A detection device for visualizing real-time monitoring of chemical vapor deposition

Abstract

The utility model discloses a kind of detection devices of visual real-time monitoring chemical vapor deposition in the field of semiconductor, comprising: gas supply component;First reaction box, connect on the gas outlet end of gas supply component, the gas provided by gas supply component is heated;Second reaction box, connect on the gas outlet end of first reaction box, second reaction box is further provided with transparent observation window on it;Vacuum component, connect with the gas outlet end of second reaction box;Schlieren system, observation area coincides with observation window;Sensing component, set on the gas outlet end of gas supply component and second reaction box;The beneficial effects of the utility model are as follows: by setting two reaction box, first reaction box preheats precursor gas, second reaction box is used as reaction chamber, and transparent observation window is set on second reaction box, real-time observation is carried out to second reaction tube by schlieren system, and the observation of reaction is more intuitive, and the quality of film of reaction can be effectively improved.

Description

Technical Field

[0001] This utility model relates to the semiconductor field, specifically to a detection device for visual real-time monitoring of chemical vapor deposition. Background Technology

[0002] Chemical vapor deposition (CVD) is a widely used technique for preparing thin film materials, applied in fields such as semiconductors, optical coatings, and wear-resistant coatings. To ensure film quality, commonly used inspection methods in the CVD process include: In-situ monitoring technology: Laser interferometer: Real-time measurement of thin film thickness and growth rate.

[0003] Mass spectrometer (MS): Analyzes the composition of reaction gases and monitors the reaction process.

[0004] Fourier transform infrared spectroscopy (FTIR): Detects reaction intermediates and the chemical composition of thin films.

[0005] Post-processing inspection technology: Scanning electron microscope (SEM): Observes the surface morphology and microstructure of thin films.

[0006] X-ray diffraction (XRD): Analyzes the crystal structure and orientation of thin films.

[0007] Atomic force microscopy (AFM): measures the surface roughness of thin films.

[0008] Although these detection methods play an important role in CVD processes, they still have some shortcomings: Limitations of in-situ monitoring technology: Laser interferometers: They work well with transparent films, but their measurement accuracy is limited for non-transparent or multilayer films.

[0009] Mass spectrometer (MS): Although it can analyze gas components, it is not sensitive enough for trace components and the equipment is expensive.

[0010] Fourier transform infrared spectroscopy (FTIR): has low sensitivity for detecting certain reaction intermediates and is greatly affected by environmental interference.

[0011] The shortcomings of post-processing detection technology: Scanning electron microscope (SEM): requires a high vacuum environment, has complex sample preparation, and cannot monitor in real time.

[0012] X-ray diffraction (XRD) is less effective for analyzing amorphous thin films and has high equipment costs.

[0013] Atomic force microscopy (AFM): slow measurement speed and easily affected by sample surface contamination.

[0014] Taking the CVD process in semiconductor manufacturing as an example, most of the above-mentioned detection methods have the following problems: The problem of thin film uniformity: On large-area substrates, it is difficult to ensure the uniformity of film thickness and composition, which affects device performance.

[0015] Low utilization rate of reactant gases: Some reactant gases do not fully participate in the reaction, resulting in waste and environmental pollution.

[0016] The process parameters are complex to control: parameters such as temperature, pressure, and gas flow rate need to be precisely controlled, and even slight deviations will affect the quality of the film.

[0017] In summary, although CVD detection methods and equipment have played an important role in thin film preparation, problems such as insufficient sensitivity, high equipment cost, and difficulty in real-time monitoring still exist.

[0018] To this end, we propose a detection device for real-time visualization monitoring of chemical vapor deposition. Summary of the Invention

[0019] To address the aforementioned shortcomings of existing technologies, this invention provides a detection device for real-time visualization and monitoring of chemical vapor deposition.

[0020] To achieve the above-mentioned objectives, the technical solution adopted by this utility model is as follows: A detection device for real-time visualization monitoring of chemical vapor deposition includes: a gas supply component for providing a gas atmosphere for the detection test; The first reaction chamber is connected to the gas outlet of the gas supply assembly and heats the gas supplied by the gas supply assembly. The second reaction chamber is connected to the gas outlet of the first reaction chamber. The second reaction chamber is used to support the substrate and provide the reaction environment. The second reaction chamber is also equipped with a transparent observation window. The vacuum assembly is connected to the gas outlet of the second reaction chamber and evacuates the interior of both the second and first reaction chambers. The schlieren system, with its observation area overlapping the observation window, is used to observe changes in the flow field on the vent pipe inside the second reaction chamber. The sensing component is located at the gas outlet of the gas supply component and the second reaction chamber to collect data on the gas supply flow rate and the pressure of the reaction gas.

[0021] By setting up a first reaction chamber and a second reaction chamber, the first reaction chamber is used for atmosphere mixing and preheating, while the second reaction chamber is used for the reaction. A transparent observation window is opened on the second reaction chamber, and a schlieren system is set up so that the observation area of ​​the schlieren system coincides with the observation window. The reaction status in the second reaction chamber can be observed in real time through the schlieren system, which allows for more intuitive observation of the reaction status. Process parameters can be adjusted in a timely manner according to the reaction status, which can effectively improve the uniformity and quality of the film.

[0022] Further defined, the first reaction chamber includes a first chamber, a first control box, a first reaction tube, a first electric heating wire, and a first thermocouple; the first chamber is fixedly mounted on the top of the first control box, and a first cover is rotatably connected to the first chamber; a first through hole for the first reaction tube to pass through is horizontally opened in the first chamber and the first cover; the first through hole in the first chamber and the first cover is semi-cylindrical, and when combined, it is a complete cylindrical hole; the first reaction tube is located in the first through hole, and both ends extend out of the chamber wall of the first chamber; the first electric heating wire is embedded in the inner wall of the first through hole; both the inlet and outlet ends of the first reaction tube are provided with connecting flanges; the inlet end of the first reaction tube is connected to the gas supply assembly; the first thermocouple is embedded in the first chamber, and a gap is left between the probe end and the first reaction tube; a control circuit is provided in the first control box, and the first electric heating wire and the first thermocouple are electrically connected to the control circuit in the first control box.

[0023] By setting up a first housing and a first reaction tube, the gas supply assembly delivers the required gas to the first reaction tube, and the first electric heating wire heats the gas inside, realizing the preheating of the precursor gas, which is more conducive to the reaction. The heating temperature is set by the control circuit of the first control box. The control circuit of the first control box heats the first electric heating wire according to the real-time temperature of the first reaction tube fed back by the first thermocouple. The structure is simple and easy to use.

[0024] Further defining the second reaction chamber, it includes a second housing, a second control box, a second reaction tube, a second electric heating wire, a second thermocouple, and an radio frequency assembly. The second housing is located on top of the second control box. The second control box has a horizontally opened U-shaped through-hole for the second reaction tube to pass through. The top of the second through-hole extends through the top of the second control box. The top of the second control box has a second cover, which is T-shaped and has a second through-groove recessed at the bottom to fit against the wall of the second reaction tube. The inlet and outlet ends of the second reaction tube also have connecting flanges. The gas end is connected to the gas outlet end of the first reaction tube. The second electric heating wire is embedded in the inner wall of the second through groove and the inner wall of the second through hole, and is located on the upper and lower sides of the second reaction tube. The radio frequency component and the second thermocouple are both embedded in the second control box, and the detection end is close to the middle section of the second reaction tube. The observation window is opened along the front and back direction of the second box and penetrates the second box. The center height of the observation window is the same as the axis height of the second reaction tube and is offset from the second electric heating wire. The second electric heating wire, the second thermocouple, and the radio frequency component are all electrically connected to the control circuit in the second control box.

[0025] This arrangement of the second chamber, second cover, and second through hole, compared to the split structure of the first chamber and first cover, where the axis of the reaction tube is located at the joint line, would result in a poor seal and visible seams if an observation window were provided. This design makes the observation window a single unit, eliminating seam marks and improving sealing. It also facilitates observation by the schlieren system. The radio frequency component is used to emit radio frequency power to the second reaction tube, causing the gas inside to plasmaize. The control circuit in the second control box allows for setting the radio frequency and heating temperature, making it convenient to use.

[0026] Further defining the gas supply assembly, it includes a main gas supply pipe, several branch gas supply pipes, and a gas supply container. The main gas supply pipe is connected to the connecting flange at the inlet end of the first reaction pipe. Several branch gas supply pipes are spaced apart on the main gas supply pipe, and each branch gas supply pipe is connected to a gas supply container at its end. Each branch gas supply pipe is equipped with an on / off solenoid valve, which is electrically connected to the control circuit in the first control box. With this arrangement of the main gas supply pipe and branch gas supply pipes, and the electrical connection between the on / off solenoid valve and the control circuit in the first control box, the proportions of various gases in the atmosphere can be set through the first control box, and the on / off solenoid valve automatically opens the mixed gas according to the proportion, which is very convenient.

[0027] Further specifying, the vacuum assembly includes a vacuum pump and a connecting pipe; an exhaust pipe is connected to the connecting flange at the outlet end of the second reaction tube, and an on / off valve is provided on the exhaust pipe; one end of the connecting pipe is detachably connected to the exhaust pipe, and the other end is connected to the inlet end of the vacuum pump; a vent valve is provided on the pipeline between the first reaction tube and the second reaction tube.

[0028] With this vacuum pump setup, before the test begins, the vent valve, on / off valve, and vacuum pump are opened to evacuate the first and second reaction tubes, completely expelling the internal air. At this point, the vent valve is closed to isolate the first and second reaction tubes, the on / off valve and vacuum pump are closed, and the connecting pipe to the exhaust pipe is disconnected to achieve internal vacuuming, facilitating the reaction.

[0029] Further defining the schlieren system, it includes a light source, a concave mirror, a blade, an imaging plate, and a camera. The light source and the concave mirror are positioned on the front and rear sides of the second housing, respectively, via a bracket and an observation window. The blade is also positioned between the concave mirror and the imaging plate via a bracket. The camera is positioned opposite the imaging plate to capture images on the imaging plate.

[0030] This arrangement of the light source and concave mirror allows light emitted from the light source to pass through a transparent observation window and the second reaction tube, illuminating the concave mirror. The concave mirror reflects the light, and the knife edge is positioned at the focal point of the reflected light between the concave mirror and the imaging plate. The reactive gas inside the transparent second reaction tube refracts the light emitted from the light source, causing it to deviate from its original direction and bypass the knife edge located at the focal point of the reflected light, projecting the diffracted light onto the imaging plate. The image on the imaging plate is then captured by a camera, enabling a more intuitive analysis of the reaction within the second reaction tube.

[0031] Further specifying, the sensing components include a flow controller and a pressure sensor. The flow controller is located on the main gas supply pipe, and the pressure sensor is located on the exhaust pipe between the on / off valve and the second reaction pipe. By setting the flow controller on the main gas supply pipe, it is convenient to control the gas flow rate entering the first reaction pipe, and by setting the pressure sensor, the gas pressure in the second reaction pipe can be monitored.

[0032] The beneficial effects of this invention are as follows: by setting up two reaction chambers, the first reaction chamber preheats the precursor gas, and the second reaction chamber serves as the reaction chamber. A transparent observation window is opened on the second reaction chamber, and the second reaction tube is observed in real time through a schlieren system. The observation of the reaction is more intuitive and can effectively improve the quality of the reaction film. Attached Figure Description

[0033] Figure 1 This is a simplified structural diagram of the first reaction chamber of this utility model in the open state from a frontal view. Figure 2 This is a perspective view of the second reaction chamber from the right side. Figure 3 A simplified structural diagram of the second reaction chamber and the schlieren system from a top-down view; Figure 4 This is a diagram showing the connection relationships of the electrical components inside the first reaction chamber; Figure 5This is a diagram showing the connection relationships of the electrical components inside the second reaction chamber.

[0034] The symbols for each component are as follows: Gas supply assembly 1, main gas supply pipe 11, branch gas supply pipe 12, gas supply container 13, solenoid valve 14, first reaction chamber 2, first chamber 21, first control box 22, first reaction tube 23, first electric heating wire 24, first thermocouple 25, first chamber cover 26, first through hole 27, second reaction chamber 3, observation window 31, second chamber 32, second control box 33, second reaction tube 34, second electric heating wire 35, second thermocouple 36, radio frequency assembly 37, second through hole 38, second chamber cover 39, exhaust pipe 310, on / off valve 311, second through groove 312, vacuum assembly 4, vacuum pump 41, connecting pipe 42, schlieren system 5, light source 51, concave mirror 52, knife edge 53, imaging plate 54, camera 55, sensing assembly 6, flow controller 61, pressure sensor 62, connecting flange 7, vent valve 8. Detailed Implementation

[0035] The specific embodiments of this utility model are described below to enable those skilled in the art to understand this utility model. However, it should be understood that this utility model is not limited to the scope of the specific embodiments. For those skilled in the art, as long as various changes are within the spirit and scope of this utility model as defined and determined by the appended claims, these changes are obvious. All utility model creations utilizing the concept of this utility model are within the scope of protection.

[0036] Example: like Figures 1-5As shown, a detection device for real-time visualization monitoring of chemical vapor deposition includes a gas supply assembly 1, a first reaction chamber 2, a second reaction chamber 3, a vacuum assembly 4, a schlieren system 5, and a sensing assembly 6. The gas supply assembly 1 provides a gas atmosphere for the detection experiment. The gas supply assembly 1 includes a main gas supply pipe 11, several gas supply branch pipes 12, and a gas supply container 13. Several gas supply branch pipes 12 are spaced apart on the main gas supply pipe 11, and each gas supply branch pipe 12 is connected to a gas supply container 13 at its end. Each gas supply branch pipe 12 is equipped with a... There is an on / off solenoid valve 14; the first reaction chamber 2 is used to heat the gas supplied by the gas supply assembly 1; the first reaction chamber 2 includes a first chamber 21, a first control box 22, a first reaction tube 23, a first electric heating wire 24, and a first thermocouple 25; the first chamber 21 is fixedly mounted on the top of the first control box 22, and a first cover 26 is rotatably connected to the first chamber 21; a first through hole 27 for the first reaction tube 23 to pass through is horizontally opened in the first chamber 21 and the first cover 26; the first chamber 21 and the first control box 22 are rotatably connected to the first cover 26. The first through holes 27 inside the cover 26 are all semi-cylindrical, and when combined, they form a complete cylindrical hole. The first reaction tube 23 is located inside the first through hole 27, with both ends extending out of the walls of the first housing 21. The first electric heating wire 24 is embedded in the inner wall of the first through hole 27. Both the inlet and outlet ends of the first reaction tube 23 are equipped with connecting flanges 7. The main gas supply pipe 11 is connected to the connecting flange 7 at the inlet end of the first reaction tube 23. The first thermocouple 25 is embedded inside the first housing 21, with its detection end connected to the first reaction tube. A gap is left between the tubes 23. The first control box 22 is equipped with a control circuit. The first electric heating wire 24 and the first thermocouple 25 are electrically connected to the control circuit in the first control box 22. The opening and closing solenoid valve 14 is electrically connected to the control circuit in the first control box 22. The second reaction chamber 3 is used to support the substrate and provide the reaction environment. The second reaction chamber 3 includes an observation window 31, a second chamber 32, a second control box 33, a second reaction tube 34, a second electric heating wire 35, a second thermocouple 36, and a radio frequency assembly 37.The second housing 32 is located on top of the second control housing 33. The second control housing 33 has a horizontally opened U-shaped second through-hole 38 for the second reaction tube 34 to pass through. The top of the second through-hole 38 extends through the top of the second control housing 33. The top of the second control housing 33 is provided with a second housing cover 39, which is T-shaped and has a recessed bottom that fits against the wall of the second reaction tube 34. The inlet and outlet ends of the second reaction tube 34 are also provided with connecting flanges 7, with the inlet end connected to the outlet end of the first reaction tube 23. The second electric heating wire 35 is embedded in the second through-hole 312. On the inner wall of 12 and the inner wall of the second through hole 38, and located on the upper and lower sides of the second reaction tube 34, the radio frequency component 37 and the second thermocouple 36 are both embedded in the second control box 33, with the probe end close to the middle section of the second reaction tube 34. The observation window 31 is opened along the front and rear direction of the second box 32 and penetrates the second box 32. The center height of the observation window 31 is the same as the axis height of the second reaction tube 34 and is offset from the second electric heating wire 35. The second electric heating wire 35, the second thermocouple 36, and the radio frequency component 37 are all electrically connected to the control circuit in the second control box 33; the vacuum component 4 is used for The interiors of the second reaction chamber 3 and the first reaction chamber 2 are evacuated; the vacuum assembly 4 includes a vacuum pump 41 and a connecting pipe 42; an exhaust pipe 310 is connected to the connecting flange 7 at the outlet end of the second reaction pipe 34, and an on / off valve 311 is provided on the exhaust pipe 310; one end of the connecting pipe 42 is detachably connected to the exhaust pipe 310, and the other end is connected to the inlet end of the vacuum pump 41; a vent valve 8 is provided on the pipeline between the first reaction pipe 23 and the second reaction pipe 34; the observation area of ​​the schlieren system 5 coincides with the observation window 31 and is used to observe the flow field changes on the vent pipe inside the second reaction chamber 3; the schlieren system 5 The system includes a light source 51, a concave mirror 52, a blade 53, an imaging plate 54, and a camera 55. The light source 51 and concave mirror 52 are positioned at the front and rear of the second housing 32, respectively, via a bracket and an observation window 31. The blade 53 is also positioned between the concave mirror 52 and the imaging plate 54 via a bracket. The camera 55 is positioned opposite the imaging plate 54 to capture images from it. The sensing component 6 includes a flow controller 61 and a pressure sensor 62. The flow controller 61 is located on the main gas supply pipe 11, and the pressure sensor 62 is located on the exhaust pipe 310 between the on / off valve 311 and the second reaction pipe 34.

[0037] In this application, the first reaction chamber 2 and the second reaction chamber 3 are both tube furnaces in the prior art. Only their external structures have been improved, and their internal control circuits have not been improved. The radio frequency component 37 is also an electrode radio frequency component that exists in existing tube furnaces. Therefore, its control circuit and radio frequency component 37 are not described in the text.

[0038] By setting up a first reaction chamber 2 and a second reaction chamber 3, the first reaction chamber 2 is used for atmosphere mixing and preheating, while the second reaction chamber 3 is used for the reaction. A transparent observation window 31 is opened on the second reaction chamber 3, and a schlieren system 5 is installed, with the observation area of ​​the schlieren system 5 coinciding with the observation window 31. The reaction status within the second reaction chamber 3 can be observed in real time through the schlieren system 5, allowing for more intuitive observation of the reaction process. Process parameters can be adjusted promptly based on the reaction status, effectively improving the uniformity and quality of the thin film. By setting up the first chamber 21 and the first reaction tube 23, the gas supply assembly 1 supplies the atmosphere... The required gas is delivered to the first reaction tube 23, and the first electric heating wire 24 heats the internal gas to preheat the precursor gas, which is more conducive to the reaction. The heating temperature is set by the control circuit of the first control box 22. The control circuit of the first control box 22 heats the first electric heating wire 24 according to the real-time temperature of the first reaction tube 23 fed back by the first thermocouple 25. The structure is simple and easy to use. With the second box 32, the second box cover 39 and the second through hole 38 set up in this way, compared with the half structure of the first box 21 and the first box cover 26, the axis of the reaction tube in the half structure is located at the joint line. If an observation hole is opened... The observation window 31, if divided into two parts, would have poor sealing and would show joint marks. This new design makes the observation window 31 a single unit, eliminating joint marks, improving sealing, and facilitating observation by the schlieren system 5. The radio frequency component 37 transmits radio frequency power to the second reaction tube 34, ionizing the gas inside. The control circuit in the second control box 33 sets the radio frequency and heating temperature, making it convenient to use. This design also includes the main gas supply pipe 11 and branch gas supply pipe 12, and connects the opening and closing solenoid valve 14 to the control circuit in the first control box 22. The connection allows for setting the proportions of various gases in the atmosphere via the first control box 22. The solenoid valve 14 automatically opens the mixed gas according to the proportion, which is very convenient. With the vacuum pump 41 set up, before the test begins, the vent valve 8, the on / off valve 311, and the vacuum pump 41 are opened to evacuate the first reaction tube 23 and the second reaction tube 34, so that the internal air is completely discharged. At this time, the vent valve 8 is closed to isolate the first reaction tube 23 and the second reaction tube 34, the on / off valve 311 and the vacuum pump 41 are closed, and the connecting pipe 42 connected to the exhaust pipe 310 is disconnected to achieve internal evacuation, which facilitates the reaction.With the light source 51 and concave mirror 52 configured this way, the light emitted from the light source 51 passes through the transparent observation window 31 and the second reaction tube 34, illuminating the concave mirror 52. The concave mirror 52 reflects the light, placing the knife edge 53 at the focal point of the reflected light between the concave mirror 52 and the imaging plate 54. The reacting gas inside the transparent second reaction tube 34 refracts the light emitted from the light source 51, causing it to deviate from its original direction and bypass the knife edge 53 at the focal point of the reflected light, projecting the diffracted light onto the imaging plate 54. The camera 55 captures the image on the imaging plate 54, thus enabling a more intuitive analysis of the reaction within the second reaction tube 34. A flow controller 61 is installed on the gas supply main pipe 11 to control the gas flow rate entering the first reaction tube 23, and a pressure sensor 62 monitors the gas pressure inside the second reaction tube 34.

[0039] During the experiment, the substrate and reactants are first placed into the second reaction tube 34. The vent valve 8, the on / off valve 311, and the vacuum pump 41 are opened to evacuate the first reaction tube 23 and the second reaction tube 34. After the evacuation of the first reaction tube 23 and the second reaction tube 34 is completed, the vent valve 8, the on / off valve 311, and the vacuum pump 41 are closed. The on / off solenoid valve 14 is opened to introduce precursor gas into the first reaction tube 23. After the precursor gas is introduced, the precursor gas inside is heated through the first control box 22. At the same time, the second reaction tube 34 is heated through the second control box 33. When the temperature of the precursor gas in the first control box 22 and the second reaction tube 34 both reach the required temperature, the vent valve 8 is opened to introduce precursor gas into the second reaction tube 34. At the same time, the radio frequency component 37 is turned on to ionize the gas inside. At this time, the deposition begins. The gas flow and reaction process inside are observed at any time through the schlieren component to monitor the film growth. The radio frequency frequency, temperature, etc. are adjusted according to the reaction. After the deposition is completed, the device is closed sequentially.

Claims

1. A detection device for real-time visualization monitoring of chemical vapor deposition, characterized in that, include: Gas supply assembly (1) is used to provide a gas atmosphere for the test; The first reaction chamber (2) is connected to the gas outlet of the gas supply assembly (1) and heats the gas supplied by the gas supply assembly (1); The second reaction chamber (3) is connected to the gas outlet of the first reaction chamber (2). The second reaction chamber (3) is used to support the substrate and provide the reaction environment. The second reaction chamber (3) is also provided with a transparent observation window (31). Vacuum assembly (4) is connected to the outlet of the second reaction chamber (3) to evacuate the interior of the second reaction chamber (3) and the first reaction chamber (2); The schlieren system (5) has an observation area that coincides with the observation window (31) and is used to observe the flow field changes on the vent pipe inside the second reaction chamber (3). The sensing component (6) is located at the outlet of the gas supply component (1) and the second reaction chamber (3) to collect data on the gas supply flow rate of the gas supply component (1) and the pressure data of the reaction gas.

2. The detection device for real-time visualization monitoring of chemical vapor deposition according to claim 1, characterized in that, The first reaction chamber (2) includes a first chamber (21), a first control box (22), a first reaction tube (23), a first electric heating wire (24), and a first thermocouple (25). The first chamber (21) is fixedly mounted on the top of the first control box (22). A first cover (26) is rotatably connected to the first chamber (21). A first through hole (27) for the first reaction tube (23) to pass through is horizontally opened in the first chamber (21) and the first cover (26). The first through hole (27) in the first chamber (21) and the first cover (26) are both semi-cylindrical, and when combined, they form a complete cylindrical hole. The first reaction tube (23) is located in... The first through hole (27) extends into the wall of the first box (21) at both ends. The first electric heating wire (24) is embedded in the inner wall of the first through hole (27). The inlet and outlet of the first reaction tube (23) are provided with connecting flanges (7). The inlet of the first reaction tube (23) is connected to the gas supply assembly (1). The first thermocouple (25) is embedded in the first box (21) with a gap between the probe end and the first reaction tube (23). The first control box (22) is provided with a control circuit. The first electric heating wire (24) and the first thermocouple (25) are electrically connected to the control circuit in the first control box (22).

3. The detection device for real-time visualization monitoring of chemical vapor deposition according to claim 2, characterized in that, The second reaction chamber (3) includes a second chamber (32), a second control box (33), a second reaction tube (34), a second electric heating wire (35), a second thermocouple (36), and a radio frequency assembly (37). The second chamber (32) is located on top of the second control box (33). The second control box (33) has a horizontally opened second through hole (38) with a U-shaped cross-section for the second reaction tube (34) to pass through. The top of the second through hole (38) extends through the top of the second control box (33). The top of the second control box (33) is provided with a second cover (39). The second cover (39) is T-shaped and has a second through groove (312) that fits against the wall of the second reaction tube (34) at the bottom. The inlet and outlet ends of the second reaction tube (34) are also provided with connecting flanges (7), and the inlet end is connected to the... On the outlet end of the first reaction tube (23), the second electric heating wire (35) is embedded in the inner wall of the second through groove (312) and the inner wall of the second through hole (38), and is located on the upper and lower sides of the second reaction tube (34). The radio frequency component (37) and the second thermocouple (36) are both embedded in the second control box (33), and the detection end is close to the middle section of the second reaction tube (34). The observation window (31) is opened along the front and back direction of the second box (32) and penetrates the second box (32). The center height of the observation window (31) is the same as the axis height of the second reaction tube (34) and is offset from the second electric heating wire (35). The second electric heating wire (35), the second thermocouple (36), and the radio frequency component (37) are all electrically connected to the control circuit in the second control box (33).

4. The detection device for real-time visualization monitoring of chemical vapor deposition according to claim 3, characterized in that, The gas supply assembly (1) includes a main gas supply pipe (11), several gas supply branch pipes (12) and a gas supply container (13); the main gas supply pipe (11) is connected to the connecting flange (7) at the gas inlet end of the first reaction pipe (23), several gas supply branch pipes (12) are spaced apart on the main gas supply pipe (11), and the end of each gas supply branch pipe (12) is connected to the gas supply container (13). Each gas supply branch pipe (12) is provided with an opening and closing solenoid valve (14), and the opening and closing solenoid valve (14) is electrically connected to the control circuit in the first control box (22).

5. The detection device for real-time visualization monitoring of chemical vapor deposition according to claim 4, characterized in that, The vacuum assembly (4) includes a vacuum pump (41) and a connecting pipe (42); an exhaust pipe (310) is connected to the connecting flange (7) at the outlet end of the second reaction pipe (34), and an on / off valve (311) is provided on the exhaust pipe (310). One end of the connecting pipe (42) is detachably connected to the exhaust pipe (310), and the other end is connected to the inlet end of the vacuum pump (41). A vent valve (8) is provided on the pipeline between the first reaction pipe (23) and the second reaction pipe (34).

6. The detection device for real-time visualization monitoring of chemical vapor deposition according to claim 5, characterized in that, The schlieren system (5) includes a light source (51), a concave mirror (52), a blade (53), an imaging plate (54), and a camera (55). The light source (51) and the concave mirror (52) are positioned on the front and rear sides of the second housing (32) respectively, corresponding to the observation window (31) via a bracket. The blade (53) is also positioned between the concave mirror (52) and the imaging plate (54) via a bracket. The camera (55) is positioned opposite to the imaging plate (54) and acquires images on the imaging plate (54).

7. The detection device for real-time visualization monitoring of chemical vapor deposition according to claim 6, characterized in that, The sensing component (6) includes a flow controller (61) and a pressure sensor (62). The flow controller (61) is located on the gas supply main pipe (11), and the pressure sensor (62) is located on the exhaust pipe (310) between the on / off valve (311) and the second reaction pipe (34).

Images