Calligraphy practice grid paper (Yitian positioning grid)
CN309065053SActive Publication Date: 2025-01-10SHENZHEN LIREN CULTURE TECHNOLOGY CO LTD
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Patent Information
- Application Number
- CN202430377378.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2024-06-19
- Publication Date
- 2025-01-10
- Estimated Expiration
- 2039-06-19
Smart Images
Figure 000001_ABST
Abstract
1. The name of the product of this design: Calligraphy Practice Grid Paper (Yitian Positioning Grid). 2. Purpose of the product of this design: grid paper for calligraphy practice. 3. The design key point of this appearance design product lies in the pattern. 4. The picture or photo that best illustrates the key points of the design: main view. 5. The back of the product is not easily visible or can not be seen during use, so the back view is omitted. For flat products, left, right, top, bottom and stereoscopic views are omitted.
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