A gas uniform structure and a coating equipment

Abstract

The utility model belongs to vacuum plating technology field discloses a kind of air distribution structure and coating equipment, air distribution structure includes air distribution main body, and air distribution main body is equipped with the first air distribution passage of M×N matrix arrangement and the N first air inlet passage of along first direction interval, first air inlet passage is along second direction extension arrangement, N first air inlet passage and N column first air distribution passage along first direction arrangement one-to-one corresponding arrangement, first air inlet passage and corresponding first air distribution passage are communicated, and N first air distribution passage in the same row along first direction is jointly communicated with at least one second air distribution passage arranged on air distribution main body, and all second air distribution passage is interval arrangement along second direction, and second air distribution passage is communicated with first air hole group, and first air hole group includes multiple first air outlet holes arranged on air distribution main body along first direction interval arrangement. The air distribution structure provided by the utility model is conducive to reducing the flow difference of process gas discharged by each first air outlet hole.

Description

Technical Field

[0001] This utility model relates to the field of vacuum coating technology, and in particular to a uniform gas structure and coating equipment. Background Technology

[0002] Atomic layer deposition (ALD) is a method of depositing material onto a substrate surface layer by layer in the form of single-atom films. In this process, two or more chemical vapor precursors react sequentially on the substrate surface to produce a solid thin film.

[0003] In related technologies, the air inlet channel of ALD vacuum coating equipment is relatively long, and each air inlet channel is connected to multiple air outlets. The long air inlet channel will cause a large difference in the flow rate of the process gas ejected from each air outlet, which will affect the coating quality. Utility Model Content

[0004] One objective of this invention is to provide a gas uniformity structure that facilitates the uniform discharge of process gases.

[0005] To achieve this objective, the present invention adopts the following technical solution:

[0006] A gas equalization structure is provided, including a gas equalization body. The gas equalization body is provided with a first gas equalization channel arranged in an M×N matrix and N first air inlet channels spaced apart along a first direction. The first air inlet channels extend along a second direction. The N first air inlet channels are arranged one-to-one with the N columns of first gas equalization channels arranged along the first direction. The first air inlet channels are connected to the corresponding first gas equalization channels. The N first gas equalization channels located in the same row along the first direction are connected to at least one second gas equalization channel provided on the gas equalization body. All the second gas equalization channels are spaced apart along the second direction. The second gas equalization channels are connected to a first air hole group. The first air hole group includes a plurality of first air outlets spaced apart along the first direction on the gas equalization body, wherein N>1 and M>1.

[0007] Optionally, the first gas equalization channel includes X first channel sections, which extend along a first direction. N first channel sections located in the same row along the first direction are connected to a second gas equalization channel, which extends along the first direction, wherein X≥1.

[0008] Optionally, X≥2, X first channel sections of the same first air equalization channel are spaced apart along the second direction; the first air equalization channel further includes a first main channel section, the first main channel section extends along the second direction, and the first channel sections of the same first air equalization channel are connected to the corresponding first air intake channel through the first main channel section.

[0009] The central region of the first channel section is connected to the first main channel section, or one end of the first channel section is connected to the first main channel section.

[0010] Optionally, the first channel section is connected to the corresponding second air distribution channel through a plurality of first vent holes.

[0011] Optionally, the gas equalization structure further includes a first control valve, which is located between the first gas equalization channel and the first air intake channel. The first control valve is used to adjust the opening between the first air intake channel and the first gas equalization channel.

[0012] Optionally, the gas-distributing body includes:

[0013] A gas equalization plate, wherein the gas equalization plate is provided with a first gas equalization channel and a first air inlet channel;

[0014] An air outlet plate is attached to the air distribution plate along a third direction and forms a second air distribution channel with the air distribution plate. The first air outlet hole is provided on the air outlet plate.

[0015] Optionally, the gas equalization plate is provided with a first valve hole, and the first valve hole and the first gas equalization channel are provided in a one-to-one correspondence. The first gas equalization channel and the first air inlet channel are connected through the first valve hole.

[0016] The air outlet plate is provided with first connection holes that correspond one-to-one with the first valve holes;

[0017] The gas distribution structure further includes a first control valve, which passes through the first connecting hole and the first valve hole, and the first control valve forms a seal with the end wall of the first valve hole near the first connecting hole.

[0018] Optionally, the gas equalization plate is provided with the first gas equalization channel on the side away from the gas outlet plate along the third direction. The gas equalization structure also includes a heating plate, which is provided on the side of the gas equalization body away from the first gas outlet along the third direction, and the heating plate is attached to the gas equalization plate and seals the first gas equalization channel.

[0019] Optionally, the gas equalization body includes a first gas equalization plate, a second gas equalization plate, a third gas equalization plate, and a gas outlet plate that are sequentially attached along a third direction;

[0020] The first air inlet channel is formed between the first air distribution plate and the second air distribution plate, the first air distribution channel is formed between the second air distribution plate and the third air distribution plate, the second air distribution channel is formed between the third air distribution plate and the air outlet plate, and the first air outlet hole is provided on the air outlet plate.

[0021] Optionally, the second air distribution plate is provided with a second valve hole, and the third air distribution plate is provided with a third valve hole. The second valve hole, the third valve hole and the first air distribution channel are provided in a one-to-one correspondence. The first air distribution channel and the first air inlet channel are connected through the second valve hole.

[0022] The air outlet plate is provided with a first connection hole that corresponds one-to-one with the third valve hole;

[0023] The gas distribution structure further includes a first control valve, which is sequentially disposed in the first connecting hole, the third valve hole and the second valve hole, and the first control valve and the third valve hole form a seal.

[0024] Optionally, the gas equalization body is provided with a third gas equalization channel arranged in a P×Q matrix and Q second air inlet channels spaced apart along a first direction. The Q second air inlet channels are arranged one-to-one with the Q columns of the third gas equalization channels arranged along the first direction. The second air inlet channels are connected to the corresponding third gas equalization channels. The Q third gas equalization channels located in the same row along the first direction are connected to at least one fourth gas equalization channel provided on the gas equalization body. All the fourth gas equalization channels are spaced apart along the second direction. The fourth gas equalization channels are connected to a second air hole group. The second air hole group includes a plurality of second air outlets spaced apart along the first direction on the gas equalization body, wherein P>1, -1≥NQ≥1;

[0025] Among them, N first air intake channels and Q second air intake channels are arranged alternately along the first direction, and the first air hole group and the second air hole group are arranged alternately along the second direction.

[0026] Optionally, the first gas equalization channel includes X first channel sections, which extend along a first direction. N first channel sections located in the same row along the first direction are connected to a second gas equalization channel, which extends along the first direction, wherein X≥1.

[0027] The third gas equalization channel includes Y second channel sections, which extend along a first direction. Q second channel sections located in the same row along the first direction are connected to a fourth gas equalization channel, which extends along the first direction. Wherein, Y≥1; the first channel sections in the N× row and the second channel sections in the QY row are arranged alternately along the second direction.

[0028] Optionally, the second channel section is connected to the corresponding fourth air distribution channel through a plurality of second vent holes.

[0029] Optionally, the gas equalization structure further includes a second control valve, which is located between the third gas equalization channel and the second air intake channel. The second control valve is used to adjust the opening between the second air intake channel and the third gas equalization channel.

[0030] Optionally, the gas equalization body is provided with at least one isolation channel group between adjacent first air hole groups and second air hole groups. The isolation channel group includes two rows of first retraction channels and a row of first air isolation holes disposed between the two rows of first retraction channels. Both the first retraction channels and the first air isolation holes extend in a third direction.

[0031] The gas equalization structure further includes a heating plate, which is located on the side of the gas equalization body away from the first air outlet along a third direction. The heating plate is provided with a first return hole that corresponds to and communicates with the first return channel. The first return hole extends along a third direction. The heating plate is provided with a first partition corresponding to the isolation channel group along a third direction on the side away from the gas equalization body. The projection of the first partition along a third direction is located between the two rows of the first return channels of the corresponding isolation channel group.

[0032] Optionally, the heating plate is provided with a second partition between two rows of first return holes on the side of the heating plate away from the gas equalization body in a third direction.

[0033] Optionally, the gas equalization structure further includes a cover plate, which is disposed on the side of the heating plate away from the gas equalization body along a third direction. A surrounding plate is provided between the heating plate and the cover plate. A return cavity is formed between the heating plate, the cover plate and the surrounding plate. The first return hole communicates with the return cavity, and the first partition is located inside the return cavity.

[0034] At least one of the heating plate and the cover plate is provided with a second back-pull hole that communicates with the back-pull chamber, and the gas in the back-pull chamber is discharged through the second back-pull hole.

[0035] Optionally, the first partition abuts against the cover plate, and the heating plate protrudes from at least one of its two sides along the first direction from the gas equalization body.

[0036] Along the first direction, the first partition and the surrounding plate form a gap on the portion of the heating plate that protrudes from the gas equalization body, and the portion of the heating plate that protrudes from the gas equalization body is provided with a second return hole that communicates with the return cavity.

[0037] Optionally, the area of ​​the end of the first air outlet that is connected to the second air distribution channel is smaller than the area of ​​the end of the first air outlet that is away from the second air distribution channel.

[0038] Another objective of this utility model is to provide a coating device, comprising:

[0039] The main body of the equipment is equipped with a reaction chamber;

[0040] The aforementioned gas-uniform structure is located inside the main body of the device, and the first gas outlet on the gas-uniform structure is connected to the reaction chamber.

[0041] The beneficial effects of this utility model are as follows: The gas equalization structure provided by this utility model allows the process gas entering the first inlet channel to flow sequentially through the first equalization channel and the second equalization channel before being discharged through the first outlet. The arrangement of the first and second equalization channels reduces the flow rate difference of the process gas discharged from each of the first outlets. Furthermore, the N first inlet channels correspond one-to-one with the N columns of first equalization channels arranged along the first direction, and the first inlet channels are connected to their corresponding first equalization channels. The N first equalization channels located in the same row along the first direction are also connected to at least one second equalization channel, ensuring that the process gas in the N first inlet channels flows into each second equalization channel. This helps reduce the flow rate difference of the process gas discharged from each of the first outlets caused by pressure differences within the N first inlet channels, thus improving the uniformity of the process gas discharged from the first outlets.

[0042] The coating equipment provided by this utility model, through the setting of the gas uniform structure, helps to reduce the flow rate difference of the process gas ejected from each first gas outlet, so that the coating equipment has good coating quality. Attached Figure Description

[0043] Figure 1 This is a schematic diagram of one embodiment of the gas-uniform structure provided by this utility model;

[0044] Figure 2 This is a cross-sectional view of one embodiment of the gas-uniform structure provided by this utility model;

[0045] Figure 3 This utility model provides Figure 2 Enlarged structural diagram at point A;

[0046] Figure 4 This is a schematic diagram of one perspective of an embodiment of the air distribution plate provided by this utility model;

[0047] Figure 5 This is a layout diagram of the first and third gas equalization channels equipped with control valves provided by this utility model.

[0048] Figure 6 This is a schematic diagram of another perspective of one embodiment of the air distribution plate provided by this utility model;

[0049] Figure 7 This utility model provides Figure 6 Enlarged structural diagram at point B;

[0050] Figure 8 This is a schematic diagram of one perspective of an embodiment of the air outlet plate provided by this utility model;

[0051] Figure 9 This is a schematic diagram of one perspective of the structure of a heating plate provided by this utility model;

[0052] Figure 10 This is a schematic diagram of another embodiment of the gas-uniform structure provided by this utility model;

[0053] Figure 11 This is a cross-sectional view of another embodiment of the gas-uniform structure provided by this utility model;

[0054] Figure 12 This utility model provides Figure 11 Enlarged structural diagram at point C;

[0055] Figure 13 This is a schematic diagram of the structure of the third gas equalization plate provided by this utility model;

[0056] Figure 14 This is another layout diagram of the first and third gas equalization channels equipped with control valves provided by this utility model.

[0057] Figure 15 This is a schematic diagram of the structure of the second gas equalization plate provided by this utility model;

[0058] Figure 16 This is a schematic diagram of the structure of the first gas equalization plate provided by this utility model;

[0059] Figure 17 This is a schematic diagram of another embodiment of the air outlet plate provided by this utility model from one perspective.

[0060] Figure 18 This is a schematic diagram of another embodiment of the heating plate provided by this utility model.

[0061] In the picture:

[0062] 100. Gas equalization body; 101. Gas equalization plate; 1011. First gas equalization plate; 1012. Second gas equalization plate; 1013. Third gas equalization plate; 102. Air outlet plate; 1021. First connecting hole; 1031. First valve hole; 1302. Second valve hole; 1033. Third valve hole; 110. First gas equalization channel; 111. First channel section; 1111. First vent hole; 112. First main channel section; 120. First air inlet channel; 130. Second gas equalization channel; 140, First air outlet; 150, Third gas equalization channel; 151, Second channel section; 1511, Second vent; 160, Second air inlet channel; 170, Fourth gas equalization channel; 180, Second air outlet; 190, Isolation channel group; 191, First backflow channel; 1921, First air isolation hole; 1922, Second air isolation hole; 193, Fifth gas equalization channel; 194, Third air inlet channel; 195, Sixth gas equalization channel;

[0063] 210. Heating plate; 211. First pull-back hole; 2121. First partition; 2122. Second partition; 213. Gap; 214. Second pull-back channel; 215. Second pull-back hole; 220. Cover plate; 230. Enclosure plate;

[0064] 310, First control valve; 320, Second control valve. Detailed Implementation

[0065] The present invention will now be described in further detail with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present invention and not intended to limit it. Furthermore, it should be noted that, for ease of description, the accompanying drawings show only the parts relevant to the present invention, not the entire structure.

[0066] In the description of this utility model, unless otherwise explicitly specified and limited, the terms "connected," "linked," and "fixed" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0067] In this invention, unless otherwise explicitly specified and limited, "above" or "below" the second feature can include direct contact between the first and second features, or contact between the first and second features through another feature between them. Furthermore, "above," "over," and "on top" of the second feature includes the first feature directly above or diagonally above the second feature, or simply indicates that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature includes the first feature directly below or diagonally below the second feature, or simply indicates that the first feature is at a lower horizontal level than the second feature.

[0068] In the description of this embodiment, the terms "upper," "lower," "right," etc., refer to the orientation or positional relationship shown in the accompanying drawings. They are used only for ease of description and simplification of operation, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model. In addition, the terms "first" and "second" are only used for distinction in description and have no special meaning.

[0069] Example 1

[0070] Reference Figures 1 to 8 As shown, this embodiment provides a gas-uniformity structure, which includes a gas-uniformity body 100. The gas-uniformity body 100 has first gas-uniformity channels 110 arranged in an M×N matrix and N first air inlet channels 120 spaced apart along a first direction. Here, M rows of first gas-uniformity channels 110 refer to M rows of first gas-uniformity channels 110 arranged side-by-side along a second direction, and N columns of first gas-uniformity channels 110 refer to N columns of first gas-uniformity channels 110 arranged side-by-side along the first direction. The row and column definitions of other channels and slots in the gas-uniformity structure are the same and will not be elaborated further in this embodiment. The first direction and the second direction are perpendicular to each other. The first direction can be the width direction of the gas-uniformity structure, and the second direction can be the length direction of the gas-uniformity structure.

[0071] The first air intake channel 120 extends along the second direction. N first air intake channels 120 are arranged in a one-to-one correspondence with N columns of first air equalization channels 110 arranged along the first direction. The first air intake channel 120 is connected to the corresponding first air equalization channel 110. It can be understood that a first air equalization channel 110 in the same column is connected to a first air intake channel 120.

[0072] N first gas-uniforming channels 110 located in the same row along a first direction are connected to at least one second gas-uniforming channel 130 disposed on the gas-uniforming body 100. All the second gas-uniforming channels 130 are spaced apart along a second direction. Each second gas-uniforming channel 130 is connected to a first air hole group. The first air hole group includes multiple first air outlets 140 spaced apart along the first direction on the gas-uniforming body 100, where N > 1 and M > 1. The first air outlets 140 may extend along a third direction. The first direction, the second direction, and the third direction are perpendicular to each other. The third direction may be the thickness direction of the gas-uniforming structure.

[0073] When process gas is introduced into the gas equalization structure through the first gas inlet channel 120, the process gas entering the first gas inlet channel 120 will flow through the first gas equalization channel 110 and the second gas equalization channel 130 in sequence and then be discharged through the first gas outlet 140. The arrangement of the first gas equalization channel 110 and the second gas equalization channel 130 can reduce the flow rate difference of the process gas discharged from each first gas outlet 140. Furthermore, the N first gas inlet channels 120 are arranged one-to-one with the N columns of first gas equalization channels 110 arranged along the first direction. Each first gas inlet channel 120 is connected to its corresponding first gas equalization channel 110, and the N first gas equalization channels 110 located in the same row along the first direction are connected to at least one second gas equalization channel 130. This allows the process gas in the N first gas inlet channels 120 to flow into each second gas equalization channel 130 and then be discharged through the first gas outlet 140. This helps to reduce the flow rate difference of the process gas discharged from each first gas outlet 140 caused by the different pressures within the N first gas inlet channels 120, thereby improving the uniformity of the process gas discharged from the first gas outlet 140 and ultimately improving the coating quality.

[0074] For example, the first air hole group is spaced apart along the second direction. Since the second air distribution channel 130 is spaced apart along the second direction, it is convenient for the second air distribution channel 130 to communicate with the corresponding plurality of first air outlet holes 140 spaced apart along the first direction.

[0075] For example, the first vent holes 140 are arranged in a matrix. For example, the process gas ejected from the first vent holes 140 located in the same row along the first direction can form an air curtain, which is beneficial to improving the coating quality.

[0076] For example, both ends of the first air inlet channel 120 can be used to introduce process gas, which helps to improve the uniformity of the process gas discharged from the first air outlet 140.

[0077] In one feasible implementation, the area of ​​the end of the first air outlet 140 that is connected to the second air distribution channel 130 is smaller than the area of ​​the end of the first air outlet 140 that is far away from the second air distribution channel 130, which is beneficial to the formation of the air curtain.

[0078] For example, the first vent 140 is trapezoidal in shape, such as an isosceles trapezoid; or it is formed by a combination of steps and a frustum, such as... Figure 3 As shown.

[0079] In this embodiment, reference is made to Figure 4 and Figure 5 As shown, the first gas equalization channel 110 includes X first channel sections 111, which extend along a first direction. N first channel sections 111 located in the same row along the first direction are connected to a second gas equalization channel 130, which also extends along the first direction. X ≥ 1. When X ≥ 2, it facilitates the connection between the first air inlet channel 120 and the first gas equalization channel 110, which helps improve the uniformity of the process gas discharged from the first air outlet 140, simplifies the structure of the gas equalization body 100, facilitates the channel arrangement on the gas equalization body 100, and reduces costs.

[0080] When X≥2, the X first channel portions 111 of the same first air equalization channel 110 are spaced apart along the second direction; the first air equalization channel 110 also includes a first main channel portion 112, which extends along the second direction. The first channel portions 111 of the same first air equalization channel 110 are connected to the corresponding first air intake channel 120 through the first main channel portion 112, which is beneficial to the channel arrangement on the air equalization body 100.

[0081] In some embodiments, the central region of the first channel portion 111 is connected to the first main channel portion 112, which simplifies the structure of the gas equalization body 100, facilitates the channel arrangement on the gas equalization body 100, improves the gas uniformity within the first channel portion 111, and improves the uniformity of the process gas discharged from the first outlet 140. For example, the central region of the first channel portion 111 along the first direction is connected to the first main channel portion 112.

[0082] In some embodiments, one end of the first channel portion 111 is connected to the first main channel portion 112, which is beneficial for the channel arrangement on the gas equalization body 100 and improves the structural compactness of the gas equalization body 100.

[0083] Exemplarily, along the first direction, the length of the outermost first channel portion 111 is less than the length of the other first channel portions 111; for example, the length of the outermost first channel portion 111 is half the length of the other first channel portions 111. Along the first direction, one end of the outermost first channel portion 111 communicates with the first main channel portion 112, and the central region of the other first channel portions 111 communicates with the first main channel portion 112. Exemplarily, one end of the outermost first channel portion 111 near the corresponding side edge (such as the corresponding long side of the air-regulating body 100) communicates with the first main channel portion 112. Exemplarily, along the first direction, the lengths of the other first channel portions 111, except for the outermost first channel portion 111, can be equal or unequal; this embodiment does not limit this. Of course, the lengths of all first channel portions 111 can be equal.

[0084] In one feasible implementation, the first channel section 111 is connected to the corresponding second gas equalization channel 130 through a plurality of first vent holes 1111, which is beneficial to improving the gas uniformity in the second gas equalization channel 130 and the uniformity of the process gas discharged from the first vent hole 140.

[0085] For example, the first vent 1111 is provided to extend in a third direction.

[0086] For example, the centerline of the first vent 1111 is offset from the centerline of the first outlet 140, which helps to improve the uniformity of the process gas discharged from the first outlet 140. Of course, the centerline of the first vent 1111 and the centerline of the first outlet 140 can also coincide.

[0087] In this embodiment, reference is made to Figures 5 to 8 As shown, the gas equalization structure also includes a first control valve 310, which is located between the first gas equalization channel 110 and the first air inlet channel 120. The first control valve 310 is used to adjust the opening between the first air inlet channel 120 and the first gas equalization channel 110. It can be understood that adjusting the opening between the first air inlet channel 120 and the spray channel is equivalent to adjusting the opening of the control valve, thereby regulating the flow rate of the process gas flowing into the first gas equalization channel 110 through the first air inlet channel 120.

[0088] In this embodiment, reference continues to be made to... Figures 5 to 8As shown, the gas equalization body 100 includes a gas equalization plate 101 and a gas outlet plate 102. The gas equalization plate 101 has a first gas equalization channel 110 and a first air inlet channel 120. The gas outlet plate 102 is attached to the gas equalization plate 101 along a third direction and forms a second gas equalization channel 130 with the gas equalization plate 101. The gas outlet plate 102 has a first air outlet hole 140. It is understood that at least one of the gas outlet plate 102 and the gas equalization plate 101 has a groove for enclosing the second gas equalization channel 130.

[0089] For example, the first air intake channel 120 is formed by opening a straight hole on the air distribution plate 101.

[0090] For example, the first vent 1111 is provided on the air distribution plate 101.

[0091] In this embodiment, compared with the integrally formed gas equalization body 100, the setting of the gas equalization plate 101 and the air outlet plate 102 facilitates the molding and manufacturing of the second gas equalization channel 130 and the first air vent 1111.

[0092] In one feasible embodiment, the air distribution plate 101 is provided with a first valve hole 1031, and the first valve hole 1031 and the first air distribution channel 110 are respectively arranged one-to-one. The first air distribution channel 110 and the first air inlet channel 120 are connected through the first valve hole 1031. The air outlet plate 102 is provided with a first connecting hole 1021 corresponding one-to-one with the first valve hole 1031. The first control valve 310 passes through the first connecting hole 1021 and the first valve hole 1031, and the first control valve 310 forms a seal with the end wall of the first valve hole 1031 near the first connecting hole 1021, which facilitates the installation and replacement of the first control valve 310 and the maintenance of the air distribution structure. It can be understood that the first control valve 310 can adjust the opening between the first air inlet channel 120 and the first air distribution channel 110 by adjusting the opening of the first valve hole 1031.

[0093] For example, when X = 1, the first valve hole 1031 can be provided at the end of the first channel portion 111 or in the central region of the first channel portion 111; when X ≥ 2, the first valve hole 1031 can be provided in the central region of the first main channel portion 112.

[0094] In one feasible implementation, such as Figure 2 and Figure 3As shown, the gas equalization plate 101 has a first gas equalization channel 110 on the side away from the gas outlet plate 102 along a third direction. The gas equalization structure also includes a heating plate 210, which is located on the side of the gas equalization body 100 away from the first gas outlet 140 along a third direction. The heating plate 210 is attached to the gas equalization plate 101 and seals the first gas equalization channel 110. It can be understood that the first gas equalization channel 110 is grooved, and the sealing of the heating plate 210 forms a gas path for the process gas to flow, which facilitates the molding and manufacturing of the first gas equalization channel 110. It is understandable that, along the third direction upward, the first gas equalization channel 110 is located on the side of the first gas inlet channel 120 away from the gas outlet plate 102, which simplifies the structure of the gas equalization body 100 and is conducive to the arrangement of channels on the gas equalization body 100. Moreover, the first gas inlet channel 120 and the first gas equalization channel 110 cooperate to form a gas transmission path from bottom to top, and the first gas equalization channel 110 and the second gas equalization channel 130 form a gas transmission path from top to bottom, which is conducive to improving the uniformity of the process gas discharged from the first gas outlet 140.

[0095] In this embodiment, reference is made to Figures 4 to 8 As shown, the gas equalization body 100 is provided with a third gas equalization channel 150 arranged in a P×Q matrix and Q second air inlet channels 160 spaced apart along the first direction. The Q second air inlet channels 160 are arranged one-to-one with the Q columns of third gas equalization channels 150 arranged along the first direction. The second air inlet channels 160 are connected to the corresponding third gas equalization channels 150. The Q third gas equalization channels 150 located in the same row along the first direction are connected to at least one fourth gas equalization channel 170 provided on the gas equalization body 100. All the fourth gas equalization channels 170 are spaced apart along the second direction. The fourth gas equalization channels 170 are connected to a second air hole group. The second air hole group includes a plurality of second air outlets 180 spaced apart along the first direction on the gas equalization body 100, where P>1, -1≥NQ≥1. In this embodiment, N first air inlet channels 120 and Q second air inlet channels 160 are arranged alternately along a first direction, and the first and second air hole groups are arranged alternately along a second direction, simplifying the structure of the gas distribution body 100 and facilitating the channel arrangement on the gas distribution body 100. Wherein, -1 ≥ NQ ≥ 1 indicates that the number of first air inlet channels 120 and second air inlet channels 160 is equal or the difference between their numbers is 1. In this embodiment, different process gases can be introduced into the first air inlet channels 120 and the second air inlet channels 160 to meet the coating requirements.

[0096] For example, both ends of the second air inlet channel 160 can be used to introduce process gas, which helps to improve the uniformity of the process gas discharged from the second air outlet 180.

[0097] For example, the center lines of the first air intake passage 120 and the second air intake passage 160 are located on the same plane.

[0098] For example, the second vent 180 may be provided to extend in a third direction.

[0099] For example, the number of second vents 180 may be equal to or different from the number of first vents 140.

[0100] For example, the shape of the second vent 180 may be the same as the shape of the first vent 140.

[0101] For example, taking the gas equalization body 100 including a gas equalization plate 101 and a gas outlet plate 102 as an example, the third gas equalization channel 150 and the second air inlet channel 160 are disposed on the gas equalization plate 101; the fourth gas equalization channel 170 is formed by the gas outlet plate 102 and the gas equalization plate 101 surrounding each other, and the second air outlet 180 is disposed on the gas outlet plate 102. The first air inlet channel 120 and the second air inlet channel 160 are formed in the same way, and will not be described in detail in this embodiment. The third gas equalization channel 150 and the first gas equalization channel 110 are formed in the same way, and will not be described in detail in this embodiment. The fourth gas equalization channel 170 and the second gas equalization channel 130 are formed in the same way, and will not be described in detail in this embodiment.

[0102] It is understood that the second vents 180 are arranged in a matrix. For example, the process gas ejected from the second vents 180 located in the same row along the first direction can form an air curtain, which is beneficial to improving the coating quality.

[0103] In one feasible embodiment, the third gas equalization channel 150 includes Y second channel portions 151 extending along a first direction. Q second channel portions 151 located in the same row along the first direction are connected to a fourth gas equalization channel 170, which also extends along the first direction, wherein Y ≥ 1. When Y ≥ 2, it facilitates the connection between the second air inlet channel 160 and the third gas equalization channel 150, improves the uniformity of the process gas discharged from the second air outlet 180, simplifies the structure of the gas equalization body 100, facilitates the channel arrangement on the gas equalization body 100, and reduces costs.

[0104] When Y≥2, the Y second channel sections 151 of the same third air equalization channel 150 are spaced apart along the second direction; the second air equalization channel 130 also includes a second main channel section (not shown), the second main channel section extends along the second direction, and the second channel section 151 of the same third air equalization channel 150 is connected to the corresponding second air intake channel 160 through the second main channel section, which is beneficial to the channel arrangement on the air equalization body 100.

[0105] In one feasible implementation, the first channel portions 111 of the NX rows and the second channel portions 151 of the QY rows are arranged alternately along the second direction, simplifying the structure of the gas equalization body 100 and facilitating the arrangement of channels on the gas equalization body 100. It is understood that the NX rows refer to the total number of rows of the first channel portions 111, and the QY rows refer to the total number of rows of the second channel portions 151.

[0106] In some embodiments, the central region of the second channel portion 151 is connected to the second main channel portion, which simplifies the structure of the gas equalization body 100, facilitates the channel arrangement on the gas equalization body 100, improves the gas uniformity within the second channel portion 151, and improves the uniformity of the process gas discharged from the second outlet 180. For example, the central region of the second channel portion 151 along the first direction is connected to the second main channel portion.

[0107] In some embodiments, one end of the second channel portion 151 is connected to the second main channel portion, which is beneficial to the channel arrangement on the gas equalization body 100 and improves the structural compactness of the gas equalization body 100.

[0108] Exemplarily, along the first direction, the length of the outermost second channel portion 151 is less than the length of the other second channel portions 151; for example, the length of the outermost second channel portion 151 is half the length of the other second channel portions 151. Along the first direction, one end of the outermost second channel portion 151 communicates with the second main channel portion, and the central region of the other second channel portions 151 communicates with the second main channel portion. Exemplarily, the end of the outermost second channel portion 151 near the corresponding side edge (such as the corresponding long side of the air-regulating body 100) of the air-regulating body 100 communicates with the second main channel portion. Exemplarily, along the first direction, the lengths of the other second channel portions 151, except for the outermost second channel portion 151, can be equal or unequal; this embodiment does not limit this. Of course, the lengths of all second channel portions 151 can be equal.

[0109] For example, such as Figure 4 As shown, the first gas equalization channel 110 includes two first channel portions 111, and the third gas equalization channel 150 includes one second channel portion 151. All the second channel portions 151 can have the same length, and along the first direction, the length of the outermost first channel portion 111 is less than the length of the other first channel portions 111.

[0110] In one feasible implementation, the second channel section 151 is connected to the corresponding fourth gas equalization channel 170 through a plurality of second vent holes 1511, which is beneficial to improving the gas uniformity in the fourth gas equalization channel 170 and the uniformity of the process gas discharged from the second vent hole 180.

[0111] For example, the second vent 1511 is provided to extend in a third direction.

[0112] For example, the centerline of the second vent 1511 is offset from the centerline of the second vent 180, which helps to improve the uniformity of the process gas discharged from the second vent 180. Of course, the centerline of the second vent 1511 and the centerline of the second vent 180 can also coincide.

[0113] In this embodiment, reference is made to Figures 5 to 8 As shown, the gas equalization structure also includes a second control valve 320, which is located between the third gas equalization channel 150 and the second air inlet channel 160. The second control valve 320 is used to adjust the opening between the second air inlet channel 160 and the third gas equalization channel 150. It can be understood that adjusting the opening between the second air inlet channel 160 and the spray channel is equivalent to adjusting the opening of the second control valve 320, thereby regulating the flow rate of the process gas flowing into the third gas equalization channel 150 through the second air inlet channel 160. The arrangement of the second control valve 320 is the same as that of the first control valve 310, and will not be elaborated further in this embodiment.

[0114] In this embodiment, reference is made to Figures 5 to 9 As shown, the gas distribution body 100 has at least one isolation channel group 190 between adjacent first and second pore groups. The isolation channel group 190 includes two rows of first backflow channels 191 and a row of first air-blocking holes 1921 disposed between the two rows of first backflow channels 191. Both the first backflow channels 191 and the first air-blocking holes 1921 extend in a third direction. In this embodiment, the isolation gas discharged from the first air-blocking hole 1921 can separate the process gases discharged from the first air outlet 140 and the second air outlet 180. This helps to prevent different process gases from directly mixing before acting on the workpiece to be coated, thus generating a large amount of CVD reactants and affecting the coating quality. It can also extend the maintenance and cleaning cycle of the gas distribution structure and improve its utilization rate. Furthermore, the isolation gas can be returned through the two rows of first backflow channels 191 to prevent the isolation gas from diffusing and affecting the coating of the process gases.

[0115] For example, the first air-sealing holes 1921 are arranged in a matrix.

[0116] Exemplarily, the first retraction channels 191 are arranged in a matrix. Exemplarily, the first retraction channels 191 are elongated, and the first air-blocking holes 1921 are circular. The number of first retraction channels 191 in a row is less than the number of first air-blocking holes 1921 in a row. In adjacent rows of first retraction channels 191 and rows of first air-blocking holes 1921, one first retraction channel 191 may correspond to at least two first air-blocking holes 1921, for example, three to twenty.

[0117] For example, the gas distribution body 100 has two isolation channel groups 190 between adjacent first and second pore groups, and the two isolation channel groups 190 are arranged at intervals along the second direction. Furthermore, a first air-blocking hole 1921 can also be provided between the two isolation channel groups 190 to further block the interaction of process gases.

[0118] For example, the first air-blocking hole 1921 is provided on the air outlet plate 102.

[0119] For example, the shape of the first air-blocking hole 1921 may be the same as the shape of the first air-outlet hole 140.

[0120] For example, the isolation gas can be an inert gas or nitrogen.

[0121] For example, the first retraction channel 191 penetrates the gas uniform body 100 in a third direction.

[0122] For example, the first pore group and the second pore group form a pore region on the gas uniform body 100; along the second direction, at least one isolation channel group 190 is provided on both sides of the pore region, which is beneficial to improving the coating quality.

[0123] In one feasible implementation, the heating plate 210 is provided with first return holes 211 that correspond one-to-one with the first return channels 191. The first return holes 211 extend along a third direction. On the side of the heating plate 210 away from the gas equalization body 100 along a third direction, there is a first partition 2121 that corresponds one-to-one with the isolation channel group 190. The projection of the first partition 2121 along a third direction is located between the two rows of first return channels 191 of the corresponding isolation channel group 190. In this embodiment, the first partition 2121 can separate different process gases, which helps to reduce the risk of different process gases mixing at the first return holes 211 and forming CVD reactant accumulation that blocks the first return holes 211. This can extend the maintenance and cleaning cycle of the gas equalization structure and improve its utilization rate.

[0124] In this embodiment, reference is made to Figure 1 , Figures 6 to 8 As shown, the gas distribution body 100 is also provided with a third air intake channel 194, through which the isolation gas is introduced into the first air isolation hole 1921.

[0125] In one feasible implementation, a plurality of third air intake channels 194 are provided at intervals along the second direction, and the third air intake channels 194 extend along the first direction. For example, the number of third air intake channels 194 is the same as the number of rows of first air-blocking holes 1921, and one third air intake channel 194 communicates with one row of first air-blocking holes 1921.

[0126] For example, the third air intake channel 194 is provided on the air distribution plate 101.

[0127] For example, the third air intake channel 194 is located in a third direction on the side of the first air intake channel 120 away from the first air distribution channel 110, which is beneficial to the channel arrangement on the air distribution body 100.

[0128] In one feasible implementation, a fifth air distribution channel 193 is formed between the air outlet plate 102 and the air distribution plate 101. The fifth air distribution channel 193 extends along the first direction, and the third air inlet channel 194 can be connected to the first air isolation hole 1921 through the fifth air distribution channel 193.

[0129] For example, the number of fifth air distribution channels 193 is the same as the number of rows of first air-blocking holes 1921, and one fifth air distribution channel 193 is connected to one row of first air-blocking holes 1921. It can be understood that one row of first air-blocking holes 1921 is connected to the corresponding third air intake channel 194 through the corresponding fifth air distribution channel 193.

[0130] For example, the fifth gas equalization channel 193 is connected to the corresponding third air inlet channel 194 through a plurality of second air isolation holes 1922, which is beneficial to improving the gas uniformity in the fifth gas equalization channel 193 and to the uniform discharge of the isolated gas.

[0131] For example, the second air vent 1922 is provided to extend in a third direction.

[0132] For example, the center line of the second air-blocking hole 1922 is offset from the center line of the first air-blocking hole 1921, which is beneficial for the uniform discharge of the isolated gas. Of course, the center line of the second air-blocking hole 1922 can also coincide with the center line of the first air-blocking hole 1921.

[0133] In this embodiment, reference is made to Figure 1 , Figure 2 and Figure 9 As shown, the gas equalization structure also includes a cover plate 220, which is located on the side of the heating plate 210 away from the gas equalization body 100 along a third direction. A surrounding plate 230 is provided between the heating plate 210 and the cover plate 220, and a return cavity is formed between the heating plate 210, the cover plate 220, and the surrounding plate 230. A first return hole 211 communicates with the return cavity, and a first partition plate 2121 is located inside the return cavity. At least one of the heating plate 210 and the cover plate 220 is provided with a second return hole 215 communicating with the return cavity, and the gas in the return cavity is discharged through the second return hole 215. The second return hole 215 can be used to connect a gas extraction device. In this embodiment, the gas extraction device extracts gas, so that the gas entering the first return channel 191 flows sequentially through the corresponding first return hole 211 and the return cavity and is discharged through the second return hole 215.

[0134] For example, the enclosure 230 is integrally formed with the heating plate 210, or is fixed to the heating plate 210 by welding, threaded connection or other means.

[0135] In one feasible embodiment, the first partition 2121 abuts against the cover plate 220, and the heating plate 210 protrudes from at least one side of the gas equalization body 100 along the first direction. Along the first direction, the first partition 2121 and the surrounding plate 230 form a gap 213 on the portion of the heating plate 210 protruding from the gas equalization body 100, and the portion of the heating plate 210 protruding from the gas equalization body 100 is provided with a second return hole 215 communicating with the return cavity, which helps improve the compactness of the gas equalization structure and facilitates disassembly and assembly. It is understood that the first partition 2121 divides the return cavity into multiple second return channels 214 communicating with the gap 213. When the gas extraction device extracts gas, the gas entering the first return channel 191 flows sequentially through the corresponding first return hole 211, the corresponding second return channel 214, and the gap 213, and is discharged through the second return hole 215.

[0136] For example, the second pull-out hole 215 extends in a third direction. It can be understood that the second pull-out hole 215 is located on the side of the heating plate 210 away from the cover plate 220 or on the periphery of the heating plate 210.

[0137] Example 2

[0138] The gas equalization plate 101 in the gas equalization structure provided in this embodiment differs from that in Embodiment 1; in this embodiment, the gas equalization plate 101 is arranged in separate parts. In this embodiment, refer to... Figures 10 to 17 As shown, the gas equalization body 100 includes a first gas equalization plate 1011, a second gas equalization plate 1012, a third gas equalization plate 1013, and an air outlet plate 102, which are sequentially attached along a third direction. It can be understood that the gas equalization plate 101 includes the first gas equalization plate 1011, the second gas equalization plate 1012, and the third gas equalization plate 1013.

[0139] In this embodiment, a first air inlet channel 120 is formed between the first air distribution plate 1011 and the second air distribution plate 1012, a first air distribution channel 110 is formed between the second air distribution plate 1012 and the third air distribution plate 1013, a second air distribution channel 130 is formed between the third air distribution plate 1013 and the air outlet plate 102, and a first air outlet hole 140 is provided on the air outlet plate 102.

[0140] For example, at least one of the first air distribution plate 1011 and the second air distribution plate 1012 is provided with a groove for forming the first air intake channel 120. For example, only the second air distribution plate 1012 is provided with a groove for forming the first air intake channel 120.

[0141] For example, at least one of the second air-distributing plate 1012 and the third air-distributing plate 1013 is provided with a groove for enclosing the formation of the first air-distributing channel 110. For example, only the third air-distributing plate 1013 is provided with a groove for enclosing the formation of the first air-distributing channel 110.

[0142] For example, at least one of the third gas equalization plate 1013 and the gas outlet plate 102 is provided with a groove for forming the second gas equalization channel 130. For example, both the third gas equalization plate 1013 and the gas outlet plate 102 are provided with grooves for forming the second gas equalization channel 130.

[0143] In this embodiment, a second air inlet channel 160 is formed between the first air distribution plate 1011 and the second air distribution plate 1012, a third air distribution channel 150 is formed between the second air distribution plate 1012 and the third air distribution plate 1013, a fourth air distribution channel 170 is formed between the third air distribution plate 1013 and the air outlet plate 102, and a second air outlet hole 180 is provided on the air outlet plate 102.

[0144] For example, at least one of the first air distribution plate 1011 and the second air distribution plate 1012 is provided with a groove for forming the second air intake channel 160. For example, only the second air distribution plate 1012 is provided with a groove for forming the second air intake channel 160.

[0145] For example, at least one of the second air-distributing plate 1012 and the third air-distributing plate 1013 is provided with a groove for enclosing the formation of the third air-distributing channel 150. For example, only the third air-distributing plate 1013 is provided with a groove for enclosing the formation of the third air-distributing channel 150.

[0146] For example, at least one of the third gas equalization plate 1013 and the gas outlet plate 102 is provided with a groove for forming the fourth gas equalization channel 170. For example, both the third gas equalization plate 1013 and the gas outlet plate 102 are provided with grooves for forming the fourth gas equalization channel 170.

[0147] In one feasible embodiment, the second gas equalization plate 1012 is provided with a second valve hole 1302, and the third gas equalization plate 1013 is provided with a third valve hole 1033. The second valve hole 1302, the third valve hole 1033, and the first gas equalization channel 110 are respectively arranged in a one-to-one correspondence. The first gas equalization channel 110 and the first air inlet channel 120 are connected through the second valve hole 1302. The air outlet plate 102 is provided with a first connecting hole 1021 corresponding to the third valve hole 1033. The gas equalization structure also includes a first control valve 310, which is sequentially inserted through the first connecting hole 1021, the third valve hole 1033, and the second valve hole 1302. The first control valve 310 and the third valve hole 1033 form a seal, which facilitates the installation and replacement of the first control valve 310 and the maintenance of the gas equalization structure. Understandably, the first control valve 310 can adjust the opening between the first air intake channel 120 and the first air distribution channel 110 by adjusting the opening of the second valve orifice 1302.

[0148] For example, the second control valve 320 in this embodiment is configured in the same way as the first control valve 310, and will not be described in detail in this embodiment.

[0149] For example, such as Figure 13 As shown, the first gas equalization channel 110 includes two first channel portions 111, and the third gas equalization channel 150 includes one second channel portion 151. All the first channel portions 111 have the same length, and along the first direction, the length of the outermost second channel portion 151 is less than the length of the other second channel portions 151.

[0150] The other structures of the gas-uniform structure provided in this embodiment are the same as those in Embodiment 1, and will not be described in detail here.

[0151] Example 3

[0152] The specific configuration of the third air intake channel 194 in the gas distribution structure provided in this embodiment differs from that in Embodiments 1 and 2. In this embodiment, referring to... Figures 10 to 17 As shown, the third air intake channel 194 extends along the second direction.

[0153] For example, the third air intake passage 194 is provided with at least one, such as two to six third air intake passages 194 spaced apart along the first direction.

[0154] In this embodiment, the gas equalization body 100 is further provided with a plurality of sixth gas equalization channels 195 communicating with the third air intake channel 194. The sixth gas equalization channels 195 extend along the first direction, and the sixth gas equalization channels 195 communicating with the same third air intake channel 194 are correspondingly arranged with the isolation channel group 190. A row of first air isolation holes 1921 can be connected to all the third air intake channels 194 through the corresponding sixth gas equalization channels 195. In other words, the isolation gas in all the third air intake channels 194 can flow to each first air isolation hole 1921, which is conducive to the uniform discharge of the isolation gas.

[0155] For example, the central region of the sixth air distribution channel 195 is connected to the third air intake channel 194.

[0156] For example, a row of first air-blocking holes 1921 can be connected through the corresponding fifth air-regulating channel 193 and the corresponding sixth air-regulating channel 195, so that a row of first air-blocking holes 1921 can be connected to all the third air-inlet channels 194.

[0157] For example, the gas distribution plate 101 is provided with a third air inlet channel 194 and a sixth air distribution channel 195. The third air inlet channel 194 and the sixth air distribution channel 195 are located along a third direction on the side of the gas distribution plate 101 away from the air outlet plate 102. In this embodiment, the heating plate 210 is attached to and seals the third air inlet channel 194 and the sixth air distribution channel 195 with the gas distribution plate 101. It can be understood that the third air inlet channel 194 and the sixth air distribution channel 195 are grooved, and the sealing by the heating plate 210 forms an air passage that can isolate gas flow, facilitating the molding and manufacturing of the third air inlet channel 194 and the sixth air distribution channel 195.

[0158] For example, the first air distribution plate 1011 of the air distribution plate 101 is provided with a third air inlet channel 194 and a sixth air distribution channel 195.

[0159] For example, a fifth air distribution channel 193 is formed between the air outlet plate 102 and the third air distribution plate 1013.

[0160] The other structures of the gas-uniform structure provided in this embodiment are the same as those in Embodiment 1 or Embodiment 2, and will not be described in detail here.

[0161] Example 4

[0162] The specific arrangement of the heating plate 210 in the gas distribution structure provided in this embodiment differs from that in Embodiments 1, 2, and 3. In this embodiment, refer to... Figure 10 , Figure 11 and Figure 18As shown, compared with Embodiment 1, Embodiment 2 and Embodiment 3, in this embodiment, the heating plate 210 is provided with a second partition 2122 between two rows of return holes between two adjacent first partitions 2121 on the side away from the gas equalization body 100 along the third direction. The first partition 2121 and the second partition 2122 cooperate to reduce the risk of blockage of the first return hole 211.

[0163] Understandably, the first partition 2121 and the second partition 2122 divide the return chamber into multiple second return channels 214 that communicate with the gap 213. The evacuation device evacuates the gas, allowing the gas entering the first return channel 191 to flow sequentially through the corresponding first return hole 211 and the corresponding second return channel 214 and the gap 213, and then be discharged through the second return hole 215.

[0164] For example, when the heating plate 210 is provided with a second partition 2122, the gas distribution body 100 provides an isolation channel group 190 between adjacent first and second air hole groups, which can better separate the process gas discharged from the first air outlet 140 and the second air outlet 180.

[0165] Example 5

[0166] The specific arrangement of the heating plate 210 in the gas distribution structure provided in this embodiment differs from that in Embodiments 1, 2, 3, and 4. In this embodiment, refer to... Figure 10 and Figure 18 As shown, the heating plate 210 is flush with the gas equalizing body 100 on both sides along the first direction, and the heating plate 210 is not provided with the surrounding plate 230 on both sides along the first direction, but is provided with the surrounding plate 230 on both sides along the second direction. It is understood that the two ends of the second return channel 214 are open. In this embodiment, the suction device can be connected to the second return channel 214 through an intermediate component (not shown). Exemplarily, there are two intermediate components, respectively located on both sides of the heating plate 210 along the first direction. The intermediate component is provided with a return groove communicating with all the second return channels and an interface communicating with the return groove. The suction device is connected to the interface. The suction device draws air, allowing the gas entering the first return channel 191 to flow sequentially through the corresponding first return hole 211, the corresponding second return channel 214, and the return groove, and then be discharged through the interface.

[0167] Example 6

[0168] This embodiment provides a coating apparatus, which includes a main body and a gas-uniforming structure as described in Embodiments 1, 2, 3, 4, or 5. The main body has a reaction chamber, and the gas-uniforming structure is located within the main body, with a first gas outlet 140 on the gas-uniforming body 100 communicating with the reaction chamber. In this embodiment, the gas-uniforming structure helps reduce the flow rate differences of the process gas ejected from each of the first gas outlets 140, resulting in better coating quality.

[0169] Obviously, the above embodiments of this utility model are merely examples for clearly illustrating the present utility model, and are not intended to limit the implementation of the present utility model. Those skilled in the art can make various obvious changes, readjustments, and substitutions without departing from the protection scope of this utility model. It is neither necessary nor possible to exhaustively describe all embodiments here. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of this utility model should be included within the protection scope of the claims of this utility model.

Claims

1. A gas-uniform structure, characterized in that, The system includes a gas equalization body (100), which has a first gas equalization channel (110) arranged in an M×N matrix and N first air intake channels (120) spaced apart along a first direction. The first air intake channels (120) extend along a second direction. The N first air intake channels (120) correspond one-to-one with the N columns of first gas equalization channels (110) arranged along the first direction. The first air intake channels (120) are connected to the corresponding first gas equalization channels (110). The N first gas equalization channels (110) located in the same row along the first direction are connected to at least one second gas equalization channel (130) provided on the gas equalization body (100). All the second gas equalization channels (130) are spaced apart along the second direction. The second gas equalization channels (130) are connected to a first air hole group. The first air hole group includes a plurality of first air outlets (140) spaced apart along the first direction on the gas equalization body (100), where N>1 and M>1.

2. The gas-uniform structure according to claim 1, characterized in that, The first gas equalization channel (110) includes X first channel sections (111), which extend along a first direction. N first channel sections (111) located in the same row along the first direction are connected to a second gas equalization channel (130), which extends along the first direction. Where X ≥ 1.

3. The gas-uniform structure according to claim 2, characterized in that, X≥2, X first channel portions (111) of the same first air distribution channel (110) are spaced apart along the second direction; the first air distribution channel (110) also includes a first main channel portion (112), the first main channel portion (112) extends along the second direction, and the first channel portions (111) of the same first air distribution channel (110) are connected to the corresponding first air intake channel (120) through the first main channel portion (112); The central region of the first channel section (111) is connected to the first main channel section (112), or one end of the first channel section (111) is connected to the first main channel section (112).

4. The gas-uniform structure according to claim 2, characterized in that, The first channel section (111) is connected to the corresponding second air distribution channel (130) through a plurality of first vent holes (1111).

5. The gas-uniform structure according to claim 1, characterized in that, The gas equalization structure also includes a first control valve (310), which is located between the first gas equalization channel (110) and the first air intake channel (120). The first control valve (310) is used to adjust the opening between the first air intake channel (120) and the first gas equalization channel (110).

6. The gas-uniform structure according to claim 1, characterized in that, The gas-distributing body (100) includes: A gas equalization plate (101) is provided with a first gas equalization channel (110) and a first air inlet channel (120). An air outlet plate (102) is attached to the air distribution plate (101) along a third direction and forms a second air distribution channel (130) between the air outlet plate (101) and the air distribution plate (101). The first air outlet hole (140) is provided on the air outlet plate (102).

7. The gas-uniform structure according to claim 6, characterized in that, The gas equalization plate (101) is provided with a first valve hole (1031), and the first valve hole (1031) and the first gas equalization channel (110) are provided in a one-to-one correspondence. The first gas equalization channel (110) and the first air inlet channel (120) are connected through the first valve hole (1031). The air outlet plate (102) is provided with a first connection hole (1021) that corresponds one-to-one with the first valve hole (1031). The gas distribution structure also includes a first control valve (310), which passes through the first connecting hole (1021) and the first valve hole (1031), and the first control valve (310) and the end wall of the first valve hole (1031) near the first connecting hole (1021) form a seal.

8. The gas-uniform structure according to claim 6, characterized in that, The gas equalization plate (101) is provided with the first gas equalization channel (110) on the side away from the gas outlet plate (102) along the third direction. The gas equalization structure also includes a heating plate (210). The heating plate (210) is provided on the side away from the first gas outlet (140) along the third direction of the gas equalization body (100), and the heating plate (210) is attached to the gas equalization plate (101) and seals the first gas equalization channel (110).

9. The gas-uniform structure according to claim 1, characterized in that, The gas equalization body (100) includes a first gas equalization plate (1011), a second gas equalization plate (1012), a third gas equalization plate (1013) and an air outlet plate (102) that are sequentially attached along a third direction. The first air inlet channel (120) is formed between the first air distribution plate (1011) and the second air distribution plate (1012), the first air distribution channel (110) is formed between the second air distribution plate (1012) and the third air distribution plate (1013), the second air distribution channel (130) is formed between the third air distribution plate (1013) and the air outlet plate (102), and the first air outlet hole (140) is provided on the air outlet plate (102).

10. The gas-uniform structure according to claim 9, characterized in that, The second gas equalization plate (1012) is provided with a second valve hole (1032), and the third gas equalization plate (1013) is provided with a third valve hole (1033). The second valve hole (1032), the third valve hole (1033) and the first gas equalization channel (110) are arranged in a one-to-one correspondence. The first gas equalization channel (110) and the first air inlet channel (120) are connected through the second valve hole (1032). The air outlet plate (102) is provided with a first connection hole (1021) that corresponds one-to-one with the third valve hole (1033). The gas distribution structure also includes a first control valve (310), which is sequentially disposed in the first connecting hole (1021), the third valve hole (1033) and the second valve hole (1032), and the first control valve (310) and the third valve hole (1033) form a seal.

11. The gas-uniform structure according to any one of claims 1-10, characterized in that, The gas equalization body (100) is provided with a third gas equalization channel (150) arranged in a P×Q matrix and Q second air inlet channels (160) spaced apart along a first direction. The Q second air inlet channels (160) are arranged one-to-one with the Q columns of the third gas equalization channels (150) arranged along the first direction. The second air inlet channels (160) are connected to the corresponding third gas equalization channels (150). The Q third gas equalization channels (150) located in the same row along the first direction are connected to at least one fourth gas equalization channel (170) provided on the gas equalization body (100). All the fourth gas equalization channels (170) are spaced apart along the second direction. The fourth gas equalization channels (170) are connected to a second air hole group. The second air hole group includes a plurality of second air outlets (180) spaced apart along the first direction on the gas equalization body (100), where P>1, -1≥NQ≥1. Among them, N first air intake channels (120) and Q second air intake channels (160) are arranged alternately along the first direction, and the first air hole group and the second air hole group are arranged alternately along the second direction.

12. The gas-uniform structure according to claim 11, characterized in that, The first gas equalization channel (110) includes X first channel sections (111), which extend along a first direction. N first channel sections (111) located in the same row along the first direction are connected to a second gas equalization channel (130), which extends along the first direction. Where X ≥ 1. The third gas equalization channel (150) includes Y second channel sections (151), which extend along a first direction. Q second channel sections (151) located in the same row along the first direction are connected to a fourth gas equalization channel (170), which extends along the first direction. Y ≥ 1; the first channel sections (111) in the N× row and the second channel sections (151) in the QY row are arranged alternately along a second direction.

13. The gas-uniform structure according to claim 12, characterized in that, The second channel section (151) is connected to the corresponding fourth air distribution channel (170) through a plurality of second vent holes (1511).

14. The gas-uniform structure according to claim 11, characterized in that, The gas equalization structure also includes a second control valve (320), which is located between the third gas equalization channel (150) and the second air intake channel (160). The second control valve (320) is used to adjust the opening between the second air intake channel (160) and the third gas equalization channel (150).

15. The gas-uniform structure according to claim 11, characterized in that, The gas equalization body (100) is provided with at least one isolation channel group (190) between adjacent first air hole groups and second air hole groups. The isolation channel group (190) includes two rows of first retraction channels (191) and a row of first air isolation holes (1921) between the two rows of first retraction channels (191). The first retraction channels (191) and the first air isolation holes (1921) are both extended in a third direction. The gas equalization structure also includes a heating plate (210), which is located on the side of the gas equalization body (100) away from the first air outlet (140) along the third direction. The heating plate (210) is provided with a first return hole (211) that corresponds to and communicates with the first return channel (191). The first return hole (211) extends along the third direction. The heating plate (210) is provided with a first partition (2121) that corresponds to the isolation channel group (190) along the third direction away from the gas equalization body (100). The projection of the first partition (2121) along the third direction is located between the two rows of the first return channels (191) of the corresponding isolation channel group (190).

16. The gas-uniform structure according to claim 15, characterized in that, The heating plate (210) has a second partition (2122) on the side away from the gas equalization body (100) along the third direction, between two rows of first return holes (211) between two adjacent first partitions (2121).

17. The gas-uniform structure according to claim 15, characterized in that, The gas equalization structure also includes a cover plate (220), which is located on the side of the heating plate (210) away from the gas equalization body (100) in a third direction. A surrounding plate (230) is provided between the heating plate (210) and the cover plate (220). A retraction cavity is formed between the heating plate (210), the cover plate (220) and the surrounding plate (230). The first retraction hole (211) communicates with the retraction cavity, and the first partition plate (2121) is located inside the retraction cavity. At least one of the heating plate (210) and the cover plate (220) is provided with a second back-pull hole (215) communicating with the back-pull chamber, and the gas in the back-pull chamber is discharged through the second back-pull hole (215).

18. The gas-uniform structure according to claim 17, characterized in that, The first partition (2121) abuts against the cover plate (220), and the heating plate (210) protrudes from at least one side of the gas equalization body (100) along the first direction; Along the first direction, the first partition (2121) and the surrounding plate (230) form a gap (213) on the part of the heating plate (210) that protrudes from the gas equalization body (100), and the part of the heating plate (210) that protrudes from the gas equalization body (100) is provided with a second return hole (215) that communicates with the return cavity.

19. The gas-uniform structure according to claim 11, characterized in that, The area of ​​the end of the first air outlet (140) that is connected to the second air distribution channel (130) is smaller than the area of ​​the end of the first air outlet (140) that is away from the second air distribution channel (130).

20. A coating apparatus, characterized in that, include: The main body of the equipment is equipped with a reaction chamber; The gas equalization structure as described in any one of claims 1-19 is disposed within the main body of the device, and the first gas outlet (140) on the gas equalization body (100) of the gas equalization structure is in communication with the reaction chamber.

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