tray body away from the etching component, and the finished material can be transferred again with the help of the transition component, etc. The first and second trays alternately perform the transportation and etching tasks. Through the orderly collaboration of each component along the first path, the material is initially pushed from the loading tray by the pushing component, the transition component connects and transfers the material, and the first and second trays of the moving component alternately carry the material, working with the etching component to complete the micro-nano structure etching process. The lifting and lowering of the loading tray and the lifting and lowering of the tray body ensure the continuity of material transfer and processing. While the first tray is working on the etching component, the second tray can simultaneously prepare new material on the transition component, shortening the waiting time of the etching component, improving the overall processing cycle, and making the etching process more continuous. This solves the problems of low efficiency, large impact of failure, and poor adaptability caused by a single transport plate, and improves the processing efficiency, stability, and flexibility of the plasma etching device. Attached Figure Description

[0016] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0017] Figure 1 This is a schematic diagram of the main structure of a plasma etching apparatus provided in an embodiment of this application; Figure 2This is an exploded view of the structure of a plasma etching apparatus provided in one embodiment of this application; Figure 3 This is a top view of the workbench used in an embodiment of this application; Figure 4 This is an assembly diagram of the moving component and etching component used in an embodiment of this application; Figure 5 This is an assembly diagram of the transition component and the pushing component used in an embodiment of this application; Figure 6 This is a schematic diagram of the pusher assembly used in one embodiment of this application; Figure 7 This is an assembly diagram of the material tray and the material pushing assembly used in an embodiment of this application; Figure 8 This is a schematic diagram of the structure of a transition component used in an embodiment of this application; Figure 9 A side view of the structure of a transition component used in an embodiment of this application. Figure 10 This is a schematic diagram of the structure of the pushing assembly used in one embodiment of this application; Figure 11 This is a side view of a moving component used in an embodiment of this application; Figure 12 This is a schematic diagram of the structure of a moving component used in another embodiment of this application.

[0018] Explanation of reference numerals in the attached figures: 1. Workbench; 11. Casters; 12. Protective casing; 121. Closing door; 2. Pushing assembly; 21. Support frame; 22. Pushing rod; 23. First driving component; 3. Material tray; 31. Lifting drive component; 4. Transition assembly; 41. Transition platform; 411. Moving plate; 42. Second drive component; 43. Driven wheel; 44. Conveyor belt; 45. Limit wheel; 5. Moving component; 51. First disc; 511. First mating block; 52. Second disc; 521. Second mating block; 53. First lifting component; 54. Second lifting component; 55. First lead screw; 56. Second lead screw; 57. Drive motor; 6. Etching components; 61. Mounting bracket; 62. Plasma vacuum chamber; 63. Power matching unit; 7. Pushing assembly; 71. Fixed bracket; 711. Sliding block; 72. Sliding bracket; 721. Sliding groove; 73. Moving frame; 74. Pushing plate; 8. Warning lights. Detailed Implementation

[0019] To make the technical problems, technical solutions, and beneficial effects to be solved by this application clearer, the following detailed description is provided in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative and are not intended to limit the scope of this application.

[0020] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of them. The following description of at least one exemplary embodiment is actually illustrative only and is in no way intended to limit this application or its application or use. All other embodiments obtained by those skilled in the art based on the embodiments of this application without creative effort are within the scope of protection of this application.

[0021] It should be noted that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to limit the exemplary embodiments according to this application. As used herein, the singular form is intended to include the plural form as well, unless the context clearly indicates otherwise. Furthermore, it should be understood that when the terms "comprising" and / or "including" are used in this specification, they indicate the presence of features, steps, operations, devices, components, and / or combinations thereof.

[0022] It should also be noted that, unless otherwise explicitly specified and limited, terms such as "installation," "connection," "linking," "fixing," and "setting" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this invention according to the specific circumstances.

[0023] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. Additionally, "multiple" and "several" mean two or more, unless otherwise explicitly specified.

[0024] Please refer to the following: Figures 1 to 12The plasma etching apparatus provided in this application will now be described. The plasma etching apparatus includes a worktable 1, on which a feeding assembly 2, a material tray 3, a transition assembly 4, a moving assembly 5, and an etching assembly 6 are sequentially arranged along a first path. The material tray 3 is vertically and flexibly connected to the worktable 1 and is used to hold materials. The feeding assembly 2 is located on the worktable 1 and has a feeding end that moves along the first path, which can push the material on top of the material tray 3 to the transition assembly 4. The moving assembly 5 includes a first tray 51 and a second tray 52 that move along the first path, and the first tray 51 and the second tray 52 are movably connected. The first tray 51 is shorter than the second tray 52. ​​The first tray 51 and the second tray 52 can receive materials from the transition component 4 and transfer the materials to the etching component 6 for etching. When the first tray 51 and the second tray 52 overlap in the vertical direction, the height of the first tray 51 is higher than that of the second tray 52. ​​The transition component 4 is fixed on the worktable 1. The top of the transition component 4 forms a transition section that can move along the first path. The transition section can transfer materials from the material tray 2 to the first tray 51 or the second tray 52.

[0025] It should be noted that the material is placed in the material box in a vertical direction, and the material box is placed on the material tray 3. The material is the lead frame. After the material is etched, it should be returned to the original material box.

[0026] It should be noted that in the initial state, the material is placed on top of the material tray 3, and the pushing component 2, the transition component 4, the first tray 51, the second tray 52 and the etching component 6 are in a standby state. The material tray 3 can adjust the position of the top material by lifting and lowering according to the stacking height of the material, so as to facilitate the pushing component 2 to push it.

[0027] During the feeding stage, the pushing end of the pushing component 2 moves along the first path, pushing the material on the top of the holding tray 3 to the transition component 4; the transition part of the transition component 4 moves along the first path, transferring the material to the liftable first tray 51 or the second tray 52. ​​The moving paths of the first tray 51 and the second tray 52 do not interfere with each other, and the moving directions are opposite. When the first tray 51 moves toward the etching component 6, the second tray 52 moves toward the transition component 4, and vice versa.

[0028] During the etching stage, the first disk 51 or the second disk 52 carrying the material moves along the first path to the etching component 6. The disk body rises and falls in coordination with the etching component 6 to form a sealed vacuum environment for etching processing. At the same time, another disk that is not in operation (if the first disk 51 is in operation, the second disk 52 is ready) can be prepared to receive new material at the transition component 4.

[0029] During the feeding and circulation stage, after etching is completed, the moving component 5 drives the disk to leave the etching component 6, and can transfer the finished material again through the transition component 4, etc. The first disk 51 and the second disk 52 alternately perform the transportation and etching tasks.

[0030] It should be noted that the height of the first plate 51 is higher than that of the second plate 52, so that the movement of the first plate 51 and the second plate 52 does not interfere with each other.

[0031] Compared with existing technologies, the plasma etching apparatus provided in this embodiment achieves material initial feeding from the material tray 3 through the orderly cooperation of each component along the first path. The material feeding component 2 facilitates the transfer of material, while the transition component 4 connects and transports the material. The first tray 51 and the second tray 52 of the moving component 5 alternately carry the material, working in conjunction with the etching component 6 to complete the micro-nano structure etching process. The lifting and lowering of the material tray 3 and the tray body ensure the continuity of material transfer and processing. During operation, while the first tray 51 is working on the etching component 6, the second tray 52 can simultaneously prepare new material on the transition component 4, shortening the waiting time of the etching component 6, improving the overall processing cycle, and making the etching process more continuous. When the two trays are alternating, if the first tray 51 fails, the second tray 52 can continue to perform its task, reducing the risk of production stoppage due to the failure of a single transport component and ensuring production stability. For different types and batches of materials, the two trays can be adjusted separately (e.g., the lifting height is adapted to the material thickness), reducing the workload of employees frequently adjusting the transport plates and improving the responsiveness to diverse production needs.

[0032] In some embodiments, see Figures 2 to 6 The feeding assembly 2 includes a support frame 21, multiple feeding rods 22, and a first driving member 23. The support frame 21 is slidably disposed on the upper surface of the worktable 1 along a first path; the multiple feeding rods 22 are spaced apart on the top of the support frame 21 in a direction perpendicular to the first path, and the feeding rods 22 are all located on the side of the support frame 21 near the material tray 3, with the end of the feeding rod 22 near the material tray 3 forming a feeding end; the first driving member 23 is disposed on the top of the worktable 1, and the first driving member 23 has a telescopic end that extends and retracts along the first path, and the telescopic end is connected to the bottom of the support frame 21.

[0033] In practice, the workbench 1 is equipped with a track that extends along the first path, and the first driving component 23 pushes the support frame 21 to move along the track.

[0034] In practice, the first driving component 23 can be a cylinder or a telescopic motor, as long as it can drive the support frame 21 to move along the first path.

[0035] In this embodiment, the support frame 21 slides along the first path, and multiple push rods 22 are spaced apart. Driven by the first driving component 23, the material on the holding tray 3 can be pushed stably and accurately, ensuring the initial transfer accuracy and stability of the material from the holding tray 3 to the transition component 4. This makes the feeding process more reliable and lays a good foundation for subsequent alternating double-tray transport and etching processing. During pushing, the height of the holding tray 3 is adjusted so that the material at the top and the push rods 22 are at the same height. The support frame 21 moves along the first path, driving the push rods 22 to push the material towards the transition section.

[0036] In some embodiments, see Figure 2 , Figure 5 and Figure 8 The transition assembly 4 includes a transition platform 41, multiple second drive components 42, multiple sets of driven wheels 43, and multiple conveyor belts 44. A transition table 41 is installed on the workbench 1. The transition table 41 includes multiple movable plates 411, which are spaced apart along a direction perpendicular to the first path. Multiple second driving members 42 are installed in the workbench 1 and correspond one-to-one with the movable plates 411. Each second driving member 42 has a self-rotating output shaft with its rotation axis perpendicular to the first path. Multiple driven wheel groups 43 are installed on the side walls of the corresponding movable plates 411. Each driven wheel group 43 includes two driven wheels 43 located at both ends of the corresponding movable plate 411. The rotation axis of the driven wheels 43 is parallel to the rotation axis of the output shaft. A conveyor belt 44 corresponds one-to-one with the second driving members 42. Multiple conveyor belts 44 are respectively sleeved on the corresponding two driven wheels 43 and the output shaft to achieve synchronous rotation of the driven wheels 43 and the corresponding output shaft. The outer surface of the conveyor belt 44 can contact the material to drive the material to move along the first path to the first disc 51 or the second disc 52. The conveyor belt 44 forms a transition section.

[0037] In practice, the material moves from the holding tray 3 to the top of the moving plate 411. The moving plate 411 is set vertically. The outer surface of the conveyor belt 44 moves with the bottom of the material. The output shaft rotates, driving the conveyor belt 44 to move, so that the material can move along the first path until it leaves the moving plate 411 and falls onto the first tray 51 or the second tray 52.

[0038] It should be noted that the second driving component is a rotary motor, and its output end can rotate.

[0039] In this embodiment, based on the transition platform 41 and the moving plate 411, the orderly transfer of materials along the first path to the first tray 51 and the second tray 52 is achieved through the cooperation of the second driving component 42, the driven wheel set 43, and the conveyor belt 44. Multiple sets of conveyor belts 44 are independently controlled, allowing for flexible adjustment of the material transport rhythm to adapt to the feeding requirements of different trays during dual-tray alternation, ensuring the efficiency and accuracy of material transfer between the transition-moving component 5, and improving the overall synergy of the device.

[0040] In some embodiments, see Figure 8 and Figure 9 The transition component 4 also includes multiple limiting wheels 45, which are rotatably mounted on the side of the corresponding moving plate 411, with the rotation axis perpendicular to the first path. The bottom of the limiting wheel 45 is higher than the top of the moving plate 411, and the limiting wheel 45 can roll contact with the upper surface of the material to limit the displacement of the material in the vertical direction.

[0041] It should be noted that the material is a lead frame, so the limiting wheel 45 can contact or abut the material from above during use.

[0042] This embodiment adds a limiting wheel 45 to restrict material displacement from top to bottom when the material is transported along the transition section. This prevents the material from tilting or shifting due to the transmission of the conveyor belt 44 or equipment vibration, ensuring smooth material transfer to the first tray 51 or the second tray 52. ​​This reduces the risk of etching defects caused by material position deviation and improves product yield. The rolling action reduces friction between the limiting wheel 45 and the material, minimizing material wear and reducing movement resistance.

[0043] In some embodiments, see Figure 2 , Figure 3 , Figure 4 and Figure 10 The etching assembly 6 includes a mounting bracket 61, a plasma vacuum chamber 62, and a power matching device 63. The mounting bracket 61 is mounted on the worktable 1; the plasma vacuum chamber 62 is fixed to the mounting bracket 61, and the bottom of the plasma vacuum chamber 62 is open. The opening of the plasma vacuum chamber 62 is selectively matched with the first disk 51 and the second disk 52 to form a sealed vacuum state; the power matching device 63 is mounted on the mounting bracket 61 and is electrically connected to the plasma vacuum chamber 62 and also electrically connected to a power source.

[0044] It should be noted that both the plasma vacuum chamber 62 and the power matching device 63 are devices based on existing technology, and their structure and working principle are common knowledge, so they will not be described in detail here.

[0045] In this embodiment, the bottom opening of the plasma vacuum chamber 62, in conjunction with the first disk 51 or the second disk 52, flexibly encloses and forms a sealed vacuum environment. The power matching unit 63 ensures the power supply and matching for plasma etching. This structure makes the core etching process more clearly defined and controllable, ensuring stable execution of the etching process. Combined with the alternating transport of the two disks, it achieves efficient and precise etching. The mounting bracket 61 can elevate the plasma vacuum chamber 62, allowing the first disk 51 or the second disk 52 to be moved to the bottom of the plasma vacuum chamber 62 for sealing, increasing the convenience of operation.

[0046] In some embodiments, see Figure 2 and Figure 7 A lifting drive component 31 is installed directly below the material tray 3. The top of the lifting drive component 31 forms a lifting end that can be raised and lowered, and the material tray 3 is installed on the lifting end. By configuring the lifting drive component 31 on the material tray 3, the position of the material at the top of the material tray 3 can be actively adjusted according to the stacking height of the material, adapting to the pushing height of the pushing component 2, making the feeding smoother. Especially for multi-layer stacked materials, it can continuously ensure that the pushing end is in effective contact with the material, improve the automation and intelligence of the feeding process, and reduce manual intervention and adjustment.

[0047] In practice, the lifting drive component 31 can be a servo motor to precisely drive the material tray 3 to move up and down. Alternatively, a hydraulic cylinder or a pneumatic cylinder can be used, as long as it can drive the material tray 3 to move up and down.

[0048] In some embodiments, see Figure 2 , Figure 4 and Figure 10 The plasma etching apparatus also includes a pusher assembly 7, which includes a fixed bracket 71, a sliding bracket 72, a movable frame 73, and multiple pusher plates 74. The fixed bracket 71 is mounted on the worktable 1 and located on one side of the transition assembly 4. The fixed bracket 71 has a sliding block 711 that slides along a first path. One end of the sliding bracket 72 is connected to the sliding block 711. The long axis of the sliding bracket 72 is perpendicular to the first path. The bottom of the sliding bracket 72 is provided with a sliding groove 721 that extends in a direction perpendicular to the first path. The top of the movable frame 73 is slidably disposed in the sliding groove 721. Multiple pusher plates 74 are spaced apart at the bottom of the movable frame 73 in a direction perpendicular to the first path. The pusher plates 74 are located between two adjacent movable plates 411, and the two ends of the pusher plates 74 are used to push the material away from the movable plates 411 along the first path.

[0049] In specific implementation, the fixed bracket 71 adopts a linear sliding table, and the linear sliding table has a sliding block that slides along the first path. The sliding bracket 72 is connected to the sliding block to realize the movement of the sliding bracket 72 along the first path.

[0050] The pusher assembly 7 provided in this embodiment, through the cooperation of a fixed bracket 71, a sliding bracket 72, and a movable frame 73, uses a pusher plate 74 to push materials away between movable plates 411. This facilitates proactive intervention in the material position during the connection between the transition assembly 4 and the movable assembly 5, or in cases of abnormal material transfer, resolving potential material jamming or residue issues, ensuring smooth material transport, and providing auxiliary support for the continuity of alternating dual-disc transport. The pusher plate 74 can move along the first path under the drive of the sliding bracket 72, and move in a direction perpendicular to the first path under the drive of the movable frame 73, increasing the flexibility of use and facilitating precise adjustment of the starting position of the pusher plate 74.

[0051] In some embodiments, see Figure 2 and Figure 11 The moving component 5 also includes a first lifting member 53 and a second lifting member 54 installed on the worktable 1. The first lifting member 53 is adjacent to the transition portion, and the second lifting member 54 is located below the etching component 6. The top of the first lifting member 53 has a first lifting plate that can be raised and lowered, and the top of the second lifting member 54 has a second lifting plate that can be raised and lowered. The first lifting plate and the second lifting plate can respectively lift the first tray 51 or the second tray 52. ​​The first sliding portion is installed on both sides of the first tray 51, and the second sliding portion is installed on both sides of the second tray 52. ​​The moving component 5 also includes two first guide rails and two second guide rails. The first guide rails and the second guide rails extend along a first path. The first sliding portion slides in cooperation with the first guide rail, and the second sliding portion slides in cooperation with the second guide rail. The bottom of the first guide rail is higher than the bottom of the second guide rail.

[0052] It should be noted that the first tray 51 and the second tray 52 are transport trays used in the prior art, and their structure has been disclosed in the field of etching, so the structure will not be described in detail.

[0053] In practice, when the first tray 51 needs to receive materials, the first tray 51 moves to the top of the first lifting member 53. The first lifting member 53 drives the first tray 51 to rise to the same height as the moving plate 411, and then lowers and resets. The first tray 51 moves to the top of the second lifting member 54, and the second lifting member 54 lifts the first tray 51 upward, so that the first tray 51 and the plasma vacuum chamber 62 cooperate to form a sealed processing space.

[0054] In practice, both the first lifting component 53 and the second lifting component 54 use servo motors and ball screws. The servo motor drives the screw to rise and fall, and a lifting plate is installed on the top of the screw. The lifting plate rises and falls with the first disc 51 or the second disc 52 to increase the contact area.

[0055] In this embodiment, the first lifting member 53 and the second lifting member 54 respectively realize the lifting and lowering of the first tray 51 or the second tray 52 to meet the sealing requirements of the etching component 6; the first guide rail and the second guide rail cooperate with the sliding part to ensure the stable movement of the tray body along the first path. The height difference design of the first guide rail and the second guide rail is adapted to the positional relationship when the first tray 51 and the second tray 52 are vertically overlapped, making the alternating transport of the first tray 51 and the second tray 52 more accurate and stable, improving the operational reliability of the moving component 5, and ensuring smooth connection of etching processing.

[0056] As another embodiment of the movement of the first disc 51 and the second disc 52, the worktable is provided with two rotatable first lead screws 55 and two second lead screws 56, and a drive motor 57 is also installed. The drive motor 57 drives the first lead screws 55 to rotate around their own long axes, and the bottom sides of the first disc 51 are provided with first mating blocks 511 that are threadedly engaged with the first lead screws 55. The bottom sides of the second disc 52 are provided with second mating blocks 521 that are threadedly engaged with the second lead screws 56. The drive motor 57 drives the first lead screws 55 and the second lead screws 56 to rotate, so that the first disc 51 and the second disc 52 can be moved through the lead screw engagement.

[0057] Specifically, the relative distance between the two first lead screws 55 is greater than the relative distance between the two second lead screws 56, and the two second lead screws 56 are located between the two first lead screws 55.

[0058] In some embodiments, the top of the first lifting member 53 and the top of the second lifting member 54 are provided with cushioning pads, which can abut against the first disc 51 or the second disc 52 to reduce the impact on the first disc 52 or the second disc 52.

[0059] In some embodiments, see Figure 1 and Figure 2 The workbench 1 is equipped with casters 11 at the bottom and a protective shell 12 on the top, with a closing door 121 on the side of the protective shell 12. The casters 11 at the bottom of the workbench 1 facilitate flexible movement and layout adjustment of the equipment; the protective shell 12 and the closing door 121 on the top provide protection for the internal components and facilitate observation of the equipment's operating status and maintenance and replacement of parts, improving the convenience and maintainability of the equipment and making the device more practical in workshop layout and daily operation and maintenance.

[0060] In some embodiments, see Figure 1 and Figure 2 The plasma etching apparatus also includes a warning component, which includes multiple sensors and a warning light 8. The multiple sensors are respectively installed on the feeding component 2, the material tray 3, the transition component 4, the moving component 5 and the etching component 6, and the multiple sensors are respectively connected to the warning light 8. The warning light 8 is installed on the top of the outer surface of the protective shell 12.

[0061] The warning component provided in this embodiment utilizes multiple sensors to monitor the status of each component. When an anomaly occurs, an alarm is triggered by warning light 8, enabling timely detection of faults in processes such as material feeding, transportation, and etching. This facilitates rapid response and maintenance, reduces losses caused by escalating faults, enhances the safety and monitorability of the equipment operation, and ensures the stable execution of complex processes such as dual-disc alternation. Warning light 8 provides employees with a clear visual indication of whether a fault has occurred, improving the timeliness and efficiency of maintenance.

[0062] In practice, the sensors include displacement sensors and temperature sensors, which respectively detect the displacement distance and operating temperature of each component.

[0063] The above description is merely a preferred embodiment of this application and is not intended to limit this application. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of this application should be included within the protection scope of this application.

Claims

1. A plasma etching apparatus, characterized in that, The worktable includes a pusher assembly, a tray, a transition assembly, a moving assembly, and an etching assembly arranged sequentially along a first path. The material tray is vertically and adjustablely connected to the worktable and is used to hold materials. The pushing component is disposed on the worktable and has a pushing end that moves along the first path. The pushing end can push the material on the top of the holding tray to the transition component. The moving component includes a first disk and a second disk that move along a first path. The first disk and the second disk are movably connected to the worktable and each has a degree of freedom to move up and down. The length of the first disk is less than the length of the second disk. The first disk and the second disk can receive materials from the transition component and move the materials to the etching component for etching. When the first disk and the second disk overlap in the vertical direction, the height of the first disk is higher than that of the second disk. The transition component is fixed to the workbench, and the top of the transition component forms a transition section that can move along the first path. The transition section can transfer material from the material tray to the first tray or the second tray.

2. The plasma etching apparatus as described in claim 1, characterized in that, The feeding assembly includes: A support frame is slidably disposed on the upper surface of the workbench along the first path; Multiple push rods are spaced apart at the top of the support frame along a direction perpendicular to the first path. Each push rod is located on the side of the support frame near the material tray, and the end of each push rod near the material tray forms the push end. A first driving member is disposed on the top of the workbench. The first driving member has a telescopic end that extends and retracts along the first path, and the telescopic end is connected to the bottom of the support frame.

3. The plasma etching apparatus as described in claim 1, characterized in that, The transition component includes: A transition platform is installed on the workbench. The transition platform includes multiple movable plates, which are spaced apart along a direction perpendicular to the first path. The second driving component is installed inside the worktable. The second driving component has a rotatable output shaft with the rotation axis perpendicular to the first path. The output shaft is connected to an output rod, which sequentially passes through multiple moving plates and rotatably engages with each of the multiple moving plates. Multiple driven wheel assemblies are respectively installed on the sidewalls of the corresponding movable plates. Each driven wheel assembly includes two driven wheels located at both ends of the corresponding movable plate, and the rotation axis of the driven wheels is parallel to the rotation axis of the output shaft; and Multiple conveyor belts are provided, each corresponding to a second drive component. The multiple conveyor belts are respectively fitted onto two corresponding driven wheels and the output shaft to achieve synchronous rotation of the driven wheels and the corresponding output shaft. The outer surface of the conveyor belt can contact the material to drive the material to move along the first path to the first or second disc. The conveyor belt forms the transition section.

4. The plasma etching apparatus as described in claim 3, characterized in that, The transition component also includes multiple limiting wheels, which are rotatably mounted on the side of the corresponding moving plate, with their rotation axes perpendicular to the first path. The bottom of each limiting wheel is higher than the top of the moving plate, and the limiting wheel can roll into contact with the upper surface of the material to limit the displacement of the material in the vertical direction.

5. The plasma etching apparatus as described in claim 1, characterized in that, The etching assembly includes: A fixed frame is installed on the workbench; A plasma vacuum chamber, fixed to the mounting frame, has an opening at its bottom. One of the openings of the plasma vacuum chamber mates with either the first or second disk to form a sealed vacuum. A power matching device is mounted on the mounting bracket. The power matching device is electrically connected to the plasma vacuum chamber and also electrically connected to a power source.

6. The plasma etching apparatus as described in claim 1, characterized in that, A lifting drive is installed directly below the material tray, and the top of the lifting drive forms a lifting end that can be raised and lowered. The material tray is installed on the lifting end.

7. The plasma etching apparatus as described in claim 3, characterized in that, The plasma etching apparatus further includes a pusher assembly, the pusher assembly comprising: A fixed bracket is mounted on the workbench and located on one side of the transition assembly, the fixed bracket having a sliding block that slides along the first path; A sliding bracket, one end of which is slidably connected to the sliding block, the long axis of which is perpendicular to the first path, and a sliding groove is provided at the bottom of which extends in a direction perpendicular to the first path; The movable frame, with its top slidably disposed in the sliding groove; and Multiple push plates are spaced apart at the bottom of the movable frame along a direction perpendicular to the first path. The push plates are located between two adjacent movable plates, and the two ends of the push plates are used to push the material away from the movable plates along the first path.

8. The plasma etching apparatus as described in claim 1, characterized in that, The moving component further includes a first lifting member and a second lifting member installed on the workbench. The first lifting member is adjacent to the transition portion, and the second lifting member is located below the etching component. The top of the first lifting member has a first lifting plate that can be raised and lowered, and the top of the second lifting member has a second lifting plate that can be raised and lowered. The first lifting plate and the second lifting plate can respectively lift the first tray or the second tray to raise and lower. The first plate has a first sliding part installed on both sides, and the second plate has a second sliding part installed on both sides; The moving component further includes two first guide rails and two second guide rails, the first guide rails and the second guide rails extending along the first path respectively, the first sliding part slidingly engaging with the first guide rail, the second sliding part slidingly engaging with the second guide rail, and the bottom of the first guide rail being higher than the bottom of the second guide rail.

9. The plasma etching apparatus as described in claim 1, characterized in that, The workbench is equipped with casters at the bottom; the top of the workbench is covered with a protective shell, and the side of the protective shell is equipped with a closing door.

10. The plasma etching apparatus as described in claim 9, characterized in that, The plasma etching apparatus further includes a warning component, which includes multiple sensors and a warning light. The multiple sensors are respectively installed on the feeding component, the material tray, the transition component, the moving component, and the etching component, and the multiple sensors are respectively communicatively connected to the warning light. The warning light is installed on the top of the outer surface of the protective shell.

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