Flow regulating device for a crystal growing furnace

Abstract

The utility model relates to a flow regulating device of long crystal furnace, including the furnace body and gas supply device for crystal growth, be equipped with the conveying pipeline between furnace body and gas supply device, the conveying pipeline is equipped with flow regulating element, flow detection element along the air current direction in proper order, the adjusting device still includes control element, the inside temperature sensor of furnace body is provided with, control element includes treater, the memory that has a plurality of corresponding different furnace temperature interval's gas flow preset value is stored, the input of treater and temperature sensor, flow detection element communication connection, treater's output and flow regulating element's communication connection. Through the setting of flow detection element, flow regulating element, temperature sensor and control element, make this adjusting device can automatically detect the furnace temperature to the preset temperature and flow corresponding relation drive flow regulating element to adjust gas flow, improve the degree of automation, simplify the operation.

Description

Technical Field

[0001] This utility model relates to the field of crystal material preparation technology, specifically to a flow regulating device for a crystal growth furnace. Background Technology

[0002] During crystal growth, operators typically need to introduce reactive or protective gases into the furnace. However, the requirements for furnace atmosphere stability and gas flow rate vary at different stages of crystal growth. To achieve flow control, operators usually need to manually adjust the corresponding flow valves in the gas supply lines to control different gas flow rates, which is cumbersome and has a low degree of automation. Utility Model Content

[0003] The purpose of this invention is to provide a flow regulation device for a crystal growth furnace, thereby solving the above-mentioned problems.

[0004] To solve the above-mentioned technical problems, this utility model provides the following technical solution: a flow regulation device for a crystal growth furnace, comprising a furnace body for crystal growth and a gas supply device, wherein a gas supply pipeline is provided between the furnace body and the gas supply device, and a flow regulation element for regulating the gas flow rate entering the furnace body and a flow detection element for detecting the actual gas flow rate after regulation by the flow regulation element are sequentially arranged along the airflow direction on the supply pipeline. The regulation device also includes a control element, wherein a temperature sensor is provided inside the furnace body, and the control element includes a processor and a memory storing multiple preset gas flow rates corresponding to different furnace temperature ranges. The input terminal of the processor is communicatively connected to the temperature sensor and the flow detection element to obtain the current furnace temperature and the actual gas flow rate, and the output terminal of the processor is communicatively connected to the flow regulation element to output a control signal based on the comparison result between the preset flow rate value corresponding to the temperature range and the actual flow rate value to drive the flow regulation element to regulate the gas flow rate.

[0005] As a further optimization of this utility model, the flow regulating element is a solenoid valve or a proportional valve.

[0006] As a further optimization of this utility model, the flow detection element is a mass flow meter.

[0007] As a further optimization of this utility model, a voltage stabilizing device is provided between the flow detection element and the flow regulation element.

[0008] As a further optimization of this utility model, the pressure stabilizing device is a buffer tank.

[0009] As a further optimization of this utility model, a rectifier tube is provided between the flow detection element and the voltage stabilizing device.

[0010] As a further optimization of this utility model, the control element is communicatively connected to an input device for setting a preset value for gas flow.

[0011] As a further optimization of this utility model, the input device is a touch screen installed on the furnace body.

[0012] Compared with the prior art, the present invention has the following advantages: by setting up a flow detection element, a flow regulation element, a temperature sensor and a control element, the regulating device can automatically detect the temperature inside the furnace and drive the flow regulation element to regulate the gas flow according to the preset temperature and flow correspondence, thereby improving the degree of automation and simplifying operation. Attached Figure Description

[0013] Figure 1 This is a schematic diagram of the structure of this utility model;

[0014] Figure 2 This is a schematic diagram of the operation of the control element in this utility model. Detailed Implementation

[0015] The embodiments of this utility model will now be described in detail with reference to the accompanying drawings.

[0016] like Figure 1 , Figure 2 As shown, this utility model discloses a flow regulation device for a crystal growth furnace, including a furnace body 1 for crystal growth and a gas supply device 2. A gas delivery pipeline 3 is provided between the furnace body 1 and the gas supply device 2. A flow regulation element 4 for regulating the gas flow rate entering the furnace body 1 and a flow detection element 5 for detecting the actual gas flow rate after being regulated by the flow regulation element 4 are sequentially arranged along the airflow direction on the delivery pipeline 3. The regulation device also includes a control element 6. A temperature sensor 11 is installed inside the furnace body 1. The control element 6 includes a processor 61 and a memory 62 storing multiple preset gas flow rates corresponding to different furnace temperature ranges. The input terminal of the processor 61 is communicatively connected to the temperature sensor 11 and the flow detection element 5 to obtain the current furnace temperature and the actual gas flow rate. The output terminal of the processor 61 is communicatively connected to the flow regulation element 4 and is used to output a control signal to drive the flow regulation element 4 to regulate the gas flow rate based on the comparison result between the preset flow rate value corresponding to the temperature range and the actual flow rate value.

[0017] The furnace body 1 is used to house tools and materials such as crystal rods and crucibles, providing a controlled environment for crystal growth. The gas supply device 2 provides gases required for crystal growth, such as argon, nitrogen, and hydrogen; preferably, it is a high-pressure gas cylinder or gas generator. The delivery pipeline 3 forms the channel for transporting gas from the gas supply device 2 to the furnace body 1. The flow regulating element 4 can actively change its flow cross-sectional area according to received external control signals, thereby dynamically regulating the gas flow rate through the element. The flow detection element 5 can measure the actual gas flow rate after adjustment by the flow regulating element 4 and convert the measured value into an electrical signal output. The temperature inside the furnace varies at different stages of crystal growth; the temperature sensor 11 can monitor the furnace temperature and send the data to the control element 6. The processor 61 can be a microcontroller, programmable logic controller, or other components, executing data processing and control algorithms. The memory 62 is electrically connected to or integrated within the processor 61, storing multiple preset gas flow rates, and these preset values ​​have a one-to-one correspondence with different furnace temperature ranges. A temperature sensor 11 is installed inside the furnace body 1 to detect the actual temperature inside the furnace in real time and convert the temperature signal into an electrical signal for output.

[0018] In one embodiment, the operation of the regulating device is as follows: The processor 61 first receives the current furnace temperature from the temperature sensor 11, and based on the current temperature value, searches or calculates in the temperature-flow mapping relationship stored in the memory 62 to determine the preset value of the target gas flow rate corresponding to the current temperature. Simultaneously, the processor 61 receives the actual gas flow rate value from the flow detection element 5. Then, the processor 61 compares the acquired actual gas flow rate value with the preset target gas flow rate value, calculates the deviation between the two, and generates a corresponding control signal based on the deviation, sending it to the flow regulating element 4 through the output terminal to drive it to adjust its operating state, thereby reducing the deviation between the actual flow rate and the target flow rate, and thus achieving the purpose of accurately and stably regulating the gas flow rate according to the furnace temperature.

[0019] By setting up the flow detection element 5, the flow regulation element 4, the temperature sensor 11, and the control element 6, the regulating device can automatically detect the temperature inside the furnace and drive the flow regulation element to adjust the gas flow according to the preset temperature-flow correspondence, ensuring that the gas flow is stable within the process requirements range, improving the stability of crystal growth quality, increasing the degree of automation, and simplifying operation.

[0020] The flow regulating element 4 is a solenoid valve or a proportional valve, which enables the regulating device to achieve precise flow regulation through multiple combinations of solenoid valves or by receiving analog signals.

[0021] The flow detection element 5 is a mass flow meter, which measures the actual mass flow rate of the gas entering the furnace and provides a reliable feedback signal to the processor 61. The flow detection element 5 can also be implemented using a differential pressure flow meter or other flow meters.

[0022] In one embodiment, a pressure stabilizing device 8 is provided between the flow detection element 5 and the flow regulation element 4. The pressure stabilizing device 8 stabilizes the pressure of its downstream pipeline, thereby providing a measurement environment with small pressure fluctuations for the flow detection element 5, reducing measurement noise and errors caused by pressure transients, and ensuring the accuracy of the feedback signal.

[0023] The pressure stabilizing device 8 is a buffer tank, which is a closed chamber with a certain volume. When the upstream pressure fluctuates instantaneously, the gas in the buffer tank can be compressed or expanded to absorb or release energy, thereby smoothing the changes in downstream pressure and enhancing system stability.

[0024] A rectifier tube 9 is provided between the flow detection element 5 and the pressure stabilizing device 8. The rectifier tube 9 provides a sufficiently long straight pipe section to ensure that the airflow reaches a uniform and stable flow state before entering the flow meter. The rectifier tube 9 makes the airflow entering the flow detection element 5 more stable and uniform, thereby improving the measurement accuracy.

[0025] The control element 6 is communicatively connected to an input device 7 for setting a preset gas flow rate. Through the settings of the input device 7, operators or external systems are allowed to input, modify, or select preset gas flow rates corresponding to different furnace temperature ranges, thereby improving system flexibility.

[0026] The input device 7 is a touch screen installed on the furnace body 1. Operators can use the touch screen to set the target flow rate, view the real-time flow curve, and modify control parameters.

[0027] Compared with existing technologies, this invention can improve the accuracy and stability of flow control, avoid errors and lags during manual adjustment, reduce crystal defects caused by gas flow fluctuations, and automatically switch flow parameters at different stages according to preset processes without manual intervention. This reduces the labor intensity of operators, improves production efficiency, facilitates the recording and traceability of flow data, provides data support for optimizing crystal growth processes, and enhances the controllability and repeatability of the production process.

Claims

1. A flow regulating device for a crystal growing furnace, characterized by, The system includes a furnace body (1) for crystal growth and a gas supply device (2). A gas supply pipeline (3) is provided between the furnace body (1) and the gas supply device (2). The gas supply pipeline (3) is provided with a flow regulating element (4) for regulating the gas flow rate entering the furnace body (1) and a flow detection element (5) for detecting the actual gas flow rate after being regulated by the flow regulating element (4) along the airflow direction. The regulating device also includes a control element (6). A temperature sensor (11) is provided inside the furnace body (1). The control element (6) includes a processor (61) and a memory (62) storing multiple preset gas flow rates corresponding to different furnace temperature ranges. The input end of the processor (61) is communicatively connected to the temperature sensor (11) and the flow detection element (5) to obtain the current furnace temperature and actual gas flow rate. The output end of the processor (61) is communicatively connected to the flow regulating element (4) and is used to output a control signal to drive the flow regulating element (4) to regulate the gas flow rate based on the comparison result between the preset flow rate value and the actual flow rate value corresponding to the temperature range.

2. The flow rate regulating device for a crystal growth furnace according to claim 1, characterized in that, The flow regulating element (4) is a solenoid valve or a proportional valve.

3. The flow regulating device of a crystal growing furnace according to claim 2, wherein The flow detection element (5) is a mass flow meter.

4. The flow regulating device of claim 1, wherein, A voltage stabilizing device (8) is provided between the flow detection element (5) and the flow regulation element (4).

5. The flow rate regulating device for a crystal growth furnace according to claim 4, characterized in that, The pressure stabilizing device (8) is a buffer tank.

6. The flow regulating device of a crystal growing furnace according to claim 5, wherein A rectifier tube (9) is provided between the flow detection element (5) and the voltage regulator (8).

7. The flow regulating device of claim 1, wherein, The control element (6) is communicatively connected to an input device (7) for setting a preset value for gas flow rate.

8. The flow rate regulating device for a crystal growth furnace according to claim 7, characterized in that, The input device (7) is a touch screen installed on the furnace body (1).

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