Photolithography machine wafer loading device

CN309155384SActive Publication Date: 2025-03-07苏州盛拓半导体科技有限公司
View PDF 0 Cites 1 Cited by

Patent Information

Application Number
CN202430436603.0
Authority / Receiving Office
CN · China
Patent Type
Designs(China)
Current Assignee / Owner
Filing Date
2024-07-12
Publication Date
2025-03-07
Estimated Expiration
2039-07-12

Smart Images

  • Figure 000001_ABST
    Figure 000001_ABST
Patent Text Reader

Abstract

1. The name of the product of this design: photolithography machine wafer loading device. 2. Purpose of this design product: This design product is used as a wafer loading and unloading device for lithography machines. 3. The design key point of this appearance design product lies in the shape. 4. The picture or photo that best illustrates the design points: three-dimensional picture.
Need to check novelty before this filing date? Find Prior Art

Citation Information

Cited By

  • Substrate processing apparatus

    USD1098056S